WO2014015608A1 - 彩色滤光片、液晶显示面板及显示装置 - Google Patents

彩色滤光片、液晶显示面板及显示装置 Download PDF

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Publication number
WO2014015608A1
WO2014015608A1 PCT/CN2012/085765 CN2012085765W WO2014015608A1 WO 2014015608 A1 WO2014015608 A1 WO 2014015608A1 CN 2012085765 W CN2012085765 W CN 2012085765W WO 2014015608 A1 WO2014015608 A1 WO 2014015608A1
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Prior art keywords
substrate
color filter
layer
liquid crystal
thickness
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French (fr)
Inventor
舒适
崔承镇
惠官宝
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BOE Technology Group Co Ltd
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix

Definitions

  • Embodiments of the present invention belong to the field of liquid crystal display, and in particular, to a color filter, a liquid crystal display panel, and a display device. Background technique
  • the liquid crystal display panel is formed by an array substrate and a color filter pair box.
  • Each layer of the color filter is formed by spin-coating a polymer solution on a glass substrate and then patterning. 1 to 4, the color filter is prepared in the following steps: Step S11, providing a substrate 1 and spin-coating a black matrix photoresist material 21 on the substrate; and step S12, using a mask having a black matrix pattern After the template exposes and develops the photoresist material 21, a pattern of the black matrix 2 is formed; in step S13, a layer of color photoresist 31 is spin-coated on the substrate 1 on which step S12 is completed, and a mask pair patterned with a pattern is used. After the color resist 31 is exposed and developed, a pattern of the color filter layer 3 is formed.
  • the technical problem to be solved by the present invention is to provide a color filter, a liquid crystal display panel and a display device to improve the uniformity of the film thickness of the color filter layer.
  • the present invention provides the following technical solutions:
  • a color filter comprising:
  • a compensation layer disposed on the substrate, the thickness of the compensation layer gradually decreasing from a center of the substrate to an edge of the substrate;
  • a color filter layer disposed in a pixel region defined by the black matrix.
  • the thickness of the compensation layer at the center of the substrate and the thickness at the edge of the substrate The difference is from 0.1 ⁇ m to 0.8 ⁇ m.
  • a liquid crystal display panel comprising the above-described color filter.
  • a display device comprising the above liquid crystal display panel.
  • the present invention can compensate for the uneven thickness of the color filter layer caused by the spin coating process by providing a compensation layer on the substrate, thereby avoiding uneven color expression of the final product and further improving the display effect.
  • 5 to 7 are cross-sectional views showing color filters in different steps of the fabrication method of the embodiment of the present invention. detailed description
  • a color filter according to an embodiment of the present invention includes:
  • the compensation layer 4 disposed on the substrate 1 has a thickness of the compensation layer 4 gradually decreasing from the center of the substrate to the edge of the substrate;
  • a color filter layer 3 is disposed in the pixel area defined by the black matrix 2.
  • the color filter layer 3 may further include a red filter layer, a green filter layer, and a blue filter layer.
  • the compensation layer can be transparent, for example, made of a plastic or inorganic polymeric material.
  • the thickness of the compensation layer can be designed depending on the size of the substrate. In one embodiment, the difference between the thickness of the compensation layer at the center of the substrate and the thickness at the edge of the substrate may range from 0.1 ⁇ m to 0.8 ⁇ m.
  • the difference between the thickness of the compensation layer at the center of the substrate and the thickness at the edge of the substrate can be designed to be 0.1 ⁇ m; for a substrate having an area of 1100 mm X 1300 mm, the thickness of the compensation layer at the center of the substrate and The difference in thickness at the edge of the substrate can be designed to be 0.2 ⁇ m.
  • the color filter may further include a flat layer formed on the color filter layer 3 and the black matrix 2, and a spacer formed on the flat layer.
  • the above color filter can be used in a liquid crystal panel in which the pixel electrode and the common electrode are both disposed on the array substrate, such as an ADS (ADvanced Super Dimension Switch) mode liquid crystal panel.
  • ADS ADvanced Super Dimension Switch
  • a transparent electrode layer is further formed between the spacer and the flat layer.
  • the method for fabricating the color filter of the embodiment of the present invention includes: Step S21, providing a substrate, forming a compensation layer on the substrate (FIG. 5);
  • the compensation layer is transparent, for example, it can be made of a plastic or inorganic polymer material.
  • the pre-made compensation layer may be attached to the substrate, or the compensation layer may be formed by gray scale exposure.
  • Step S22 spin coating a layer of a black matrix photoresist material on the substrate of step S21, and exposing and developing the photoresist material with a mask having a black matrix pattern to form a black matrix pattern (FIG. 6) ) ;
  • Step S23 spin coating a layer of color photoresist on the substrate of step S22, and exposing and developing the color photoresist with a mask patterned with a color filter layer pattern to form a pattern of the color filter layer;
  • the color filter layer is formed by sequentially forming a red filter layer, a green filter layer, and a blue filter layer by three photolithography processes.
  • Step S24 coating the transparent resin material on the substrate of step S23 to form a flat layer (or a flat protective layer);
  • Step S25 forming a spacer on the flat layer.
  • Step S24 is an optional step, that is, when no flat layer is designed in the color filter, step Step S24 can be omitted.
  • a step of forming a transparent conductive layer may be further included between step S24 and step S25, in which case the spacer is formed. Above the transparent conductive layer.
  • the embodiment of the present invention further provides a liquid crystal display panel, the liquid crystal display panel includes an array substrate, a color filter provided by the above embodiments, and a liquid crystal filled between the array substrate and the color filter.
  • the liquid crystal display panel includes an array substrate, a color filter provided by the above embodiments, and a liquid crystal filled between the array substrate and the color filter.
  • Floor a liquid crystal display panel
  • the embodiment of the invention further provides a display device, wherein the display device comprises the above liquid crystal display panel, and the display device can be a device having a display function such as a television, a display, a digital photo frame or the like.
  • the film thickness unevenness of the color filter layer caused by the spin coating process can be compensated, thereby avoiding uneven color expression of the final product, thereby improving the display effect.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)

