WO2015055099A1 - 彩膜基板及制备方法、显示面板 - Google Patents

彩膜基板及制备方法、显示面板 Download PDF

Info

Publication number
WO2015055099A1
WO2015055099A1 PCT/CN2014/088367 CN2014088367W WO2015055099A1 WO 2015055099 A1 WO2015055099 A1 WO 2015055099A1 CN 2014088367 W CN2014088367 W CN 2014088367W WO 2015055099 A1 WO2015055099 A1 WO 2015055099A1
Authority
WO
WIPO (PCT)
Prior art keywords
layer
spacer
pillow
substrate
photoresist
Prior art date
Application number
PCT/CN2014/088367
Other languages
English (en)
French (fr)
Inventor
郭磊
尹傛俊
涂志中
惠大胜
Original Assignee
京东方科技集团股份有限公司
合肥京东方光电科技有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 京东方科技集团股份有限公司, 合肥京东方光电科技有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US14/655,535 priority Critical patent/US9880427B2/en
Publication of WO2015055099A1 publication Critical patent/WO2015055099A1/zh

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13396—Spacers having different sizes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13398—Spacer materials; Spacer properties

Definitions

  • Embodiments of the present invention relate to a color film substrate, a method of fabricating the same, and a display panel using the color film substrate.
  • the flat panel display device Compared with the conventional cathode ray tube display device, the flat panel display device has the advantages of light weight, low driving voltage, no flickering jitter, and long service life; the flat panel display device is divided into an active light emitting display device and a passive light emitting display device; for example, a thin film transistor liquid crystal
  • a Thin Film Transistor-Liquid Crystal Display (TFT-LCD) is a passive light-emitting display device widely used in televisions due to its advantages of stable picture, vivid image, low radiation, space saving and energy saving. Electronic products such as mobile phones and monitors have occupied a dominant position in the field of flat display.
  • the liquid crystal display panel known by the inventors mainly comprises a color filter substrate and an array substrate of the pair of boxes, and a liquid crystal layer is further interposed between the color film substrate and the array substrate.
  • the thickness of the liquid crystal layer (Cell Gap) is mainly controlled by the height of the spacer disposed between the array substrate and the color filter substrate, and the thickness of the liquid crystal layer is important for the structural parameters and display quality of the liquid crystal display device. influences.
  • the spacers currently used are usually column spacers (PS, Post Spacer), and the column spacers are generally formed on a black matrix on a color filter substrate by a process such as masking, photolithography or the like.
  • a liquid crystal display panel is formed, and the column spacer between the color filter substrate and the array substrate supports the two substrates and functions as a buffer to maintain a predetermined thickness. Ensure that the picture display is stable.
  • FIG. 1 shows a cross-sectional structural view of a three-stage column spacer (Triple PS) known to the inventors, including a main spacer 14 (Main PS) disposed on a black matrix, and a first auxiliary spacer.
  • the object 15 and the second auxiliary spacer 16 function as a three-stage buffer.
  • the main spacer 14 is usually in a compressed state, and the main purpose is to ensure prevention.
  • the gravity Mura appears on the LCD panel.
  • the gravity Mura means that when the liquid crystal display panel is placed vertically, the liquid crystal material accumulates to the lower portion of the liquid crystal display panel due to gravity, causing the lower portion of the liquid crystal display panel to expand, and a vacuum phenomenon occurs at the upper portion of the liquid crystal display panel, under the action of external atmospheric pressure, The upper portion of the liquid crystal display panel is squeezed, resulting in a serious inconsistency in the thickness of the upper and lower portions of the liquid crystal display panel, resulting in uneven display of the screen. In a large-sized liquid crystal display panel, gravity Mura is more likely to occur due to a larger amount of liquid crystal perfused.
  • the main spacer 14 is usually mainly disposed at the upper portion of the liquid crystal display panel, and when the liquid crystal display panel is vertically placed, the occurrence of gravity Mura is prevented by its own elastic force. Therefore, the amount of compression of the main spacer 14 is strongly related to the upper limit of the amount of liquid crystal which the liquid crystal display panel can permeate and the anti-gravity Mura ability. To put it simply, the larger the amount of compression of the main spacer 14 is, the more it can withstand the stronger pressure and the change of the thickness of the box does not change, so the less likely the gravity Mura appears, and correspondingly, more liquid crystal can be poured. Material to enhance the display.
  • the auxiliary pillows are usually made on the array substrate by the thickness of each functional film layer 23.
  • the layer 24, the main spacer 14 is in press contact with the auxiliary pillow layer 24, and the amount of compression of the main spacer 14 is increased by the auxiliary pillow layer 24.
  • the thickness of the auxiliary pillow layer 24 is determined by the thickness of each functional film layer 23 on the array substrate, for example, when the auxiliary pillow layer is disposed in the same layer as the gate metal layer, the thickness of the auxiliary pillow layer is equal to the gate metal.
  • the thickness of the layer when the auxiliary pillow layer is disposed in the same layer as the passivation layer, the thickness of the auxiliary pillow layer is equal to the thickness of the passivation layer; and the thickness of each functional film layer on the array substrate is a fixed value, and cannot be arbitrarily changed. Therefore, the thickness of the auxiliary pillow layer 24 cannot be continuously changed, that is, it can only satisfy certain specific compression amounts, and it is difficult to meet various varying compression demands.
  • a continuous change in the amount of compression can be achieved by a continuous change in the height of the spacer itself, but in practice the height of the spacer is determined by the diameter of the spacer, once the diameter of the spacer is based on the array substrate. After the size and the size parameters of the black matrix are determined, it means that the height of the spacer can only be changed within a short range, so that the continuous change of the compression amount cannot be truly realized, that is, the variable compression demand cannot be satisfied. .
  • the oxide semiconductor thin film transistor liquid crystal display panel is relatively thin compared to the conventional amorphous silicon thin film transistor liquid crystal display panel, and the functional film layer formed by the oxide semiconductor is generally 0.05 ⁇ m, which is much smaller than the function of the conventional amorphous silicon.
  • the thickness of the film layer (generally 0.23 ⁇ m), which reduces the thickness of the array substrate, but also reduces the compression of the main spacer by nearly 10% (the percentage of compression to its original height), usually the main spacer
  • the maximum compression is only about 15% (the percentage of compression is the percentage of its original height), and the compression of the main spacer is insufficient, which is likely to cause the occurrence of gravity Mura; since the thickness of the auxiliary pillow layer is relatively fixed, It is necessary to increase the height of the spacer, and increasing the height of the spacer means that the diameter of the spacer needs to be increased, resulting in a substantial increase in the cost of the material.
  • the diameter and height of the spacer do not change indefinitely. All of the above factors limit the design of the spacers, resulting in a small amount of spacer compression of the Oxide-TFT liquid crystal display panel, the risk of gravity Mura, and the cost of the spacer material and the production capacity. Reduced problems.
  • Embodiments of the present invention provide a color filter substrate that can flexibly control the amount of compression of a spacer, a method of preparing the color filter substrate, and a display panel.
  • an embodiment of the present invention provides a color filter substrate including: a first substrate; a black matrix disposed on the first substrate; and a plurality of spacers disposed on the black Above the matrix, at least one of the spacers and the black matrix is provided with a pillow layer.
  • embodiments of the present invention provide a method of preparing the above color film substrate, including the step of forming a pillow layer as described above.
  • an embodiment of the present invention further provides a display panel, including: a color film substrate, as described above; and an array substrate, and the color film substrate pair box, at least a portion of which is disposed on the pillow A spacer on the layer is in press contact with the array substrate.
  • FIG. 1 is a schematic cross-sectional structural view of a portion of a spacer in a conventional display panel
  • FIG. 2 is a schematic cross-sectional view showing another portion of a spacer in a conventional display panel
  • FIG. 3 is a schematic cross-sectional view showing a portion of a spacer in a color film substrate and a display panel according to Embodiment 1 of the present invention
  • 4a-4b are cross-sectional views showing steps of a method of preparing a color filter substrate when a black matrix is formed of a photosensitive black resin according to Embodiment 1 of the present invention
  • 5a-5g are cross-sectional views showing steps of a method for preparing a color filter substrate when a black matrix is formed of a non-photosensitive black resin according to Embodiment 1 of the present invention
  • FIG. 6 is another cross-sectional structural view of a portion of a spacer in a color film substrate and a display panel according to Embodiment 1 of the present invention.
