WO2015106527A1 - 显示基板及其制备方法、显示装置 - Google Patents

显示基板及其制备方法、显示装置 Download PDF

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Publication number
WO2015106527A1
WO2015106527A1 PCT/CN2014/079292 CN2014079292W WO2015106527A1 WO 2015106527 A1 WO2015106527 A1 WO 2015106527A1 CN 2014079292 W CN2014079292 W CN 2014079292W WO 2015106527 A1 WO2015106527 A1 WO 2015106527A1
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Prior art keywords
substrate
display
display substrate
reinforcement layer
support reinforcement
Prior art date
Application number
PCT/CN2014/079292
Other languages
English (en)
French (fr)
Inventor
张莹
李京鹏
唐磊
裴扬
李鑫
Original Assignee
京东方科技集团股份有限公司
北京京东方光电科技有限公司
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Application filed by 京东方科技集团股份有限公司, 北京京东方光电科技有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US14/426,282 priority Critical patent/US9568777B2/en
Publication of WO2015106527A1 publication Critical patent/WO2015106527A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/006—Filter holders
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133308—Support structures for LCD panels, e.g. frames or bezels
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133302—Rigid substrates, e.g. inorganic substrates
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133308—Support structures for LCD panels, e.g. frames or bezels
    • G02F1/133317—Intermediate frames, e.g. between backlight housing and front frame
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133308—Support structures for LCD panels, e.g. frames or bezels
    • G02F1/133325—Assembling processes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133519—Overcoatings
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/50—Protective arrangements
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/54—Arrangements for reducing warping-twist

Definitions

  • Embodiments of the present invention relate to a display substrate and a display device. Background technique
  • TFT-LCD Thin Film Transistor Liquid Crystal Display
  • FPD main flat panel display
  • a general TFT-LCD includes a color filter substrate and an array substrate, and a liquid crystal layer between the two substrates.
  • a spacer (PS) is disposed between the color filter substrate and the array substrate to maintain a cell gap.
  • the color filter substrate includes: a first substrate 1 and a color filter layer and a black matrix 3 disposed on the first substrate 1, and a first layer disposed above the color filter layer and the black matrix 3.
  • Transparent electrode layer 4 Generally, the color filter layer includes a plurality of sub-pixel color films 2 (eg, a red sub-pixel color film, a green sub-pixel color film, and a blue sub-pixel color film).
  • the array substrate includes: a second substrate 7 and a second Thin film transistor 8 on substrate 7. Summary of the invention
  • Embodiments of the present invention provide an anti-extrusion display substrate and a display device.
  • At least one embodiment of the present invention provides a display substrate including a display area and a non-display area, at least a region corresponding to the display area is provided with a transparent support reinforcement layer.
  • At least another embodiment of the present invention provides a method of fabricating a display substrate, the display substrate including a display area and a non-display area, the preparation method comprising: forming a transparent support at least in the display area of the display substrate Strengthen the layer.
  • At least one embodiment of the present invention is a display device including the above display substrate.
  • FIG. 1 is a schematic plan view of a color filter substrate;
  • Figure 2 is a cross-sectional view taken along line AA of Figure 1;
  • FIG. 3 is a schematic cross-sectional view showing a structure of a display panel
  • FIG. 4 is a schematic plan view of a color filter substrate according to Embodiment 1 of the present invention.
  • Figure 5 is a plan view showing the support reinforcing layer of Figure 4.
  • Figure 6 is a cross-sectional view taken along line A-A of Figure 4.
  • FIG. 7 is a schematic cross-sectional view showing a structure of a portion of a display panel according to an embodiment of the present invention.
  • FIG. 8 is a schematic plan view showing a support reinforcing layer at a position of a spacer of the color filter substrate according to Embodiment 1 of the present invention.
  • Figure 9 is a plan view showing the support reinforcing layer of Figure 8.
  • Figure 10 is a partial cross-sectional view showing an array substrate according to Embodiment 1 of the present invention
  • Figure 11 is a schematic view showing the structure of a display device according to Embodiment 3 of the present invention.
  • the materials of the sub-pixel color film 2 and the black matrix 3 can be made of a resin having a weak pressure resistance, in which
  • the color filter substrate is pressed by an external force, it is likely to cause a phenomenon in which the picture quality such as blushing is poor in the pressed region during display. If the pressing force received is too large, even if the spacer 5 inside the display device is broken, unsuccessful image quality such as whitening or bluing is unsatisfactory.
  • the array substrate is pressed, the array substrate is deformed, which also causes a display failure.