Abstract

一种彩色滤光片、液晶显示面板及显示装置，属于液晶显示领域。所述彩色滤光片包括：基板（1）；形成在所述基板（1）上的补偿层（4），所述补偿层（4）的厚度由基板（1）中心至基板（1）边缘逐渐减小；形成在所述补偿层（4）上的黑矩阵（2）；形成在所述黑矩阵（2）限定的像素区域内的彩色滤光层（3）。该彩色滤光片、液晶显示面板及显示装置能够提高彩色滤光层（3）膜厚的均匀度。

Description

彩色滤光片、 液晶显示面板及显示装置 技术领域
本发明的实施例属于液晶显示领域， 特别涉及一种彩色滤光片、 液晶显 示面板及显示装置。 背景技术
液晶显示面板是由阵列基板和彩色滤光片对盒形成。 彩色滤光片各层均 是由高分子溶液在玻璃基板上旋涂成膜，而后进行图案化制成。参照图 1 ~ 4, 彩色滤光片的制作流程为： 步骤 S11 , 提供一基板 1 , 在基板上旋涂一层黑 矩阵用光刻胶材料 21 ; 步骤 S12, 釆用具有黑矩阵图形的掩模板对光刻胶材 料 21进行曝光和显影后， 形成黑矩阵 2的图形； 步骤 S13 , 在完成步骤 S12 的基板 1上旋涂一层彩色光刻胶 31 ,釆用刻画有图形的掩模板对彩色光刻胶 31进行曝光和显影后， 形成彩色滤光层 3的图形。
由于玻璃基板旋转时， 基板中心的线速度小于基板边缘的线速度， 因此 各层图形普遍存在中间厚、 边缘薄的现象。 而彩色滤光层的厚度不均勾， 会 造成最终产品的颜色表现不均匀， 影响显示效果。 发明内容
本发明所要解决的技术问题是提供一种彩色滤光片、 液晶显示面板及显 示装置， 以提高彩色滤光层膜厚的均匀度。
为解决上述技术问题， 本发明提供技术方案如下：
根据本发明第一方面， 提供一种彩色滤光片， 包括：
基板；
设置在所述基板上的补偿层， 所述补偿层的厚度由基板中心至基板边缘 逐渐减小；
设置在所述补偿层上的黑矩阵；
设置在所述黑矩阵限定的像素区域内的彩色滤光层。
在一个实施例中， 所述补偿层在基板中心的厚度与在基板边缘的厚度之 差为 0.1 μ m ~ 0.8 μ m。
根据本发明第二方面，提供一种液晶显示面板， 包括上述的彩色滤光片。 根据本发明第三方面， 提供一种显示装置， 包括上述的液晶显示面板。 与现有技术相比， 本发明通过在基板上设置补偿层， 能够补偿旋涂工艺 造成的彩色滤光层的膜厚不均匀， 从而避免最终产品颜色表现不均匀， 进而 能够提高显示效果。 附图说明
为了更清楚地说明本发明实施例的技术方案， 下面将对实施例的附图作 简单地介绍，显而易见地，下面描述中的附图仅仅涉及本发明的一些实施例， 而非对本发明的限制。
图 1 ~ 4 示出了在现有技术的制作方法的不同步骤中彩色滤光片的截面 图； 和
图 5 ~ 7 示出了在本发明实施例的制作方法的不同步骤中彩色滤光片的 截面图。 具体实施方式
为使本发明实施例的目的、 技术方案和优点更加清楚， 下面将结合本发 明实施例的附图，对本发明实施例的技术方案进行清楚、 完整地描述。显然， 所描述的实施例是本发明的一部分实施例， 而不是全部的实施例。 基于所描 述的本发明的实施例， 本领域普通技术人员在无需创造性劳动的前提下所获 得的所有其他实施例， 都属于本发明保护的范围。
参照图 7, 本发明实施例的彩色滤光片， 包括：
基板 1 ;
设置在基板 1上的补偿层 4, 补偿层 4的厚度由基板中心至基板边缘逐 渐减小；
