WO2015188416A1 - 掩模版的清洗方法及装置 - Google Patents

掩模版的清洗方法及装置 Download PDF

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Publication number
WO2015188416A1
WO2015188416A1 PCT/CN2014/081443 CN2014081443W WO2015188416A1 WO 2015188416 A1 WO2015188416 A1 WO 2015188416A1 CN 2014081443 W CN2014081443 W CN 2014081443W WO 2015188416 A1 WO2015188416 A1 WO 2015188416A1
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WIPO (PCT)
Prior art keywords
reticle
tank
cleaning
microwave
liquid
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Ceased
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PCT/CN2014/081443
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English (en)
French (fr)
Inventor
匡友元
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TCL China Star Optoelectronics Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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Priority to US14/378,612 priority Critical patent/US9724735B2/en
Publication of WO2015188416A1 publication Critical patent/WO2015188416A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B08B3/022—Cleaning travelling work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0064—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes
    • B08B7/0071—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes by heating
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

Definitions

  • the present invention relates to the field of fabrication of organic electroluminescent display devices, and more particularly to a method and apparatus for cleaning a reticle. Background technique
  • the flat display device has many advantages such as thin body, power saving, no radiation, and has been widely used.
  • the existing flat display devices mainly include a liquid crystal display device (LCD) and an organic electroluminescence display device (OLED). Since the organic electroluminescent device has self-luminescence, no backlight, contrast is required. High performance, thin thickness, wide viewing angle, fast response, flexible panel, wide temperature range, simple structure and simple process are considered to be the next generation of flat panel display emerging applications.
  • organic electroluminescent devices are classified into small molecule organic electroluminescent devices (OLEDs) and polymer electroluminescent devices (PLEDs). Due to the difference in molecular weight, the processes of organic electroluminescent devices are also A big difference is that OLEDs are mainly prepared by thermal evaporation, and PLEDs are prepared by spin coating or inkjet printing.
  • OLEDs usually include: a substrate, an ITO transparent anode placed on the substrate, and a transparent ITO a hole injection layer (HIL) on the anode, a hole transport layer (HTL) disposed on the hole injection layer, a light-emitting layer (EML) disposed on the hole transport layer, and an electron transport layer disposed on the light-emitting layer (ETL), an electron injection layer (EIL) placed on the electron transport layer, and a cathode placed on the electron injection layer.
  • HIL hole injection layer
  • HTL hole transport layer
  • EML light-emitting layer
  • ETL electron transport layer
  • EIL electron injection layer
  • cathode placed on the electron injection layer
  • the luminescent layer usually employs a host/guest doping system.
  • the reticle is generally made of a metal reticle. After a period of evaporation, the metal reticle needs to be cleaned to ensure that the reticle does not have accuracy due to material adhesion. Changes, the traditional reticle cleaning is wet immersion cleaning, there are shortcomings such as long cleaning time, high purity of the liquid, and residual materials.
  • FIG. 1 is a schematic structural view of a conventional reticle cleaning apparatus, including a chemical liquid wet cleaning tank 500, a chemical liquid wet cleaning tank 600, and a drying tank 700.
  • 200 is an OLED metal mask to be cleaned.
  • the method firstly deposits the OLED metal reticle 200 to be cleaned in a chemical liquid wet cleaning tank 500 containing a chemical solution to clean the organic material on the surface of the OLED metal reticle, and then mounts the cleaned OLED metal mask plate.
  • the wet chemical washing tank 600 with detergent the liquid medicine taken out in the previous step is rinsed, and finally the rinsed OLED metal mask is placed in the drying tank 700 for drying.
  • the method has the advantages of long cleaning time, high purity of chemical liquid, and material residue.
  • the object of the present invention is to provide a cleaning method for a reticle, which overcomes the problems of long immersion cleaning time and low efficiency of the conventional chemical liquid, greatly shortens the cleaning cycle, improves the cleaning productivity, and reduces the probability of material residue.
