WO2014036749A1 - 一种显示面板及其制造方法、平板显示装置 - Google Patents

一种显示面板及其制造方法、平板显示装置 Download PDF

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Publication number
WO2014036749A1
WO2014036749A1 PCT/CN2012/081342 CN2012081342W WO2014036749A1 WO 2014036749 A1 WO2014036749 A1 WO 2014036749A1 CN 2012081342 W CN2012081342 W CN 2012081342W WO 2014036749 A1 WO2014036749 A1 WO 2014036749A1
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WIPO (PCT)
Prior art keywords
area
image display
blank
display area
dummy pattern
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
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PCT/CN2012/081342
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English (en)
French (fr)
Inventor
郑华
陈世烽
林沛
林明文
吴良东
高攀
陈上潘
潘龙
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TCL China Star Optoelectronics Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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Application filed by Shenzhen China Star Optoelectronics Technology Co Ltd filed Critical Shenzhen China Star Optoelectronics Technology Co Ltd
Priority to US13/643,089 priority Critical patent/US9323080B2/en
Publication of WO2014036749A1 publication Critical patent/WO2014036749A1/zh
Anticipated expiration legal-status Critical
Priority to US15/084,754 priority patent/US9963789B2/en
Ceased legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133388—Constructional arrangements; Manufacturing methods with constructional differences between the display region and the peripheral region
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture

Definitions

  • the present invention relates to the field of image display, and in particular to a display panel, a method of manufacturing the same, and a flat panel display device. Background technique
  • the lithography process is very important in the manufacture of flat panel displays.
  • the main steps are "film deposition - photoresist coating - one exposure - one photoresist development - one film etching - one photoresist peeling".
  • “resistance development” is carried out using a liquid developing solution
  • the “film etching” of the metal (alloy) layer is carried out using a liquid etching solution, which is a so-called “wet process”.
  • the film pattern on the surface of the substrate affects the local concentration of the agent in the solution, that is, if the area of the photoresist to be developed somewhere or the area of the metal (alloy) to be etched is large, the amount of the drug consumed is large. On the other hand, if the area of the photoresist to be developed somewhere or the area of the metal (alloy) to be etched is small, the amount of the drug consumed is small.
  • the solution generally has a diffusing effect, spontaneously tending to maintain equal concentrations everywhere. Therefore, when the film patterns on the surface of the substrate are greatly different, diffusion of the agent from the high concentration region to the low concentration region occurs during development or etching, so that the development or etching effect of the pattern boundary region is significantly different from that of the central region. This effect is called the "Loading Effect”.
  • the photoresist development process of the pixel electrode layer of the liquid crystal panel is taken as an example to illustrate the adverse effect of the Loading Effect on the edge of the image display area (AA area) of the ordinary liquid crystal panel.
  • Fig. 1 shows the design of a pixel electrode layer of a conventional liquid crystal panel.
  • the center of the panel is AA area 1, and the area of the photoresist to be developed is small. Most of the area outside the AA area is a blank area 2, and the area of the photoresist to be developed is large.
  • the inner side is designed as a normal pixel area 3, and has a neat IT0 (indium tin oxide) electrode array, and the outer side is designed as a blank area (with no IT0 electrode array). 4.
  • IT0 indium tin oxide
  • the developer concentration of the edge area 5 is significantly attenuated, and the developer concentration is closer to the blank area 4; the development of the edge area 5 is subsequent to the development process.
  • the ability is reduced in gradient, and the degree of photoresist development of the pixels closer to the blank area 4 is weaker.
  • the Loading Effect weakens the degree of development of the photoresist in the edge region 5, which inevitably results in an abnormal pattern after the etching process (mainly manifested in that the pattern cannot be etched or the pattern is coarse).
  • the edge region 5 may cause image display defects due to pattern abnormality. Not only the important indicators such as brightness, viewing angle, and response time are different from the normal pixel region 3, but also affect the charge and discharge characteristics of the normal pixel region 3, so it is necessary to try eliminate. Summary of the invention
  • the technical problem to be solved by the present invention is to provide a display panel, a method of manufacturing the same, and a flat panel display device, in which a pattern displayed on a display area is kept normal and uniform.