  • FIG. 7 is a cross-sectional structural view showing a portion of a spacer in a color film substrate and a display panel according to Embodiment 2 of the present invention.
  • FIG. 8 is another cross-sectional structural view of a portion of a spacer in a color film substrate and a display panel according to Embodiment 2 of the present invention.
  • the color film substrate provided by the embodiment of the invention includes a first substrate substrate, a black matrix disposed on the first substrate, and a plurality of spacers disposed on the black matrix; at least a portion of the spacer and the black
  • a pillow layer is arranged between the matrices, and the cushion layer is used to increase the compression amount of the spacers, thereby reducing the possibility of generating gravity Mura, improving the display quality of the screen and the reliability of the display device.
  • the thickness of the pillow layer can be flexibly set according to requirements in the embodiment of the present invention, the thickness of the pillow layer can be continuously changed, so that the compression amount of the spacer can be flexibly controlled, and is not limited to the prior art.
  • the embodiments of the present invention will be described in more detail below with reference to the first to fourth embodiments.
  • the color film substrate includes: a first substrate substrate 11; a black matrix 12 and a color resist layer 17 disposed on the first substrate substrate 11. And a plurality of spacers disposed on the black matrix 12.
  • the spacer in this embodiment includes a main spacer 14, a first auxiliary spacer 15 and a second auxiliary spacer 16, and the main spacer 14 is disposed on the pillow layer 13, and the first auxiliary spacer 15 and a second auxiliary spacer 16 are disposed directly on the black matrix 12; wherein the main spacer 14 is mainly used to prevent gravity Mura, and the first auxiliary spacer 15 is mainly used to prevent Push (Mush), second The auxiliary spacer 16 is mainly used to prevent blackening of the Mura.
  • first auxiliary spacer 15 and the second auxiliary spacer 16 may not be provided, or only one of the first auxiliary spacer 15 and the second auxiliary spacer 16 may be provided, or other types may be provided.
  • the auxiliary spacer or the like is not limited to the ones listed in the embodiment.
  • a pillow layer 13 is disposed between the main spacer 14 and the black matrix 12, and the compression amount of the main spacer 14 is increased by the pillow layer 13. Reduces the risk of gravity Mura.
  • the embodiment further provides a method for preparing the above color film substrate.
  • the color film substrate preparation method further includes the step of forming the pillow layer 13.
  • the pillow layer 13 may be formed separately between the first base substrate 11 and the black matrix 12, or may be formed separately on the black matrix 12.
  • the pillow layer 13 and the black matrix 12 may be an integrated structure, that is, The pillow layer 13 can be formed while forming the black matrix 12.
  • the black matrix 12 known to the inventors is generally made of a resin material containing a black colorant (for example, carbon black), that is, a black resin, and the resin black matrix 12 has an advantage of less reflection and low cost.
  • the black resin is divided into a photosensitive resin and a non-photosensitive resin.
  • the black matrix 12 can be directly prepared by a photolithography process; for the non-photosensitive black resin, the black matrix 12 can be prepared by a patterning process using a photoresist.
  • the black matrix 12 and the pillow layer 13 are prepared using a photosensitive black resin, the following steps are included:
  • the first substrate substrate 11 may be a glass substrate or a quartz substrate or the like; coating a photosensitive black resin layer on the first substrate substrate 11 or The layer of light absorbing material; the thickness of the coated black resin layer directly determines the thickness of the finally formed pillow layer 13; the thickness of the pillow layer 13 needs to be according to the thickness of the display panel to be finally formed, the main spacer 14
  • the amount of compression and other factors are specifically set. Illustratively, it is calculated that the sum of the thicknesses of the pillow layer 13 and the black matrix 12 is 1.05 to 3.15 ⁇ m, and correspondingly, the thickness of the coated black resin layer is 1.05 to 3.15 ⁇ m.
  • this step mainly includes:
  • the photosensitive black resin layer 33 is exposed through the two-tone mask 31 to form a black resin completely reserved region corresponding to the pillow layer 13, and a black resin semi-reserved region corresponding to the black matrix 12 region. And a black resin completely removed region corresponding to the region outside the above region;
  • the continuous variation of the thickness of the photosensitive black resin layer can be ensured, so that the step difference between the black matrix 12 and the pillow layer 13 can be flexibly controlled, and can be flexibly set according to requirements.
  • the steps are as follows:
  • the first substrate 11 may be a glass substrate or a quartz substrate; and coating a non-photosensitive black resin layer or other light absorbing material layer on the first substrate 11
  • the thickness of the coated black resin layer directly determines the thickness of the finally formed pillow layer 13; the thickness of the pillow layer 13 needs to be based on factors such as the thickness of the display panel to be formed finally, the amount of compression of the main spacer 14 and the like. (For example, if an auxiliary spacer is provided on the array substrate, it is also necessary to consider the influence of the auxiliary spacer) a specific setting. Illustratively, it is calculated that the sum of the thicknesses of the pillow layer 13 and the black matrix 12 is 1.05 to 3.15 ⁇ m, and accordingly, the thickness of the coated black resin needs to be 1.05 to 3.15 ⁇ m.
  • the black matrix 12 and the pillow layer 13 are formed by a patterning process.
  • step S2 comprises the steps of:
  • the continuous variation of the thickness of the non-photosensitive black resin layer 33 can be ensured, so that the step difference between the black matrix 12 and the pillow layer 13 can be flexibly controlled, and can be flexibly adjusted according to requirements.
  • the thickness of the pillow layer 13 is set.
  • the method for preparing a color film substrate in this embodiment is merely an implementation method for preparing the color filter substrate provided by the embodiment. In actual use, the method can also be changed by increasing or decreasing the number of processes, selecting different materials or material combinations. Embodiments of the invention are implemented.
  • the embodiment further provides a display panel using the color film substrate; as shown in FIG. 3, the display panel includes the color film substrate and the array substrate disposed on the color filter substrate, and the array substrate includes a second lining a base substrate 21 and a plurality of functional film layers 23 formed on the second substrate substrate 21; the main spacers 14 disposed on the pillow layer 13 are in press contact with the array substrate, the first auxiliary spacers 15 and the array The substrate can be contacted without a compression amount, and the second auxiliary spacer 16 is suspended and does not contact the array substrate.
  • the compression amount of the main spacer 14 in press contact with the array substrate is 10% to 20% of the initial height of the main spacer 14; for example, For 15% and so on.
  • the first embodiment Pressing contact area of the two substrate substrates 21 or the functional film layer 23 with the spacer and the array substrate
  • the auxiliary pillow layer 24 is provided at a position corresponding to the domain; the function, structure and preparation method of the auxiliary pillow layer 24 are similar to the related prior art.
  • a method for preparing the above display panel is further provided.
  • the method for preparing the display panel further includes using the color film substrate preparation method provided in the embodiment, in addition to the conventional steps for manufacturing the display substrate.
  • the functional film layer 23 is formed on the second substrate of the array substrate, for example, a gate metal layer, a gate insulating layer, an active layer, a source/drain metal layer, a passivation layer, and a transparent layer are sequentially formed. Electrode layer or the like (of course, the order in which the functional film layers 23 are disposed and the selection of the functional film layer 23 may be changed according to requirements, for example, an etching barrier layer may be provided between the active layer and the passivation layer. ).
  • the method of manufacturing a display panel according to an embodiment of the present invention further includes a method of forming an auxiliary pillow layer on the array substrate.
  • the gate metal layer and the auxiliary pillow layer 24 are simultaneously formed by a patterning process:
  • the second substrate may be a glass substrate or a quartz substrate or the like;
  • the metal thin film may be Cr, W, Ti, Ta, Mo, a single layer film formed of a metal such as Al or Cu or an alloy thereof, or a composite film composed of a plurality of metal thin films;
  • the thickness of the photoresist in the photoresist retention region is not changed, and the photoresist in the photoresist removal region is removed;
  • the remaining photoresist is stripped, and the remaining metal film includes the gate electrode and the gate metal layer of the scan line and the auxiliary pillow layer 24, and the center of the auxiliary pillow layer 24 coincides with the center of the sleeper layer 13,
  • the shape of the auxiliary pillow layer 24 may be square, polygonal, circular, or the like.
  • a process of forming a gate insulating layer, an active layer, a data line, a source/drain metal layer, a passivation layer, and a via by a patterning process is similar to the related art in the related art; for example:
  • the semiconductor layer and the doped semiconductor layer are sequentially deposited on the gate insulating layer by a method such as Plasma Enhanced Chemical Vapor Deposition (PECVD), and then the source and drain metal layers are deposited by magnetron sputtering or thermal evaporation. ;
  • PECVD Plasma Enhanced Chemical Vapor Deposition
  • the thickness of the photoresist in the completely remaining region of the photoresist is not changed, the photoresist in the completely removed region of the photoresist is completely removed, and the thickness of the photoresist in the semi-reserved region of the photoresist is thinned;
  • the sub-etching process removes the source/drain metal layer, the doped semiconductor layer, and the semiconductor layer in the completely removed region of the photoresist to form an active layer pattern;
  • a via is formed on the passivation layer using a conventional mask process.
  • the auxiliary pillow layer 24 may also be formed in the same patterning process as the functional insulating layer such as the gate insulating layer, the active layer, the source/drain metal layer, the passivation layer or the transparent electrode layer, for example, formed in the same layer. Similar to the above method, it will not be described here.
  • the spacer is disposed on the pillow layer 13, thereby increasing the compression amount of the spacer and reducing the amount of compression.
  • the risk of gravity Mura occurs, which improves the display quality of the screen and the reliability of the display device; for example, it can effectively solve the problem of insufficient compression of the spacer in the oxide semiconductor liquid crystal display panel, thereby greatly improving the anti-gravity of the oxide semiconductor liquid crystal display panel.
  • the thickness of the pillow layer 13 can be flexibly set according to requirements in the present invention, the height of the pillow layer 13 can be continuously changed, so that the compression amount of the spacer can be flexibly controlled, and is not limited to the present.
  • the embodiment of the present invention can facilitate the design of the spacer, make the processing of the spacer more easy, and can adjust the compression amount of the product spacer at any time, thereby reducing the fluctuation of the production line to the screen display.
  • the impact of quality provides strong technical support for improving the efficiency of display device production and reducing production costs.
  • the color film substrate mainly includes a first substrate substrate 11, a black matrix 12 and a color resist layer 17 disposed on the first substrate substrate 11. And a spacer or the like disposed on the black matrix 12.
  • the spacer in the embodiment includes a main spacer 14, a first auxiliary spacer 15 and a second auxiliary spacer 16; the main difference from the first embodiment of the present invention is that, in the embodiment, the pillow Layer 13 is a multi-stepped structure.
  • the pillow layer 13 may be a three-step stepped structure, with the main spacer 14 disposed on the highest step, the first auxiliary spacer 15 disposed on the next higher order, and the second auxiliary spacer. 16 is disposed on the lowest step; or, the pillow layer 13 may be a two-step structure, the main spacer 14 is disposed on the highest step, and the first auxiliary spacer 15 is disposed on the lowest step, and the second The auxiliary spacers 16 are disposed directly on the black matrix 12; of course, when there are more types of spacers, other stages of the stepped pillow layer 13 can be designed as needed.
  • the pillow layer 13 in this embodiment may be a two-step structure in order to minimize the difficulty of the process.
  • the embodiment further provides a method for preparing the above color film substrate.
  • the method for preparing the color film substrate further includes the step of forming the stepped pillow layer 13 in addition to the conventional steps for manufacturing the color filter substrate.
  • the difference from the manufacturing of the pillow layer according to the first embodiment of the present invention is mainly described herein.
  • the remaining steps are similar to the manufacturing method of the color filter substrate according to the first embodiment of the present invention, and are not described herein.
  • the steps of manufacturing the secondary stepped pillow layer 13 include:
  • the first substrate 11 may be, for example, a glass substrate or a quartz substrate; coating a non-photosensitive black resin layer 33 or other light absorbing material layer on the first substrate 11;
  • the thickness of the covered black resin layer 33 directly determines the highest order thickness of the finally formed pillow layer 13; the highest order thickness of the pillow layer 13 needs to be based on the thickness of the final display panel to be formed, and the compression of the main spacer 14 Factors such as the amount (for example, if an auxiliary spacer is provided on the array substrate, it is also necessary to consider the influence of the auxiliary spacer) specific settings, for example, by calculation, the highest order of the pillow layer 13 and the black matrix 12
  • the sum of the thicknesses is 1.05 to 3.15 ⁇ m, and accordingly, the thickness of the applied black resin layer 33 needs to be 1.05 to 3.15 ⁇ m.
  • the black matrix 12 and the bolster layer 13 are formed by two photolithography processes.
  • step S2 comprises:
  • the black resin layer 33 of the photoresist completely removed region is removed by a first etching process
  • the black resin layer 33 is removed by a second etching process to remove a portion of the thickness of the semi-retained region of the photoresist;
  • the continuous variation of the thickness of the non-photosensitive black resin layer 33 can be ensured, so that the step difference between the black matrix 12 and the pillow layer can be flexibly controlled, and can be flexibly set according to requirements.
  • the thickness of the pillow layer
  • steps are employed to form a pillow layer having a stepped structure.
  • the second embodiment of the present invention describes a method for manufacturing a color filter substrate by taking the pillow layer 13 as a two-step structure, but the method for manufacturing a color filter substrate according to the second embodiment of the present invention can be applied.
  • the manufacturing method is similar to the above, and for brevity, it will not be described herein.
  • the color film substrate preparation method in this embodiment is only the preparation of the color film substrate provided by the embodiment.
  • embodiments of the present invention can also be implemented by increasing or decreasing the number of processes, selecting different materials, or varying combinations of materials.
  • a display panel using the color film substrate is further provided.
  • the display panel includes the color film substrate and the array substrate with the color film substrate, and the array substrate includes a second lining.
  • the main spacers 14 disposed on the highest order of the pillow layer 13 are in press contact with the array substrate, and are disposed at the lowest level of the pillow layer 13
  • the first auxiliary spacer 15 can be in contact with the array substrate, and the second auxiliary spacer 16 is suspended and does not contact the array substrate.
  • the amount of compression of the main spacer 14 in press contact with the array substrate may be 10% of the initial height of the main spacer 14 20%; for example, it can be 15% and so on.
  • the auxiliary pillow layer 24 may be disposed at a position corresponding to the pressing contact area of the spacer substrate and the array substrate of the second base substrate 21 or the functional film layer 23, as shown in FIG. .
  • the same utilization can be achieved.
  • the size (or the same height) of the spacers serves as the main spacer 14, the first auxiliary spacer 15 and the second auxiliary spacer 16, respectively, thus reducing the complexity of the spacer design and being more advantageous. Batch production.
  • Embodiment 3 of the present invention provides a display device including the display panel provided in Embodiment 1 or Embodiment 2. Since in the display device, the amount of compression of the spacer is increased by the pillow layer disposed on the black matrix, the risk of occurrence of gravity Mura is reduced, the quality of the screen display and the reliability of the display device are improved; The thickness of the cushion layer can be flexibly set according to requirements, so that the compression amount of the spacer can be flexibly controlled without being limited by various limitations of the prior art, thereby improving the preparation efficiency of the display device and reducing the production cost.
  • the display device may be any product or component having a display function, such as a liquid crystal display panel, an electronic paper, a liquid crystal television, a liquid crystal display, a digital photo frame, a mobile phone, a tablet computer, or the like.
  • a display function such as a liquid crystal display panel, an electronic paper, a liquid crystal television, a liquid crystal display, a digital photo frame, a mobile phone, a tablet computer, or the like.
  • the color film substrate provided by the embodiment of the present invention, the preparation method thereof, and the display panel by forming a pillow layer on the black matrix, and placing the spacer on the pillow layer, thereby increasing the compression amount of the spacer.
  • Reduce the risk of gravity Mura improve the quality of the picture display and the reliability of the display device;
  • the thickness of the pillow layer can be flexibly set according to requirements in the embodiment of the present invention, the thickness of the pillow layer can be continuously changed, so that the compression amount of the spacer can be flexibly controlled without being limited by various limitations of the prior art. Therefore, it provides powerful technical support for improving the preparation efficiency of the display device and reducing the production cost.