  • Another object of the present invention is to provide a reticle cleaning apparatus which is simple in structure, convenient in operation, practical in function, and effectively improves the cleaning efficiency of the reticle.
  • the present invention provides a method for cleaning a reticle, comprising the following steps: Step 1: providing a reticle to be cleaned, the reticle is made of metal, and an organic material film layer is attached thereon;
  • Step 2 Microwave heating the reticle to be cleaned to break the organic material film layer attached to the reticle;
  • Step 3 Stop the microwave heating, spray the liquid on the microwave-heated reticle, and rinse the broken organic material film layer out of the reticle;
  • Step 4 using a chemical solution to clean the remaining organic material film layer on the reticle
  • Step 5 Rinse the cleaned reticle to wash off the liquid remaining on the reticle; Step 6. Dry the reticle using microwave.
  • the reticle is used in an evaporation process of an OLED.
  • the steps 2 and 3 are performed in a microwave dry cleaning tank, and the microwave dry cleaning is performed.
  • the trough includes a trough body, a microwave generating device disposed at the bottom of the trough body, and a chemical liquid sprinkler head disposed at the top of the trough body, and the reticle is microwave-heated by the microwave generating device, and the reticle is sprayed by the chemical liquid sprinkler head Liquid medicine.
  • the reticle to be cleaned is placed obliquely in the microwave dry cleaning tank, the organic material film layer faces upward, and the liquid chemical spray head is sprayed with the sputum liquid head.
  • the step 4 is performed in a chemical wet cleaning tank, the chemical wet cleaning tank is filled with a chemical solution, and the reticle is immersed in the chemical solution.
  • the step 5 is rinsing in a wet chemical tank containing a washing liquid, and the reticle is immersed in the washing liquid.
  • the step is performed in the microwave dry cleaning tank.
  • the invention also provides a reticle cleaning device, comprising a microwave dry cleaning tank, a chemical liquid wet cleaning tank and a chemical liquid wet washing tank, wherein the microwave dry cleaning tank comprises a tank body and is arranged at the bottom of the tank body.
  • the microwave generating device and the ⁇ located at the top of the tank body.
  • the microwave dry cleaning tank, the chemical liquid wet cleaning tank and the chemical liquid wet cleaning tank are sequentially placed adjacent to the chemical liquid wet cleaning tank, and the chemical liquid is filled with a washing liquid in the wet washing tank.
  • the reticle is made of metal for the evaporation process of the OLED.
  • the invention also provides a reticle cleaning device, comprising a microwave dry cleaning tank, a chemical liquid wet cleaning tank and a chemical liquid wet washing tank, wherein the microwave dry cleaning tank comprises a tank body and is arranged at the bottom of the tank body. a microwave generating device, and a kiln liquid spray head disposed at the top of the tank body;
  • the microwave dry cleaning tank, the chemical liquid wet cleaning tank and the chemical liquid wet cleaning tank are sequentially placed adjacent to the chemical liquid wet cleaning tank, and the chemical liquid is filled with a washing liquid in the wet washing tank.
  • the reticle is made of metal for the evaporation process of the OLED.
  • the cleaning method and device for a reticle provided by the present invention by introducing a microwave dry cleaning method and device, perform pre-wave treatment on the reticle before entering the wet cleaning tank of the chemical liquid, so as to enter the medicine
  • the organic material attached to the reticle before the wet cleaning tank is greatly reduced, thereby improving the cleaning effect and cleaning efficiency of the reticle, greatly shortening the cleaning cycle, improving the cleaning productivity, and contributing to the overall improvement of the production capacity of the OLED display.
  • FIG. 1 is a schematic structural view of a cleaning device of a conventional reticle
  • FIG. 2 is a schematic structural view of a cleaning device for a reticle of the present invention
  • FIG. 3 is a flow chart of a cleaning method of a mask plate of the present invention.
  • step 2 is a schematic view showing the operation of step 2 of the cleaning method of the mask plate of the present invention.
