WO2016019594A1 - 取向膜的制备方法 - Google Patents

取向膜的制备方法 Download PDF

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Publication number
WO2016019594A1
WO2016019594A1 PCT/CN2014/084266 CN2014084266W WO2016019594A1 WO 2016019594 A1 WO2016019594 A1 WO 2016019594A1 CN 2014084266 W CN2014084266 W CN 2014084266W WO 2016019594 A1 WO2016019594 A1 WO 2016019594A1
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WIPO (PCT)
Prior art keywords
film
alignment
orientation
area
array substrate
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PCT/CN2014/084266
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English (en)
French (fr)
Inventor
赵国
黄宇吾
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深圳市华星光电技术有限公司
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Priority to US14/417,661 priority Critical patent/US9520417B2/en
Publication of WO2016019594A1 publication Critical patent/WO2016019594A1/zh

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/1259—Multistep manufacturing methods
    • H01L27/1262—Multistep manufacturing methods with a particular formation, treatment or coating of the substrate
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133351—Manufacturing of individual cells out of a plurality of cells, e.g. by dicing
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133711—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133388—Constructional arrangements; Manufacturing methods with constructional differences between the display region and the peripheral region

Definitions

  • the present invention relates to the field of liquid crystal display, and more particularly to a method for preparing an oriented film.
  • a liquid crystal display panel is composed of a color filter substrate (CF) and a thin film transistor array substrate (Thin Film). Transistor, TFT), liquid crystal between the two (Liquid Crystal, LC) molecules, and sealant frame (Sealant) composition.
  • TFT Transistor
  • LC liquid crystal between the two (Liquid Crystal, LC) molecules
  • Sealant frame Sealant
  • the working principle is that the liquid crystal molecules are changed in direction by the energization of the TFT substrate, and the light of the backlight module is refracted to form a picture.
  • an alignment liquid such as a commonly used polyimide
  • the polyimide alignment liquid is first applied to the array substrate and the color filter substrate by inkjet; then, the polyimide solution is pre-cured.
  • the solvent is volatilized uniformly to form a film, which avoids the solvent residue from affecting the uniformity of the film; and then the main curing causes the polyamic acid (polyamic) Acid, PAA) is cyclized into a polyimide film (PI) to ensure uniformity of film thickness to avoid the formation of mura.
  • an alignment liquid such as a polyimide solution is applied onto the array substrate 01 or the color filter substrate, and a film 02 is formed in a predetermined pattern.
  • the array substrate 01 is located in the transfer region (Au Transfer The position of the pad) 03 and the corresponding position of the color filter substrate do not need to be covered by the PI film.
  • the polyimide film often has irregularities at the boundary of the A-A' region, and the film thickness is uneven, which eventually leads to uneven display of the screen and light leakage.
  • An object of the present invention is to provide a method for producing an oriented film, which is intended to make the thickness of the prepared alignment film uniform, and the quality of the display device formed after assembly is good, and mura is less likely to occur.
  • a method for preparing an oriented film comprising the steps of:
  • a printing area of the alignment liquid comprising a display area and a transition area on the array substrate and the color film substrate;
  • the alignment liquid film is subjected to an alignment operation to form the alignment film.
  • the step after the forming the alignment liquid film further comprises:
  • the method further comprises:
  • the stripping solution in the transfer zone is washed to remove impurities generated in the dissolving step.
  • the method further includes:
  • the gold ball is disposed on the annular transparent electrode layer.
  • the step of disposing the gold ball and the transition region on the annular transparent electrode layer comprises:
  • a plastic frame in which the gold balls are mixed is coated on the annular transparent electrode layer.
  • the embodiment of the present invention provides the following technical solutions:
  • a method for preparing an oriented film comprising the steps of:
  • the alignment liquid film is subjected to a curing and orientation operation to form the alignment film.
  • the orienting operation comprises: rubbing orientation, ultraviolet irradiation orientation, or lithographic orientation.
  • the orientation comprises a homogeneous parallel orientation, a homogeneous vertical orientation, an oblique orientation, and a mixed orientation.
  • the oriented film has a thickness of between 0.05 and 0.1 micron.
  • the present invention by uniformly expanding the printing region of the alignment liquid, the uneven phenomenon of the alignment film due to the edge diffusion effect is kept away from the display region, thereby improving The image quality of the finally formed liquid crystal display device.
  • Fig. 1 is an application environment diagram of an oriented film in the background art.
  • Figure 2 is an enlarged plan view of A-A' of Figure 1 in the background art.
  • Figure 3 is an enlarged cross-sectional view of A-A' of Figure 1 in the background art.
  • Fig. 4 is a view showing a method of preparing an oriented film in the first embodiment of the present invention.
  • 5A and 5B are schematic views respectively showing an original pattern and an expanded pattern of an alignment film in the first embodiment of the present invention.
  • Figure 6 is a cross-sectional view of an alignment film in a liquid crystal cell according to a second embodiment of the present invention.
  • Figure 7 is a cross-sectional view showing an alignment film in a liquid crystal cell according to a third embodiment of the present invention.
  • FIG. 8 is a schematic view of a transparent electrode layer in an array substrate according to Embodiment 3 of the present invention.
