Classifications

• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
  • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
  • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
  • B42D25/40—Manufacture
  • B42D25/405—Marking
  • B42D25/43—Marking by removal of material
  • B42D25/445—Marking by removal of material using chemical means, e.g. etching
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
  • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
  • B41M1/00—Inking and printing with a printer's forme
  • B41M1/14—Multicolour printing
  • B41M1/18—Printing one ink over another
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
  • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
  • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
  • B42D25/20—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof characterised by a particular use or purpose
  • B42D25/29—Securities; Bank notes
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
  • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
  • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
  • B42D25/30—Identification or security features, e.g. for preventing forgery
  • B42D25/324—Reliefs
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
  • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
  • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
  • B42D25/30—Identification or security features, e.g. for preventing forgery
  • B42D25/328—Diffraction gratings; Holograms
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
  • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
  • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
  • B42D25/30—Identification or security features, e.g. for preventing forgery
  • B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
  • B42D25/364—Liquid crystals
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
  • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
  • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
  • B42D25/30—Identification or security features, e.g. for preventing forgery
  • B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
  • B42D25/373—Metallic materials
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
  • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
  • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
  • B42D25/30—Identification or security features, e.g. for preventing forgery
  • B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
  • B42D25/378—Special inks
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
  • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
  • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
  • B42D25/40—Manufacture
  • B42D25/405—Marking
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
  • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
  • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
  • B42D25/40—Manufacture
  • B42D25/405—Marking
  • B42D25/415—Marking using chemicals
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
  • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
  • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
  • B42D25/40—Manufacture
  • B42D25/405—Marking
  • B42D25/43—Marking by removal of material
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
  • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
  • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
  • B42D25/40—Manufacture
  • B42D25/45—Associating two or more layers

Definitions

• the invention relates to a multilayer body with two layers or
• Banknotes, securities, identity documents, or even used to authenticate products are based on a combination of several functional layers, which may have, for example, optical variable devices (OVD), diffractive elements, partially metallized layers or printed features.
• OLED optical variable devices
• diffractive elements diffractive elements
• partially metallized layers printed features.
• Register or register accuracy is the positionally accurate arrangement of superimposed layers relative to each other while maintaining a desired positional tolerance to understand.
• Multi-layer body with improved security against counterfeiting allows. It is a further object of the present invention to specify a particularly tamper-proof multilayer body.
• Such a method for producing a multilayer body, in particular a security element comprises the following steps: a) producing a partial first layer or a partial first one
• the partial first layer or the partial first layer system using the partial second layer or the partial second layer system as a mask register exactly to the partial second layer or the partial second Layer system is structured and wherein the partial first layer or the partial first layer system is present in a first portion and is not present in a second portion and wherein the partial second layer or the partial second layer system is present in a third portion and in one fourth subregion is absent, and wherein the third subregion overlaps the first and second subregions.
• the partial second layer or the partial second layer system As a mask, the partial first layer or the partial first Structuring layer system, it is possible to arrange the two layers or layer systems exactly in register with each other. That's it
• the second partial layer or the second partial layer system extends not only in those areas which are covered by the first partial layer or the first partial layer system - ie the first partial area - but also in that of first partial layer or the first partial layer system uncovered areas - ie the second sub-area.
• Layer system is to be understood here as any arrangement of several layers.
• the layers can move in the direction of
• Overlapping is understood to mean that the respective subareas are at least partially superimposed in the direction of the surface normals of the planes spanned by the first or second layer, ie in the stacking direction of the multilayer body.
• the generation of the two layers or layer systems does not have to take place in the stated order, ie the second partial layer or the second partial layer system can also be produced before the first partial layer or the first partial layer system.
• Layer systems can be produced directly on the substrate, directly on one another or to form any intermediate layers.
• Layer system in step c) is preferably carried out by etching. That's it
• Layer system is an etch resist, or comprises an etch resist.
