JP2008238365A - Polishing machine of glass substrate, production line of glass substrate with film, and polishing method of glass substrate - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To remove only all of abnormal protrusions by polishing for a short time without reducing a film thickness of a normal film thickness portion. <P>SOLUTION: In this polishing machine of a glass substrate, while a polishing plate 20 to a polishing surface plate face 20a of which a fixing abrasive polishing sheet 23 as a polishing pad is adhered, is pressed to a surface of a glass substrate, on which a film is formed, a polishing plate is orbitally moved to the glass substrate, so as to polish the film on the surface of the glass substrate by the fixing abrasive polishing sheet. A clearance-adjusting pad 24 for keeping an optimum clearance between the surface of the glass substrate and the fixing abrasive polishing sheet by contacting the surface of the glass substrate before the fixing abrasive polishing sheet 23 and being smashed and deformed according to a pressing force when the polishing plate is pressed to the surface, is provided on the polishing surface plate face of the polishing plate. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention includes, for example, a polishing machine for polishing a film formed on a glass substrate such as a color filter for a liquid crystal display device, a production line for a glass substrate with a film provided with the polishing machine, and a glass using the polishing machine The present invention relates to a method for polishing a substrate.

  For example, the color filter CF for a liquid crystal display device shown in an exaggerated cross section in FIG. 10 has a structure in which a black matrix BM is formed on the surface of a flat glass substrate W, and an RGB (red green blue) film is formed thereon. However, if abnormal projections 300 are generated on the RGB film in the manufacturing process, it becomes an obstacle to the bonding of the panels. Therefore, as shown in FIG. If there is an abnormal protrusion, the abnormal protrusion is once removed from the line, and the abnormal protrusion is removed by the correction machine 130 installed off-line, and then returned to the conveyance line to obtain a finished color filter (CF). There are various causes for the occurrence of abnormal protrusions, but the most likely cause is that foreign matters are mixed in through human intervention.

  Generally, as shown in FIG. 10, the height of the RGB film thickness S1 + normal protrusion is 1.5 μm to 2.0 μm, and the height S2 of the abnormal protrusion 300 is about 10 to 40 μm. As shown in FIG. 11, in the past, when all the color filters CF were inspected (100%), abnormalities were detected at a rate of 10% to 20%. Yes. At this time, if there are a plurality of abnormal protrusions in one color filter, it is necessary to perform an operation of removing the abnormal protrusions one by one with the tape of the correction device 130, which is very time consuming. For example, when there are 20 abnormal protrusions in one color filter, it takes about 5 minutes to correct, so the production efficiency cannot be increased, resulting in an increase in cost.

  By the way, the thing of patent document 1 is known conventionally as a grinder of the colored layer of a color filter. In this polishing machine, a rectangular polishing plate having a long side longer than a short side of the glass substrate is formed on a surface of a stationary square glass substrate (color filter) on which a colored layer is formed. Placed parallel to the short side of the substrate, pressurizing the glass substrate surface with the polishing plate, and rotating the polishing plate in the short side direction of the glass substrate by rotating the polishing plate eccentrically about the vertical direction of the glass substrate The polishing plate is moved in the long side direction (perpendicular to the short side) of the glass substrate to polish the color filter surface. According to this polishing machine, an advantage that the entire surface of the glass substrate can be uniformly polished is obtained as compared with a conventional Oscar type polishing machine.

  However, it has been found that the above-described abnormal protrusions due to foreign matters and the like cannot be efficiently removed by a normal entire polishing process using a conventional polishing machine. In other words, since the conventional polishing machine is for polishing the entire surface, there is a possibility that the thickness of the normal film thickness portion may be reduced even though only the abnormal protrusion is desired to be polished.

JP 2004-195602 A

  In view of the above circumstances, the present invention includes a glass substrate polishing machine capable of removing all abnormal projections by polishing in a short time without reducing the film thickness of the normal film thickness portion, and the polishing machine. Another object is to provide a production line for a glass substrate with a film and a method for polishing a glass substrate using the polishing machine.