  • Example 1 The embodiment provides a display substrate including a display area and a non-display area.
  • a support reinforcement layer is disposed in the display area and the support reinforcement layer is a transparent structure.
  • the display area generally refers to an area for displaying an image
  • the non-display area refers to a surrounding area of the display area, such as surrounding the display area.
  • the display substrate of the embodiment is provided with the support reinforcement layer capable of effectively receiving the external force at least in the display area, the phenomenon that various picture quality defects caused by the display substrate being pressed is avoided, and the external force is suppressed. Display damage caused by the substrate.
  • the display substrate of this embodiment may include a color film substrate or an array substrate or a combination thereof, but is not limited thereto.
  • the array substrate may further include a color filter structure, which may be disposed above or below the array structure.
  • the display substrate may be a substrate applied to a flat panel display such as a liquid crystal display, a plasma display, or an electroluminescence display.
  • the display substrate of the present embodiment will be described by taking a display substrate as a color filter substrate and an array substrate as an example.
  • the display substrate is a color film substrate.
  • the color filter substrate may include a first substrate 1 and a color filter layer disposed on the first substrate 1.
  • the color filter layer may include a plurality of sub-pixel color films 2.
  • the plurality of sub-pixel color films 2 may be spaced apart, and a black matrix 3 may be disposed between adjacent sub-pixel color films 2.
  • the color filter substrate may include a color filter layer having a red sub-pixel color film, a green sub-pixel color film, and a blue sub-pixel color film. Embodiments of the invention are not limited to the particular color of the sub-pixel color film.
  • a black matrix 3 may also be disposed on the color filter substrate, and the black matrix 3 is disposed between the adjacent two sub-pixel color films 2, thereby defining sub-pixels.
  • the support reinforcement layer 6 is disposed at least between the first substrate 1 and the sub-pixel color film 2, that is, at least in the red sub-pixel color film, the green sub-pixel color film, or the blue sub-pixel color film
  • a support reinforcement layer 6 is disposed between the first substrate 1 and the first substrate 1 .
  • the material of the sub-pixel color film 2 can be a resin material, in this case, the pressure resistance is weak, and the support reinforcing layer 6 is disposed at this time, which can effectively bear the external force to squeeze the sub-pixel color film 2. , to prevent damage to the sub-pixel color film 2.
  • the color film substrate of this structure is applied to a display device, particularly a touch display device, which can effectively prevent the display device from being poorly displayed due to the pressing of a large external force.
  • the support reinforcement layer 6 is a transparent structure, it may be a complete layer structure, for example, the support reinforcement layer 6 in the entire display area is integrated.
  • the support reinforcement layer 6 may also include a plurality of spaced block structures, each block corresponding to a region of each sub-pixel color film disposed on the display substrate.
  • each of the support reinforcing layers 6 having the block structure arranged in a matrix corresponds to the position where the sub-pixel color film 2 is located.
  • the area of each of the blocks may be the same as or slightly larger than the area of each of the sub-pixel color films 2.
  • “slightly larger” means that the block is not only at the position of the sub-pixel color film 2, but also at least at the position corresponding to the black matrix 3.
  • “slightly larger” means that the block is not only at the position of the sub-pixel color film 2, but also at least at the position corresponding to the black matrix 3.
  • These blocks may be insulated from each other or electrically connected to each other.
  • the color filter substrate may further include: a first transparent electrode layer 4 disposed above the color filter layer, and a spacer disposed above the first transparent electrode layer 4 5.
  • the first transparent electrode layer 4 is, for example, a common electrode or a pixel electrode on a color filter substrate. Since the spacer 5 is also easily broken due to a large external force during extrusion, the support reinforcing layer 6 may be disposed on a region of the color filter substrate corresponding to the spacer. In one example, the support reinforcing layer 6 can also enclose the spacer 5, so that the pressure resistance of the spacer 5 is further improved.
  • the thickness of the sub-pixel color film 2 can be made thinner in this embodiment, so that the sum of the thicknesses of the sub-pixel color film 2 and the support reinforcement layer 6 is controlled in the sub-pixel color film 2
  • the usual thickness is about 2.5 ⁇ 5 ⁇ .
  • the sum of the thickness of the support reinforcing layer 6 and the thickness of the sub-pixel color film 2 may be between 2.5 and 5 ⁇ m.
  • the thickness of the support reinforcing layer 6 may be between 1 and 3 ⁇ m. Of course, this can be based on specific settings.
  • the display substrate is an array substrate.
  • the array substrate includes a second substrate 7 and a thin film transistor 8 disposed on the second substrate 7.
