WO2016041259A1 - Écran tactile et son procédé de fabrication, et dispositif d'affichage - Google Patents

Écran tactile et son procédé de fabrication, et dispositif d'affichage Download PDF

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Publication number
WO2016041259A1
WO2016041259A1 PCT/CN2014/093108 CN2014093108W WO2016041259A1 WO 2016041259 A1 WO2016041259 A1 WO 2016041259A1 CN 2014093108 W CN2014093108 W CN 2014093108W WO 2016041259 A1 WO2016041259 A1 WO 2016041259A1
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Prior art keywords
touch
insulating film
transparent conductive
transparent
film
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PCT/CN2014/093108
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English (en)
Chinese (zh)
Inventor
刘震
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京东方科技集团股份有限公司
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Publication of WO2016041259A1 publication Critical patent/WO2016041259A1/fr

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means

Definitions

  • At least one embodiment of the present invention is directed to a touch screen, a method of fabricating the same, and a display device.
  • touch screen technology has developed rapidly and has gradually developed into a common technology in the field of touch and display.
  • a touch electrode is formed by using a transparent conductive oxide material such as Indium Tin Oxides (ITO) material on a cover plate attached to the display panel by using a vacuum sputtering apparatus.
  • ITO Indium Tin Oxides
  • the ITO material and The cost of the vacuum sputtering apparatus is high, resulting in a high production cost of the touch screen.
  • nano-level transparent conductive materials such as metal nanowires, carbon nanotubes, graphene, etc., which are not required to be formed by vacuum sputtering equipment, are used instead of ITO materials. Touch electrode.
  • the embodiment of the invention provides a touch screen, a manufacturing method thereof and a display device, which are used to optimize the manufacturing process of the touch screen.
  • At least one embodiment of the present invention provides a method of fabricating a touch screen, the method comprising: forming a first transparent insulating film on a cover of the touch screen with a thermosetting material; coating the nano transparent film on the first transparent insulating film a transparent conductive material forming a first transparent conductive film; thermally curing the first transparent insulating film coated with the nano-sized transparent conductive material; and forming a heat-cured first transparent insulating film
  • the first transparent conductive film forms a touch driving electrode and/or a touch sensing electrode.
  • At least one embodiment of the present invention also provides a touch screen including: a display panel and a cover plate attached to the display panel, a first transparent insulating film on the cover plate, and the first transparent insulating film A mutually insulated touch driving electrode and a touch sensing electrode above a transparent insulating film.
  • the touch driving electrode and/or the contact with the first transparent insulating film is a nanometer transparent conductive material.
  • At least one embodiment of the present invention further provides a display device, including the above touch screen provided by the embodiment of the present invention.
  • FIG. 1 is a flowchart of a method for fabricating a touch screen according to an embodiment of the present invention
  • FIG. 2 to FIG. 6 are schematic structural diagrams of a touch screen according to an embodiment of the present invention.
  • FIGS. 7a-7e are schematic structural diagrams of a method for fabricating a touch screen in the first embodiment of the present invention after performing various steps;
  • FIGS. 8a-8c are schematic structural diagrams of a method for fabricating a touch screen in the second embodiment of the present invention after performing various steps;
  • FIG. 9a and FIG. 9b are respectively schematic structural diagrams of a method for fabricating a touch screen according to Example 5 of the present invention after performing various steps;
  • FIG. 10 is a schematic structural diagram of a touch screen according to an embodiment of the present invention.
  • a silver nanowire material as a touch electrode on a cover plate
  • the dry film is formed by forming a polyethylene terephthalate on the base substrate.
  • a polyvinyl terephthalate (PET) film the silver nanowire material is coated on the PET film and then covered with a protective layer to form a dry film comprising a PET film, a silver nanowire film and a protective layer;
  • the base substrate is removed, and the dry film is attached to the cover of the touch screen by a filming process using an optically transparent adhesive (OCA); then, the protective layer is removed; finally, the silver nanowires exposed in the dry film are exposed.