  The polishing machine for a glass substrate according to the invention of claim 1 is configured to press the polishing plate with a polishing pad attached to the surface of the polishing plate against the surface of the glass substrate on which the film is formed, In the glass substrate polishing machine that polishes the film on the surface of the glass substrate with the polishing pad, the polishing plate is pressed against the surface of the glass substrate against the polishing platen surface of the polishing plate. When the surface of the glass substrate is provided with a clearance adjustment pad that optimally maintains a gap between the surface of the glass substrate and the polishing pad by being crushed and deformed according to the pressing force before the polishing pad. It is said.

A second aspect of the present invention is the glass substrate polishing machine according to the first aspect, wherein the polishing pad is made of a fixed abrasive polishing sheet.
Here, as the fixed abrasive grains, for example, diamond or alumina is used, and the fixed abrasive polishing sheet is a diamond sheet formed by mixing these fixed abrasive grains into a resin material and forming into a sheet shape. An alumina sheet is meant.

  The invention of claim 3 is the glass substrate polishing machine according to claim 2, wherein the fixed abrasive polishing sheet is attached to the polishing platen surface of the polishing plate via an elastic sheet. It is a feature.

  The invention of claim 4 is the glass substrate polishing machine according to any one of claims 1 to 3, wherein the glass substrate is disposed below the conveyance path for conveying the glass substrate along the surface direction. A lower surface plate on which the substrate is placed is disposed, and a polishing head for polishing the upper surface of the glass substrate that has been conveyed is provided above the lower surface plate, and the polishing pad and the clearance are provided on the main body of the polishing head. The polishing plate as an upper surface plate is provided so as to be movable in the vertical direction with the adjustment pad facing downward, and the polishing plate is pressed against the glass substrate between the main body of the polishing head and the polishing plate; A pressing adjustment mechanism for adjusting the pressing force is provided, and the polishing head is orbitally moved so as to include at least a movement component in an in-plane direction perpendicular to the conveyance direction of the glass substrate. It is characterized in that a drive mechanism.

  A fifth aspect of the present invention is the glass substrate polishing machine according to the fourth aspect, wherein the polishing head is arranged with its length direction directed in a direction perpendicular to the conveying direction of the glass substrate. The length is such that one of the glass substrates conveyed on the conveyance path or a plurality of glass substrates conveyed in a state of being arranged in a direction orthogonal to the conveyance direction can be polished at a time. It is characterized by being set to.

  A sixth aspect of the present invention is the glass substrate polishing machine according to the fifth aspect, wherein a plurality of polishing pads are attached to the polishing plate in the transport direction of the glass substrate at intervals. It is characterized by that.

  A seventh aspect of the present invention is the glass substrate polishing machine according to any one of the fourth to sixth aspects, wherein the polishing plate is provided with a liquid supply port for supplying a liquid to a polishing surface by the polishing pad. It is characterized by being.

  The invention of claim 8 is the glass substrate polishing machine according to any one of claims 4 to 7, wherein the polishing plate is provided with a pressing chamber having an opening on a lower surface thereof, and the polishing plate The upper part of the polishing plate is accommodated in the pressing chamber, and the lower part of the polishing plate is protruded downward from the opening so that the polishing platen surface on the lower surface of the polishing plate is placed on the upper surface of the glass substrate being conveyed. Further, as the pressing adjustment mechanism, a pressurizing tube that expands into the pressing chamber by introducing pressurized gas and presses the upper end surface of the polishing plate downward, and the polishing plate A pressure tube is provided below the flange projecting to the left and right, expands by introduction of pressurized gas and presses the flange upward, and pressurizes the pressure tube and reaction tube. The pressure balance of the body, is characterized in that a pressure adjusting means for adjusting the pressing force of the polishing plate with respect to the glass substrate.

  The invention of claim 9 is the glass substrate polishing machine according to any one of claims 1 to 8, wherein the clearance adjustment pad includes only abnormal projections present on the film on the surface of the glass substrate. Further, the gap between the surface of the glass substrate and the polishing pad is maintained so that the polishing pad is in contact with the film having a normal thickness and is not in contact with the film having a normal thickness.

  The invention of claim 10 is the glass substrate polishing machine according to any one of claims 1 to 9, wherein the glass substrate on which the film is formed is a color filter of a display panel, and the film is It is an RGB colored film.