  • FIG. 5 is a schematic view showing changes in the mask plate before and after microwave treatment in the step 2 ;
  • FIG. 6 is a schematic view showing the operation of the step 3 in the cleaning method of the mask plate of the present invention.
  • Figure 7 is a schematic view showing the operation of the step 4 of the cleaning method of the mask plate of the present invention.
  • Figure 8 is a schematic view showing the operation of the step 5 of the cleaning method of the mask plate of the present invention.
  • Figure 9 is a schematic view showing the operation of the step 6 of the cleaning method of the reticle of the present invention. detailed description
  • the present invention provides a reticle cleaning apparatus 10 for cleaning a reticle 20 to be cleaned, including a microwave dry cleaning tank 40, a chemical wet cleaning tank 50, and a liquid medicine.
  • a wet washing tank 60 the microwave dry cleaning tank 40 includes a tank body 41, and is disposed at the bottom of the tank body
  • the microwave generating device 45 and the low-speed chemical liquid shower head 43 0 provided at the top of the tank body are sequentially placed adjacent to each other in the microwave dry cleaning tank 40, the chemical liquid wet cleaning tank 50, and the chemical liquid wet washing tank 60.
  • the low speed liquid chemical shower head 43 sprays the liquid medicine 432 to the reticle 20 when it is in operation.
  • the chemical solution wet cleaning tank 50 is filled with a chemical liquid 432, and the chemical liquid wet cleaning tank 60 is provided with a washing liquid 62.
  • the reticle 20 is made of metal and used for an evaporation process of the OLED.
  • the invention also provides a cleaning method for a reticle, comprising the following steps:
  • Step 1 A reticle 20 to be cleaned is provided, the reticle 20 being made of metal to which an organic material film layer 21 is attached.
  • the reticle 20 is used for an evaporation process of an OLED.
  • Step 2 Microwave heating the reticle 20 to be cleaned to break the organic material film layer 21 attached to the reticle 20.
  • the step 2 is performed in a microwave dry cleaning tank 40.
  • the microwave dry cleaning tank 40 includes a tank body 41, a microwave generating device 45 disposed at the bottom of the tank body, and a top portion of the tank body.
  • the chemical liquid shower head 43 is subjected to microwave heating of the reticle 20 by the microwave generating device 45, and the reticle 20 to be cleaned is placed obliquely in the microwave dry cleaning tank 40, and the organic material film layer 21 faces upward.
  • the organic material film layer 21 on the reticle 20 is subjected to polarization deflection of the microwave, and is broken by the inside and the outside to become small pieces.
  • Step 3 Stop the microwave heating, spray the liquid 432 on the microwave-heated reticle 20, and rinse the broken organic material film layer 21 away from the reticle 20.
  • the step 3 is performed in the microwave dry cleaning tank 40.
  • the reticle 20 to be cleaned is placed obliquely in the microwave dry cleaning tank 40, and the organic material film layer 21 faces upward and passes the medicine.
  • the liquid shower head 43 sprays the chemical solution 432 to the reticle 20, and the chemical liquid shower head 43 is a low-speed chemical liquid shower head.
  • Step 4 The remaining organic film layer 21 on the reticle 20 is cleaned using the chemical solution 432. As shown in Fig. 7, the step 4 is cleaned in a chemical wet cleaning tank 50 containing a chemical liquid 432, and the reticle 20 is immersed in the chemical liquid 432.
  • the remaining organic material film layer 21 is immersed and washed by the chemical liquid 432 by immersion of the chemical liquid 432.
  • Step 5 The cleaned reticle 20 is rinsed to wash away the chemical solution remaining on the reticle 20. As shown in FIG. 8, the step 5 is rinsed in a chemical wet buffer tank 60 containing a washing liquid 62, and the reticle 20 is immersed in the washing liquid 62.
  • Step 6 Drying the reticle 20 using microwaves.
  • the step 6 is performed in the microwave dry cleaning tank 40, and the reticle 20 is microwave-heated by the microwave generating device 45, and the reticle 20 is obliquely placed in the microwave dry cleaning tank 40.