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

提供了一种彩膜基板及其制备方法、显示面板。彩膜基板包括第一衬底基板（11）；黑矩阵（12），设置在第一衬底基板（11）上；以及多个隔垫物（14，15，16），设置在黑矩阵（12）之上，其中至少一部分隔垫物（14，15，16）与黑矩阵（12）之间设置有枕垫层（13）。通过在黑矩阵（12）上形成枕垫层（13），将隔垫物（14，15，16）设置在枕垫层（13）上，从而增加了隔垫物（14，15，16）的压缩量，降低了发生重力Mura的风险，提升了画面显示质量以及显示装置的可靠性，且枕垫层（13）厚度可连续变化。

Description

彩膜基板及制备方法、显示面板 技术领域
本发明的实施例涉及一种彩膜基板及其制备方法、应用该彩膜基板的显示面板。
背景技术
平板显示装置相比于传统的阴极射线管显示装置具有轻薄、驱动电压低、没有闪烁抖动以及使用寿命长等优点；平板显示装置分为主动发光显示装置与被动发光显示装置；例如，薄膜晶体管液晶显示装置(Thin Film Transistor-Liquid Crystal Display，TFT-LCD)就是一种被动发光显示装置，由于其具有画面稳定、图像逼真、低辐射、节省空间以及节省能耗等优点，被广泛应用于电视、手机、显示器等电子产品中，已占据了平面显示领域的主导地位。
发明人已知的液晶显示面板主要包括对盒的彩膜(Color Filter)基板以及阵列(Array)基板，在彩膜基板和阵列基板之间还灌注有液晶层。其中，液晶层厚度(Cell Gap，盒厚)主要通过设置在阵列基板和彩膜基板之间的隔垫物的高度来进行控制，液晶层厚度对液晶显示装置的结构参数和显示质量有重要的影响。目前使用的隔垫物通常为柱状隔垫物(PS，Post Spacer)，柱状隔垫物一般通过掩模、光刻等工艺形成在彩膜基板上的黑矩阵上。在彩膜基板和阵列基板对盒后即形成液晶显示面板，处于彩膜基板和阵列基板之间的柱状隔垫物对上述两个基板进行支撑且起到缓冲作用，从而维持预定的盒厚，保证画面显示的稳定。
目前，大尺寸高分辨率的电视(如65寸超高清电视产品等)越来越受到消费者青睐。在大尺寸液晶显示面板中，通常会使用多种不同类型的隔垫物防止各种显示不均(mura)或者不良的发生。例如，图1示出了发明人已知的三级柱状隔垫物(Triple PS)的截面结构图，其包括设置在黑矩阵上的主隔垫物(Main PS)14、第一辅助隔垫物15以及第二辅助隔垫物16，起到三级缓冲的作用。其中，主隔垫物14通常处于压缩状态，主要目的是保证防止 液晶显示面板出现重力Mura。这里，重力Mura是指当液晶显示面板垂直放置时，液晶材料会由于重力作用聚积到液晶显示面板的下部，造成液晶显示面板下部膨胀，同时液晶显示面板上部出现真空现象，在外界大气压作用下，液晶显示面板上部被挤压，导致液晶显示面板的上部和下部出现盒厚严重不一致，从而引起画面显示的不均匀。在大尺寸液晶显示面板中，由于灌注的液晶量较多，更容易出现重力Mura。主隔垫物14通常主要设置在液晶显示面板的上部，在液晶显示面板垂直放置时，通过自身的弹力防止重力Mura的发生。因此，主隔垫物14压缩量的多少，与液晶显示面板能够灌注的液晶量的上限以及抗重力Mura能力有重要关联。简单的说，主隔垫物14压缩量越大，其越能承受更强的压力而维持盒厚不发生变化，也就越不容易出现重力Mura，与之相应的，可以灌注更多的液晶材料，从而提升画面显示效果。
由于隔垫物通常形成在彩膜基板上，如图2中所示，为了进一步增加主隔垫物14的压缩量，通常会在阵列基板上利用各个功能膜层23的厚度做出辅助枕垫层24，主隔垫物14与辅助枕垫层24挤压接触，利用辅助枕垫层24增加主隔垫物14的压缩量。但是，由于辅助枕垫层24的厚度由阵列基板上各个功能膜层23的厚度决定，例如，当辅助枕垫层与栅极金属层同层设置时，辅助枕垫层的厚度等于栅极金属层的厚度，当辅助枕垫层与钝化层同层设置时，辅助枕垫层的厚度等于钝化层的厚度；而阵列基板上各功能膜层的厚度均为固定值，不可随意更改，因此辅助枕垫层24的厚度无法做到连续的变化，即只能满足某些特定的压缩量，难以满足各种变化的压缩量需求。此外，原则上也可以通过隔垫物自身高度的连续变化来实现压缩量的连续变化，但是实际上隔垫物的高度由隔垫物的直径决定，一旦隔垫物的直径根据阵列基板上的空间以及黑矩阵的尺寸参数确定下来后，就意味着隔垫物的高度只能在一小段范围内变化，因此同样无法真正的实现压缩量的连续变化，即无法满足各种变化的压缩量需求。
另外，在追求大屏幕超高清的同时，势必会带来显示面板功耗的增加，这与节能低碳的环保理念相冲突。而在氧化物半导体薄膜晶体管(Oxide-TFT)驱动技术中，由于氧化物半导体具有较高的电子迁移率(比传统的非晶硅快100倍左右)，可以大幅度降低液晶显示面板的功耗，因此在大尺寸液晶显示产品中具有不可比拟的技术优势，被评为最具潜力的新一 代液晶显示技术，具有良好的市场应用前景。但是氧化物半导体薄膜晶体管液晶显示面板相对对于传统的非晶硅薄膜晶体管液晶显示面板来说，氧化物半导体形成的功能膜层很薄，一般为0.05μm，远远小于传统非晶硅形成的功能膜层的厚度(一般为0.23μm)，这样虽然降低了阵列基板的厚度，但是也使主隔垫物的压缩量下降近10％(压缩量占自身原始高度的百分比)，通常主隔垫物的压缩量最大也就只有15％左右(压缩量占自身原始高度的百分比)，而主隔垫物的压缩量不足，势必容易导致重力Mura的发生；由于辅助枕垫层的厚度相对固定，因此需要增加隔垫物的高度，而增加隔垫物高度，意味着隔垫物的直径需要增加，从而造成用料成本的大幅度增加。另外，受限于阵列基板上的空间以及黑矩阵的尺寸参数限制，隔垫物的直径以及高度也并不是无限变化的。以上种种因素都限制了隔垫物的设计，导致Oxide-TFT液晶显示面板的隔垫物压缩量偏小，存在重力Mura的风险，同时，还会造成隔垫物用料成本的增加及产能的降低的问题。
发明内容
本发明的实施例提供一种可以灵活控制隔垫物压缩量的彩膜基板以及该彩膜基板的制备方法以及显示面板。
一方面，本发明的实施例提供了一种彩膜基板，包括：第一衬底基板；黑矩阵，设置在所述第一衬底基板上；以及多个隔垫物，设置在所述黑矩阵之上，其中至少一个所述隔垫物与黑矩阵之间设置有枕垫层。
另一方面，本发明的实施例提供了一种制备上述彩膜基板的方法，包括以上所述的枕垫层的形成步骤。
再一方面，本发明的实施例还提供了一种显示面板，包括：彩膜基板，如以上所述；以及阵列基板，与所述彩膜基板对盒，其中至少一部分设置在所述枕垫层上的隔垫物与所述阵列基板挤压接触。
附图说明
为了更清楚地说明本发明实施例的技术方案，下面将对实施例的附图作简单地介绍，显而易见地，下面描述中的附图仅仅涉及本发明的一些实施例，而非对本发明的限制。
图1是现有的显示面板中隔垫物部分的截面结构示意图；
图2是现有的显示面板中的隔垫物部分的另一截面结构示意图；
图3是本发明实施例一中彩膜基板及显示面板中隔垫物部分的截面结构示意图；
图4a-图4b是本发明实施例一中黑矩阵由感光黑色树脂形成时彩膜基板的制备方法的步骤截面图；
图5a-图5g是本发明实施例一中黑矩阵由非感光黑色树脂形成时彩膜基板的制备方法的步骤截面图；
图6是本发明实施例一中彩膜基板及显示面板中隔垫物部分的另一截面结构图；
图7是本发明实施例二中彩膜基板及显示面板中隔垫物部分的一种截面结构图；
图8是本发明实施例二中彩膜基板及显示面板中隔垫物部分的另一截面结构图。
具体实施方式
为使本发明实施例的目的、技术方案和优点更加清楚，下面将结合本发明实施例的附图，对本发明实施例的技术方案进行清楚、完整地描述。显然，所描述的实施例是本发明的一部分实施例，而不是全部的实施例。基于所描述的本发明的实施例，本领域普通技术人员在无需创造性劳动的前提下所获得的所有其他实施例，都属于本发明保护的范围。
下面结合附图，对本发明的实施例做进一步描述。以下实施例仅用于说明本发明，但不用来限制本发明的范围。
本发明实施例所提供的彩膜基板，包括第一衬底基板、设置在第一衬底基板上的黑矩阵以及设置在黑矩阵之上的多个隔垫物；至少一部分隔垫物与黑矩阵之间设置有枕垫层，利用枕垫层增加了隔垫物的压缩量，降低了发生重力Mura的可能性，提升了画面显示质量以及显示装置的可靠性。此外，由于本发明的实施例中枕垫层的厚度可以根据需求灵活设定，能够实现枕垫层厚度的连续变化，因此可以灵活控制隔垫物的压缩量，不必受限于现有技术的种种限制。下面结合实施例一至四，对本发明实施例加以更详细的说明。
