WO2015022793A1 - Dispositif à faisceau de particules chargées ayant un mode d'annulation de fonction et un mode d'extension de fonction - Google Patents

Dispositif à faisceau de particules chargées ayant un mode d'annulation de fonction et un mode d'extension de fonction Download PDF

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Publication number
WO2015022793A1
WO2015022793A1 PCT/JP2014/062983 JP2014062983W WO2015022793A1 WO 2015022793 A1 WO2015022793 A1 WO 2015022793A1 JP 2014062983 W JP2014062983 W JP 2014062983W WO 2015022793 A1 WO2015022793 A1 WO 2015022793A1
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Prior art keywords
charged particle
sample
particle beam
image
mode
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PCT/JP2014/062983
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English (en)
Japanese (ja)
Inventor
浩嗣 梶山
佐藤　貢
安藤　徹
齋藤　勉
訓志 重藤
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株式会社日立ハイテクノロジーズ
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Publication of WO2015022793A1 publication Critical patent/WO2015022793A1/fr

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H01J37/265—Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination

Definitions

  • the present invention relates to a charged particle beam apparatus such as a scanning electron microscope.
  • GUI graphic user interface
  • Patent Document 1 due to recent technological advancement, it is possible to realize a charged particle beam apparatus at a very low price for performance, and accordingly, in the past, such as educational sites such as elementary and junior high schools and automobile repair shops, etc. In light of the fact that charged particle beam measures are being introduced to places that could not have been envisaged, an intuitive and easy-to-operate GUI that can be operated even by beginners without specialized knowledge is disclosed. . Patent Document 1 discloses a technique that makes it easy to operate by reducing the user's operation by limiting the observation conditions such as the electro-optic conditions in the charged particle beam apparatus microscope to a fixed value as a table. ing.
  • the inventor of the present application can operate even a beginner without specialized knowledge, and a user who has mastered basic operations and deepened their understanding of the charged particle beam device can set advanced observation conditions and perform advanced observations. As a result of intensive studies on a charged particle beam apparatus capable of performing the following, the following knowledge has been obtained.
  • the height (Z axis) and tilt (T axis) of the sample stage are set appropriately according to the observation purpose. If it is necessary to set a combination of conditions that is wrong one step, the observation purpose may not be achieved at all. For example, if the height (Z-axis) of the sample stage is not appropriate, astigmatism increases or the focus is lost, and the observation image is blurred or distorted. If the sample stage is too far away, the image observation itself cannot be performed due to a decrease in the yield of signal electrons. In addition, if the sample stage (T-axis) is tilted, part of the sample surface is too close or too far away, and the observation image may be blurred or distorted, or the image observation itself cannot be performed. .
  • the charged particle beam device disclosed in Patent Document 1 basically provides operability specialized for general users including beginners, and the hardware has a simple configuration corresponding to it. Only functions necessary for general users are installed.
  • the purpose of the present invention is a charged particle beam apparatus that can be observed without being conscious of complicated observation conditions including the height and inclination of the sample stage, and can be used easily even by beginners, but also for advanced observation.
  • the present invention relates to realizing a charged particle beam apparatus capable of setting fine observation conditions.
  • the present invention provides, for example, an image display unit that maintains the height of the sample stage at a predetermined level, maintains the tilt angle of the sample stage horizontally, and can move and move the field of view of the sample image in the vertical and horizontal directions and in the rotation direction. Charging with an extended release mode that displays on the image display, and a function expansion mode that can operate the height and tilt angle of the sample stage and display an operation area on the image display unit that can move the visual field of the sample image up, down, left, and right and in the rotation direction
  • the present invention relates to a particle beam apparatus.
  • the present invention provides, for example, an extension release mode in which the distance between the end of the charged particle optical system and the sample stage and the tilt of the sample stage cannot be operated arbitrarily, and the three-dimensional movement, tilt and rotation of the sample stage arbitrarily operated
  • the present invention relates to a charged particle beam apparatus having a function expansion mode capable of switching between an expansion cancellation mode and a function expansion mode.
  • the present invention it is possible to observe without being aware of complicated observation conditions including the height and inclination of the sample stage, and even if it is a charged particle beam apparatus that can be used easily even by beginners, even if you want to make advanced observations, A charged particle beam apparatus that can set fine observation conditions can be realized.
  • FIG. 1 is a diagram illustrating a basic configuration of an SEM according to Example 1.
  • FIG. 1 is a diagram showing a system configuration of an SEM according to Example 1.
  • FIG. 10 is a diagram illustrating a specific operation screen example of a GUI in an extended cancellation mode according to the first embodiment.
  • FIG. 10 is a diagram illustrating a specific operation screen example of a GUI in a function expansion mode according to the first embodiment.