  • the support reinforcement layer 6 is disposed on the second substrate 7 and below the thin film transistor 8, for example, below the lowermost film layer of the transistor 8.
  • the support reinforcing layer 6 at this time can be disposed not only in the region corresponding to the display region but also in the non-display region below the thin film transistor 8, for example.
  • the support reinforcement layer 6 may be disposed between the second substrate 7 and the layer where the gate is located, that is, the layer where the gate is located.
  • the support reinforcement layer 6 may be disposed between the second substrate 7 and the layer where the active layer is located, that is, under the layer where the active layer is located.
  • the support reinforcement layer 6 is disposed between the second substrate 7 and the thin film transistor 8, Therefore, the bending resistance of the array substrate can be enhanced.
  • the support reinforcement layer 6 can also be a complete layer structure.
  • the support reinforcing layer 6 may also use a spaced-apart block structure, that is, a projected area of each of the blocks supporting the reinforcing layer 6 and the sub-pixel color film 2 on the array substrate.
  • the area of each block can be the same as the area of the display area, or it can be slightly larger. These blocks may be insulated from each other or electrically connected to each other.
  • the material of the support reinforcing layer 6 in the present embodiment may be polycarbonate.
  • the material for supporting the reinforcing layer 6 is not limited to this material, and other materials which are transparent and which have the effect of supporting the reinforcing layer 6 are also possible.
  • the display substrate of this embodiment can be applied to a display panel, such as a display panel including a color filter substrate and an array substrate, as shown in FIGS.
  • a display panel such as a display panel including a color filter substrate and an array substrate, as shown in FIGS.
  • FIG. 7 cross-sectional schematic view of FIG. 4
  • both the array substrate and the color filter substrate of the display panel are provided with the support reinforcement layer 6, so that the anti-extrusion capability of the display panel is significantly enhanced. .
  • the embodiment provides a method for preparing a display substrate.
  • the display substrate includes a display area and a non-display area.
  • the preparation method includes: forming a transparent support reinforcement layer at least in the display area.
  • the display substrate in this embodiment may include a color film substrate or an array substrate or a combination thereof, but is not limited thereto.
  • the array substrate may further include a color filter structure in addition to an array structure including a thin film transistor, a signal line, or the like.
  • the display substrate may be a substrate applied to a flat panel display such as a liquid crystal display, a plasma display, or an electroluminescence display.
  • a method of preparing the display substrate of the present embodiment will be described by taking a display substrate as a color filter substrate and an array substrate as an example.
  • the display substrate is a color filter substrate
  • the color filter substrate includes: a first substrate and a color filter layer disposed above the first substrate, wherein the color filter layer includes a plurality of sub-pixel color films, The plurality of sub-pixel color film intervals are set.
  • a black matrix can also be placed between two adjacent sub-pixel color films to define sub-pixels.
  • the black matrix can also be disposed on the array substrate. This embodiment is exemplified by a black matrix disposed between two adjacent sub-pixel color films, but the embodiment of the present invention is not limited thereto.
  • the forming of the transparent support reinforcement layer at least in the display area of the display substrate may include: forming a transparent support reinforcement layer at least in a display area of the first substrate of the display substrate.
  • the method for preparing the display substrate of the embodiment may further include: forming a sub-pixel color film on the first substrate on which the support reinforcement layer is formed after the above steps.
  • the support reinforcement layer may be disposed at least between the first substrate and the sub-pixel color film.
  • the preparation method of the embodiment may further include, after the above steps, forming a pattern including a spacer on the first substrate.
  • the support reinforcing layer may also be formed on the color filter substrate in a region corresponding to the spacer. At this time, the support reinforcing layer can enclose the spacer, so that the pressure resistance of the spacer is further improved.
  • the support reinforcement layer may be a complete layer structure or a plurality of spaced block structure.
  • the area of the block may also be no less than the area of the sub-pixel color film.
  • the display substrate may be the color film substrate described in Embodiment 1, so that the anti-extrusion ability is obviously improved, and will not be described in detail herein.
  • the display substrate may also be an array substrate, and the array substrate includes a second substrate and a thin film transistor disposed above the second substrate.
  • the step of forming a transparent support reinforcement layer at least in the display area of the display substrate may include: forming a transparent support reinforcement layer at least in a display area of the second substrate of the display substrate.
  • the preparation method may further include: forming, for example, a thin film transistor on the second substrate on which the support reinforcement layer is formed.
