WO2014021411A1 - Guide d'onde optique et miroir de guide d'onde optique - Google Patents

Guide d'onde optique et miroir de guide d'onde optique Download PDF

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Publication number
WO2014021411A1
WO2014021411A1 PCT/JP2013/070837 JP2013070837W WO2014021411A1 WO 2014021411 A1 WO2014021411 A1 WO 2014021411A1 JP 2013070837 W JP2013070837 W JP 2013070837W WO 2014021411 A1 WO2014021411 A1 WO 2014021411A1
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WO
WIPO (PCT)
Prior art keywords
film
optical waveguide
mirror
polymer
core
Prior art date
Application number
PCT/JP2013/070837
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English (en)
Japanese (ja)
Inventor
健 天野
茂也 浮田
小森　和弘
Original Assignee
独立行政法人産業技術総合研究所
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Publication of WO2014021411A1 publication Critical patent/WO2014021411A1/fr

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/12004—Combinations of two or more optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
    • G02B5/085—Multilayer mirrors, i.e. having two or more reflecting layers at least one of the reflecting layers comprising metal
    • G02B5/0875—Multilayer mirrors, i.e. having two or more reflecting layers at least one of the reflecting layers comprising metal the reflecting layers comprising two or more metallic layers

Definitions

  • the present invention relates to an optical waveguide having a reflective film structure having a high reflectance and a mirror for optical waveguide.
  • optical communication technology has been commercialized from ultra-long distances such as between continents to relatively short distances between base stations and homes.
  • low power consumption and high performance of devices can be expected by realizing optical communication systems between devices and within devices.
  • An optical waveguide using a polymer material can be formed in a large area.
  • an optical path conversion mirror is known in which an inclined surface having an angle of 45 degrees with the substrate is formed on the core of the optical waveguide, and the light is totally reflected using the refractive index difference between the core of the optical waveguide and air.
  • Patent Document 1 describes that an optical waveguide provided with an optical path conversion mirror is produced as follows.
  • An optical waveguide is created by the forming process (see Patent Document 1).
  • Patent Document 1 it is assumed that a dielectric multilayer film or a metal such as gold, silver, copper, or aluminum can be used as the type of the reflective film, and gold is preferable in terms of reflectance and stability (see Patent Document 1). It is said.
  • a reflective film structure is manufactured by depositing 0.05 ⁇ m of titanium as an underlayer and then depositing 0.25 ⁇ m of gold as a reflective film.
  • Patent Document 2 discloses a light-transmitting substrate, a metal or metalloid oxide adhesion promoting layer deposited on the surface of the substrate, a reflective layer made of a highly reflective metal layer covering the adhesion promoting layer, An optical structure is described that includes a protective layer comprising a parylene polymer film bonded to the reflective layer.
  • the metal or metalloid is selected from the group consisting of aluminum, hafnium, zirconium, tantalum, titanium, niobium, silicon, tungsten, vanadium, molybdenum, chromium, tin, antimony, indium, zinc, bismuth, cadmium and nickel, Of these, aluminum is preferred.
  • the highly reflective metal is selected from the group consisting of silver, copper, gold, palladium, iridium, rhodium, and combinations thereof, of which silver is described as being preferred.
  • Gold is used for the reflection film of the optical path conversion mirror provided in the polymer optical waveguide.
  • Gold (Au) is a stable substance and has a high reflectance of 98.2% in the near-infrared region (1000 nm).
  • Gold has an electric resistivity of 2.21 ⁇ 10 ⁇ 8 [ ⁇ m] and a heat conduction characteristic of 320 [W ⁇ m ⁇ 1 ⁇ K ⁇ 1 ], which are good values.
  • a further high-performance micromirror for example, a mirror part size of 250 ⁇ m or less
  • a material exceeding these characteristics is required.
  • the present inventor adopted copper (Cu) as a reflection film of the optical path conversion mirror provided in the polymer optical waveguide, and produced a micro mirror of Cu material of 100 ⁇ m or less.
  • Cu is inferior in reflectance to Ag and Au at wavelengths of 400 nm and 700 nm, but in the near-infrared region (1000 nm), it has a reflectance of 98.5%, which exceeds that of Au, and has an electrical resistivity of 1. 68 ⁇ 10 ⁇ 8 [ ⁇ m], thermal conductivity 398 [W ⁇ m ⁇ 1 ⁇ K ⁇ 1 ] and characteristics exceeding Au, respectively.
