Classifications

• • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
  • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
  • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
  • F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
  • F04C23/005—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of dissimilar working principle
• • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
  • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
  • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
  • F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
  • F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
  • F04B37/14—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use to obtain high vacuum
• • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
  • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
  • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
  • F04C18/00—Rotary-piston pumps specially adapted for elastic fluids
  • F04C18/30—Rotary-piston pumps specially adapted for elastic fluids having the characteristics covered by two or more of groups F04C18/02, F04C18/08, F04C18/22, F04C18/24, F04C18/48, or having the characteristics covered by one of these groups together with some other type of movement between co-operating members
  • F04C18/34—Rotary-piston pumps specially adapted for elastic fluids having the characteristics covered by two or more of groups F04C18/02, F04C18/08, F04C18/22, F04C18/24, F04C18/48, or having the characteristics covered by one of these groups together with some other type of movement between co-operating members having the movement defined in group F04C18/08 or F04C18/22 and relative reciprocation between the co-operating members
  • F04C18/344—Rotary-piston pumps specially adapted for elastic fluids having the characteristics covered by two or more of groups F04C18/02, F04C18/08, F04C18/22, F04C18/24, F04C18/48, or having the characteristics covered by one of these groups together with some other type of movement between co-operating members having the movement defined in group F04C18/08 or F04C18/22 and relative reciprocation between the co-operating members with vanes reciprocating with respect to the inner member
• • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
  • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
  • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
  • F04C25/00—Adaptations of pumps for special use of pumps for elastic fluids
  • F04C25/02—Adaptations of pumps for special use of pumps for elastic fluids for producing high vacuum
• • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
  • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
  • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
  • F04C28/00—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids
  • F04C28/06—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids specially adapted for stopping, starting, idling or no-load operation
• • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
  • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
  • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
  • F04C29/00—Component parts, details or accessories of pumps or pumping installations, not provided for in groups F04C18/00 - F04C28/00
  • F04C29/0021—Systems for the equilibration of forces acting on the pump
  • F04C29/0028—Internal leakage control
• • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
  • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
  • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
  • F04C29/00—Component parts, details or accessories of pumps or pumping installations, not provided for in groups F04C18/00 - F04C28/00
  • F04C29/02—Lubrication; Lubricant separation
• • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
  • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
  • F04F—PUMPING OF FLUID BY DIRECT CONTACT OF ANOTHER FLUID OR BY USING INERTIA OF FLUID TO BE PUMPED; SIPHONS
  • F04F5/00—Jet pumps, i.e. devices in which flow is induced by pressure drop caused by velocity of another fluid flow
  • F04F5/14—Jet pumps, i.e. devices in which flow is induced by pressure drop caused by velocity of another fluid flow the inducing fluid being elastic fluid
  • F04F5/16—Jet pumps, i.e. devices in which flow is induced by pressure drop caused by velocity of another fluid flow the inducing fluid being elastic fluid displacing elastic fluids
  • F04F5/20—Jet pumps, i.e. devices in which flow is induced by pressure drop caused by velocity of another fluid flow the inducing fluid being elastic fluid displacing elastic fluids for evacuating
• • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
  • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
  • F04F—PUMPING OF FLUID BY DIRECT CONTACT OF ANOTHER FLUID OR BY USING INERTIA OF FLUID TO BE PUMPED; SIPHONS
  • F04F5/00—Jet pumps, i.e. devices in which flow is induced by pressure drop caused by velocity of another fluid flow
  • F04F5/54—Installations characterised by use of jet pumps, e.g. combinations of two or more jet pumps of different type