  • the cleaning method and device for a reticle provided by the present invention, by introducing a microwave dry cleaning method and device, perform pre-wave treatment on the reticle before entering the wet cleaning tank of the chemical solution, so as to enter the liquid medicine.
  • the organic material attached to the reticle before the wet cleaning tank is greatly reduced, thereby improving the cleaning effect and cleaning efficiency of the reticle, greatly shortening the cleaning cycle, improving the cleaning productivity, and contributing to the overall improvement of the production capacity of the OLED display.

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  • Electroluminescent Light Sources (AREA)

Abstract

一种掩模板的清洗装置及清洗方法，该清洗装置包括微波干式清洗槽（40）、药液湿式清洗槽（50）和药液湿式洗涤槽（60）。该清洗方法包括提供待清洗掩模板；对掩模板进行微波加热，使附着在掩模板的有机材料膜层破碎；停止微波加热，对掩模板进行喷淋药液，将破碎的有机材料膜层冲洗脱离掩模板；对掩模板进行清洗；对清洗过的掩模板进行漂洗；使用微波对掩模板进行干燥处理。该清洗装置及清洗方法缩短了掩模板的清洗周期，提高了清洗产能，并降低了材料残留的几率。

Description

掩模版的清洗方法及装置 技术领域
本发明涉及有机电致发光显示器件制作领域，尤其涉及一种掩模版的 清洗方法和装置。 背景技术
平面显示器件具有机身薄、 省电、 无辐射等众多优点，得到了广泛的 应用。现有的平面显示器件主要包括液晶显示器件 ( Liquid Crystal Display , LCD )及有机电致发光显示器件 ( Organic Light Emitting Display , OLED \ 有机电致发光器件由于同时具备自发光，不需背光源、 对比度高、 厚 度薄、 视角广、 反应速度快、 可用于挠曲性面板、 使用温度范围广、 构造 及制程较简单等优异之特性，被认为是下一代的平面显示器新兴应用技术。 从使用的有机电致发光材料的分子量来看，有机电致发光器件分为小分子 有机电致发光器件（ OLED )和高分子电致发光器件 (PLED) ,由于分子量的 不同，有机电致发光器件的制程也有很大的区别， OLED主要通过热蒸镀 方式制备， PLED通过旋涂或者喷墨打印方式制备。
OLED通常包括：基板、 置于基板上的 ITO透明阳极、 置于 ITO透明 阳极上的空穴注入层 (HIL)、 置于空穴注入层上的空穴传输层 (HTL)、 置于 空穴传输层上的发光层 (EML)、 置于发光层上的电子传输层 (ETL)、 置于电 子传输层上的电子注入层 (EIL)以及置于电子注入层上的阴极。为了提高效 率，发光层通常采用主 /客体掺杂系统。
目前 OLED制作的主要方式是加热蒸发镀膜,掩模版一般都是选用金属 制作的掩模版,经过一段时间的蒸镀之后需要对金属掩模版进行清洗,以保 证掩模版不会因材料附着而发生精度变化，传统的掩模版清洗采用湿式药液 浸泡清洗，存在清洗时间长,药液纯度要求高,有材料残留的等缺点。