  • Figure 9 is a cross-sectional view of the alignment film in the liquid crystal cell of Example 3 of the present invention.
  • FIGS 10A and 10B are schematic views showing the original pattern and the expanded pattern of the alignment film in the fourth embodiment of the present invention.
  • a method for preparing an alignment film according to an embodiment of the present invention for providing an alignment film having uniform thickness and clear display boundary, and the preparation method includes the following steps:
  • step S401 a printing area of the alignment liquid is first determined, and the printing area includes a display area and a transfer area on the array substrate and the color filter substrate.
  • the display area is used for displaying a screen after forming a liquid crystal panel, as shown by 12a in FIG. 5A.
  • the transfer region surrounds the display region, and the array substrate and the color filter substrate are connected by a coating frame glue.
  • a transparent electrode layer is disposed on the array substrate and the color film substrate corresponding to the transfer region, and the conductive gold ball and the sealant are coated on the transfer region.
  • FIG. 5B A schematic view of the printing area, as shown by 12b in Fig. 5B, expands the edge of the original display area.
  • step S402 an alignment solution is sprayed in the printing area to form an alignment liquid film.
  • a common alignment solution is a polyimide (PI) solution and a polyimide film is formed in this step.
  • PI polyimide
  • step S403 the alignment liquid film is subjected to an alignment operation to form the alignment film, and its cross-sectional structure is as shown in FIG.
  • the orientation operation includes: rubbing orientation, ultraviolet irradiation orientation, or lithographic orientation, etc.
  • rubbing orientation is commonly used.
  • the orientation includes a homogeneous parallel orientation, a homogeneous vertical orientation, an oblique orientation, and a mixed orientation.
  • step S404 the golden ball is set to a predetermined position of the relay area.
  • step S405 the array substrate and the color filter substrate are pressed together so that the gold ball is pressed through the alignment film, and the transparent electrodes of the array substrate and the color filter substrate are turned on.
  • Layer (ITO) ITO
  • Fig. 6 it is a sectional view of the position of the alignment film before the group is pressed.
  • the array substrate and the color filter substrate 11 are provided with a transfer region 13 on which the alignment film 11 is applied, and a gold ball 14 is disposed on the transfer region 13 and fixed by the sealant 15 and seal. It can be understood that after the pressing, the gold ball 14 is pressed through the alignment film 12 to conduct the transparent electrode layer (not shown) of the substrate 11.
  • steps S401-S404 are preparation of the alignment film itself
  • steps S405-S406 are preparations for completing the final form of the alignment film in the liquid crystal cell.
  • the method for preparing an oriented film provided by the embodiment of the present invention is for providing an oriented film having a uniform thickness and a clear boundary.
  • the preparation method is based on the first embodiment, and the step S403 to the step S404 are added. Steps to clean up the transit area. Specifically include:
  • a stripping liquid is applied to the transfer zone for dissolving the alignment liquid film covered on the transfer zone.
  • the array substrate and the color filter substrate 11 are provided with a transfer region 13 , and the alignment film 12 ′ is coated on the substrate 11 , and the gold ball 14 is disposed on the transfer region 13 and is processed by the sealant 15 . Fixed and sealed. It can be understood that since there is no alignment film 12 and other impurities on the transition region 13, the conduction effect is stronger.
  • step S406 the array substrate and the color filter substrate are laminated, and the gold ball is electrically connected to the array substrate and the transparent electrode layer of the color filter substrate.
  • step of "pressing the gold ball through the alignment film” is omitted in the second embodiment as compared with the first embodiment.
  • the invention provides a method for preparing an oriented film, which is used for providing an oriented film having uniform thickness and clear display boundary.
  • the preparation method is based on the first embodiment, and the following steps are added:
  • annular transparent electrode layer is formed on the array substrate of the transfer region for improving the conduction effect of the gold ball between the upper and lower substrates.
  • the arrangement of the annular transparent electrode layer is as shown by 11a in FIG.
  • the gold ball is mixed into the sealant and coated on the annular transparent electrode layer.
  • the gold balls are uniformly distributed in the closed frame glue, and the gold balls are evenly distributed throughout the frame glue, so that the probability of the gold balls pressing through the alignment film is greatly improved, so that the transparent electrode layers of the upper and lower substrates are turned on. The effect is better, and its sectional view is shown in Fig. 9.
  • the invention provides a method for preparing an oriented film, which is used for providing an oriented film having uniform thickness and clear display boundary, and the preparation method comprises the following steps:
  • the orientation operation includes: rubbing orientation, ultraviolet irradiation orientation, or lithographic orientation, etc.
  • rubbing orientation is commonly used.
  • the orientation includes a homogeneous parallel orientation, a homogeneous vertical orientation, an oblique orientation, and a mixed orientation.
  • the prepared alignment film has a thickness of 0.05 to 0.1 ⁇ m and has a uniform thickness and a clear boundary.
  • the display device formed by the assembly has the advantages of high picture quality and low light leakage.
  • the invention provides an oriented film, which improves the uniformity of the alignment film.
  • the cleaning and design of the gold ball facilitates the conduction of the gold ball to the transparent electrode layer in the upper and lower substrates. And shorten the time of the process.

