WO2014013887A1 - Apparatus for polishing plate-like body and method for polishing plate-like body - Google Patents

Apparatus for polishing plate-like body and method for polishing plate-like body Download PDF

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Publication number
WO2014013887A1
WO2014013887A1 PCT/JP2013/068433 JP2013068433W WO2014013887A1 WO 2014013887 A1 WO2014013887 A1 WO 2014013887A1 JP 2013068433 W JP2013068433 W JP 2013068433W WO 2014013887 A1 WO2014013887 A1 WO 2014013887A1
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WO
WIPO (PCT)
Prior art keywords
sheet
polishing
plate
film body
film
Prior art date
Application number
PCT/JP2013/068433
Other languages
French (fr)
Japanese (ja)
Inventor
木村　宏
充 古田
Original Assignee
旭硝子株式会社
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Publication of WO2014013887A1 publication Critical patent/WO2014013887A1/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B27/00—Other grinding machines or devices
    • B24B27/0023—Other grinding machines or devices grinding machines with a plurality of working posts
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/27—Work carriers
    • B24B37/30—Work carriers for single side lapping of plane surfaces
    • B24B37/32—Retaining rings
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/34—Accessories
    • B24B37/345—Feeding, loading or unloading work specially adapted to lapping

Definitions

  • the present invention relates to a plate-like body polishing apparatus and a plate-like body polishing method.
  • a plate-like body, particularly a glass plate for a flat panel display such as a liquid crystal display, is known as a production method using a forming method called a float method as an example of the production method.
  • This manufacturing method includes a step of manufacturing molten glass into a strip-shaped glass plate by the float method, a step of cutting the strip-shaped glass plate into a rectangular glass plate of a predetermined size, and a minute unevenness on the surface of the rectangular glass plate.
  • a step of polishing and removing the waviness with a polishing apparatus As a result, the rectangular glass plate is manufactured into a glass plate having a thickness of 0.05 to 2.0 mm suitable for a flat panel display.
  • This polishing apparatus includes a unit sheet including an adsorption sheet that adsorbs and holds a glass plate and a film body to which the adsorption sheet is attached. According to this polishing apparatus, a pressurized fluid is supplied between the film body and a carrier to which the film body is attached, and the glass plate adsorbed and held on the adsorption sheet is pressed against the polishing pad by the pressure of the pressurized fluid. Grind.
  • the film body disclosed in Patent Document 1 has a three-layer structure including an airtight holding layer, a strength holding layer, and a smooth layer, and the adsorbing sheet is constituted by a porous foamed polyurethane sheet having a self-adsorbing force. Has been.
  • Patent Document 1 has a problem in that during the polishing of the glass plate, the adsorbing sheet peels off from the film body due to polishing resistance, and the glass plate is damaged.
  • Patent Document 2 discloses a polishing apparatus that solves the above-mentioned problem of Patent Document 1 in Patent Document 2.
  • the polishing apparatus of Patent Document 2 is a unit formed by interposing an intermediate sheet between the film body and the suction sheet having a higher rigidity in the pulling direction than the rigidity in the pulling direction of the suction sheet to the film body and the suction sheet. It has a seat.
  • peeling may occur between the intermediate sheet and the film body having lower rigidity than the intermediate sheet by the expansion and contraction operation of the film body due to the polishing resistance.
  • the suction sheet since the suction sheet is not peeled off from the intermediate sheet, it is possible to prevent the suction sheet from peeling off and rising, and to prevent the glass plate from being damaged.
  • Patent Document 2 discloses that the adsorbing sheet is made of polyurethane foam and that the intermediate sheet is made of hard polycarbonate. Further, the film body has a double structure composed of an airtight holding layer made of rubber and a strength holding layer made of aramid fiber, and has a lower rigidity than the intermediate sheet.
  • the polishing apparatus of Patent Document 2 is an intermediate sheet due to the expansion and contraction operation in the sliding direction of the film body (the movement direction of the film body) due to polishing resistance and the tensile force in the vertical direction (pressing direction) that is strongly generated at the four corners.
  • a part of the film (for example, four corners) may peel off from the film body. That is, the rigidity of the film body due to the polishing resistance is smaller than the rigidity of the intermediate sheet.
  • a polishing material for example, fine particles mainly composed of cerium oxide
  • peeling portion a gap between the peeled intermediate sheet and the film body.
  • the liquid enters and exits, at that time, the abrasive staying in the peeling portion may aggregate and solidify in the peeling portion.
  • the granular material of the abrasive flows out from the peeling portion, the granular material is mixed into the polishing liquid, and the granular material comes into contact with the polished surface of the glass plate, thereby scratching the polished surface.
  • the polishing quality of the glass plate may deteriorate.
  • the peeling between the intermediate sheet and the film body gradually proceeds, eventually leading to complete peeling, and during the polishing, the glass plate In some cases, damage or other problems occurred.
  • the present invention has been made in view of the above problems, and can prevent the peeling of the intermediate sheet from the film body to improve the polishing quality of the plate-like body and prevent troubles such as breakage of the plate-like body. It is an object of the present invention to provide a plate-like body polishing apparatus and a plate-like body polishing method using the polishing apparatus.
  • the present invention comprises an adsorption sheet that adsorbs and holds a plate-like body, a film body to which the adsorption sheet is attached, a carrier to which the film body is attached, and a polishing pad, A plate-like body for supplying a pressurized fluid between the film body and the carrier and polishing the plate-like body adsorbed and held by the adsorption sheet against the polishing pad by the pressure of the pressurized fluid.
  • an intermediate sheet having a tension direction rigidity higher than a tension direction rigidity of the suction sheet is interposed between the film body and the suction sheet, and between the intermediate sheet and the film body.
  • the present invention provides a plate-like polishing apparatus in which an elastic sheet that deforms following the deformation in the sliding direction and the pressure direction of the film body is interposed.
  • the adsorption sheet since the intermediate sheet is bonded between the film body and the adsorption sheet, the adsorption sheet can be prevented from peeling off and rising, and the glass plate can be prevented from being damaged.
  • an elastic sheet that deforms following the deformation in the sliding direction and the deformation in the pressing direction of the film body is interposed between the intermediate sheet and the film body.
  • the film body having rigidity lower than that of the intermediate sheet is deformed by expanding and contracting in the sliding direction and the pressurizing direction due to polishing resistance generated during the polishing of the plate-shaped body, and the elastic sheet is deformed following the deformation of the film body.
  • the intermediate sheet having higher rigidity than the film body is difficult to be deformed because it is difficult to expand and contract due to polishing resistance, and therefore, there is no relative displacement between the intermediate sheet and the elastic sheet. Therefore, according to the present invention, the elastic sheet does not peel from the film body, and the elastic sheet does not peel from the intermediate sheet. Therefore, the entry and exit of the polishing liquid can be prevented. Thereby, the polishing quality of the plate-like body is improved.
  • the film body and the elastic sheet, the elastic sheet and the intermediate sheet, and the intermediate sheet and the adsorption sheet are both bonded with an adhesive and configured as a unit sheet.
  • the elastic sheet is interposed between the entire surface of the intermediate sheet on the film body side and the film body, a part of the intermediate sheet having a high rigidity attached to the film body via the elastic sheet. There is no other low rigidity part. That is, the rigidity on the surface of the intermediate sheet becomes uniform, so that uneven polishing does not occur in the plate-like body, and the polishing quality of the plate-like body is improved.
  • the film body includes an airtight holding layer made of vinyl, nylon, or urethane such as rubber, silicone, fluororesin, or vinyl chloride (PVC), an aramid fiber, and a stainless steel wire mesh.
  • PVC vinyl chloride
  • aramid fiber a stainless steel wire mesh
  • Steel wire mesh, carbon fiber, glass fiber, nylon fiber, metal sheet, or resin sheet, and the intermediate sheet is polycarbonate, acrylic, aluminum, iron, stainless steel, glass, or carbon fiber reinforced plastic (CFRP: Carbon Fiber Reinforced Plastics)
  • the elastic sheet is a soft resin (such as urethane) containing foam, or rubber.
  • the pressure of the pressurized fluid can be uniformly transmitted to the plate-like body that is adsorbed and held by the adsorption sheet.
  • the intermediate sheet by manufacturing the intermediate sheet with the above-mentioned material, it is possible to provide a highly rigid intermediate sheet that does not expand and contract in the pulling direction during polishing of the plate-like body. More preferably, the intermediate sheet is made of aluminum. In addition to these materials, ABS (Acrylonitrile Butadiene Styrene) and fiber reinforced plastics (FRP) can also be exemplified.
  • ABS Acrylonitrile Butadiene Styrene
  • FRP fiber reinforced plastics
  • the elastic sheet smoothly deforms following the deformation in the sliding direction and the deformation in the pressing direction of the film body.
  • the hardness of the elastic sheet is preferably 2 to 70 in Shore A hardness (according to ISO 7619) from the viewpoint of having a follow-up deformation function and rigidity that can withstand polishing resistance, and more preferably Shore A hardness 30 to 50 More preferred.
  • the thickness of the elastic sheet is preferably 1 mm or more, more preferably 2.0 to 3.0 mm, from the viewpoint of providing the following sheet deformation function of the elastic sheet and rigidity capable of withstanding polishing resistance. .
  • the present invention provides a plate-like polishing method for polishing a plate-like body using the plate-like polishing apparatus.
  • the plate-like body polishing apparatus and the plate-like body polishing method of the present invention it is possible to prevent the intermediate sheet from being peeled off from the film body, thereby improving the polishing quality of the plate-like body.
  • FIG. 1 is a plan view showing an overall configuration of a plate-like polishing apparatus according to an embodiment.
  • FIG. 2 is an assembled perspective view of the membrane frame and the unit sheet.
  • FIG. 3 is a side view of the first polishing stage and the second polishing stage.
  • FIG. 4 is a cross-sectional view of the main part showing the configuration of the unit sheet.
  • FIG. 5 is a side view showing the configuration of the unit sheet.
  • FIG. 6 is an enlarged cross-sectional view of a main part of the carrier to which the membrane frame is attached.
  • FIG. 7 is an explanatory view showing that the elastic sheet is deformed following the deformation of the film body.
  • FIG. 1 is a plan view showing an overall configuration of a plate-like body polishing apparatus 10 according to an embodiment.
  • the polishing apparatus 10 shown in FIG. 1 polishes one surface (polishing surface) of a large glass plate G (for example, one side of 1000 mm or more), thereby flatness required for the glass plate for a liquid crystal display.
  • This is a polishing apparatus for processing into a glass plate G having a thickness (for example, 0.05 to 2.0 mm) necessary for a glass plate for a liquid crystal display.
  • the polishing apparatus 10 includes a conveyor 12 that conveys the glass plate G before polishing, a stage 16 that adheres the glass plate G to the film frame 14, a first polishing stage 18, a second polishing stage 20, and a glass plate that has been polished.
  • a stage 22 for removing G from the membrane frame 14, a glass plate carry-out conveyor 24, a membrane frame cleaning stage 26, a membrane frame drying stage 28, and a membrane frame return conveyor 30 are configured as main elements.
  • the polishing apparatus 10 also includes a transfer device 150 that transfers the film frame 14 from the stage 16 to the first polishing stage 18, and a transfer device that transfers the film frame 14 from the first polishing stage 18 to the second polishing stage 20. 152 and a transfer device 154 for transferring the film frame 14 from the second polishing stage 20 to the stage 22.
  • the unpolished glass plate G conveyed by the conveyor 12 is sucked and held by a suction pad 34 provided on the arm 33 of the robot 32. Then, it is transferred from the conveyor 12 to the conveyor 36 by the rotation operation of the arm 33, and conveyed toward the stage 16 by the conveyor 36.
  • the glass plate G is held on the film frame 14.
  • a method for holding the glass plate G with respect to the film frame 14 will be described.
  • FIG. 2 is an assembled perspective view of the membrane frame 14 and the unit sheet 230.
  • the unit sheet 230 includes a film body 38 stretched on the film frame 14, an adsorption sheet 200, an intermediate sheet 210, and an elastic sheet 220.