  • the support reinforcement layer may be disposed on the second substrate and under the thin film transistor, for example, under the lowermost film layer of the thin film transistor. That is, the support reinforcing layer may be disposed not only in the region corresponding to the display region of the second substrate but also in the non-display region under the thin film transistor.
  • the array substrate can also be the array substrate described in Embodiment 1, so that the anti-extrusion ability is remarkably improved.
  • the first substrate and the second substrate may be a common glass substrate, a quartz substrate or other substrate, which is not limited herein.
  • the positions of the support reinforcing layers provided in Embodiment 1 and Embodiment 2 are only for the purpose of illustrating the embodiments of the present invention, and are not limited thereto, and those skilled in the art should understand that the support reinforcing layers may also be disposed in other Display area or non-display area.
  • the display device of this embodiment may be a flat panel display such as a liquid crystal display, a plasma display, or an electroluminescence display, which may include a front display substrate and a rear display substrate.
  • the front display substrate may be the color filter substrate 30, and the display substrate may be the array substrate 20; the array substrate 20 and the color filter substrate 30 are opposed to each other and passed through the sealant 35.
  • a liquid crystal cell is formed; the liquid crystal cell is filled with a liquid crystal material 40.
  • the pixel electrode of each pixel unit of the array substrate 20 is used to apply an electric field to control the degree of rotation of the liquid crystal material to perform a display operation.
  • the display device further includes a backlight 50 that provides backlighting for the array substrate 20.
  • the display device can be: an Organic Light-Emitting Diode (OLED) panel, a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator, various touch devices, and the like having any display function. Product or part.