  • Au is expensive and disadvantageous in terms of mass production, and Cu is advantageous in that the price can be suppressed.
  • the present invention is intended to solve these problems, and an object of the present invention is to provide a polymer optical waveguide provided with a high-reflectance optical path conversion mirror. It is another object of the present invention to provide a polymer optical waveguide optical path conversion mirror having high reflectivity and excellent durability.
  • the present invention has the following features in order to achieve the above object.
  • An optical waveguide according to the present invention is an optical waveguide in which a core and a clad are made of an organic polymer, and includes at least a reflecting portion in the core, and the reflecting portion includes a tantalum film formed on the core, and the tantalum film. It is characterized by a laminated structure made of a copper film having a thickness of 200 nm to 400 nm.
  • the mirror for an optical waveguide of the present invention is characterized in that a copper film having a thickness of 200 nm or more and 400 nm or less is provided on a surface of an inclined surface formed on an optical waveguide core made of an organic polymer via a tantalum film.
  • a reflective film structure having a high reflectivity can be obtained as a reflective film structure in an optical waveguide made of an organic polymer.
  • a higher reflectance than that of a conventional reflecting film structure using an Au film is obtained.
  • a high-reflectance mirror can be provided at wavelengths used in the optical communication field, loss in optical communication between devices and in devices can be reduced.
  • a high absolute reflectance (95% or more at a wavelength of 1000 nm to 1900 nm) can be realized by setting a Cu film thickness in the range of 200 to 400 nm with a Ta film interposed.
  • a high reflectivity of 95 to 96.2% can be obtained at a wavelength of 1000 nm to 1550 nm.
  • the lower limit of the film thickness is desirably 200 nm.
  • the reflectance tends to decrease.
  • the reflective film structure uses Cu without using an expensive metal such as Au or Ag for increasing the area of the optical waveguide, it has a high practical value in industry. Moreover, since Cu used for the wiring can be used as the reflective film, the wiring and the reflective film can be manufactured at the same time, and the manufacturing process can be simplified.
  • the figure which shows the absolute reflectance of the reflecting film structure of this invention and a comparative example The figure which shows the measuring system for performing optical evaluation of this invention and a comparative example.
  • the present invention relates to a mirror having a reflective film structure that realizes a high reflectance, and an optical waveguide in which the reflective film structure is provided as a part of the optical waveguide as an optical path conversion mirror.
  • the optical waveguide of the present invention is an optical waveguide made of an organic polymer and is also called a polymer optical waveguide.
  • the optical waveguide is formed by laminating the first clad layer, the core layer, and the second clad layer in this order on the substrate, and is formed in a desired pattern shape.
  • the material for the polymer optical waveguide is not particularly limited as long as it is usually used. High purity polyimide resins, polyamide resins / polyether resins, epoxy resins, and the like are used.
  • the material of the substrate is a glass epoxy substrate or the like.
  • the clad layer is made of a polymer material, and a photosensitive polymer material that can be patterned by photolithography is preferable.
  • the core layer is made of a polymer material, and a photosensitive polymer material is preferably used.
  • a slope that intersects the core at an arbitrary angle is formed in the core, and a reflective film structure is formed on the surface of the slope to form a reflecting portion.
  • the reflective film structure has a multilayer structure of a tantalum film and a copper film formed on the tantalum film.
  • the copper film can obtain a high reflectance at about 100 to 500 nm, but in order to obtain a high reflectance superior to that of a conventional Au film, a thickness of 200 to 400 nm is preferable. If it is thinner than 200 nm, it cannot be used because it has an increased electrical resistance when used as an electrode, and is preferably 200 nm or more. Moreover, when it exceeds 400 nm, a reflectance will worsen.
