WO2014169671A1 - 滤光片、其制备方法以及显示装置 - Google Patents

滤光片、其制备方法以及显示装置 Download PDF

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Publication number
WO2014169671A1
WO2014169671A1 PCT/CN2013/089124 CN2013089124W WO2014169671A1 WO 2014169671 A1 WO2014169671 A1 WO 2014169671A1 CN 2013089124 W CN2013089124 W CN 2013089124W WO 2014169671 A1 WO2014169671 A1 WO 2014169671A1
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Prior art keywords
dielectric film
refractive index
dielectric
film
optical filter
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Ceased
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PCT/CN2013/089124
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English (en)
French (fr)
Inventor
张洪术
邵喜斌
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BOE Technology Group Co Ltd
Beijing BOE Display Technology Co Ltd
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BOE Technology Group Co Ltd
Beijing BOE Display Technology Co Ltd
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Priority to US14/355,369 priority Critical patent/US10191320B2/en
Publication of WO2014169671A1 publication Critical patent/WO2014169671A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/14—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers
    • B32B37/16—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers with all layers existing as coherent layers before laminating
    • B32B37/18—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers with all layers existing as coherent layers before laminating involving the assembly of discrete sheets or panels only
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B38/00—Ancillary operations in connection with laminating processes
    • B32B38/0004—Cutting, tearing or severing, e.g. bursting; Cutter details
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B38/00—Ancillary operations in connection with laminating processes
    • B32B38/0008—Electrical discharge treatment, e.g. corona, plasma treatment; wave energy or particle radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/14—Beam splitting or combining systems operating by reflection only
    • G02B27/141—Beam splitting or combining systems operating by reflection only using dichroic mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/285—Interference filters comprising deposited thin solid films
    • G02B5/286—Interference filters comprising deposited thin solid films having four or fewer layers, e.g. for achieving a colour effect
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/40—Properties of the layers or laminate having particular optical properties
    • B32B2307/402—Coloured
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2310/00—Treatment by energy or chemical effects
    • B32B2310/08—Treatment by energy or chemical effects by wave energy or particle radiation
    • B32B2310/0806—Treatment by energy or chemical effects by wave energy or particle radiation using electromagnetic radiation
    • B32B2310/0843—Treatment by energy or chemical effects by wave energy or particle radiation using electromagnetic radiation using laser
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2551/00—Optical elements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B38/00—Ancillary operations in connection with laminating processes
    • B32B38/10—Removing layers, or parts of layers, mechanically or chemically
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133521—Interference filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2203/00—Function characteristic
    • G02F2203/02—Function characteristic reflective
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10—Methods of surface bonding and/or assembly therefor
    • Y10T156/1052—Methods of surface bonding and/or assembly therefor with cutting, punching, tearing or severing
    • Y10T156/1062—Prior to assembly
    • Y10T156/1064—Partial cutting [e.g., grooving or incising]

Definitions

  • Embodiments of the present invention relate to a filter, a method of fabricating the same, and a display device. Background technique
  • the color film substrate is a key component for colorization of flat panel displays.
  • a liquid crystal flat panel display is a non-active light emitting display, which requires an internal backlight module or an external ambient incident light to provide a light source, and is combined with a driving circuit and a liquid crystal driving control to form a gray scale display, and then passes through the color filter substrate.
  • the red (R), green (G), and (B) color filters form a color display.
  • the basic structure of the color filter substrate is composed of a glass substrate, a black matrix, a color filter, a protective layer, and a transparent conductive film.
  • the red (R), green (G), and blue (B) color filters are formed by the color glue, and the pixels are separated by a black matrix.
  • the principle of the existing color filter is absorption type, that is, A color filter only allows visible light of a specific color to pass, and the visible light of the remaining colors is absorbed.
  • the red color filter only allows red visible light to pass, and the rest of the visible light is absorbed, and the visible light transmittance is low (only about 30%) ), the utilization of incident light (or backlight) is also low.
  • the color filter also causes the temperature to rise due to the absorption of the remaining visible light energy. Summary of the invention
  • Embodiments of the present invention provide a filter, a method of fabricating the same, and a display device that can improve the utilization of incident light (or backlight) and prevent incident light (or backlight) from being converted into useless heat.
  • an embodiment of the present invention provides a filter, including: a first dielectric film, a second dielectric film, and a third dielectric film that are bonded to each other, wherein the filter includes a first pixel region, and a second a pixel region and a third pixel region; the first dielectric film is removed in the first pixel region of the filter, and the second dielectric film is in the second pixel region of the filter Removing, the third dielectric film is removed in the third pixel region of the filter; the first dielectric film reflects light in a first wavelength range, and transmits light outside a first wavelength range; The second dielectric film reflects light in the second wavelength range and transmits light outside the second wavelength range; the third dielectric film reflects light in the third wavelength range and transmits light outside the third wavelength range.
  • an embodiment of the present invention further provides a display device, including: an array substrate; a color filter substrate opposite the array substrate, and including the filter as described above.
  • an embodiment of the present invention further provides a method for preparing a filter, comprising: separately fabricating a first dielectric film, a second dielectric film, and a third dielectric film; removing the first dielectric film corresponding to the first pixel a film layer of the region, removing a film layer corresponding to the second pixel region of the second dielectric film, removing a film layer corresponding to the third pixel region of the third dielectric film; and disposing the first dielectric film, the second dielectric film, and the third layer The dielectric film is bonded.
  • FIG. 1 is a schematic cross-sectional structural view of a filter according to Embodiment 1 of the present invention.
  • FIG. 2 is a schematic diagram of backlight reuse of the leftmost blue pixel area of FIG. 1;
  • FIG. 3 is a schematic diagram of a manufacturing principle of a wide reflective bandwidth dielectric film according to Embodiment 2 of the present invention.
  • An embodiment of the present invention provides a filter, the filter includes a first dielectric film, a second dielectric film, and a third dielectric film; the filter includes a first pixel region and a second pixel a region and a third pixel region; the first dielectric film is removed in a first pixel region of the filter, and the second dielectric film is removed in a second pixel region of the filter, the third dielectric film is The third pixel region of the filter is removed; the first dielectric film reflects light in a first wavelength range, and transmits light outside the first wavelength range; and the second dielectric film reflects light in a second wavelength range, Transmitted second wavelength Light outside the range; the third dielectric film reflects light in the third wavelength range and transmits light outside the third wavelength range.