  • OLED Organic Light-Emitting Diode
  • the display device of the present embodiment includes the above display substrate (e.g., a color filter substrate or an array substrate or a combination thereof), the anti-extrusion ability is stronger, and the display failure due to external force pressing can be effectively avoided.
  • the display device is a touch display device, the anti-extrusion capability is greatly enhanced, and the service life of the display device can be prolonged.

Abstract

一种显示基板及其制备方法、显示装置，该显示基板包括显示区、非显示区和透明的支撑加强层(6)，所述支撑加强层(6)至少设置在与所述显示区对应的区域。该显示基板不易被挤压造成破损，且能避免显示装置显示不良的现象。

Description

显示基板及其制备方法、 显示装置 技术领域
本发明实施例涉及一种显示基板及显示装置。 背景技术
薄膜晶体管液晶显示装置（ Thin Film Transistor Liquid Crystal Display, 简称 TFT-LCD )是一种主要的平板显示装置（ Flat Panel Display,简称 FPD )。 一般的 TFT-LCD包括彩膜基板和阵列基板以及处于两块基板之间的液晶层， 在彩膜基板与阵列基板中间设置有隔垫物（PS ) ， 以维持盒厚 ( cell gap ) 。
如图 1~3所示， 彩膜基板包括： 第一基底 1和设置在第一基底 1上的彩 色滤光层和黑矩阵 3， 以及设于彩色滤光层和黑矩阵 3上方的第一透明电极 层 4。 通常所述彩色滤光层包括多个子像素彩膜 2 (例如， 红色子像素彩膜、 绿色子像素彩膜、 蓝色子像素彩膜） 阵列基板包括： 第二基底 7， 以及设于 第二基底 7上的薄膜晶体管 8。 发明内容
本发明实施例提供一种抗挤压的显示基板及显示装置。
本发明的至少一个实施例提供一种显示基板，其包括显示区和非显示区， 至少在与所述显示区对应的区域设置有透明的支撑加强层。
本发明的至少另一个实施例提供一种显示基板的制备方法， 所述显示基 板包括显示区和非显示区， 所述制备方法包括： 至少在所述显示基板的所述 显示区形成透明的支撑加强层。
本发明的至少再一个实施例一种显示装置， 其包括上述显示基板。 附图说明
为了更清楚地说明本发明实施例的技术方案， 下面将对实施例的附图作 简单地介绍，显而易见地，下面描述中的附图仅仅涉及本发明的一些实施例， 而非对本发明的限制。
图 1为一种彩膜基板的平面示意图； 图 2为图 1的 A-A、方向剖面示意图；
图 3为一种显示面板部分结构的截面示意图；
图 4为本发明的实施例 1的彩膜基板的平面示意图；
图 5为图 4中支撑加强层的平面示意图；
图 6为图 4的 A-A、方向剖面示意图；
图 7为本发明实施例提供的显示面板部分结构的截面示意图；
图 8为本发明的实施例 1的彩膜基板的隔垫物所在位置处设置有支撑加 强层的平面示意图；
图 9为图 8中支撑加强层的平面示意图；
图 10为本发明的实施例 1的阵列基板的部分截面示意图； 以及 图 11为本发明实施例 3的显示装置的结构示意图。
附图标记：
1、 第一基底； 2、 子像素彩膜； 3、 黑矩阵； 4、 第一透明电极层； 5、 隔 垫物； 6、 支撑加强层； 7、 第二基底； 8、 薄膜晶体管； 20、 阵列基板； 30、 彩膜基板； 35、 封框胶； 40、 液晶材料； 50、 背光源。 具体实施方式
为使本发明实施例的目的、 技术方案和优点更加清楚， 下面将结合本发 明实施例的附图， 对本发明实施例的技术方案进行清楚、 完整地描述。显然， 所描述的实施例是本发明的一部分实施例， 而不是全部的实施例。 基于所描 述的本发明的实施例， 本领域普通技术人员在无需创造性劳动的前提下所获 得的所有其他实施例， 都属于本发明保护的范围。
本申请的发明人发现： 对于平板显示器， 例如图 1-3所示的情形中， 子 像素彩膜 2和黑矩阵 3的材料可以釆用抗压耐受力较弱的树脂制成， 在这种 情形下， 当彩膜基板受到外力按压后， 很容易导致显示时在受压区域产生发 白等画面品质不良的现象。 如果所受到的挤压力过大， 甚至使显示装置内部 的隔垫物 5破损， 同样会产生不可恢复性的发白或发蓝等画面品质不良的现 象。 此外， 当阵列基板受到挤压时， 阵列基板会发生变形， 这也会造成显示 不良的现象。