  • the film thickness of the tantalum film is preferably 60 to 100 nm. In particular, 70 nm is preferable. When the thickness is reduced, the adhesion of the copper micromirror is deteriorated, and it is easy to peel off. Moreover, it is not necessary to make it thicker than necessary.
  • ⁇ To form a slope on the core it is processed by machining such as dicer, sputter etching using argon gas or oxygen gas, or ion etching.
  • the inclined surface is formed so as to have an inclination of about 45 degrees (43 to 47 degrees) with respect to the substrate, for example.
  • the tantalum film is formed on the inclined surface of the core by sputtering, vapor deposition, printing, or the like.
  • the copper film is formed on the tantalum film by sputtering, vapor deposition, printing, or the like.
  • a polymer material may be provided as a protective film on the copper film.
  • FIG. 1 is a diagram showing the results of measuring the absolute reflectance at the wavelength of light (500 nm to 1900 nm) for the reflective film structures of the present embodiment and the comparative example.
  • a polymer optical waveguide was prepared by laminating a polymer waveguide material of an epoxy resin (for example, phenoxy resin) on a substrate (FR-4: a substrate obtained by impregnating glass fiber with an epoxy resin and cured).
  • a film was formed on the core layer of the waveguide by DC sputtering using a Ta metal material target.
  • the deposition conditions for the Ta metal material were a pressure of 0.5 Pa and a plasma output of 200 W in an Ar atmosphere.
  • the thickness of the Ta film was about 70 nm.
  • a Cu film was formed on the Ta film by the same sputtering apparatus. Film formation was performed under a pressure of 0.5 Pa and a plasma output of 200 W in an Ar atmosphere.
  • the Ta material was used as a high adhesion material between Cu and polymer.
  • the film thickness of the Ta film was fixed at 70 nm, and Cu films having different film thicknesses were formed to produce a plurality of samples, and the reflectance was examined.
  • an absolute reflectance at the time of 5 ° incidence was measured using an absolute reflectance measuring device.
  • Table 1 shows the absolute reflectance values at wavelengths of 1000 nm, 1300 nm, and 1550 nm when the Cu film thickness is 200 nm, 300 nm, and 400 nm.
  • FIG. 1 shows the measurement results of absolute reflectance at wavelengths from 600 nm to 1900 nm when the Cu film thickness is 400 nm and 500 nm.
  • the solid line indicates the case of Cu film thickness 400 nm (Ta film 70 nm as an intervening film), and the dotted line indicates the case of Cu film thickness 500 nm (Ta film 70 nm as an interposition film).
  • the Cu film thickness is 400 nm
  • the highest absolute reflectance 95 to 96% at wavelengths of 1000 nm to 1900 nm
  • the Cu film thickness is 500 nm, a decrease of about 2% is observed as compared with the case of 400 nm.
  • FIG. 1 also shows the absolute reflectance when no intervening film is provided.
  • the long dotted line is for a Cu film thickness of 400 nm (no intervening film), and the two-dot chain line is a Cu film thickness of 500 nm (no intervening film).
  • the absolute reflectance is about 92 to 94% at a wavelength of 1000 nm to 1900 nm. From FIG. 1, it can be seen that the absolute reflectance is improved by the presence of the Ta film as an intervening film. Further, the Cu film having no intervening film is peeled off with the passage of time. For example, it peels off because it receives heat, impact, etc. in a process for mounting an electronic component such as a CPU after manufacturing the mirror.
  • a polymer optical waveguide was prepared in the same manner as in the first embodiment.
  • a Ti metal material was deposited on the core layer of the waveguide by sputtering in the same manner as in the first embodiment.
  • the thickness of the Ti film was about 70 nm.
  • An Au film was formed on the Ti film by the same sputtering apparatus.
  • the Ti material was used as a highly adhesive material of Au and polymer, and the thickness was set to 70 nm as in the case of the intervening film (Ta film) of the embodiment.
  • An Au film having a thickness of 500 nm was prepared and the reflectance was examined.
  • the reflectivity measurement was performed by measuring the absolute reflectivity at 5 ° incidence using an absolute reflectometer. In FIG. 1, the measurement result of the absolute reflectance in the wavelength of 600 nm to 1900 nm in the case of the comparative example is shown by a thin dotted line.