  The production line for a glass substrate with a film according to the invention of claim 11 is provided on a surface of the glass substrate on a conveyance line connecting between the carry-in portion of the glass substrate on which the film is formed and the carry-out portion of the finished glass substrate. An inspection machine for inspecting the state of the formed film is arranged, and a correction device for the glass substrate determined to be abnormal by the inspection machine is arranged outside the conveyance line, before the inspection machine on the conveyance line, A glass substrate polishing machine according to any one of claims 1 to 10 is arranged.

  The production line for a glass substrate with a film according to the invention of claim 12 includes a plurality of polishing means having different polishing specifications arranged on a transport line of the glass substrate on which the film is formed, and the plurality of polishing means. Among them, the glass substrate polishing machine according to any one of claims 1 to 10 is arranged as the most upstream polishing means in the conveyance direction of the glass substrate.

  The invention of claim 13 is a polishing method for polishing a film on the surface of a glass substrate using the glass substrate polishing machine according to any one of claims 1 to 10, wherein the glass substrate has a film formed thereon. The surface of the glass substrate is pressed by pressing a polishing plate having a polishing pad and a clearance adjustment pad affixed to the surface of the polishing platen, and the clearance adjustment pad is first crushed and deformed according to the pressing force. In this state, the polishing plate is moved in-plane with respect to the glass substrate, and the film on the surface of the glass substrate is polished with the polishing pad.

  According to the first aspect of the present invention, the surface of the polishing plate is provided with a clearance adjusting pad that is crushed and deformed before the polishing pad when the polishing plate is pressed against the surface of the glass substrate. Therefore, the clearance adjustment pad stopper function can keep the gap between the glass substrate and the polishing pad at an optimum gap for removing only abnormal protrusions. Therefore, only abnormal protrusions can be efficiently removed in a short time by polishing with the polishing pad without reducing the normal thickness of the film itself. Therefore, by passing all the glass substrates through this polishing machine, the number of offline correction operations can be greatly reduced, which can contribute to low-cost production. Further, by adjusting the pressing force applied to the polishing plate, the polishing pad can be brought into contact with the protrusion on the film that is lower than the abnormal protrusion. Therefore, it can be used for flattening or smoothing the film on the glass substrate.

  According to the invention of claim 2, since the polishing pad is made of a fixed abrasive polishing sheet, only abnormal protrusions can be removed in a short time.

  According to the invention of claim 3, since the fixed abrasive polishing sheet is attached to the polishing platen surface of the polishing plate via the elastic sheet, the elasticity of the elastic sheet allows the fixed abrasive polishing sheet to be adjusted relative to the clearance adjustment pad. The height can be adjusted, and the fixed abrasive polishing sheet can be brought into contact with the glass substrate with an appropriate pressing force.

  According to the invention of claim 4, since the polishing plate is provided in the polishing head so as to be movable in the vertical direction, and the polishing plate is pressed against the glass substrate by the press adjusting mechanism, the pressing force generated by the press adjusting mechanism, The gap between the polishing pad and the glass substrate can be adjusted by the balance with the elastic reaction force accompanying the deformation of the clearance adjustment pad.

  According to the invention of claim 5, since the length of the polishing head is set to a size capable of polishing one or more glass substrates at a time, abnormal projections can be efficiently removed in a short time. it can.

  According to the invention of claim 6, since a plurality of polishing pads are affixed to the polishing plate in the direction of transport of the glass substrate, the polishing plate only covers a part of the transported glass substrate, and the glass substrate When the polishing plate is applied to the entire surface, the method of hitting the polishing pad against the glass substrate can be made less biased.

  According to the seventh aspect of the present invention, by supplying a liquid (for example, pure water) to the polishing surface, polishing debris can be eliminated and generation of unnecessary scratches can be prevented.

  According to the invention of claim 8, the polishing plate can be pressed against the glass substrate by introducing the pressurized gas into the pressure tube provided between the main body of the polishing head and the polishing plate. In this state, the pressing force of the polishing plate against the glass substrate can be freely adjusted by introducing a pressurized gas into the reaction tube and adjusting the pressure balance between the pressure tube and the reaction tube. Further, the polishing plate can be separated from the glass substrate by releasing the pressure of the pressure tube and introducing pressure into the reaction tube.