  • OCA optically transparent adhesive
  • a method for fabricating a touch screen provided by at least one embodiment of the present invention, as shown in FIG. 1, includes, for example, the following steps S101 to S104.
  • first transparent insulating film on the cover of the touch screen by using a thermosetting material.
  • the material of the first transparent insulating film may be polyethylene terephthalate (PET) or polymethyl methacrylate (PMMA), which is not limited herein.
  • the material of the first transparent conductive film may be a metal nanowire material, such as a gold nanowire material, a silver nanowire material, a copper nanowire material, or an aluminum nanowire material; or the material of the first transparent conductive film may also be For carbon nanotube materials or graphene materials, etc., there is no limit here. set.
  • the heat curing treatment can make the first transparent insulating film reach the hardness required by the process, and the first transparent insulating film can be stabilized on the cover of the touch screen without using an optical transparent adhesive (OCA).
  • OCA optical transparent adhesive
  • the first transparent conductive film on the first transparent insulating film after the heat curing process is formed into a touch driving electrode and/or a touch sensing electrode.
  • the touch driving electrode and/or the touch sensing electrode may be formed by a patterning process.
  • the patterning process includes, for example, a step of exposing, developing, and the like of the first transparent insulating film using a mask.
  • the pattern of the touch electrode can also be formed by a laser dry etching process, which is not limited herein.
  • the first transparent insulating film is thermally cured to stabilize the two layers of the film on the cover plate.
  • the first transparent insulating film coated with the nano-scale transparent conductive layer material is not required to be adhered to the cover plate by using an optical transparent adhesive, which not only reduces the thickness of the touch screen, but also improves the light transmittance of the touch screen.
  • the first transparent conductive film on the first transparent insulating film after the heat curing treatment may be formed only by the touch driving electrode; or
  • the touch sensing electrodes and the touch sensing electrodes may be formed at the same time, that is, the touch driving electrodes and the touch sensing electrodes are disposed in the same layer, which is not limited herein.
  • the touch sensing electrodes are formed in the same manner as the touch driving electrodes; or the touch sensing electrodes are formed by a method commonly used by those skilled in the art, which is not limited herein.
  • the above manufacturing method provided by the embodiment of the present invention may further include the following steps.
  • a second transparent insulating film is formed by using a thermosetting material above the film layer where the touch driving electrode is located (ie, the side of the film layer where the touch driving electrode is located away from the cover).
  • the material of the second transparent insulating film may be PET or PMMA or the like, which is not limited herein; and the material of the second transparent insulating film may be the same as or different from the material of the first transparent insulating film, and is not limited herein. set.
  • a nano-scale transparent conductive material is coated on the second transparent insulating film to form a second transparent conductive film.
  • the material of the second transparent conductive film may be a metal nanowire material, such as a gold nanowire material, a silver nanowire material, a copper nanowire material or an aluminum nanowire material; or the material of the second transparent conductive film may also be The carbon nanotube material or the graphene material or the like is not limited herein; and the material of the second transparent conductive film may be the same as or different from the material of the first transparent conductive film, which is not limited herein.
  • the second transparent insulating film coated with the nano-sized transparent conductive material is subjected to a heat curing treatment.
  • the heat curing treatment can make the second transparent insulating film reach the hardness required by the process.
  • the second transparent conductive film on the second transparent insulating film after the heat curing treatment is formed into a touch sensing electrode.
  • the touch sensing electrode can be formed by a patterning process.
  • the pattern of the touch electrode can also be formed by a laser dry etching process, which is not limited herein.
  • the above manufacturing method provided by the embodiment of the present invention may further include the following steps when the touch sensing electrode is fabricated by a method commonly used by those skilled in the art.
  • a vacuum conductive device is used to form a transparent conductive oxide film insulated from the touch driving electrodes above the film layer where the touch driving electrodes are located (ie, the side of the film layer where the touch driving electrodes are located away from the cover).