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  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
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  • Mathematical Physics (AREA)
  • Optics & Photonics (AREA)
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Abstract

一种取向膜的制备方法，包括如下步骤：确定取向液的喷印区域，包括显示区域与中转区域；在喷印区域内喷印取向液，形成取向液薄膜；对取向液薄膜进行取向作业形成取向膜。通过外扩张取向液的喷印区域，使取向膜因边缘扩散效应导致的不均匀的现象远离显示区域，提高最终形成的液晶显示装置的成像品质。

Description

取向膜的制备方法 技术领域
本发明涉及液晶显示领域，尤其涉及一种取向膜的制备方法。
 背景技术
通常，液晶显示面板由彩膜基板（Color Filter，CF）、薄膜晶体管阵列基板（Thin Film Transistor, TFT）、二者之间的液晶（Liquid Crystal，LC）分子、以及密封胶框（Sealant）组成。其工作原理是通过TFT基板的通电控制液晶分子改变方向，将背光模组的光线折射出来形成画面。
在彩膜基板与阵列基板的制备过程中，需要涂布上取向液，如常用的聚酰亚胺，再通过摩擦或光蚀刻后形成预倾角，从而给液晶分子提供一个承载的角度。
通常，在聚酰亚胺取向液的涂布过程中，首先将聚酰亚胺取向液经过喷墨的方式分别涂在阵列基板与彩膜基板上；然后经过预固化使聚酰亚胺溶液的溶剂挥发均匀成膜，避免溶剂残留影响膜的均匀性；再经过主固化使聚酰胺酸（polyamic acid，PAA）环化成聚酰亚胺薄膜（polyimide film，PI），确保膜厚均匀性避免形成光斑（mura）。
如图1所示，在阵列基板01或彩膜基板上涂布取向液，如聚酰亚胺溶液，并按照预定图案成膜02。然而，阵列基板01上位于中转区域（Au transfer pad）03的位置以及彩膜基板的对应位置不需要PI膜覆盖。如图2及图3所示，聚酰亚胺膜在A-A’区的边界常出现不规则，且膜厚不均的现象，最终导致画面显示不均，出现漏光等现象。
因此，如何设计一种取向膜的制备方法，使制备的取向膜的厚度均匀，成为液晶显示设备的一大研发方向。
 技术问题
本发明的目的在于提供一种取向膜的制备方法，旨在可以使制备的取向膜的厚度均匀，组装后形成的显示设备品质好，不易出现光斑（mura）。
 技术解决方案
一种取向膜的制备方法，包括如下步骤：
确定取向液的喷印区域，所述喷印区域包括在阵列基板与彩膜基板上的显示区域与中转区域；
在所述喷印区域内喷印取向液，以形成取向液薄膜；以及
对所述取向液薄膜进行取向作业，形成所述取向膜。
优选地，在所述形成取向液薄膜后的步骤还包括：
在所述中转区域上涂布剥离液，所述剥离液用于溶解所述中转区域上的所述取向液薄膜；
将金球设置到所述中转区域的预定位置；以及
将所述阵列基板与所述彩膜基板进行对组压合，使得所述金球导通所述阵列基板与所述彩膜基板的透明电极层。
优选地，在所述在中转区域上涂布剥离液的步骤后还包括：
对所述中转区域的剥离液进行清洗，以去除在所述溶解步骤中所产生的杂质。
优选地，在所述金球压穿所述取向膜的步骤中，还包括：
在制备所述阵列基板时，在所述中转区域的所述阵列基板上形成环状的透明电极层；
所述金球设置于所述环状的透明电极层上。