  • the present invention provides a display panel including an image display area and a blank area surrounding the periphery of the image display area, between the image display area and the blank area, along the image display area A matte pattern area with no display function is provided on the peripheral edge.
  • the solution concentration at the interface between the dummy pattern area and the image display area is substantially the same as the solution concentration of the image display area, and the solution of the ⁇ sub-pattern area The concentration is decremented from the junction to the blank area.
  • the image display area, the blank area, and the dummy pattern area are disposed in the display panel for developing or etching using a wet process, and the layer includes a pixel electrode layer, a first metal layer or a second metal Floor.
  • the image display area, the blank area and the dummy pattern area are disposed on the pixel electrode layer, and the dummy pattern area includes a plurality of dummy pixels.
  • the embodiment of the invention further provides a method for manufacturing a display panel, comprising the steps of:
  • a dummy pattern area having no display function is disposed along a peripheral edge of the image display area between the image display area and the blank area.
  • a solution concentration at a junction of the dummy pattern region and the image display region is substantially the same as a solution concentration of the image display region, and a solution concentration on the dummy pattern region is self-contained
  • the junction is decremented to the blank area.
  • the image display area, the blank area, and the dummy pattern area are disposed in the display panel for developing or etching using a wet process, and the layer includes a pixel electrode layer, a first metal layer or a second metal Floor.
  • the image display area, the blank area and the dummy pattern area are disposed on the pixel electrode layer, and the dummy pattern area includes a plurality of dummy pixels.
  • the embodiment of the invention further provides a flat panel display device, comprising: a display panel, the display panel comprising an image display area and a blank area surrounding the periphery of the image display area, between the image display area and the blank area A dummy pattern area having no display function is provided along a peripheral edge of the image display area.
  • the solution concentration at the interface between the dummy pattern area and the image display area is substantially the same as the solution concentration of the image display area, and the solution concentration of the dummy pattern area The blank area is decremented from the junction.
  • the image display area, the blank area, and the dummy pattern area are disposed in the display panel for developing or etching using a wet process, and the layer includes a pixel electrode layer, a first metal layer or a second metal Floor.
  • the image display area, the blank area and the dummy pattern area are disposed on the pixel electrode layer, and the dummy pattern area includes a plurality of dummy pixels.
  • the display panel, the manufacturing method thereof and the flat panel display device provided by the invention have a dummy pattern area added to the peripheral edge of the image display area, and the dummy pattern area is subjected to the influence of the Loading Effect to ensure the image display area is protected from the loading effect.
  • the effect is that the displayed patterns are normal and uniform.
  • FIG. 1 is a schematic diagram of a conventional display panel design.
  • FIG. 2 is a schematic diagram of actual effect of the existing display panel design.
  • FIG. 3 is a schematic view showing the design of a display panel according to an embodiment of the present invention.
  • FIG. 4 is a schematic view showing the actual effect of the design of the display panel according to the embodiment of the present invention. detailed description
  • An embodiment of the present invention provides a display panel including an image display area and a blank area surrounding the periphery of the image display area, and between the image display area and the blank area, along a peripheral edge of the image display area. Dummy Pattern with no display function.
  • the present invention is applicable to a layer which is developed or etched using a "wet process" such as a pixel electrode layer, a first metal layer or a second metal layer.
  • a pixel electrode layer a layer which is developed or etched using a "wet process”
  • a first metal layer a first metal layer or a second metal layer.
  • FIG. 3 is a schematic diagram of a pixel electrode layer design of a display panel according to Embodiment 1 of the present invention
  • FIG. 4 is a schematic diagram of a pixel electrode layer design effect of the display panel according to Embodiment 1 of the present invention.
  • the display panel of the first embodiment of the present invention includes an image display area 1 (AA area), a blank area 2 surrounding the periphery of the display area 1, and an image along the image display area 1 and the blank area 2.
  • a dummy pattern area 6 having no display function is provided at the peripheral edge of the display area 1.
  • the edge area A of the AA area 1 is enlarged.
  • the dummy pattern area 6 includes a plurality of dummy pixels 7.
  • the pattern design of the dummy pixels 7 can be exactly the same as that of the normal pixel area 3, and can be adjusted according to the situation.