  • the first wavelength range in this embodiment is 600 nm to 780 nm
  • the first dielectric film is a red dielectric film
  • the second wavelength range is 480 nm to 600 nm.
  • the second dielectric film is a green dielectric film
  • the third wavelength range is 390 nm to 480 nm
  • the third dielectric film is a blue dielectric film.
  • the filter provided by the embodiment of the present invention is described in detail below by taking a common RGB filter as an example:
  • the filter includes red, green, and blue dielectric films that are bonded to each other; wherein the red dielectric film 11 reflects red visible light A1 (wavelength range 600 nm to 780 nm), allowing for the removal of red and visible light.
  • red visible light A1 wavelength range 600 nm to 780 nm
  • the visible light (mainly green visible light A2 and blue visible light A3) is transmitted, and the red dielectric film 11 is hollowed out in the region corresponding to the red pixel R; the green dielectric film 12 reflects the green visible light A2 (wavelength range 480 nm to 600 nm), allowing the removal of green visible light The remaining visible light transmission (red visible light A1 and blue visible light A3), and the green dielectric film 12 is hollowed out in the region corresponding to the green pixel G; the blue dielectric film 13 reflects the blue visible light A3 (wavelength range is 390 nm to 480 nm), allowing blue removal The remaining visible light (red visible light A1 and green visible light A2) other than visible light is transmitted, and the blue dielectric film 13 is hollowed out in the area corresponding to the blue pixel B.
  • the filter in this embodiment includes red, green, and blue dielectric films that are bonded to each other. Taking the blue pixel B on the leftmost side as an example, the blue dielectric film 13 needs to hollow out the corresponding region of the blue pixel B. Therefore, actually Only the red dielectric film 11 and the green dielectric film 12 exist in the corresponding region of the blue pixel B.
  • the incident light or the backlight (which can be regarded as three primary colors of light) passes through the red dielectric film 11, the red visible light A1 is reflected, the green visible light A2 and the blue visible light A3 are transmitted; while continuing through the green dielectric film 12, the green visible light A2 It is also reflected, leaving only the blue visible light A3 to continue to exit through the hollowed out area of the blue dielectric film 13, and the red pixel R area and the green pixel G area are substantially similar.
  • the corresponding region of the blue pixel B emits blue visible light A3, the green visible light A2 and the red visible light A3 ⁇ 4 ⁇ are emitted back;
  • the green pixel G corresponding region emits the green visible light A2, and the blue visible light A3 and the red visible light A3 ⁇ 4 ⁇ are shot back;
  • the red pixel R corresponding region emits red visible light A1, the green visible light A2 and the blue visible light A3 3 ⁇ 4 ⁇ are emitted back, and the reflected light can be reused after being reflected, thereby improving the utilization of incident light (or backlight), and simultaneously Avoid converting incident light (or backlight) into Useless heat loss.
  • the backlight of the liquid crystal display device as a flat panel display device generally includes: a prism film, a diffusion film, and a reflective film.
  • the protective film as shown in FIG. 2, the light reflected by the filter is reflected by the reflective film in the backlight, and then injected into the liquid crystal cell for reuse, thereby improving the utilization of incident light (or backlight), and simultaneously Avoid converting incident light (or backlight) into useless heat.
  • RGB color filter is the basic unit of the color filter substrate.
  • RGBY red/green/blue/yellow
  • RGBW red/green/blue/white
  • the filter still includes red, green, and blue dielectric films that are bonded to each other, and the red, green, and blue pixel regions still perform the same hollowing process, but only in the white pixel (W).
  • the area is hollowed out of the red, green and blue dielectric films.
  • the RGBY color mixing scheme four dielectric films of red, green, blue, and yellow may be mutually bonded together, and the reflection wavelength ranges corresponding to the four dielectric films of red, green, blue, and yellow are redefined (ie, The reflection wavelength ranges of these four dielectric films are re-divided).
  • the arrangement order of the first dielectric film, the second dielectric film and the third dielectric film in the present embodiment does not affect the specific implementation effect of the embodiment, and therefore, the present embodiment is not limited thereto.
  • the first, second, and third dielectric films are generally relatively thin (about 50 to 100 microns), so the first, second, and third dielectric films are generally attached to the glass substrate 10.
  • the filter further includes a black matrix region, the black matrix region separating the first pixel region, the second pixel region, and the third pixel region, wherein the filter of the black matrix region reflects the first wavelength Light within the range, within the second wavelength range, and within the third wavelength range.
  • the filter of the embodiment when used in a liquid crystal display device, the filter may be disposed between the light emitting surface of the liquid crystal cell and the upper polarizer, or between the lower polarizer and the light incident surface of the liquid crystal cell. , or below the lower polarizer.
  • the filter of this embodiment can be realized according to Bragg reflection, and the dielectrics of different refractive indexes are laminated. Add a reflective film.
  • Bragg reflection refers to the periodic reflection point at the interface of two different media. When light is incident, it will produce periodic reflection, which is called Bragg reflection.
  • the wavelength ⁇ of the reflected light of the dielectric layer of the material can be changed. If a plurality of layers of different thicknesses are stacked by a multi-layer superposition method, a dielectric film having a wide reflection bandwidth can be formed. As shown in Fig. 3, as the film thickness of the dielectric layer increases, the reflection bandwidth is superimposed, and the multilayer film is selected. When the thickness of each layer is a certain value, it can be reflected in a certain range (see the formula in the following specific embodiment). Full band visible light.
  • the first dielectric film, the second dielectric film and the third dielectric film may each comprise a plurality of periods, each period being formed by overlapping layers of dielectric layers having different refractive indices, and the dielectric layer of each period may be Two, three or more dielectric layers are included, but from a production process point of view, exemplarily, each period is formed by overlapping two dielectric layers of a low refractive index dielectric layer and a high refractive index dielectric layer. As shown in Figure 1.