图 1 为现有的掩模版的清洗装置的结构示意图，包括药液湿式清洗槽 500、 药液湿式洗涤槽 600及干燥槽 700。 200为待清洗的 OLED金属掩模 版。 该方法首先将待清洗的 OLED金属掩模版 200置于装有药液的药液湿 式清洗槽 500中对 OLED金属掩模版表面的有机材料进行清洗，然后将清 洗后的 OLED金属掩模版置于装有洗涤剂的药液湿式洗涤槽 600中，对前 —道工序中带出的药液进行漂洗，最后把漂洗后的 OLED金属掩模版置于 干燥槽 700中进行干燥处理。 该方法具有清洗时间长，药液纯度要求高， 有材料残留等缺点。 发明内容 本发明的目的在于提供一种掩模版的清洗方法，克服了传统药液浸泡 清洗时间长、 效率低的问题，大大缩短了清洗周期，提高了清洗产能，并 降低材料残留的几率。
本发明的另一目的在于提供一种掩模版的清洗装置，结构简单，操作 方便，功能实用，有效提高了掩模版的清洗效率。
为实现上述目的，本发明供一种掩模版的清洗方法，包括以下步骤： 步骤 1、 提供待清洗掩模版，该掩模版由金属制成，其上附有有机材 料膜层；
步骤 2、对该待清洗的掩模版进行微波加热，使附着在掩模版的有机材 料膜层破碎；
步骤 3、 停止微波加热，对微波加热过的掩模版喷淋药液，将破碎的有 机材料膜层冲洗脱离掩模版；
步骤 4、 使用药液对掩模版上剩余的有机材料膜层进行清洗；
步骤 5、 对清洗过的掩模版进行漂洗，以洗掉残留在掩模版上的药液； 步骤 6、 使用微波对掩模版进行干燥处理。
所述掩模版用于 OLED的蒸镀制程。
所述步骤 2与步骤 3在一微波干式清洗槽里进行，所述微波干式清洗 槽包括槽体、 设于槽体底部的微波发生装置、 及设于槽体顶部的药液喷淋 头，通过微波发生装置对掩模版进行微波加热，通过药液喷淋头对掩模版 喷淋药液。
在所述步骤 2与 3中，所述待清洗掩模版倾斜放置于微波干式清洗槽 内，所述有机材料膜层朝上，且所述药液喷淋头为 ί氐速药液喷淋头。
所述步骤 4在一药液湿式清洗槽中进行清洗，所述药液湿式清洗槽装 有药液，所述掩模版浸没于药液中。
所述步骤 5在一药液湿式洗涤槽中进行漂洗，所述药液湿式洗涤槽装 有洗涤液，所述掩模版浸没于洗涤液中。
所述步骤 ό在所述微波干式清洗槽里进行。
本发明还提供一种掩模版的清洗装置，包括一微波干式清洗槽、 一药 液湿式清洗槽及一药液湿式洗涤槽，所述微波干式清洗槽包括槽体、 设于 槽体底部的微波发生装置、 及设于槽体顶部的 ί氏速药液喷淋头。
所述微波干式清洗槽、 药液湿式清洗槽及药液湿式洗洚槽依次相邻放 所述药液湿式清洗槽中装有药液，所述药液湿式洗涤槽中装有洗涤液， 所述掩模版由金属制成，用于 OLED的蒸镀制程。 本发明还提供一种掩模版的清洗装置，包括一微波干式清洗槽、 一药 液湿式清洗槽及一药液湿式洗涤槽，所述微波干式清洗槽包括槽体、 设于 槽体底部的微波发生装置、 及设于槽体顶部的 ί氏速药液喷淋头；
所述微波干式清洗槽、 药液湿式清洗槽及药液湿式洗洚槽依次相邻放 所述药液湿式清洗槽中装有药液，所述药液湿式洗涤槽中装有洗涤液， 所述掩模版由金属制成，用于 OLED的蒸镀制程。
本发明的有益效果：本发明提供的一种掩模版的清洗方法及装置，通 过引入微波干式清洗方法和装置，对进入药液湿式清洗槽之前的掩模版做 前期的微波处理，使进入药液湿式清洗槽之前掩模版上附着的有机材料大 大减少，从而提高掩模版的清洗效果及清洗效率，大大缩短了清洗周期， 提高了清洗产能，并有利于整体提升 OLED显示器的产能。
为了能更进一步了解本发明的特征以及技术内容，请参阅以下有关本 发明的详细说明与附图，然而附图仅提供参考与说明用，并非用来对本发 明加以限制。 附图说明
下面结合附图，通过对本发明的具体实施方式详细描述，将使本发明 的技术方案及其它有益效果显而易见。
附图中，
图 1为现有掩模版的清洗装置的结构示意图；
图 2为本发明掩模版的清洗装置的结构示意图；
图 3为本发明掩模版的清洗方法的流程图；
图 4为本发明掩模版的清洗方法步骤 2的操作示意图；