实施例一
本实施例中提供了一种彩膜基板，如图1中所示，该彩膜基板包括：第一衬底基板11；设置在第一衬底基板11上的黑矩阵12和色阻层17；以及设置在黑矩阵12之上的多个隔垫物。本实施例中的隔垫物包括主隔垫物14，第一辅助隔垫物15以及第二辅助隔垫物16，主隔垫物14设置在枕垫层13上，第一辅助隔垫物15和第二辅助隔垫物16直接设置在黑矩阵12上；其中，主隔垫物14主要用于防止重力Mura，第一辅助隔垫物15主要用于防止Push(擦拭)Mura，第二辅助隔垫物16主要用于防止压黑Mura。
备选地，也可以不设置第一辅助隔垫物15和第二辅助隔垫物16，或者仅设置第一辅助隔垫物15和第二辅助隔垫物16之一，又或者设置其他类型的辅助隔垫物等，并不局限于本实施例中所列举的方式。
由于主隔垫物14需要保证较大的压缩量，因此，在主隔垫物14与黑矩阵12之间设置有枕垫层13，利用枕垫层13增加主隔垫物14的压缩量，降低了发生重力Mura的风险。
本实施例还提供了一种制备上述彩膜基板的方法，除了包括现有的制造彩膜基板的常用步骤之外，该彩膜基板制备方法还包括形成上述枕垫层13的步骤。示例性地，枕垫层13可以单独形成在第一衬底基板11与黑矩阵12之间，也可以单独形成在黑矩阵12之上。进一步地，为了减少工艺次数，提升生产效率，降低生产成本以及增加枕垫层13与黑矩阵12之间的稳固连接，本实施例中枕垫层13与黑矩阵12可以为一体式结构，即，可以在形成黑矩阵12的同时，形成枕垫层13。
发明人已知的黑矩阵12通常是由含有黑色着色剂(例如炭黑)的树脂材料，即，黑色树脂制成的，树脂黑矩阵12具有反射少以及成本低等优点。黑色树脂分为感光树脂和非感光树脂，对于感光的黑色树脂，可以利用光刻工艺直接制备黑矩阵12；对于非感光的黑色树脂，可以利用光刻胶采用构图工艺制备黑矩阵12。
示例性地，在本实施例中，当采用感光黑色树脂制备黑矩阵12以及枕垫层13时，包括以下步骤：
A1.清洁第一衬底基板11，示例性地，第一衬底基板11可以是玻璃基板或者石英基板等；在第一衬底基板11上涂覆一层感光的黑色树脂层或者其 他吸光材料层；涂覆的黑色树脂层的厚度直接决定着最后形成的枕垫层13的厚度；枕垫层13的厚度需要根据最终要形成的显示面板的盒厚、主隔垫物14的压缩量等因素具体设定。示例性地，通过计算得到：枕垫层13与黑矩阵12的厚度之和为1.05～3.15μm，则与之相应的，涂覆的黑色树脂层的厚度为1.05～3.15μm。
A2.通过光刻工艺形成所述黑矩阵12以及枕垫层13；
示例性地，该步骤主要包括：
A201.如图4a所示，通过双色调掩模板31曝光感光的黑色树脂层33，形成对应所述枕垫层13的黑色树脂完全保留区域、对应所述黑矩阵12区域的黑色树脂半保留区域以及对应上述区域之外区域的黑色树脂完全去除区域；
A202.进行显影处理，如图4b中所示，黑色树脂完全去除区域的黑色树脂层33被完全去除；黑色树脂完全保留区域的黑色树脂层33被完全保留，作为枕垫层13；黑色树脂半保留区域的部分厚度的黑色树脂层33被去除，作为黑矩阵12。
通过控制曝光量、显影时间以及显影时所用的显影液浓度等，可以保证感光黑色树脂层厚度的连续变化，从而可以灵活的控制黑矩阵12与枕垫层13的段差，可以根据需求灵活设定枕垫层13的厚度。
当采用非感光黑色树脂制备黑矩阵12以及枕垫层13时，包括步骤：
S1.清洁第一衬底基板11，示例性地，第一衬底基板11可以是玻璃基板或者石英基板；在第一衬底基板11上涂覆一层非感光黑色树脂层或者其他吸光材料层；涂覆的黑色树脂层的厚度直接决定着最后形成的枕垫层13的厚度；枕垫层13的厚度需要根据最终要形成的显示面板的盒厚、主隔垫物14的压缩量等因素(例如，如果在阵列基板上设置了辅助隔垫物，则也需要考虑辅助隔垫物的影响)具体设定。示例性地，通过计算得到：枕垫层13与黑矩阵12的厚度之和为1.05～3.15μm，则与之相应的，涂覆的黑色树脂的厚度需要为1.05～3.15μm。
S2.通过构图工艺形成黑矩阵12以及枕垫层13。
示例性地，步骤S2包括步骤：
S201.如图5a所示，在黑色树脂层33上涂覆一层光刻胶32；
S202.如图5b所示，通过双色调掩模板31曝光，形成对应枕垫层13的光刻胶完全保留区域、对应黑矩阵12区域的光刻胶半保留区域以及对应上述区域之外区域的光刻胶完全去除区域；进行显影处理，如图5c中所示，显影处理后，光刻胶完全保留区域的光刻胶被完全保留，光刻胶完全去除区域的光刻胶被完全去除，光刻胶半保留区域部分厚度的光刻胶被去除；
S203.如图5d中所示，通过第一刻蚀工艺去除光刻胶完全去除区域的黑色树脂层33；
S204.如图5e中所示，通过灰化工艺去除光刻胶半保留区域的光刻胶；
S205.如图5f中所示，通过第二次刻蚀工艺去除光刻胶半保留区域的部分厚度的黑色树脂层33；
通过控制刻蚀时间以及刻蚀时所用的刻蚀液浓度等，可以保证非感光黑色树脂层33厚度的连续变化，从而可以灵活的控制黑矩阵12与枕垫层13的段差，可以根据需求灵活设定枕垫层13的厚度。
S206.如图5g中所示，剥离剩余的光刻胶，最终留下的黑色树脂层33作为黑矩阵12以及枕垫层13。
本实施例中的彩膜基板制备方法仅仅是制备本实施例所提供的彩膜基板的一种实现方法，实际使用中还可以通过增加或减少工艺次数、选择不同的材料或材料组合改变实现方法来实现本发明的实施例。
本实施例还提供了一种应用上述彩膜基板的显示面板；如图3中所示，该显示面板包括上述彩膜基板以及与彩膜基板对盒设置的阵列基板，阵列基板包括第二衬底基板21以及形成在第二衬底基板21上的多个功能膜层23；设置在枕垫层13上的主隔垫物14与阵列基板挤压接触，第一辅助隔垫物15与阵列基板接触即可，无需压缩量，第二辅助隔垫物16悬空设置，不与阵列基板接触。
示例性地，根据隔垫物的材质以及尺寸的综合计算，与阵列基板挤压接触的主隔垫物14的压缩量为该主隔垫物14初始高度的10％～20％；例如，可以为15％等。
为了进一步增加主隔垫物14的压缩量或者在相同压缩量下，减少主隔垫物14的高度，从而达到节省材料、降低成本的目的，如图6中所示，本实施例中的第二衬底基板21或者功能膜层23的与隔垫物和阵列基板挤压接触区 域对应的位置处设置有辅助枕垫层24；该辅助枕垫层24的作用、结构以及制备方法与相关现有技术类似。
本实施例中还提供了一种制备上述显示面板的方法，除了包括现有的制造显示基板的常用步骤之外，该显示面板制备方法还包括利用本实施例中所提供的彩膜基板制备方法制备彩膜基板的步骤。除此之外，还包括在阵列基板的第二衬底基板上形成各个功能膜层23，例如依次形成栅极金属层、栅绝缘层、有源层、源漏金属层、钝化层以及透明电极层等(当然，各功能膜层23的设置顺序以及功能膜层23的选择可以根据需求的不同而相应改变，例如，在有源层和钝化层之间还可以设置刻蚀阻挡层等)。
备选地，根据本发明实施例的显示面板的制造方法还包括在阵列基板上形成辅助枕垫层的方法。
示例性地，通过构图工艺同时形成栅极金属层以及辅助枕垫层24：
清洁第二衬底基板，示例性地，第二衬底基板可以是玻璃基板或者石英基板等；
在第二衬底基板上沉积金属薄膜；例如采用磁控溅射或热蒸发的方法在第二衬底基板上沉积一层金属薄膜；金属薄膜可以是由Cr、W、Ti、Ta、Mo、Al、Cu等金属或其合金形成的单层膜，也可以为由多层金属薄膜组成的复合薄膜；
在金属薄膜上涂布一层光刻胶；
采用普通掩模板进行曝光，形成对应辅助枕垫层24以及栅极金属层的光刻胶保留区域以及对应上述区域之外区域的光刻胶去除区域；
对光刻胶进行显影处理，显影处理后，光刻胶保留区域的光刻胶厚度没有变化，光刻胶去除区域的光刻胶被去除；
通过刻蚀工艺去除光刻胶去除区域的金属薄膜；
最后剥离剩余的光刻胶，留下的金属薄膜即包括栅电极以及扫描线的栅极金属层和辅助枕垫层24，且辅助枕垫层24的中心正好与枕垫层13的中心重合，辅助枕垫层24的形状可以是方形、多边形、圆形等。
示例性地，通过构图工艺形成栅绝缘层、有源层、数据线、源漏金属层、钝化层以及过孔等工艺与现有技术中的相关工艺类似；例如：
在栅极金属层以及辅助枕垫层24上形成覆盖整个第二衬底基板的栅绝 缘层；
采用PECVD(Plasma Enhanced Chemical Vapor Deposition，等离子体增强化学气相沉积法)等方法在栅绝缘层上依次沉积半导体层以及掺杂半导体层；然后采用磁控溅射或热蒸发等方法沉积源漏金属层；