  • the material of the transparent conductive oxide film may be Indium Tin Oxides (ITO) or the like, which is not limited herein.
  • the transparent conductive oxide film is formed into a touch sensing electrode, for example, by a patterning process.
  • the touch driving electrodes are formed in the same manner as the touch sensing electrodes; or the touch driving electrodes are formed by a method commonly used by those skilled in the art, which is not limited herein.
  • the manufacturing method provided by the embodiment of the present invention may further include the following steps when the touch driving electrode is formed in the same manner as the touch sensing electrode.
  • a second transparent insulating film is formed by using a thermosetting material above the film layer where the touch sensing electrode is located (ie, the side of the film layer where the touch sensing electrode is located away from the cover).
  • the material of the second transparent insulating film may be PET or PMMA or the like, which is not limited herein; and the material of the second transparent insulating film may be the same as or different from the material of the first transparent insulating film, which is not limited herein. .
  • a nano-scale transparent conductive material is coated on the second transparent insulating film to form a second transparent conductive film.
  • the material of the second transparent conductive film may be a metal nanowire material, such as a gold nanowire material, a silver nanowire material, a copper nanowire material or an aluminum nanowire material; or the material of the second transparent conductive film may also be The carbon nanotube material or the graphene material or the like is not limited herein; and the material of the second transparent conductive film may be the same as or different from the material of the first transparent conductive film, which is not limited herein.
  • the second transparent insulating film coated with the nano-sized transparent conductive material is subjected to a heat curing treatment.
  • the heat curing treatment can make the second transparent insulating film reach the hardness required by the process.
  • the second transparent conductive film on the second transparent insulating film after the heat curing treatment is formed into a touch driving electrode.
  • the touch drive electrodes can be formed by a patterning process.
  • the pattern of the touch electrode can also be formed by a laser dry etching process, which is not limited herein.
  • the above manufacturing method provided by the embodiment of the present invention may further include the following steps when the touch driving electrode is fabricated by a method commonly used by those skilled in the art.
  • a vacuum conductive device is used to form a transparent conductive oxide film insulated from the touch sensing electrodes above the film layer where the touch sensing electrodes are located (ie, the side of the film layer where the touch sensing electrodes are located away from the cover).
  • the material of the transparent conductive oxide film may be ITO or the like, which is not limited herein.
  • the transparent conductive oxide film is formed into a touch driving electrode, for example, by a patterning process.
  • the method for forming the touch driving electrode by using the above steps is similar to the method for forming the touch electrode by using a transparent conductive oxide commonly used by those skilled in the art, and details are not described herein.
  • the manufacturing method of the embodiment of the present invention may further include: forming a transparent protective layer over the touch driving electrode and the touch sensing electrode.
  • Transparent protective layer protects touch The drive electrode and the touch sensing electrode are protected from mechanical scratches.
  • the manufacturing method of the embodiment of the present invention may further include: forming a first lead electrically connected to the touch driving electrode and a second lead electrically connected to the touch sensing electrode.
  • the conductive paste is formed by a low-temperature curing conductive paste by a printing process or a patterning process.
  • a first lead is generally formed after the touch driving electrode is formed, and a second lead is formed after the touch sensing electrode is formed.
  • the touch screen includes: a display panel 20 and a cover 1 attached to the display panel 20. a first transparent insulating film 2 on the cover 1 and an insulated touch drive electrode 3 located above the first transparent insulating film 2 (ie, the side of the first transparent insulating film 2 away from the cover 1) and Touch sensing electrode 4.
  • the material of the touch driving electrode 3 and/or the touch sensing electrode 4 that is in contact with the first transparent insulating film 2 is a nano-scale transparent conductive material.
  • the display panel 20 includes an array substrate 21 and a counter substrate 22 (for example, a color filter substrate or a transparent substrate), and the cover plate 1 is disposed on a side of the opposite substrate 22 away from the array substrate 21.
