CN103760719A - 一种显示基板及显示装置 - Google Patents
一种显示基板及显示装置 Download PDFInfo
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Abstract
本发明提供一种显示基板及显示装置,属于显示技术领域,其可解决现有的显示基板被挤压造成破损,导致包括该种显示基板的显示装置显示不良的问题。本发明的显示基板包括:显示区和非显示区,至少在与所述显示区对应的区域设置有透明的支撑加强层。本发明的显示装置包括该显示基板。
Description
技术领域
本发明属于显示技术领域,具体涉及一种显示基板及显示装置。
背景技术
薄膜晶体管液晶显示装置(Thin Film Transistor Liquid CrystalDisplay,简称TFT-LCD)是一种主要的平板显示装置(Flat PanelDisplay,简称FPD)。一般的TFT-LCD包括彩膜基板和阵列基板以及处于两块基板之间的液晶层,在彩膜基板与阵列基板中间设置有隔垫物(PS),以维持盒厚。
如图1~3所示,其中,彩膜基板包括:第一基底1和设置在第一基底1上的彩色滤光层和黑矩阵3,以及设于彩色滤光层和黑矩阵3上方的第一透明电极层4。其中,通常所述彩色滤光层包括多个子像素彩膜2(红色子像素彩膜、绿色子像素彩膜、蓝色子像素彩膜),且子像素彩膜2和黑矩阵3的材料是由树脂构成,故其抗压耐受力较弱,当受到外力按压后,很容易导致显示时在受压区域产生发白等画面品质不良的问题。如果所受到的挤压力过大,甚至使显示装置内部的隔垫物5破损,同样会产生不可恢复性的发白或发蓝等画面品质不良。阵列基板包括:第二基底7,以及设于第二基底7上的薄膜晶体管8,此时当受到挤压时,阵列基板会发生变形,此时也会造成显示不良的情况。
发明内容
本发明所要解决的技术问题包括,针对现有的显示装置存在的上述问题,提供一种抗挤压的显示基板及显示装置。
解决本发明技术问题所采用的技术方案是一种显示基板,其包括显示区和非显示区,至少在与所述显示区对应的区域设置有透明的支撑加强层。
由于在本发明的显示基板的至少显示区中设置有支撑加强层,故其可以有效的承担来自外界对显示基板的压力,避免显示基板由于受压而造成损坏。
优选的是,所述显示基板为彩膜基板,所述彩膜基板包括:第一基底和设置在所述第一基底上的彩色滤光层,所述彩色滤光层包括:多个子像素彩膜,
所述支撑加强层至少设置在所述第一基底与所述子像素彩膜之间。
进一步优选的是,所述支撑加强层的面积不小于子像素彩膜的面积。
进一步优选地是,所述支撑加强层的厚度与子像素彩膜的厚度之和在2.5~5um之间。
再进一步优选地是,所述支撑加强层的厚度在1~3um之间。
进一步优选地是,所述彩膜基板上还设置有隔垫物;其中,
所述支撑加强层还设置在所述彩膜基板上与所述隔垫物所对应的区域。
优选的是,所述支撑加强层包括多个间隔排列的区块,各区块对应设置在所述子像素彩膜所在区域。
优选的是,所述显示基板为阵列基板,所述阵列基板包括第二基底和设置在所述第二基底上方的薄膜晶体管,其中,
所述支撑加强层设置于所述第二基底上且位于所述薄膜晶体管的最下方膜层的下方。
优选的是,所述支撑加强层的材料为聚碳酸酯。
解决本发明技术问题所采用的技术方案是一种显示基板的制备方法:所述显示基板包括显示区和非显示区,所述制备方法包括:
至少在所述显示基板的所述显示区形成透明的支撑加强层的步骤。
优选的是,所述显示基板为彩膜基板,所述彩膜基板包括:第一基底和是设置在第一基底上方的彩色滤光层,所述彩色滤光层包括:多个子像素彩膜,其中,在形成透明的支撑加强层的步骤之后,还包括:
在所述支撑加强层的第一基底上形成子像素彩膜的步骤。
进一步优选的是,所述彩膜基板上还设置有隔垫物,其中,
