WO2013143350A1 - Solar cell, module and method for manufacturing solar cell electrode - Google Patents

Solar cell, module and method for manufacturing solar cell electrode Download PDF

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Publication number
WO2013143350A1
WO2013143350A1 PCT/CN2013/000361 CN2013000361W WO2013143350A1 WO 2013143350 A1 WO2013143350 A1 WO 2013143350A1 CN 2013000361 W CN2013000361 W CN 2013000361W WO 2013143350 A1 WO2013143350 A1 WO 2013143350A1
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WIPO (PCT)
Prior art keywords
solar cell
metal
cell electrode
manufacturing
alloy layer
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PCT/CN2013/000361
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French (fr)
Chinese (zh)
Inventor
葛剑
杨健
陈如龙
钱洪强
陈丽萍
王晓晖
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无锡尚德太阳能电力有限公司
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Publication of WO2013143350A1 publication Critical patent/WO2013143350A1/en

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0216—Coatings
    • H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0224—Electrodes
    • H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
    • H01L31/068—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic Table
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/547—Monocrystalline silicon PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Definitions

  • the present invention relates to electrochemical deposition metal technology, and more particularly to a solar cell, a module, and a method of fabricating a solar cell electrode. Background technique
  • the conductive electrodes of commercial solar cells are produced by screen printing, on the cathode surface of the solar cell, that is, the front side is brushed with silver paste, the anode surface, that is, the back side is brushed with aluminum paste, and then subjected to high temperature co-firing.
  • a conductive cathode and an anode are simultaneously formed on the cathode and the anode of the solar cell.
  • the solar cell conductive electrode generating method has the advantages that the process is simple and reliable, and is easy to be applied in mass production.
  • the simple process of screen printing and co-firing to produce a solar cell conductive electrode limits the improvement of the photoelectric conversion efficiency of the solar cell.
  • the so-called selective diffusion process refers to generating two different values of sheet resistance in different regions of the emitter of the solar cell, that is, having a lower sheet resistance in the region where the metal conductive electrode is formed and a higher surface on the other light receiving surface. Square resistance.
  • This process design not only increases the short-circuit current of the solar cell, but also reduces the contact resistance between the metal wire and the solar cell. Therefore, the selective diffusion process is one of the main measures to improve the photoelectric conversion efficiency of solar cells.
  • the width of the metal gate line In order to improve the shielding of the metal substrate from the area of the battery substrate, it is necessary to reduce the width of the metal gate line; however, to reduce the series resistance of the solar cell, it is necessary to increase the width of the metal gate line; therefore, a metal having a high aspect ratio is required.
  • the grid lines balance the shading and series resistance, but the formation of metal grid lines with a high aspect ratio has very high requirements on the screen printing process parameters and printing paste.
  • the buried-gate solar cell solves the problem encountered in screen printing a gate line of a higher aspect ratio by forming a metal conductive electrode on the emitter of the solar cell by chemically depositing copper.
  • the specific method is to cover the surface of the emitter having a large square resistance with a passivation film or an anti-reflection film, and after performing a deep diffusion on the passivation film by using a laser, thereby reducing the grooved area of the emitter surface.
  • the square resistance, and finally the method of chemically depositing metal generates a metal conductive electrode of the solar cell in an emitter region having a lower sheet resistance.
  • the process of chemically depositing copper is a rather slow chemical process, which typically takes about ten hours to reach the desired thickness of the metal conductive electrode.
  • the chemically deposited metal solution has a relatively short service life and generally cannot be used only after several batches. Therefore, the method of chemically depositing metal generates a large amount of waste water when used in mass production.
  • the solution of the chemically deposited metal is quite unstable, and the phenomenon of self-deposition of the metal is likely to occur, which affects normal production.
  • the control of the process conditions for chemically deposited metals is also very demanding.
  • One of the ways to solve the above problems of chemical deposition is to replace the process of chemically depositing metals with an electroplating process.
  • An advantage of the electroplating process over chemically deposited metals is the speed at which the metal is deposited.
  • the generation time of the conductive electrode of the solar cell can be shortened from the process of chemically depositing the metal by nearly ten hours to one hour.
  • the process of preparing the conductive electrodes of the solar cell can be completed in ten minutes. It has low temperature requirements and can be operated at room temperature, which is beneficial to production control and saves the cost of heating.
  • the composition of the electrolyte used for electroplating is also very simple, so in general, the electrolyte can be used repeatedly for a long time.
  • the solar cell electrode formed by the electroplating process is inferior in strength.
  • the interconnect strip cannot be directly soldered to the electrode formed by the electroplating process, and the conductive paste is usually used.
  • the method of bonding the interconnecting strip to the solar cell electrode formed by the electroplating process, and the technique of connecting the interconnecting strip and the solar cell electrode with the conductive adhesive has a problem of poor reliability.
  • the present invention provides a method for manufacturing a solar cell electrode, comprising the steps of: a. performing a texturing and cleaning of a battery substrate, and shallowly diffusing a front surface thereof to form a PN junction; b.
  • a passivation anti-reflection film on the front side of the subsequent battery substrate; c, performing deep-depth dispersion on the electrode area on the front surface of the battery substrate; d, performing passivation treatment on the back surface of the battery substrate; Electrode area on the front side of the passivated battery substrate Forming a first metal to form a seed layer; f, forming a second metal or metal alloy layer on the seed layer by spraying or printing; g, disposing the battery substrate in an electrochemical deposition device for electrochemical deposition A third metal or metal alloy layer is formed on the second metal or metal alloy layer.
  • a first metal is formed by chemical deposition on a front electrode region of a battery substrate and sintered to form a seed layer.
  • the first metal is nickel
  • the sintering temperature is 200 ° C to 500 ° C.
  • a second metal or metal alloy layer is formed by screen printing, and a drying treatment is performed; the temperature of the drying treatment is 100. C ⁇ 500. C.
  • the step c includes the following steps: c0, forming a groove on a front main gate line and a sub-gate line portion of the battery substrate; c2, cleaning the groove and performing deep diffusion .
  • the step c includes the steps of: cl clearing and cleaning the passivation anti-reflection film on the front main gate line and the sub-gate line portion of the battery substrate; c2, on the main gate The line and the sub-gate line are deeply diffused.
  • the method further comprises the step of forming a second metal or metal alloy layer on the third metal or metal alloy layer by spraying, printing, electrochemical deposition or chemical deposition.
  • the second metal or metal alloy layer is silver
  • the third metal or metal alloy layer is copper
  • step d by spraying, printing
  • the aluminum substrate is brushed or sputtered and heat treated to passivate the back surface of the battery substrate; the heat treatment temperature is greater than the silicon-aluminum eutectic temperature of 577 ° C.