  • the dummy pixel 7 has no electrical or optical function and does not connect to the driving signal, so it does not affect the charging and discharging of the normal pixel region 3, and does not increase the load of the driving circuit.
  • the following is a description of how the display panel of the first embodiment of the present invention implements the normal display pattern of the display area, which is not affected by the loading effect.
  • the AA zone 1 slowly consumes a small amount of developer, and the blank zone 2 quickly consumes a large amount of developer, and the difference in concentration causes the developer of the AA zone 1 to diffuse toward the blank zone 2 as a whole.
  • the prior art shown in FIG. 1 Different from the prior art shown in FIG. 1
  • the developer concentration of the dummy pattern area 6 is from the inside to the outside (from Positive
  • the normal pixel region 3 has a significant gradient attenuation toward the blank region 4, and the concentration of the developer closer to the blank region 4 is lower; that is, the concentration of the developer at the junction of the dummy pattern region 6 and the AA region 1 is substantially the same as that of the AA region 1
  • the developer concentration on the same is the same, and the developer concentration of the dummy pattern region 6 is decremented from the junction to the blank region 2.
  • the developing ability of the dummy pattern region 6 is gradually lowered, and the closer to the pixel of the blank region 4, the weaker the degree of development of the photoresist.
  • the actual prepared panel will be as shown in Figure 4.
  • the pattern of the dummy pixel 8 near the blank area 4 after the development process is abnormally affected by the Loading Effect, and the entire normal pixel area 3 away from the blank area 4 is observed.
  • the displayed pattern remains normal, uniform, and does not include an edge region 5 that exhibits anomalies as shown in FIG.
  • the embodiment achieves the above-mentioned effects different from the prior art, and is based on: all pixels in the image display area are used to display images in the prior art, so that the outermost pixels in the wet process are susceptible to the loading effect, and the present invention is implemented.
  • a dummy pattern area 6 is added to the peripheral edge of the image display area 1, and the edge area 5 is replaced by the dummy pattern area 6 to withstand the influence of the loading effect.
  • the normal pixel area 3 is away from the blank.
  • the size of the dummy pattern area 6 As for the size of the dummy pattern area 6, and the number and pattern of dummy pixels required, it can be determined according to engineering experiments, and only needs to be satisfied: in the wet process, the solution of the dummy pattern area 6 and the image display area 1 is The concentration of the solution in the image display area 1 is substantially the same, and the concentration of the solution on the dummy pattern area 6 decreases from the junction to the blank area 2.
  • the second embodiment of the present invention further provides a method for manufacturing a display panel, comprising the steps of: setting an image display area and a blank area surrounding the periphery of the image display area;
  • a dummy pattern area having no display function is disposed along a peripheral edge of the image display area.
  • setting the dummy pattern area must meet the following conditions:
  • the solution concentration at the interface between the dummy pattern area and the image display area is substantially the same as the solution concentration in the image display area, and the solution concentration on the dummy pattern area is transferred from the junction to the blank area.
  • the image display area, the blank area, and the dummy pattern area may be provided in a display panel for developing or etching using a wet process, and the layers include a pixel electrode layer, a first metal layer, or a second metal layer.
  • the image display area, the blank area, and the dummy pattern area are disposed on the pixel electrode layer, and the dummy pattern area includes a plurality of dummy pixels.
  • the step of adding one to the image display area and the blank area is performed, and a dummy pattern area having no display function is disposed along the peripheral edge of the image display area.
  • the matte pattern area is subjected to the influence of the loading effect to ensure that the image display area is protected from the loading effect, and the displayed pattern is normal and uniform; and the dummy pattern area is used only for buffering the wet process loading because there is no display function.
  • the Effect effect even if it is affected by the Loading Effect, does not adversely affect the image display of the display panel.
  • the display panel of the first embodiment of the present invention can be applied to a flat panel display device such as a liquid crystal display (LCD), a plasma display (PDP), or an organic light emitting diode display (OLED).
  • a flat panel display device such as a liquid crystal display (LCD), a plasma display (PDP), or an organic light emitting diode display (OLED).