实施例 1 本实施例提供一种显示基板，其包括显示区和非显示区，在一个示例中， 至少在所述显示区中设置有支撑加强层且所述支撑加强层为透明结构。例如， 显示区通常指用于显示图像的区域， 非显示区指位于显示区的周围区域， 例 如围绕显示区。
由于本实施例的显示基板至少在显示区中设置有可有效承受外力的支撑 加强层， 因而避免了显示基板受压时造成的各种画面品质不良的现象， 且可 减小由于外力挤压对显示基板造成的损坏。
需要注意的是， 本实施例的显示基板可以包括彩膜基板或阵列基板或其 组合， 但不限于此。 例如， 除了包括薄膜晶体管、信号线等的阵列结构之外， 阵列基板还可以包括彩色滤光结构， 该彩色滤光结构可以设置在阵列结构之 上或之下。 此外， 该显示基板可以是应用于液晶显示器、 等离子体显示器、 电致发光显示器等平板显示器中的基板。 以下分别以显示基板为彩膜基板和 阵列基板为例， 对本实施例的显示基板进行说明。
如图 4~7所示的本实施例的一个示例， 所述显示基板为彩膜基板。 在该 示例中，彩膜基板可以包括第一基底 1和设置在第一基底 1上的彩色滤光层。 该彩色滤光层可以包括多个子像素彩膜 2。多个子像素彩膜 2可以间隔设置， 相邻子像素彩膜 2之间可设置有黑矩阵 3。
在一个示例中， 彩膜基板可以包括具有红色子像素彩膜、 绿色子像素彩 膜、 蓝色子像素彩膜的彩色滤光层。 本发明的实施例不限于子像素彩膜的具 体颜色。 在彩膜基板上还可以设置黑矩阵 3， 黑矩阵 3设置于两两相邻的子 像素彩膜 2之间， 由此界定了子像素。 支撑加强层 6至少设置在所述第一基 底 1与所述子像素彩膜 2之间， 也就是说， 至少在红色子像素彩膜、 绿色子 像素彩膜和或蓝色子像素彩膜所在的位置与第一基底 1之间设置有支撑加强 层 6。 由于子像素彩膜 2的材料可以为树脂材料， 在这种情况下， 其抗压耐 受力较弱， 此时设置支撑加强层 6， 可以有效地承担外力对子像素彩膜 2的 挤压， 防止子像素彩膜 2破损。 将该种结构的彩膜基板应用于显示装置， 尤 其是触控显示装置中， 其可有效地避免由于较大外力的挤压造成显示装置显 示不良的现象。
需要说明的是， 由于该支撑加强层 6为透明结构， 故其可以为一完整的 层结构， 例如， 整个显示区中的支撑加强层 6为一体的。 当然， 支撑加强层 6也可以包括多个间隔排列的区块结构， 各区块对应设置在所述显示基板上 的各子像素彩膜所在区域。 例如， 具有成矩阵式排列的区块结构的支撑加强 层 6中的每一个区块与子像素彩膜 2所在的位置对应。 在一个示例中， 每一 个区块的面积可以与每一个子像素彩膜 2的面积相同或者略大一点。这里"略 大一点" 是指该区块不仅仅在子像素彩膜 2所在位置上， 同时也至少在黑矩 阵 3所对应的位置上。 当支撑加强层 6釆用间隔排列的区块结构时， 故其可 以更好地承受外力的作用。 这些区块可以彼此绝缘或者彼此电连接。
如图 7、 8和 9所示， 上述彩膜基板还可以包括： 设置在彩色滤光层上方 的第一透明电极层 4，以及间隔设置在所述第一透明电极层 4上方的隔垫物 5。 该第一透明电极层 4例如是彩膜基板上的公共电极或像素电极。 由于隔垫物 5在挤压过程中也很容易由于外力较大而破损， 因此， 所述支撑加强层 6还 可以设置在所述彩膜基板上与所述隔垫物所对应的区域。 在一个示例中， 该 支撑加强层 6还可以将隔垫物 5包住，使得隔垫物 5的抗压能力进一步提高。
为了不影响光的透过率， 本实施例中可将子像素彩膜 2的厚度相应做得 薄一些， 使得子像素彩膜 2与支撑加强层 6的厚度之和控制在子像素彩膜 2 通常的厚度（2.5~5μπι )左右。 例如， 支撑加强层 6 的厚度与子像素彩膜 2 的厚度之和可以在 2.5~5 μπι之间。再例如， 所述支撑加强层 6的厚度可以在 1~3μπι之间。 当然， 这可以根据具体设定。
如图 10所示的本实施例的一个示例中，该显示基板为阵列基板。在该示 例中， 该阵列基板包括第二基底 7和设置在第二基底 7上的薄膜晶体管 8。 在一个示例中， 所述支撑加强层 6设置于所述第二基底 7上且位于所述薄膜 晶体管 8的下方， 例如， 晶体管 8的最下方膜层的下方。 当然， 此时的支撑 加强层 6不仅可以设置在显示区对应的区域， 还可以设置在例如薄膜晶体管 8下方的非显示区域。
在一个示例中，为了制备方便， 当薄膜晶体管 8为底栅型薄膜晶体管时， 可以将支撑加强层 6设置在第二基底 7与栅极所在的层之间， 也就是在栅极 所在的层的下方； 当薄膜晶体管 8为顶栅型薄膜晶体管时， 可以将支撑加强 层 6设置在第二基底 7与有源层所在的层之间， 也就是在有源层所在的层的 下方。