  • the film thickness of the first dielectric layer is ⁇ and the wavelength of the reflected light is ⁇
  • the relationship between the wavelength of the reflected light and the film thickness of the first dielectric layer is: df o ni;
  • the difference between the wavelengths of the reflected light of the adjacent two dielectric layers is k (ie, the increasing coefficient below), and the film thickness of the Z-th dielectric layer is:
  • ⁇ ⁇ is the refractive index of the dielectric layer of the second layer
  • ⁇ ⁇ is the wavelength of the reflected light of the dielectric layer of the second layer
  • the fourth dielectric film is any one of the first, second, and third dielectric films, and the fourth dielectric film has a reflection wavelength range of Li ⁇ L 2 ; in the incident light direction, if the low The refractive index dielectric layer is arranged before the high refractive index dielectric layer, and then in the fourth dielectric film:
  • the thickness of the low refractive index dielectric layer in the i-th cycle is ,
  • the thickness of the low refractive index dielectric layer in the i-th cycle is
  • Z is the fourth
  • the total number of layers of the low refractive index dielectric layer and the high refractive index dielectric layer in the dielectric film is the refractive index of the low refractive index dielectric layer
  • n 2 is the refractive index of the high refractive index dielectric layer
  • the increasing coefficient k corresponds to the phase
  • the difference in wavelength of the reflected light between the adjacent two dielectric layers is related to the total number of layers Z of the low refractive index dielectric layer and the high refractive index dielectric layer in the fourth dielectric film, illustratively, (Zl).
  • the filter includes an RGB sub-region, which is formed by bonding red, green, and blue dielectric films to each other.
  • Each period of the green and blue medium is formed by overlapping two dielectric layers of a low refractive index dielectric layer and a high refractive index dielectric layer.
  • 200 ⁇ 400 layers is suitable.
  • the following is an example of a filter composed of a 400 dielectric layer, wherein the blue dielectric film includes 50 cycles, that is, 50 low refractive index dielectric layers and 50 high refractive index dielectric layers, and a total of 100 dielectric layers; the green dielectric film includes 60 cycles, 60 low-refractive-index dielectric layer high refractive index dielectric layers, a total of 120 dielectric layers; red dielectric film consists of 90 cycles, low refractive index dielectric layer high refractive index dielectric layer 90 each, a total of 180 dielectric layers.
  • the thickness of the blue dielectric film in the filter, the low refractive index dielectric layer and the high refractive index dielectric layer are as follows. When in the incident light direction, if the low refractive index dielectric layer is arranged behind the high refractive index dielectric layer, then in the blue dielectric film:
  • the green dielectric film of the filter comprises 60 cycles, and if the low refractive index dielectric layer is arranged in front of the high refractive index dielectric layer along the incident light direction, then in the green dielectric film:
  • the thickness of the low refractive index dielectric layer in the jth cycle is
  • the refractive index, n 2 is the refractive index of the high refractive index dielectric layer, and the increasing coefficient l ⁇ k ⁇ 2.
  • the red dielectric film of the filter comprises 90 cycles, and if the low refractive index dielectric layer is arranged in front of the high refractive index dielectric layer along the incident light direction, the red dielectric film is:
  • the refractive index, n 2 is the refractive index of the high refractive index dielectric layer, and the increasing coefficient l ⁇ k ⁇ 2.
  • the difference between the refractive index of the low refractive index dielectric layer and the refractive index of the high refractive index dielectric layer is greater than or equal to 0.2. If the difference is too small, the reflection is not good and more layers are needed.
  • the low refractive index dielectric layer is a poly-terephthalic acid plastic having a refractive index of 1.57
  • the high refractive index dielectric layer is a polyparaphthalic acid plastic having a refractive index of 1.82.
  • the thickness of the first film layer (the low refractive index dielectric layer in the first cycle) is
  • the thickness of the second film layer (the high refractive index dielectric layer in the first cycle) is
  • the thickness of the third film layer (the low refractive index dielectric layer in the second cycle) is 62.42 nm; the thickness of the fourth film layer (the high refractive index dielectric layer in the second cycle) is 53.98 nm;
  • each dielectric layer increases layer by layer, and the wavelength of reflected light increases layer by layer.
  • the wavelength range of light (reflection bandwidth) is: 390 ⁇ 489nm.
  • the reflection bandwidth of the blue dielectric film can be strictly limited to 390 ⁇ 480 by adjusting the number of layers of the dielectric layer or adjusting the coefficient k.
  • the thickness calculation process of each dielectric layer is substantially the same, except that for the red and green dielectric films, the formulas for calculating the thickness of each dielectric layer are different, and will not be further described herein.
  • the two dielectric layers of the low refractive index dielectric layer and the high refractive index dielectric layer are alternately arranged to form a red, green, and blue dielectric film, and then a laser is used to place the red dielectric film on the red pixel corresponding region.
  • the region corresponding to the green pixel on the green dielectric film and the region corresponding to the blue pixel on the blue dielectric film are respectively hollowed out, and finally the hollowed out red, green, and blue dielectric films are bonded to each other to form the filter described in this embodiment. .
  • the dielectric layer material is an organic material including polyterpene terpenic acid; or an oxide including titanium dioxide, silicon dioxide, trititanium pentoxide, aluminum oxide, silicon nitride Or nitride material.
  • the polyterephthalic acid-based organic material includes polyethylene terephthalate and polybutylene terephthalate.
  • the filter further includes a black matrix region, the black matrix region separating the first pixel region, the second pixel region, and the third pixel region, wherein the filter of the black matrix region reflects the first wavelength Light within the range, within the second wavelength range, and within the third wavelength range.
  • the filter in this embodiment reflects unwanted light in the pixel area (such as red, green, and blue pixel areas) for reuse, rather than absorption, thereby improving the utilization of incident light (or backlight). At the same time, the incident light (or backlight) is prevented from being converted into useless heat.
  • An embodiment of the present invention further provides a color filter substrate, comprising: any one of the filters described in Embodiment 1 or 2.
  • the filter does not affect the specific implementation effect of the embodiment of the present invention.
  • This embodiment is not limited thereto, but is merely convenient for the purpose of the process.
  • the filter is disposed on the back side of the substrate, and the other side (front side) of the substrate can directly prepare the black matrix and protect by using the prior art.
  • An embodiment of the present invention further provides a display device provided with the color filter substrate, or includes any of the filters described in Embodiment 1 or 2.
  • the display device is a liquid crystal display device, including: a backlight, a liquid crystal cell, a polarizer, and the like, wherein the filter is attached between the light emitting surface of the liquid crystal cell and the polarizer.
