WO2014079122A1 - 一种可对准卷对卷uv成型的装置及方法 - Google Patents

一种可对准卷对卷uv成型的装置及方法 Download PDF

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Publication number
WO2014079122A1
WO2014079122A1 PCT/CN2012/087081 CN2012087081W WO2014079122A1 WO 2014079122 A1 WO2014079122 A1 WO 2014079122A1 CN 2012087081 W CN2012087081 W CN 2012087081W WO 2014079122 A1 WO2014079122 A1 WO 2014079122A1
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WIPO (PCT)
Prior art keywords
flexible substrate
mold
transparent flexible
alignment
roll
Prior art date
Application number
PCT/CN2012/087081
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English (en)
French (fr)
Inventor
顾滢
高育龙
崔铮
Original Assignee
苏州蒙斯威光电科技有限公司
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Application filed by 苏州蒙斯威光电科技有限公司 filed Critical 苏州蒙斯威光电科技有限公司
Priority to JP2014547702A priority Critical patent/JP5867764B2/ja
Priority to KR1020137029922A priority patent/KR101577700B1/ko
Priority to US14/000,202 priority patent/US9096024B2/en
Publication of WO2014079122A1 publication Critical patent/WO2014079122A1/zh

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C70/00Shaping composites, i.e. plastics material comprising reinforcements, fillers or preformed parts, e.g. inserts
    • B29C70/68Shaping composites, i.e. plastics material comprising reinforcements, fillers or preformed parts, e.g. inserts by incorporating or moulding on preformed parts, e.g. inserts or layers, e.g. foam blocks
    • B29C70/78Moulding material on one side only of the preformed part
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/04Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C71/00After-treatment of articles without altering their shape; Apparatus therefor
    • B29C71/04After-treatment of articles without altering their shape; Apparatus therefor by wave energy or particle radiation, e.g. for curing or vulcanising preformed articles
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0805Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
    • B29C2035/0827Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using UV radiation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing

Definitions

  • the invention relates to the technical field of an embossing device, and in particular to an apparatus and method for aligning roll-to-roll UV forming. Background technique
  • Ultraviolet embossing refers to the technique of placing a UV-curable material between a mold and a substrate, filling the material into a mold having an undulating structure under pressure, and demolding the mold after UV curing.
  • Imprinting especially micro-nano imprinting, plays an irreplaceable role in graphic processing such as optical films, anti-counterfeit labels, optical discs, and MEMS. It is an important target for research in high-tech fields such as optical display, information storage, and biomedicine.
  • micro-nano processing methods such as UV lithography, electron beam or ion beam lithography
  • micro-nano imprint technology has the advantages of simple operation, high limit resolution and good repeatability.
  • the second is the double-plane mold double-sided imprinting technology, usually using two non-deformable flat molds placed on the front and back sides of the substrate, and the imprinted material is coated on both the front and back sides of the substrate, and the two molds and the substrate are under vacuum. Tight fit for double-sided imprinting of one unit.
  • the alignment of the front and back patterns can be achieved by the alignment mechanism, it is necessary to introduce a vacuuming step to exclude air bubbles between the mold and the imprint material, so there are two problems: (1). It is necessary to construct a confined space. Creating a vacuum environment; (2). The vacuuming process takes a very long time. The above problem determines that this method cannot achieve volume-to-volume rapid production. Summary of the invention
  • the invention provides an apparatus and a method for aligning roll-to-roll UV forming, which solves the accumulation of offset errors in the upper and lower corresponding patterned area imprinting processes in the double-sided embossing existing in the prior art.
  • Another object of the present invention is to solve the disadvantage that bubbles are difficult to eliminate during the imprint process.
  • An apparatus for aligning roll-to-roll UV molding comprising a unwinding mechanism, a coating mechanism, a UV forming mechanism, a demolding mechanism and a winding mechanism; further comprising a fine adjustment alignment mechanism; the fine adjustment alignment mechanism comprising a planar mold a supporting device and an alignment probe, wherein the planar mold supporting device adjusts the position of the planar mold in three degrees of freedom in the lateral direction, the longitudinal direction and the corner; the mold is disposed on the planar mold supporting device;
  • the UV forming mechanism and the fine adjustment alignment mechanism are fixedly mounted on the molding device.
  • the UV forming mechanism is a flat mold and a pressure from top to bottom.
  • Roller and UV light source the UV light source is mounted inside the press roll or placed side by side with the UV light source.
  • the planar support device is provided with an air suction hole.
  • a transparent flexible substrate double-sided imprinting method is prepared using the above apparatus, and the imprinting method comprises the following steps:
  • the demolding mechanism disengages the transparent flexible substrate from one end of the planar mold to the other end to complete demolding.
  • the coating method of the UV resin in the step II is one of roll coating, silk screen coating or slit extrusion coating.
  • the alignment probe and the second surface of the transparent flexible substrate are on the same side.
  • the rolling method in the step IV specifically includes the following steps: First, the initial position of the pressing roller is directly below one end of the second surface of the transparent flexible substrate, after the alignment is completed Pressing the pressure roller to press the transparent flexible substrate to make the initial fit of one end of the flat mold and the second end of the transparent flexible substrate;
  • Step 2 turning on the UV light source, curing the UV resin of the initial bonding point;
  • Step 3 the pressure roller is rolled from the bonding point of one end to the other end, so that the flat mold and the first side of the transparent flexible substrate are successively bonded, and the same is cured;
  • Step 4 The pressure roller moves at the other end at a constant speed, the imprint is completed, and the pressure roller returns to the initial position.
  • the second side of the transparent flexible substrate has been patterned and aligned by embossing, and the second surface of the transparent flexible substrate is coated with a protective film.
  • the present invention can realize roll-to-roll double-sided imprinting, and the positional deviation of the front and back sides of the pattern does not accumulate as compared with the two-roller type;
  • the rolling method does not need to work in a vacuum environment, so the embossing time can be saved, the structure can be simplified, and a large-area continuous embossing can be realized.
  • FIG. 1 is a schematic view of a double-sided imprinting apparatus for a transparent flexible substrate of the present invention
  • FIG. 2 is a schematic structural view of two cycles of the transparent flexible substrate after coating according to the present invention.
  • Figure 3 is a schematic view of a planar mold of the present invention.
  • FIG. 4 is a schematic view of the UV forming of the present invention.