Definitions

• the present invention relates to a pumping method for reducing the electrical power consumption as well as the performance in terms of flow and final vacuum in a pumping system whose main pump is a lubricated vane vacuum pump.
• the present invention relates to a pumping system that can be used to perform the method according to the present invention.
• Roots booster pumps arranged upstream of the lubricated vane primary pumps.
• This type of system is cumbersome, works either with by-pass valves having reliability problems, or by employing means of measurement, control, adjustment or control.
• these control means, adjustment or servo must be controlled in an active manner, which necessarily results in an increase in the number of components of the system, its complexity and its cost.
• the object of the present invention is to propose a pumping method in a pumping system making it possible to reduce the electrical energy necessary for evacuating a vacuum chamber and maintaining the vacuum in this chamber, as well as for performing a lowering of the temperature of the exit gases.
• Another object of the present invention is to propose a method of pumping in a pumping system making it possible to obtain a higher flow rate at low pressure than that which can be obtained by means of a vacuum pump with vanes lubricated alone during the pumping a vacuum chamber.
• Another object of the present invention is to propose a pumping method in a pumping system which makes it possible to obtain a better vacuum than that which can be obtained by means of a vacuum vane pump lubricated alone in a vacuum chamber. .
• the method essentially consists in supplying the driving fluid and operating the ejector continuously all the time that the lubricated vacuum primary vacuum pump pumps the gases contained in the vacuum chamber by the gas inlet orifice, but also, all the time that the lubricated vane primary vacuum pump maintains a defined pressure (eg the final vacuum) in the chamber by pushing back the gases through its outlet.
• a defined pressure eg the final vacuum
• the invention resides in the fact that the coupling of the lubricated vanes primary vacuum pump and the ejector does not require specific measurements and devices (eg pressure sensors, temperature sensors, current, etc.), servocontrols or data and calculation management. Therefore, the pumping system adapted for the implementation of the pumping method according to the present invention comprises a minimum number of components, is very simple and costs significantly less than existing systems.
• the ejector built into the pumping system can still operate without damage according to this method of pumping. Its dimensioning is conditioned by a minimum motor fluid consumption for the operation of the device. It is normally single-storey. Its nominal flow rate is chosen according to the volume of the outlet duct of the lubricated vane primary vacuum pump, limited by the non-return valve. This flow rate may be 1/500 to 1/20 of the nominal flow rate of the lubricated vane primary vacuum pump, but may also be lower or higher than these values.
• the driving fluid for the ejector may be compressed air, but also other gases, for example nitrogen.
• the non-return valve placed in the conduit at the outlet of the lubricated vane primary vacuum pump, may be a standard commercially available element. It is dimensioned according to the rated flow rate of the lubricated vane primary vacuum pump. In particular, it is expected that the check valve return closes when the suction pressure of the lubricated vane primary vacuum pump is between 500 mbar absolute and the final vacuum (eg 100 mbar).
• the ejector is multi-stage.
• the ejector may be made of high chemical resistance material substances and gas commonly used in the chemical industry, that of semiconductors, both in the single-stage ejector variant as in that of the multi-stage ejector.
• the ejector is preferably small.
• the ejector is integrated in a cartridge which incorporates the non-return valve.
• the ejector is integrated in a cartridge which incorporates the non-return valve and this cartridge itself is housed in the oil separator of the lubricated vane primary vacuum pump.
• the flow of gas at the pressure necessary for the operation of the ejector is controlled "all or nothing".
• the control consists of measuring one or more parameters and putting the ejector into operation or stop it, according to certain predefined rules.
• the parameters, provided by suitable sensors, are p. ex. the motor current of the lubricated vane vacuum pump, the temperature or pressure of the gases in the volume of the outlet duct of the lubricated vane primary vacuum pump, limited by the check valve, or a combination of these parameters.
• the pressure is high, for example equal to the atmospheric pressure. Due to the compression in the lubricated vane primary vacuum pump, the pressure of the gases discharged at its outlet is higher than the atmospheric pressure (if the gases at the outlet of the primary pump are discharged directly to the atmosphere) or higher than the pressure at the inlet of another device connected downstream. This causes the non-return valve to open.
• the lubricated vane primary vacuum pump consumes less and less energy for compression and produces less and less compression heat.
• the flow of gas at the pressure necessary for the operation of the ejector is provided. by a compressor.
• this compressor can be driven by the lubricated vane primary pump or, alternatively or additionally, independently, independent of the lubricated vane primary pump.
• This compressor can draw atmospheric air or gases into the gas outlet duct after the non-return valve. The presence of such a compressor makes the lubricated vane vacuum pump systems independent of a source of compressed gas, which may meet certain industrial environments.
• the compressor can supply the gas flow at the pressure
• the compressor is part of the system both in the case of continuous operation of the ejector as in the case of its control according to the parameters, controlled by suitable sensors.
• FIG. 1 schematically shows a pumping system adapted for carrying out a pumping method according to a first embodiment of the present invention
• FIG. 2 schematically shows a pumping system adapted for the realization of a pumping method according to a second embodiment of the present invention.
• FIG. 3 schematically shows a pumping system adapted for the realization of a pumping method according to a third embodiment of the present invention.
• Figure 1 shows a pump system SP adapted for the implementation of a pumping method according to a first embodiment of the present invention.
• This pumping system SP comprises an enclosure 1, which is connected to the suction port 2 of a lubricated vane primary vacuum pump 3.
• the gas outlet port of the lubricated vane primary vacuum pump 3 is connected to the conduit 5.
• a discharge check valve 6 is placed in the conduit 5, which after this non-return valve 6 continues in the gas outlet conduit 8.
• the non-return valve 6, when closed allows the formation of a volume 4, between the gas outlet port of the primary vacuum pump 3 and itself.
• the pumping system SP also comprises an ejector 7, connected in parallel with the non-return valve 6.
• the suction orifice of the ejector is connected to the volume 4 of the conduit 5 and its discharge orifice is connected to the conduit 8.
• the supply duct 9 provides the driving fluid for the ejector 7.
• the driving fluid for the ejector 7 is injected through the feed duct 9. Then, the lubricated vane primary vacuum pump 3 sucks the gases in the pump. 1 enclosure through the conduit 2 connected to its inlet and compresses them to discharge thereafter at its outlet in the conduit 5 by the non-return valve 6. When the closing pressure of the non-return valve 6 is reached, it closes. From this moment the pumping of the ejector 7 gradually lowers the pressure in the volume 4 to the value of its limit pressure. In parallel, the power consumed by the lubricated vane primary vacuum pump 3 gradually decreases. This occurs in a short period of time, for example for a certain cycle in 5 to 10 seconds.
• FIG. 2 represents a pumping system SP adapted for the implementation of a pumping method according to a second embodiment of the present invention.
• the system represented in FIG. 2 furthermore comprises a compressor 10 which supplies the gas flow rate at the pressure necessary for the operation of the ejector 7.
• this compressor 10 can aspire atmospheric air or gases in the gas outlet duct 8 after the non-return valve 6. Its presence makes the pumping system independent of a source of compressed gas, which can meet certain industrial environments.
• the compressor 10 can be driven by the lubricated vane primary pump 3 or by its own electric motor, so completely independently of the pump 3. In all cases the energy consumption of the compressor 10 when it provides the flow rate of gas at the pressure needed to make
• FIG. 3 shows a vacuum pump system SPP adapted for implementing a pumping method according to a third embodiment of the present invention.
• the system represented in FIG. 3 corresponds to a controlled pumping system, which furthermore comprises sensors 1 1, 12, 13 which control p. ex. the motor current (sensor 1 1) of the lubricated vane primary vacuum pump 3, the pressure (sensor 13) of the gases in the volume of the outlet duct of the lubricated vane primary vacuum pump (limited by the check valve) 6), the temperature (sensor 12) of the gases in the volume of the outlet duct of the lubricated vane primary vacuum pump (limited by the non-return valve 6) or a combination of these parameters.
• the lubricated vane primary vacuum pump 3 starts to pump the gases from the vacuum chamber 1, these mentioned parameters (in particular the current of its engine, the temperature and the pressure of the gases in the volume of the duct output 4) begin to change and reach threshold values detected by the corresponding sensors 1 1, 12, 13. This causes the ejector 7 to turn on (after a certain time delay). When these parameters return to initial ranges (out of setpoints) the ejector is stopped (again after a certain delay).
• the SSP driven pumping system may have as compressed gas source a distribution network or a compressor 10 under the conditions described in FIG. 2.