• An etch resist should be understood to mean a substance which is resistant to an etchant and which can protect a substance which is sensitive to the etchant from attack by the etchant where it covers it.
• the etch resist is preferably a paint, which in particular binders, dyes, pigments, especially colored or achromatic pigments,
• Effect pigments, thin film layer systems, cholesteric liquid crystals and / or metallic or non-metallic nanoparticles may include.
• the second partial layer or the second partial layer system does not meet only one Protective function in structuring the first partial layer or the first partial layer system, but can itself develop a decorative effect. It is also possible for the second partial layer or the second partial layer system to use a plurality of different etching resists, for example resist coatings with different colors, in order to produce further visual effects.
• the etchant used for structuring the first partial layer or the first partial layer system depends on the composition of this layer or this layer system.
• HRI High Refractive Index
• Tetramethylammonium hydroxide or sodium ethylenediaminetetraacetate are, for example ⁇ tzresiste based on PVC (polyvinyl chloride), polyester resins, acrylates, which typically further film-forming substances such as nitrocellulose may be mixed.
• the etching can be assisted by mechanical agitation, for example by brushing, moving the etching bath or ultrasonic treatment.
• Temperatures for the etching process are preferably between 15 ° C and 75 ° C.
• Layer system in step c) can also be carried out preferably by a lift-off method. It is expedient if the partial second layer or the partial second layer system is a washcoat, or comprises a washcoat.
• washcoat In lift-off method, the washcoat is removed by means of a solvent.
• the washcoat must therefore be soluble in the solvent. Preference is given to Environmental reasons Water used as solvent.
• Suitable washcoats are based for example on the basis of polyvinyl alcohol (PVA) or polyvinylpyrrolidone (PVP) and may additionally contain fillers which facilitate the subsequent removal of the washcoat.
• PVA polyvinyl alcohol
• PVP polyvinylpyrrolidone
• the removal of the washcoat takes place in a solvent bath or by spraying with solvent, preferably at
• the removal of the washcoat may be mechanically assisted, for example, by brushing, moving the solvent bath, spraying, or sonicating.
• the partial first layer or the partial first layer system is applied to the washcoat, the partial first layer or the partial first layer system is removed together with the washcoat.
• the partial first layer or the partial first layer system thus remains only in
• Washcoat is part of a layer system, so that then the remaining, not detached with the washcoat components of the coating system
• Layer system in step c) can also be carried out preferably by mask exposure.
• the partial second layer or the partial second layer system itself acts as an exposure mask or is structured by means of a separate exposure mask. It is expedient here if the partial second layer or the partial second layer system is a protective lacquer or comprises a protective lacquer.
• a protective lacquer should be understood as meaning a substance which is used in one for exposing the partial first layer or the partial first one
• Layer system used absorbed wavelength range.
• the partial layers or layer systems are irradiated over the whole area with light of this wavelength range, preferably perpendicular to the layer plane.
• Typical wavelengths used for the exposure are, for example, 250 nm to 420 nm.
• the exposure is preferably carried out with a dose of 10 mJ / cm 2 to 500 mJ / cm 2 .
• the exposure times result from the sensitivities of the materials used and the power of the available exposure source.
• etch resists and conformal coatings for example by adding absorbing substances, for example so-called UV absorbers, dyes, color pigments or scattering substances, for example titanium dioxide to an etching resist.
• absorbing substances for example so-called UV absorbers, dyes, color pigments or scattering substances, for example titanium dioxide
• the protective lacquer is preferably a lacquer, which in particular binders, dyes, pigments, especially colored or achromatic pigments,
• Effect pigments, thin film layer systems, cholesteric liquid crystals and / or metallic or non-metallic nanoparticles comprises.
• Suitable protective coatings are formulated for example based on PVC, polyester or acrylates.
• the second partial layer or the second partial layer system not only fulfills a protective function when structuring the first partial layer or the first partial layer system, but can itself have a decorative effect unfold. It is also possible for the second partial layer or the second partial layer system to use a plurality of different protective lacquers, for example with different colors, in order to produce further visual effects.