  According to the ninth aspect of the present invention, the polishing pad can be applied only to the abnormal protrusion existing on the film on the surface of the glass substrate by the function of the clearance adjusting pad, and only the abnormal protrusion is removed without reducing the film thickness. can do.

  According to the tenth aspect of the present invention, it is possible to efficiently remove abnormal protrusions generated on the colored film of the color filter in a short time.

  According to the invention of claim 11, by incorporating a polishing machine in front of the inspection machine on the transfer line and carrying out a total inspection after polishing, the number of abnormality determinations can be greatly reduced, and the production efficiency can be improved. Can be planned.

  According to the invention of claim 12, a plurality of polishing means are arranged on the conveyance line of the glass substrate, and the polishing machine having the above-mentioned clearance adjustment pad is arranged as the most upstream polishing means. Thus, abnormal projections can be removed, and finish polishing can be performed by a subsequent polishing means, and polishing processing can be performed with a role shared on one transport line, thereby improving production efficiency.

  According to the invention of claim 13, since the clearance between the surface of the glass substrate and the polishing pad is optimally maintained by the crushing deformation of the clearance adjustment pad, the abnormal protrusion is not reduced without reducing the normal thickness of the film itself. Can be efficiently removed in a short time by polishing with a polishing pad.

Hereinafter, embodiments of the present invention will be described with reference to the drawings.
The polishing machine of this embodiment is for polishing the RGB film of the color filter for a liquid crystal display device, and FIG. 1 shows the main part of the production line of the glass substrate W (color filter) equipped with the polishing machine of the embodiment. FIG. 2 is a side view showing the structure of the main part, FIG. 3 is a cross-sectional view of the lower structure of the polishing plate as the upper platen, as viewed from the side in the conveyance direction of the glass substrate, and FIG. 3 is an enlarged view of a portion IV, FIG. 5 is an enlarged view similar to FIG. 4 showing a state when the polishing plate is pressed against the glass substrate, and FIG. 6 is a side of the glass substrate in the conveyance direction showing the configuration of the polishing head. It is sectional drawing seen from the direction, (a) is a state before pressing the polishing plate against the glass substrate, (b) is a sectional view showing a state where the polishing plate is pressed against the glass substrate, and FIG. Outline of polishing head viewed from the front side in the transport direction FIG. 8A is a cross-sectional view showing a state before the polishing plate is pressed against the glass substrate, FIG. 8B is a cross-sectional view showing a state where the polishing plate is pressed against the glass substrate, and FIG. It is a block diagram which shows the system configuration | structure at the time of incorporating.

  1 and 2, reference numeral 1 denotes a transfer conveyor (transfer path) for transferring a glass substrate W (corresponding to a color filter) in the direction of arrow A along the surface direction, and 3 denotes a lower side of the transfer path of the glass substrate W. A lower surface plate 10 on which the placed glass substrate W is placed is disposed above the lower surface plate 3, and a polishing head for polishing the upper surface of the glass substrate W that has been conveyed, and 20 is a main body 11 of the polishing head 10. It is a polishing plate as an upper surface plate provided. This polishing machine (portion represented by the polishing head 10) moves the polishing plate 20 relative to the glass substrate W while pressing the polishing plate 20 against the surface of the glass substrate W on which the RGB film is formed. Thus, the film on the surface of the glass substrate W is polished. The glass substrate W is a rectangular flat plate having a long side parallel to the conveyance direction A, with one short side being the front end, and being conveyed from the upstream side to the lower side of the polishing head 10, After being polished by the polishing head 10, it is conveyed downstream with the same posture and speed.