  • 6 is an operation flowchart when switching between extension cancellation / function extension according to the first embodiment; It is a figure which shows the observation purpose setting screen structure at the time of the expansion cancellation
  • FIG. It is a figure which shows the table structure which recorded the observation conditions according to the observation purpose concerning Example 1.
  • FIG. It is a figure which shows the screen which sets the sample concerning Example 1.
  • FIG. is a figure which shows the application assistance screen concerning Example 3.
  • FIG. 10 is a diagram illustrating a specific operation screen example of a GUI in an extended cancellation mode according to the first embodiment.
  • a charged particle source that emits a charged particle beam
  • a charged particle optical system that irradiates the sample with a charged particle beam
  • a detector that detects signal electrons generated from the sample
  • a sample an X axis
  • a sample stage driven by the Y-axis, Z-axis, T-axis and R-axis
  • an image display unit for displaying a sample image formed from signal electrons
  • the control unit maintains the height of the sample stage at a predetermined level, maintains the tilt angle of the sample stage horizontally, and rotates the field of view of the sample image vertically and horizontally.
  • An extension release mode that displays an operation area that can be moved in the direction on the image display section, an operation area that allows you to operate the height and tilt angle of the sample stage, and move the field of view of the sample image in the vertical and horizontal directions and in the rotation direction.
  • Has the extension mode for displaying on the display unit it discloses a charged particle beam apparatus for displaying an operation area for switching the extended release mode and the extension mode to the image display unit.
  • a charged particle source that emits a charged particle beam
  • a charged particle optical system that irradiates the sample with the charged particle beam
  • a detector that detects signal electrons generated from the sample
  • a sample Sample stage that can be moved, tilted, and rotated
  • an image display unit that displays a sample image formed from signal electrons
  • a control that controls the charged particle source, charged particle optical system, detector, sample stage, and image display unit
  • an extension release mode in which the interval between the end of the charged particle optical system and the sample stage and the tilt of the sample stage cannot be arbitrarily operated, and the three-dimensional movement, tilt and rotation of the sample stage.
  • a charged particle beam device having a function expansion mode that can be operated on and switching between an expansion cancellation mode and a function expansion mode.
  • control unit keeps the R axis of the sample stage constant in the extension release mode, and when an instruction to move the sample image field of view in the rotation direction is input from the operation region, the sample rotation is performed by raster rotation. Rotating the field of view of an image is disclosed. Further, it is disclosed that the control unit rotates the field of view of the sample image by raster rotation when an instruction to move the field of view of the sample image in the rotation direction is input without rotating the sample stage in the extension cancellation mode.
  • control unit displays an observation condition selection region in which a predetermined observation condition can be selected in the extension cancellation mode on the screen display unit, and controls the height of the sample stage according to the selected observation condition.
  • control unit takes over the observation condition when switching from the extension cancellation mode to the function extension mode.
  • an observation condition selection area in which a predetermined observation condition can be selected is displayed on the screen display unit, and the selected observation condition is reset. , Switching to the extended release mode is disclosed.
  • a sample holder selection region for setting a sample holder held on the sample stage is displayed on the image display unit.
  • control unit controls the X and Y axes of the sample stage and shifts the image of the sample image. Is moved up, down, left and right, and the image shift is reset when the magnification of the sample is lower than a predetermined magnification.
  • control unit controls the X and Y axes of the sample stage and shifts the image of the sample image. Is moved up, down, left and right, and the image shift is reset a plurality of times in accordance with the movement of the sample stage.
  • control unit switches between the extension release mode and the function extension mode according to the input user name or password.
  • the present invention includes an appearance inspection apparatus using an electron beam, a focused ion beam (FIB) apparatus, etc.
  • the present invention can be applied to general charged particle beam apparatuses that perform processing.
  • FIG. 1 is a diagram showing a basic configuration of the SEM according to the present embodiment.
  • a primary electron beam 4 charged particle beam
  • an electron gun 1 is controlled and accelerated by an anode 2, converged by a condenser lens 3 and an objective lens 6, and held by a sample stage 10.
  • the sample 8 placed on the table 9 is irradiated.
  • the sample stage 10 is disposed in a sample chamber not shown.
  • the sample chamber is connected to an evacuation system including a vacuum pump (not shown).
  • the primary electron beam 4 is corrected by the stigma lens 19.
  • the main control unit 13 controls the anode 2, the condenser lens 3, the objective lens 6, the stigma lens 19, and the sample stage 10 that constitute the charged particle optical system.
  • the main control unit 13 and the computer 14 constitute an operation control unit.
  • a deflector 5 is provided in the path of the primary electron beam 4.
  • a predetermined deflection current is sent from the main control unit 13 to the deflector 5 according to an arbitrary setting magnification set from an input device 17 (command input unit) such as a mouse, a keyboard and / or an operation panel connected to the computer 14. Be paid.