  • the backlight generally comprises: a prism film, a diffusion film, a reflective film and a protective film, and the light reflected by the filter is reflected by the reflective film in the backlight, and then injected into the liquid crystal cell for reuse, thereby improving the incident light (or The utilization of the backlight) while avoiding the conversion of incident light (or backlight) into useless heat.
  • the embodiment of the invention further provides a method for preparing a filter, comprising:
  • Step 102 removing a film layer corresponding to the first pixel region of the first dielectric film, removing a film layer corresponding to the second pixel region of the second dielectric film, and removing a film layer corresponding to the third pixel region of the third dielectric film;
  • the first dielectric film, the second dielectric film, and the third dielectric film each include a plurality of periods, and each period is formed by overlapping a plurality of dielectric layers having different refractive indexes.
  • the step 101 is respectively performed to form the first dielectric film, the second dielectric film, and the third dielectric film, respectively.
  • the formed low refractive index dielectric layer and the high refractive index dielectric layer are alternately arranged, and then heated to 140 degrees, and pressed at 10 atmospheres.
  • the low refractive index dielectric layer is a poly-terephthalic acid plastic having a refractive index of 1.57
  • the high refractive index dielectric layer is a polyethylene terephthalate plastic having a refractive index of 1.82.
  • step 102 the method of removing the film layer corresponding to the first pixel region of the first dielectric film, removing the film layer corresponding to the second pixel region of the first dielectric film, and removing the film layer corresponding to the third pixel region of the third dielectric film For the laser cutting method.
  • the embodiment of the present invention further provides a method for preparing a filter, which adopts a first dielectric film, a second dielectric film and a third dielectric film which are mutually adhered to replace the color filter in the prior art, and the principle is different
  • the dielectric film of the radiance can be made into a transflective film that reflects a specific wavelength band (for example, an RGB color mixing scheme is used to form a red, green, and blue dielectric film), and a portion that needs to transmit red light (a region corresponding to a red pixel), Removing the dielectric film layer that reflects red light; removing the green light-transmissive dielectric film layer in the portion where the green light is required (the region corresponding to the green pixel); in the portion where the blue light is required (the region corresponding to the blue pixel), The blue-light-removed dielectric film layer is removed to form a filter having the same filtering function as the existing color filter, and the utilization of light (or backlight) prevents the incident light (or