其中,所述在形成所述支撑加强层的第一基底上形成子像素彩膜的步骤之后,还包括形成隔垫物的步骤,所述支撑加强层还形成在所述彩膜基板上与所述隔垫物所对应的区域。
进一步优选地是,所述支撑加强层的面积不小于子像素彩膜的面积。
优选的是,所述显示基板为阵列基板,所述阵列基板包括第二基底和设置在所述第二基底上方的薄膜晶体管;
所述方法在形成透明的支撑加强层的步骤之后,,还包括在形成所述支撑加强层的第二基底上形成所述薄膜晶体管的步骤。
解决本发明技术问题所采用的技术方案是一种显示装置,其包括上述显示基板。
由于本发明的显示装置包括上述显示基板,故其可以有效的避免由于受压时造成的各种显示不良。
附图说明
图1为现有的彩膜基板的平面示意图;
图2为图1的A-A`方向剖面示意图;
图3为现有技术提供的显示面板部分结构的截面示意图;
图4为本发明的实施例1的彩膜基板的平面示意图;
图5为图4中支撑加强层的平面示意图;
图6为图4的A-A`方向剖面示意图;
图7为本发明实施例提供的显示面板部分结构的截面示意图;
图8为本发明的实施例1的彩膜基板的隔垫物所在位置处设置有支撑加强层的平面示意图;
图9为图8中支撑加强层的平面示意图;以及
图10为本发明的实施例1的阵列基板的部分截面示意图。
其中附图标记为:1、第一基底;2、子像素彩膜;3、黑矩阵;4、第一透明电极层;5、隔垫物;6、支撑加强层;7、第二基底;8、薄膜晶体管。
具体实施方式
为使本领域技术人员更好地理解本发明的技术方案,下面结合附图和具体实施方式对本发明作进一步详细描述。
实施例1:
本实施例提供一种显示基板,其包括显示区和非显示区,其中,至少在所述显示区中设置有支撑加强层且所述支撑加强层为透明结构。
由于本实施例的显示基板至少显示区中设置有支撑加强层其可有效承受外力的作用,避免显示基板受压时造成的各种画面品质不良,且可减小由于外力挤压时对显示基板造成的损坏。
如图4~7所示,优选地,作为本实施例的一种情况,所述显示基板为彩膜基板,其中,彩膜基板包括:第一基底1和设置在第一基底1上的彩色滤光层,该彩色滤光层包括:多个子像素彩膜2和黑矩阵3。多个子像素彩膜2间隔设置且设于多个子像素中。
其中,本实施例中的彩膜基板以包括红色子像素彩膜、绿色子像素彩膜、蓝色子像素彩膜的彩色滤光层为例,通常在彩膜基板上还可以设置黑矩阵3,黑矩阵3设置于两两相邻的子像素彩膜2之间。进一步优选地,所述支撑加强层6至少设置在所述第一基底1与所述子像素彩膜2之间。也就是说至少在红色子像素彩膜、绿色子像素彩膜、蓝色子像素彩膜所在的位置与第一基底1之间设置于支撑加强层6。通常由于子像素彩膜2的材料一般为树脂材料,其抗压耐受力较弱,此时设置支撑加强层6,可以有效的承担外力对子像素彩膜2的挤压,防止子像素彩膜2破损。将该种结构的彩膜基板应用于显示装置,尤其是触控显示装置中,其可有效的避免由于较大外力的挤压造成显示装置显示不良的现象。
需要说明的是,由于该支撑加强层6为透明结构,故其可以为一完整的层结构。当然优选为,多个间隔排列的区块结构,各区块对应设置在所述显示基板上的各子像素彩膜所在区域。其中成矩阵式排列的结构的支撑加强层6中的每一个区块是与子像素彩膜2所在位置对应的,也就是与子像素彩膜2的所在位置对应,每一个区块的面积与每一个子像素彩膜2的面积相同或者略大一点(略大一点是指该区块不仅仅在子像素彩膜2所在位置上,同时至少在黑矩阵3所对应的位置上也有)。由于支撑加强层6采用间隔设置的排列结构,故其可以更好地承受外力的作用。
如图8和9所示,当然,上述彩膜基板还包括:设置在彩色滤光层上方的第一透明电极层4,以及间隔设置在所述第一透明电极层4上方的隔垫物5。其中,由于隔垫物5在挤压过程中也很容易由于外力较大,造成隔垫物5破损。此时优选地,所述支撑加强层6还包括设置在所述彩膜基板上与所述隔垫物所对应的区域。该支撑加强层6最好可以将隔垫物5包住,使得隔垫物5的抗压能力进一步提高。