优选地，所述金球设置与所述环状的透明电极层上中转区域的步骤，包括：
将所述金球均匀混合到框胶中；
将混合所述金球的胶框涂布于所述环状的透明电极层上。
为解决上述技术问题，本发明实施例提供以下技术方案：
一种取向膜的制备方法，包括如下步骤：
确定取向液的喷印区域，所述喷印区域为阵列基板与彩膜基板相贴合的一侧的区域；
在所述喷印区域内喷印取向液；
进行预固化后形成取向液薄膜；
将所述喷印区域中显示区域之外的区域喷印剥离液进行剥离；
通过清洗制程去除所述剥离所产生的杂质，以形成显示区域的取向液薄膜；以及
对所述取向液薄膜进行固化与取向作业，以形成所述取向膜。
优选地，所述取向作业包括：摩擦取向、紫外辐照法取向、或平版印刷法取向。
优选地，所述取向包括均质平行取向、均质垂直取向、倾斜取向、以及混合取向。
优选地，所述取向膜的厚度在0.05~0.1微米之间。
 有益效果
相对于现有技术，本发明的取向膜的制备方法，在本发明中，通过外扩聚取向液的喷印区域，使取向膜因边缘扩散效应导致的不均匀的现象远离显示区域，提高其所最终形成的液晶显示装置的成像品质。
 附图说明
图1是背景技术中的取向膜的应用环境图。
图2是背景技术中图1中A-A’的放大后的平面图。
图3是背景技术中图1中A-A’的放大后的剖面图。
图4是本发明实施例一中取向膜的制备方法。
图5A与图5B分别是本发明实施例一中取向膜的原图案与外扩图案的示意图。
图6是本发明实施例二中取向膜的在液晶盒中的剖面图。
图7是本发明实施例三中取向膜的在液晶盒中的剖面图。
图8是本发明实施例三中透明电极层在阵列基板中的示意图。
图9是本发明中实施例三中取向膜的在液晶盒中的剖面图。
图10A与图10B是本发明实施例四中取向膜的原图案与外扩图案的示意图。
 本发明的最佳实施方式
请参照附图中的图式，其中相同的组件符号代表相同的组件。以下的说明是基于所例示的本发明具体实施例，其不应被视为限制本发明未在此详述的其它具体实施例。
实施例一
请参阅图4，所示为本发明实施例提供的一种取向膜的制备方法，用于提供具有厚度均匀、显示边界清晰的取向膜，所述制备方法包括如下步骤：
在步骤S401中，首先确定取向液的喷印区域，所述喷印区域包括阵列基板与彩膜基板上的显示区域与中转区域。
可以理解的是：在上述阵列基板与彩膜基板上，所述显示区域用于在形成液晶面板后进行画面显示，如图5A中的12a所示。
可以理解的是，所述中转区域，围绕在显示区域的周围，通过涂布框胶连接所述阵列基板以及所述彩膜基板。通常，中转区域对应的阵列基板与彩膜基板上将设置透明电极层，中转区域的上将涂布导电的金球和框胶。
所述喷印区域的示意图，如图5B中的12b所示，将原显示区域的边缘进行了外扩。
在步骤S402中，在所述喷印区域内喷印取向溶液，形成取向液薄膜。
在一实施例中，常见的取向溶液为聚酰亚胺（polyimide，PI）溶液，并在此步骤中形成聚酰亚胺薄膜。
在步骤S403中，对所述取向液薄膜进行取向作业，形成所述取向膜，其剖面结构如图6所示。
可以理解的是：所述取向作业包括：摩擦取向、紫外辐照法取向、或平版印刷法取向等，目前常用的是摩擦取向。所述取向包括均质平行取向、均质垂直取向、倾斜取向、以及混合取向。
在步骤S404中，将金球设置到所述中转区域的预定位置。
在步骤S405中，将所述阵列基板与所述彩膜基板进行对组压合，使得所述金球压穿所述取向膜，并导通所述阵列基板与所述彩膜基板的透明电极层（ITO）。
如图6所示，为对组之后压合之前取向膜的所在位置剖面图。其中阵列基板与所述彩膜基板11上设置有中转区域13，取向膜11涂布于上述基板11以及中转区域13上，在中转区域13上设置金球14，并通过框胶15进行固定和密封。可以理解的是，在压合之后，金球14会压穿取向膜12而导通上述基板11的透明电极层（未标示）。