  • the porous foamed polyurethane-based adsorption sheet 200 that self-adsorbs the glass plate G is disposed below the film body 38, and the adsorption sheet 200, the film body 38, An intermediate sheet 210 is interposed between the two. Further, the upper surface of the suction sheet 200 is bonded to the lower surface of the intermediate sheet 210 with an adhesive, the entire upper surface of the intermediate sheet 210 is bonded to the elastic sheet 220 with an adhesive, and the upper surface of the elastic sheet 220 is bonded to the film body 38. It is bonded by an adhesive.
  • the adhesive for example, urethane adhesive or epoxy adhesive can be preferably used.
  • an elastic sheet 220 is interposed between the entire upper surface (film body side) of the intermediate sheet 210 and the film body 38.
  • the film body 38 via the elastic sheet 220 in the intermediate sheet 210 There are a part with high rigidity bonded to and a part with low rigidity other than that. That is, since the rigidity can be distributed on the surface of the intermediate sheet 210, uneven polishing occurs in the glass plate G, and the polishing quality of the glass plate G may deteriorate.
  • the polishing apparatus 10 since the elastic sheet 220 is interposed between the entire upper surface of the intermediate sheet 210 and the film body 38, the rigidity on the surface of the intermediate sheet 210 is uniform. Accordingly, uneven polishing does not occur on the glass plate G, and the polishing quality of the glass plate G is improved.
  • the mode in which the elastic sheet 220 is interposed in the film body 38 only for a part of the upper surface of the intermediate sheet 210 is not excluded.
  • the intermediate sheet 210 is made of a material whose rigidity in the pulling direction is higher than that of the suction sheet 200 in the pulling direction.
  • the intermediate sheet 210 may be made of polycarbonate, acrylic, aluminum, iron, stainless steel, glass, or carbon fiber reinforced plastic (CFRP: Carbon Fiber Reinforced Plastics).
  • CFRP Carbon Fiber Reinforced Plastics
  • the elastic sheet 220 has a function of deforming following the deformation in the sliding direction and the deformation in the pressurizing direction of the film body 38, and the material thereof is a soft resin material or a rubber system including a foam.
  • the operation and function of the unit sheet 230 will be described later.
  • the lower surface of the suction sheet 200 is pressed against the upper surface of the glass plate G by the pressing force by the lifting mechanism described above.
  • the glass plate G is adsorbed on the lower surface of the adsorbing sheet 200 and held on the film frame 14.
  • the film frame 14 is held by the transfer device 150 of FIG. 1 and transferred along the guide rail 170 to the first polishing stage 18 of FIG. 3, where the film frame 14 is the carrier of the first polishing stage 18. 52 is attached.
  • the film frame 14 (film frame 14 holding the glass plate G) that has been polished by the first polishing stage 18 is removed from the carrier 52 of the first polishing stage 18 and then held by the transfer device 152.
  • FIG. 3 is a side view of the first polishing stage 18 and the second polishing stage 20.
  • the film frame 14 includes a rectangular upper frame 40 and a lower frame 42 as shown in FIG.
  • the rectangular film body 38 is stretched between the upper frame 40 and the lower frame 42 and then fixed to the film frame 14 by fastening the upper frame 40 and the lower frame 42 with bolts (not shown).
  • the film frame 14 and the film body 38 are not limited to rectangles, and may be circular.
  • FIG. 4 is an enlarged cross-sectional view of a main part of the unit sheet 230.
  • FIG. 5 is a side view showing the configuration of the unit sheet 230.
  • FIG. 6 is an enlarged cross-sectional view of a main part of the carrier 52 to which the membrane frame 14 is attached.
  • the film body 38 has a two-layer structure including an airtight holding layer 44 and a strength holding layer 46.
  • the airtight holding layer 44 is a sheet material whose outer peripheral portion is in close contact with the lower outer peripheral frame portion 53 of the carrier 52 and maintains airtightness with the air chamber 54 of the carrier 52.
  • Examples of the material for the airtight holding layer 44 include rubbers, silicones, fluororesins, vinyl chlorides such as vinyl chloride (PVC), nylons, and urethanes.
  • the strength holding layer 46 of FIG. 4 is a sheet material having a predetermined tensile strength that can withstand the tension that holds the airtight holding layer 44 and stretches the entire film body 38.
  • the material for the strength retaining layer 46 is aramid fiber, stainless steel wire mesh, steel wire mesh, carbon fiber, glass fiber, nylon fiber, metal sheet, resin sheet or the like, and the reason that the aramid fiber has very little elongation against tensile force Is preferable.
  • the upper surface of the elastic sheet 220 is bonded to the lower surface of the strength holding layer 46 with an adhesive.
  • the pressure of the pressurized fluid described later can be uniformly transmitted to the glass plate G adsorbed and held by the adsorption sheet 200.
  • polishing head 50 shown in FIG. 3 will be described. Since the polishing head 50 of the first polishing stage 18 and the polishing head 50 of the second polishing stage 20 have the same structure, they will be described with the same reference numerals. .
  • the polishing head 50 is configured such that a motor is built in a main body casing 51, and an output shaft of the motor is connected to a spindle 56 suspended in a vertical direction.
  • a carrier 52 is connected to the spindle 56.
  • the main body casing 51 is connected to the slider 158 via the lifting mechanism 156.
  • the main body casing 51 is moved up and down with respect to the slider 158 by the lifting mechanism 156, so that the carrier 52 moves forward and backward with respect to the polishing pad 58 of the first polishing stage 18 and the polishing pad 60 of the second polishing stage 20. Is done. Therefore, when the carrier 52 moves forward, the lower surface (one surface: polishing surface) of the glass plate G on which the upper surface is sucked and held comes into contact with the polishing pads 58 and 60 on the lower surface of the suction sheet 200.
  • the polishing pad 58 is attached to the upper surface of the polishing surface plate 62, and a rotating shaft 64 that is rotated by a motor (not shown) is connected to the lower portion of the polishing surface plate 62.
  • the polishing pad 60 is affixed to the upper surface of the polishing surface plate 66, and a rotating shaft 68 that is rotated by a motor (not shown) is connected to the lower portion of the polishing surface plate 66.
  • the main body casing 51 is connected to a revolving drive mechanism (not shown) and has a function of revolving at a predetermined revolving radius.
  • This revolution drive mechanism can also be configured by incorporating a planetary gear mechanism in the main body casing 51 and connecting the output shaft of the planetary gear mechanism to the spindle 56.
  • the above is the configuration of the first polishing stage 18 and the second polishing stage 20, and the lower surface of the glass plate G is polished by the first polishing stage 18 and the second polishing stage 20, and the glass plate G Minute irregularities and undulations are removed from the surface.
  • linear motion guides 70 are attached to the slider 158 of the first polishing stage 18.
  • the linear motion guides 70, 70 are fitted to the guide rails 72, 72.
  • the guide rails 72 and 72 are arranged toward a maintenance stage 74 that maintains the spindle 56 and the carrier 52 of the first polishing stage 18.
  • linear motion guides 70 and 70 are similarly attached to the slider 158 of the second polishing stage 20, and the linear motion guides 70 and 70 are fitted to the guide rails 160 and 160. As shown in FIG. 1, the guide rails 160 and 160 are disposed toward a maintenance stage 76 for maintaining the spindle 56 and the carrier 52 of the second polishing stage 20.
  • the carrier 52 has a lifting frame 78 fixed to the upper outer peripheral portion of the carrier 52 by bolts (not shown).
  • a plurality of through holes 80, 80... are provided at equal intervals on the flange portion of the lifting frame 78 protruding from the outer periphery of the carrier 52, and a sliding frame (slide-contact) is provided in these through holes 80, 80.
  • a hanger 84 projecting from the upper surface of the frame 82 is penetrated from below as shown in FIG.
  • the lifting tool 84 is penetrated by a lifting spring 88 disposed between the lifting frame 78 and the lifting disk spring 86, and is also passed through the through hole 90 of the lifting disk spring 86, thereby screwing the screw. It is connected to a jack 92.
  • the carrier 52 is formed with a plurality of ejection ports 98, 98... For ejecting compressed air (pressurized fluid) into the air chamber 54 of FIG.
  • These injection ports 98, 98... Communicate with an air supply path 102 indicated by a broken line in FIG. 3 through an air chamber 100 formed on the upper surface of the carrier 52.
  • the air supply path 102 extends to the outside of the polishing head 50 via a rotary joint (not shown) attached to the polishing head 50, and is connected to an air pump 106 via a valve 104. Therefore, when the valve 104 is opened, compressed air from the air pump 106 is supplied to the air chamber 54 via the air supply path 102, the air chamber 100, and the injection port 98. Thereby, the pressure of compressed air is transmitted to the glass plate G through the unit sheet 230, and the lower surface of the glass plate G is pressed against the polishing pads 58 and 60 by this pressure and polished.
  • a plurality of pins 108, 108... are projected at equal intervals on the upper frame 40 of the film frame 14, and the circular head shown in FIG.
  • the part 110 is engaged with a hook 112 fixed to the lower part of the sliding frame 82.
  • the membrane frame 14 is attached to the sliding frame 82.
  • the engaging force between the head portion 110 and the hook 112 is strengthened by the reaction force of the film body 38 when the film body 38 is lifted by the screw jack 92, and the polishing resistance received from the film body 38 during polishing causes the head portion from the hook 112. 110 does not come off.
  • the film frame 14 is removed from the carrier 52 and transferred to the stage 22 by the transfer device 154.
  • the screw jack 92 shown in FIG. the film frame 14 is rotated by a predetermined angle with respect to the carrier 52 to remove the head portion 110 from the hook 112. Thereby, the film frame 14 is removed from the carrier 52.
  • the polished glass sheet G is peeled off from the unit sheet 230 of the film frame 14 conveyed by the conveying device 154.
  • the peeled glass plate G is transported by the conveyor 138 and sucked by the suction head 144 attached to the arm 142 of the robot 140.
  • the glass plate G is transferred to the glass plate carry-out conveyor 24 by the operation of the robot 140 and is carried out of the polishing apparatus 10 by the glass plate carry-out conveyor 24.
  • the film frame 14 (including the unit sheet 230) from which the glass plate G has been peeled off is transported to the film frame cleaning stage 26 by the conveyor 146, where it is washed with water.
  • the washed film frame 14 is conveyed to the film frame drying stage 28 by the conveyor 148, where it is heated and dried.
  • the dried film frame 14 is transported to the stage 16 by the film frame return conveyor 30 and reused for adsorbing and holding the glass plate G before polishing.
  • the above is the overall configuration of the polishing apparatus 10.
  • the polishing apparatus 10 has a sliding direction rigidity and a pressing direction rigidity between the film body 38 and the suction sheet 200 higher than the sliding direction rigidity and the pressing direction rigidity of the suction sheet 200. Since the intermediate sheet 210 is bonded, it is possible to prevent the adsorption sheet 200 from being peeled off and rising and preventing the glass plate G from being damaged.
  • an elastic sheet 220 that deforms following the deformation in the sliding direction and the deformation in the pressing direction of the film body 38 is interposed between the intermediate sheet 210 and the film body 38 as shown in FIG. I am letting.
  • FIG. 7 is a cross-sectional view of the unit sheet 230 showing the state of the unit sheet 230 when a force in the sliding direction indicated by the arrow A and the pressure direction indicated by the arrow B is applied to the film body 38 during polishing. is there.
  • the film body 38 having a lower rigidity in the sliding direction and a lower rigidity in the pressurizing direction than the intermediate sheet 210 expands and contracts, and the film body 38 has arrows A and arrows.
  • the edge portion 220A of the elastic sheet 220 is elastically deformed as shown in FIG.
  • the intermediate sheet 210 having higher rigidity in the sliding direction and higher rigidity in the pressurizing direction than the film body 38 is difficult to expand and contract due to the polishing resistance, and is not easily deformed. Therefore, there is no relative displacement between the intermediate sheet 210 and the elastic sheet 220. Does not occur.
  • the unit sheet 230 of the embodiment since the elastic sheet 220 does not peel from the film body 38 and the elastic sheet 220 does not peel from the intermediate sheet 210, the intermediate sheet 210 peels from the film body 38. Can be prevented. Thereby, the grinding
  • the elastic sheet 220 smoothly deforms following the deformation of the film body 38 in the pulling direction.
  • the thickness of the elastic sheet 220 is 1 mm or more from the viewpoint of providing the following deformation function of the elastic sheet 220 and the rigidity capable of withstanding the polishing resistance.
  • the soft resin in the present invention is preferably a resin having a first elastic recovery rate of 100% and a second elastic recovery rate of 95% or more.