图 5为所述步骤 2中掩模版经微波处理前后的变化示意图； 图 6为本发明掩模版的清洗方法步骤 3的操作示意图；
图 7为本发明掩模版的清洗方法步骤 4的操作示意图；
图 8为本发明掩模版的清洗方法步骤 5的操作示意图；
图 9为本发明掩模版的清洗方法步骤 6的操作示意图。 具体实施方式
为更进一步阐述本发明所采取的技术手段及其效果，以下结合本发明 的优选实施例及其附图进行详细描述。
请参阅图 2-9 ,本发明提供一种掩模版的清洗装置 10 ,用于清洗一待清 洗的掩模版 20 ,包括一微波干式清洗槽 40、 一药液湿式清洗槽 50及一药 液湿式洗涤槽 60 ,所述微波干式清洗槽 40包括槽体 41、 设于槽体底部的 微波发生装置 45、 及设于槽体顶部的低速药液喷淋头 430 所述微波干式清洗槽 40、 药液湿式清洗槽 50及药液湿式洗涤槽 60依 次相邻放置。
所述低速药液喷淋头 43工作时对掩模版 20喷淋药液 432。
所述药液湿式清洗槽 50中装有药液 432 ,所述药液湿式洗涤槽 60中装 有洗涤液 62 ,所述掩模版 20由金属制成，用于 OLED的蒸镀制程。
本发明还提供一种掩模版的清洗方法，包括以下步骤：
步骤 1、提供待清洗的掩模版 20 ,该掩模版 20由金属制成，其上附有 有机材料膜层 21。
所述掩模版 20用于 OLED的蒸镀制程。
步骤 2、对该待清洗的掩模版 20进行微波加热，使附着在掩模版 20的 有机材料膜层 21破碎。
如图 4所示，所述步骤 2在微波干式清洗槽 40里进行，所述微波干式 清洗槽 40包括槽体 41、 设于槽体底部的微波发生装置 45、 及设于槽体顶 部的药液喷淋头 43 ,通过微波发生装置 45对掩模版 20进行微波加热，所 述待清洗掩模版 20倾斜放置于微波干式清洗槽 40内，所述有机材料膜层 21朝上。 如图 5所示，掩模版 20上的有机材料膜层 21经过微波的极化偏转摩 擦，由内及外发生破裂，变成小块碎片。
步骤 3、 停止微波加热，对微波加热过的掩模版 20喷淋药液 432 ,将破 碎的有机材料膜层 21冲洗脱离掩模版 20。
如图 6所示，所述步骤 3在微波干式清洗槽 40里进行，所述待清洗掩 模版 20倾斜放置于微波干式清洗槽 40内，所述有机材料膜层 21朝上，通 过药液喷淋头 43对掩模版 20喷淋药液 432 ,且所述药液喷淋头 43为低速 药液喷淋头。
经过一段时间的冲洗，有机材料膜层 21的大部分已经从掩模版 20上 去除掉，剩下的是部分黏附牢固的有机材料。
步骤 4、使用药液 432对掩模版 20上剩余的有机材料膜层 21进行清洗。 如图 7所示，所述步骤 4在药液湿式清洗槽 50中进行清洗，所述药液 湿式清洗槽 50装有药液 432 ,所述掩模版 20浸没于药液 432中。
通过药液 432的浸泡使得剩余的有机材料膜层 21被药液 432浸泡清洗 掉。
步骤 5、 对清洗过的掩模版 20进行漂洗，以洗掉残留在掩模版 20上 的药液。 如图 8所示，所述步骤 5在药液湿式洗涤槽 60中进行漂洗，所述药液 湿式洗涤槽 60装有洗涤液 62 ,所述掩模版 20浸没于洗涤液 62中。
步骤 6、 使用微波对掩模版 20进行干燥处理。
如图 9所示，所述步骤 6在微波干式清洗槽 40里进行，通过微波发生 装置 45对掩模版 20进行微波加热，所述掩模版 20倾斜放置于微波干式清 洗槽 40内。
综上所述，本发明提供的一种掩模版的清洗方法及装置，通过引入微 波干式清洗方法和装置，对进入药液湿式清洗槽之前的掩模版做前期的微 波处理，使进入药液湿式清洗槽之前掩模版上附着的有机材料大大减少， 从而提高掩模版的清洗效果及清洗效率，大大缩短了清洗周期，提高了清 洗产能，并有利于整体提升 OLED显示器的产能。
以上所述，对于本领域的普通技术人员来说，可以根据本发明的技术 方案和技术构思作出其他各种相应的改变和变形，而所有这些改变和变形 都应属于本发明权利要求的保护范围。

Claims

杈 利 要 求
1、 一种掩模版的清洗方法，包括以下步骤：
步骤 1、 提供待清洗掩模版，该掩模版由金属制成，其上附有有机材 料膜层 '·