  • the technical solutions in the embodiments of the present invention are clearly and completely described in the following with reference to the accompanying drawings in the embodiments of the present invention. It is obvious that the described embodiments are only a part of the embodiments of the present invention, but not all of the embodiments. All other embodiments obtained by those skilled in the art based on the embodiments of the present invention without creative efforts are within the scope of the present invention.
  • Fig. 1 shows the structure of the apparatus of the present embodiment, including a unwinding mechanism 101, a transparent UV resin coating mechanism 102, a UV molding mechanism 100, a fine adjustment alignment mechanism 10, a mold release mechanism 107, and a winding mechanism 110.
  • the UV resin coating mechanism 102 is a slit type pressing mechanism that is fixed to the apparatus and includes a constant temperature supply cylinder, an output line, and a slit coating head.
  • the fine adjustment alignment mechanism 10 includes a planar mold supporting device 116 and an alignment probe 108; the planar support device 116 is densely covered with an air suction hole sufficient for sucking the planar mold 112, the suction force is 5-7 kgf; the alignment probe 108 is a CCD image.
  • the ingestion unit; the demolding mechanism 107 is composed of two rollers.
  • the UV forming mechanism 100 in this embodiment is a planar mold 112, a pressure roller 105, and a UV light source 106 from top to bottom;
  • the pressure roller 105 is a silicone roller having a diameter of 100 mm and a length of 1500 mm.
  • the PC 113 is pressed by a force of 6kgf, and the moving speed of the pressing roller 105 is adjustable from 0.1 to 75 m/mim; the UV light source 106 can be placed inside the pressing roller or placed side by side with the pressing roller.
  • UV The light source 106 is placed inside the pressure roller and has an irradiation intensity of 70 to 150 W/cm.
  • the transparent flexible substrate 113 described in the embodiment is a PC coil having a thickness of ⁇ and a width of 1000 mm, and the back surface 115 has a periodic pattern which has been realized by roll-to-roll single-sided imprinting.
  • the alignment mark, 201 is a PE protective film;
  • the transparent UV resin 111 is an ultraviolet curing resin having a viscosity ranging from 200 to 800 cps, a curing band of 320 to 400 nm, and a curing dose of 800 to 1000 mj/cm 2 . As shown in FIG.
  • the planar mold 112 used in this embodiment is a nickel template having a thickness of ⁇ and an area of 1000 mm X 1000 mm; wherein the pattern area is 800 mm ⁇ 800 mm, and the pattern is a wire grid structure having a line width of 1 ⁇ m and a depth of 2 ⁇ m. .
  • the PC 113 is unwound by the discharge mechanism 101, and then the slit type extrusion coating device 102 coats the ultraviolet curable resin 111 on the front surface 114 of a unit 20 with a coating thickness of 5 to 6 ⁇ m and an area of 1000 mm X. 1000mm, the spacing between units is 50mm.
  • the working unit 20 then enters the UV forming mechanism 100 when the alignment mark on one side of the second side pattern of the working unit 20 is located directly below the alignment probe 108 and the alignment mark on the other side is directly below the next alignment probe 108.
  • the working unit 20 stops moving, the alignment probe 108 picks up the alignment mark information on the second surface 115 of the working unit 20 and the planar mold 112, and the control plane mold supporting device 116 makes a position adjustment, and the planar mold supporting device 116 can be in the horizontal direction and the vertical direction.
  • the three degrees of freedom of the corners finely adjust the position of the planar mold 112 to overlap the alignment marks of the second mold pattern of the working unit 20, and the alignment precision is better than 50 ⁇ m.
  • the initial position of the pressing roller 105 is at the leftmost side of the working unit 20.
  • the pressing roller rises to the pressing unit 20, so that the left end of the planar die 112 and the left end of the working unit 20 are initially fitted; then the UV light source 106 is turned on.
  • the solvent-free ultraviolet resin of the initial bonding point is solidified, and at this time, the working unit 20 and the flat mold 112 are not relatively slid by the movement of the pressure roller, and then the pressure roller 105 is rolled rightward from the initial bonding point to realize the plane.
  • the die 112 and the PC113 are cured one by one and the same; when the pressure roller is moved to the other end of the working unit 20 at a uniform speed, the front side of the working unit 20 is embossed; in the process, between the planar die 112 and the PC 113 The bubble is pushed by the pressing roller until the plane die 112, so that the pattern can obtain good pattern copying precision; after the stamping is completed, the pressing roller 105 is lowered to return to the initial position; the automatic releasing mechanism 107 is activated, two The roller is moved downward to provide a demolding force, so that the first surface 114 of the working unit 20 and the planar die 112 are peeled off one by one, in the work order A double-sided embossed pattern is formed on the element 20.
  • the polyacrylate UV glue in the embodiment may also be an epoxy UV glue and all UV curing colloids; the glue application mechanism in this embodiment may be roll coating, silk screen coating or slit extrusion coating.
  • the glue application mechanism in this embodiment may be roll coating, silk screen coating or slit extrusion coating.