  • the first elastic recovery rate of the soft resin is measured by the following method. First, the soft resin is sandwiched with a gauge or the like, and the thickness of the soft resin before compression is measured. Next, the soft resin is compressed by a press so as to have a predetermined compression rate. Next, the compression of the soft resin is released after several seconds, and the thickness of the soft resin is measured after 1 minute. Finally, the ratio (percentage) of the thickness of the soft resin after compression to the thickness of the soft resin before compression is calculated, and the ratio is used as the first elastic recovery rate.
  • the first elastic recovery rate of the urethane of the embodiment is 100% in the compression rate when the predetermined compression rate is 40%, 60%, and 75%.
  • the second elastic recovery rate of the soft resin is measured by the following method. First, the soft resin is sandwiched with a gauge or the like, and the thickness of the soft resin before compression is measured. Next, the soft resin is compressed by a press so as to have a compression rate of 60%. Next, the compression of the soft resin is released after 1 hour, and the thickness of the soft resin is measured after 1 minute. Finally, the ratio (percentage) of the thickness of the soft resin after compression to the thickness of the soft resin before compression is calculated, and the ratio is used as the first elastic recovery rate. The second elastic recovery rate of the urethane of the embodiment is 95%.
  • auxiliary plate 232 surrounding the glass plate G is held by suction on the suction sheet 200 of the embodiment.
  • the auxiliary plate 232 relaxes the high pressure generated at the end of the glass plate G due to the polishing pressure applied to the glass plate G through the polishing pad 58 during polishing, that is, prevents the polishing pressure from being applied to the glass plate G.
  • the suction sheet 200 are arranged to prevent the suction sheet 200 from rising.
  • the distance S between the auxiliary plate 232 and the glass plate G is preferably 5 mm or more. If the distance S is 5 mm or more, even if the arrangement position of the glass plate G or the auxiliary plate 232 is shifted during polishing, the glass plate G and the auxiliary plate 232 are difficult to contact, and there is no possibility that the glass plate G is damaged.
  • the thickness t of the auxiliary plate 232 is preferably equal to or less than the thickness of the glass plate G. Specifically, the difference between the thickness t of the auxiliary plate 232 and the thickness of the glass plate G is ⁇ 0. It is preferably 1 mm to 0 mm.
  • the material of the auxiliary plate 232 is made of a fluorine resin such as ultra high molecular weight polyethylene (UPE), stainless steel (SUS), polytetrafluoroethylene (Teflon (registered trademark)), or a material having high wear resistance such as glass epoxy. preferable.
  • UPE ultra high molecular weight polyethylene
  • SUS stainless steel
  • Teflon polytetrafluoroethylene
  • glass epoxy a material having high wear resistance
  • the auxiliary plate 232 is not easily worn even if the polishing pad 58 contacts the auxiliary plate 232.
  • the suction sheet 200 generated during polishing can be prevented from rising, so that the suction sheet 200 contacts the polishing pad 58. Can prevent tearing.
  • the thin plate glass used for the flat panel display or the like is exemplified as the plate-like object to be polished.
  • the present invention is not limited to this, and any glass plate that requires surface polishing may be used. It is not limited to glass, and may be a metal or resin plate that requires surface polishing.

Abstract

The present invention relates to an apparatus for polishing a plate-like body, which is provided with: a suction sheet that sucks and holds a plate-like body; a film body to which the suction sheet is attached; a carrier to which the film body is attached; and a polishing pad. This apparatus for polishing a plate-like body polishes the plate-like body by supplying a pressurized fluid between the film body and the carrier and thereby pressing the plate-like body, which is sucked and held by the suction sheet, against the polishing pad by means of the pressure of the pressurized fluid. An intermediate sheet, which has a rigidity in the tensile direction higher than the rigidity of the suction sheet in the tensile direction, is interposed between the film body and the suction sheet. An elastic sheet, which deforms following to the deformation of the film body in the sliding direction and in the pressurized direction, is interposed between the intermediate sheet and the film body.

Description

板状体の研磨装置及び板状体の研磨方法Plate-like body polishing apparatus and plate-like body polishing method
　本発明は、板状体の研磨装置及び板状体の研磨方法に関する。 The present invention relates to a plate-like body polishing apparatus and a plate-like body polishing method.
　板状体、特に、液晶ディスプレイ等のフラットパネルディスプレイ用のガラス板は、その製造方法の一例として、フロート法といわれる成形法を用いた製造方法が知られている。この製造方法は、前記フロート法によって溶融ガラスを帯状ガラス板に製造する工程、前記帯状ガラス板を所定サイズの矩形状ガラス板に切断する工程、及び前記矩形状ガラス板の表面の微小な凹凸やうねりを研磨装置によって研磨して除去する工程を備える。これによって、矩形状ガラス板をフラットパネルディスプレイに適した厚さ０．０５～２．０ｍｍのガラス板に製造する。 A plate-like body, particularly a glass plate for a flat panel display such as a liquid crystal display, is known as a production method using a forming method called a float method as an example of the production method. This manufacturing method includes a step of manufacturing molten glass into a strip-shaped glass plate by the float method, a step of cutting the strip-shaped glass plate into a rectangular glass plate of a predetermined size, and a minute unevenness on the surface of the rectangular glass plate. A step of polishing and removing the waviness with a polishing apparatus; As a result, the rectangular glass plate is manufactured into a glass plate having a thickness of 0.05 to 2.0 mm suitable for a flat panel display.
　本願出願人は、特許文献１において、特にフラットパネルディスプレイ用のガラス板を対象とする研磨装置を提案している。この研磨装置は、ガラス板を吸着して保持する吸着シートと、該吸着シートが取り付けられた膜体とからなるユニットシートを備えている。この研磨装置によれば、前記膜体と該膜体が取り付けられるキャリアとの間に加圧流体を供給し、吸着シートに吸着保持されたガラス板を加圧流体の圧力によって研磨パッドに押し付けて研磨する。 The applicant of the present application has proposed a polishing apparatus specifically for glass plates for flat panel displays in Patent Document 1. This polishing apparatus includes a unit sheet including an adsorption sheet that adsorbs and holds a glass plate and a film body to which the adsorption sheet is attached. According to this polishing apparatus, a pressurized fluid is supplied between the film body and a carrier to which the film body is attached, and the glass plate adsorbed and held on the adsorption sheet is pressed against the polishing pad by the pressure of the pressurized fluid. Grind.
　また、特許文献１に開示された膜体は気密保持層、強度保持層、及び平滑層からなる三層構造に構成されるとともに、吸着シートは自己吸着力を有する多孔質の発泡ポリウレタンシートによって構成されている。 Further, the film body disclosed in Patent Document 1 has a three-layer structure including an airtight holding layer, a strength holding layer, and a smooth layer, and the adsorbing sheet is constituted by a porous foamed polyurethane sheet having a self-adsorbing force. Has been.
　しかしながら、特許文献１に開示された研磨装置では、ガラス板の研磨中に、研磨抵抗によって吸着シートが膜体から剥がれて捲れ上がりガラス板が破損するという問題があった。 However, the polishing apparatus disclosed in Patent Document 1 has a problem in that during the polishing of the glass plate, the adsorbing sheet peels off from the film body due to polishing resistance, and the glass plate is damaged.
　そこで、本願出願人は、特許文献１の前記問題を解消する研磨装置を特許文献２において開示している。 Therefore, the applicant of the present application discloses a polishing apparatus that solves the above-mentioned problem of Patent Document 1 in Patent Document 2.
　特許文献２の研磨装置は、膜体と吸着シートとの間に、引っ張り方向の剛性が吸着シートの引っ張り方向の剛性よりも高い中間シートを介在させて膜体と吸着シートに接着させてなるユニットシートを備えている。 The polishing apparatus of Patent Document 2 is a unit formed by interposing an intermediate sheet between the film body and the suction sheet having a higher rigidity in the pulling direction than the rigidity in the pulling direction of the suction sheet to the film body and the suction sheet. It has a seat.
　特許文献２の研磨装置のユニットシートによれば、研磨抵抗による膜体の引っ張り方向の伸縮動作によって中間シートと、中間シートよりも剛性の低い膜体との間に剥がれが生じる場合があるが、中間シートと吸着シートとの間では相対的なずれは発生しない。すなわち、吸着シートはガラス板を吸着しているため伸縮が制約されており、中間シートは吸着シートよりも引っ張り方向の剛性が高く引っ張り方向に伸縮しないためである。その結果、吸着シートが中間シートから剥がれなくなるので、吸着シートが剥がれて捲り上がることを防止でき、ガラス板の破損を防止できるという効果を有する。 According to the unit sheet of the polishing apparatus of Patent Document 2, peeling may occur between the intermediate sheet and the film body having lower rigidity than the intermediate sheet by the expansion and contraction operation of the film body due to the polishing resistance. There is no relative shift between the intermediate sheet and the suction sheet. That is, since the suction sheet adsorbs the glass plate, expansion and contraction is restricted, and the intermediate sheet has higher rigidity in the pulling direction than the suction sheet and does not expand and contract in the pulling direction. As a result, since the suction sheet is not peeled off from the intermediate sheet, it is possible to prevent the suction sheet from peeling off and rising, and to prevent the glass plate from being damaged.
　また、特許文献２には、吸着シートが発泡ポリウレタン系であること、中間シートが硬質のポリカーボネイト製であることが開示されている。また、膜体は、ゴム製の気密保持層とアラミド繊維製の強度保持層とからなる二重構造に構成されており、中間シートよりも剛性が低いものである。 Patent Document 2 discloses that the adsorbing sheet is made of polyurethane foam and that the intermediate sheet is made of hard polycarbonate. Further, the film body has a double structure composed of an airtight holding layer made of rubber and a strength holding layer made of aramid fiber, and has a lower rigidity than the intermediate sheet.
日本国特開２００４－１２２３５１号公報Japanese Unexamined Patent Publication No. 2004-122351 国際公開第２００７／０２０８５９号International Publication No. 2007/020859
　特許文献２の研磨装置は前述の如く、研磨抵抗による膜体の摺動方向（膜体の動作方向）の伸縮動作及び特に四隅部に強く生じる垂直方向（加圧方向）の引張力によって中間シートの一部（例えば四隅部）が膜体から剥離する場合がある。つまり、研磨抵抗による膜体の剛性が、中間シートの剛性と比較して小さいからである。 As described above, the polishing apparatus of Patent Document 2 is an intermediate sheet due to the expansion and contraction operation in the sliding direction of the film body (the movement direction of the film body) due to polishing resistance and the tensile force in the vertical direction (pressing direction) that is strongly generated at the four corners. A part of the film (for example, four corners) may peel off from the film body. That is, the rigidity of the film body due to the polishing resistance is smaller than the rigidity of the intermediate sheet.
　ガラス板の研磨中には、前記剥離した中間シートと膜体との間の隙間（以下、「剥離部」という）に、研磨材（例えば、酸化セリウムを主体とする微粒子）が含有された研磨液が出入りするが、その際に、剥離部に滞留した研磨材が剥離部で凝集して固化する場合がある。そして、固化した研磨材の粒状体が前記剥離部から流出すると、研磨液に前記粒状体が混入し、この粒状体がガラス板の研磨面に接触することによって、前記研磨面に傷が付いてしまい、ガラス板の研磨品質が低下する場合があった。 During polishing of a glass plate, a polishing material (for example, fine particles mainly composed of cerium oxide) is contained in a gap (hereinafter referred to as “peeling portion”) between the peeled intermediate sheet and the film body. Although the liquid enters and exits, at that time, the abrasive staying in the peeling portion may aggregate and solidify in the peeling portion. Then, when the solidified granular material of the abrasive flows out from the peeling portion, the granular material is mixed into the polishing liquid, and the granular material comes into contact with the polished surface of the glass plate, thereby scratching the polished surface. As a result, the polishing quality of the glass plate may deteriorate.
　また、前記剥離部への研磨液の出入り及び繰り返し生じる垂直方向の引張力により、中間シートと膜体との剥離が徐々に進行し、最終的には完全剥離に至り、研磨中にガラス板の破損やその他のトラブルを発生する場合があった。 Further, due to the entrance and exit of the polishing liquid to and from the peeled portion and the repetitive vertical tensile force, the peeling between the intermediate sheet and the film body gradually proceeds, eventually leading to complete peeling, and during the polishing, the glass plate In some cases, damage or other problems occurred.