  • liquid crystal display device is taken as an example in the embodiment of the present invention, it should be understood that the application of the embodiment of the present invention is not limited thereto, and the embodiment of the present invention is also applicable to all other devices that require a color filter, for example, organic light emitting. Display device.

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Abstract

公开了一种滤光片、其制备方法以及显示装置。滤光片包括：相互贴合的第一介质膜（11），第二介质膜（12）和第三介质膜（13），滤光片包括第一像素区域，第二像素区域和第三像素区域；第一介质膜在滤光片的第一像素区域被去除，第二介质膜在滤光片的第二像素区域被去除，第三介质膜在滤光片的第三像素区域被去除；第一介质膜反射第一波长范围内的光线（A1），透射第一波长范围外的光线；第二介质膜反射第二波长范围内的光线（A2），透射第二波长范围外的光线；第三介质膜反射第三波长范围内的光线（A3），透射第三波长范围外的光线。

Description

滤光片、 其制备方法以及显示装置 技术领域
本发明的实施例涉及一种滤光片、 其制备方法以及显示装置。 背景技术
彩膜基板为平板显示器彩色化的关键部件。 作为一种平板显示器， 液 晶平面显示器是非主动发光型显示器， 其必需内部的背光模块或外部的环 境入射光提供光源， 再搭配驱动电路与液晶驱动控制形成灰阶显示， 而后 透过彩膜基板上的红（R )、 绿（G )、 ( B )滤色器而形成彩色显示画面。
彩膜基板的基本结构由玻璃基板、 黑矩阵、 滤色器、 保护层， 透明导 电膜组成。 其中， 由色胶涂覆而形成红（R )、 绿（G )、 蓝 （B ) 滤色器， 像素之间用黑矩阵隔开， 现有滤色器采用的原理是吸收式的， 即一种颜色 的滤色器只允许特定颜色的可见光通过， 其余颜色的可见光均被吸收， 例 如红色滤色器只允许红可见光通过， 其余可见光均被吸收， 可见光透过率 低（只有 30%左右）， 对入射光（或背光） 的利用率也低， 此外， 滤色器因 吸收其余可见光的能量还会导致温度升高。 发明内容
本发明的实施例提供一种滤光片、 其制备方法以及显示装置， 可提高对 入射光（或背光） 的利用率， 避免入射光（或背光）转化为无用的热耗。
一方面， 本发明的实施例提供一种滤光片， 包括： 相互贴合的第一介质 膜， 第二介质膜和第三介质膜， 其中所述滤光片包括第一像素区域、 第二像 素区域和第三像素区域； 所述第一介质膜在所述滤光片的所述第一像素区域 被去除， 所述第二介质膜在所述滤光片的所述第二像素区域被去除， 所述第 三介质膜在所述滤光片的所述第三像素区域被去除； 所述第一介质膜反射第 一波长范围内的光线， 透射第一波长范围外的光线； 所述第二介质膜反射第 二波长范围内的光线， 透射第二波长范围外的光线； 所述第三介质膜反射第 三波长范围内的光线， 透射第三波长范围外的光线。 另一方面， 本发明的实施例还提供一种显示装置， 包括： 阵列基板； 彩 膜基板， 与所述阵列基板对置， 且包括如上所述的滤光片。
再一方面， 本发明的实施例还提供一种滤光片的制备方法， 包括： 分别 制作第一介质膜、 第二介质膜和第三介质膜； 去除所述第一介质膜对应第一 像素区域的膜层， 去除所述第二介质膜对应第二像素区域的膜层， 去除所述 第三介质膜对应第三像素区域的膜层； 将第一介质膜、 第二介质膜和第三介 质膜贴合。 附图说明
为了更清楚地说明本发明实施例的技术方案， 下面将对实施例的附图作 筒单地介绍，显而易见地，下面描述中的附图仅仅涉及本发明的一些实施例， 而非对本发明的限制。
图 1为本发明实施例一中滤光片的截面结构示意图；
图 2为图 1最左侧蓝像素区域的背光重新利用的示意图；
图 3为本发明实施例二中宽反射带宽介质膜的制作原理示意图。
具体实施方式
为使本发明实施例的目的、 技术方案和优点更加清楚， 下面将结合本发 明实施例的附图，对本发明实施例的技术方案进行清楚、 完整地描述。显然， 所描述的实施例是本发明的一部分实施例， 而不是全部的实施例。 基于所描 述的本发明的实施例， 本领域普通技术人员在无需创造性劳动的前提下所获 得的所有其他实施例， 都属于本发明保护的范围。
实施例一
本发明实施例提供一种滤光片，所述滤光片包括相互贴合的第一介质膜， 第二介质膜和第三介质膜； 所述滤光片包括第一像素区域、 第二像素区域和 第三像素区域； 所述第一介质膜在滤光片的第一像素区域被去除， 所述第二 介质膜在滤光片的第二像素区域被去除， 所述第三介质膜在滤光片的第三像 素区域被去除； 所述第一介质膜反射第一波长范围内的光线， 透射第一波长 范围外的光线； 所述第二介质膜反射第二波长范围内的光线， 透射第二波长 范围外的光线； 所述第三介质膜反射第三波长范围内的光线， 透射第三波长 范围外的光线。
以常见的 RGB (红 /绿 /蓝）滤光片为例， 本实施例所述第一波长范围为 600nm~780nm,第一介质膜为红介质膜；所述第二波长范围为 480nm~600nm, 第二介质膜为绿介质膜； 所述第三波长范围为 390nm~480nm, 第三介质膜为 蓝介质膜。
为了本领域技术人员更好的理解本发明实施例提供的滤光片的技术方 案， 下面以常见的 RGB滤光片为例， 对本发明实施例提供的滤光片进行详 细说明：
如图 1所示， 所述滤光片包括相互贴合的红、 绿、 蓝介质膜； 其中， 红 介质膜 11反射红可见光 A1 (波长范围 600nm~780nm ), 允许除红可见光之 外的其余可见光 (主要是绿可见光 A2和蓝可见光 A3)透射，且红介质膜 11在 红像素 R 对应的区域挖空； 绿介质膜 12 反射绿可见光 A2 (波长范围 480nm~600nm ), 允许除绿可见光之外的其余可见光透射 (红可见光 A1和蓝 可见光 A3), 且绿介质膜 12在绿像素 G对应的区域挖空； 蓝介质膜 13反射 蓝可见光 A3 (波长范围为 390nm~480nm ), 允许除蓝可见光之外的其余可见 光 (红可见光 A1和绿可见光 A2)透射， 且蓝介质膜 13在蓝像素 B对应的区 域挖空。