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• Engineering & Computer Science (AREA)
• Mechanical Engineering (AREA)
• General Engineering & Computer Science (AREA)
• Physics & Mathematics (AREA)
• Fluid Mechanics (AREA)
• Applications Or Details Of Rotary Compressors (AREA)
• Jet Pumps And Other Pumps (AREA)
• Compressors, Vaccum Pumps And Other Relevant Systems (AREA)

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Applications Claiming Priority (1)

Publications (1)

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Family Applications (1)

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Citations (3)

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• 2014
  • 2014-05-01 CA CA2944825A patent/CA2944825C/fr active Active
  • 2014-05-01 AU AU2014392229A patent/AU2014392229B2/en active Active
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  • 2014-05-01 JP JP2016559425A patent/JP6410836B2/ja active Active
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  • 2014-05-01 DK DK14721361.5T patent/DK3137771T3/da active
  • 2014-05-01 ES ES14721361T patent/ES2797400T3/es active Active
  • 2014-05-01 RU RU2016142607A patent/RU2666379C2/ru active
  • 2014-05-01 US US15/306,175 patent/US20170045051A1/en not_active Abandoned
  • 2014-05-01 CN CN201480078447.9A patent/CN106255828A/zh active Pending
  • 2014-05-01 KR KR1020167030629A patent/KR102235562B1/ko active IP Right Grant
  • 2014-05-01 EP EP14721361.5A patent/EP3137771B1/fr active Active
  • 2014-05-01 WO PCT/EP2014/058948 patent/WO2015165544A1/fr active Application Filing
  • 2014-05-01 BR BR112016024380-3A patent/BR112016024380B1/pt active IP Right Grant
• 2015
  • 2015-05-01 TW TW104114058A patent/TWI698585B/zh active

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