　本発明は、前記のような問題に鑑みてなされたものであり、膜体に対する中間シートの剥離を防止して板状体の研磨品質を向上させ、板状体の破損などのトラブルを防止できる板状体の研磨装置、及び該研磨装置を用いた板状体の研磨方法を提供することを目的とする。 The present invention has been made in view of the above problems, and can prevent the peeling of the intermediate sheet from the film body to improve the polishing quality of the plate-like body and prevent troubles such as breakage of the plate-like body. It is an object of the present invention to provide a plate-like body polishing apparatus and a plate-like body polishing method using the polishing apparatus.
　前記目的を達成するために本発明は、板状体を吸着して保持する吸着シートと、前記吸着シートが取り付けられる膜体と、前記膜体が取り付けられるキャリアと、研磨パッドとを備え、前記膜体と前記キャリアとの間に加圧流体を供給し、前記吸着シートに吸着されて保持された前記板状体を前記加圧流体の圧力によって前記研磨パッドに押し付けて研磨する板状体の研磨装置であって、前記膜体と前記吸着シートとの間に、引っ張り方向の剛性が前記吸着シートの引っ張り方向の剛性よりも高い中間シートが介在され、前記中間シートと前記膜体との間に、該膜体の摺動方向の変形及び加圧方向の変形に追従して変形する弾性シートが介在されている板状体の研磨装置を提供する。 To achieve the above object, the present invention comprises an adsorption sheet that adsorbs and holds a plate-like body, a film body to which the adsorption sheet is attached, a carrier to which the film body is attached, and a polishing pad, A plate-like body for supplying a pressurized fluid between the film body and the carrier and polishing the plate-like body adsorbed and held by the adsorption sheet against the polishing pad by the pressure of the pressurized fluid. In the polishing apparatus, an intermediate sheet having a tension direction rigidity higher than a tension direction rigidity of the suction sheet is interposed between the film body and the suction sheet, and between the intermediate sheet and the film body. Further, the present invention provides a plate-like polishing apparatus in which an elastic sheet that deforms following the deformation in the sliding direction and the pressure direction of the film body is interposed.
　まず、本発明では、膜体と吸着シートとの間に中間シートが接着されているので、吸着シートが剥がれて捲り上がることを防止でき、ガラス板の破損を防止できる。 First, in the present invention, since the intermediate sheet is bonded between the film body and the adsorption sheet, the adsorption sheet can be prevented from peeling off and rising, and the glass plate can be prevented from being damaged.
　このような研磨装置において本発明は、中間シートと膜体との間に、膜体の摺動方向の変形及び加圧方向の変形に追従して変形する弾性シートを介在させた。板状体の研磨中に発生する研磨抵抗によって中間シートより剛性の低い膜体は摺動方向及び加圧方向に伸縮して変形し、その膜体の変形に追従して弾性シートが変形する。また、膜体より剛性の高い中間シートは研磨抵抗によって伸縮し難いため変形し難く、よって、中間シートと弾性シートとには相対的なずれは発生しない。したがって、本発明によれば、膜体から弾性シートは剥離せず、かつ、中間シートから弾性シートも剥離しないので、膜体から中間シートが剥離するのを防止でき、かつ、剥離部も生じないので、前記研磨液の出入りも防止できる。これにより、板状体の研磨品質が向上する。 In such a polishing apparatus, in the present invention, an elastic sheet that deforms following the deformation in the sliding direction and the deformation in the pressing direction of the film body is interposed between the intermediate sheet and the film body. The film body having rigidity lower than that of the intermediate sheet is deformed by expanding and contracting in the sliding direction and the pressurizing direction due to polishing resistance generated during the polishing of the plate-shaped body, and the elastic sheet is deformed following the deformation of the film body. Further, the intermediate sheet having higher rigidity than the film body is difficult to be deformed because it is difficult to expand and contract due to polishing resistance, and therefore, there is no relative displacement between the intermediate sheet and the elastic sheet. Therefore, according to the present invention, the elastic sheet does not peel from the film body, and the elastic sheet does not peel from the intermediate sheet. Therefore, the entry and exit of the polishing liquid can be prevented. Thereby, the polishing quality of the plate-like body is improved.
　なお、膜体と弾性シート、弾性シートと中間シート、及び中間シートと吸着シートはともに接着剤によって接着され、ユニットシートとして構成されている。 It should be noted that the film body and the elastic sheet, the elastic sheet and the intermediate sheet, and the intermediate sheet and the adsorption sheet are both bonded with an adhesive and configured as a unit sheet.
　本発明の好ましい形態では、中間シートの膜体側の全面と膜体との間に、弾性シートが介在されているので、中間シートにおいて、弾性シートを介して膜体に取り付けられた剛性の高い一部分と、それ以外の剛性の低い部分とが存在しない。すなわち、中間シートの面上の剛性は均一となり、よって、板状体に研磨むらは発生せず、板状体の研磨品質が向上する。 In a preferred embodiment of the present invention, since the elastic sheet is interposed between the entire surface of the intermediate sheet on the film body side and the film body, a part of the intermediate sheet having a high rigidity attached to the film body via the elastic sheet. There is no other low rigidity part. That is, the rigidity on the surface of the intermediate sheet becomes uniform, so that uneven polishing does not occur in the plate-like body, and the polishing quality of the plate-like body is improved.
　本発明の好ましい態様では、前記膜体は、ゴム類、シリコーン類、フッ素樹脂、塩化ビニル（ＰＶＣ）等のビニル系、ナイロン系、又はウレタン系からなる気密保持層と、アラミド繊維、ステンレス製金網、スチール金網、炭素繊維、ガラス繊維、ナイロン繊維、金属シート、又は樹脂シートからなる強度保持層とからなり、前記中間シートは、ポリカーボネイト、アクリル、アルミニウム、鉄、ステンレス、ガラス、又は炭素繊維強化プラスチック（ＣＦＲＰ：Ｃａｒｂｏｎ　Ｆｉｂｅｒ　Ｒｅｉｎｆｏｒｃｅｄ　Ｐｌａｓｔｉｃｓ）からなり、前記弾性シートは、発泡体を含む軟質樹脂（ウレタン系等）、又はゴム類である。 In a preferred embodiment of the present invention, the film body includes an airtight holding layer made of vinyl, nylon, or urethane such as rubber, silicone, fluororesin, or vinyl chloride (PVC), an aramid fiber, and a stainless steel wire mesh. , Steel wire mesh, carbon fiber, glass fiber, nylon fiber, metal sheet, or resin sheet, and the intermediate sheet is polycarbonate, acrylic, aluminum, iron, stainless steel, glass, or carbon fiber reinforced plastic (CFRP: Carbon Fiber Reinforced Plastics), and the elastic sheet is a soft resin (such as urethane) containing foam, or rubber.
　膜体を前記材料によって製造することによって、吸着シートに吸着されて保持された板状体に加圧流体の圧力を均一に伝えることができる。 By manufacturing the film body with the material, the pressure of the pressurized fluid can be uniformly transmitted to the plate-like body that is adsorbed and held by the adsorption sheet.
　また、中間シートを前記材料によって製造することにより、板状体の研磨中において引っ張り方向に伸縮しない剛性の高い中間シートを提供できる。中間シートはアルミニウムからなるものであればより好ましい。また、これらの材料の他、ＡＢＳ（Ａｃｒｙｌｏｎｉｔｒｉｌｅ　Ｂｕｔａｄｉｅｎｅ　Ｓｔｙｒｅｎｅ）、繊維強化プラスチック（ＦＲＰ：Ｆｉｂｅｒ　Ｒｅｉｎｆｏｒｃｅｄ　Ｐｌａｓｔｉｃｓ）も例示できる。 Also, by manufacturing the intermediate sheet with the above-mentioned material, it is possible to provide a highly rigid intermediate sheet that does not expand and contract in the pulling direction during polishing of the plate-like body. More preferably, the intermediate sheet is made of aluminum. In addition to these materials, ABS (Acrylonitrile Butadiene Styrene) and fiber reinforced plastics (FRP) can also be exemplified.
　更に、弾性シートを前記材料によって製造することによって、膜体の摺動方向の変形及び加圧方向の変形に追従して弾性シートが円滑に変形する。なお、弾性シートの硬度は、その追従変形機能、及び研磨抵抗に耐え得る剛性を備える観点から、ショアＡ硬度（ＩＳＯ　７６１９に準ずる）で２～７０が好ましく、さらにはショアＡ硬度３０～５０がより好ましい。また、弾性シートの厚さは、弾性シートの追従変形機能、及び研磨抵抗に耐え得る剛性を備える観点から１ｍｍ以上であることが好ましく、さらには２．０～３．０ｍｍであることがより好ましい。 Furthermore, by manufacturing the elastic sheet with the material, the elastic sheet smoothly deforms following the deformation in the sliding direction and the deformation in the pressing direction of the film body. The hardness of the elastic sheet is preferably 2 to 70 in Shore A hardness (according to ISO 7619) from the viewpoint of having a follow-up deformation function and rigidity that can withstand polishing resistance, and more preferably Shore A hardness 30 to 50 More preferred. In addition, the thickness of the elastic sheet is preferably 1 mm or more, more preferably 2.0 to 3.0 mm, from the viewpoint of providing the following sheet deformation function of the elastic sheet and rigidity capable of withstanding polishing resistance. .
　また、本発明は、前記板状体の研磨装置を用いて板状体を研磨する板状体の研磨方法を提供する。 Further, the present invention provides a plate-like polishing method for polishing a plate-like body using the plate-like polishing apparatus.
　これにより、膜体から中間シートが剥離するのを防止でき、板状体の研磨品質が向上する。 This prevents the intermediate sheet from peeling off from the film body, and improves the polishing quality of the plate-like body.
　本発明に係る板状体の研磨装置及び板状体の研磨方法によれば、膜体から中間シートが剥離するのを防止でき、板状体の研磨品質が向上する。 According to the plate-like body polishing apparatus and the plate-like body polishing method of the present invention, it is possible to prevent the intermediate sheet from being peeled off from the film body, thereby improving the polishing quality of the plate-like body.
図１は、実施の形態の板状体の研磨装置の全体構成を示す平面図である。FIG. 1 is a plan view showing an overall configuration of a plate-like polishing apparatus according to an embodiment. 図２は、膜枠とユニットシートとの組立斜視図である。FIG. 2 is an assembled perspective view of the membrane frame and the unit sheet. 図３は、第１の研磨ステージと第２の研磨ステージとの側面図である。FIG. 3 is a side view of the first polishing stage and the second polishing stage. 図４は、ユニットシートの構成を示した要部断面図である。FIG. 4 is a cross-sectional view of the main part showing the configuration of the unit sheet. 図５は、ユニットシートの構成を示した側面図である。FIG. 5 is a side view showing the configuration of the unit sheet. 図６は、膜枠が取り付けられたキャリアの要部拡大断面図である。FIG. 6 is an enlarged cross-sectional view of a main part of the carrier to which the membrane frame is attached. 図７は、膜体の変形に弾性シートが追従して変形したことを示す説明図である。FIG. 7 is an explanatory view showing that the elastic sheet is deformed following the deformation of the film body.
　以下、図面に従って本発明に係る板状体の研磨装置及び板状体の研磨方法の好ましい実施の形態について詳説する。 Hereinafter, a preferred embodiment of a plate-like polishing apparatus and a plate-like polishing method according to the present invention will be described in detail with reference to the drawings.
　図１は、実施の形態の板状体の研磨装置１０の全体構成を示した平面図である。 FIG. 1 is a plan view showing an overall configuration of a plate-like body polishing apparatus 10 according to an embodiment.
　図１に示す研磨装置１０は、大型（例えば、一辺が１０００ｍｍ以上）のガラス板Ｇの片面（研磨面）を研磨することによって、ガラス板Ｇの片面を液晶ディスプレイ用ガラス板に必要な平坦度に加工しつつ、液晶ディスプレイ用ガラス板に必要な厚さ（例えば、０．０５～２．０ｍｍ）のガラス板Ｇに加工する研磨装置である。 The polishing apparatus 10 shown in FIG. 1 polishes one surface (polishing surface) of a large glass plate G (for example, one side of 1000 mm or more), thereby flatness required for the glass plate for a liquid crystal display. This is a polishing apparatus for processing into a glass plate G having a thickness (for example, 0.05 to 2.0 mm) necessary for a glass plate for a liquid crystal display.