  • the present invention also provides a solar cell, the electrode of which is fabricated by the above-described method of manufacturing a solar cell electrode.
  • the present invention further provides a solar cell module comprising a plurality of solar cells as described above arranged in rows/columns.
  • the solar cell electrode of the present invention Compared with the prior art solar cell electrode formed only by electroplating, the solar cell electrode of the present invention and the method of manufacturing the same, after chemically depositing a seed layer, then forming a second metal or metal on the seed layer by spraying or printing An alloy layer, followed by electrochemical deposition to form a third metal or metal alloy layer on the second metal or metal alloy layer, thereby increasing the strength of the solar cell electrode, thereby enabling the electrode to be connected to the interconnecting strip by soldering, and effective Improve battery reliability.
  • FIG. 1 is a flow chart of a first embodiment of a method for manufacturing a solar cell electrode of the present invention
  • FIG. 2 is a flow chart of a second embodiment of a method for manufacturing a solar cell electrode of the present invention
  • 4 is a schematic structural view of a second embodiment of a solar cell according to the present invention
  • FIG. 5 is a schematic structural view of a third embodiment of a solar cell according to the present invention.
  • a method for manufacturing a solar cell electrode of the present invention first performs a step S10 of performing a process of texturing and cleaning a battery substrate, wherein the battery substrate is a single crystal wafer or a polycrystalline silicon wafer. Needle For the single crystal and polycrystalline tantalum sheets, the different method of texturing is used. When it is a single crystal sheet, an alkaline solution such as potassium hydroxide or sodium hydroxide is used to form a pyramid-like suede on the tantalum sheet.
  • an acidic solution such as hydrofluoric acid, nitric acid or acetic acid is used to form a porous suede on the polycrystalline silicon flakes; and the flakes are washed with hydrochloric acid, hydrofluoric acid solution and deionized water in sequence. Wait.
  • the polycrystalline fluorene is fluffed with a mixed solution of hydrofluoric acid and nitric acid.
  • shallow diffusion of the front surface of the battery substrate forms a PN junction.
  • the back faces of the two cymbals are relatively bonded into a group, and the cymbals are fed into the furnace for single-sided diffusion.
  • the liquid source is phosphorus oxychloride (P0C13), and the diffusion temperature range of the liquid source is 850. °C, the diffusion time range is 30min, and the sheet resistance of the battery substrate is 100 ⁇ / ⁇ .
  • the monolithic wafer can be spread on both sides and then the PN junction on the back side of the wafer can be removed by chemical etching.
  • a passivation anti-reflection film is deposited on the front side of the battery substrate after the shallow diffusion.
  • the passivation anti-reflection film is tantalum nitride, and the tantalum nitride is formed by plasma enhanced chemical vapor deposition.
  • a groove is formed in the front gate line and the sub-gate line portion of the front surface of the battery substrate.
  • the grooves may be formed by laser scribing, and in other embodiments, the grooves may be formed by chemical etching.
  • the groove is cleaned and deep dispersed.
  • the back faces of the two cymbals are relatively bonded into a group, and the cymbals are fed into the furnace for single-sided diffusion.
  • the liquid source is phosphorus oxychloride (P0C13), and the diffusion temperature range of the liquid source is 850. °C, the diffusion time range is 30min.
  • the sheet resistance of the main gate line and the sub-gate line is 300/ ⁇ , while the sheet resistance of other areas is still 100 ⁇ / ⁇ .
  • the back surface of the battery substrate is subjected to passivation treatment.
  • the back surface of the battery substrate is passivated by spraying, printing or sputtering aluminum and heat treatment.
  • the temperature of the heat treatment is greater than the yttrium aluminum eutectic temperature of 577 °C.
  • a passivation layer for example, tantalum oxide, tantalum nitride, or a composite layer of tantalum oxide and tantalum nitride
  • a passivation layer may be first deposited to passivate the back surface of the battery substrate, and then sprayed, printed, or splashed. Aluminium is shot and heat treated; it is also possible to deposit a passivation layer and then form a local contact opening in the passivation layer, followed by spraying, printing or sputtering aluminum and heat treatment to form a backside local passivation (Real Locally Diffused).
  • S16 chemically depositing a first metal to form a seed layer on an electrode region on the front side of the passivated battery substrate.
  • the first metal is nickel, and the sintering temperature is 200 ° C ⁇ 500 . C.
  • a second metal or metal alloy layer is formed on the seed layer by spraying or printing.
  • the second metal or metal alloy layer is silver, and a second metal or metal alloy layer is formed by screen printing, and is subjected to a drying process, and the temperature of the drying process is 100° C. to 500. °C.
  • the battery substrate is disposed in an electrochemical deposition device for electrochemical deposition on the second metal or metal alloy layer to form a third metal or metal alloy layer.
  • the third metal or metal alloy layer is copper. As shown in FIG.
  • steps S20, S21, and S22 of the second embodiment of the method for manufacturing a solar cell electrode of the present invention are the same as steps S10, S11, and S12 of the first embodiment shown in FIG. 1, respectively. Narration.
  • the second embodiment proceeds to step S23 to remove the passivation anti-reflection film on the front main gate line and the sub-gate line portion of the battery substrate and perform cleaning.
  • the anti-reflection film of the main gate line and the sub-gate line portion can be removed by screen printing etching the slurry and washed by deionized water or alkali solution.
  • step S24 deep diffusion is performed at the main gate line and the sub-gate line portion.
  • the step S24 is basically the same as the implementation process of the step S14 of the first embodiment, and details are not described herein again.
  • the subsequent steps S25 to S28 of the second embodiment are respectively consistent with the steps S15 to S18 in the first embodiment, and details are not described herein again.
  • a second metal or metal alloy layer is deposited on the third metal or metal alloy layer by electrochemical deposition or chemical deposition after step S18 or S28 is performed.
  • a solar cell electrode is formed on the battery substrate 2, and the solar cell electrode includes a seed layer 10, a second metal or metal alloy layer 11, and a third metal or metal.
  • An alloy layer 12 the seed layer 10 is covered in a groove on the battery substrate 2, and the second metal or metal alloy layer 11 and the third metal or metal alloy layer 12 are sequentially laminated on the seed layer 10. on.
  • the seed layer 10 is nickel, and the second metal or metal alloy layer 11 and the third metal or metal alloy layer 12 are silver and copper, respectively.
  • a solar cell electrode is formed on the battery substrate 2, and the solar cell electrode includes a seed layer 10, a second metal or metal alloy layer 11, a third metal or metal.