步骤 2、对该待清洗的掩模版进行微波加热，使附着在掩模版的有机材 料膜层破碎；
步骤 3、 停止微波加热，对微波加热过的掩模版喷淋药液，将破碎的有 机材料膜层冲洗脱离掩模版；
步骤 4、 使用药液对掩模版上剩余的有机材料膜层进行清洗；
步骤 5、 对清洗过的掩模版进行漂洗，以洗掉残留在掩模版上的药液； 步骤 6、 使用微波对掩模版进行干燥处理。
2、 如权利要求 1 所述的掩模版的清洗方法，其中，所述掩模版用于 OLED的蒸镀制程。
3、 如权利要求 1所述的掩模版的清洗方法，其中，所述步骤 2与步骤
3在一微波干式清洗槽里进行，所述微波干式清洗槽包括槽体、设于槽体底 部的微波发生装置、 及设于槽体顶部的药液喷淋头，通过微波发生装置对 掩模版进行微波加热，通过药液喷淋头对掩模版喷淋药液。
4、 如权利要求 3所述的掩模版的清洗方法，其中，在所述步骤 2与 3 中，所述待清洗掩模版倾斜放置于微波干式清洗槽内，所述有机材料膜层 朝上，且所述药液喷淋头为低速药液喷淋头。
5、 如权利要求 1所述的掩模版的清洗方法，其中，所述步骤 4在一药 液湿式清洗槽中进行清洗，所述药液湿式清洗槽装有药液，所述掩模版浸 没于药液中。
6、 如权利要求 1所述的掩模版的清洗方法，其中，所述步骤 5在一药 液湿式洗洚槽中进行漂洗，所述药液湿式洗洚槽装有洗洚液，所述掩模版 浸没于洗涤液中。
7、 如权利要求 3所述的掩模版的清洗方法，其中，所述步骤 6在所述 微波干式清洗槽里进行。
8、 一种掩模版的清洗装置，包括一微波干式清洗槽、 一药液湿式清洗 槽及一药液湿式洗洚槽，所述微波干式清洗槽包括槽体、 设于槽体底部的 微波发生装置、 及设于槽体顶部的 ί氏速药液喷淋头。
9、 如权利要求 8所述的掩模版的清洗装置，其中，所述微波干式清洗 槽、 药液湿式清洗槽及药液湿式洗涤槽依次相邻放置。
10、 如权利要求 8所述的掩模版的清洗装置，其中，所述药液湿式清 洗槽中装有药液，所述药液湿式洗洚槽中装有洗洚液，所述掩模版由金属 制成，用于 OLED的蒸镀制程。
11、 一种掩模版的清洗装置，包括一微波干式清洗槽、 一药液湿式清 洗槽及一药液湿式洗涤槽，所述微波干式清洗槽包括槽体、 设于槽体底部 的微波发生装置、 及设于槽体顶部的 ί氏速药液喷淋头；
其中，所述微波干式清洗槽、 药液湿式清洗槽及药液湿式洗洚槽依次 相邻放置；
其中，所述药液湿式清洗槽中装有药液，所述药液湿式洗洚槽中装有 洗涤液，所述掩模版由金属制成，用于 OLED的蒸镀制程。
PCT/CN2014/081443 2014-06-12 2014-07-02 掩模版的清洗方法及装置 Ceased WO2015188416A1 (zh)

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Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104614933A (zh) * 2014-12-24 2015-05-13 信利（惠州）智能显示有限公司 一种金属成膜掩膜板的清洗方法
CN104550104A (zh) * 2014-12-30 2015-04-29 深圳市华星光电技术有限公司 一种金属掩模版清洗装置
CN106057726B (zh) * 2016-07-26 2019-11-26 武汉华星光电技术有限公司 一种小尺寸掩膜板固定装置
CN107203094B (zh) * 2017-07-03 2020-07-24 京东方科技集团股份有限公司 掩膜版清理装置及方法
CN108816870B (zh) * 2018-04-08 2021-05-25 苏州珮凯科技有限公司 半导体8寸晶元制造薄膜制程的WxZ工艺的陶瓷环状零部件再生方法
CN108866340B (zh) * 2018-07-17 2019-12-20 成都中建材光电材料有限公司 一种碲化镉薄膜太阳能电池的微波照射回收处理方法