　研磨装置１０は、研磨前のガラス板Ｇを搬送するコンベア１２、ガラス板Ｇを膜枠１４に貼着するステージ１６、第１の研磨ステージ１８、第２の研磨ステージ２０、研磨完了したガラス板Ｇを膜枠１４から取り外すステージ２２、ガラス板搬出コンベア２４、膜枠洗浄ステージ２６、膜枠乾燥ステージ２８、及び膜枠返送コンベア３０を主要素として構成されている。 The polishing apparatus 10 includes a conveyor 12 that conveys the glass plate G before polishing, a stage 16 that adheres the glass plate G to the film frame 14, a first polishing stage 18, a second polishing stage 20, and a glass plate that has been polished. A stage 22 for removing G from the membrane frame 14, a glass plate carry-out conveyor 24, a membrane frame cleaning stage 26, a membrane frame drying stage 28, and a membrane frame return conveyor 30 are configured as main elements.
　また、研磨装置１０には、ステージ１６から第１の研磨ステージ１８に膜枠１４を搬送する搬送装置１５０、第１の研磨ステージ１８から第２の研磨ステージ２０に膜枠１４を搬送する搬送装置１５２、及び第２の研磨ステージ２０からステージ２２に膜枠１４を搬送する搬送装置１５４が設けられている。 The polishing apparatus 10 also includes a transfer device 150 that transfers the film frame 14 from the stage 16 to the first polishing stage 18, and a transfer device that transfers the film frame 14 from the first polishing stage 18 to the second polishing stage 20. 152 and a transfer device 154 for transferring the film frame 14 from the second polishing stage 20 to the stage 22.
　コンベア１２によって搬送されてきた研磨前のガラス板Ｇは、ロボット３２のアーム３３に設けられた吸着パッド３４に吸着保持される。そして、アーム３３の回転動作によってコンベア１２からコンベア３６に移載され、コンベア３６によってステージ１６に向けて搬送される。 The unpolished glass plate G conveyed by the conveyor 12 is sucked and held by a suction pad 34 provided on the arm 33 of the robot 32. Then, it is transferred from the conveyor 12 to the conveyor 36 by the rotation operation of the arm 33, and conveyed toward the stage 16 by the conveyor 36.
　ステージ１６において、まず、ガラス板Ｇが膜枠１４に保持される。以下、膜枠１４に対するガラス板Ｇの保持方法について説明する。 In the stage 16, first, the glass plate G is held on the film frame 14. Hereinafter, a method for holding the glass plate G with respect to the film frame 14 will be described.
　膜枠１４はステージ１６において、不図示の昇降機構に保持されており、膜枠１４の下方にガラス板Ｇが位置したところで、膜枠１４が昇降機構により下降移動され、膜枠１４に張設された図２のユニットシート２３０の吸着シート２００の下面がガラス板Ｇの上面（非研磨面）に押し付けられる。図２は、膜枠１４とユニットシート２３０との組立斜視図である。 The film frame 14 is held by a lifting mechanism (not shown) on the stage 16. When the glass plate G is positioned below the film frame 14, the film frame 14 is moved downward by the lifting mechanism and is stretched on the film frame 14. The lower surface of the suction sheet 200 of the unit sheet 230 in FIG. 2 is pressed against the upper surface (non-polished surface) of the glass plate G. FIG. 2 is an assembled perspective view of the membrane frame 14 and the unit sheet 230.
　ユニットシート２３０は、膜枠１４に張設される膜体３８、吸着シート２００、中間シート２１０、及び弾性シート２２０から構成される。 The unit sheet 230 includes a film body 38 stretched on the film frame 14, an adsorption sheet 200, an intermediate sheet 210, and an elastic sheet 220.
　実施の形態のユニットシート２３０によれば、膜体３８の下方に、ガラス板Ｇを自己吸着する多孔質性の発泡ポリウレタン系の吸着シート２００が配置されるとともに、吸着シート２００と膜体３８との間に、中間シート２１０が介在されている。更に、中間シート２１０の下面には、吸着シート２００の上面が接着剤によって接着され、中間シート２１０の上面の全面が弾性シート２２０に接着剤によって接着され、弾性シート２２０の上面が膜体３８に接着剤によって接着されている。前記接着剤としては、例えばウレタン系接着剤又はエポキシ系接着剤が好ましく使用できる。 According to the unit sheet 230 of the embodiment, the porous foamed polyurethane-based adsorption sheet 200 that self-adsorbs the glass plate G is disposed below the film body 38, and the adsorption sheet 200, the film body 38, An intermediate sheet 210 is interposed between the two. Further, the upper surface of the suction sheet 200 is bonded to the lower surface of the intermediate sheet 210 with an adhesive, the entire upper surface of the intermediate sheet 210 is bonded to the elastic sheet 220 with an adhesive, and the upper surface of the elastic sheet 220 is bonded to the film body 38. It is bonded by an adhesive. As the adhesive, for example, urethane adhesive or epoxy adhesive can be preferably used.
　実施の形態の研磨装置１０は、中間シート２１０の上面（膜体側）の全面と膜体３８との間に、弾性シート２２０が介在されている。実施の形態の研磨装置１０に対して、例えば中間シート２１０の上面の一部分のみを弾性シート２２０を介して膜体３８に接着した場合、中間シート２１０において、前記弾性シート２２０を介して膜体３８に接着された剛性の高い一部分と、それ以外の剛性の低い部分とが存在する。すなわち、中間シート２１０の面上において剛性に分布ができるので、ガラス板Ｇに研磨むらが生じ、ガラス板Ｇの研磨品質が低下する場合がある。 In the polishing apparatus 10 according to the embodiment, an elastic sheet 220 is interposed between the entire upper surface (film body side) of the intermediate sheet 210 and the film body 38. For example, when only a part of the upper surface of the intermediate sheet 210 is bonded to the film body 38 via the elastic sheet 220 with respect to the polishing apparatus 10 of the embodiment, the film body 38 via the elastic sheet 220 in the intermediate sheet 210. There are a part with high rigidity bonded to and a part with low rigidity other than that. That is, since the rigidity can be distributed on the surface of the intermediate sheet 210, uneven polishing occurs in the glass plate G, and the polishing quality of the glass plate G may deteriorate.
　これに対して、実施の形態の研磨装置１０は、中間シート２１０の上面の全面と膜体３８との間に、弾性シート２２０が介在されているので、中間シート２１０の面上の剛性は均一となり、よって、ガラス板Ｇに研磨むらは発生せず、ガラス板Ｇの研磨品質が向上する。ただし、中間シート２１０の上面の一部分のみを膜体３８に弾性シート２２０を介在させる態様を排除するものではない。 In contrast, in the polishing apparatus 10 according to the embodiment, since the elastic sheet 220 is interposed between the entire upper surface of the intermediate sheet 210 and the film body 38, the rigidity on the surface of the intermediate sheet 210 is uniform. Accordingly, uneven polishing does not occur on the glass plate G, and the polishing quality of the glass plate G is improved. However, the mode in which the elastic sheet 220 is interposed in the film body 38 only for a part of the upper surface of the intermediate sheet 210 is not excluded.
　また、中間シート２１０は、引っ張り方向の剛性が吸着シート２００の引っ張り方向の剛性よりも高い材質のものが使用されている。中間シート２１０としては、ポリカーボネイト、アクリル、アルミニウム、鉄、ステンレス、ガラス、又は炭素繊維強化プラスチック（ＣＦＲＰ：Ｃａｒｂｏｎ　Ｆｉｂｅｒ　Ｒｅｉｎｆｏｒｃｅｄ　Ｐｌａｓｔｉｃｓ）からなるものを使用できる。これらの材料によって中間シート２１０を製造することにより、ガラス板Ｇの研磨中において引っ張り方向に伸縮しない剛性の高い中間シート２１０を提供できる。また、これらの材料の他、ＡＢＳ（Ａｃｒｙｌｏｎｉｔｒｉｌｅ　Ｂｕｔａｄｉｅｎｅ　Ｓｔｙｒｅｎｅ）、繊維強化プラスチック（ＦＲＰ：Ｆｉｂｅｒ　Ｒｅｉｎｆｏｒｃｅｄ　Ｐｌａｓｔｉｃｓ）も例示できる。 Further, the intermediate sheet 210 is made of a material whose rigidity in the pulling direction is higher than that of the suction sheet 200 in the pulling direction. The intermediate sheet 210 may be made of polycarbonate, acrylic, aluminum, iron, stainless steel, glass, or carbon fiber reinforced plastic (CFRP: Carbon Fiber Reinforced Plastics). By manufacturing the intermediate sheet 210 with these materials, it is possible to provide a highly rigid intermediate sheet 210 that does not expand or contract in the pulling direction during polishing of the glass plate G. In addition to these materials, ABS (Acrylonitrile Butadiene Styrene) and fiber reinforced plastics (FRP) can also be exemplified.
　一方、弾性シート２２０は、膜体３８の摺動方向の変形及び加圧方向の変形に追従して変形する機能を有し、その材料は発泡体を含む軟質樹脂材又はゴム系である。なお、ユニットシート２３０の作用、及び機能については後述する。 On the other hand, the elastic sheet 220 has a function of deforming following the deformation in the sliding direction and the deformation in the pressurizing direction of the film body 38, and the material thereof is a soft resin material or a rubber system including a foam. The operation and function of the unit sheet 230 will be described later.
　前述した昇降機構による押圧力によって吸着シート２００の下面がガラス板Ｇの上面に押し付けられる。これによって、ガラス板Ｇが吸着シート２００の下面に吸着されて膜枠１４に保持される。その後、膜枠１４が図１の搬送装置１５０に保持されて、図３の第１の研磨ステージ１８にガイドレール１７０に沿って搬送され、ここで膜枠１４が第１の研磨ステージ１８のキャリア５２に取り付けられる。また、第１の研磨ステージ１８によって研磨終了した膜枠１４（ガラス板Ｇが保持された膜枠１４）は、第１の研磨ステージ１８のキャリア５２から取り外された後、搬送装置１５２に保持される。そして、膜枠１４は、搬送装置１５２に保持されて、ガイドレール１７０に沿って第２の研磨ステージ２０に搬送され、ここで膜枠１４が第２の研磨ステージ２０のキャリア５２に取り付けられる。更に、第２の研磨ステージ２０によって研磨終了した膜枠１４は、第２の研磨ステージ２０のキャリア５２から取り外された後、搬送装置１５４に保持される。そして、膜枠１４は、搬送装置１５４に保持されて、ガイドレール１７０に沿ってステージ２２に搬送される。図３は、第１の研磨ステージ１８と第２の研磨ステージ２０との側面図である。 The lower surface of the suction sheet 200 is pressed against the upper surface of the glass plate G by the pressing force by the lifting mechanism described above. As a result, the glass plate G is adsorbed on the lower surface of the adsorbing sheet 200 and held on the film frame 14. Thereafter, the film frame 14 is held by the transfer device 150 of FIG. 1 and transferred along the guide rail 170 to the first polishing stage 18 of FIG. 3, where the film frame 14 is the carrier of the first polishing stage 18. 52 is attached. The film frame 14 (film frame 14 holding the glass plate G) that has been polished by the first polishing stage 18 is removed from the carrier 52 of the first polishing stage 18 and then held by the transfer device 152. The The film frame 14 is held by the transfer device 152 and transferred to the second polishing stage 20 along the guide rail 170, where the film frame 14 is attached to the carrier 52 of the second polishing stage 20. Further, the film frame 14 that has been polished by the second polishing stage 20 is removed from the carrier 52 of the second polishing stage 20 and then held by the transfer device 154. The film frame 14 is held by the transfer device 154 and transferred to the stage 22 along the guide rail 170. FIG. 3 is a side view of the first polishing stage 18 and the second polishing stage 20.
　膜枠１４は図２の如く、矩形の上枠４０と下枠４２とを備えている。矩形の膜体３８は、上枠４０と下枠４２との間で張設された後、上枠４０と下枠４２とを不図示のボルトによって締結することにより膜枠１４に固定される。なお、膜枠１４、及び膜体３８は矩形に限定されるものではなく円形であってもよい。 The film frame 14 includes a rectangular upper frame 40 and a lower frame 42 as shown in FIG. The rectangular film body 38 is stretched between the upper frame 40 and the lower frame 42 and then fixed to the film frame 14 by fastening the upper frame 40 and the lower frame 42 with bolts (not shown). The film frame 14 and the film body 38 are not limited to rectangles, and may be circular.