  • LCD liquid crystal display
  • PDP plasma display
  • OLED organic light emitting diode display

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Description

一种显示面^其制造方法、 平板显示装置 本申请要求于 2012年 9月 10日提交中国专利局、申请号为 201210331726.4、 发明名称为 "一种显示面板及其制造方法、 平板显示装置" 的中国专利申请的 优先权， 上述专利的全部内容通过引用结合在本申请中。 技术领域
本发明涉及图像显示领域， 尤其涉及一种显示面板及其制造方法、 平板显 示装置。 背景技术
光刻制程在平板显示器的制造中至关重要， 主要步骤为 "薄膜沉积一一光 阻涂布一一曝光一一光阻显影一一薄膜蚀刻一一光阻剥离"。 一般情况下， "光 阻显影" 是使用液态的显影液进行， 而金属 （合金）层的 "薄膜蚀刻" 是使用 液态的蚀刻液进行， 均为所谓的 "湿制程"。 在 "湿制程" 中， 基板表面的薄膜 图案会影响溶液中药剂的局部浓度， 即： 如果某处需要显影的光阻面积或需要 蚀刻的金属 （合金） 面积大， 则该处消耗的药剂多； 反之， 如果某处需要显影 的光阻面积或需要蚀刻的金属 （合金） 面积小， 则该处消耗的药剂少。
溶液普遍存在扩散作用， 自发地倾向于保持各处浓度相等。 因此当基板表 面的薄膜图案差异很大时， 显影或蚀刻时会出现药剂从高浓度区向低浓度区的 扩散， 从而导致图案边界区的显影或蚀刻效果与中心区明显不同。 这种效应被 称为 "负载效应" （ Loading Effect )。
下面以液晶面板的像素电极层的光阻显影制程为例， 说明 Loading Effect对 普通液晶面板的图像显示区域（ AA区） 边缘的不利影响。
图 1所示为现有普通液晶面板的像素电极层的设计， 面板中心为 AA区 1 , 需要显影的光阻面积小； AA区外大部分为空白区 2, 需要显影的光阻面积大。 从图 1中选取 AA区 1的边缘区域 A'处放大来看， 内侧设计为正常像素区 3,具 有整齐的 IT0 (铟锡氧化物 ) 电极阵列， 外侧设计为空白区 （无 IT0电极阵列 ) 4。 然而由于 Loading Effect的影响， 实际光阻显影制程不能实现上述理想设计， 实际结果如图 2所示。 同样， 从图 2中选取 AA区 1的边缘区域 A'处放大来看， 靠近空白区 4的边缘区 5将会由于光阻显影不充分而出现图案异常， 但越靠内 侧的像素异常程度将越轻，足够靠内的正常像素区 3就能实现理想设计。 Loading Effect影响光阻显影的具体过程为： 在显影制程开始时刻， AA区 1緩慢消耗了 少量的显影剂， 而空白区 2迅速消耗了大量的显影剂， 浓度差导致 AA区 1的 显影剂整体向空白区 2扩散。 从 AA区 1的边缘区域 A'处看，边缘区 5的显影 液浓度呈明显的梯度衰减， 越靠近空白区 4的显影液浓度越低； 在显影制程的 后续时间里， 边缘区 5的显影能力呈梯度降低， 越靠近空白区 4的像素的光阻 显影程度越弱。 Loading Effect使边缘区 5的光阻显影程度减弱， 必然导致其蚀 刻制程后图案异常（主要表现为不能蚀刻出图案或者图案粗大）。
边缘区 5 由于出现图案异常， 会造成图像显示缺陷， 不仅其亮度、 视角、 响应时间等重要指标均有别于正常像素区 3,而且还会影响正常像素区 3的充放 电特性， 因此必须设法消除。 发明内容
本发明所要解决的技术问题在于， 提供一种显示区域所显示图案保持正常、 均一的一种显示面板及其制造方法、 平板显示装置。
为了解决上述技术问题， 本发明提供一种显示面板， 包括图像显示区和围 绕在所述图像显示区域外围的空白区， 在所述图像显示区和空白区之间， 沿所 述图像显示区的外围边缘设有无显示功能的哑图案区。