  • the display panel 20 and the cover 1 can be attached together by the adhesive 12.
  • the structure of the first transparent insulating film 2, the touch driving electrode 3 and the touch sensing electrode 4 is not shown in FIG. 10; and FIG. 10 is an example in which the display panel 20 is a liquid crystal panel, but the display panel is used. 20 may also be an OLED panel or the like, which is not limited in the embodiment of the present invention.
  • the material of the cover plate attached to the display panel may be tempered glass, ordinary glass or plastic, and the like, which is not limited herein.
  • the nano-scale transparent conductive material may be a metal nanowire material, such as a gold nanowire material, a silver nanowire material, a copper nanowire material or an aluminum nanowire material; or the nanometer transparent conductive material may also be a carbon nanotube Materials or graphene materials and the like are not limited herein.
  • the touch driving electrode 3 can be in contact with the first transparent insulating film 2, and the material of the touch driving electrode 3 is The nano-level transparent conductive material; or, as shown in FIG. 4 and FIG. 5, only the touch sensing electrode 4 is in contact with the first transparent insulating film 2, and the material of the touch sensing electrode 4 is a nano-level transparent conductive material.
  • the touch driving electrode 3 and the touch sensing electrode 4 are disposed in the same layer, and the touch driving electrode 3 and the touch sensing electrode 4 are both insulated from the first transparent.
  • the film 2 is in contact with each other, and the materials of the touch driving electrode 3 and the touch sensing electrode 4 are both nanometers.
  • the level of transparent conductive material is not limited herein.
  • control sensing electrode 4 can be the same material as the touch driving electrode 3; or, as shown in FIG. 3, the touch sensing electrode 4 can also be made of materials commonly used by those skilled in the art, which is not limited herein.
  • the touch screen provided by the embodiment of the present invention may further include a second layer located above the film layer of the touch driving electrode 3 .
  • the transparent insulating film 5 is disposed on the second transparent insulating film 5, and the material of the touch sensing electrode 4 is a nano-level transparent conductive material, so that the touch driving electrode 3 and the touch sensing electrode 4 are used.
  • the nano-scale transparent conductive material with lower cost and higher light transmittance enables the embodiment of the invention not only to reduce the manufacturing cost of the touch screen, but also improve the light transmittance of the touch screen; and, because the first transparent is omitted
  • the OCA glue between the insulating film 2 and the cover plate 1 can not only reduce the thickness of the touch screen, but also further improve the light transmittance of the touch screen.
  • the touch sensing electrode 4 when the touch sensing electrode 4 is made of materials commonly used by those skilled in the art, the touch sensing electrode 4 is located above the film layer where the touch driving electrode 3 is located, and is driven by the insulating layer 6 and the touch driving layer.
  • the electrodes 3 are insulated from each other, and the material of the touch sensing electrode 4 is a transparent conductive oxide, such as ITO.
  • the touch driving electrode 3 adopts a nano-level transparent conductive material with low cost and high light transmittance, so that the present invention
  • the embodiment of the invention can not only reduce the manufacturing cost of the touch screen, but also improve the light transmittance of the touch screen; and, since the OCA glue between the first transparent insulating film 2 and the cover 1 is omitted, the embodiment of the invention can not only reduce The thickness of the touch screen can further increase the light transmittance of the touch screen.
  • control driving electrode 3 can be the same material as the touch sensing electrode 4; or, as shown in FIG. 5, the touch driving electrode 3 can also be made of materials commonly used by those skilled in the art, which is not limited herein.
  • the touch screen provided by the embodiment of the present invention may further include a second layer located above the film layer of the touch sensing electrode 4 .
  • the transparent insulating film 5, the touch driving electrode 3 is located on the second transparent insulating film 5, and the material of the touch driving electrode 3 is a nano-level transparent conductive material, so that the touch driving electric Both the pole 3 and the touch sensing electrode 4 adopt a nano-level transparent conductive material with low cost and high light transmittance, so that the embodiment of the invention can not only reduce the manufacturing cost of the touch screen, but also provide the light transmittance of the touch screen.