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Abstract

一种可对准卷对卷UV成型的装置及方法,该装置包括放卷机构(101)、涂布机构(1Q2)、UV成型机构(100)、脱模机构(107)和收卷机构(110);其特征在于,还包括微调对准机构(10);所述微调对准机构(10)包括平面模具支撑装置(116)和对准探头(108),所述平面模具支撑装置(116)调整平面模具在横向、纵向、转角三个自由度的位置;所述模具(112)设置于平面模具支撑装置(116)上;所述UV成型机构(100)和微调对准机构(10)固定安装于成型装置上。它消除了生产中带来的对准所产生的累计误差和气泡对图形的影响。

Description

发明名称
一种可对准卷对卷 UV成型的装置及方法 技术领域
本发明涉及一种压印成型装置技术领域,尤其涉及一种可对准卷对卷 UV 成型的装置及方法。 背景技术
紫外压印是指将紫外固化材料置于模具和基材之间, 在压力作用下使材 料充塞进有起伏结构的模具中, 紫外固化后脱模完成模具图形复制的技术。 压印特别是微纳米压印在光学膜、 防伪标签、 光碟、 微机电系统等图形化制 备中有着不可替代的作用, 是光学显示、 信息存储、 生物医药等高科技领域 研究的重要对象。 相比于紫外光刻、 电子束或离子束光刻等微纳加工手段, 微纳米压印技术具有操作简单、 极限分辨率高、 重复性好等优点。
目前在基材表面进行单面压印的技术已经非常成熟, 通过平面或者曲面 模具实现单面压印的设备已能够制作线宽小于 lOOnm的图形。 但在诸如双面 防伪标签等许多领域中, 单面压印技术已经不能满足要求。 针对这些领域的 双面压印技术主要有以下两种:
一是双辊式双面压印技术, 其基于曲面模具单面压印的原理, 在设备上 放置两支包覆曲面模具或者直接雕刻图形的压辊, 实现正反面分别压印。 该 方式能够实现卷对卷快速双面压印。 然而, 每一个压印单元正反面图形的对 准精度是决定压印质量的重要因素之一。 为实现双面对准, 双辊式技术采用 了两个直径理论相同的压辊, 但是实际上压辊的制作存在误差, 直径不可能 完全一致, 细微的差别在上千次压印之后被显著放大, 导致正反面压印图形 不能对位。 此外, 模具包覆于压辊上容易引入角度误差, 使其中一面图形发 生旋转, 亦不能实现双面对位。
二是双平面模具式双面压印技术, 通常采用两个不形变的平面模具放置 在基材的正反面, 在基材正反面同时涂有压印材料, 两个模具与基材在真空 下紧密贴合实现一个单元的双面压印。 该方式虽然可以通过对准机构实现正 反面图形的对位,但需要引入抽真空歩骤来排除模具和压印材料之间的气泡, 所以存在两个问题: (1).需要搭建密闭空间, 营造真空环境; (2).抽真空过程 耗时非常长。 上述问题决定该方式不能实现卷对卷快速生产。 发明内容
本发明提出一种可对准卷对卷 UV成型的装置及方法, 解决了现有技术 中存在的双面压印中上下相对应的图形化区域压印过程中偏移误差累计。
本发明的另一目的是解决压印过程中气泡难以消除的缺点。
本发明的所解决的技术问题采用以下技术方案来实现:
一种可对准卷对卷 UV成型的装置, 包括放卷机构、涂布机构、 UV成型 机构、 脱模机构和收卷机构; 还包括微调对准机构; 所述微调对准机构包括 平面模具支撑装置和对准探头,所述平面模具支撑装置调整平面模具在横向、 纵向、 转角三个自由度的位置; 所述模具设置于平面模具支撑装置上; 所述
UV成型机构和微调对准机构固定安装于成型装置上。
作为优选的技术方案, 所述 UV成型机构自上而下依次为平面模具、 压 辊和 UV灯源; 所述 UV灯源安装于压辊内部或与 UV灯源并列放置。
作为优选的技术方案, 所述的平面支撑装置上布有吸气孔。
使用上述装置制备透明柔性基材双面压印方法, 所述压印方法包括以下 歩骤:
I、 由涂布机构将 UV树脂涂布在透明柔性基材的第一面;
II、 将所述透明柔性基材的第一面已涂布区域输送到平面模具和压辊之 间, 且所述第一面已涂布区域与平面模具相对;
III、 由微调对准机构中对准探头识别所述透明柔性基材的第二面的对准 标记和平面模具上对应的对准标记, 控制平面模具支撑装置调整模具横向、 纵向、 转角三个自由度, 完成对准;
IV、 以辊压方式使已对准涂布有 UV树脂的所述透明柔性基材第一面与 平面模具逐歩压合, UV灯源与压辊同歩移动, 对 UV树脂完成固化;
V、 脱模机构将所述透明柔性基材从平面模具的一端向另一端脱离, 完 成脱模。
作为优选的技术方案, 所述歩骤 II中 UV树脂的涂布方式为辊涂、 丝印 涂布或狭缝式挤压涂布的一种。
作为优选的技术方案,所述歩骤 III中对准探头与透明柔性基材第二面位 于同侧。
作为优选的技术方案, 所述歩骤 IV中辊压方式具体包括以下歩骤: 歩骤 1、 压辊的初始位置位于所述透明柔性基材的第二面一端的正下方, 对准完毕后, 压辊上升顶压透明柔性基材, 使平面模具的一端与透明柔性基 材的第二面一端实现初始贴合;
歩骤 2、 打开 UV灯源, 将初始贴合点的 UV树脂固化; 歩骤 3、 压辊从一端的贴合点开始向另一端滚压, 使平面模具与透明柔 性基材第一面逐歩贴合, 且同歩固化;
歩骤 4、 压辊匀速移动另一端, 压印完成, 压辊回到初始位置。