• the partial first layer or the partial first layer system is a photoresist or comprises a photoresist.
• a photoresist changes its chemical and / or physical properties during exposure in a certain wavelength range, so that the
• Different properties of the exposed and unexposed areas can be exploited to selectively remove the photoresist in one of the areas. For example, when the photoresist is exposed to light, its solubility changes relative to a solvent which, after exposure to light
• Photoresist can be used. In the case of positive photoresists, the exposed area is selectively removed in the development step subsequent to the exposure, and in the case of negative photoresists the unexposed area is removed. A photoresist can also serve as a wash.
• Suitable positive photoresists are AZ 1518 or AZ 4562 from AZ Electronic Materials based on phenolic resin / diazoquinone.
• Suitable negative photoresists are, for example, AZ nLOF 2000 or ma-N 1420 from micro resist technology GmbH, for example based on cinnamic acid derivatives. These can preferably be exposed by irradiation with light in a wavelength range of 250 nm to 440 nm. The required dose depends on the respective layer thicknesses, the wavelength of the exposure and the sensitivity of the photoresists. For the development of these photoresists, for example
• Tetramethylammonium The development is preferably at
• the photoresist may in particular binders, dyes, pigments, in particular colored pigments, effect pigments, thin film layer systems, cholesteric liquid crystals and / or metallic or non-metallic
• the partial first layer or the partial first layer system and / or the partial second layer or the partial second layer system is first produced over the entire surface or at least in large areas and then patterned .
• the full-surface or large-scale generating can be done for example by printing or steaming.
• the subsequent structuring of the partial first layer or the partial first layer system and / or the partial second layer or the partial second layer system in steps a) and b) is then preferably carried out by etching, lift-off or mask exposure. This takes place analogously to the structuring of the partial first layer or of the partial first layer system in step c), as described above.
• washcoats can be part of one or both of the Layer systems or be applied as additional layers. These layers can in turn remain as part of the layer systems or be removed again in a further step.
• mask exposure it is also possible to use an external exposure mask which is placed on the respective layer or the respective layer system.
• methods are also possible in which certain areas of the first layer or the first layer system are partially removed, for example by means of a laser. Such methods are particularly suitable for the individual marking of security elements.
• step b) it is also possible for structuring of the partial second layer or of the partial second layer system in step b) to simultaneously structure the partial first layer or the partial first layer system according to step c). This makes a particularly easy and fast
• step a) and / or b) the partial first layer or the partial first layer system and / or the partial second layer or the partial second layer system are generated in a structured manner.
• a printing method is preferably used, in particular gravure printing, flexographic printing, offset printing, screen printing or digital printing, in particular
• the partial first layer or the partial first layer system is or a reflective layer of a particular opaque metal and / or a particular transparent or translucent material having a high refractive index (thus, a high real part of the complex Refractive index meant), and / or at least one single or multi-colored
• the partial second layer or the partial second layer system is at least one transparent, translucent or substantially opaque monochrome or multicolor lacquer layer, in particular an etching and / or protective lacquer, and / or a Fabry-Perot layer system or includes.
• Layer system can produce a variety of optical effects that further contribute to anti-counterfeiting security and make the visual appearance particularly appealing.
• Layer system and / or the partial second layer or the partial second layer system in the form of at least one motif, pattern, symbol, image, logo or alphanumeric characters, in particular numbers or letters, applied.
• the layers or layer systems can also already before or after the structuring of the partial first layer or the partial first layer system to such a motif, pattern, symbol, image, logo or alphanumeric characters, in particular numbers or
• the partial first layer or the partial first layer system and / or the partial second layer or the partial second layer system in the form of a one- or two-dimensional line and / or Dot matrix is applied.
• transformed line grids are possible, for example with wavy lines, which can also have a variable line width.
• the points of a dot matrix can have any geometries and / or sizes and need not be circular disk-shaped.
• dot patterns of triangular, rectangular, arbitrary polygonal, star-shaped or in the form of symbols formed points are possible.