进一步地， 在所述显示面板的湿制程中， 所述哑图案区与所述图像显示区 相接处的溶液浓度和所述图像显示区的溶液浓度大致相同， 所述 ρ亚图案区的溶 液浓度自所述相接处向所述空白区递减。
进一步地， 所述图像显示区域的溶液浓度维持不变。
进一步地， 所述图像显示区、 空白区和哑图案区设于所述显示面板中使用 湿制程进行显影或蚀刻的图层， 所述图层包括像素电极层、 第一金属层或第二 金属层。
进一步地， 所述图像显示区、 空白区和哑图案区设于所述像素电极层， 所 述哑图案区包括若干哑像素。
本发明实施例还提供一种显示面板的制造方法， 包括步骤：
设置图像显示区和围绕在所述图像显示区域外围的空白区； 在所述图像显示区和空白区之间， 沿所述图像显示区的外围边缘设置无显 示功能的哑图案区。
进一步地， 设置所述哑图案区满足以下条件：
在所述显示面板的湿制程中， 所述哑图案区与所述图像显示区相接处的溶 液浓度和所述图像显示区的溶液浓度大致相同， 而所述哑图案区上的溶液浓度 自所述相接处向所述空白区递减。
进一步地， 所述图像显示区、 空白区和哑图案区设于所述显示面板中使用 湿制程进行显影或蚀刻的图层， 所述图层包括像素电极层、 第一金属层或第二 金属层。
进一步地， 所述图像显示区、 空白区和哑图案区设于所述像素电极层， 所 述哑图案区包括若干哑像素。
本发明实施例还提供一种平板显示装置， 其中， 包括显示面板， 所述显示 面板包括图像显示区和围绕在所述图像显示区域外围的空白区， 在所述图像显 示区和空白区之间， 沿所述图像显示区的外围边缘设有无显示功能的哑图案区。
进一步地， 在所述显示面板的湿制程中， 所述哑图案区与所述图像显示区 相接处的溶液浓度和所述图像显示区的溶液浓度大致相同， 所述哑图案区的溶 液浓度自所述相接处向所述空白区递减。
进一步地， 所述图像显示区域的溶液浓度维持不变。
进一步地， 所述图像显示区、 空白区和哑图案区设于所述显示面板中使用 湿制程进行显影或蚀刻的图层， 所述图层包括像素电极层、 第一金属层或第二 金属层。
进一步地， 所述图像显示区、 空白区和哑图案区设于所述像素电极层， 所 述哑图案区包括若干哑像素。
本发明所提供的显示面板及其制造方法、 平板显示装置， 由于在图像显示 区的外围边缘增设了哑图案区， 由哑图案区来承受 Loading Effect的影响， 保证 图像显示区免受 Loading Effect的影响， 所显示的图案均正常、 均一。 附图说明
为了更清楚地说明本发明实施例或现有技术中的技术方案， 下面将对实施 例或现有技术描述中所需要使用的附图作筒单地介绍， 显而易见地， 下面描述 中的附图仅仅是本发明的一些实施例， 对于本领域普通技术人员来讲， 在不付 出创造性劳动的前提下， 还可以根据这些附图获得其他的附图。
图 1是现有显示面板设计示意图。
图 2是现有显示面板设计实际效果示意图。
图 3是本发明实施例的显示面板设计示意图。
图 4是本发明实施例的显示面板设计实际效果示意图。 具体实施方式
下面参考附图对本发明的优选实施例进行描述。
本发明实施例提供一种显示面板， 包括图像显示区和围绕在所述图像显示 区域外围的空白区， 在所述图像显示区和空白区之间， 沿所述图像显示区的外 围边缘设有无显示功能的哑图案区 （ Dummy Pattern )。
本发明适用于像素电极层、 第一金属层或第二金属层等使用 "湿制程" 进 行显影或蚀刻的图层。 为表述方便， 以下以像素电极层为例对本发明的主要思 想进行说明。
具体参照图 3-4所示，其中图 3为本发明实施例一的显示面板的像素电极层 设计示意图， 图 4为本发明实施例一的显示面板的像素电极层设计效果示意图。