  • the embodiment of the present invention can not only reduce the thickness of the touch screen, but also further improve the light transmittance of the touch screen.
  • the touch driving electrode 3 when the touch driving electrode 3 is made of materials commonly used by those skilled in the art, the touch driving electrode 3 is located above the film layer where the touch sensing electrode 4 is located, and passes through the insulating layer 6 and the touch sensing.
  • the electrodes 4 are insulated from each other, and the material of the touch driving electrode 3 is a transparent conductive oxide, such as ITO.
  • the touch sensing electrode 4 is made of a nanometer transparent conductive material with low cost and high light transmittance.
  • the embodiment of the invention can not only reduce the manufacturing cost of the touch screen, but also provide the light transmittance of the touch screen; and, since the OCA glue between the first transparent insulating film 2 and the cover 1 is omitted, the embodiment of the invention can not only reduce The thickness of the touch screen can further increase the light transmittance of the touch screen.
  • the touch driving electrode 3 and the touch sensing electrode 4 may also be disposed in the same layer, and both are A transparent insulating film 2 is in contact with each other, so that the touch driving electrode 3 and the touch sensing electrode 4 both use a nano-level transparent conductive material with low cost and high light transmittance, so that the embodiment of the invention can not only reduce the touch screen
  • the manufacturing cost can also increase the light transmittance of the touch screen; and, since the OCA glue between the first transparent insulating film 2 and the cover 1 is omitted, the embodiment of the present invention can not only reduce the thickness of the touch screen, but also Further improve the light transmittance of the touch screen.
  • the nano-scale transparent conductive film has a low square resistance, for example, the square resistance of the nano-scale transparent conductive film is controlled to be less than or equal to 50 ⁇ /m 2 .
  • the touch screen provided by the embodiment of the present invention may further include a transparent protective layer 7 located above the touch driving electrode 3 and the touch sensing electrode 4, that is, a side of the transparent protective layer 7 facing the cover 1 is provided.
  • the touch driving electrode 2 and the touch sensing electrode 4 protect the touch driving electrode 3 and the touch sensing electrode 4 from mechanical scratches.
  • Example 1 As shown in FIG. 2, the touch driving electrode 3 and the touch sensing electrode 4 are both made of silver nanowire material, and only the touch driving electrode 3 is in contact with the first transparent insulating film 2, and the manufacturing method thereof includes the following, for example, the following Steps (1) to (8).
  • a black matrix 8 having a thickness of 1 to 20 ⁇ m is formed on the cover 1 of the touch panel by, for example, a printing process, as shown in Fig. 7a.
  • the black matrix may also be formed using a patterning process, and the thickness of the black matrix is preferably 1.5 ⁇ m.
  • a first transparent insulating film 2 having a thickness of 3 to 50 ⁇ m is formed on the cover 1 on which the black matrix 8 is formed, as shown in Fig. 7b.
  • the thickness of the first transparent insulating film is preferably 10 ⁇ m.
  • a silver nanowire material is coated on the first transparent insulating film 2 to form a silver nanowire transparent conductive film (an example of the first transparent conductive film 34) having a thickness of 40 to 120 nm, as shown in Fig. 7c.
  • the thickness of the silver nanowire transparent conductive film is preferably 100 nm; and the formed silver nanowire transparent conductive film has a square resistance of 10 to 200 ⁇ /m 2 and a square resistance of preferably 50 ⁇ /m 2 .
  • the first transparent insulating film 2 coated with the silver nanowire material is subjected to a heat curing treatment.
  • the curing temperature is 100-180 ° C
  • the curing temperature is preferably 150 ° C
  • the curing time is 20-120 min, and the curing time is preferably 60 min.