  As shown in FIGS. 3 to 5, the lower surface of the polishing plate 20 is a polishing surface plate surface 20a, and a fixed abrasive polishing sheet 23 as a polishing pad and a clearance adjustment pad 24 are provided on the polishing surface plate surface 20a. It is pasted. When the polishing plate 20 is pressed against the surface of the glass substrate W, the clearance adjusting pad 24 comes into contact with the surface of the glass substrate W before the fixed abrasive polishing sheet 23 and is crushed and deformed according to the pressing force. In order to maintain an optimum gap H2 (see FIG. 5; the optimum gap is several μm or less) between the surface of the glass substrate W and the fixed abrasive polishing sheet 23. As the fixed abrasive polishing sheet 23, a diamond sheet or an alumina sheet formed by mixing diamond abrasive grains or alumina abrasive grains in a resin material into a sheet shape is preferably used, and more preferably a diamond sheet is used. .

  The clearance adjusting pad 24 is made of urethane resin, urethane rubber, or the like, and protrudes from the lower surface of the fixed abrasive polishing sheet 23 by a predetermined dimension H1 (about 20 μm) when not pressed. The fixed abrasive polishing sheet 23 is affixed to the polishing surface plate surface 20a by a double-sided tape 22 via an elastic sheet (urethane rubber, urethane sheet or the like) 21, and the elastic sheet 21 provides a clearance adjustment pad. The height with respect to 24 is adjusted to come into contact with the glass substrate W with an appropriate pressing force. The specifications of each element in this case are as shown in Table 1 below.

  The polishing head 10 is arranged with its own length direction in a direction orthogonal to the conveyance direction A of the glass substrate W, and the length of the polishing head 10 is conveyed on the conveyance path, or the conveyance direction. The length is set such that all of a plurality of (two in the illustrated example) glass substrates W conveyed in a state of being arranged in a direction perpendicular to each other can be polished at a time. Further, two fixed abrasive polishing sheets 23 are affixed to the polishing platen surface 20a of the polishing plate 20 in parallel in the transport direction of the glass substrate W and spaced apart from each other in parallel. A clearance adjusting pad 24 is attached to the front and rear of the direction. Further, a pure water supply port (liquid supply port) for supplying pure water (liquid) to the polishing portion of the polishing plate 20 that is positioned between the two fixed abrasive polishing sheets 23. ) 13 is provided.

  As shown in FIGS. 3 and 6, the polishing plate 20 is provided on the main body 11 of the polishing head 10 so as to be movable in the vertical direction with the fixed abrasive polishing sheet 23 and the clearance adjustment pad 24 facing downward. As shown in FIG. 6, the main body 11 of the polishing head 10 is provided with a pressing chamber 14 having an opening 14 a on the lower surface, and the upper portion of the polishing plate 20 is accommodated inside the pressing chamber 14. The lower part of the polishing plate 20 protrudes downward from the opening 14a. The polishing surface plate surface 20a on the lower surface of the polishing plate 20 can be opposed to the upper surface of the glass substrate W being conveyed.

  Further, between the main body 11 of the polishing head 10 and the polishing plate 20, a pressure tube (also referred to as a main tube) 18 that presses the polishing plate 20 against the glass substrate W and adjusts the pressing force and a reaction force tube ( 19) (also referred to as a side tube). The pressurizing tube 18 is expanded by introducing pressurized air (or a gas other than air) and presses the polishing plate 20 downward. The ceiling wall of the pressing chamber 14 and the upper end wall of the polishing plate 20 are pressed. It is arranged between. The reaction force tube 19 is expanded by introducing pressurized air (or a gas other than air) and presses the polishing plate 20 upward against the pressure of the pressure tube 18. The plate 20 is disposed between the flange 25 projecting left and right of the plate 20 and the left and right flanges 15 of the opening 14 a on the main body 11 side of the polishing head 10. FIG. 6B shows the relationship between the downward force P1 due to the pressurizing tube 18 and the upward force P2 due to the reaction tube 19. As shown in FIG. 7, the pressurizing tube 18 and the reaction force tube 19 are disposed over substantially the entire length of the polishing plate 20.

  A pressure adjusting means (not shown) is connected to a pressurized air supply / discharge pipe (not shown) connected to the pressure tube 18 and the reaction force tube 19. The pressure adjusting means adjusts the pressing force of the polishing plate 20 against the glass substrate W by adjusting the pressure balance of the pressurized air introduced into the pressurizing tube 18 and the reaction force tube 19. The pressurizing tube 18 and the reaction force tube 19 constitute a pressing adjustment mechanism for adjusting the pressing force of the polishing plate 20 against the glass substrate W.