• the dot matrix can also be brewed from differently sized and / or differently shaped dots.
• further graphic effects such as halftone images, can be generated.
• the line and / or dot grid in this case has a screen width of less than 300 ⁇ , preferably of less than 200 ⁇ and more than 25 ⁇ and preferably of more than 50 ⁇ on.
• the grid width can also vary across the grid. Line weights or dot diameter amount
• the substrate is a carrier layer, in particular a film made of a plastic, preferably polyester, in particular PET
• a release layer for example of a polymer lacquer, e.g. PMMA (polymethyl methacrylate) or waxy
• Such a carrier layer gives the multilayer body in its manufacture and subsequent handling stability and protects it from damage.
• a release layer allows for easy detachment of the Security elements of unnecessary layers, such as the carrier layer, so that it can be attached to the desired document or object, in particular in the form of a hot stamping foil with the carrier layer as a carrier film and the security element as from the carrier film to a substrate to be transferred transfer layer.
• the substrate comprises a replicating layer having a diffractive surface relief.
• the replication layer may be made of a thermoplastic, i. thermally curable or dryable replicate varnish or a UV-curable replicate varnish or a mixture of such varnishes.
• Surface relief is an optically variable element, in particular a hologram, Kinegram® or Trustseal®, a preferably sinusoidal diffraction grating, an asymmetric relief structure, a blaze grating, a preferably isotropic or anisotropic matt structure, or a light-diffractive and / or refractive and / or light-focusing microstructure. or nanostructure, a binary or continuous Fresnel lens, a microprism structure, a microlens structure, or a combination structure formed therefrom.
• a third layer or a third layer system is applied, which or which
• an HRI layer and / or an adhesive layer is or comprises.
• Adhesive layers can be used to secure the multilayer body to a substrate, for example a document to be secured.
• HRI layers are particularly useful in the context of planar
• extended relief structures which can be made visible through the transparent HRI layer even in areas where the first and / or second layer or the first and / or second layer system does not provide an opaque metallized layer.
• a material for an HRI layer is suitable
• a multi-layer body obtainable in this way can be used as a security element, in particular for a security document, in particular a banknote, a security, an identification document, a passport or a credit card.
• Fig. 1 A-C a multilayer body and the manufacturing steps of a
• Multilayer body having a metal layer and a monochromatic lacquer layer
• Fig. 2A-C a multilayer body and the manufacturing steps of a
• Multilayer body having a metal layer and a bicolor lacquer layer
• Fig. 6 a multilayer body with a metal layer, a monochrome
• Lacquer layer, a diffractive structure and an HRI layer 7A-C: a multilayer body and the manufacturing steps of a
• Multilayer body with two metal layers and a monochrome lacquer layer Multilayer body with two metal layers and a monochrome lacquer layer
• Multilayer body having a metal layer, an HRI layer and a monochromatic lacquer layer;
• Multilayer body with a finely structured metal layer and a monochromatic lacquer layer Multilayer body with a finely structured metal layer and a monochromatic lacquer layer
• FIG. 9 Production of a multilayer body according to FIG. 9;
• Fig. 1 1 a sectional view through a second intermediate product in the
• FIG. 12 is a sectional view through a third intermediate product during the production of a multilayer body according to FIG. 9;
• FIG. 12 is a sectional view through a third intermediate product during the production of a multilayer body according to FIG. 9;
• FIG. 13 shows a sectional view through the finished multi-layer body according to FIG.
• FIG. 14 shows a detailed view of the structures for the metal and lacquer layer for the multi-layer body according to FIG. 9;
• FIGS. 15A-C show a multilayer body and production steps of a
• Multilayer body having a metal layer and a front side lacquer layer
• 16A-C a multilayer body and manufacturing steps of a
• Multilayer body with a rastered metal and lacquer layer Multilayer body with a rastered metal and lacquer layer
• Multilayer body with a finely structured metal layer and a multicolor lacquer layer Multilayer body with a finely structured metal layer and a multicolor lacquer layer
• Fig. 18A-E a multilayer body and manufacturing steps of a
• Fig. 1 shows a first embodiment of a multi-layer body 10, which can be used as a security element for banknotes, securities, identity documents, tickets or protected product packaging.