如图 3所示， 本发明实施例一的显示面板包括图像显示区域 1 ( AA区）、 围绕在显示区域 1外围的空白区域 2,以及在图像显示区域 1和空白区域 2之间、 沿图像显示区域 1的外围边缘设置的无显示功能的哑图案区域 6。从图 3中选取 AA区 1的边缘区域 A处放大来看， 哑图案区 6包括若干哑像素 7, 哑像素 7的 图案设计可以和正常像素区 3的像素完全相同， 也可以根据情况调整。 哑像素 7 没有电学、 光学功用， 不接入驱动信号， 因此不会影响正常像素区 3的充放电， 也不会增加驱动电路的负荷。
下面以显影制程为例说明本发明实施例一的显示面板是如何实现显示区域 正常显示图案， 不受 Loading Effect影响的。
在显影制程开始时， AA区 1緩慢消耗了少量的显影剂， 而空白区 2迅速消 耗了大量的显影剂， 浓度差导致 AA区 1的显影剂整体向空白区 2扩散。 与图 1 所示现有设计不同， 由于本发明实施例一的显示面板在 AA区 1 的边缘增设了 哑图案区 6, 受 Loading Effect影响， 哑图案区 6的显影液浓度自内向外（自正 常像素区 3向空白区 4呈明显的梯度衰减， 越靠近空白区 4的显影液浓度越低； 也就是说，哑图案区 6与 AA区 1相接处的显影液浓度大致与 AA区 1上的显影 液浓度相同， 而哑图案区域 6的显影液浓度自该相接处向空白区域 2递减。
在显影制程的后续时间里， 哑图案区 6 的显影能力呈梯度降低， 越靠近空 白区 4的像素的光阻显影程度越弱。 实际制备出来的面板将如图 4所示。从图 4 中选取 AA区 1的边缘区域 A处放大来看， 经历显影制程后的靠近空白区 4的 哑像素 8的图案受 Loading Effect影响出现异常， 而远离空白区 4的整个正常像 素区 3所显示的图案保持正常、 均一， 不再像图 2所示那样包含一个显示异常 的边缘区 5。
本实施例达到上述区别于现有技术的效果， 是基于： 现有技术中图像显示 区域的所有像素均用来显示图像， 因此在湿制程中最外围像素容易受 Loading Effect影响， 而本发明实施例一在图像显示区 1的外围边缘增设了哑图案区 6, 由哑图案区 6取代边缘区 5来承受 Loading Effect的影响， 一方面由于有哑图案 区 6来緩沖， 正常像素区 3远离空白区 4, 不会受到 Loading Effect的影响， 整 个正常像素区 3所显示的图案均正常、 均一， 进而保证 AA区 1的各层图案与 设计值完全一致； 另一方面， 由于哑图案区 6没有显示功能， 仅用于緩沖湿制 程的 Loading Effect效应， 即使其受到 Loading Effect的影响， 也不会对显示面 板的图像显示产生不利之处。
至于哑图案区 6 的大小， 以及所需哑像素的个数和图案， 可根据工程实验 来实际确定， 只需要满足： 在湿制程中， 哑图案区 6与图像显示区 1相接处的 溶液浓度和图像显示区 1的溶液浓度大致相同， 而哑图案区 6上的溶液浓度自 该相接处向空白区 2递减。
相应地， 本发明实施例二还提供一种显示面板的制造方法， 包括步骤： 设置图像显示区和围绕在所述图像显示区域外围的空白区；
在所述图像显示区和空白区之间， 沿所述图像显示区的外围边缘设置无显 示功能的哑图案区。
其中， 设置哑图案区需满足以下条件：
在显示面板的湿制程中， 哑图案区与图像显示区相接处的溶液浓度和图像 显示区的溶液浓度大致相同， 而哑图案区上的溶液浓度自该相接处向空白区递 图像显示区、 空白区和哑图案区可设在显示面板中使用湿制程进行显影或 蚀刻的图层， 这些图层包括像素电极层、 第一金属层或第二金属层。
作为一个例子， 图像显示区、 空白区和哑图案区设于像素电极层， 哑图案 区包括若干哑像素。