在源漏金属层上涂覆一层光刻胶；
通过双色调掩模板曝光，形成对应源电极以及漏电极区域的光刻胶完全保留区域、对应沟道区域的光刻胶半保留区域以及对应上述区域之外区域的光刻胶完全去除区域；
显影处理后，光刻胶完全保留区域的光刻胶厚度没有变化，光刻胶完全去除区域的光刻胶被完全去除，光刻胶半保留区域的光刻胶厚度变薄；然后通过第一次刻蚀工艺去除光刻胶完全去除区域的源漏金属层、掺杂半导体层以及半导体层，形成有源层图形；
通过灰化工艺去除光刻胶半保留区域的光刻胶，暴露出该区域的源漏金属层；
通过第二次刻蚀工艺去除光刻胶半保留区域的源漏金属层以及掺杂半导体层，并去除部分厚度的半导体层，形成源电极、漏电极以及沟道区域；
剥离剩余的光刻胶；
在源电极、漏电极及沟道区域上采用PECVD方法或者其他方式沉积形成钝化层；
采用普通掩模板工艺在钝化层上形成过孔。
备选地，辅助枕垫层24也可以与栅绝缘层、有源层、源漏金属层、钝化层或者透明电极层等功能膜层在同一次构图工艺中形成，例如，同层形成，与上述方法相似，在此不再赘述。
本实施例中所提供的彩膜基板以及显示面板，通过在黑矩阵12上形成枕垫层13，将隔垫物设置在枕垫层13上，从而增加了隔垫物的压缩量，降低了发生重力Mura的风险，提升了画面显示质量以及显示装置的可靠性；例如可以有效解决氧化物半导体液晶显示面板中隔垫物压缩量不足的问题，从而极大提高氧化物半导体液晶显示面板抗重力Mura的性能；同时，由于本发明中枕垫层13的厚度可以根据需求灵活设定，从而实现枕垫层13高度的连续变化，因此可以灵活控制隔垫物的压缩量，不必受限于现有技术的种种 限制，此外，本发明的实施例可以方便隔垫物的设计，使隔垫物的加工制造更加容易，还可以随时对量产品隔垫物的压缩量进行调整，从而减少产线波动对画面显示品质的影响，为提升显示装置的制备效率以及降低生产成本提供有力的技术支持。
实施例二
本发明的实施例提供了一种彩膜基板，如图7所示，该彩膜基板主要包括第一衬底基板11，设置在第一衬底基板11上的黑矩阵12和色阻层17，以及设置在黑矩阵12之上的隔垫物等。本实施例中的隔垫物包括主隔垫物14，第一辅助隔垫物15以及第二辅助隔垫物16；与本发明的实施例一的主要区别在于，本实施例中，枕垫层13为多级台阶状结构。
示例性地，枕垫层13可以为三级台阶状结构，将主隔垫物14设置在最高阶上，将第一辅助隔垫物15设置在次高阶上，将第二辅助隔垫物16设置在最低阶上；或者，枕垫层13可以为二级台阶状结构，将主隔垫物14设置在最高阶上，将第一辅助隔垫物15设置在最低阶上，将第二辅助隔垫物16直接设置在黑矩阵12上；当然，在具有更多类型的隔垫物时，可以根据需要设计其他级数的台阶状枕垫层13。出于尽量不增加工艺难度的目的，本实施例中的枕垫层13可以为二级台阶状结构。
本实施例还提供了一种制备上述彩膜基板的方法，除了包括现有的制造彩膜基板的常用步骤之外，该彩膜基板制备方法还包括形成上述台阶状枕垫层13的步骤，这里主要描述与根据本发明实施例一的制造枕垫层的区别，其余步骤与根据本发明实施例一的彩膜基板的制造方法类似，这里不做赘述。
示例性地，制造二级台阶状枕垫层13的步骤包括：
S1.清洁第一衬底基板11，第一衬底基板11可以是例如玻璃基板或者石英基板；在第一衬底基板11上涂覆一层非感光黑色树脂层33或者其他吸光材料层；涂覆的黑色树脂层33的厚度直接决定着最后形成的枕垫层13最高阶的厚度；枕垫层13最高阶的厚度需要根据最终要形成的显示面板的盒厚、主隔垫物14的压缩量等因素(例如，如果在阵列基板上设置了辅助隔垫物，则也需要考虑辅助隔垫物的影响)具体设定，例如通过计算得到，枕垫层13的最高阶与黑矩阵12的厚度之和为1.05～3.15μm，则与之相应的，涂覆的黑色树脂层33的厚度需要为1.05～3.15μm。
S2.通过两次光刻工艺形成黑矩阵12以及枕垫层13。
示例性地，步骤S2包括：
S201.在黑色树脂层33层上涂覆一层光刻胶32；
S202.通过双色调掩模板31曝光，形成对应枕垫层13的光刻胶完全保留区域、对应黑矩阵12区域的光刻胶半保留区域以及对应上述区域之外区域的光刻胶完全去除区域并进行显影处理，显影处理后，光刻胶完全保留区域的光刻胶被完全保留，光刻胶完全去除区域的光刻胶被完全去除，光刻胶半保留区域部分厚度的光刻胶被去除；
S203.通过第一刻蚀工艺去除光刻胶完全去除区域的黑色树脂层33；
S204.通过灰化工艺去除光刻胶半保留区域的光刻胶；
S205.通过第二次刻蚀工艺去除光刻胶半保留区域部分厚度的黑色树脂层33；
通过控制刻蚀时间以及刻蚀时所用的刻蚀液浓度等，可以保证非感光黑色树脂层33厚度的连续变化，从而可以灵活的控制黑矩阵12与枕垫层的段差，可以根据需求灵活设定枕垫层的厚度；
S206.剥离剩余的光刻胶；
在此之后，采用步骤形成具有台阶状结构的枕垫层。
示例性地，可以通过以下步骤实现：
S207.在彩膜基板上涂覆一层光刻胶；
S208.通过掩模板曝光，形成对应枕垫层13最低阶图案的光刻胶完全去除区域以及对应上述区域之外的光刻胶完全保留区域；
S209.显影处理后，通过刻蚀工艺去除光刻胶完全去除区域部分厚度的黑色树脂层33；
S210.剥离剩余的光刻胶，最终留下的黑色树脂33即黑矩阵12以及枕垫层13，并且，枕垫层13为二级台阶状结构。
示例性地，本发明的实施例二以枕垫层13为二级台阶状结构为例对制造彩膜基板的方法进行了描述，但根据本发明实施例二的制造彩膜基板的方法可以适用于具有一级、三级或具有其他级数台阶状结构的枕垫层，制造方法与以上类似，为了简便，这里不做赘述。
本实施例中的彩膜基板制备方法仅仅是制备本实施例所提供的彩膜基板 的一种实现方法，实际使用中还可以通过增加或减少工艺次数、选择不同的材料或材料组合改变实现方法来实现本发明的实施例。
本实施例中还提供了一种应用上述彩膜基板的显示面板；如图7中所示，该显示面板包括上述彩膜基板以及与彩膜基板对盒的阵列基板，阵列基板包括第二衬底基板21以及形成在第二衬底基板21上的若干层功能膜层23；设置在枕垫层13最高阶上的主隔垫物14与阵列基板挤压接触，设置在枕垫层13最低阶第一辅助隔垫物15与阵列基板接触即可，无需压缩量，第二辅助隔垫物16悬空设置，不与阵列基板接触。
示例性地，根据发明人已知的隔垫物的材质以及尺寸的综合计算，与阵列基板挤压接触的主隔垫物14的压缩量可以为该主隔垫物14初始高度的10％～20％；例如，可以为15％等等。并且，与实施例一中类似，还可以在第二衬底基板21或者功能膜层23的与隔垫物和阵列基板挤压接触区域对应的位置处设置辅助枕垫层24，可以参见图8。
在本实施例中，通过优化控制二级台阶状枕垫层13最高阶与最低阶的段差、枕垫层13最低阶与黑矩阵12的段差以及辅助枕垫层24的厚度，可以实现利用相同尺寸(或相同高度)的隔垫物分别作为主隔垫物14、第一辅助隔垫物15以及第二辅助隔垫物16，这样，减少了隔垫物设计的复杂程度，而且更有利于批量化生产。
实施例三
本发明的实施例三提供了一种包括实施例一或实施例二所提供的显示面板的显示装置。由于在该显示装置中，通过设置在黑矩阵上的枕垫层增加了隔垫物的压缩量，降低了发生重力Mura的风险，提升了画面显示质量以及显示装置的可靠性；此外，由于枕垫层的厚度可以根据需求灵活设定，因此可以灵活控制隔垫物的压缩量，不必受限于现有技术的种种限制，从而可以提升显示装置的制备效率以及降低生产成本。
示例性地，上述显示装置可以是：液晶显示面板、电子纸、液晶电视、液晶显示器、数码相框、手机、平板电脑等任何具有显示功能的产品或部件。
本发明的实施例所提供的彩膜基板及其制备方法、显示面板，通过在黑矩阵上形成枕垫层，将隔垫物设置在枕垫层上，从而增加了隔垫物的压缩量，降低了发生重力Mura的风险，提升了画面显示质量以及显示装置的可靠性； 此外，由于本发明实施例中枕垫层的厚度可以根据需求灵活设定，实现枕垫层厚度的连续变化，因此可以灵活控制隔垫物的压缩量，不必受限于现有技术的种种限制，从而为提升显示装置的制备效率以及降低生产成本提供有力的技术支持。
以上实施方式仅用于说明本发明，而并非对本发明的限制，有关技术领域的普通技术人员，在不脱离本发明的精神和范围的情况下，还可以做出各种变化和变型，因此所有等同的技术方案也属于本发明的保护范畴。
本申请要求于2013年10月15日递交的中国专利申请第201310484617.0号的优先权，在此全文引用上述中国专利申请公开的内容以作为本申请的一部分。