• Multilayer body 10 comprises a first layer 11 which, as a metal layer, for example, made of aluminum, and a second layer 12, which is formed as a colored ⁇ tzresistlack.
• a metal layer for example, made of aluminum
• a second layer 12 which is formed as a colored ⁇ tzresistlack.
• copper, silver or chrome are also suitable or even a wide variety of metal alloys.
• the first layer 1 1 is first produced for the production of the multi-layer body 10, which can be done for example by vapor deposition on a not shown substrate.
• the vapor deposition is preferably carried out in vacuo by thermal evaporation, by electron beam evaporation or by sputtering.
• the layer thickness of the first layer 1 1 is
• nm preferably 5 nm to 100 nm, more preferably 15 nm to 40 nm.
• the first vapor-deposited layer can be partially removed by means of known methods, for example by the partial application of an etching resist after vapor deposition and subsequent etching, including removal of the etching resist; by the partial application of a washcoat before the
• the substrate is not fully evaporated, the layer 1 1 is rather partially generated so that it is present in a first region 1 1 1 and in a second region 1 12 is absent.
• various methods are known, such as shielding by means of a follower mask or pressure of an oil, which prevents the deposition of the metal layer in the vapor deposition process.
• a replicated diffractive structure for example in the form of an optically variable device (OVD), in particular a hologram, Kinegram® or Trustseal®, a preferably sinusoidal diffraction grating, an asymmetrical relief structure, a blaze grating, may already be present on the substrate.
• ODD optically variable device
• Microprism structure a microlens structure or a combination structure thereof. But this does not necessarily have to be present.
• the first layer 1 1 does not have to be contiguous, as shown, but can be arbitrarily structured and have an arbitrary shape.
• the second layer 12 extends both into the region 1 1 1 covered by the first layer 1 1, but does not cover it completely, nor in the region 1 12 not covered by the first layer 11. If a replicated diffractive structure is present, the pressure is preferably in the register to this structure, with tolerances of +/- 1 mm, preferably +/- 0.5 mm are desired, depending on the printing method.
• the lacquer used to print the second layer 12 is an etch resist, that is to say it is resistant to an etchant which contains the metal of the first layer 11 can dissolve.
• this etchant may be, for example, caustic soda.
• an etch resist is then suitable, for example, a paint based on PVC / PVAc (polyvinyl acetate) copolymer.
• the paint further contains dyes, pigments, especially colored or achromatic pigments or effect pigments, thin film layer systems or cholesteric liquid crystals or nanoparticles, so that it produces an optically visible effect.
• the etching is then preferably carried out at a concentration of 0.1% to 5%, a temperature of the etchant of 15 ° C to 75 ° C over a period of 5 seconds to 100 seconds.
• a suitable etch resist is, for example, a lacquer based on PVC / PVAc (polyvinyl acetate) copolymer, which is printed in a layer thickness of preferably from 0.1 ⁇ m to 10 ⁇ m. In the areas not covered by the second layer, the first layer 11 dissolves.
• the etching may be followed by a rinsing process, for example with water and a drying step.
• FIG. 1 c shows the resulting multi-layer body 10 from the side opposite the pressure side. It can be seen that the structures of the first layer 1 1 and second layer 12 seamlessly merge into one another, ie are arranged in register. This site is also the typical one
• the first layer 11 acts as a reflection layer, so that the diffractive structure is particularly clearly visible in the region of the first layer 11.
• an additional coating with an adhesive layer not shown If the adhesive layer can be completely extinguished, the diffractive structure can be completely extinguished in the region 1 1 1 not covered by the first layer 11
• the adhesive layer simultaneously serves to apply the multi-layer body 10 to a substrate, for example a banknote.