本实施例在现有显示面板制造方法的设置图像显示区和空白区之后， 增加 步骤一一在图像显示区和空白区之间， 沿图像显示区的外围边缘设置无显示功 能的哑图案区， 由该哑图案区来承受 Loading Effect的影响， 保证图像显示区免 受 Loading Effect的影响， 其所显示的图案均正常、 均一； 而哑图案区由于没有 显示功能， 仅用于緩沖湿制程的 Loading Effect效应， 即使其受到 Loading Effect 的影响， 也不会对显示面板的图像显示产生不利之处。
本发明实施例一的显示面板可以应用在液晶显示器（LCD )、 等离子显示器 ( PDP )、 有机发光二极管显示器 （0LED )等平板显示装置上。 由此， 本发明 实施例三提供一种平板显示装置， 包括本发明实施例一所公开的显示面板。 本 实施例的有益效果基于本发明实施例一， 此处不再赘述。
以上所揭露的仅为本发明较佳实施例而已， 当然不能以此来限定本发明之 权利范围， 因此依本发明权利要求所作的等同变化， 仍属本发明所涵盖的范围。

Claims

权 利 要 求
1、 一种显示面板， 包括图像显示区和围绕在所述图像显示区域外围的空白 区， 其中， 在所述图像显示区和空白区之间， 沿所述图像显示区的外围边缘设 有无显示功能的哑图案区。
2、 根据权利要求 1所述的显示面板， 其中， 在所述显示面板的湿制程中， 所述 图案区与所述图像显示区相接处的溶液浓度和所述图像显示区的溶液浓 度大致相同， 所述哑图案区的溶液浓度自所述相接处向所述空白区递减。
3、 根据权利要求 2所述的显示面板， 其中， 所述图像显示区域的溶液浓度 维持不变。
4、 根据权利要求 3所述的显示面板， 其中， 所述图像显示区、 空白区和哑 图案区设于所述显示面板中使用湿制程进行显影或蚀刻的图层， 所述图层包括 像素电极层、 第一金属层或第二金属层。
5、 根据权利要求 4所述的显示面板， 其中， 所述图像显示区、 空白区和哑 图案区设于所述像素电极层， 所述哑图案区包括若干哑像素。
6、 一种显示面板的制造方法， 包括步骤：
设置图像显示区和围绕在所述图像显示区域外围的空白区；
在所述图像显示区和空白区之间， 沿所述图像显示区的外围边缘设置无显 示功能的哑图案区。
7、 根据权利要求 6所述的制造方法， 其中， 设置所述哑图案区满足以下条 件：
在所述显示面板的湿制程中， 所述哑图案区与所述图像显示区相接处的溶 液浓度和所述图像显示区的溶液浓度大致相同， 而所述哑图案区上的溶液浓度 自所述相接处向所述空白区递减。
8、 根据权利要求 7所述的制造方法， 其中， 所述图像显示区、 空白区和哑 图案区设于所述显示面板中使用湿制程进行显影或蚀刻的图层， 所述图层包括 像素电极层、 第一金属层或第二金属层。
9、 根据权利要求 8所述的制造方法， 其中， 所述图像显示区、 空白区和哑 图案区设于所述像素电极层， 所述哑图案区包括若干哑像素。
10、 一种平板显示装置， 其中， 包括显示面板， 所述显示面板包括图像显 示区和围绕在所述图像显示区域外围的空白区， 在所述图像显示区和空白区之 间， 沿所述图像显示区的外围边缘设有无显示功能的哑图案区。
11、 根据权利要求 10所述的平板显示装置， 其中， 在所述显示面板的湿制 程中， 所述哑图案区与所述图像显示区相接处的溶液浓度和所述图像显示区的 溶液浓度大致相同， 所述哑图案区的溶液浓度自所述相接处向所述空白区递减。
12、 根据权利要求 11所述的平板显示装置， 其中， 所述图像显示区域的溶 液浓度维持不变。
13、 根据权利要求 12所述的平板显示装置， 其中， 所述图像显示区、 空白 区和哑图案区设于所述显示面板中使用湿制程进行显影或蚀刻的图层， 所述图 层包括像素电极层、 第一金属层或第二金属层。
14、 根据权利要求 13所述的平板显示装置， 其中， 所述图像显示区、 空白 区和哑图案区设于所述像素电极层， 所述哑图案区包括若干哑像素。
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