　図４は、ユニットシート２３０の要部拡大断面図である。図５は、ユニットシート２３０の構成を示した側面図である。図６は、膜枠１４が取り付けられたキャリア５２の要部拡大断面図である。 FIG. 4 is an enlarged cross-sectional view of a main part of the unit sheet 230. FIG. 5 is a side view showing the configuration of the unit sheet 230. FIG. 6 is an enlarged cross-sectional view of a main part of the carrier 52 to which the membrane frame 14 is attached.
　図４の如く膜体３８は、気密保持層４４と強度保持層４６とからなる二層構造に構成されている。気密保持層４４は図２及び図６に示すように、その外周部がキャリア５２の下部外周フレーム部５３に密着されてキャリア５２の空気室５４との間で気密を保持するシート材である。気密保持層４４の材料としてはゴム類、シリコーン類、フッ素樹脂、塩化ビニル（ＰＶＣ）等のビニル系、ナイロン系、又はウレタン系等を例示できる。 As shown in FIG. 4, the film body 38 has a two-layer structure including an airtight holding layer 44 and a strength holding layer 46. As shown in FIGS. 2 and 6, the airtight holding layer 44 is a sheet material whose outer peripheral portion is in close contact with the lower outer peripheral frame portion 53 of the carrier 52 and maintains airtightness with the air chamber 54 of the carrier 52. Examples of the material for the airtight holding layer 44 include rubbers, silicones, fluororesins, vinyl chlorides such as vinyl chloride (PVC), nylons, and urethanes.
　また、図４の強度保持層４６は、気密保持層４４を保持するとともに膜体３８全体を張設する張力に耐え得る所定の引っ張り強さを有するシート材である。強度保持層４６の材料としては、アラミド繊維、ステンレス製金網、スチール金網、炭素繊維、ガラス繊維、ナイロン繊維、金属シート、又は樹脂シート等であり、アラミド繊維が引っ張り力に対する伸びが極めて少ないという理由で好ましい。この強度保持層４６の下面に、弾性シート２２０の上面が接着剤によって接着されている。 Further, the strength holding layer 46 of FIG. 4 is a sheet material having a predetermined tensile strength that can withstand the tension that holds the airtight holding layer 44 and stretches the entire film body 38. The material for the strength retaining layer 46 is aramid fiber, stainless steel wire mesh, steel wire mesh, carbon fiber, glass fiber, nylon fiber, metal sheet, resin sheet or the like, and the reason that the aramid fiber has very little elongation against tensile force Is preferable. The upper surface of the elastic sheet 220 is bonded to the lower surface of the strength holding layer 46 with an adhesive.
　膜体３８を前記材料によって製造することによって、吸着シート２００に吸着されて保持されたガラス板Ｇに後述する加圧流体の圧力を均一に伝えることができる。 By manufacturing the film body 38 from the above material, the pressure of the pressurized fluid described later can be uniformly transmitted to the glass plate G adsorbed and held by the adsorption sheet 200.
　次に、図３に示す研磨ヘッド５０について説明するが、第１の研磨ステージ１８の研磨ヘッド５０と第２の研磨ステージ２０の研磨ヘッド５０は同一構造なので、同一の符号を付して説明する。 Next, the polishing head 50 shown in FIG. 3 will be described. Since the polishing head 50 of the first polishing stage 18 and the polishing head 50 of the second polishing stage 20 have the same structure, they will be described with the same reference numerals. .
　研磨ヘッド５０は、本体ケーシング５１にモータが内蔵され、このモータの出力軸が、鉛直方向に垂下されたスピンドル５６に連結されて構成される。このスピンドル５６にキャリア５２が連結されている。また、本体ケーシング５１は、昇降機構１５６を介してスライダ１５８に連結されている。この昇降機構１５６によって本体ケーシング５１がスライダ１５８に対して昇降されることにより、キャリア５２が第１の研磨ステージ１８の研磨パッド５８、及び第２の研磨ステージ２０の研磨パッド６０に対して進退移動される。したがって、キャリア５２が進出移動されると、吸着シート２００の下面に、その上面が吸着保持されたガラス板Ｇの下面（片面：研磨面）が研磨パッド５８、６０に接触する。 The polishing head 50 is configured such that a motor is built in a main body casing 51, and an output shaft of the motor is connected to a spindle 56 suspended in a vertical direction. A carrier 52 is connected to the spindle 56. The main body casing 51 is connected to the slider 158 via the lifting mechanism 156. The main body casing 51 is moved up and down with respect to the slider 158 by the lifting mechanism 156, so that the carrier 52 moves forward and backward with respect to the polishing pad 58 of the first polishing stage 18 and the polishing pad 60 of the second polishing stage 20. Is done. Therefore, when the carrier 52 moves forward, the lower surface (one surface: polishing surface) of the glass plate G on which the upper surface is sucked and held comes into contact with the polishing pads 58 and 60 on the lower surface of the suction sheet 200.
　研磨パッド５８は、研磨定盤６２の上面に貼り付けられ、研磨定盤６２の下部には、不図示のモータによって回転される回転軸６４が連結される。また、研磨パッド６０は、研磨定盤６６の上面に貼り付けられ、研磨定盤６６の下部には、不図示のモータによって回転される回転軸６８が連結されている。 The polishing pad 58 is attached to the upper surface of the polishing surface plate 62, and a rotating shaft 64 that is rotated by a motor (not shown) is connected to the lower portion of the polishing surface plate 62. The polishing pad 60 is affixed to the upper surface of the polishing surface plate 66, and a rotating shaft 68 that is rotated by a motor (not shown) is connected to the lower portion of the polishing surface plate 66.
　更に、本体ケーシング５１は、不図示の公転駆動機構に連結され、所定の公転半径で公転する機能も有している。なお、この公転駆動機構は、本体ケーシング５１にプラネタリーギア機構を内蔵し、プラネタリーギア機構の出力軸をスピンドル５６に連結することによっても構成できる。以上が第１の研磨ステージ１８、及び第２の研磨ステージ２０の構成であり、これらの第１の研磨ステージ１８、及び第２の研磨ステージ２０によってガラス板Ｇの下面が研磨され、ガラス板Ｇの表面の微小な凹凸やうねりが除去される。 Furthermore, the main body casing 51 is connected to a revolving drive mechanism (not shown) and has a function of revolving at a predetermined revolving radius. This revolution drive mechanism can also be configured by incorporating a planetary gear mechanism in the main body casing 51 and connecting the output shaft of the planetary gear mechanism to the spindle 56. The above is the configuration of the first polishing stage 18 and the second polishing stage 20, and the lower surface of the glass plate G is polished by the first polishing stage 18 and the second polishing stage 20, and the glass plate G Minute irregularities and undulations are removed from the surface.
　一方、第１の研磨ステージ１８のスライダ１５８には、直動ガイド７０、７０が取り付けられている。直動ガイド７０、７０はガイドレール７２、７２に嵌合されている。このガイドレール７２、７２は、図１の如く第１の研磨ステージ１８のスピンドル５６やキャリア５２をメンテナンスするメンテナンスステージ７４に向けて配設されている。 On the other hand, linear motion guides 70 are attached to the slider 158 of the first polishing stage 18. The linear motion guides 70, 70 are fitted to the guide rails 72, 72. As shown in FIG. 1, the guide rails 72 and 72 are arranged toward a maintenance stage 74 that maintains the spindle 56 and the carrier 52 of the first polishing stage 18.
　また、図３の如く第２の研磨ステージ２０のスライダ１５８にも同様に、直動ガイド７０、７０が取り付けられ、直動ガイド７０、７０はガイドレール１６０、１６０に嵌合されている。このガイドレール１６０、１６０は、図１の如く第２の研磨ステージ２０のスピンドル５６やキャリア５２をメンテナンスするメンテナンスステージ７６に向けて配設されている。 Also, as shown in FIG. 3, linear motion guides 70 and 70 are similarly attached to the slider 158 of the second polishing stage 20, and the linear motion guides 70 and 70 are fitted to the guide rails 160 and 160. As shown in FIG. 1, the guide rails 160 and 160 are disposed toward a maintenance stage 76 for maintaining the spindle 56 and the carrier 52 of the second polishing stage 20.
　キャリア５２は、図２の如くキャリア５２の上部外周部に吊上フレーム７８が不図示のボルトによって固定されている。吊上フレーム７８のキャリア５２の外周部から突出したフランジ部には、貫通孔８０、８０…が等間隔に複数個備えられ、これらの貫通孔８０、８０…に、摺動フレーム（ｓｌｉｄｅ－ｃｏｎｔａｃｔ　ｆｒａｍｅ）８２の上面に突設された吊具８４が図６の如く下方から貫通される。また、吊具８４は、吊上フレーム７８と吊上用皿ばね８６との間に配置された吊上ばね８８に貫通されるとともに、吊上用皿ばね８６の貫通孔９０に貫通され、スクリュウジャッキ９２に連結されている。 As shown in FIG. 2, the carrier 52 has a lifting frame 78 fixed to the upper outer peripheral portion of the carrier 52 by bolts (not shown). A plurality of through holes 80, 80... Are provided at equal intervals on the flange portion of the lifting frame 78 protruding from the outer periphery of the carrier 52, and a sliding frame (slide-contact) is provided in these through holes 80, 80. A hanger 84 projecting from the upper surface of the frame 82 is penetrated from below as shown in FIG. The lifting tool 84 is penetrated by a lifting spring 88 disposed between the lifting frame 78 and the lifting disk spring 86, and is also passed through the through hole 90 of the lifting disk spring 86, thereby screwing the screw. It is connected to a jack 92.
　したがって、スクリュウジャッキ９２を動作させ、吊具８４を吊上ばね８８の付勢力に抗して上方に引き上げると、摺動フレーム８２がキャリア５２に対して引き上げられる。これにより、摺動フレーム８２に着脱自在に取り付けられた膜枠１４が引き上げられて、膜体３８に所定の張力が付与される。 Therefore, when the screw jack 92 is operated and the lifting tool 84 is pulled upward against the urging force of the lifting spring 88, the sliding frame 82 is lifted with respect to the carrier 52. Thereby, the membrane frame 14 detachably attached to the sliding frame 82 is pulled up, and a predetermined tension is applied to the membrane body 38.
　キャリア５２には、図６の空気室５４に圧縮エア（加圧流体）を噴出する噴射口９８、９８…が複数形成される。これらの噴射口９８、９８…は、キャリア５２の上面に形成された空気室１００を介して、図３の破線で示すエア供給路１０２に連通される。エア供給路１０２は、研磨ヘッド５０に取り付けられた不図示のロータリジョイントを介して研磨ヘッド５０の外部に延設され、バルブ１０４を介してエアポンプ１０６に接続されている。したがって、バルブ１０４を開放すると、エアポンプ１０６からの圧縮エアがエア供給路１０２、空気室１００、及び噴射口９８を介して空気室５４に供給される。これにより、圧縮エアの圧力がユニットシート２３０を介してガラス板Ｇに伝達され、この圧力によってガラス板Ｇの下面が研磨パッド５８、６０に押し付けられて研磨される。 The carrier 52 is formed with a plurality of ejection ports 98, 98... For ejecting compressed air (pressurized fluid) into the air chamber 54 of FIG. These injection ports 98, 98... Communicate with an air supply path 102 indicated by a broken line in FIG. 3 through an air chamber 100 formed on the upper surface of the carrier 52. The air supply path 102 extends to the outside of the polishing head 50 via a rotary joint (not shown) attached to the polishing head 50, and is connected to an air pump 106 via a valve 104. Therefore, when the valve 104 is opened, compressed air from the air pump 106 is supplied to the air chamber 54 via the air supply path 102, the air chamber 100, and the injection port 98. Thereby, the pressure of compressed air is transmitted to the glass plate G through the unit sheet 230, and the lower surface of the glass plate G is pressed against the polishing pads 58 and 60 by this pressure and polished.