作为优选的技术方案, 所述透明柔性基材的第二面已通过压印形成图案 和对准标记, 且所述透明柔性基材的第二面表面贴有保护膜。
本发明的有益效果:
(1)本发明能够实现卷对卷双面压印, 与双辊式相比, 每周期图形正反面 的位置偏差不会累积;
(2)相较于平面压印, 辊压方式不需要在真空环境下工作, 因此能够节省 压印时间、 简化结构, 实现大面积连续式压印。 附图说明
为了更清楚地说明本发明实施例或现有技术中的技术方案, 下面将对实 施例或现有技术描述中所需要使用的附图作简单地介绍, 显而易见地, 下面 描述中的附图仅仅是本发明的一些实施例, 对于本领域普通技术人员来讲, 在不付出创造性劳动性的前提下, 还可以根据这些附图获得其他的附图。
图 1 是本发明透明柔性基材双面压印装置的示意图;
图 2 是本发明涂布后透明柔性基材两个周期的结构示意图;
图 3是本发明平面模具示意图;
图 4是本发明 UV成型示意图。 具体实施方式 下面将结合本发明实施例中的附图, 对本发明实施例中的技术方案进行 清楚、 完整地描述, 显然, 所描述的实施例仅仅是本发明一部分实施例, 而 不是全部的实施例。 基于本发明中的实施例, 本领域普通技术人员在没有作 出创造性劳动前提下所获得的所有其他实施例, 都属于本发明保护的范围。
实施例 1
图 1为本实施例的装置结构,包括放卷机构 101、透明 UV树脂涂布机构 102、 UV成型机构 100、 微调对准机构 10、 脱模机构 107和收卷机构 110。 UV树脂涂布机构 102为狭缝式挤压机构, 固定在装置上, 包括恒温供料筒、 输出管路和狭缝式涂布头。 微调对准机构 10包括平面模具支撑装置 116、 对 准探头 108;平面支撑装置 116上密布有足以吸紧平面模具 112的吸气孔,吸 紧力为 5~7kgf;对准探头 108为 CCD图像摄取单元;脱模机构 107由两支辊 轮组成。
作为进一歩的改进, 本实施例中的 UV成型机构 100 自上而下依次为平 面模具 112、 压辊 105、 UV灯源 106; 压辊 105为硅胶辊, 直径为 100mm, 长度为 1500mm, 以 6kgf 的力顶压 PC 113, 压辊 105 的移动速度在 0.1~75m/mim, 可调; UV光源 106可以放置在压辊内部, 也可以与压辊并排 放置,在本实施例中, UV光源 106放置在压辊内部,照射强度为 70~150W/cm。
实施例 2
如图 2所示,在本实施例中所述的透明柔性基材 113为 PC卷材,厚度为 ΙΟΟμιη, 宽度为 1000mm, 背面 115有已通过卷对卷单面压印方式实现的周期 式图案和对准标记, 201为 PE保护膜; 透明 UV树脂 111为紫外固化树脂, 粘度范围是 200~800cps, 固化波段在 320~400nm, 固化剂量为 800~1000mj/cm2。 如图 3 所示, 在本实施例中所使用的平面模具 112 为镍模板, 厚度为 ΙΟΟμιη, 面积为 1000mm X 1000mm; 其中图案面积为 800mmX 800mm, 图案 为线宽 1μιη、 深 2μιη的线栅结构。
首先由放料机构 101将 PC 113放卷,接着狭缝式挤压涂布装置 102将紫 外固化树脂 111涂覆在一个单元 20的正面 114上, 涂布厚度为 5~6μιη, 面积 为 1000mm X 1000mm, 单元间的间隔为 50mm。
工作单元 20随后进入 UV成型机构 100,当工作单元 20第二面图案一侧 的对准标记位于对准探头 108正下方、 另外一侧的对准标记位于下一个对准 探头 108正下方时, 工作单元 20停止移动, 对准探头 108摄取工作单元 20 第二面 115和平面模具 112上的对准标记信息, 控制平面模具支撑装置 116 做出位置调整, 平面模具支撑装置 116能在横向、 纵向、 转角三个自由度微 调平面模具 112的位置,使平面模具 112与工作单元 20第二面图案的对准标 记重叠, 对准精度优于 50μιη。
压辊 105初始位置在工作单元 20最左侧, 当对准完毕后, 压辊上升顶压 单元 20, 使平面模具 112的左端与工作单元 20左端实现初始贴合; 然后 UV 灯源 106打开, 将初始贴合点的无溶剂紫外树脂固化, 此时工作单元 20与平 面模具 112不会因压辊的移动而出现相对滑动, 然后压辊 105从初始贴合点 开始向右滚压, 实现平面模具 112与 PC113的逐歩贴合和同歩固化; 当压辊 匀速移动至工作单元 20的另一端时, 工作单元 20的正面压印完成; 这个过 程中, 位于平面模具 112与 PC113之间的气泡被压辊逐歩推赶, 直至平面模 具 112 以外, 因此该方式能够获得很好的图形复制精度; 压印完成后, 压辊 105下降, 回到初始位置; 自动脱模机构 107启动, 两支辊轮向下移动, 提 供脱模拉力, 使工作单元 20第一面 114与平面模具 112逐歩揭离, 在工作单 元 20上形成双面压印图案。
重复以上歩骤, 可实现卷对卷快速生产。
实施例中所述聚丙烯酸酯 UV胶, 同样可以是环氧类 UV胶和一切紫外 固化胶体; 本实施例中的涂胶机构可以是辊涂、 丝印涂布或狭缝式挤压涂布 的一种一种。
以上所述仅为本发明的较佳实施例而已, 并不用以限制本发明, 凡在本 发明的精神和原则之内, 所作的任何修改、 等同替换、 改进等, 均应包含在 本发明的保护范围之内。