  • an input device 17 command input unit
  • the primary electron beam 4 is deflected, and the surface of the sample 8 is secondarily scanned.
  • the movement of the sample 8 to the observation position is performed by the main control unit 13 controlling the sample stage 10. Secondary electrons 7 generated by electron beam irradiation to the observation position of the positioned sample 8 are detected by the secondary electron detector 11, amplified by the amplifier 12, and supplied to the computer 14 via the main controller 13.
  • the observation field of view can be changed by image shift or raster rotation.
  • the main control unit 13 controls the deflector 5 to deflect the primary electron beam 4 to change the scanning area vertically and horizontally and move the observation field vertically and horizontally.
  • the movable range of the observation visual field is limited to the scannable region, it does not require a mechanical operation, so that the visual field can be moved with high accuracy.
  • the control unit 13 controls the deflector 5 to deflect the primary electron beam 4, rotate the scanning direction, and rotate the observation field. Unlike the rotation by the sample stage, the observation field can be rotated around the observation field.
  • the image signal based on the secondary electrons detected by the secondary electron detector 11 is displayed as an image on the image display device 15.
  • reflected electrons and transmitted electrons can be detected and displayed as an image.
  • a storage device 16 is connected to the computer 14.
  • an operation program 20 for performing control and data analysis processing is used in the computer 14 for controlling the entire SEM apparatus and for analyzing data obtained by the apparatus.
  • This operation program 20 is stored in the memory 18.
  • the operation program 20 has a GUI mode, and can visually notify various apparatus states and receive instructions for apparatus control and data analysis processing from the user.
  • FIG. 2 is a diagram illustrating a system configuration of the SEM according to the present embodiment.
  • an operation program 20 operating on a computer 14 includes a GUI mode (expansion cancellation mode 201) used by general users including beginners, and an advanced observation that requires expert users and detailed observation condition settings. It has a GUI mode (function expansion mode 202) used when The user can switch between the extended release mode 201 and the function extended mode 202 according to his / her application.
  • GUI mode expansion cancellation mode 201
  • function expansion mode 202 used when The user can switch between the extended release mode 201 and the function extended mode 202 according to his / her application.
  • the extended cancellation mode 201 is a mode for a user who wants to observe a sample anyway without thinking about difficulties, and does not display functions that are used only during advanced observation on the GUI (on the image display device 15). The operation is also restricted. This provides simple and easy-to-understand operability for general users.
  • Both of the above-described two GUI modes, the extension cancellation mode 201 and the function extension mode 202, have operation screens for setting observation conditions, and hardware control according to user operations can be performed on the operation screens. Made.
  • the user designates an operation using the operation button 206 for performing a basic operation, the complicated function button 211, or the function button 214 suitable for the purpose.
  • the operation information designated by the user is converted into command information for controlling the hardware and transmitted to the main control unit 13 via the command transmission / reception unit 203A.
  • the main control unit 13 performs control according to the command transmitted from the command transmission / reception unit 203A and received by the command transmission / reception unit 203B, and finally the current voltage via the digital-analog conversion circuit (DAC) 204 and the driver 205.
  • Signals and pulse signals are converted into electronic lenses such as an electron gun 1, an objective movable diaphragm, a condenser lens 3, an objective lens 6 and a stigma lens 19, hardware such as a sample stage motor, a vacuum pump and a detector 11. Control and set various observation conditions.
  • the command is a data format for exchanging information between the main control unit 13 and the computer 14.
  • the main control unit 13 analyzes the received command, and accordingly, the stage XY axis control unit of the control unit group 216 sets a parameter for driving the motor in the driver 205.
  • the driver 205 drives the motor by controlling the pulse signal and current voltage for the connected step motor and servo motor.
  • the sample stage 10 is driven in the XY directions, and the sample 8 on the sample stage 10 moves.
  • the irradiation position of the primary electron beam 4 irradiated on the sample 8 changes, and an image signal corresponding to the irradiation position is generated.
  • the generated image signal is converted into a digital signal by an analog-digital conversion circuit (ADC) 207 and converted into two-dimensional image data by an image data generation unit 208.
  • ADC analog-digital conversion circuit
  • the two-dimensional image data is displayed on the image display unit 210 of the GUI (image display device 15) via the display control unit 209, the user can recognize the movement of the image.
  • the function expansion mode 202 many interfaces are provided so that various observation conditions can be set in detail, and there are many commands corresponding to them.
  • the extended cancellation mode 201 in order to provide a simple and easy-to-understand interface, the operation buttons 206 for performing basic operations are displayed, but the complicated function buttons 211 for performing complicated settings are not displayed. .
  • the extended cancellation mode 201 it is possible to perform observation with only a simple function by combining optimum setting values according to the observation purpose and automatically setting the combination.