  • the second embodiment of the solar cell electrode of the present invention shown in FIG. 4 is different from the first embodiment shown in FIG. 3 in that the solar cell electrode of the second embodiment is electrochemically deposited to form a second metal or metal alloy layer. 12 is also passed through spraying, printing, electrochemical deposition or chemical deposition, etc.
  • a second metal or metal alloy layer 13 is formed on the second metal or metal alloy layer 12. Referring to FIG.
  • a solar cell electrode is formed on the battery substrate 2, and the solar cell electrode includes a seed layer 30, a second metal or metal alloy layer 31, and a third metal or metal. Alloy layer 32.
  • the difference between the third embodiment shown in FIG. 5 and the first embodiment shown in FIG. 3 is that the battery substrate 2 of the third embodiment is not provided with a groove, and the solar cell electrode is directly formed on the battery substrate 2. On the surface.
  • the present invention also provides a solar cell module comprising a plurality of solar cells as described above arranged in rows/columns.
  • the solar cell electrode of the present invention and the method for fabricating the same are formed by chemical deposition to form a seed layer, followed by spraying or printing on the seed layer to form a second metal or metal alloy layer, followed by electrochemical deposition.
  • a third metal or metal alloy layer is formed on the second metal or metal alloy layer, thereby increasing the strength of the solar cell electrode, so that the electrode can be connected to the interconnecting strip by soldering, and the reliability of the battery is effectively improved.

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Abstract

A solar cell, a module and a method for manufacturing solar cell electrode are provided. Firstly, texturing and washing a cell substrate (2), then carrying out a shallow diffusion at the front side of the substrate to form a PN junction, thereafter depositing a passivation-antireflection film, then carrying out a deep diffusion in the electrode region at the front side of the substrate and passivating the rear side of the substrate. After that, chemically depositing a first metal in the electrode region at the front side of the substrate to form a seed layer (10, 30), then forming a second metal or metal alloy layer (11, 31) on the seed layer (10, 30) by spray-coating or printing, finally forming a third metal or metal alloy layer (12, 32) on the second metal or metal alloy layer (11, 31) by electrochemically depositing. The present invention can improve the robustness of the solar cell electrode, so as to enhance the reliability of a corresponding solar cell module.

Description

一种太阳电池、 组件及太阳电池电极的制造方法 域 本发明涉及电化学沉积金属技术， 特别涉及一种太阳电池、 组件 及太阳电池电极的制造方法。 背景技术  FIELD OF THE INVENTION The present invention relates to electrochemical deposition metal technology, and more particularly to a solar cell, a module, and a method of fabricating a solar cell electrode. Background technique
目前绝大多数商业化太阳能电池的导电电极生成方法是， 用丝网 印刷的方法， 在太阳能电池的阴极表面即正面刷上银浆、 在阳极表面 即背面刷上铝浆， 再经过高温共烧， 在所述太阳能电池的阴极和阳极 上同时生成导电阴极和阳极。 这种太阳能电池导电电极生成方法的优 点是工艺简单可靠， 容易在大规模生产上得到应用。 但是， 丝网印刷和共烧生成太阳能电池导电电极的简单工艺限制 了太阳能电池的光电转换效率的提高。 为了确保丝网印刷的浆料在共 烧后能与太阳能电池的表面有较好的欧姆接触， 降低太阳能电池的串 联电阻， 不仅必须采用较粗的金属副栅线的设计 （一般大于 ΙΟΟμπι ), 而且还必须采用较低的发射极方块电阻的设计（一般在 50Ω/Π )。 较粗 的金属副栅线的设计降低了太阳能电池的有效工作面积， 而较低的发 射极方块电阻的设计降低了太阳能电池的短路电流， 这是目前商业化 太阳能电池的光电转换效率偏低的主要原因。 很明显， 提高太阳能电池的光电转换效率的主要措施之一是提高 其发射极的方块电阻。 但是， 太阳能电池发射极的方块电阻提高后， 如果继续采用丝网印刷浆料和共烧的工艺， 将会增加太阳能电池的接 触电阻， 从而降低太阳能电池的光电转换效率。 因此， 提高太阳能电 池发射极的方块电阻后必须解决的问题之一是降低金属导电电极和太 阳能电池之间的接触电阻。 解决上述问题的方法之一是采用选择性扩散工艺。 所谓的选择性 扩散工艺是指在太阳能电池的发射极的不同区域生成两种不同值的方 块电阻， 即， 在生成金属导电电极的区域具有较低的方块电阻， 在其 它受光表面具有较高的方块电阻。 这种工艺设计既能提高太阳能电池 的短路电流， 又能降低金属导线和太阳能电池之间的接触电阻。 因此， 选择性扩散工艺是提高太阳能电池的光电转换效率的主要措施之一。 为提高金属栅极对电池基片面积的遮挡， 需要减小金属栅线的宽 度； 但要降低太阳电池的串联电阻， 就需要提高金属栅线的宽度； 因 此就需要纵宽比很高的金属栅线来平衡遮光和串联电阻， 但形成纵宽 比很高的金属栅线对丝网印刷的工艺参数及印刷浆料均有非常高的要 求。 埋栅太阳能电池可解决丝网印刷较高纵宽比的栅线所遇到的问题， 其是通过化学沉积铜的方法在太阳能电池的发射极上生成金属导电电 极。 其具体方法是， 用钝化膜或减反膜覆盖具有较大方块电阻的发射 极表面， 采用激光在钝化膜上开槽后， 再进行深扩散， 从而降低所述 发射极表面开槽区域的方块电阻， 最后采用化学沉积金属的方法， 在 具有较低方块电阻的发射极区域生成太阳能电池的金属导电电极。 化学沉积铜的过程是一个相当緩慢的化学过程 , 一般需要近十个 小时左右的时间才能达到所需的金属导电电极的厚度。 化学沉积金属 溶液的使用寿命比较短， 一般只能使用几个批次就不能继续使用。 因 此化学沉积金属的方法在大规模生产上使用时会产生大量的废水。 化 学沉积金属的溶液相当不稳定， 很容易发生自析金属的现象， 影响正 常的生产。 另外， 化学沉积金属的工艺条件的控制也非常的苛刻。 解决以上化学沉积所出现问题的方法之一是采用电镀工艺取代化 学沉积金属的工艺。 相对于化学沉积金属， 电镀工艺的优点是沉积金 属的速度快。 釆用电镀工艺后， 可以把太阳能电池的导电电极的生成 时间从化学沉积金属的近十个小时的过程缩短到一个小时之内。 在一 般情况下， 采用电镀工艺后， 制备太阳能电池的导电电极的过程可在 十几分钟内完成。 它对温度的要求不高， 一般可在室温下操作， 这样 既有利于生产控制， 又节约了加热所需要的成本。 电镀所用的电解液 的组成也非常简单， 所以在一般情况下电解液可以长时间反复地使用。 通过电镀工艺所形成的太阳电池电极强度较差， 具有所述种电极 的太阳电池封装形成组件时， 无法将互连条直接焊接在电镀工艺所形 成的电极上， 通常会采用导电胶黏贴的方式将互连条粘接至电镀工艺 形成的太阳电池电极上， 采用导电胶连接互联条和太阳电池电极的技 术存在着可靠性差的问题。 At present, most of the conductive electrodes of commercial solar cells are produced by screen printing, on the cathode surface of the solar cell, that is, the front side is brushed with silver paste, the anode surface, that is, the back side is brushed with aluminum paste, and then subjected to high temperature co-firing. A conductive cathode and an anode are simultaneously formed on the cathode and the anode of the solar cell. The solar cell conductive electrode generating method has the advantages that the process is simple and reliable, and is easy to be applied in mass production. However, the simple process of screen printing and co-firing to produce a solar cell conductive electrode limits the improvement of the photoelectric conversion efficiency of the solar cell. In order to ensure that the screen printed paste can have good ohmic contact with the surface of the solar cell after co-firing, and reduce the series resistance of the solar cell, it is necessary to adopt not only the design of the thick metal sub-gate line (generally larger than ΙΟΟμπι), It is also necessary to use a lower emitter pad resistance design (typically 50Ω / Π ). The design of the thicker metal sub-gate line reduces the effective working area of the solar cell, while the lower emitter block resistance design reduces the short-circuit current of the solar cell, which is the low photoelectric conversion efficiency of commercial solar cells. main reason. It is obvious that one of the main measures to improve the photoelectric conversion efficiency of a solar cell is to increase the sheet resistance of its emitter. However, if the sheet resistance of the solar cell emitter is increased, if the screen printing paste and the co-firing process are continued, the contact resistance of the solar cell will be