  • a patterning process is performed on the silver nanowire transparent conductive film on the first transparent insulating film 2 after the heat curing treatment to form the touch driving electrode 3, as shown in FIG. 7d.
  • the pattern of the touch driving electrode can also be formed by a laser dry etching process, for example, the laser energy can be controlled to 1W-20W, and the laser dry etching speed can be controlled to 0.1m/s-15m/s, in one example, The laser energy is preferably 4 W, and the laser dry etching speed is preferably 1 m/s; for example, the pitch between the touch driving electrodes can be controlled to be 10 to 70 ⁇ m, and in one example, the pitch is preferably 30 ⁇ m.
  • the first lead 9 by using a printing process using a low-temperature curing conductive silver paste.
  • the first lead may also be formed using a patterning process.
  • a transparent protective layer 7 having a thickness of 1-30 ⁇ m by a printing process, as shown in FIG. 2; in one example, the thickness of the transparent protective layer is preferably 10 ⁇ m; for example, the transparent protective layer may also be formed by a patterning process. To expose the first lead and the second lead.
  • Example 2 As shown in FIG. 3, the touch driving electrode 3 is made of silver nanowire material, and the touch sense is The electrode 4 is made of ITO, and only the touch driving electrode 3 is in contact with the first transparent insulating film 2. For example, after repeating the steps (1)-(6) in the first example, the following steps (7) are performed. To (11).
  • the insulating layer is used to insulate the touch driving electrodes from the touch sensing electrodes to be formed.
  • a patterning process is performed on the ITO film to form the touch sensing electrode 4, as shown in Fig. 8b.
  • the pitch between the touch sensing electrodes is generally controlled to be 10 to 70 ⁇ m, and in one example, the pitch is preferably 30 ⁇ m.
  • the second lead 10 is formed by a printing process using a low temperature curing conductive silver paste, as shown in Fig. 8c.
  • the second lead can also be formed using a patterning process.
  • a transparent protective layer 7 having a thickness of 1-30 ⁇ m by a printing process, as shown in FIG. 3; in one example, the thickness of the transparent protective layer is preferably 10 ⁇ m; for example, the transparent protective layer may also be formed by a patterning process. It is necessary to expose the first lead and the second lead.
  • Example 3 As shown in FIG. 4, the touch driving electrode 3 and the touch sensing electrode 4 are both made of silver nanowire material, and only the touch sensing electrode 4 is in contact with the first transparent insulating film 2.
  • Example 4 As shown in FIG. 5, the touch sensing electrode 4 is made of silver nanowire material, and the touch driving electrode 3 is made of ITO, and only the touch sensing electrode 4 is in contact with the first transparent insulating film 2.
  • Example 5 As shown in FIG. 6 , the touch driving electrode 3 and the touch sensing electrode 4 are both made of a silver nanowire material, and both are in contact with the first transparent insulating film 2, and the manufacturing method thereof includes, for example, repeating the example 1. After steps (1)-(4), the following steps (5) to (7) are performed.
  • a cross-bridge structure commonly used by those skilled in the art can be used; for example, the distance between the touch driving electrodes can be controlled to be 10-70 ⁇ m, and in one example, the pitch is preferably 30 ⁇ m; and the touch sensing electrode can be The spacing between the controls 10-70 ⁇ m, in one example, the pitch is preferably 30 ⁇ m.
  • a first lead 9 and a second lead 10 are respectively formed by using a low-temperature-curable conductive silver paste by a printing process, as shown in Fig. 9b.
  • the first lead and the second lead may also be formed using a patterning process.
  • the touch electrode is not limited to the use of the silver nanowire material, or the touch electrode may be formed by using other metal nanowire materials, or
  • the touch electrode is made of a carbon nanotube material or a graphene material, which is not limited herein.