其中，步骤S401-S404是取向膜自身的制备，步骤S405-S406是完成所述取向膜的在液晶盒的中最终形态的制备。
实施例二
本发明实施例提供的一种取向膜的制备方法，用于提供具有厚度均匀、边界清晰的取向膜，所述制备方法是在实施例一的基础上，在步骤S403至步骤S404之间增加了清理中转区域的步骤。具体包括：
(1)在中转区域上涂布剥离液，用于溶解中转区域上面覆盖的取向液薄膜。
(2)对所述中转区域的剥离液进行清洗，以去除在所述溶解步骤中所产生的杂质。这样既提升了显示区的取向膜厚度均匀性，同时使金球导通上下基板透明电极层的效果更佳，其剖面结构如图7所示。
请参阅图7，其中阵列基板与所述彩膜基板11上设置有中转区域13，取向膜12’涂布于上述基板11上，在中转区域13上设置金球14，并通过框胶15进行固定和密封。可以理解的是，由于中转区域13上没有取向膜12及其他杂质，导通效果更强。
此外，在步骤S406中，将所述阵列基板与所述彩膜基板进行对组压合，使金球导通所述阵列基板与所述彩膜基板的透明电极层。
可以理解的是，与实施例一相比，实施例二中省去了“使得所述金球压穿所述取向膜”的步骤。
实施例三
本发明实施例提供的一种取向膜的制备方法，用于提供具有厚度均匀、显示边界清晰的取向膜，所述制备方法是在实施例一的基础上，还增加了如下步骤：
(1)在制备所述阵列基板时，在所述中转区域的所述阵列基板上形成环状的透明电极层，用于提升金球在上下基板之间的导通效果。其中，所述环形透明电极层的设置如图8中的11a所示。
(2)将金球混合到框胶中并涂布于所述环状的透明电极层上。在本步骤中，使金球均匀分布在闭合的框胶中，这时金球均匀分布在整个框胶中，使得金球压穿取向膜的概率大大提高，使得导通上下基板的透明电极层的效果更好，其剖面图如图9所示。
在图9中，其中阵列基板与所述彩膜基板11上设置有透明电极层（ITO）16，取向膜12’涂布于上述基板11上，将金球14均匀分布在框胶15’中进行涂布，以缩短制程。可以理解的是：上述两个步骤是既可以单独实施，也可以组合实施，是从不同角度提高金球对于上下基板的导通效果。有别于传统方式中对于金球、中转区域及其上可能覆盖的杂质的忽略，更注重细节，不会出现漏光等现象。
实施例四
本发明实施例提供的一种取向膜的制备方法，用于提供具有厚度均匀、显示边界清晰的取向膜，所述制备方法包括如下步骤：
(1)确定取向液的喷印区域，所述喷印区域为阵列基板与彩膜基板相贴合的一侧的区域。
(2)在所述喷印区域内喷印取向液，形成的取向液薄膜，如图10A所示。即，将外扩至整个基板。
(3)进行预固化后形取向液薄膜。
(4)将所述喷印区域中显示区域之外的区域喷印剥离液进行剥离。
(5)通过清洗制程去除所述剥离所产生的杂质，以形成显示区域的取向液薄膜，如图10B所示。
(6)对所述取向液薄膜进行固化和取向作业，以形成所述取向膜。
可以理解的是：所述取向作业包括：摩擦取向、紫外辐照法取向、或平版印刷法取向等，目前常用的是摩擦取向。所述取向包括均质平行取向、均质垂直取向、倾斜取向、以及混合取向。
在本实施方式中，所制备的取向膜的厚度在0.05~0.1微米之间，具有厚度均匀、边界清晰的特点，由其组装而形成的显示装置具有画面品质高、不易漏光的优点。
本发明提供了一种取向膜，提升了取向膜的均匀性，此外，实施例二与实施例三通过对金球的清理和设计，有利于金球对于上下基板中透明电极层的导通，以及缩短制程的时间。
综上所述，虽然本发明已以优选实施例揭露如上，但上述优选实施例并非用以限制本发明，本领域的普通测试人员，在不脱离本发明的精神和范围内，均可作各种更动与润饰，因此本发明的保护范围以权利要求界定的范围为准。