  • the acceleration voltage when the surface structure of the sample 8 is to be observed, it is desirable to set the acceleration voltage to be low and use the secondary electron detector 11. If the acceleration voltage is determined, it is possible to determine an adjustment value of an electron lens or the like that adjusts the convergence point and the optical axis. Such optimal observation conditions according to the observation purpose are held in advance as the observation condition table 212.
  • the switching control unit 213 determines from the observation condition table 212, converts it into a plurality of commands, and automatically sets the observation condition.
  • a function 214 suitable for the purpose of observation is determined from the observation condition table 212 and arranged.
  • the optimum control unit 215 for each purpose determines from the observation condition table 212 according to the currently set observation purpose, converts it to a command, and observes it. Set observation conditions suitable for the purpose.
  • the function expansion mode 202 and the expansion cancellation mode 201 are different from each other only in the program that operates on the computer 14, the setting at the time of login and the operation of the switching button can be performed without changing the hardware. You can choose.
  • FIG. 3 is a diagram illustrating a specific operation screen example of the GUI in the extension cancellation mode 201.
  • the operation screen shown in FIG. 3 includes an image display screen 210, an extension cancellation / function extension switching button 300, an observation start / stop button 301 for starting and stopping observation, and an observation purpose change button 302 for resetting the observation purpose.
  • the operation screen of the extended release mode 201 does not have a screen for directly setting the Z-axis (height), R-axis (rotation), and T-axis (tilt) of the sample stage 10, and can be arbitrarily operated by the user. Is limiting.
  • the R-axis movement (rotation) of the sample stage 10 and the raster rotation can be used together, a beginner may be confused. Therefore, in the extended release mode 201, the R-axis (rotation) by the user is limited and the raster rotation is performed. Only can be operated. On the other hand, if the sample stage 10 is moved (rotated) along the R axis, the relative positional relationship (direction) between the sample and the detector may change, and the appearance of the sample may change. It is good also as a structure which can be rotated.
  • a general charged particle beam apparatus has a screen for setting an acceleration voltage value and a spot intensity to control an electron beam.
  • a screen for setting an acceleration voltage value and a spot intensity to control an electron beam.
  • the operation screen of the extended cancellation mode 201 in one embodiment of the present invention In order to control the electron beam, there is no screen area for setting the acceleration voltage value and the spot intensity, and the direct setting by the user is limited.
  • the intention is to observe the sample surface structure, but the internal structure is observed. There is also a risk of damaging the sample itself.
  • the possibility of being in the above state can be completely eliminated.
  • the user's observation purpose can be satisfied with only such a simple adjustment screen.
  • the observation purpose change button 302 in FIG. 3 is pressed, the observation purpose setting screen 600 shown in FIG. 6 is displayed.
  • the selected purpose is displayed. Accordingly, the conditions shown in FIG. 7 are automatically set.
  • the acceleration voltage is applied and the observation starts.
  • the optimum acceleration voltage value according to the observation purpose is automatically set, and at the same time, the spot intensity, the focus value, the stigma value, the alignment value, and the stage position are also automatically set. Since the movement of the sample stage 10 may take time until the movement is completed, it can be configured to automatically move simultaneously with setting the observation purpose.
  • the user adjusts the brightness and contrast using the input device 17 such as a slider or an operation panel while looking at the sample image displayed on the image display screen 210, and similarly adjusts the focus to find the target field of view. Perform image output.
  • the input device 17 such as a slider or an operation panel
  • the brightness, contrast, and focus adjustment may be automatically adjusted by pressing the button of the auto image adjustment area 306, or automatically adjusted in conjunction with the electron beam application process when the observation start button 301 is pressed. Also good.
  • the autofocus process in this embodiment does not search the entire working distance range, but focuses on the working distance determined by the user's observation purpose and sample setting, and limits the search range to increase the speed. Focus processing may be used.
  • magnification adjustment and visual field movement are performed to find a desired observation visual field.
  • the magnification is adjusted using a slider or an operation panel. At this time, it is also possible to configure so that the magnification can be adjusted by mouse drag on the display image or mouse wheel scroll.
  • the image display screen 210 When the visual field on the image display screen 210 is to be moved in the up / down / left / right (X / Y) direction, the image display screen 210 is dragged, for example, in the desired direction. It is also possible to specify and move the position to be moved directly on the image, for example, by clicking on the position to be moved to the center.
  • the computer 14 performs image shift by moving the sample stage 10 and deflecting the primary electron beam 4 by controlling the deflector 5 based on the input information. If the movement amount of the visual field is within the range in which the image shift is possible, the movement by the image shift is performed, and if the movement amount is not the image shift movement, the stage is moved. Image shift and stage movement are controlled in consideration of raster rotation, and the user only needs to specify the direction (up / down / left / right) on the observation field.