increased, thereby reducing the photoelectric conversion efficiency of the solar cell. Therefore, improve solar power One of the problems that must be solved after the square resistor of the cell emitter is to reduce the contact resistance between the metal conductive electrode and the solar cell. One way to solve the above problems is to use a selective diffusion process. The so-called selective diffusion process refers to generating two different values of sheet resistance in different regions of the emitter of the solar cell, that is, having a lower sheet resistance in the region where the metal conductive electrode is formed and a higher surface on the other light receiving surface. Square resistance. This process design not only increases the short-circuit current of the solar cell, but also reduces the contact resistance between the metal wire and the solar cell. Therefore, the selective diffusion process is one of the main measures to improve the photoelectric conversion efficiency of solar cells. In order to improve the shielding of the metal substrate from the area of the battery substrate, it is necessary to reduce the width of the metal gate line; however, to reduce the series resistance of the solar cell, it is necessary to increase the width of the metal gate line; therefore, a metal having a high aspect ratio is required. The grid lines balance the shading and series resistance, but the formation of metal grid lines with a high aspect ratio has very high requirements on the screen printing process parameters and printing paste. The buried-gate solar cell solves the problem encountered in screen printing a gate line of a higher aspect ratio by forming a metal conductive electrode on the emitter of the solar cell by chemically depositing copper. The specific method is to cover the surface of the emitter having a large square resistance with a passivation film or an anti-reflection film, and after performing a deep diffusion on the passivation film by using a laser, thereby reducing the grooved area of the emitter surface. The square resistance, and finally the method of chemically depositing metal, generates a metal conductive electrode of the solar cell in an emitter region having a lower sheet resistance. The process of chemically depositing copper is a rather slow chemical process, which typically takes about ten hours to reach the desired thickness of the metal conductive electrode. The chemically deposited metal solution has a relatively short service life and generally cannot be used only after several batches. Therefore, the method of chemically depositing metal generates a large amount of waste water when used in mass production. The solution of the chemically deposited metal is quite unstable, and the phenomenon of self-deposition of the metal is likely to occur, which affects normal production. In addition, the control of the process conditions for chemically deposited metals is also very demanding. One of the ways to solve the above problems of chemical deposition is to replace the process of chemically depositing metals with an electroplating process. An advantage of the electroplating process over chemically deposited metals is the speed at which the metal is deposited. After the electroplating process, the generation time of the conductive electrode of the solar cell can be shortened from the process of chemically depositing the metal by nearly ten hours to one hour. In general, after the electroplating process is employed, the process of preparing the conductive electrodes of the solar cell can be completed in ten minutes. It has low temperature requirements and can be operated at room temperature, which is beneficial to production control and saves the cost of heating. The composition of the electrolyte used for electroplating is also very simple, so in general, the electrolyte can be used repeatedly for a long time. The solar cell electrode formed by the electroplating process is inferior in strength. When the solar cell package having the electrode is formed into a component, the interconnect strip cannot be directly soldered to the electrode formed by the electroplating process, and the conductive paste is usually used. The method of bonding the interconnecting strip to the solar cell electrode formed by the electroplating process, and the technique of connecting the interconnecting strip and the solar cell electrode with the conductive adhesive has a problem of poor reliability.
因此， 如何提供一种制备太阳电池电极的技术来使电极可以通过 焊接方式与互连条连接， 已成为业界亟待解决的技术问题。 发明内容  Therefore, how to provide a technique for preparing solar cell electrodes to connect electrodes to interconnecting strips by soldering has become an urgent technical problem to be solved in the industry. Summary of the invention
本发明的目的是要提供一种太阳电池电极及其制备方法， 所述电 极及其制备方法可以提高电极的强度， 并有效提高太阳电池组件的可 靠性。 为实现上述目的， 本发明将提供一种太阳电池电极的制造方法， 包括以下步骤： a、 对电池基片进行制绒和清洗， 并对其正面进行浅扩 散形成 PN结； b、在浅扩散以后的电池基片的正面沉积钝化减反膜； c、 在电池基片正面的电极区域进行深才广散； d、 对所述电池基片的所述背 面进行钝化处理； e、 在背面经钝化处理的电池基片正面的电极区域沉 积第一金属形成籽晶层； f、 通过喷涂或印刷在籽晶层上形成第二金属 或金属合金层； g、 将所述电池基片设置在电化学沉积装置内进行电化 学沉积在第二金属或金属合金层上形成第三金属或金属合金层。 在上述太阳电池电极的制造方法中， 在步骤 e 中， 通过化学沉积 在电池基片的正面电极区域形成第一金属并进行烧结形成籽晶层。 It is an object of the present invention to provide a solar cell electrode and a method of fabricating the same, which can improve the strength of the electrode and effectively improve the reliability of the solar cell module. In order to achieve the above object, the present invention provides a method for manufacturing a solar cell electrode, comprising the steps of: a. performing a texturing and cleaning of a battery substrate, and shallowly diffusing a front surface thereof to form a PN junction; b. Depositing a passivation anti-reflection film on the front side of the subsequent battery substrate; c, performing deep-depth dispersion on the electrode area on the front surface of the battery substrate; d, performing passivation treatment on the back surface of the battery substrate; Electrode area on the front side of the passivated battery substrate Forming a first metal to form a seed layer; f, forming a second metal or metal alloy layer on the seed layer by spraying or printing; g, disposing the battery substrate in an electrochemical deposition device for electrochemical deposition A third metal or metal alloy layer is formed on the second metal or metal alloy layer. In the above method of manufacturing a solar cell electrode, in step e, a first metal is formed by chemical deposition on a front electrode region of a battery substrate and sintered to form a seed layer.