　一方、図２の如く膜枠１４の上枠４０には、複数のピン１０８、１０８…が等間隔に突設され、これらのピン１０８の上端部に備えられた、図６に示す円形のヘッド部１１０が、摺動フレーム８２の下部に固定されたフック１１２に係合される。これによって、膜枠１４が摺動フレーム８２に取り付けられる。ヘッド部１１０とフック１１２との係合力は、スクリュウジャッキ９２によって膜体３８を張り上げた時の膜体３８の反力によって強固になり、研磨時に膜体３８から受ける研磨抵抗ではフック１１２からヘッド部１１０が外れることはない。 On the other hand, as shown in FIG. 2, a plurality of pins 108, 108... Are projected at equal intervals on the upper frame 40 of the film frame 14, and the circular head shown in FIG. The part 110 is engaged with a hook 112 fixed to the lower part of the sliding frame 82. Thereby, the membrane frame 14 is attached to the sliding frame 82. The engaging force between the head portion 110 and the hook 112 is strengthened by the reaction force of the film body 38 when the film body 38 is lifted by the screw jack 92, and the polishing resistance received from the film body 38 during polishing causes the head portion from the hook 112. 110 does not come off.
　図１に示した第２の研磨ステージ２０でガラス板Ｇの研磨が終了すると、ここで膜枠１４がキャリア５２から取り外されて搬送装置１５４によってステージ２２に搬送される。 When the polishing of the glass plate G is completed at the second polishing stage 20 shown in FIG. 1, the film frame 14 is removed from the carrier 52 and transferred to the stage 22 by the transfer device 154.
　キャリア５２から膜枠１４を取り外す方法は、まず、図６に示したスクリュウジャッキ９２を緩める方向に動作させ、膜体３８の張力を解消する。次に、キャリア５２に対して膜枠１４を所定角度回動させてフック１１２からヘッド部１１０を取り外す。これにより、キャリア５２から膜枠１４が取り外される。 In the method of removing the film frame 14 from the carrier 52, first, the screw jack 92 shown in FIG. Next, the film frame 14 is rotated by a predetermined angle with respect to the carrier 52 to remove the head portion 110 from the hook 112. Thereby, the film frame 14 is removed from the carrier 52.
　図１に示したステージ２２では、搬送装置１５４で搬送されてきた膜枠１４のユニットシート２３０から、研磨終了したガラス板Ｇを剥ぎ取る。剥ぎ取られたガラス板Ｇは、コンベア１３８によって搬送され、そして、ロボット１４０のアーム１４２に取り付けられた吸着ヘッド１４４に吸着される。そして、ロボット１４０の動作によってガラス板搬出コンベア２４にガラス板Ｇが移載され、ガラス板搬出コンベア２４によって研磨装置１０の外部に搬出される。 In the stage 22 shown in FIG. 1, the polished glass sheet G is peeled off from the unit sheet 230 of the film frame 14 conveyed by the conveying device 154. The peeled glass plate G is transported by the conveyor 138 and sucked by the suction head 144 attached to the arm 142 of the robot 140. Then, the glass plate G is transferred to the glass plate carry-out conveyor 24 by the operation of the robot 140 and is carried out of the polishing apparatus 10 by the glass plate carry-out conveyor 24.
　ガラス板Ｇが剥ぎ取られた膜枠１４（ユニットシート２３０も含む）は、コンベア１４６によって膜枠洗浄ステージ２６に搬送され、ここで水洗浄される。洗浄終了した膜枠１４は、コンベア１４８によって膜枠乾燥ステージ２８に搬送され、ここで加熱されて乾燥される。そして、乾燥終了した膜枠１４は、膜枠返送コンベア３０によってステージ１６に搬送され、研磨前のガラス板Ｇの吸着保持に再使用される。以上が研磨装置１０の全体構成である。 The film frame 14 (including the unit sheet 230) from which the glass plate G has been peeled off is transported to the film frame cleaning stage 26 by the conveyor 146, where it is washed with water. The washed film frame 14 is conveyed to the film frame drying stage 28 by the conveyor 148, where it is heated and dried. Then, the dried film frame 14 is transported to the stage 16 by the film frame return conveyor 30 and reused for adsorbing and holding the glass plate G before polishing. The above is the overall configuration of the polishing apparatus 10.
　次に、前記の如く構成された研磨装置１０のユニットシート２３０による作用、機能について説明する。 Next, the operation and function of the unit sheet 230 of the polishing apparatus 10 configured as described above will be described.
　まず、この研磨装置１０は、膜体３８と吸着シート２００との間に、摺動方向の剛性及び加圧方向の剛性が吸着シート２００の摺動方向の剛性及び加圧方向の剛性よりも高い中間シート２１０が接着されているので、吸着シート２００が剥がれて捲り上がることを防止でき、ガラス板Ｇの破損を防止できる。 First, the polishing apparatus 10 has a sliding direction rigidity and a pressing direction rigidity between the film body 38 and the suction sheet 200 higher than the sliding direction rigidity and the pressing direction rigidity of the suction sheet 200. Since the intermediate sheet 210 is bonded, it is possible to prevent the adsorption sheet 200 from being peeled off and rising and preventing the glass plate G from being damaged.
　このような研磨装置１０において、図５の如く中間シート２１０と膜体３８との間に、膜体３８の摺動方向の変形及び加圧方向の変形に追従して変形する弾性シート２２０を介在させている。 In such a polishing apparatus 10, an elastic sheet 220 that deforms following the deformation in the sliding direction and the deformation in the pressing direction of the film body 38 is interposed between the intermediate sheet 210 and the film body 38 as shown in FIG. I am letting.
　図７は、膜体３８に矢印Ａで示す摺動方向、及び、矢印Ｂで示す加圧方向の力が研磨中に加わった際のユニットシート２３０の状態を示したユニットシート２３０の断面図である。 FIG. 7 is a cross-sectional view of the unit sheet 230 showing the state of the unit sheet 230 when a force in the sliding direction indicated by the arrow A and the pressure direction indicated by the arrow B is applied to the film body 38 during polishing. is there.
　ガラス板Ｇの研磨中に発生する研磨抵抗によって、中間シート２１０よりも摺動方向の剛性及び加圧方向の剛性の低い膜体３８は伸縮して変形し、その膜体３８の矢印Ａ及び矢印Ｂで示す方向の変形に追従して弾性シート２２０の端縁部２２０Ａが図７の如く弾性変形する。 Due to the polishing resistance generated during the polishing of the glass plate G, the film body 38 having a lower rigidity in the sliding direction and a lower rigidity in the pressurizing direction than the intermediate sheet 210 expands and contracts, and the film body 38 has arrows A and arrows. Following the deformation in the direction indicated by B, the edge portion 220A of the elastic sheet 220 is elastically deformed as shown in FIG.
　また、摺動方向の剛性及び加圧方向の剛性が膜体３８よりも高い中間シート２１０は研磨抵抗によって伸縮し難く変形し難いため、中間シート２１０と弾性シート２２０とには相対的なずれは発生しない。 Further, the intermediate sheet 210 having higher rigidity in the sliding direction and higher rigidity in the pressurizing direction than the film body 38 is difficult to expand and contract due to the polishing resistance, and is not easily deformed. Therefore, there is no relative displacement between the intermediate sheet 210 and the elastic sheet 220. Does not occur.
　したがって、実施の形態のユニットシート２３０によれば、膜体３８から弾性シート２２０は剥離せず、かつ、中間シート２１０から弾性シート２２０も剥離しないので、膜体３８から中間シート２１０が剥離するのを防止できる。これにより、ガラス板Ｇの研磨品質が向上する。 Therefore, according to the unit sheet 230 of the embodiment, since the elastic sheet 220 does not peel from the film body 38 and the elastic sheet 220 does not peel from the intermediate sheet 210, the intermediate sheet 210 peels from the film body 38. Can be prevented. Thereby, the grinding | polishing quality of the glass plate G improves.
　また、弾性シート２２０の材料を、発泡体を含む軟質樹脂（ウレタン系等）、又はゴム類とすることによって、膜体３８の引っ張り方向の変形に追従して弾性シート２２０が円滑に変形する。なお、弾性シート２２０の厚さは、弾性シート２２０の追従変形機能、及び研磨抵抗に耐え得る剛性を備える観点から１ｍｍ以上であることが好ましい。 In addition, by using a soft resin (urethane type or the like) containing a foam or rubber as the material of the elastic sheet 220, the elastic sheet 220 smoothly deforms following the deformation of the film body 38 in the pulling direction. In addition, it is preferable that the thickness of the elastic sheet 220 is 1 mm or more from the viewpoint of providing the following deformation function of the elastic sheet 220 and the rigidity capable of withstanding the polishing resistance.
　本発明における軟質樹脂は、第１の弾性回復率が１００％及び第２の弾性回復率が９５％以上の樹脂が好ましい。 The soft resin in the present invention is preferably a resin having a first elastic recovery rate of 100% and a second elastic recovery rate of 95% or more.
　軟質樹脂の第１の弾性回復率は以下の方法で計測する。初めに、軟質樹脂をゲージ等で挟み、圧縮前の軟質樹脂の厚さを測定する。次いで、軟質樹脂を所定の圧縮率になるようにプレス機にて圧縮する。次いで、数秒経過後に軟質樹脂の圧縮を開放して、１分後に軟質樹脂の厚さを測定する。最後に、圧縮前の軟質樹脂の厚さに対する圧縮後の軟質樹脂の厚さの比率（百分率）を算出し、当該比率を第１の弾性回復率とする。実施の形態のウレタンの第１の弾性回復率は、所定の圧縮率が４０％、６０％、７５％のとき、全て圧縮率において１００％である。 The first elastic recovery rate of the soft resin is measured by the following method. First, the soft resin is sandwiched with a gauge or the like, and the thickness of the soft resin before compression is measured. Next, the soft resin is compressed by a press so as to have a predetermined compression rate. Next, the compression of the soft resin is released after several seconds, and the thickness of the soft resin is measured after 1 minute. Finally, the ratio (percentage) of the thickness of the soft resin after compression to the thickness of the soft resin before compression is calculated, and the ratio is used as the first elastic recovery rate. The first elastic recovery rate of the urethane of the embodiment is 100% in the compression rate when the predetermined compression rate is 40%, 60%, and 75%.
　軟質樹脂の第２の弾性回復率は以下の方法で計測する。初めに、軟質樹脂をゲージ等で挟み、圧縮前の軟質樹脂の厚さを測定する。次いで、軟質樹脂を６０％の圧縮率になるようにプレス機にて圧縮する。次いで、１時間経過後に軟質樹脂の圧縮を開放して、１分後に軟質樹脂の厚さを測定する。最後に、圧縮前の軟質樹脂の厚さに対する圧縮後の軟質樹脂の厚さの比率（百分率）を算出し、当該比率を第１の弾性回復率とする。実施の形態のウレタンの第２の弾性回復率は、９５％である。 The second elastic recovery rate of the soft resin is measured by the following method. First, the soft resin is sandwiched with a gauge or the like, and the thickness of the soft resin before compression is measured. Next, the soft resin is compressed by a press so as to have a compression rate of 60%. Next, the compression of the soft resin is released after 1 hour, and the thickness of the soft resin is measured after 1 minute. Finally, the ratio (percentage) of the thickness of the soft resin after compression to the thickness of the soft resin before compression is calculated, and the ratio is used as the first elastic recovery rate. The second elastic recovery rate of the urethane of the embodiment is 95%.
　なお、実施の形態の吸着シート２００には図２、図５～図７に示すように、ガラス板Ｇを包囲する矩形の補助プレート２３２が吸着保持されている。 In addition, as shown in FIGS. 2 and 5 to 7, a rectangular auxiliary plate 232 surrounding the glass plate G is held by suction on the suction sheet 200 of the embodiment.
　この補助プレート２３２は、研磨時に研磨パッド５８を介してガラス板Ｇに付加される研磨圧によるガラス板Ｇの端部に生じる高圧力の緩和効果、つまりガラス板Ｇに掛かる研磨圧の偏重の防止、及び吸着シート２００の盛り上がりを防止するために配置されている。 The auxiliary plate 232 relaxes the high pressure generated at the end of the glass plate G due to the polishing pressure applied to the glass plate G through the polishing pad 58 during polishing, that is, prevents the polishing pressure from being applied to the glass plate G. And the suction sheet 200 are arranged to prevent the suction sheet 200 from rising.