设置在补偿层 4上的黑矩阵 2;
设置在黑矩阵 2限定的像素区域内的彩色滤光层 3。
在一个实施例中， 所述彩色滤光层 3可进一步包括红色滤光层、 绿色滤 光层和蓝色滤光层。 在一个实施例中， 补偿层可以是透明的， 例如可以釆用塑料或无机高分 子材料来制作。 补偿层的厚度可随基板尺寸不同而设计。 在一个实施例中， 补偿层在基板中心的厚度与在基板边缘的厚度之差的范围可以为 0.1 μ πι ~ 0.8 μ πι。 例如， 对于面积为 70mm X 470mm的基板， 补偿层在基板中心的厚 度与在基板边缘的厚度之差可以设计为 0.1 μ πι; 对于面积为 1100mm X 1300mm的基板， 补偿层在基板中心的厚度与在基板边缘的厚度之差可以设 计为 0.2 μ πι。
在一个实施例中， 所述彩色滤光片还可包括形成在彩色滤光层 3和黑矩 阵 2上的平坦层， 以及形成在平坦层上的隔垫物。
上述彩色滤光片可以用于像素电极和公共电极均设置在阵列基板上的液 晶面板中， 例如 ADS ( ADvanced Super Dimension Switch, 高级超维场转换 技术）模式的液晶面板。 对于用于扭曲向列 （TN )模式液晶面板的彩色滤光 片， 则在隔垫物和平坦层之间还形成有透明电极层。
参照图 5 ~ 7, 上述本发明实施例的彩色滤光片的制作方法， 包括： 步骤 S21 , 提供一基板， 在基板上形成补偿层（图 5 ) ；
如前所述， 该补偿层是透明的， 例如可以釆用塑料或无机高分子材料来 制作。 可以将预先制作好的补偿层贴覆到基板上， 也可以釆用灰阶曝光的方 式来形成所述补偿层。
步骤 S22, 在完成步骤 S21的基板上旋涂一层黑矩阵用光刻胶材料， 釆 用具有黑矩阵图形的掩模板对光刻胶材料进行曝光和显影后， 形成黑矩阵的 图形 （图 6 ) ；
步骤 S23 , 在完成步骤 S22的基板上旋涂一层彩色光刻胶， 釆用刻画有 彩色滤光层图形的掩模板对彩色光刻胶进行曝光和显影后， 形成彩色滤光层 的图形；
更具体地，形成彩色滤光层是通过 3次光刻工艺来依次形成红色滤光层、 绿色滤光层和蓝色滤光层。
步骤 S24, 在完成步骤 S23的基板上进行透明树脂材料料的涂布， 形成 平坦层（或平坦保护层） ；
步骤 S25 , 在平坦层上形成隔垫物。
其中， 步骤 S24为可选步骤， 即当彩色滤光片中没有设计平坦层时， 步 骤 S24可以省略。
另外， 如前所述， 对于 TN模式的液晶面板， 在进行彩色滤光片的制作 时， 在步骤 S24和步骤 S25之间还可以包括形成透明导电层的步骤， 此时， 隔垫物是形成在透明导电层之上。
本发明实施例还提供一种液晶显示面板， 所述液晶显示面板包括阵列基 板、 上述实施例提供的彩色滤光片， 以及， 填充在所述阵列基板和所述彩色 滤光片之间的液晶层。
本发明实施例还提供一种显示装置， 所述显示装置包括上述的液晶显示 面板， 所述显示装置可以为电视、显示器、数码相框等具有显示功能的装置。
综上所述， 本发明实施例通过在基板上设置补偿层， 能够补偿旋涂工艺 造成的彩色滤光层的膜厚不均匀， 从而避免最终产品颜色表现不均匀， 进而 能够提高显示效果。
以上所述仅是本发明的示范性实施方式， 而非用于限制本发明的保护范 围， 本发明的保护范围由所附的权利要求确定。