在上述太阳电池电极的制造方法中， 所述第一金属为镍， 所述烧 结温度为 200 °C ~ 500 °C。  In the above method for producing a solar cell electrode, the first metal is nickel, and the sintering temperature is 200 ° C to 500 ° C.
在上述太阳电池电极的制造方法中， 在步骤 f t , 通过丝网印刷形 成第二金属或金属合金层， 并进行烘干处理； 所述烘干处理的温度为 100。C ~ 500。C。  In the above method for manufacturing a solar cell electrode, at step ft, a second metal or metal alloy layer is formed by screen printing, and a drying treatment is performed; the temperature of the drying treatment is 100. C ~ 500. C.
在上述太阳电池电极的制造方法中， 所述步骤 c 包括以下步骤： c0、 在电池基片正面主栅线和副栅线部位形成凹槽； c2、 对所述凹槽 进行清洗并进行深扩散。  In the above method for manufacturing a solar cell electrode, the step c includes the following steps: c0, forming a groove on a front main gate line and a sub-gate line portion of the battery substrate; c2, cleaning the groove and performing deep diffusion .
在上述太阳电池电极的制造方法中， 所述步骤 c 包括以下步骤： cl、 清除电池基片正面主栅线和副栅线部位的钝化减反膜并进行清洗； c2、 对所述主栅线和副栅线部位进行深扩散。  In the above method for manufacturing a solar cell electrode, the step c includes the steps of: cl clearing and cleaning the passivation anti-reflection film on the front main gate line and the sub-gate line portion of the battery substrate; c2, on the main gate The line and the sub-gate line are deeply diffused.
在上述太阳电池电极的制造方法中， 所述方法还包括步骤 h、通过 喷涂、 印刷、 电化学沉积或化学沉积在第三金属或金属合金层上形成 第二金属或金属合金层。  In the above method of manufacturing a solar cell electrode, the method further comprises the step of forming a second metal or metal alloy layer on the third metal or metal alloy layer by spraying, printing, electrochemical deposition or chemical deposition.
在上述太阳电池电极的制造方法中， 所述第二金属或金属合金层 为银， 所述第三金属或金属合金层为铜。  In the above method for producing a solar cell electrode, the second metal or metal alloy layer is silver, and the third metal or metal alloy layer is copper.
在上述太阳电池电极的制造方法中， 在步骤 d 中， 通过喷涂、 印 刷或溅射铝并经热处理来对所述电池基片的背面进行钝化处理； 所述 热处理的温度大于硅铝共晶温度 577°C。 In the above method for manufacturing a solar cell electrode, in step d, by spraying, printing The aluminum substrate is brushed or sputtered and heat treated to passivate the back surface of the battery substrate; the heat treatment temperature is greater than the silicon-aluminum eutectic temperature of 577 ° C.
本发明还提供一种太阳电池， 所述太阳电池的电极通过上述的太 阳电池电极的制造方法制成。  The present invention also provides a solar cell, the electrode of which is fabricated by the above-described method of manufacturing a solar cell electrode.
本发明又提供一种太阳电池组件， 所述太阳电池组件包括多个按 行 /列排列的如上所述的太阳电池。  The present invention further provides a solar cell module comprising a plurality of solar cells as described above arranged in rows/columns.
与现有技术中太阳电池电极仅通过电镀形成相比， 本发明的太阳 电池电极及其制造方法在化学沉积形成籽晶层后， 接着通过喷涂或印 刷在籽晶层上形成第二金属或金属合金层， 之后通过电化学沉积在第 二金属或金属合金层上形成第三金属或金属合金层， 从而提高了太阳 电池电极的强度， 使得可以通过焊接方式将电极连接至互连条， 并有 效提高了电池的可靠性。  Compared with the prior art solar cell electrode formed only by electroplating, the solar cell electrode of the present invention and the method of manufacturing the same, after chemically depositing a seed layer, then forming a second metal or metal on the seed layer by spraying or printing An alloy layer, followed by electrochemical deposition to form a third metal or metal alloy layer on the second metal or metal alloy layer, thereby increasing the strength of the solar cell electrode, thereby enabling the electrode to be connected to the interconnecting strip by soldering, and effective Improve battery reliability.
附图说明 DRAWINGS
图 1为本发明的太阳电池电极的制造方法第一实施例的流程图； 图 2为本发明的太阳电池电极的制造方法第二实施例的流程图； 图 3为本发明的太阳电池第一实施例的组成结构示意图； 图 4为本发明的太阳电池第二实施例的组成结构示意图； 图 5为本发明的太阳电池第三实施例的组成结构示意图。  1 is a flow chart of a first embodiment of a method for manufacturing a solar cell electrode of the present invention; FIG. 2 is a flow chart of a second embodiment of a method for manufacturing a solar cell electrode of the present invention; 4 is a schematic structural view of a second embodiment of a solar cell according to the present invention; and FIG. 5 is a schematic structural view of a third embodiment of a solar cell according to the present invention.