Claims (24)

  1. 一种彩膜基板，包括：
    第一衬底基板；
    黑矩阵，设置在所述第一衬底基板上；以及
    多个隔垫物，设置在所述黑矩阵之上，
    其中至少一个所述隔垫物与黑矩阵之间设置有枕垫层。
  2. 根据权利要求1所述的彩膜基板，其中所述枕垫层与所述黑矩阵为一体式结构。
  3. 根据权利要求1或2所述的彩膜基板，其中所述枕垫层为一级或更多级台阶状结构。
  4. 根据权利要求3所述的彩膜基板，其中所述隔垫物包括主隔垫物和辅助隔垫物，所述主隔垫物设置在所述枕垫层的最高阶上，所述辅助隔垫物设置在所述枕垫层最高阶之外的其他阶或黑矩阵上。
  5. 根据权利要求3所述的彩膜基板，其中所述枕垫层为二级台阶状结构。
  6. 根据权利要求5所述的彩膜基板，其中所述隔垫物包括主隔垫物和辅助隔垫物，所述主隔垫物设置在所述枕垫层的最高阶上，所述辅助隔垫物包括设置在所述枕垫层最低阶上的第一辅助隔垫物以及设置在所述黑矩阵上的第二辅助隔垫物。
  7. 根据权利要求4或6所述的彩膜基板，其中所述主隔垫物和辅助隔垫物的高度相同。
  8. 根据权利要求3所述的彩膜基板，其中所述枕垫层的最高阶与所述黑矩阵的厚度之和为1.05μm～3.15μm。
  9. 一种彩膜基板的制备方法，包括根据权利要求1-8中任一项所述的枕垫层的形成步骤。
  10. 根据权利要求9所述的彩膜基板的制备方法，其中形成所述枕垫层包括：
    A1.在第一衬底基板上涂覆一层感光黑色树脂层；
    A2.通过光刻工艺形成所述黑矩阵以及枕垫层。
  11. 根据权利要求10所述的彩膜基板的制备方法，其中所述步骤A2包 括：
    A201.通过双色调掩模板曝光所述感光黑色树脂层，形成对应所述枕垫层的黑色树脂完全保留区域、对应所述黑矩阵区域的黑色树脂半保留区域以及对应上述区域之外区域的黑色树脂完全去除区域；
    A202.进行显影处理，黑色树脂完全保留区域的黑色树脂层被完全保留，黑色树脂完全去除区域的黑色树脂层被完全去除，黑色树脂半保留区域部分厚度的黑色树脂层被去除。
  12. 根据权利要求9所述的彩膜基板的制备方法，其中形成所述枕垫层包括：
    S1.在第一衬底基板上涂覆一层非感光黑色树脂层；
    S2.通过构图工艺形成所述黑矩阵以及枕垫层。
  13. 根据权利要求12所述的彩膜基板的制备方法，其中所述步骤S2包括：
    S201.在所述黑色树脂层上涂覆一层光刻胶；
    S202.通过双色调掩模板曝光所述光刻胶，形成对应所述枕垫层的光刻胶完全保留区域、对应所述黑矩阵的光刻胶半保留区域以及对应上述区域之外区域的光刻胶完全去除区域并进行显影处理；
    S203.通过刻蚀工艺去除光刻胶完全去除区域的黑色树脂层；
    S204.通过灰化工艺去除光刻胶半保留区域的光刻胶；
    S205.通过刻蚀工艺去除光刻胶半保留区域部分厚度的黑色树脂层；
    S206.剥离剩余的光刻胶。
  14. 根据权利要求13所述的彩膜基板的制备方法，其中所要形成的枕垫层为二级台阶状结构，在所述步骤S206之后还包括：
    S207.在所述彩膜基板上涂覆一层光刻胶；
    S208.通过掩模板曝光，形成对应所述枕垫层最低阶图案的光刻胶完全去除区域以及对应上述区域之外区域的光刻胶完全保留区域；
    S209.显影处理后，通过刻蚀工艺去除光刻胶完全去除区域部分厚度的黑色树脂层；
    S210.剥离剩余的光刻胶。
  15. 一种显示面板，包括：
    彩膜基板，根据权利要求1-8中任一项所述；以及
    阵列基板，与所述彩膜基板对盒设置，
    其中至少一部分设置在所述枕垫层上的隔垫物与所述阵列基板挤压接触。
  16. 根据权利要求15所述的显示面板，其中与所述阵列基板挤压接触的隔垫物的压缩量为所述隔垫物初始高度的10％～20％。
  17. 根据权利要求16所述的显示面板，其中与所述阵列基板挤压接触的隔垫物的压缩量为所述隔垫物初始高度的15％。
  18. 根据权利要求15中任一项所述的显示面板，其中所述隔垫物包括主隔垫物和辅助隔垫物，所述主隔垫物的压缩量为该主隔垫物初始高度的10％～20％。
  19. 根据权利要求15-18中任一项所述的显示面板，其中所述阵列基板包括第二衬底基板以及形成在所述第二衬底基板上的多个功能膜层，所述第二衬底基板或者所述功能膜层的与隔垫物和阵列基板的挤压接触区域对应的位置处设置有辅助枕垫层。
  20. 根据权利要求18所述的显示面板，其中所述多个功能膜层为栅极金属层、栅绝缘层、有源层、源漏金属层、钝化层或透明电极层，所述辅助枕垫层与所述栅极金属层、所述栅绝缘层、所述有源层、所述源漏金属层、所述钝化层或所述透明电极层同层形成。
  21. 一种制备权利要求15-20中任一项所述的显示面板的方法，其中包括制备阵列基板的步骤以及根据权利要求9-14中任一项所述的方法制备彩膜基板的步骤。
  22. 根据权利要求21所述的显示面板制备方法，其中所述制备阵列基板的步骤还包括形成根据权利要求19所述的辅助枕垫层的步骤。
  23. 根据权利要求22所述的显示面板制备方法，其中所述功能膜层包括栅极金属层、栅绝缘层、有源层、源漏金属层、钝化层以及透明电极层；
    所述辅助枕垫层与所述栅极金属层、栅绝缘层、有源层、源漏金属层、钝化层或者透明电极层在同一次构图工艺中形成。
  24. 一种显示装置，包括根据权利要求15-20中任一项所述的显示面板。
PCT/CN2014/088367 2013-10-15 2014-10-11 彩膜基板及制备方法、显示面板 WO2015055099A1 (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US14/655,535 US9880427B2 (en) 2013-10-15 2014-10-11 Color filter substrate, manufacturing method thereof and display panel