  • the thickness of the carbon nanotube transparent conductive film is generally controlled to be 20 ⁇ m - 120 ⁇ m, in one example, the thickness of the carbon nanotube transparent conductive film is preferably 35 ⁇ m; Further, the formed carbon nanotube transparent conductive film has a square resistance of 100 to 300 ⁇ /m 2 , and in one example, the square resistance is preferably 150 ⁇ /m 2 .
  • the carbon nanotube transparent conductive film is generally patterned by a laser dry etching process to form a touch electrode.
  • the pitch between the touch electrodes is generally controlled to be 10-70 ⁇ m. In one example, the pitch is preferably 25 ⁇ m.
  • the laser energy is controlled to 1W-20W, in one example, the laser energy is preferably 4W; generally the laser dry etching speed is controlled to 0.1m/s-15m/s, in one example, the laser dry etching speed Preferably, it is 1 m/s; the thickness of the first transparent protective layer formed over the touch electrode made of the carbon nanotube material is generally controlled to be 2 to 30 ⁇ m, and in one example, the thickness is preferably 10 ⁇ m.
  • an embodiment of the present invention further provides a display device, which includes the above-mentioned touch screen provided by the embodiment of the present invention, and the display device may be: a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, Any product or part that has a display function, such as a navigator.
  • the display device reference may be made to the embodiment of the touch screen described above, and the repeated description is omitted.
  • the invention provides a touch screen, a manufacturing method thereof and a display device.
  • the manufacturing method comprises: forming a first transparent insulating film on a cover of the touch screen; coating a nano-level transparent conductive material on the first transparent insulating film Forming a first transparent conductive film; thermally curing the first transparent insulating film coated with the nano-scale transparent conductive material; forming a first transparent conductive film on the first transparent insulating film after the heat curing treatment Controlling the driving electrode and/or the touch sensing electrode; After the first transparent insulating film and the first transparent conductive film are sequentially laminated on the cover plate, the first transparent insulating film is thermally cured to stabilize the two layers of the film on the cover plate without using an optical transparent adhesive. The first transparent insulating film coated with the nano-scale transparent conductive layer material is adhered to the cover plate. Therefore, the embodiment of the present invention can not only reduce the thickness of the touch screen, but also improve the light transmittance of the touch screen.

Abstract

L'invention concerne un écran tactile et son procédé de fabrication, et un dispositif d'affichage. Le procédé de fabrication consiste à : former un premier film mince d'isolation transparent (2) sur une plaque de recouvrement (1) d'un écran tactile; revêtir d'un matériau conducteur transparent à l'échelle nanométrique le premier film mince d'isolation transparent (2) en vue de former un premier film mince conducteur (34) transparent; mettre en œuvre un thermodurcissement du premier film mince d'isolation transparent (2) revêtu du matériau conducteur transparent à l'échelle nanométrique; et activer le premier film mince conducteur (34) transparent disposé sur le premier film mince d'isolation transparent (2) après thermodurcissement en vue de former une électrode d'attaque tactile (3) et/ou une électrode de détection tactile (4). La présente invention permet de réduire l'épaisseur de l'écran tactile, et également d'améliorer la transmittance de lumière de l'écran tactile.
PCT/CN2014/093108 2014-09-18 2014-12-05 Écran tactile et son procédé de fabrication, et dispositif d'affichage WO2016041259A1 (fr)

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CN201410479017.X 2014-09-18
CN201410479017.XA CN104252269A (zh) 2014-09-18 2014-09-18 一种触摸屏、其制作方法及显示装置

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CN110058732A (zh) * 2019-01-18 2019-07-26 东旭（昆山）显示材料有限公司 触控面板组件及其制造方法
CN111524883A (zh) * 2020-04-29 2020-08-11 业成科技（成都）有限公司 膜内电子组件及其制备方法
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CN105955530A (zh) * 2016-04-29 2016-09-21 信利光电股份有限公司 一种触摸屏的制作方法、触摸屏及触摸显示装置
CN106020571A (zh) * 2016-07-13 2016-10-12 信利光电股份有限公司 一种触摸屏及其制造方法
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