  • the rotation angle can be input using a slider, and an object drawn by a computer such as a horizontal ruler can be superimposed on the operation screen display to display the horizontal It may be rotated while checking the position of the observation image desired.
  • the display mode is switched in the display mode setting area 304, and the focus and brightness are finally adjusted by scanning with a high S / N and excellent image adjustment.
  • the display mode change buttons in the display mode setting area 304 include “viewing field of view”, “image confirmation”, and “image adjustment”, and these are used for the following purposes.
  • “Finding field of view” is a mode in which high-speed scanning is performed and the image update speed is increased although the quality of the image is lowered, and the followability to the movement of the field of view is improved.
  • image confirmation is a mode used for final confirmation before image recording, etc. by performing a slow scan, and improving the quality of the image although the image update speed is slow.
  • Image adjustment is a mode used to adjust focus and astigmatism. The scan is slow, so the quality of the image is excellent, and the update speed is increased by reducing the scan area. Mode.
  • buttons have easy-to-understand meanings and can be operated intuitively.
  • the user presses the image save button 305 and saves the image as electronic data (file) in the storage device 16 connected to the computer 14.
  • the scan speed at the time of image storage and the scan speed in each display mode vary greatly depending on the observation purpose. For example, if an observation purpose for observing the composition of a sample is selected, a BSE detector using a semiconductor detector is automatically set.
  • the scanning speed must be set a little slower than the secondary electron detector.
  • FIG. 4 is a diagram showing a specific operation screen example of the GUI in the function expansion mode 202.
  • the function expansion mode 202 in contrast to the above-described expansion cancellation mode 201, all conditions can be set and have various setting screen areas.
  • it has a purpose setting screen area 400 in which the acceleration voltage and pod intensity of the electron optical system can be set with fine numerical values.
  • a screen for adjusting the alignment of the electron beam and a button 401 for opening the screen are provided. It also has a detector switching function button 402. Furthermore, it is possible to display multiple signals at the same time. In addition to observing on one screen, different detectors can be displayed on two or four screens at the same time, allowing observation while comparing images and synthesizing signals. It is.
  • sample stage 10 not only the X axis and Y axis, but also the R axis, Z axis, and T axis can be arbitrarily controlled, and the image shift can also be individually controlled. It is also possible to move by directly inputting coordinate values.
  • a total of 17 or more scan speeds such as Rapid1 to 2, Fast1 to 2, CSS1 to 5, Slow1 to 5, Reduce1 to 3, etc. can be applied to the four buttons shown in the figure. Assigned and used.
  • FIG. 5 is an operation flowchart when switching between extension cancellation / function extension in this embodiment.
  • Either the extension cancellation mode 201 or the function extension mode 202 is initialized at the time of login. Further, the mode can be switched by a switching button 300 shown in FIG. 3 or FIG. General users including beginners switch to the function expansion mode 202 by pressing the switch button 300 when more advanced observation is necessary while continuing the observation in the expansion cancellation mode 201.
  • a table for designating whether the extension cancellation mode 201 or the function expansion mode 202 is specified for each user (or password) is registered in the memory 18 in advance.
  • the mode is automatically set. Note that a screen for selecting the extension cancellation mode 201 or the function extension mode 202 may be displayed after login, and may be selected by the user.
  • step 503 When observation is started, it is determined whether or not a sample is set (step 501). If the sample is not set, the sample is set by the sample setting sequence (step 502). Thereafter, mode determination is performed (step 503).
  • the observation purpose is set (step 504), and the observation conditions are automatically set (step 505). Then, the sample image is observed in the extension cancellation mode 201 (step 506). If the observation purpose is changed in step 506, the process returns to step 504.
  • step 506 when the switch button 300 is pressed and the function expansion mode 202 is selected (step 509), the function expansion mode 202 is switched to and the sample image is observed in the function expansion mode 202 (step 507).
  • the function extension mode 202 can reproduce all the observation conditions in the extension release mode 201 because the function is not restricted at all. Therefore, it is possible to smoothly shift from the observation in the extended cancellation mode 201 to the advanced observation in the function expansion mode 202 with reference to the state observed in the extended cancellation mode 201.
  • the function expansion mode 202 When the function expansion mode 202 is switched as described above, or when the function determination mode 202 is determined in the mode determination (step 503), the sample image is observed in the function expansion mode 202. In the case of the function expansion mode 202, when the user presses the switching button 300, the transition process to the expansion cancellation mode 201 starts.
  • the process proceeds to the sample setting sequence 502, the sample is reset, and the normal sample holder is If set, the process proceeds directly to mode determination 503. Then, the process proceeds to the extended cancellation mode 201.
  • step 503 the observation purpose setting screen is displayed, and the user is allowed to set the observation purpose again.