Claims

权利要求书
1.一种可对准卷对卷 UV成型的装置, 包括放卷机构 (101 )、 涂布机构 ( 102)、 UV成型机构 (100)、 脱模机构 (107) 和收卷机构 (110); 其特征 在于, 还包括微调对准机构 (10); 所述微调对准机构 (10)包括平面模具支 撑装置 (116) 和对准探头 (108), 所述平面模具支撑装置 (116) 调整平面 模具在横向、 纵向、 转角三个自由度的位置; 所述模具 (112) 设置于平面模 具支撑装置 (116) 上; 所述 UV成型机构 (100) 和微调对准机构 (10) 固 定安装于成型装置上。
2.根据权利要求 1所述的装置, 其特征在于, 所述 UV成型机构 (100) 自上而下依次为平面模具 (112)、 压辊 (105) 和 UV灯源 (106); 所述 UV 灯源 (106) 安装于压辊 (105 ) 内部或与 UV灯源 (106) 并列放置。
3.根据权利要求 1所述的装置,其特征在于,所述的平面支撑装置(116) 上布有吸气孔。
4.使用权利要求 1-3 任一权利要求所述装置制备透明柔性基材双面压印 方法, 所述透明柔性基材的第二面已通过压印形成图案和对准标记, 且所述 透明柔性基材的第二面表面贴有保护膜, 所述压印方法包括以下歩骤:
I、 由涂布机构将 UV树脂涂布在透明柔性基材的第一面;
II、 将所述透明柔性基材的第一面已涂布区域输送到平面模具和压辊之 间, 且所述第一面已涂布区域与平面模具相对; III、 由微调对准机构中对准探头识别所述透明柔性基材的第二面的对准 标记和平面模具上对应的对准标记, 控制平面模具支撑装置调整模具横向、 纵向、 转角三个自由度, 完成对准;
IV、 以辊压方式使已对准涂布有 UV树脂的所述透明柔性基材第一面与 平面模具逐歩压合, UV灯源与压辊同歩移动, 对 UV树脂完成固化;
V、 脱模机构将所述透明柔性基材从平面模具的一端向另一端脱离, 完 成脱模。
5.根据权利要求 4所述的方法, 其特征在于, 所述歩骤 II中 UV树脂的 涂布方式为辊涂、 丝印涂布或狭缝式挤压涂布的一种。
6.根据权利要求 4所述的方法, 其特征在于, 所述歩骤 III中对准探头与 透明柔性基材第二面位于同侧。
7.根据权利要求 4所述的方法, 其特征在于, 所述歩骤 IV中辊压方式具 体包括以下歩骤:
歩骤 1、 压辊的初始位置位于所述透明柔性基材的第二面一端的正下方, 对准完毕后, 压辊上升顶压透明柔性基材, 使平面模具的一端与透明柔性基 材的第二面一端实现初始贴合;
歩骤 2、 打开 UV灯源, 将初始贴合点的 UV树脂固化;
歩骤 3、 压辊从一端的贴合点开始向另一端滚压, 使平面模具与透明柔 性基材第一面逐歩贴合, 且同歩固化;
歩骤 4、 压辊匀速移动另一端, 压印完成, 压辊回到初始位置。
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