  In addition, although not illustrated, the polishing machine of the present embodiment moves the polishing head 10 in the in-plane direction perpendicular to the conveyance direction of the glass substrate W via the swing shaft 12 protruding from the upper end of the polishing head 10. A drive mechanism for orbital movement is included so as to include at least.

  FIG. 8 shows an outline of a production line for the color filter CF (glass substrate W). In the production line in this figure, the space between the color filter CF carry-in part 101 and the finished color filter CF carry-out part 102 is shown. An inspection machine 120 for inspecting the state of the RGB film of the color filter is disposed on the conveyance line 103 connecting the two, and a color filter correction machine 130 determined to be abnormal by the inspection machine 120 outside the conveyance line 103 (on-line). Is disposed, and the polishing machine 100 having the above-described configuration is disposed in front of the inspection machine 120 on the conveyance line 103.

Next, a method for polishing the film on the surface of the glass substrate using the polishing machine having the above-described configuration will be described.
When the glass substrate W is transported under the polishing head 10 by the transport conveyor 1, as shown in FIGS. 6B and 7B, pressurized air is introduced into the pressure tube 18 to polish the polishing plate. 20 is lowered. Further, pressurized air is also introduced into the reaction tube 19 to adjust the lowered position of the polishing plate 20, and the lower surface of the polishing plate 20 is pressed against the surface of the glass substrate W. At that time, the pressure balance between the pressurizing tube 18 and the reaction force tube 19 is adjusted to adjust the pressing force, and the clearance adjusting pad 24 is crushed and deformed according to the pressing force as shown in FIG. The gap between the surface of the substrate W and the fixed abrasive polishing sheet 23 is optimally adjusted. In this state, the polishing head 10 is eccentrically rotated with respect to the glass substrate W, whereby the film on the surface of the glass substrate W is polished with the fixed abrasive polishing sheet 23.

  In this case, the gap H2 between the surface of the glass substrate W and the fixed abrasive polishing sheet 23 at the time of pressing is only in the abnormal projection 300 (see FIG. 10) present on the film on the surface of the glass substrate W. It adjusts so that 23 may contact and it may become non-contact with respect to the film | membrane of normal thickness. Thereby, without reducing the normal thickness of the film itself (that is, without changing the surface state of the polished glass substrate W from that before polishing), only abnormal protrusions are polished by the fixed abrasive polishing sheet 23 for a short time. Can be removed efficiently. For example, the height of the abnormal projection portion that is 10 μm to 40 μm can be kept to 1 μm or less, and the remaining number of abnormal projections can be reduced to zero. Moreover, high-speed processing is possible, and the processing time of one glass substrate W can be reduced to 30 seconds or less.

  Therefore, as shown in FIG. 8, by passing all the glass substrates W through the polishing machine 100, the number of off-line correction operations can be greatly reduced, contributing to improvement in yield and production efficiency and low-cost production. can do. Further, by adjusting the pressing force applied to the polishing plate 20, the fixed abrasive polishing sheet 23 can be brought into contact with a protrusion on the film lower than the abnormal protrusion, so that the film on the glass substrate W is flattened. And smoothing can also be performed.

  In the above polishing machine, two fixed abrasive polishing sheets 23 are affixed to the polishing plate 20 in the transport direction of the glass substrate W with a gap therebetween, so a part of the transported glass substrate W It is possible to prevent the fixed abrasive polishing sheet 23 from touching the glass substrate W between the case where only the polishing plate 20 is applied and the case where the polishing plate 20 is applied to the entire surface of the glass substrate W.

  Further, by constantly supplying pure water to the polishing surface, polishing debris can be eliminated, so that unnecessary scratches caused by the polishing debris can be prevented.

  When the polishing is finished, as shown in FIGS. 6A and 7A, the pressurized air from the pressure tube 18 is extracted and the pressurized air is introduced into the reaction tube 19 to thereby polish the polishing plate. 20 can be raised, and the next glass substrate W can be prepared for loading.