  • the electron beam application may be automatically turned off in the sense of resetting the observation.
  • a confirmation message may be displayed to confirm the user.
  • login management of a user may be performed by an application, and the transition to the function expansion mode may be prohibited depending on the user, and approval by a password or the like may be performed.
  • FIG. 8 is a diagram showing a screen 900 for setting a sample according to the present embodiment.
  • sample settings are “selection of sample stage”, “adjustment of sample height”, “drawing of sample stage”, “confirmation of sample height / insertion of sample stage”, “evacuation”, etc. You will be guided through a wizard step by step.
  • the sample stage is selected by selecting the sample stage to be used from the displayed sample stage selection list 902, but the items 903 that cannot be used in the extended release mode 201 are hidden from this list and are set erroneously. It prevents that.
  • the full size of the selected sample stage is displayed on the display area 904 to the user so that it can be compared with the actual product, thereby preventing erroneous setting.
  • observation purpose change screen 600 in the extended cancellation mode 201 shown in FIG. 6 will be described.
  • the observation purpose setting screen 600 is displayed when the observation purpose change button 302 in FIG. 3 is pressed.
  • the screen is also displayed when the extension release button 300 in FIG. 4 is pressed to shift from the function extension mode 202 to the extension release mode 201.
  • the observation purpose change screen 600 displays a plurality of observation purposes 601 according to the user's purpose.
  • the observation purpose 601 is easy to understand even for a novice user, and the feature may be expressed by a sentence, an actual image, or a radar chart.
  • observation purpose 601 on the observation purpose setting screen 600 shown in FIG. 6 When the user uniquely selects the observation purpose 601 on the observation purpose setting screen 600 shown in FIG. 6, appropriate observation conditions corresponding to the purpose are automatically set.
  • the automatically set observation conditions are tabulated as shown in FIG. 7, and are stored as an observation condition file in the memory 18 or the storage device 16 connected to the computer 14 in association with the selected observation purpose 601. Yes.
  • a record 700 in the table shown in FIG. 7 includes a detector, an acceleration voltage value, a spot intensity, an alignment value, a focus value, a stigma value, a scan mode (display mode), and a stage XYZTR coordinate value. Automatically set according to the purpose.
  • the top observation purpose “standard observation” is the default observation purpose, and is the basis of SEM observation.
  • the observation conditions are obtained.
  • “standard observation” is a condition that allows a beginner who does not know which condition is appropriate for a conductive sample to easily obtain satisfactory data. By using such observation conditions, it is expected that beginners will be able to take pictures easily, and will be motivated to use the apparatus, and further improve their will.
  • the observation conditions that can provide a sharp concavo-convex structure on the surface of the sample even at high magnifications are conditions that provide high resolution. By using such observation conditions, the user can acquire an image at a high magnification, for example, 100,000 times relatively easily without being aware of the magnification.
  • Specific parameter settings include, for example, an acceleration voltage of 15 kV, a sample stage height Z (working distance) of 5 mm, a sample stage tilt T of 0 degrees, a condenser lens with strong excitation, and a small aperture diameter of the objective movable aperture.
  • the degree of vacuum is high vacuum
  • the detection signal is secondary electrons. Since secondary electrons have a weak energy of several eV and can be generated only from about 10 nm of the sample surface, using secondary electrons can obtain an image that more reflects the uneven structure of the surface. Theoretically, the resolution becomes higher as the acceleration voltage is higher, and the SEM can usually be observed up to an acceleration voltage of 30 kV.
  • the acceleration voltage is too high, the electron beam from the primary electron beam 2 is generated inside the sample if the acceleration voltage is too high. The depth to invade becomes deeper. As a result, internal information is mixed with secondary electrons emitted by electron beam irradiation, making it difficult to obtain an image reflecting the uneven structure of the sample surface.
  • the second observation purpose “observation that emphasizes the surface structure” from the top is an observation condition in which fine unevenness on the sample surface, which was difficult to observe by “standard observation”, can be displayed more three-dimensionally.
  • Specific parameter settings include, for example, an acceleration voltage of 5 kV, a sample stage height Z (working distance) of 5 mm, a sample stage tilt T of 0 degrees, a condenser lens with strong excitation, and a small aperture diameter of the objective movable aperture.
  • the degree of vacuum is high vacuum, and the detection signal is secondary electrons.
  • the difference from the “standard observation” is that the acceleration voltage is changed from 15 kV to 5 kV.
  • the degree of vacuum is high vacuum, and the detection signal is backscattered electrons.
  • the difference from “standard observation” is that the acceleration voltage is changed from 15 kV to 5 kV, the detection signal is backscattered electrons, and the excitation of the condenser lens is slightly weakened.