本实施例中的滤光片包括相互贴合的红、 绿、 蓝介质膜， 以最左侧的蓝 像素 B为例， 蓝介质膜 13需要将蓝像素 B对应区域挖空， 因此， 实际上蓝 像素 B对应区域仅存在红介质膜 11和绿介质膜 12。 因此， 当入射光或背光 (可看成三基色光）在通过红介质膜 11时， 红可见光 A1被反射， 绿可见光 A2和蓝可见光 A3透过； 继续通过绿介质膜 12时， 绿可见光 A2也被反射， 只剩下蓝可见光 A3继续穿过蓝介质膜 13的挖空区域射出，红像素 R区域和 绿像素 G区域大致类似。
筒言之， 最终蓝像素 B对应区域射出蓝可见光 A3,绿可见光 A2和红可 见光 Al ¾^射回去； 绿像素 G对应区域射出绿可见光 A2, 蓝可见光 A3和 红可见光 Al ¾^射回去； 而红像素 R对应区域射出红可见光 A1 ,绿可见光 A2和蓝可见光 A3 ¾^射回去， 被反射后的光再经反射后还可以重新利用， 从而提高对入射光（或背光） 的利用率， 同时避免入射光（或背光）转化为 无用的热耗。
本实施例的滤光片用于平板显示装置时， 其功能与彩膜基板的滤色器相 同， 作为一种平板显示装置的液晶显示装置的背光源一般包括： 棱镜膜、 扩 散膜、 反射膜和保护膜， 如图 2所示， 被滤光片反射后的光再经背光源中的 反射膜反射后， 射入液晶盒重新利用， 从而提高对入射光（或背光） 的利用 率， 同时避免入射光（或背光）转化为无用的热耗。
需要说明的是， RGB滤色器是彩膜基板的基本单元， 除此之外， 也存在 RGBY (红 /绿 /蓝 /黄）、 RGBW (红 /绿 /蓝 /白）等其它混色方案。 本领域技术 人员在不付出创造性劳动的前提下， 可将本发明实施例的技术方案用于其它 混色方案， 这都属于本发明实施例的保护范围。
例如， 对于 RGBW混色方案， 所述滤光片仍然包括相互贴合的红、 绿、 蓝介质膜， 红、 绿、 蓝像素区域仍然进行相同的挖空处理， 只不过在白像素 (W)对应区域将红、 绿、 蓝介质膜全部挖空。 而对 RGBY混色方案， 可选择 由红、 绿、 蓝、 黄四种介质膜相互贴合而成， 同时对红、 绿、 蓝、 黄这四种 介质膜对应的反射波长范围进行重新定义（即这四种介质膜的反射波长范围 进行重新划分）。
此外， 本实施例所述第一介质膜， 第二介质膜和第三介质膜相互贴合时 的排列顺序并不影响本实施例具体实施效果， 因此， 本实施对此并不限定。 此外， 所述第一、 第二、 第三介质膜一般比较薄（约 50~100微米）， 所以一 般将第一、 第二、 第三介质膜贴合在玻璃基底 10上。
进一步地， 所述滤光片还包括黑矩阵区域， 所述黑矩阵区域分隔所述第 一像素区域、 第二像素区域和第三像素区域， 所述黑矩阵区域的滤光片反射 第一波长范围内、 第二波长范围内、 第三波长范围内的光线。
当然， 也可以独立地按现有技术制作黑矩阵， 再将不含有黑矩阵的滤光 片对应贴合。
需要补充说明的是， 本实施例滤光片用于液晶显示装置时， 滤光片可设 置在液晶盒的出光面与上偏光片之间，或者下偏光片与液晶盒的进光面之间， 或者下偏光片以下均可。
实施例二
本实施例的滤光片可依据布拉格反射来实现， 将不同折射率的介质层叠 加制成反射膜。 布拉格反射是指在两种不同介质的交界面上， 具有周期性的 反射点， 当光入射时， 将产生周期性的反射， 这种反射即称为布拉格反射。
某一介质层的膜厚与反射波长的关系为： （1=λ/4η, d为介质层的厚度， λ 为该介质层反射光的波长， η为该介质层的折射率。
改变介质层的厚度 d, 可使该种材料的介质层的反射光的波长 λ发生变 化， 如果用多层叠加的方法， 将不同厚度介质层叠加， 可制成宽反射带宽的 介质膜。 如图 3所示， 随介质层膜厚渐增， 其反射带宽叠加， 选择多层膜， 当各层厚度为特定值时在某一范围 （见下面具体实施方式中的公式） 时， 可 反射全波段可见光。
具体而言， 第一介质膜， 第二介质膜和第三介质膜均可包括多个周期， 每个周期由多层不同折射率的介质层交叠排列而成， 每个周期的介质层可以 包括两种、 三种甚至更多介质层， 但从生产工艺的角度来看， 示例性地， 每 个周期采用低折射率介质层和高折射率介质层两种介质层交叠排列而成， 如 图 1所示。
根据布拉格反射， 若设第一层介质层的膜厚为 折射率为 ηι, 其反射 光的波长为 λο, 则反射光的波长与第一层介质层的膜厚关系为： df o ni; 若相邻两层介质层反射光波长的差值均为 k (即下文中的递增系数）， 则 第 Z层介质层的膜厚为：
Figure imgf000007_0001
其中， ηζ为第 Ζ层介质层的折射率， λζ为第 Ζ层介质层的反射光波长。
因此， 假设第四介质膜为第一、 第二和第三介质膜中的任一介质膜， 所 述第四介质膜的反射波长范围为 Li~L2; 沿入射光方向， 若所述低折射率介 质层排列在所述高折射率介质层之前， 则所述第四介质膜中：
第 i个周期中低折射率介质层的厚度为
Figure imgf000007_0002
,
第 i个周期中高折射率介质层的厚度为（1 =[ +] 21-1)]/4112；
沿入射光方向，若所述低折射率介质层排列在所述高折射率介质层之后， 则所述第四介质膜中：
第 i个周期中低折射率介质层的厚度为
Figure imgf000007_0003
第 i个周期中高折射率介质层的厚度为（1 =[ +] 21-1-1)]/4112；
其中， k为递增系数， 且 0.5≤k≤16, i为自然数， 且 0<i≤Z/2, Z为第四 介质膜中低折射率介质层和高折射率介质层的总层数， 为所述低折射率介 质层的折射率， n2为所述高折射率介质层的折射率， 递增系数 k对应相邻两 层介质层反射光波长的差值， 与第四介质膜中低折射率介质层和高折射率介 质层的总层数 Z有关， 示例性地，
Figure imgf000008_0001
( Z-l )。
为了本领域技术人员更好的理解本发明实施例提供的滤光片的技术方 明， 其中滤光片包括 RGB子区域， 由红、 绿、 蓝介质膜相互贴合而成， 所 述红、 绿、 蓝介质的每个周期采用低折射率介质层和高折射率介质层两种介 质层交叠排列而成。
介质层的层数越多反射效果越好， 但考虑到液晶面板的厚度要求，
200~400层左右为宜。 下面的以 400介质层构成的滤光片为例， 其中， 蓝介 质膜包括 50个周期， 即 50个低折射率介质层和 50个高折射率介质层， 共 100介质层；绿介质膜包括 60个周期，低折射率介质层高折射率介质层各 60 个，共 120介质层； 红介质膜包括 90个周期，低折射率介质层高折射率介质 层各 90个， 共 180介质层。
其中， 滤光片中的蓝介质膜， 其低折射率介质层和高折射率介质层的厚 度如下。 当沿入射光方向， 若低折射率介质层排列在高折射率介质层之后， 则蓝介质膜中：