Claims

权利要求书
1. 一种彩色滤光片， 包括：
基板；
设置在所述基板上的补偿层， 所述补偿层的厚度由基板中心至基板边缘 逐渐减小；
设置在所述补偿层上的黑矩阵；
设置在所述黑矩阵限定的像素区域内的彩色滤光层。
2. 如权利要求 1所述的彩色滤光片，其中所述补偿层在基板中心的厚度 与在基板边缘的厚度之差为 0.1 μ πι ~ 0.8 μ πι。
3. 如权利要求 1或 2所述的彩色滤光片，其中所述补偿层在基板中心的 厚度与在基板边缘的厚度之差为 0.1 μ πι。
4. 如权利要求 1或 2所述的彩色滤光片，其中所述补偿层在基板中心的 厚度与在基板边缘的厚度之差为 0.2 μ πι。
5. 如权利要求 1-4中任一项所述的彩色滤光片， 还包括： 设置在所述彩 色滤光层和黑矩阵上的平坦层。
6. 如权利要求 5 所述的彩色滤光片，还包括：设置在所述平坦层上的隔 垫物。
7. 如权利要求 6所述的彩色滤光片， 还包括： 设置在所述平坦层和所述 隔垫物之间的透明电极层。
8. 一种液晶显示面板，包括权利要求 1至 7中任一项所述的彩色滤光片。
9. 一种显示装置， 包括权利要求 8所述的液晶显示面板。
PCT/CN2012/085765 2012-07-23 2012-12-03 彩色滤光片、液晶显示面板及显示装置 Ceased WO2014015608A1 (zh)

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CN104503134A (zh) * 2015-01-21 2015-04-08 合肥鑫晟光电科技有限公司 一种彩膜基板、液晶显示面板及显示装置
CN106802508B (zh) * 2015-11-26 2020-04-10 上海仪电显示材料有限公司 彩色滤光基板及其形成方法
CN107247359A (zh) 2017-07-20 2017-10-13 京东方科技集团股份有限公司 一种显示基板、显示面板及显示装置

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