  • the Cu film thickness of the present embodiment is 400 nm (there is a Ta film as an intervening film), compared to the absolute reflectance of about 93 to 94%. In this case, the absolute reflectance was 95 to 96%, which was about 2% higher.
  • the Cu film thickness is 500 nm, it is almost the same as that of the comparative example (Au), and the reflectance is lower than that of the comparative example (Au) at a wavelength of 1100 nm or less.
  • the Cu micromirror having the reflective film structure of the present embodiment and the Au micromirror of the comparative example were produced and evaluated as follows.
  • a clad forming polymer material On the substrate (FR-4), about 50 ⁇ m of a clad forming polymer material was applied, and then 50 ⁇ m of a core forming photosensitive polymer having a refractive index higher than that of the clad forming polymer material was applied.
  • a phenoxy resin as a binder polymer
  • B an alicyclic diepoxycarboxylate as a light or heat polymerizable compound
  • C triphenylsulfonium as a light or heat polymerization initiator. Hexafluoroantimonate salt, sensitizer, and propylene glycol monomethyl ether acetate as organic solvent.
  • the polymer material for forming the core includes, for example, (A) a phenoxy resin as a binder polymer, and (B) 9,9-bis [4- (2-acryloyloxyethoxy) phenyl] fluorene as a light or heat polymerizable compound. And bisphenol A type epoxy acrylate, (C) bis (2,4,6-trimethylbenzoyl) phenylphosphine oxide, and 1- [4- (2-hydroxyethoxy) phenyl]-as photo or thermal polymerization initiator 2-Hydroxy-2-methyl-1-propan-1-one, propylene glycol monomethyl ether acetate as the organic solvent.
  • an optical waveguide portion having a width of 50 ⁇ m was formed using a photomask and an exposure machine. Thereafter, about 50 ⁇ m of a clad forming polymer was applied to form a clad portion. Thereafter, a 45 ° oblique structure was produced with a dicer. First, Ta metal (film thickness: 70 nm) and Cu metal (film thickness: 400 nm) were formed on the oblique structure using a sputtering apparatus, and a 45 ° metal mirror was formed in the polymer waveguide.
  • the Au micromirror of the comparative example was produced in the same manner. First, Ti metal (film thickness: 70 nm) and then Au metal (film thickness: 500 nm) were formed on the oblique structure using a sputtering apparatus, and a 45 ° metal mirror was formed in the polymer waveguide. .
  • FIG. 2 shows a measurement system.
  • the optical waveguide comprises a polymer optical waveguide cladding part 3, a polymer optical waveguide core part 4 and a polymer optical waveguide cladding part 3 formed on the substrate 2, and a 45 ° micro mirror part 1 is provided at the end of the optical waveguide. ing.
  • the dimension of the mirror part (inclined surface in FIG. 2) is about 211 ⁇ m.
  • the input light was input to a 2 cm polymer waveguide using an optical fiber with a wavelength of 1300 nm and an intensity of -1.0 dB.
  • the output side received light through an optical fiber, and the light intensity was measured using a power meter.
  • This measurement system has a polymer waveguide loss of 0.8 dB (2 cn) and a coupling loss between the polymer and the optical fiber of 0.6 dB.
  • the output light intensity was measured, it was -3.9 dB for the 45 ° Au micromirror and -3.8 dB for the 45 ° Cu micromirror. From the above results, the loss at the mirror portion is 1.5 dB for the Au micromirror of the comparative example, 1.4 dB for the Cu micromirror of this embodiment, and 0.1 dB for the Cu micromirror. Loss was reduced.
  • the mirror of the embodiment shown in FIG. 2 forms an inclined portion not only on the core layer of the polymer waveguide but also on the upper and lower cladding layers and forms a reflecting film on the inclined portion.
  • An inclined portion may be formed only on the core portion of the polymer waveguide, and a reflective film may be formed on the inclined portion. That is, the mirror of the present invention is provided with a reflection part at least in the core.
  • the reflective film is formed on the inclined part that covers not only the core layer but also part or all of the cladding layer, the light spreads from the polymer waveguide to the mirror, so that the light hits the mirror evenly. High performance.
  • the optical waveguide and mirror of the present invention can realize a reflective film structure with high reflectivity, it is useful in the field of optical communication, particularly in the development of optical communication between devices and devices, and between and between printed circuit boards and printed circuit boards. is there.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Optical Integrated Circuits (AREA)