CN113351583B (zh) * 2021-05-31 2023-03-10 江苏高光半导体材料有限公司 一种掩膜版清洗装置及其清洗方法
CN114995052A (zh) * 2022-05-18 2022-09-02 上海图灵智算量子科技有限公司 光罩版清洁装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101221355A (zh) * 2007-11-28 2008-07-16 上海广电电子股份有限公司 有机电致发光元件制程中的光刻掩膜板的清洗方法及装置
CN201436973U (zh) * 2009-07-27 2010-04-14 宁波方太厨具有限公司 具有喷淋和微波处理的洗碗机
US20100242988A1 (en) * 2009-03-25 2010-09-30 Chee Kin Woo Method and apparatus for cleaning a component using microwave radiation
CN103406301A (zh) * 2013-08-11 2013-11-27 唐军 掩模板清洗器

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5950645A (en) * 1993-10-20 1999-09-14 Verteq, Inc. Semiconductor wafer cleaning system
US6634368B1 (en) * 1999-11-12 2003-10-21 Texas Instruments Incorporated Application of ozonated DI water to scrubbers for resist strip and particle removal processes
US6776171B2 (en) * 2001-06-27 2004-08-17 International Business Machines Corporation Cleaning of semiconductor wafers by contaminate encapsulation
KR100626037B1 (ko) * 2004-11-18 2006-09-20 삼성에스디아이 주식회사 마스크 세정방법
JP2011066259A (ja) * 2009-09-18 2011-03-31 Toshiba Corp マスク洗浄方法及びマスク洗浄装置
DE102009058962B4 (de) * 2009-11-03 2012-12-27 Suss Microtec Photomask Equipment Gmbh & Co. Kg Verfahren und Vorrichtung zum Behandeln von Substraten
CN103408301B (zh) 2013-07-19 2015-04-22 江苏大学 一种超高压陶瓷电容器介质及其制备方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101221355A (zh) * 2007-11-28 2008-07-16 上海广电电子股份有限公司 有机电致发光元件制程中的光刻掩膜板的清洗方法及装置
US20100242988A1 (en) * 2009-03-25 2010-09-30 Chee Kin Woo Method and apparatus for cleaning a component using microwave radiation
CN201436973U (zh) * 2009-07-27 2010-04-14 宁波方太厨具有限公司 具有喷淋和微波处理的洗碗机
CN103406301A (zh) * 2013-08-11 2013-11-27 唐军 掩模板清洗器

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