• the color can be
• the second layer 12 is then preferably a protective lacquer, for example a transparent or opaque lacquer with a UV blocker. Benzophenone derivatives or finely divided titanium dioxide are particularly suitable for this purpose.
• the second layer 12 is then preferably printed overlapping with the boundary regions of the color layers of the first layer 1 1.
• the second layer 12 is in the form of Guilloche lines
• the finished multi-layer body 10 shows guilloche lines in which color transitions are visible, that is to say a so-called iris print.
• the multilayer body 10 shown in FIG. 2 is produced analogously to FIG. 1. Only in the second production step according to FIG. 2 b is the second layer 12 formed as a layer system by printing of two differently colored paints 121, 122.
• the two paints 121, 122 may overlap in some areas and are preferably printed in the register with a tolerance of preferably less than 0.5 mm and more preferably less than 0.2 mm.
• the multilayer body 10 according to FIG. 2c results.
• the rays formed by the second layer 12 of the star-shaped motif shown now appear alternately in the colors of the paints 121, 122. In addition visible in the visible range
• Embodiments are also used lacquers which are UV-active or can be excited by IR irradiation or show optically variable effects, such as OVI® colors, or which are electrically or magnetically detectable, for example by the addition of corresponding metallic nanoparticles.
• Figures 3 to 5 show the manufacturing steps of an alternative
• Multilayer body 10 which, however, in the basic structure corresponds to that shown in Fig. 2.
• the essential difference lies in the fact that the second layer 12 is not already printed in a structured manner in this case, but first applied over the entire surface or at least in large areas and
• a release layer 14 and a replication layer 15 of, for example, a thermoplastic material or a radiation- or temperature-curable replication lacquer are first applied to a carrier layer 13 made of polyester, in particular PET, these layers in turn may consist of several layers.
• Diffractive structures 151 are then formed in the replication layer 15, for example by embossing with a metallic one
• the first layer 1 1 is now applied, which in this case as a layer of a transparent
• high refractive index material for example of zinc sulfide or titanium dioxide is formed.
• HRI High Refractive Index
• the second layer 12 which in turn consists of two different colored paints 121, 122 adjacent to each other.
• the paints 121, 122 are UV-sensitive photoresists, such as AZ 1518 from AZ Electronic Materials based on phenolic resin / diazoquinone.
• a mask layer 16 is partially printed on the second layer 12. The mask layer 16 simultaneously serves as an etching and protective lacquer.
• an Atzresistlack for example based on PVC / PVAc (polyvinyl acetate) copolymer, for example, be provided with UV-absorbing titanium dioxide particles or other UV blockers. Subsequently, an exposure with UV light from the side of the
• the exposure is preferably carried out at a wavelength of 365 nm with a dose of 25 mJ / cm 2 to 500 mJ / cm 2 .
• the intermediate product shown in Fig. 3 is then exposed to a lye bath, which simultaneously acts as a developer and etching bath.
• a lye bath which simultaneously acts as a developer and etching bath.
• NaOH in a preferred concentration of 0.05% to 2.5%, which preferably acts on the intermediate for a period of 2 seconds to 60 seconds at a temperature of 20 ° C to 65 ° C.
• FIG. 4 shows a further multilayer body 10. The order of
• Layers 1 1 and 12 are analogous to that shown in FIG. 1
• Diffractive structures are thus recognizable in the opaque metallic regions of the first layer 11 and in the regions of the transparent HRI layer 17, but typically not in the pressure regions of the second layer 12, because the diffractive structures are extinguished by the color coat of the second layer 12 printed directly on the diffractive structures, because the color coat preferably has a similar refractive index (approximately 1.5) as the replication layer and therefore no optically effective boundary layer is formed between color coat and replication layer. It should be preferred to the
• FIG. 7a-c corresponds in turn to the
• Embodiment of FIG. 1 The only difference is that for the first layer 1 1 two different metals 1 13, 1 14, such as Al and Cu are used.