由于在所述第二基底 7与所述薄膜晶体管 8之间设置有支撑加强层 6， 因此， 可以增强阵列基板的抗弯折能力。
需要说明的是， 此实施例中， 该支撑加强层 6同样可以为一完整的层结 构。 当然， 支撑加强层 6也可以釆用间隔排列的区块结构， 即支撑加强层 6 的每一个区块与子像素彩膜 2在阵列基板上的投影区域。 此外， 每一区块的 面积可以与显示区面积相同， 也可以略大一点。 这些区块可以彼此绝缘或者 彼此电连接。
例如， 本实施例的中的支撑加强层 6的材料可以为聚碳酸酯。 当然， 支 撑加强层 6的材料也不局限于这一种材料， 其他的透明且可以有支撑加强层 6的效果的材料也是可以的。
需要说明的是， 本实施例的显示基板可以应用于显示面板中， 例如包括 彩膜基板和阵列基板的显示面板，如图 4~10所示。从图 7所示（图 4的 B-B、 方向剖面示意图） 的情形可以看出， 显示面板的阵列基板和彩膜基板中均设 有支撑加强层 6， 因而该显示面板的抗挤压能力明显增强。
实施例 2
本实施例提供一种显示基板的制备方法， 所述显示基板包括显示区和非 显示区， 所述制备方法包括： 至少在所述显示区形成透明的支撑加强层。
需要注意的是， 本实施例中的显示基板可以包括彩膜基板或阵列基板或 其组合， 但不限于此。 例如， 除了包括薄膜晶体管、 信号线等的阵列结构之 夕卜， 阵列基板还可以包括彩色滤光结构。 此外， 显示基板可以是应用于液晶 显示器、 等离子体显示器、 电致发光显示器等平板显示器中的基板。
以下分别以显示基板为彩膜基板和阵列基板为例， 对本实施例的显示基 板的制备方法进行说明。
在一个示例中， 所述显示基板为彩膜基板， 所述彩膜基板包括： 第一基 底和设置在第一基底上方的彩色滤光层， 所述彩色滤光层包括多个子像素彩 膜， 该多个子像素彩膜间隔设置。 需要注意的是， 还可以在两个相邻的子像 素彩膜之间设置黑矩阵， 以界定子像素。 当然， 黑矩阵也可以设置在阵列基 板上， 本实施例是以黑矩阵设置在两个相邻的子像素彩膜之间为例的， 但是 本发明实施例不局限于此。
所述至少在所述显示基板的所述显示区形成透明的支撑加强层的步骤可 以包括： 至少在显示基板的第一基底的显示区形成透明的支撑加强层。 在一个示例中， 本实施例的显示基板的制备方法在上述步骤之后还可以 包括： 在形成有支撑加强层的第一基底上形成子像素彩膜。 在一个示例中， 支撑加强层可以至少设置在第一基底与子像素彩膜之间。
在一个示例中， 本实施例的制备方法在上述步骤之后还可以包括： 在第 一基底上形成包括隔垫物的图形。
在本实施例中， 支撑加强层还可以形成在彩膜基板上与所述隔垫物所对 应的区域。 此时支撑加强层可以将隔垫物包住， 使得隔垫物的抗压能力进一 步提高。
当然， 支撑加强层可以为完整的层结构， 也可以包括多个间隔排列的区 块结构。 在一个示例中， 所述区块的面积还可以不小于子像素彩膜的面积。 这些区块可以彼此绝缘或彼此电连接。
需要说明的是， 该显示基板可以是实施例 1中所述的彩膜基板， 故其抗 挤压能力有明显的提高， 在此不详细描述。
当然， 所述显示基板还可以为阵列基板， 所述阵列基板包括第二基底和 设置在所述第二基底上方的薄膜晶体管。
在一个示例中， 所述至少在所述显示基板的所述显示区形成透明的支撑 加强层的步骤可以包括： 至少在显示基板的第二基底的显示区形成透明的支 撑加强层。
在一个示例中， 所述制备方法还可以包括： 在形成有支撑加强层的第二 基底上形成例如薄膜晶体管。 在一个示例中， 支撑加强层可以设置于第二基 底上且位于薄膜晶体管的下方， 例如， 薄膜晶体管的最下方膜层的下方。 也 就是说， 支撑加强层不仅可以设置在第二基底的显示区对应的区域， 还可以 设置在薄膜晶体管下方的非显示区域。
需要说明的是， 由于薄膜晶体管的制备为本领域技术人员所知的制备方 法， 在此不详细说明了。 当然该阵列基板也可以是实施例 1中所述的阵列基 板， 故其的抗挤压能力有明显提高。
第一基底和第二基底可以为普通玻璃基底、 石英基底或其他基底， 此处 不做限定。 此外， 实施例 1和实施例 2中提供的支撑加强层的位置只是为了 说明本发明的实施方式， 而不是对其进行限制， 本领域技术人员应当理解， 所述支撑加强层还可设置于其他显示区或非显示区。 实施例 3
本实施例提供一种显示装置， 其包括上述显示基板。 本实施例的显示装 置可以是液晶显示器、 等离子体显示器、 电致发光显示器等平板显示器， 其 可以包括前显示基板和后显示基板。 例如， 如图 11所示的液晶显示器， 其前 显示基板可以为彩膜基板 30， 其后显示基板可以为阵列基板 20; 阵列基板 20与彩膜基板 30彼此对置且通过封框胶 35以形成液晶盒；在液晶盒中填充 有液晶材料 40。 阵列基板 20的每个像素单元的像素电极用于施加电场以对 液晶材料的旋转程度进行控制从而进行显示操作。 在一些实施例中， 该显示 装置还包括为阵列基板 20提供背光的背光源 50。