FIG. 9 is a side view showing a case where three polishing means are installed on the production line.
In this illustrated example, three polishing means 100A, 100B, and 100C with different polishing specifications are arranged along the transfer conveyor 1 that constitutes the transfer line, and the most upstream polishing means 100A is as follows. By using the polishing machine having the above-described clearance adjusting pad 24 of the embodiment of the present invention, the abnormal projections are removed by the polishing machine. Further, the two polishing means 100B and 100C in the latter stage are configured to perform finish polishing. By doing so, the abnormal protrusion polishing removal process and the surface polishing process can be continuously performed on-line, and the RGB film of the color filter can be flattened and smoothed to improve the quality while increasing the production efficiency. be able to.

  For example, by surface refresh polishing, which is finish polishing, the projections of the RGB film on the black matrix BM can be lowered (0.4 to 0.6 μm → 0.2 μm or less) (flattening) and the surface roughness can be reduced. Ra = 5 to 8 nm → 2 nm or less (smoothing). The polishing units 100A, 100B, and 100C may be installed as independent polishing machines, but only the polishing head is provided as each of the polishing units 100A, 100B, and 100C, and other configurations are made common. May be.

It is a top view which shows the principal part structure of the manufacturing line of the glass substrate W (color filter) equipped with the polisher of embodiment of this invention. It is a side view which shows the principal part structure. It is sectional drawing seen from the side of the conveyance direction of the glass substrate which shows the lower part structure of the grinding | polishing plate as an upper surface plate. FIG. 4 is an enlarged view of a part IV in FIG. 3. FIG. 5 is an enlarged view similar to FIG. 4 showing a state when a polishing plate is pressed against a glass substrate. It is sectional drawing seen from the side of the conveyance direction of the glass substrate which shows the structure of a grinding | polishing head, (a) is the state before pressing a polishing plate against a glass substrate, (b) pressed the polishing plate against the glass substrate. It is sectional drawing which shows a state, respectively. It is a schematic sectional view of the polishing head viewed from the front side in the conveyance direction of the glass substrate, (a) is a state before pressing the polishing plate against the glass substrate, (b) is a state where the polishing plate is pressed against the glass substrate. It is sectional drawing shown, respectively. It is a block diagram which shows the system configuration | structure at the time of incorporating a grinder on-line on a production line. It is a side view which shows the case where the three grinding | polishing means are equipped on a production line. It is sectional drawing of the color filter for liquid crystal display devices. It is a block diagram which shows the system configuration | structure of the manufacturing line of the conventional color filter.

Explanation of symbols

1 Conveyor (transport route)
3 Lower surface plate 10 Polishing head 11 Polishing head body 13 Pure water supply port (liquid supply port)
14 Pressing chamber 18 Pressurizing tube 19 Reaction tube 20 Polishing plate 20a Polishing surface plate surface 21 Elastic sheet 23 Fixed abrasive polishing sheet (polishing pad)
24 Clearance adjustment pad 25 Flange 100 Polishing machine 120 Inspection machine 130 Correction machine 100A, 100B, 100C Polishing means H2 Optimal gap W Glass substrate CF Color filter A Transport direction of glass substrate

Claims (13)