第 i个周期中低折射率介质层的预设厚度为 df^^+k pi-l-l IMni,第 i 个周期中高折射率介质层的预设厚度为 d2i=[390+k (2i-l)]/4n2;
低折射率介质层排列在所述高折射率介质层之后， 则蓝介质膜中： 第 i个周期中低折射率介质层的预设厚度为
Figure imgf000008_0002
第 i 个周期中高折射率介质层的预设厚度为 d2i=[390+k (2i-l-l)]/4n2;
其中， i为自然数， 且 0<i≤50, 为低折射率介质层的折射率， n2为高 折射率介质层的折射率， k为递增系数， 即上面叙述中提到的相邻两层介质 层反射光的波长的差值， 且 k=l。
其中， 滤光片的绿介质膜包括 60个周期， 若沿入射光方向，低折射率介 质层排列在高折射率介质层之前， 则绿介质膜中：
第 j个周期中低折射率介质层的厚度为
Figure imgf000008_0003
第 j个周期中高折射率介质层的厚度为 d¾=[480+k(2j-l)]/4n2; 若低折射率介质层排列在高折射率介质层之后， 则绿介质膜中： 第 j个周期中低折射率介质层的厚度为
Figure imgf000009_0001
第 j个周期中高折射率介质层的厚度为 d2j=[480+k(2j-l-l)]/4n2; 其中， j 为自然数， 且 0<j≤60, ηι为低折射率介质层的折射率， n2为高折射率介质层 的折射率， 递增系数 l≤k≤2。
其中， 滤光片的红介质膜包括 90个周期， 若沿入射光方向，低折射率介 质层排列在高折射率介质层之前， 则红介质膜中：
第 N个周期中低折射率介质层的厚度为 d1N=[600+ k pN-l-l IMni, 第 N 个周期中高折射率介质层的厚度为 d2N=[600+ k (2N-l)]/4n2;
若低折射率介质层排列在高折射率介质层之后， 则红介质膜中： 第 N个周期中低折射率介质层的厚度为
Figure imgf000009_0002
第 N个 周期中高折射率介质层的厚度为 d2N=[600+ k (2N-l-l)]/4n2; 其中， N为自然 数， 且 0<N≤90, 为所述低折射率介质层的折射率， n2为所述高折射率介 质层的折射率， 递增系数 l≤k≤2。
示例性地， 低折射率介质层折射率与高折射率介质层折射率的差值大于 等于 0.2。 如果差值太小， 反射效果不好， 而且需要较多层数。 示例性地， 本 实施例中低折射率介质层采用折射率 1.57的聚对苯二曱酸类塑料，所述高折 射率介质层采用折射率 1.82的聚对苯二曱酸类塑料， 现以蓝介质膜为例， 对 各介质层厚度的具体计算过程进行详细叙述， 如下：
第 1层膜层（第 1个周期中的低折射率介质层） 的厚度为，
d!=[390+(2i- 1 )- 1 ]/4n!=[390+(2 * 1 - 1 )- 1 ]/ ( 4*1.57 ) =62.10nm;
第 2层膜层（第 1个周期中的高折射率介质层） 的厚度为，
d2=[390+(2i)- 1 ]/4n2=[390+ (2* 1 )- 1 ]/ ( 4*1.82 ) =53.71匪；
第 3层膜层（第 2个周期中的低折射率介质层） 的厚度为 62.42nm; 第 4层膜层（第 2个周期中的高折射率介质层）厚度为 53.98nm; 直至， 第 Z层介质层厚度为 dz=[390+Z-l]/4nx, nx为第 Z层介质层的折 射率， 递增系数 k=l。
各介质层厚度逐层递增， 反射光的波长逐层增大， 反射光波长变化的规 律为 λζ=390+1*(Ζ-1), 对应地， 最终 1~100层介质层形成的蓝介质膜的反射 光波长范围 （反射带宽） 为： 390~489nm。 当然， 在具体实施中， 也可以通 过调整介质层的层数或者调整系数 k, 将蓝介质膜的反射带宽严格限制在 390~480
对于红介质膜和绿介质膜，各介质层的厚度计算过程大致相同，只不过， 对红、 绿介质膜， 计算各介质层的厚度时采用公式有所不同， 在此不再一一 赘述。
按上述的厚度递增规律， 低折射率介质层和高折射率介质层两种介质层 交叠排列而成红、 绿、 蓝介质膜， 然后采用激光将红介质膜上红像素对应的 区域， 所述绿介质膜上绿像素对应的区域， 以及蓝介质膜上蓝像素对应的区 域分别进行挖空， 最终挖空后的红、 绿、 蓝介质膜相互贴合形成本实施例所 述滤光片。
可选地， 所述介质层材料为包括聚对苯二曱酸类在内的有机材料； 或者 为， 包括二氧化钛、 二氧化硅、 五氧化三钛、 氧化铝、 氮化硅在内的氧化物 或氮化物材料。
示例性地， 所述聚对苯二曱酸类有机材料包括聚对苯二曱酸乙二酯和聚 对苯二曱酸丁二酯。
进一步地， 所述滤光片还包括黑矩阵区域， 所述黑矩阵区域分隔所述第 一像素区域、 第二像素区域和第三像素区域， 所述黑矩阵区域的滤光片反射 第一波长范围内、 第二波长范围内、 第三波长范围内的光线。
当然， 也可以独立按现有技术制作黑矩阵， 再将不含有黑矩阵的滤光片 对应贴合。
本实施例所述滤光片在像素区域（如红、 绿、 蓝像素区域）， 将不需要的 可见光反射回去以便重新利用， 而不是吸收， 从而提高对入射光（或背光） 的利用率， 同时避免入射光（或背光）转化为无用的热耗。
实施例三
本发明的实施例还提供一种彩膜基板， 包括： 实施例一或二所述的任一 滤光片。
滤光片具体的设置位置不影响本发明实施例的具体实施效果， 本实施例 对此不做限定， 只不过工艺上便于实现的目的。 示例性地， 滤光片设置在基 板的背面， 基板的另一面 （正面）可以采用现有技术直接制备黑矩阵、 保护 层， 透明导电膜等， 只不过省去色胶涂覆形成滤色器层的步骤。
本发明的实施例还提供一种显示装置， 设置有所述的彩膜基板， 或者， 包括有实施例一或二所述的任一滤光片。
示例性地， 所述显示装置为液晶显示装置， 包括： 背光源、 液晶盒和偏 光片等， 其中所述滤光片贴合在所述液晶盒的出光面和所述偏光片之间。 背 光源一般包括： 棱镜膜、 扩散膜、 反射膜和保护膜， 被滤光片反射后的光再 经背光源中的反射膜反射后， 射入液晶盒重新利用， 从而提高对入射光（或 背光） 的利用率， 同时避免入射光 (或背光)转化为无用的热耗。
实施例四
本发明的实施例还提供一种滤光片的制备方法， 包括：
101、 分别制作第一介质膜、 第二介质膜和第三介质膜；
102、去除所述第一介质膜对应第一像素区域的膜层，去除所述第二介质 膜对应第二像素区域的膜层 ,去除所述第三介质膜对应第三像素区域的膜层；
103、 将第一介质膜、 第二介质膜和第三介质膜贴合。
可选地， 所述第一介质膜、 第二介质膜和第三介质膜均包括多个周期， 每个周期由多层不同折射率的介质层交叠排列而成。
具体地， 若采用低折射率介质层和高折射率介质层两种介质层交叠排列 形成所述滤光片，步骤 101分别制作第一介质膜、第二介质膜和第三介质膜， 具体包括：
1011、 形成预设厚度的低折射率介质层和高折射率介质层（具体预设厚 度的见实施例二所述）；