^^实施方案 ^^ Implementation plan
下面结合具体实施例及附图来详细说明本发明的目的及功效。 参见图 1 , 本发明太阳电池电极的制造方法首先进行步骤 S10 , 对 电池基片进行制绒和清洗， 所述电池基片为单晶珪片或多晶珪片。 针 对单晶和多晶珪片分别釆用不用的制绒方法， 当是单晶珪片时采用氢 氧化钾或氢氧化钠等碱性溶液在珪片上形成类似金字塔形的绒面， 当 是多晶珪片时釆用氢氟酸、 硝酸或乙酸等酸性溶液在多晶珪片上形成 类似多孔的绒面； 对制绒后珪片进行清洗时依次用到盐酸、 氢氟酸溶 液和去离子水等。 在本实施例中， 釆用氢氟酸和硝酸的混合溶液对多 晶珪制绒。 接着继续步骤 S 11 , 对电池基片正面进行浅扩散形成 PN结。 在本 实施例中， 将两片珪片背面相对贴合为一组将珪片送进 散炉进行单 面扩散， 液态源为三氯氧磷（P0C13 ), 液态源扩散的扩散温度范围为 850°C , 扩散时间范围为 30min, 电池基片的方块电阻为 100Ω/口。 在其 他实施例中， 可对单片硅片进行双面扩散， 然后再通过化学腐蚀方法 将硅片背面的 PN结去除。 接着继续步骤 S12 ,在浅扩散以后的电池基片的正面沉积钝化减反 膜。 在本实施例中， 所述钝化减反膜为氮化珪， 所述氮化珪通过等离 子增强化学气相沉积形成。 接着继续步骤 S13 , 在电池基片正面主栅线和副栅线部位形成凹 槽。 在本实施例中， 可以通过激光划刻形成凹槽， 在其他实施例中， 可以通过化学腐蚀方式形成凹槽。 接着继续步骤 S14 , 对所述凹槽进行清洗并进行深 散。在本实施 例中， 将两片珪片背面相对贴合为一组将珪片送进 散炉进行单面扩 散， 液态源为三氯氧磷（P0C13 ), 液态源扩散的扩散温度范围为 850 °C , 扩散时间范围为 30min, 因有钝化减反膜的遮蔽， 主栅线和副栅线 部位的方块电阻为 300/口， 而其他区域的方块电阻仍为 100Ω/口。 接着继续步骤 S15 , 对所述电池基片的所述背面进行钝化处理。在 本实施例中， 通过喷涂、 印刷或溅射铝并经热处理来对所述电池基片 的背面进行钝化处理。 所述热处理的温度大于珪铝共晶温度 577°C。 在本发明其他实施例中， 可以先沉积钝化层 （例如为氧化珪、 氮 化珪或氧化珪和氮化珪复合层）对电池基片背面进行钝化， 之后再通 过喷涂、 印刷或溅射铝并经热处理； 也可以先沉积钝化层， 再在钝化 层形成局部接触开口， 之后通过喷涂、 印刷或溅射铝并经热处理形成 背面局部钝化 ( Rear Locally Diffused )» 接着继续步骤 S16 , 在背面经 钝化处理的电池基片正面的电极区域进行化学沉积第一金属形成籽晶 层。 在本实施例中， 所述第一金属为镍， 所述烧结温度为 200°C ~ 500 。C。 接着继续步骤 S17 ,通过喷涂或印刷在籽晶层上形成第二金属或金 属合金层。 在本实施例中， 所述第二金属或金属合金层为银， 通过丝 网印刷形成第二金属或金属合金层， 并进行烘干处理， 所述烘干处理 的温度为 100°C ~ 500°C。 接着继续步骤 S18 ,将所述电池基片设置在电化学沉积装置内进行 电化学沉积在第二金属或金属合金层上形成第三金属或金属合金层。 在本实施例中， 所述第三金属或金属合金层为铜。 如图 2所示， 本发明的太阳电池电极的制造方法第二实施例的步 骤 S20、 S21和 S22分别与图 1所示的第一实施例的步骤 S10、 S11和 S12相同， 在此不再贅述。 第二实施例在完成步骤 S22后，接着继续步骤 S23 , 清除电池基片 正面主栅线和副栅线部位的钝化减反膜并进行清洗。 在本实施例中， 可通过丝网印刷腐蚀浆料的方式清除主栅线和副栅线部位的减反膜并 通过去离子水或碱液进行清洗。 接着继续步骤 S24,在所述主栅线和副栅线部位进行深扩散。 步骤 S24与其与实施例一的步骤 S14的实施工艺基本一致， 在此不再贅述。 实施例二接下来的步骤 S25 至 S28分别与实施例一中的步骤 S15 至 S18对应一致， 在此不再贅述。 在本发明的太阳电池电极的制造方法其他实施例中 , 在进行完步 骤 S18或 S28后还通过电化学沉积或化学沉积在第三金属或金属合金 层上沉积第二金属或金属合金层。 参见图 3 , 在本发明的太阳电池第一实施例中， 太阳电池电极形成 在电池基片 2上， 太阳电池电极包括籽晶层 10、 第二金属或金属合金 层 11和第三金属或金属合金层 12 , 所述籽晶层 10覆盖在电池基片 2 上的凹槽内， 所述第二金属或金属合金层 11和第三金属或金属合金层 12依次层叠在所述籽晶层 10上。在本实施例中， 所述籽晶层 10为镍， 所述第二金属或金属合金层 11和第三金属或金属合金层 12分别为银 和铜。 The purpose and function of the present invention will be described in detail below with reference to the specific embodiments and the accompanying drawings. Referring to Fig. 1, a method for manufacturing a solar cell electrode of the present invention first performs a step S10 of performing a process of texturing and cleaning a battery substrate, wherein the battery substrate is a single crystal wafer or a polycrystalline silicon wafer. Needle For the single crystal and polycrystalline tantalum sheets, the different method of texturing is used. When it is a single crystal sheet, an alkaline solution such as potassium hydroxide or sodium hydroxide is used to form a pyramid-like suede on the tantalum sheet. In the case of wafers, an acidic solution such as hydrofluoric acid, nitric acid or acetic acid is used to form a porous suede on the polycrystalline silicon flakes; and the flakes are washed with hydrochloric acid, hydrofluoric acid solution and deionized water in sequence. Wait. In the present embodiment, the polycrystalline fluorene is fluffed with a mixed solution of hydrofluoric acid and nitric acid. Next, proceeding to step S11, shallow diffusion of the front surface of the battery substrate forms a PN junction. In this embodiment, the back faces of the two cymbals are relatively bonded into a group, and the cymbals are fed into the furnace for single-sided diffusion. The liquid source is phosphorus oxychloride (P0C13), and the diffusion temperature range of the liquid source is 850. °C, the diffusion time range is 30min, and the sheet resistance of the battery substrate is 100Ω/□. In other embodiments, the monolithic wafer can be spread on both sides and then the PN junction on the back side of the wafer can be removed by chemical etching. Next, proceeding to step S12, a passivation anti-reflection film is deposited on the front side of the battery substrate after the shallow diffusion. In this embodiment, the passivation anti-reflection film is tantalum nitride, and the tantalum nitride is formed by plasma enhanced chemical vapor deposition. Next, proceeding to step S13, a groove is formed in the front gate line and the sub-gate line portion of the front surface of the battery substrate. In this embodiment, the grooves may be formed by laser scribing, and in other embodiments, the grooves may be formed by chemical etching. Then, proceeding to step S14, the groove is cleaned and deep dispersed. In this embodiment, the back faces of the two cymbals are relatively bonded into a group, and the cymbals are fed into the furnace for single-sided diffusion. The liquid source is phosphorus oxychloride (P0C13), and the diffusion temperature range of the liquid source is 850. °C, the diffusion time range is 30min. Due to the shielding of the passivation anti-reflection film, the sheet resistance of the main gate line and the sub-gate line is 300/□, while the sheet resistance of other areas is still 100Ω/□. Next, proceeding to step S15, the back surface of the battery substrate is subjected to passivation treatment. In the present embodiment, the back surface of the battery substrate is passivated by spraying, printing or sputtering aluminum and heat treatment. The temperature of the heat treatment is greater than the yttrium aluminum eutectic temperature of 577 °C. In other embodiments of the present invention, a passivation layer (for