  • the acceleration voltage is changed from 15 kV to 5 kV, the resolution is lowered, but an image in which the uneven structure on the sample surface is more emphasized is obtained.
  • the fourth observation purpose “observation that emphasizes material distribution” from the top is an observation condition in which the difference in material can be displayed with contrast of light and dark in samples composed of different materials such as composite materials and foreign substances.
  • Specific parameter setting values include, for example, an acceleration voltage of 15 kV, a sample stage height Z (working distance) of 5 mm, a sample stage tilt T of 0 degree, a condenser lens with medium excitation, and a small aperture diameter of the objective movable diaphragm.
  • the degree of vacuum is high vacuum, and the detection signal is backscattered electrons.
  • the difference from “standard observation” is that the detection signal is backscattered electrons, and the excitation current of the condenser lens is slightly weakened to increase the irradiation current.
  • a feature of backscattered electrons is that the difference in materials can be expressed by a contrast difference. The heavier the material, the higher the reflectivity and the more signals are generated, resulting in a brighter image and the difference in material can be displayed with a contrast of light and dark. On the other hand, since the backscattered electrons have substantially the same energy as the incident electrons, backscattered electrons generated inside the sample are also detected. For this reason, internal information is mixed as compared with secondary electrons, and the resolution is deteriorated.
  • the bottom observation purpose “observation for analyzing element” is an observation condition for performing EDX analysis by increasing the thickness of the primary electron beam 4 and increasing the irradiation current.
  • “observation for analyzing elements” the difference in materials can be displayed with contrast of light and dark. Elemental analysis can be performed by searching for a location for EDX analysis under these observation conditions, adjusting the focus, etc., and then performing an operation on the EDX apparatus side.
  • Specific parameter settings include, for example, an acceleration voltage of 15 kV, a sample stage height Z (working distance) of 10 mm, a sample stage tilt T of 0 degrees, a condenser lens with weak excitation, and a small aperture diameter of the objective movable aperture.
  • the service person can adjust the focus value, stigma value, and alignment value, which may have different optimum values due to model differences caused by maintenance such as chip replacement and baking. Moreover, it is possible to replace the value with a value previously adjusted by the user using the automatic calibration function, not limited to the service person.
  • the XY coordinates of the sample stage are not only automatically set, but the current coordinate values may be maintained so that the observation field of view can be continuously observed as long as it is within a settable range.
  • An observation purpose for tilting the sample stage such as analysis of the crystal orientation and crystal structure of the sample using an EBSD (Electron Backscattered Diffraction) detector, is provided.
  • the angle may be inclined.
  • the present embodiment it is possible to perform observation without being aware of complicated observation condition settings including the height and inclination of the sample, and even if it is a charged particle beam apparatus that can be used easily even by beginners, it is necessary to perform advanced observation.
  • the present invention is not limited to the above-described embodiment, and includes various modifications.
  • the field of view movement the actual movement of the sample stage in the XY axis direction and the movement by image shift that moves the field of view by moving the charged particle beam without actually moving the sample stage
  • a method has been described in which the user is not aware of the difference between the image shift and the actual stage movement, only the image shift may be performed as long as the apparatus does not have hardware for movement in the stage XY axis direction.
  • the apparatus has a small image shift amount and is frequently used at a low magnification, the convenience of the image shift is small, so that only the movement by the actual stage may be performed.
  • the movement of a minute observation visual field at a high magnification may cause a deviation from the visual field position intended by the user due to the influence of backlash or drift in the case of visual field movement due to stage movement. Therefore, if the visual field movement distance designated by the user is within the image shift movement range, it is desirable to move the visual field with an image shift having no influence as described above.
  • the distance that the visual field can be moved by the image shift is very small with respect to the stage movement, and when it is desired to further shift the image in the image shifted direction, it can move only by the amount already moved. For this reason, in order to maximize the movable distance by the image shift, the image shift is as possible as the midpoint position of the movable range. It is desirable to be in the center.
  • the distance to move in advance is indefinite, so the image shift amount is offset and the stage It cannot be moved, and image shift reset cannot be performed.
  • the amount of visual field movement due to image shift is very small relative to the amount of movement due to stage movement, and there are conditions that prevent visual field movement due to image shift from being recognized on the screen. For this reason, it is conceivable that the image shift is automatically reset when these conditions are met, that is, when visual field movement cannot be recognized on the screen.
  • the movement width by the image shift is smaller than the width on the sample corresponding to one pixel width on the display, the user cannot recognize the visual field movement by the image shift. Since this condition is satisfied during low-magnification observation, there is no problem even if the image shift is reset. However, if the image shift is automatically reset when the field of view is not moved at all and only the magnification is switched, the field of view is not intended when observing from high magnification to low magnification (automatic image shift reset) to high magnification. May change.