Abstract

La présente invention concerne un miroir de conversion de trajet lumineux qui est formé sur un guide d'onde optique comprenant un polymère organique, une structure de film réfléchissant réalisée dans celui-ci présentant une réflectivité élevée, une excellente durabilité, et étant économique et adaptée à une production de masse. Dans le guide d'onde optique dans lequel un cœur et une gaine sont composés d'un polymère organique, un miroir de conversion de trajet lumineux est formé par la formation d'une surface inclinée au moins à l'intérieur du cœur, et par la formation sur la surface inclinée d'une structure stratifiée comprenant un film en tantale et un film en cuivre qui est formé sur le film en tantale et possède une épaisseur de 200 à 400 nm inclus. L'utilisation d'un film en cuivre dans lequel est intercalé un film en tantale améliore la réflectivité absolue.
PCT/JP2013/070837 2012-08-02 2013-08-01 Guide d'onde optique et miroir de guide d'onde optique WO2014021411A1 (fr)

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JP2012-171643 2012-08-02

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20160306111A1 (en) * 2015-04-20 2016-10-20 Skorpios Technologies, Inc. Back side via vertical output couplers
US9977188B2 (en) 2011-08-30 2018-05-22 Skorpios Technologies, Inc. Integrated photonics mode expander
US10088629B2 (en) 2014-03-07 2018-10-02 Skorpios Technologies, Inc. Wide shoulder, high order mode filter for thick-silicon waveguides
US10345521B2 (en) 2014-05-27 2019-07-09 Skorpios Technologies, Inc. Method of modifying mode size of an optical beam, using a waveguide mode expander having non-crystalline silicon features
US10649148B2 (en) 2017-10-25 2020-05-12 Skorpios Technologies, Inc. Multistage spot size converter in silicon photonics
US11360263B2 (en) 2019-01-31 2022-06-14 Skorpios Technologies. Inc. Self-aligned spot size converter

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02230505A (ja) * 1989-03-03 1990-09-12 Nec Corp 薄膜磁気ヘッドおよびその製造方法
JPH04253001A (ja) * 1991-01-30 1992-09-08 Seikosha Co Ltd 赤外線反射ミラー
JP2003309170A (ja) * 2002-02-14 2003-10-31 Nec Electronics Corp 半導体装置及びその製造方法
JP2005164762A (ja) * 2003-11-28 2005-06-23 Sharp Corp 光接続構造およびその製造方法
JP2005215529A (ja) * 2004-01-30 2005-08-11 Ngk Spark Plug Co Ltd 光導波路構造付きデバイス及びその製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02230505A (ja) * 1989-03-03 1990-09-12 Nec Corp 薄膜磁気ヘッドおよびその製造方法
JPH04253001A (ja) * 1991-01-30 1992-09-08 Seikosha Co Ltd 赤外線反射ミラー
JP2003309170A (ja) * 2002-02-14 2003-10-31 Nec Electronics Corp 半導体装置及びその製造方法
JP2005164762A (ja) * 2003-11-28 2005-06-23 Sharp Corp 光接続構造およびその製造方法
JP2005215529A (ja) * 2004-01-30 2005-08-11 Ngk Spark Plug Co Ltd 光導波路構造付きデバイス及びその製造方法

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9977188B2 (en) 2011-08-30 2018-05-22 Skorpios Technologies, Inc. Integrated photonics mode expander
US10895686B2 (en) 2011-08-30 2021-01-19 Skorpios Technologies, Inc. Integrated photonics mode expander
US10088629B2 (en) 2014-03-07 2018-10-02 Skorpios Technologies, Inc. Wide shoulder, high order mode filter for thick-silicon waveguides
US10295746B2 (en) 2014-03-07 2019-05-21 Skorpios Technologies, Inc. Wide shoulder, high order mode filter for thick-silicon waveguides
US10345521B2 (en) 2014-05-27 2019-07-09 Skorpios Technologies, Inc. Method of modifying mode size of an optical beam, using a waveguide mode expander having non-crystalline silicon features
US11409039B2 (en) 2014-05-27 2022-08-09 Skorpios Technologies, Inc. Waveguide mode expander having non-crystalline silicon features
US20160306111A1 (en) * 2015-04-20 2016-10-20 Skorpios Technologies, Inc. Back side via vertical output couplers
US10132996B2 (en) * 2015-04-20 2018-11-20 Skorpios Technologies, Inc. Back side via vertical output couplers
US10649148B2 (en) 2017-10-25 2020-05-12 Skorpios Technologies, Inc. Multistage spot size converter in silicon photonics
US11079549B2 (en) 2017-10-25 2021-08-03 Skorpios Technologies, Inc. Multistage spot size converter in silicon photonics
US11360263B2 (en) 2019-01-31 2022-06-14 Skorpios Technologies. Inc. Self-aligned spot size converter

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