example, tantalum oxide, tantalum nitride, or a composite layer of tantalum oxide and tantalum nitride) may be first deposited to passivate the back surface of the battery substrate, and then sprayed, printed, or splashed. Aluminium is shot and heat treated; it is also possible to deposit a passivation layer and then form a local contact opening in the passivation layer, followed by spraying, printing or sputtering aluminum and heat treatment to form a backside local passivation (Real Locally Diffused). S16, chemically depositing a first metal to form a seed layer on an electrode region on the front side of the passivated battery substrate. In this embodiment, the first metal is nickel, and the sintering temperature is 200 ° C ~ 500 . C. Next, proceeding to step S17, a second metal or metal alloy layer is formed on the seed layer by spraying or printing. In this embodiment, the second metal or metal alloy layer is silver, and a second metal or metal alloy layer is formed by screen printing, and is subjected to a drying process, and the temperature of the drying process is 100° C. to 500. °C. Next, proceeding to step S18, the battery substrate is disposed in an electrochemical deposition device for electrochemical deposition on the second metal or metal alloy layer to form a third metal or metal alloy layer. In this embodiment, the third metal or metal alloy layer is copper. As shown in FIG. 2, steps S20, S21, and S22 of the second embodiment of the method for manufacturing a solar cell electrode of the present invention are the same as steps S10, S11, and S12 of the first embodiment shown in FIG. 1, respectively. Narration. After the completion of step S22, the second embodiment proceeds to step S23 to remove the passivation anti-reflection film on the front main gate line and the sub-gate line portion of the battery substrate and perform cleaning. In this embodiment, The anti-reflection film of the main gate line and the sub-gate line portion can be removed by screen printing etching the slurry and washed by deionized water or alkali solution. Next, proceeding to step S24, deep diffusion is performed at the main gate line and the sub-gate line portion. The step S24 is basically the same as the implementation process of the step S14 of the first embodiment, and details are not described herein again. The subsequent steps S25 to S28 of the second embodiment are respectively consistent with the steps S15 to S18 in the first embodiment, and details are not described herein again. In other embodiments of the method of fabricating a solar cell electrode of the present invention, a second metal or metal alloy layer is deposited on the third metal or metal alloy layer by electrochemical deposition or chemical deposition after step S18 or S28 is performed. Referring to FIG. 3, in a first embodiment of the solar cell of the present invention, a solar cell electrode is formed on the battery substrate 2, and the solar cell electrode includes a seed layer 10, a second metal or metal alloy layer 11, and a third metal or metal. An alloy layer 12, the seed layer 10 is covered in a groove on the battery substrate 2, and the second metal or metal alloy layer 11 and the third metal or metal alloy layer 12 are sequentially laminated on the seed layer 10. on. In this embodiment, the seed layer 10 is nickel, and the second metal or metal alloy layer 11 and the third metal or metal alloy layer 12 are silver and copper, respectively.
参见图 4, 在本发明的太阳电池第二实施例中， 太阳电池电极形成 在电池基片 2上， 太阳电池电极包括籽晶层 10、 第二金属或金属合金 层 11、 第三金属或金属合金层 12和第二金属或金属合金层 13。 图 4 所示的本发明的太阳电池电极第二实施例与图 3 所示的第一实施例不 同之处在于， 实施例二的太阳电池电极在电化学沉积形成的第二金属 或金属合金层 12上还通过通过喷涂、 印刷、 电化学沉积或化学沉积等 在第二金属或金属合金层 12上形成第二金属或金属合金层 13。 参见图 5 , 在本发明的太阳电池第三实施例中， 太阳电池电极形成 在电池基片 2上， 太阳电池电极包括籽晶层 30、 第二金属或金属合金 层 31和第三金属或金属合金层 32。图 5所示的第三实施例与图 3所示 的第一实施例的差别为， 第三实施例的电池基片 2上未设置凹槽， 其 太阳电池电极直接制作在电池基片 2的表面上。 本发明还提供一种太阳电池组件， 所述太阳电池组件包括多个按 行 /列排列的如上所述的太阳电池。 Referring to FIG. 4, in a second embodiment of the solar cell of the present invention, a solar cell electrode is formed on the battery substrate 2, and the solar cell electrode includes a seed layer 10, a second metal or metal alloy layer 11, a third metal or metal. The alloy layer 12 and the second metal or metal alloy layer 13. The second embodiment of the solar cell electrode of the present invention shown in FIG. 4 is different from the first embodiment shown in FIG. 3 in that the solar cell electrode of the second embodiment is electrochemically deposited to form a second metal or metal alloy layer. 12 is also passed through spraying, printing, electrochemical deposition or chemical deposition, etc. A second metal or metal alloy layer 13 is formed on the second metal or metal alloy layer 12. Referring to FIG. 5, in a third embodiment of the solar cell of the present invention, a solar cell electrode is formed on the battery substrate 2, and the solar cell electrode includes a seed layer 30, a second metal or metal alloy layer 31, and a third metal or metal. Alloy layer 32. The difference between the third embodiment shown in FIG. 5 and the first embodiment shown in FIG. 3 is that the battery substrate 2 of the third embodiment is not provided with a groove, and the solar cell electrode is directly formed on the battery substrate 2. On the surface. The present invention also provides a solar cell module comprising a plurality of solar cells as described above arranged in rows/columns.