　図５の如く補助プレート２３２とガラス板Ｇとの間の間隔Ｓは５ｍｍ以上であることが好ましい。間隔Ｓが５ｍｍ以上であれば、ガラス板Ｇ又は補助プレート２３２の配置位置が研磨中にずれても、ガラス板Ｇと補助プレート２３２が接触し難くなり、ガラス板Ｇが破損する虞がない。また、補助プレート２３２の厚さｔは、ガラス板Ｇの厚さ以下であることが好ましく、具体的には、補助プレート２３２の厚さｔとガラス板Ｇの厚さとの差が、－０．１ｍｍ～０ｍｍであることが好ましい。補助プレート２３２の厚さｔとガラス板Ｇの厚さとの差が、－０．１ｍｍ～０ｍｍであれば、ガラス板Ｇに掛かる研磨圧の偏重を防止できる。更に、補助プレート２３２の材質は、超高分子量ポリエチレン（ＵＰＥ）、ステンレス鋼（ＳＵＳ）、ポリテトラフルオロエチレン（テフロン（登録商標））などのフッ素樹脂、又はガラスエポキシなど耐摩耗性が高い材質が好ましい。補助プレート２３２のＤ硬度（ＩＳＯ　７６１９：２０１０に準ずる）が研磨パッド５８のＤ硬度よりも高ければ、研磨パッド５８が補助プレート２３２に接触しても補助プレート２３２は摩耗し難くなる。 As shown in FIG. 5, the distance S between the auxiliary plate 232 and the glass plate G is preferably 5 mm or more. If the distance S is 5 mm or more, even if the arrangement position of the glass plate G or the auxiliary plate 232 is shifted during polishing, the glass plate G and the auxiliary plate 232 are difficult to contact, and there is no possibility that the glass plate G is damaged. Further, the thickness t of the auxiliary plate 232 is preferably equal to or less than the thickness of the glass plate G. Specifically, the difference between the thickness t of the auxiliary plate 232 and the thickness of the glass plate G is −0. It is preferably 1 mm to 0 mm. If the difference between the thickness t of the auxiliary plate 232 and the thickness of the glass plate G is −0.1 mm to 0 mm, uneven polishing pressure applied to the glass plate G can be prevented. Furthermore, the material of the auxiliary plate 232 is made of a fluorine resin such as ultra high molecular weight polyethylene (UPE), stainless steel (SUS), polytetrafluoroethylene (Teflon (registered trademark)), or a material having high wear resistance such as glass epoxy. preferable. If the D-hardness (according to ISO 7619: 2010) of the auxiliary plate 232 is higher than the D-hardness of the polishing pad 58, the auxiliary plate 232 is not easily worn even if the polishing pad 58 contacts the auxiliary plate 232.
　このように、ガラス板Ｇを包囲するように補助プレート２３２を吸着シート２００によって吸着保持することにより、研磨時に生じる吸着シート２００が盛り上がりを抑制できるので、吸着シート２００が研磨パッド５８に接触して破れるのを防止できる。 In this way, by holding the auxiliary plate 232 with the suction sheet 200 so as to surround the glass plate G, the suction sheet 200 generated during polishing can be prevented from rising, so that the suction sheet 200 contacts the polishing pad 58. Can prevent tearing.
　また、実施の形態では、研磨対象の板状体としてフラットパネルディスプレイ等に用いる薄板ガラスを例示したが、これに限定されるものではなく、表面研磨が必要なガラス板であればよく、また、ガラスに限定されず、表面研磨が必要な金属製及び樹脂製の板状体であってもよい。 In the embodiment, the thin plate glass used for the flat panel display or the like is exemplified as the plate-like object to be polished. However, the present invention is not limited to this, and any glass plate that requires surface polishing may be used. It is not limited to glass, and may be a metal or resin plate that requires surface polishing.
　本発明を詳細に、また特定の実施態様を参照して説明したが、本発明の範囲と精神を逸脱することなく、様々な修正や変更を加えることができることは、当業者にとって明らかである。
　本出願は、２０１２年７月１８日出願の日本国特許出願２０１２－１５９３８２に基づくものであり、その内容はここに参照として取り込まれる。 Although the present invention has been described in detail and with reference to specific embodiments, it will be apparent to those skilled in the art that various modifications and variations can be made without departing from the scope and spirit of the invention.
This application is based on Japanese Patent Application 2012-159382 filed on July 18, 2012, the contents of which are incorporated herein by reference.
　Ｇ…ガラス板、１０…研磨装置、１２…コンベア、１４…膜枠、１６…ステージ、１８…第１の研磨ステージ、２０…第２の研磨ステージ、２２…ステージ、２４…ガラス板搬出コンベア、２６…膜枠洗浄ステージ、２８…膜枠乾燥ステージ、３０…膜枠返送コンベア、３２…ロボット、３３…アーム、３４…吸着パッド、３６…コンベア、３８…膜体、４０…上枠、４２…下枠、４４…気密保持層、４６…強度保持層、５０…研磨ヘッド、５１…本体ケーシング、５２…キャリア、５３…下部外周フレーム部、５４…空気室、５６…スピンドル、５８…研磨パッド、６０…研磨パッド、６２…研磨定盤、６４…回転軸、６６…研磨定盤、６８…回転軸、７０…直動ガイド、７２…ガイドレール、７４…メンテナンスステージ、７６…メンテナンスステージ、７８…吊上フレーム、８０…貫通孔、８２…摺動フレーム、８４…吊具、８６…吊上用皿ばね、８８…吊上ばね、９０…貫通孔、９２…スクリュウジャッキ、９８…噴射口、１００…空気室、１０２…エア供給路、１０４…バルブ、１０６…エアポンプ、１０８…ピン、１１０…ヘッド部、１１２…フック、１３８…コンベア、１４０…ロボット、１４２…アーム、１４４…吸着ヘッド、１４６、１４８…コンベア、１５０、１５２、１５４…搬送装置、１５６…昇降機構、１５８…スライダ、１６０…ガイドレール、１７０…ガイドレール、２００…吸着シート、２１０…中間シート、２２０…弾性シート、２３０…ユニットシート、２３２…補助プレート G ... Glass plate, 10 ... Polishing device, 12 ... Conveyor, 14 ... Film frame, 16 ... Stage, 18 ... First polishing stage, 20 ... Second polishing stage, 22 ... Stage, 24 ... Glass plate carry-out conveyor, 26 ... Film frame cleaning stage, 28 ... Film frame drying stage, 30 ... Film frame return conveyor, 32 ... Robot, 33 ... Arm, 34 ... Suction pad, 36 ... Conveyor, 38 ... Film body, 40 ... Upper frame, 42 ... Lower frame, 44 ... Airtight holding layer, 46 ... Strength holding layer, 50 ... Polishing head, 51 ... Main body casing, 52 ... Carrier, 53 ... Lower outer peripheral frame part, 54 ... Air chamber, 56 ... Spindle, 58 ... Polishing pad, DESCRIPTION OF SYMBOLS 60 ... Polishing pad, 62 ... Polishing surface plate, 64 ... Rotating shaft, 66 ... Polishing surface plate, 68 ... Rotating shaft, 70 ... Linear motion guide, 72 ... Guide rail, 74 ... Maintenance stage, 76 ... Men Nonce stage, 78 ... Lifting frame, 80 ... Through hole, 82 ... Sliding frame, 84 ... Suspension tool, 86 ... Lifting disc spring, 88 ... Lifting spring, 90 ... Through hole, 92 ... Screw jack, 98 DESCRIPTION OF SYMBOLS ... Injection port, 100 ... Air chamber, 102 ... Air supply path, 104 ... Valve, 106 ... Air pump, 108 ... Pin, 110 ... Head part, 112 ... Hook, 138 ... Conveyor, 140 ... Robot, 142 ... Arm, 144 ... Suction head, 146, 148 ... conveyor, 150, 152, 154 ... conveying device, 156 ... lifting mechanism, 158 ... slider, 160 ... guide rail, 170 ... guide rail, 200 ... suction sheet, 210 ... intermediate sheet, 220 ... elastic Sheet 230 ... Unit sheet 232 ... Auxiliary plate

Claims (4)

  1. 　板状体を吸着して保持する吸着シートと、前記吸着シートが取り付けられる膜体と、前記膜体が取り付けられるキャリアと、研磨パッドとを備え、前記膜体と前記キャリアとの間に加圧流体を供給し、前記吸着シートに吸着されて保持された前記板状体を前記加圧流体の圧力によって前記研磨パッドに押し付けて研磨する板状体の研磨装置であって、
    　前記膜体と前記吸着シートとの間に、引っ張り方向の剛性が前記吸着シートの引っ張り方向の剛性よりも高い中間シートが介在され、
    　前記中間シートと前記膜体との間に、該膜体の摺動方向の変形及び加圧方向の変形に追従して変形する弾性シートが介在されている板状体の研磨装置。     An adsorbing sheet that adsorbs and holds a plate-like body, a film body to which the adsorbing sheet is attached, a carrier to which the film body is attached, and a polishing pad, and pressurizing between the film body and the carrier A plate-like polishing apparatus that supplies fluid and presses and holds the plate-like body held by being adsorbed to the adsorption sheet against the polishing pad by the pressure of the pressurized fluid,
    Between the film body and the suction sheet, an intermediate sheet having a tension direction rigidity higher than the tension direction rigidity of the suction sheet is interposed,
    An apparatus for polishing a plate-like body, wherein an elastic sheet that deforms following the deformation in the sliding direction and the deformation in the pressing direction of the film body is interposed between the intermediate sheet and the film body.
  2. 　前記中間シートの前記膜体側の全面と前記膜体との間に、前記弾性シートが介在されている請求項１に記載の板状体の研磨装置。 The plate-like body polishing apparatus according to claim 1, wherein the elastic sheet is interposed between the entire surface of the intermediate sheet on the film body side and the film body.
  3. 　前記膜体は、ゴム類、シリコーン類、フッ素樹脂、ビニル系、ナイロン系、又はウレタン系からなる気密保持層と、アラミド繊維、ステンレス製金網、スチール金網、炭素繊維、ガラス繊維、ナイロン繊維、金属シート、又は樹脂シートからなる強度保持層とからなり、
    　前記中間シートは、ポリカーボネイト、アクリル、アルミニウム、鉄、ステンレス、ガラス、又は炭素繊維強化プラスチックからなり、
    　前記弾性シートは、発泡体を含む軟質樹脂、又はゴム類である請求項１又は２に記載の板状体の研磨装置。     The film body includes an airtight holding layer made of rubber, silicone, fluororesin, vinyl, nylon or urethane, and aramid fiber, stainless steel wire mesh, steel wire mesh, carbon fiber, glass fiber, nylon fiber, metal It consists of a strength retention layer consisting of a sheet or a resin sheet,
    The intermediate sheet is made of polycarbonate, acrylic, aluminum, iron, stainless steel, glass, or carbon fiber reinforced plastic,
    The plate-like body polishing apparatus according to claim 1, wherein the elastic sheet is a soft resin containing foam or rubber.
  4. 　請求項１～３のいずれか１項に記載の板状体の研磨装置を用いて板状体を研磨する板状体の研磨方法。 A plate-like polishing method for polishing a plate-like body using the plate-like polishing apparatus according to any one of claims 1 to 3.
PCT/JP2013/068433 2012-07-18 2013-07-04 Apparatus for polishing plate-like body and method for polishing plate-like body WO2014013887A1 (en)

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JP2012-159382 2012-07-18
JP2012159382A JP2015171734A (en) 2012-07-18 2012-07-18 Polishing device for plate-like body and polishing method for plate-like body

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000015572A (en) * 1998-04-29 2000-01-18 Speedfam Co Ltd Carrier and polishing device
JP2000167762A (en) * 1998-12-04 2000-06-20 Speedfam-Ipec Co Ltd Carrier and cmp device
WO2007020859A1 (en) * 2005-08-19 2007-02-22 Asahi Glass Company, Limited Substrate polishing apparatus and substrate polishing method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000015572A (en) * 1998-04-29 2000-01-18 Speedfam Co Ltd Carrier and polishing device
JP2000167762A (en) * 1998-12-04 2000-06-20 Speedfam-Ipec Co Ltd Carrier and cmp device
WO2007020859A1 (en) * 2005-08-19 2007-02-22 Asahi Glass Company, Limited Substrate polishing apparatus and substrate polishing method

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