该显示装置可以为： 有机发光二极管（Organic Light-Emitting Diode, 简 称 OLED )面板、 手机、 平板电脑、 电视机、 显示器、 笔记本电脑、 数码相 框、 导航仪、 各种触摸装置等任何具有显示功能的产品或部件。
由于本实施例的显示装置包括上述显示基板 (例如彩膜基板或阵列基板 或其组合） ， 故其抗挤压能力更强， 可以有效地避免由于外力挤压造成的显 示不良的现象。 当该显示装置为触控显示装置时， 其抗挤压能力大大增强， 此时可以延长显示装置的使用寿命。
当然， 本实施例的显示装置中还可以包括其他结构， 如电源单元、 显示 驱动单元等， 此处不再赘述。 而本发明并不局限于此。 对于本领域的普通技术人员而言， 在不脱离本发明 的精神和实质的情况下， 可以做出各种变型和改进， 这些变型和改进也视为 本发明的保护范围。
本申请要求于 2014年 1月 15日递交的中国专利申请第 201410019339.6 号的优先权， 在此全文引用上述中国专利申请公开的内容以作为本申请的一 部分。

Claims

权利要求书
1. 一种显示基板， 包括显示区、 非显示区和透明的支撑加强层， 所述支 撑加强层至少设置在与所述显示区对应的区域。
2. 根据权利要求 1所述的显示基板， 还包括：
第一基底； 和
设置在所述第一基底上的彩色滤光层， 所述彩色滤光层包括多个子像素 彩膜，
其中， 所述支撑加强层至少设置在所述第一基底与至少一个所述子像素 彩膜之间。
3. 根据权利要求 2所述的显示基板， 其中， 所述支撑加强层的厚度与所 述子像素彩膜的厚度之和为 2.5~5 μπι。
4. 根据权利要求 1 ~3任一所述的显示基板， 其中， 所述支撑加强层的厚 度为 1 ~3μπΐο
5. 根据权利要求 1 ~4任一所述的显示基板， 还包括：
设置于所述显示基板上的隔垫物，
其中， 所述支撑加强层还设置在所述显示基板上与所述隔垫物所对应的 区域。
6. 根据权利要求 1 ~5任一所述的显示基板， 其中， 所述支撑加强层包括 完整的层结构和 /或多个间隔排列的区块。
7. 根据权利要求 6所述的显示基板， 其中， 当所述支撑加强层包括多个 间隔排列的区块时， 所述区块对应设置在所述子像素彩膜所在区域中。
8. 根据权利要求 7所述的显示基板， 其中， 所述区块的面积不小于所述 子像素彩膜的面积。
9. 根据权利要求 1 ~8任一所述的显示基板， 还包括：
第二基底； 和
设置在所述第二基底上的薄膜晶体管，
其中， 所述支撑加强层设置于所述第二基底上且位于所述薄膜晶体管的 下方。
10.根据权利要求 1 ~9中任意一项所述的显示基板， 其中， 所述支撑加 强层的材料包括聚碳酸酯。
11. 根据权利要求 1~10任一所述的显示基板， 包括彩膜基板或阵列基 板， 或所述彩膜基板与所述阵列基板的组合。
12. 一种显示基板的制备方法， 其中， 所述显示基板包括显示区和非显 示区， 所述制备方法包括：
至少在所述显示基板的所述显示区形成透明的支撑加强层。
13.根据权利要求 12所述的显示基板的制备方法， 其中， 至少在所述显 示基板的所述显示区形成透明的支撑加强层包括：
至少在所述显示基板的第一基底的显示区形成透明的支撑加强层。
14.根据权利要求 13所述的显示基板的制备方法， 还包括：
在形成有所述支撑加强层的第一基底上形成子像素彩膜， 其中， 所述支 撑加强层至少设置在所述第一基底与所述子像素彩膜之间。
15.根据权利要求 12~14任一所述的显示基板的制备方法， 还包括： 在所述显示基板上形成隔垫物，
其中， 在所述显示基板上与所述隔垫物所对应的区域形成有所述支撑加 强层。
16.根据权利要求 14所述的显示基板的制备方法， 其中， 所述支撑加强 层包括完整的层结构和 /或多个间隔排列的区块， 当所述支撑加强层包括多个 间隔排列的区块时， 所述区块的面积不小于所述子像素彩膜的面积。
17.根据权利要求 12~16任一所述的显示基板的制备方法， 其中， 至少 在所述显示基板的所述显示区形成透明的支撑加强层还包括：
至少在所述显示基板的第二基底的显示区形成透明的支撑加强层。
18.根据权利要求 17所述的显示基板的制备方法， 还包括：
在形成有所述支撑加强层的所述第二基底上形成薄膜晶体管，
其中， 所述支撑加强层设置于所述第二基底上且位于所述薄膜晶体管的 下方。
19.根据权利要求 12~18任一所述的显示基板的制备方法， 其中， 所述 显示基板包括彩膜基板，或阵列基板或所述彩膜基板与所述阵列基板的组合。
20.一种显示装置， 包括权利要求书 1~11中任意一项所述的显示基板。
PCT/CN2014/079292 2014-01-15 2014-06-05 显示基板及其制备方法、显示装置 WO2015106527A1 (zh)

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