为了不影响光的透过率,本实施例中可将子像素彩膜2的厚度相应做的薄一些,使得子像素彩膜2与支撑加强层6的厚度之和控制在现有的子像素彩膜的厚度左右(现有的子像素彩膜的厚度一般在2.5~5um左右)。支撑加强层6的厚度与子像素彩膜2的厚度之和优选在2.5~5um之间。所述支撑加强层6的厚度优选在1~3um之间。当然可以根据具体设定。
如图10所示,作为本实施例的另一种情况,该显示基板为阵列基板。其中,该阵列基板包括:第二基底7和设置在第二基底7上的薄膜晶体管8。优选地,所述支撑加强层6设置于所述第二基底7上且位于所述薄膜晶体管8的最下方膜层的下方,当然,此时的支撑加强层6不仅包括设置在显示区对应的区域,还可以包括设置在薄膜晶体管8下方的非显示区域。具体的说为了制备方便,当薄膜晶体管8为底栅型薄膜晶体管时,通常将支撑加强层6设置在第二基底7与栅极所在层之间,也就是在栅极所在层的下方;当薄膜晶体管8为顶栅型薄膜晶体管时,通常将支撑加强层6设置在第二基底7与有源层所在层之间,也就是在有源层所在层的下方。
由于在所述第二基底7与所述薄膜晶体管8之间设置有支撑加强层6,此时可以增强阵列基板的抗弯折能力。
需要说明的是,此时该支撑加强层6同样可以为一完整的层结构。当然同样优选为,间隔设置的排列结构。采用间隔设置的排列结构是,每一个区块与子像素彩膜2在阵列基板上的投影区域(也就是显示区)对应,每一区块的面积可以与显示区面积相同,也可以略大一点。
本实施例的中的所述的支撑加强层6的材料优选为聚碳酸酯。当然也不局限于这一种材料,其他的透明且可以有支撑加强层6效果的材料也是可以的。
需要说明的是,本实施例的显示基板应用于显示面板中,如图4~10所示,特别是在如图7所示(图4的B-B`方向剖面示意图)可以看出,该阵列基板和彩膜基板中均设有支撑加强层6,故其该显示面板的抗挤压能力明显增强。
实施例2:
本实施例提供一种显示基板的制备方法,所述显示基板包括显示区和非显示区,所述制备方法包括:至少在所述显示区形成透明的支撑加强层的步骤。
具体的说:优选地,所述显示基板为彩膜基板,所述彩膜基板包括:第一基底和设置在第一基底上方的彩色滤光层,所述彩色滤光层包括:多个子像素彩膜,多个子像素彩膜间隔设置(可以在两个相邻的子像素彩膜之间设置黑矩阵,当然,黑矩阵也可以设置在阵列基板上,本实施例是以设置在两个相邻的子像素彩膜之间为例的,但是本发明不局限于这一种方式);
所述至少在所述显示基板的所述显示区形成透明的支撑加强层的步骤具体可以包括:至少在第一基底的显示区形成透明的支撑加强层;并且在本步骤之后还可以包括:
在形成支撑加强层的第一基底上形成子像素彩膜;
在完成上步骤的第一基底上形成包括隔垫物的图形。
在本实施例中支撑加强层优选还形成在彩膜基板上与所述隔垫物所对应的区域。此时支撑加强层可以将隔垫物包住,使得隔垫物的抗压能力进一步提高。
当然还可以优选地支撑加强层的面积不小于子像素彩膜的面积。
需要说明的是,该彩膜基板可以是实施例1中所述的彩膜基板,故其抗挤压能力有明显的提高,在此不详细描述。
当然还可以优选地,所述显示基板为阵列基板,所述阵列基板包括第二基底和设置在所述第二基底上方的薄膜晶体管;
所述至少在所述显示基板的所述显示区形成透明的支撑加强层的步骤具体可以包括:
至少在第二基底的显示区形成透明的支撑加强层;
在完成上述步骤的第二基底上形成所述薄膜晶体管的步骤。
需要说明的是,由于薄膜晶体管的制备为本领域技术人员所知的制备方法,在此不详细说明了。当然该阵列基板也可以是实施例1中所述的阵列基板,故其的抗挤压能力有明显提高。
实施例3:
本实施例提供一种显示装置,其包括上述显示基板。该显示装置可以为:有机发光二极管(Organic Light-Emitting Diode,简称OLED)面板、手机、平板电脑、电视机、显示器、笔记本电脑、数码相框、导航仪、各种触摸装置等任何具有显示功能的产品或部件。
由于本实施例的显示装置包括上述显示基板(彩膜基板或阵列基板),故其抗挤压能力更强,可以有效的避免由于外力挤压造成显示不良的现象。特别是在该显示装置为触控显示装置时,其抗挤压能力大大增强,此时可以延长显示装置的使用寿命。
当然,本实施例的显示装置中还可以包括其他常规结构,如电源单元、显示驱动单元等,此处不再赘述。
可以理解的是,以上实施方式仅仅是为了说明本发明的原理而采用的示例性实施方式,然而本发明并不局限于此。对于本领域内的普通技术人员而言,在不脱离本发明的精神和实质的情况下,可以做出各种变型和改进,这些变型和改进也视为本发明的保护范围。
Claims (15)
1.一种显示基板,其包括显示区和非显示区,其特征在于,至少在与所述显示区对应的区域设置有透明的支撑加强层。
2.根据权利要求1所述的显示基板,其特征在于,所述显示基板为彩膜基板,所述彩膜基板包括:第一基底和设置在所述第一基底上的彩色滤光层,所述彩色滤光层包括:多个子像素彩膜,
所述支撑加强层至少设置在所述第一基底与所述子像素彩膜之间。
3.根据权利要求2所述的显示基板,其特征在于,所述支撑加强层的面积不小于子像素彩膜的面积。
4.根据权利要求2所述的显示基板,其特征在于,所述支撑加强层的厚度与子像素彩膜的厚度之和在2.5~5um之间。
5.根据权利要求4所述的显示基板,其特征在于,所述支撑加强层的厚度在1~3um之间。
6.根据权利要求2所述的显示基板,其特征在于,所述彩膜基板上还设置有隔垫物;其中,
所述支撑加强层还设置在所述彩膜基板上与所述隔垫物所对应的区域。
7.根据权利要求2所述的显示基板,其特征在于,所述支撑加强层包括多个间隔排列的区块,各区块对应设置在所述子像素彩膜所在区域。
8.根据权利要求1所述的显示基板,其特征在于,所述显示基板为阵列基板,所述阵列基板包括第二基底和设置在所述第二基底上的薄膜晶体管,其中,
所述支撑加强层设置于所述第二基底上且位于所述薄膜晶体管的最下方膜层的下方。
9.根据权利要求1~8中任意一项所述的显示基板,其特征在于,所述支撑加强层的材料为聚碳酸酯。
10.一种显示基板的制备方法,其特征在于,所述显示基板包括显示区和非显示区,所述制备方法包括:
至少在所述显示基板的所述显示区形成透明的支撑加强层的步骤。
11.根据权利要求书10所述的显示基板的制备方法,其特征在于,所述显示基板为彩膜基板,所述彩膜基板包括:第一基底和是设置在第一基底上方的彩色滤光层,所述彩色滤光层包括:多个子像素彩膜,其中,在形成透明的支撑加强层的步骤之后,还包括:
在形成所述支撑加强层的第一基底上形成子像素彩膜的步骤。
12.根据权利要求书11所述的显示基板的制备方法,其特征在于,所述彩膜基板上还设置有隔垫物,其中,所述在形成所述支撑加强层的第一基底上形成子像素彩膜的步骤之后,还包括形成隔垫物的步骤,所述支撑加强层还形成在所述彩膜基板上与所述隔垫物所对应的区域。
13.根据权利要求11所述的显示基板的制备方法,其特征在于,所述支撑加强层的面积不小于子像素彩膜的面积。
14.根据权利要求书10所述的显示基板的制备方法,其特征在于,所述显示基板为阵列基板,所述阵列基板包括第二基底和设置在所述第二基底上方的薄膜晶体管;
所述方法在形成透明的支撑加强层的步骤之后,还包括:在形成所述支撑加强层的第二基底上形成所述薄膜晶体管的步骤。
15.一种显示装置,其特征在于,包括权利要求书1~9中任意一项所述的显示基板。
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