Claims (10)

  1. 一种取向膜的制备方法，其特征在于，包括如下步骤：
    确定取向液的喷印区域，所述喷印区域包括在阵列基板与彩膜基板上的显示区域与中转区域；
    在所述喷印区域内喷印取向液，以形成取向液薄膜；以及
    对所述取向液薄膜进行取向作业，形成所述取向膜。
  2. 如权利要求1所述的取向膜的制备方法，其特征在于，还包括如下步骤：
    将金球设置到所述中转区域的预定位置；以及
    将所述阵列基板与所述彩膜基板进行对组压合，使得所述金球压穿所述取向膜，并导通所述阵列基板与所述彩膜基板的透明电极层。
  3. 如权利要求1所述的取向膜的制备方法，其特征在于，在所述形成取向液薄膜后的步骤还包括：
    在所述中转区域上涂布剥离液，所述剥离液用于溶解所述中转区域上的所述取向液薄膜；
    在形成取向膜之后还包括如下步骤：
    将金球设置到所述中转区域的预定位置；以及
    将所述阵列基板与所述彩膜基板进行对组压合，使得所述金球导通所述阵列基板与所述彩膜基板的透明电极层。
  4. 如权利要求3所述的取向膜的制备方法，其特征在于，在所述在中转区域上涂布剥离液的步骤后还包括：
    对所述中转区域的剥离液进行清洗，以去除在所述溶解步骤中所产生的杂质。
  5. 如权利要求2所述的取向膜的制备方法，其特征在于，还包括如下步骤：
    在制备所述阵列基板时，在所述中转区域的所述阵列基板上形成环状的透明电极层；
    所述预定位置为将所述金球设置于所述环状的透明电极层上。
  6. 如权利要求5所述的取向膜的制备方法，其特征在于，所述金球设置于所述环状的透明电极层上的步骤，包括：
    将所述金球均匀混合到框胶中；
    将混合所述金球的胶框涂布于所述环状的透明电极层上。
  7. 一种取向膜的制备方法，其特征在于，包括如下步骤：
    确定取向液的喷印区域，所述喷印区域为阵列基板与彩膜基板相贴合的一侧的区域；
    在所述喷印区域内喷印取向液；
    进行预固化后形成取向液薄膜；
    将所述喷印区域中显示区域之外的区域喷印剥离液进行剥离；
    通过清洗制程去除所述剥离所产生的杂质，以形成显示区域的取向液薄膜；以及
    对所述取向液薄膜进行固化与取向作业，以形成所述取向膜。
  8. 如权利要求7所述的取向膜的制备方法，其特征在于，所述取向作业包括：摩擦取向、紫外辐照法取向、或平版印刷法取向。
  9. 如权利要求7所述的取向膜的制备方法，其特征在于，所述取向包括均质平行取向、均质垂直取向、倾斜取向、以及混合取向。
  10. 如权利要求9所述的取向膜的制备方法，其特征在于，所述取向膜的厚度在0.05~0.1微米之间。
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