The surface of the glass substrate is moved by moving the polishing plate in-plane with respect to the glass substrate while pressing the polishing plate with a polishing pad attached to the surface of the polishing platen on the surface of the glass substrate on which the film is formed. In a glass substrate polishing machine for polishing the film of the film with the polishing pad,
When the polishing plate is pressed against the surface of the glass substrate on the polishing platen surface of the polishing plate, the surface of the glass substrate is crushed and deformed according to the pressing force before the polishing pad, and A glass substrate polishing machine comprising a clearance adjustment pad for optimally maintaining a gap between a surface and a polishing pad.   The glass substrate polishing machine according to claim 1, wherein the polishing pad is made of a fixed abrasive polishing sheet.   The glass substrate polishing machine according to claim 2, wherein the fixed abrasive polishing sheet is attached to a polishing platen surface of the polishing plate via an elastic sheet. The lower surface plate on which the glass substrate is placed is arranged below the conveyance path for conveying the glass substrate along the surface direction,
A polishing head for polishing the upper surface of the glass substrate that has been conveyed is provided above the lower surface plate,
In the main body of this polishing head, the polishing pad and the clearance adjustment pad are directed downward, and the polishing plate as an upper surface plate is provided so as to be movable in the vertical direction,
Provided between the main body of the polishing head and the polishing plate is a pressing adjustment mechanism that presses the polishing plate against the glass substrate and adjusts the pressing force;
The drive mechanism for orbitally moving the polishing head so as to include at least a movement component in an in-plane direction orthogonal to the conveyance direction of the glass substrate is provided. A polishing machine for a glass substrate as described in 1.   The polishing head is arranged with its length direction in a direction orthogonal to the transport direction of the glass substrate, and the length is one sheet transported on the transport path, or the transport direction 5. The glass substrate polishing machine according to claim 4, wherein the glass substrate polishing machine is set to a length capable of polishing all of a plurality of glass substrates conveyed in a state of being arranged in a direction orthogonal to the horizontal direction.   The glass substrate polishing machine according to claim 5, wherein a plurality of polishing pads are affixed to the polishing plate in the conveying direction of the glass substrate with a space therebetween.   The glass substrate polishing machine according to claim 4, wherein the polishing plate is provided with a liquid supply port for supplying a liquid to a polishing surface by the polishing pad. The main body of the polishing head is provided with a pressing chamber having an opening on the lower surface, the upper portion of the polishing plate is accommodated in the pressing chamber, and the lower portion of the polishing plate is protruded downward from the opening to polish the polishing plate. The polishing platen surface on the lower surface of the plate can be opposed to the upper surface of the glass substrate being conveyed,
Further, as the pressure adjusting mechanism, a pressure tube which expands by introducing pressurized gas and presses the upper end surface of the polishing plate downwards and protrudes to the left and right of the polishing plate as the pressure adjusting mechanism. A reaction force tube that is disposed under the flange and expands by introduction of pressurized gas and presses the flange upward, and the pressure of the pressurized gas introduced into the pressure tube and the reaction force tube The glass substrate polishing machine according to any one of claims 4 to 7, further comprising pressure adjusting means for adjusting a pressing force of the polishing plate against the glass substrate by balance.   The surface of the glass substrate so that the clearance adjustment pad is in contact with only the abnormal projections present on the film on the surface of the glass substrate and is not in contact with the film of normal thickness. The glass substrate polishing machine according to claim 1, wherein the glass substrate polishing machine is used for maintaining a gap between the polishing pad and the polishing pad.   The glass substrate polishing machine according to claim 1, wherein the glass substrate on which the film is formed is a color filter of a display panel, and the film is an RGB colored film. .   An inspection machine for inspecting the state of the film formed on the surface of the glass substrate is disposed on the conveyance line connecting the carry-in part of the glass substrate on which the film is formed to the carry-out part of the glass substrate of the finished product, The glass substrate correction apparatus of the glass substrate determined to be abnormal by the said inspection machine is arrange | positioned outside a conveyance line, and the glass substrate of any one of Claims 1-10 in front of the said inspection machine on the said conveyance line. A production line for a film-coated glass substrate, wherein a polishing machine is disposed.   A plurality of polishing means having different polishing specifications are disposed on the glass substrate transfer line on which the film is formed, and among these multiple polishing means, the most upstream polishing means in the glass substrate transfer direction. A production line for a glass substrate with a film, wherein the glass substrate polishing machine according to any one of claims 1 to 10 is disposed. A polishing method for polishing a film on the surface of a glass substrate using the glass substrate polishing machine according to any one of claims 1 to 10,
Pressing a polishing plate with a polishing pad and a clearance adjustment pad affixed to the surface of a glass substrate on which a film is formed, and deforming the clearance adjustment pad first according to the pressing force In this state, the gap between the surface of the glass substrate and the polishing pad is optimally maintained, and in this state, the polishing plate is moved in-plane with respect to the glass substrate, thereby polishing the film on the surface of the glass substrate with the polishing pad. A method for polishing a glass substrate, comprising:

Images