• the two metals 1 13, 1 14 can be spatially separated, adjacent or partially overlapping.
• Fig. 7b again shows how the second layer 12 is printed on the first layer 1 1, viewed from the printing side.
• Fig. 7c shows the finished multilayer body viewed from the metal side.
• the structuring of the first layer 11 can take place in two steps, since, for example, different etchants have to be used for the two metals or metal alloys used. In the case of the use of Al and Cu for the first layer 11, these are, for example, NaOH and FeCb. However, since the same printed mask, namely the second layer 12, is used for structuring, the transitions of the two metals 1, 13, 14 of FIG first layer 1 1 in the perfect register, that is in exact relative position to the pressure of the second layer 12th
• FIG. 8 again corresponds to the
• Embodiment of FIG. 1 only one more transparent HRI layer 17 is applied.
• an opaque metal 1 13, for example aluminum applied in the manner already described.
• the HRI layer 17 of ZnS or ⁇ 2 is applied, which can also be done by vapor deposition or sputtering, so that a layer arrangement according to FIG. 8a is present.
• the HRI layer 17 may also be present only partially, adjacent to the metal layer 1 13, or they also overlap at least partially.
• the metal layer 13 and the HRI layer 17 together form the first layer 11.
• Subsequently, with an example red color layer as the second layer 12 is overprinted, so that the situation shown in FIG. 8b results. The viewing is done from the printing side.
• the non-overprinted areas of the two reflection layers 13, 17 are removed, if necessary also in two process steps with chemicals adapted to the layers to be removed, e.g. two different alkalis. While NaOH under the conditions described can be used to remove the aluminum content, to remove an HRI layer of ZnS it is also preferable to use NaOH or Na2CO3 at a temperature of 20 ° C to 60 ° C for a period of 5
• the finished multi-layer body is seen in Fig. 8c from the side of the first layer 1 first Compared to FIG. 1, the effect of the diffractive structures in the substrate can also be recognized in the non-metallic regions in which the HRI layer 17 is present, while at the same time the color print of the second layer 12 can be seen because between the printed and the diffractive Structures still the HRI layer 17 is arranged as an optical boundary layer.
• the color coat can be made transparent, translucent or largely opaque.
• the embodiment according to FIG. 9 again corresponds to that according to FIG. 1.
• the difference lies merely in the fact that the first layer 1 1 is finely structured, here as repetitions of the number "50.”
• the production process comprises a first step in which the finely structured first layer 1 1 according to FIG Structured metal layers can be produced, for example, in the following manner: by means of a high-resolution
• the layer 1 1 consists of a fine grid, which consists for example of a microscopic text.
• the colored printing of the second layer 12 according to FIG. 9b takes place.
• the second layer 12 in this example is a comparatively roughly structured motif in the form of the large number "50.”
• the second layer 12 can likewise be very finely structured.
• the colored print of the layer 12 serves as a mask for
• first layer 1 1 and the second layer 12 are, for example, finely structured line patterns, depending on their relative position to each other
• Overlay structure can produce, for example, a desired moiré effect.
• the fine structuring of the first layer 11 may, for example, also be described as guilloche of a multiplicity of fine lines, preferably metallic
• the colored print can have several different colored areas, for example in the form of a country flag (as shown here) and / or a geographical contour of a country or in the form of a coat of arms or another multi-colored motif.
• the colored print of the layer 12 serves as a mask for
• finely structured lines are present only in the colored areas and recognizable in a colored area recognizable finely structured lines continue in register in an adjacent further colored area.
• the printing of the second layer 12 takes place according to FIG. 18B.
• a colorless, preferably transparent ⁇ tzresist with a UV absorber is used.
• This etch resist is then intended to fulfill a dual function: On the one hand, the etch resist serves for further substructuring of the finely structured first layer 11 by means of etching and, on the other hand, later as an exposure mask for structuring a color region.