1012、 将形成的所述低折射率介质层和高折射率介质层交叠排列， 然后 加热到 140度， 在 10个大气压强下进行压合。
可选地， 所述低折射率介质层采用折射率 1.57的聚对苯二曱酸类塑料， 所述高折射率介质层采用折射率 1.82的聚对苯二曱酸类塑料。
可选地， 步骤 102中去除第一介质膜对应第一像素区域的膜层、 去除第 一介质膜对应第二像素区域的膜层、 去除第三介质膜对应第三像素区域的膜 层的方法为激光切割方法。
本发明的实施例还提供一种滤光片制备方法， 采用相互贴合的第一介质 膜、 第二介质膜和第三介质膜代替了现有技术中的滤色器， 其原理是不同折 射率的介质膜叠加可制成反射特定波段的透反膜（以 RGB 混色方案为例， 制成红、 绿、 蓝介质膜）， 在需要透射红光的部分（红像素对应的区域）， 将 反射红光的介质膜层去除； 在需要透射绿光的部分（绿像素对应的区域）， 将 反射绿光的介质膜层去除； 在需要透射蓝光的部分（蓝像素对应的区域）， 将 反射蓝光的介质膜层去除， 形成具有与现有滤色器相同滤光功能的滤光片， 光（或背光） 的利用率， 避免入射光（或背光）转化为无用的热耗。
虽然本发明实施例中以液晶显示装置为例， 但应理解， 本发明实施例的 应用并不限于此， 本发明的实施例还可适用于其它所有需要滤色器的装置， 例如， 有机发光显示装置。
以上所述， 仅为本发明的具体实施方式， 但本发明实施例的保护范围并 不局限于此， 任何熟悉本技术领域的技术人员在本发明实施例揭露的技术范 围内， 可轻易想到变化或替换， 都应涵盖在本发明的保护范围之内。 因此， 本发明实施例的保护范围应以所述权利要求的保护范围为准。

Claims

权利要求书
1、 一种滤光片， 包括： 相互贴合的第一介质膜， 第二介质膜和第三介质 膜，
其中所述滤光片包括第一像素区域、 第二像素区域和第三像素区域； 所述第一介质膜在所述滤光片的所述第一像素区域被去除， 所述第二介 质膜在所述滤光片的所述第二像素区域被去除， 所述第三介质膜在所述滤光 片的所述第三像素区域被去除；
所述第一介质膜反射第一波长范围内的光线， 透射第一波长范围外的光 线； 所述第二介质膜反射第二波长范围内的光线， 透射第二波长范围外的光 线； 所述第三介质膜反射第三波长范围内的光线， 透射第三波长范围外的光 线。
2、 根据权利要求 1 所述的滤光片， 其中所述第一波长范围为 600nm~780nm,第一介质膜为红介质膜；所述第二波长范围为 480nm~600nm, 第二介质膜为绿介质膜； 所述第三波长范围为 390匪〜 480匪， 第三介质膜为 蓝介质膜。
3、根据权利要求 1或 2所述的滤光片， 其中所述第一、 第二和第三介质 膜均包括多个周期，每个周期由至少两层不同折射率的介质层交叠排列而成。
4、根据权利要求 3所述的滤光片， 其中所述第一、 第二和第三介质膜的 每个所述周期均由高折射率介质层和低折射率介质层交叠而形成。
5、根据权利要求 4所述的滤光片，其中所述高折射率介质层的折射率和 所述低折射率介质层的折射率的差值大于或等于 0.2。
6、根据权利要求 4所述的滤光片， 其中所述第四介质膜为第一、 第二和 第三介质膜中的任一介质膜， 所述第四介质膜的反射波长范围为 Li~L2;
沿入射光方向，若所述低折射率介质层排列在所述高折射率介质层之前， 则所述第四介质膜中：
第 i个周期中低折射率介质层的厚度为
Figure imgf000013_0001
,
第 i个周期中高折射率介质层的厚度为（1 =[ +] 21-1)]/4112；
沿入射光方向，若所述低折射率介质层排列在所述高折射率介质层之后， 则所述第四介质膜中： 第 i个周期中低折射率介质层的厚度为
Figure imgf000014_0001
第 i个周期中高折射率介质层的厚度为（12=[ +] 21-1-1)]/4112；
其中， k为递增系数， 且 0.5≤k≤16, i为自然数， 且 0<i≤Z/2, Z为第四 介质膜中低折射率介质层和高折射率介质层的总层数， 为所述低折射率介 质层的折射率， n2为所述高折射率介质层的折射率。
7、根据权利要求 4所述的滤光片， 其中， 所述低折射率介质层的折射率 为 1.0~1.8； 所述高折射率介质层的折射率为 1.2~2.0。
8、 根据权利要求 7所述的滤光片， 其中所述低折射率介质层为折射率 1.57的聚对苯二曱酸类塑料，所述高折射率介质层为折射率 1.82的聚对苯二 曱酸类塑料。
9、根据权利要求 3所述的滤光片， 其中所述介质层材料为有机材料、 氧 化物材料或氮化物材料； 所述有机材料包括聚对苯二曱酸类； 所述氧化物材 料包括二氧化钛， 或者二氧化硅， 或者五氧化三钛， 或者氧化铝； 所述氮化 物材料包括氮化硅。
10、根据权利要求 1所述的滤光片，其中所述滤光片还包括黑矩阵区域， 所述黑矩阵区域分隔所述第一像素区域、 第二像素区域和第三像素区域， 所 述黑矩阵区域的滤光片反射第一波长范围内、 第二波长范围内、 第三波长范 围内的光线。
11、 根据权利要求 1所述的滤光片， 其中所述滤光片还包括被贴合的第 五介质膜， 所述滤光片包括与之对应的第五像素区域， 在所述第五像素区域 中所述第五介质膜被去除， 所述第五介质膜反射第五波长范围内的光线， 透 射第五波长范围外的光线。
12、 根据权利要求 11所述的滤光片， 其中所述第五介质膜反射黄光。
13、 根据权利要求 11所述的滤光片， 其中所述第五介质膜包括多个周 期， 每个所述周期由至少两层不同折射率的介质层交叠排列而成。
14、 根据权利要求 1所述的滤光片， 其中所述第一、 第二和第三介质膜 的厚度为 50~100微米。
15、 一种显示装置， 包括：
阵列基板；
彩膜基板， 与所述阵列基板对置，且包括如权利要求 1-14中任一项所述 的滤光片。
16、根据权利要求 15所述的显示装置，其中所述显示装置是液晶显示装 置， 该液晶显示装置还包括背光源， 所述背光源包括反射膜。
17、根据权利要求 15所述的显示装置，其中所述滤光片设置在所述彩膜 基板的与所述阵列基板相反的一侧。
18、根据权利要求 15所述的显示装置，其中所述滤光片设置在所述彩膜 基板的与所述阵列基板相对的一侧。
19、 一种滤光片的制备方法， 包括：
分别制作第一介质膜、 第二介质膜和第三介质膜；
去除所述第一介质膜对应第一像素区域的膜层， 去除所述第二介质膜对 应第二像素区域的膜层， 去除所述第三介质膜对应第三像素区域的膜层； 将第一介质膜、 第二介质膜和第三介质膜贴合。
20、根据权利要求 19所述的制备方法，其中所述去除所述第一介质膜对 应第一像素区域的膜层、 去除所述第一介质膜对应第二像素区域的膜层、 去 除所述第三介质膜对应第三像素区域的膜层的方法为激光切割方法。
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