WO2013012169A3 - 감광성 조성물 및 그 감광성 조성물에 사용되는 화합물 - Google Patents
감광성 조성물 및 그 감광성 조성물에 사용되는 화합물 Download PDFInfo
- Publication number
- WO2013012169A3 WO2013012169A3 PCT/KR2012/004465 KR2012004465W WO2013012169A3 WO 2013012169 A3 WO2013012169 A3 WO 2013012169A3 KR 2012004465 W KR2012004465 W KR 2012004465W WO 2013012169 A3 WO2013012169 A3 WO 2013012169A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- compound used
- photosensitive composition
- present
- composition
- pattern
- Prior art date
Links
- 150000001875 compounds Chemical class 0.000 title abstract 2
- 239000010409 thin film Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Abstract
본 출원은 감광성 조성물 및 이에 사용되는 화합물에 대한 것이다. 본 출원을 통해 제공되는 조성물을 사용하면 패턴의 접착력이 향상된 박막을 형성할 수 있다.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201280034988.2A CN103718110B (zh) | 2011-07-15 | 2012-06-07 | 光敏组合物及其中使用的化合物 |
JP2014520109A JP5872035B2 (ja) | 2011-07-15 | 2012-06-07 | 感光性組成物およびその感光性組成物に用いられる化合物 |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2011-0070644 | 2011-07-15 | ||
KR20110070644 | 2011-07-15 | ||
KR1020120056628A KR101391530B1 (ko) | 2011-07-15 | 2012-05-29 | 감광성 조성물 |
KR10-2012-0056628 | 2012-05-29 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2013012169A2 WO2013012169A2 (ko) | 2013-01-24 |
WO2013012169A3 true WO2013012169A3 (ko) | 2013-03-21 |
Family
ID=47558561
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2012/004465 WO2013012169A2 (ko) | 2011-07-15 | 2012-06-07 | 감광성 조성물 및 그 감광성 조성물에 사용되는 화합물 |
Country Status (2)
Country | Link |
---|---|
US (1) | US8835521B2 (ko) |
WO (1) | WO2013012169A2 (ko) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9049790B2 (en) * | 2013-08-13 | 2015-06-02 | Echem Solutions Corp. | Masking layer formed by applying developable photosensitive resin compositions on panel structure |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0296583A (ja) * | 1988-09-30 | 1990-04-09 | Toshiba Silicone Co Ltd | アミノアルキルアルコキシシランの製造方法 |
JPH08269071A (ja) * | 1995-03-31 | 1996-10-15 | Nitto Boseki Co Ltd | シランカップリング剤及びその製造方法 |
KR100655047B1 (ko) * | 2005-12-30 | 2006-12-06 | 제일모직주식회사 | 감광성 수지 조성물 및 이를 이용한 블랙매트릭스 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5464900A (en) * | 1993-10-19 | 1995-11-07 | Minnesota Mining And Manufacturing Company | Water soluble organosiloxane compounds |
KR100793946B1 (ko) | 2006-11-17 | 2008-01-16 | 제일모직주식회사 | 액정표시소자 칼럼 스페이서용 감광성 수지 조성물, 이를이용한 액정표시소자 칼럼 스페이서의 제조방법,액정표시소자용 칼럼 스페이서 및 이를 포함하는디스플레이 장치 |
-
2012
- 2012-06-07 WO PCT/KR2012/004465 patent/WO2013012169A2/ko active Application Filing
- 2012-07-16 US US13/549,753 patent/US8835521B2/en active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0296583A (ja) * | 1988-09-30 | 1990-04-09 | Toshiba Silicone Co Ltd | アミノアルキルアルコキシシランの製造方法 |
JPH08269071A (ja) * | 1995-03-31 | 1996-10-15 | Nitto Boseki Co Ltd | シランカップリング剤及びその製造方法 |
KR100655047B1 (ko) * | 2005-12-30 | 2006-12-06 | 제일모직주식회사 | 감광성 수지 조성물 및 이를 이용한 블랙매트릭스 |
Also Published As
Publication number | Publication date |
---|---|
US8835521B2 (en) | 2014-09-16 |
WO2013012169A2 (ko) | 2013-01-24 |
US20130029271A1 (en) | 2013-01-31 |
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