  • the reset determination condition at this time does not have to be limited to the low-magnification observation in which the field of view movement due to the image shift is less than one pixel, and may be variable depending on the condition if the user is not concerned.
  • the image shift reset is divided and executed little by little according to the stage movement.
  • the reset process of the image shift performed by dividing according to the stage movement may be a fixed value as long as the number of divisions is such that the field of view does not move suddenly.
  • the number of divisions may be variable. For example, in order not to lose sight of the visual field position, it is preferable to match the observation image update cycle. If the observation image update cycle is RefreshTime and the stage moving time is StageMoveTime, the number of divisions in the image shift midpoint processing is StageMoveTime / RefreshTime. Therefore, the image shift movement amount performed once at the observation visual field update timing is the movement amount ⁇ / (StageMoveTime / RefreshTime) of the entire image shift midpoint processing.
  • FIG. 9 is a diagram showing a screen of the application assist function 800.
  • the application assist function when the user saves an image, the user inquires whether there is dissatisfaction with the image.
  • buttons such as “image is blurred”, “no stereoscopic effect”, “other” are selected according to the current observation image and the state of the observation image when the image is saved
  • it displays a screen that guides its purpose and solution.
  • an actual characteristic image for example, a blurred image
  • buttons such as “blurred image” and “no three-dimensional effect” are displayed above the buttons such as “blurred image” and “no three-dimensional effect” to facilitate comparison with the current observed image. Also good.
  • the purpose and solution are displayed according to the state of the image.
  • the function expansion mode 202 can be entered.
  • the user can easily understand that the problem can be solved by changing the mode, and even a beginner can effectively use the charged particle beam apparatus.
  • Driver 206 ... Operation button, 20 ... Analog-digital conversion circuit (ADC), 208 ... Image data generation unit, 209 ... Display control unit, 210 ... Image display unit, 211 ... Complex function button, 212 ... Observation condition table, 213... Switching control unit, 214... Function button suitable for purpose, 215... Optimal control unit according to purpose, 300... Extension cancellation / function expansion switching button, 301. Start / stop button, 302 ... Observation purpose change button, 303 ... Field of view setting operation area, 304 ... Display mode change area, 305 ... Image save button, 306 ... Auto image adjustment area, 400 ... Acceleration voltage / spod strength setting screen, 401 ...
  • ADC Analog-digital conversion circuit

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

La présente invention concerne la fabrication d'un dispositif à faisceau de particules chargées qui peut être utilisé facilement même par un débutant, qui est tel que des observations peuvent être faites sans avoir conscience de conditions d'observation compliquées, y compris la hauteur et l'inclinaison d'une platine d'échantillon, et qui permet de régler des conditions d'observation de taille minuscule quand des observations avancées sont souhaitées. Par exemple, le dispositif à faisceau de particules chargées possède : un mode d'annulation d'extension qui affiche, au niveau d'une unité d'affichage d'image, une région de commande permettant de commander le champ de vision de l'image d'échantillon pour le déplacer dans la direction de rotation et vers le haut, le bas, la gauche et la droite, qui maintient une hauteur réglée pour la platine d'échantillon et qui maintient un angle d'inclinaison de platine d'échantillon horizontal; un mode d'extension de fonction qui affiche, au niveau de l'unité d'affichage d'image, une région de commande permettant de commander le champ de vision de l'image d'échantillon pour le déplacer dans la direction de rotation et vers le haut, le bas, la gauche et la droite, et de le commander relativement à la hauteur et à l'angle d'inclinaison de la platine d'échantillon. Par exemple, il existe un mode d'annulation d'extension dans lequel il est impossible de commander l'espacement entre la platine d'échantillon et la pointe d'un système optique à particules chargées, ainsi que l'inclinaison de la platine d'échantillon, et un mode d'extension de fonction dans lequel il est possible de commander n'importe quel mouvement 3D donné, l'inclinaison et la rotation de la platine d'échantillon, et il est possible de commuter entre le mode d'annulation d'extension et le mode d'extension de fonction.
PCT/JP2014/062983 2013-08-12 2014-05-15 Dispositif à faisceau de particules chargées ayant un mode d'annulation de fonction et un mode d'extension de fonction WO2015022793A1 (fr)

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JP6823563B2 (ja) * 2017-07-31 2021-02-03 株式会社日立製作所 走査電子顕微鏡および画像処理装置
JP7008650B2 (ja) 2019-02-01 2022-01-25 日本電子株式会社 荷電粒子線システム及び走査電子顕微鏡を用いた試料測定方法
JP7308582B2 (ja) * 2019-10-18 2023-07-14 株式会社日立ハイテクサイエンス 集束イオンビーム装置、及び集束イオンビーム装置の制御方法
WO2022064628A1 (fr) * 2020-09-25 2022-03-31 株式会社日立ハイテク Microscope électronique

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