• the fine structure of the first layer 11 is removed in the regions by means of etching in which the etching resist is not provided. Subsequently, a colored photoresist is printed, which at least the
• the photoresist may also overlap with the etch resist.
• the colored photoresist is cured in those areas that have no transparent ⁇ tzresist and can be removed in the remaining areas register accurate to the etch resist and the protected by the etch resist areas of the finely structured first layer 1.
• FIGS 10 to 13 show the manufacturing steps of an alternative
• Multilayer body 10 which, however, in the basic structure corresponds to that shown in Fig. 9.
• the essential difference is that the second layer 12 is not already printed structured in this case, but initially applied over the entire surface or at least in large areas and
• a release layer 14 and a replication layer 15 are first applied to a carrier layer 13 made of polyester or PET. Diffractive structures 151 are then formed in the replication layer 15. The first layer 11 is then applied to the replication layer 15, which in this case is in the form of a finely structured metal layer, for example in the form of a grid.
• the second layer 12 is then applied over the entire surface of the first layer 1 1, which layer is made of two different-colored paints 121, 122 is adjacent to each other.
• the paints 121, 122 are UV-sensitive colored photoresists.
• a mask layer 16 is partially printed on the second layer 12, so that shown in FIG.
• the mask layer 16 may be in the form of another raster.
• the mask layer 16 simultaneously serves as an etching and protective lacquer.
• an etching resist can for example be provided with UV-absorbing titanium dioxide particles or other UV blockers. Subsequently, an exposure with UV light from the side of the
• first layer 11 and the second layer 12 Examples of possible rasters of the first layer 11 and the second layer 12 are shown in FIG. Of course, other structures, such as dot patterns, are possible in addition to the line and motif grids shown. Furthermore, the first layer 11 and / or the second layer 12 can be provided with a further grid of diffractive structures on the respective replication layer of the first and / or second layer. , As a result, not only can overlay effects result from the superposition of the fine screens of the first and second layers 11, 12, but also a further, additional one
• the overlay effects can vary greatly depending on how similar or different the screen rulings and / or screen shapes are for the rasters involved in the overlay.
• the viewing angle and / or illumination angle dependence of the diffractive pattern can lead to surprising optical effects in this complex overlay.
• the exemplary embodiments discussed so far are based on first producing a partial reflection layer of opaque metal or transparent HRI material (first layer 11) and then applying a pressure (second layer 12).
• the pressure of the second layer 12 serves as
• Mask layer for example, analogous to a ⁇ tzresistdruck, for further structuring of the partial metal layer 1 first
• first a pressure (second layer 12) is introduced into the starting material, into which subsequently a diffractive structure (not shown) is formed (see FIG. 15 a).
• a first partial metal region (first layer 11) is produced, as shown in FIG. 15b.
• the existing already in the starting material pressure as
• the materials and process parameters used correspond to those already described above.
• the second layer 12 is thus generated temporally and locally completely independent of the first layer 1 1.
• the second layer 12 may, for example, also be arranged on the rear side of the substrate, not shown, and the first layer 11 on the front side thereof.
• Fig. 16 shows a further alternative embodiment of a
• Multi-layer body 10 As shown in Fig. 16a, first the first layer 1 1 as a metal layer with a recessed lettering 19 is generated. As shown in FIG. 16b, the second layer 12 is printed on the first layer 11 as a wave-like layered lacquer layer and then serves as
• Multi-layer body 10 in which the colored lines of the second layer 12 in the area of the recessed lettering in the perfect register to the remaining metallic lines of the first layer 1 1 outside of the
• the line widths need not be constant, but may additionally be modulated, resulting in different local area densities of the grid, which form additional information.
• the line widths are preferably from 25 ⁇ to 150 ⁇ ..
• the screen ruling can be modulated and is preferably less than 300 ⁇ and preferably less than 200 ⁇ , and preferably more than 25 ⁇ .

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• 2013
  • 2013-11-29 DE DE102013113283.9A patent/DE102013113283A1/de not_active Withdrawn
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