综上所述， 本发明的太阳电池电极及其制造方法在化学沉积形成 籽晶层后， 接着通过喷涂或印刷在籽晶层上形成第二金属或金属合金 层， 之后通过电化学沉积在第二金属或金属合金层上形成第三金属或 金属合金层， 从而提高了太阳电池电极的强度， 使得可以通过焊接方 式将电极连接至互连条， 并有效提高了电池的可靠性。  In summary, the solar cell electrode of the present invention and the method for fabricating the same are formed by chemical deposition to form a seed layer, followed by spraying or printing on the seed layer to form a second metal or metal alloy layer, followed by electrochemical deposition. A third metal or metal alloy layer is formed on the second metal or metal alloy layer, thereby increasing the strength of the solar cell electrode, so that the electrode can be connected to the interconnecting strip by soldering, and the reliability of the battery is effectively improved.

Claims

权 利 要 求 Rights request
1、 一种太阳电池电极的制造方法， 其特征在于， 包括以下步骤： a、 对电池基片进行制绒和清洗， 并对其正面进行浅扩散形成 PN 结； b、 在浅扩散以后的电池基片的正面沉积钝化减反膜； c、 在电池基片正面的电极区域进行深扩散； d、 对所述电池基片的所述背面进行钝化处理； e、 在背面经钝化处理的电池基片正面的电极区域沉积第一金属形 成軒晶层； f、 通过喷涂或印刷在籽晶层上形成第二金属或金属合金层； g、 将所述电池基片设置在电化学沉积装置内进行电化学沉积在第 二金属或金属合金层上形成第三金属或金属合金层。 A method of manufacturing a solar cell electrode, comprising the steps of: a. performing a texturing and cleaning of a battery substrate, and shallowly diffusing a front surface thereof to form a PN junction; b. a battery after shallow diffusion Depositing a passivation anti-reflection film on the front side of the substrate; c, performing deep diffusion on the electrode region on the front side of the battery substrate; d, passivating the back surface of the battery substrate; e, passivating the back surface Depositing a first metal to form an enamel layer on the front surface of the battery substrate; f, forming a second metal or metal alloy layer on the seed layer by spraying or printing; g, disposing the battery substrate in electrochemical deposition Electrochemical deposition in the apparatus forms a third metal or metal alloy layer on the second metal or metal alloy layer.
2、根据权利要求 1所述的太阳电池电极的制造方法，其特征在于， 在步骤 e 中， 通过化学沉积在电池基片的正面电极区域形成第一金属 并进行烧结形成籽晶层。 The method of manufacturing a solar cell electrode according to claim 1, wherein in the step e, a first metal is formed by chemical deposition on a front electrode region of the battery substrate and sintered to form a seed layer.
3、根据权利要求 2所述的太阳电池电极的制造方法，其特征在于， 所述第一金属为镍， 所述烧结温度为 200°C ~ 500 °C。 The method of manufacturing a solar cell electrode according to claim 2, wherein the first metal is nickel, and the sintering temperature is 200 ° C to 500 ° C.
4、根据权利要求 1所述的太阳电池电极的制造方法，其特征在于， 在步骤 f t ,通过丝网印刷形成第二金属或金属合金层， 并进行烘干处 The method of manufacturing a solar cell electrode according to claim 1, wherein in step ft, a second metal or metal alloy layer is formed by screen printing, and drying is performed.
5、根据权利要求 4所述的太阳电池电极的制造方法，其特征在于， 所述烘干处理的温度为 100°C ~ 500°C。 The method of producing a solar cell electrode according to claim 4, wherein the temperature of the drying treatment is from 100 ° C to 500 ° C.
6、根据权利要求 1所述的太阳电池电极的制造方法，其特征在于， 所述步骤 c包括以下步骤： c 0、 在电池基片正面主栅线和副栅线部位 形成凹槽； c2、 对所述凹槽进行清洗并进行深扩散。 The method of manufacturing a solar cell electrode according to claim 1, wherein the step c comprises the steps of: c 0, forming a groove on a front main gate line and a sub-gate line portion of the battery substrate; c2; The grooves are cleaned and subjected to deep diffusion.
7、根据权利要求 1所述的太阳电池电极的制造方法，其特征在于， 所述步骤 c 包括以下步骤： cl、 清除电池基片正面主栅线和副栅线部 位的钝化减反膜并进行清洗； c2、 对所述主栅线和副栅线部位进行深 扩散。 The method of manufacturing a solar cell electrode according to claim 1, wherein the step c comprises the steps of: cl clearing the passivation anti-reflection film on the front main gate line and the sub-gate line portion of the battery substrate; Performing cleaning; c2, performing deep diffusion on the main gate line and the sub-gate line portion.
8、根据权利要求 1所述的太阳电池电极的制造方法，其特征在于， 所述方法还包括步骤 h、 通过喷涂、 印刷、 电化学沉积或化学沉积在第 三金属或金属合金层上形成第二金属或金属合金层。 The method of manufacturing a solar cell electrode according to claim 1, wherein the method further comprises the step of forming a second metal or metal alloy layer by spraying, printing, electrochemical deposition or chemical deposition. A layer of two metal or metal alloys.
9、根据权利要求 1至 8中任一项所述的太阳电池电极的制造方法， 其特征在于， 所述第二金属或金属合金层为银， 所述第三金属或金属 合金层为铜。 The method of manufacturing a solar cell electrode according to any one of claims 1 to 8, wherein the second metal or metal alloy layer is silver, and the third metal or metal alloy layer is copper.
10、 根据权利要求 1 所述的太阳电池电极的制造方法， 其特征在 于， 在步骤 d 中， 通过喷涂、 印刷或溅射铝并经热处理来对所述电池 基片的背面进行钝化处理。 A method of manufacturing a solar cell electrode according to claim 1, wherein in step d, the back surface of said battery substrate is passivated by spraying, printing or sputtering aluminum and heat-treating.
11、 根据权利要求 10所述的太阳电池电极的制造方法， 其特征在 于， 所述热处理的温度大于珪铝共晶温度 577°C。 The method of manufacturing a solar cell electrode according to claim 10, wherein the heat treatment temperature is greater than a yttrium aluminum eutectic temperature of 577 °C.
12、 一种太阳电池， 其特征在于， 所述太阳电池的电极通过权利 要求 1至 11中任一项所述的太阳电池电极的制造方法制成。 12. A solar cell, characterized in that the electrode of the solar cell is produced by the method for producing a solar cell electrode according to any one of claims 1 to 11.
13、 一种太阳电池组件， 其特征在于， 所述太阳电池组件包括多 个按行 /列排列的如权利要求 12中所述的太阳电池。 A solar cell module, characterized in that the solar cell module comprises a plurality of solar cells according to claim 12 arranged in rows/columns.
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