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201310484617.0A CN103529591A (zh) 2013-10-15 2013-10-15 彩膜基板及制备方法、显示面板及制备方法、显示装置
CN201310484617.0 2013-10-15

Publications (1)

Publication Number Publication Date
WO2015055099A1 true WO2015055099A1 (zh) 2015-04-23

Family

ID=49931717

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2014/088367 WO2015055099A1 (zh) 2013-10-15 2014-10-11 彩膜基板及制备方法、显示面板

Country Status (3)

Country Link
US (1) US9880427B2 (zh)
CN (1) CN103529591A (zh)
WO (1) WO2015055099A1 (zh)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103529591A (zh) * 2013-10-15 2014-01-22 合肥京东方光电科技有限公司 彩膜基板及制备方法、显示面板及制备方法、显示装置
CN104078491B (zh) * 2014-06-20 2018-04-13 京东方科技集团股份有限公司 彩膜基板及其制作方法、显示面板和显示装置
CN104216161B (zh) * 2014-08-22 2018-06-05 京东方科技集团股份有限公司 一种显示装置
CN104199203B (zh) * 2014-09-18 2017-02-15 深圳市华星光电技术有限公司 液晶显示面板及其制造方法
CN105807473B (zh) * 2014-12-31 2019-06-28 上海仪电显示材料有限公司 滤色片的制作方法、滤色片和液晶面板
CN104793402B (zh) * 2015-04-03 2018-07-06 昆山龙腾光电有限公司 一种液晶显示面板及其形成方法
CN104750347A (zh) * 2015-04-17 2015-07-01 合肥京东方光电科技有限公司 电容式触摸屏及其制备工艺及触摸显示面板
CN104793405B (zh) * 2015-04-28 2018-06-19 深圳市华星光电技术有限公司 液晶显示器及液晶面板
CN104932138B (zh) 2015-07-07 2018-08-28 深圳市华星光电技术有限公司 一种光罩及彩膜基板的制备方法
CN105446530A (zh) * 2015-11-19 2016-03-30 业成光电（深圳）有限公司 行动电子装置的显示模块结构
CN106154651A (zh) * 2016-09-14 2016-11-23 厦门天马微电子有限公司 一种触控显示面板
CN106324895A (zh) * 2016-10-24 2017-01-11 京东方科技集团股份有限公司 显示面板及其制备方法
CN106773251A (zh) * 2016-12-29 2017-05-31 东旭（昆山）显示材料有限公司 一种彩膜基板及其制备方法以及显示面板和显示器
CN106707599B (zh) * 2016-12-29 2019-05-14 惠科股份有限公司 一种液晶显示面板及其制造方法
CN106502005A (zh) * 2017-01-03 2017-03-15 京东方科技集团股份有限公司 一种显示面板及其制备方法和显示装置
CN107479260A (zh) * 2017-09-08 2017-12-15 深圳市华星光电技术有限公司 Coa基板及其制作方法、显示面板
CN108508658B (zh) * 2018-03-30 2020-12-25 京东方科技集团股份有限公司 彩膜基板、彩膜基板的制作方法及显示面板
CN110967861A (zh) * 2018-09-28 2020-04-07 咸阳彩虹光电科技有限公司 一种液晶面板、彩膜基板及其制备方法
CN109976044A (zh) * 2019-04-01 2019-07-05 深圳市华星光电技术有限公司 显示装置
CN115808823A (zh) * 2021-09-13 2023-03-17 京东方科技集团股份有限公司 显示面板及显示装置
CN117480445A (zh) * 2022-05-27 2024-01-30 京东方科技集团股份有限公司 液晶显示面板及显示装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000338503A (ja) * 1999-05-26 2000-12-08 Casio Comput Co Ltd 液晶表示素子
US7630051B2 (en) * 2005-05-18 2009-12-08 Lg Display Co., Ltd. LCD panel and method having color filter and smoothing layers overlapping black matrix and first to third spacers in non-active area where the spacers are disposed on the smoothing layer at progressively increasing distances from substrate seal
TW201003256A (en) * 2008-07-08 2010-01-16 Au Optronics Corp Spacer structure
CN103149741A (zh) * 2011-12-07 2013-06-12 群康科技(深圳)有限公司 滤光层基板及显示装置
CN103529591A (zh) * 2013-10-15 2014-01-22 合肥京东方光电科技有限公司 彩膜基板及制备方法、显示面板及制备方法、显示装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005338770A (ja) * 2004-04-26 2005-12-08 Nec Lcd Technologies Ltd 液晶表示装置
EP2116894A4 (en) * 2007-03-07 2011-09-28 Sharp Kk LIQUID CRYSTAL DISPLAY PANEL, LIQUID CRYSTAL DISPLAY DEVICE, AND TELEVISION RECEIVER
CN101334561A (zh) * 2007-06-29 2008-12-31 群康科技(深圳)有限公司 液晶显示面板与液晶显示面板组装方法
US8134652B2 (en) * 2008-01-16 2012-03-13 Samsung Electronics Co., Ltd. Liquid crystal display having sensor and spacer arrangement and and method of manufacturing the same
CN102213857A (zh) * 2010-04-07 2011-10-12 上海广电富士光电材料有限公司 一种彩色滤光基板及其制作方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000338503A (ja) * 1999-05-26 2000-12-08 Casio Comput Co Ltd 液晶表示素子
US7630051B2 (en) * 2005-05-18 2009-12-08 Lg Display Co., Ltd. LCD panel and method having color filter and smoothing layers overlapping black matrix and first to third spacers in non-active area where the spacers are disposed on the smoothing layer at progressively increasing distances from substrate seal
TW201003256A (en) * 2008-07-08 2010-01-16 Au Optronics Corp Spacer structure
CN103149741A (zh) * 2011-12-07 2013-06-12 群康科技(深圳)有限公司 滤光层基板及显示装置
CN103529591A (zh) * 2013-10-15 2014-01-22 合肥京东方光电科技有限公司 彩膜基板及制备方法、显示面板及制备方法、显示装置

Also Published As

Publication number Publication date
US9880427B2 (en) 2018-01-30
CN103529591A (zh) 2014-01-22
US20160004113A1 (en) 2016-01-07

Similar Documents

Publication Publication Date Title
WO2015055099A1 (zh) 彩膜基板及制备方法、显示面板
WO2015127798A1 (zh) 显示面板及其制备方法、显示装置
CN105914183B (zh) Tft基板的制造方法
US20160043116A1 (en) Thin film transistor and manufacturing method thereof, array substrate and manufacturing method thereof and display device
US9748398B2 (en) Thin film transistor and manufacturing method thereof, display device
WO2020029461A1 (zh) 柔性显示面板及制造方法
WO2013071800A1 (zh) 显示装置、薄膜晶体管、阵列基板及其制造方法
EP3726580A1 (en) Display substrate, manufacturing method therefor and display device
WO2016029612A1 (zh) 薄膜晶体管及其制备方法、显示基板及显示装置
US9958732B2 (en) Liquid crystal display panel and display device
WO2017128765A1 (zh) 像素结构及其制备方法、阵列基板和显示装置
KR101630103B1 (ko) 어레이 기판, 그 제조 방법 및 어레이 기판을 포함하는 디스플레이 장치
WO2016177242A1 (zh) 触控显示面板及其制备方法、触控显示装置
WO2015000257A1 (zh) 阵列基板及其制备方法、显示装置
WO2015035832A1 (zh) 阵列基板及其制备方法和显示装置
WO2015085772A1 (zh) 基板的制作方法
US20180095320A1 (en) Liquid crystal display panle, tft substrate and manufacturing method thereof
WO2015081675A1 (zh) 基板及其制作方法、显示装置
US20170194361A1 (en) Electrically conductive structure and manufacturing method thereof, array substrate, display device
WO2014173138A1 (zh) 阵列基板及其制作方法以及显示装置
US20160284737A1 (en) Display substrate, its manufacturing method, and display device
US9799683B2 (en) Array substrate, preparation method thereof and display device
US20160322388A1 (en) Array substrate, its manufacturing method and display device
WO2018040409A1 (zh) 一种金属氧化物薄膜晶体管及其制备方法
CN112582348A (zh) Oled显示面板及其制备方法

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 14854724

Country of ref document: EP

Kind code of ref document: A1

WWE Wipo information: entry into national phase

Ref document number: 14655535

Country of ref document: US

NENP Non-entry into the national phase
32PN Ep: public notification in the ep bulletin as address of the adressee cannot be established

Free format text: NOTING OF LOSS OF RIGHTS PURSUANT TO RULE 112(1) EPC (EPO FORM 1205A DATED 22.08.2016)

122 Ep: pct application non-entry in european phase

Ref document number: 14854724

Country of ref document: EP

Kind code of ref document: A1