WO2012124717A1 - Fil métallique auquel adhèrent des grains abrasifs et procédé de fabrication de fil métallique auquel adhèrent des grains abrasifs - Google Patents

Fil métallique auquel adhèrent des grains abrasifs et procédé de fabrication de fil métallique auquel adhèrent des grains abrasifs Download PDF

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WO2012124717A1
WO2012124717A1 PCT/JP2012/056495 JP2012056495W WO2012124717A1 WO 2012124717 A1 WO2012124717 A1 WO 2012124717A1 JP 2012056495 W JP2012056495 W JP 2012056495W WO 2012124717 A1 WO2012124717 A1 WO 2012124717A1
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Prior art keywords
abrasive
metal
wire
abrasive grains
fixed
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PCT/JP2012/056495
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English (en)
Japanese (ja)
Inventor
松岡　映史
山下　健一
森　和彦
宏志 清水
相川　耕一
隆行 萬
Original Assignee
栃木住友電工株式会社
日本パーカライジング株式会社
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Application filed by 栃木住友電工株式会社, 日本パーカライジング株式会社 filed Critical 栃木住友電工株式会社
Priority to KR1020137023337A priority Critical patent/KR20140061292A/ko
Priority to JP2013504749A priority patent/JPWO2012124717A1/ja
Priority to CN2012800121062A priority patent/CN103429391A/zh
Publication of WO2012124717A1 publication Critical patent/WO2012124717A1/fr

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23D—PLANING; SLOTTING; SHEARING; BROACHING; SAWING; FILING; SCRAPING; LIKE OPERATIONS FOR WORKING METAL BY REMOVING MATERIAL, NOT OTHERWISE PROVIDED FOR
    • B23D61/00—Tools for sawing machines or sawing devices; Clamping devices for these tools
    • B23D61/18—Sawing tools of special type, e.g. wire saw strands, saw blades or saw wire equipped with diamonds or other abrasive particles in selected individual positions
    • B23D61/185—Saw wires; Saw cables; Twisted saw strips
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23D—PLANING; SLOTTING; SHEARING; BROACHING; SAWING; FILING; SCRAPING; LIKE OPERATIONS FOR WORKING METAL BY REMOVING MATERIAL, NOT OTHERWISE PROVIDED FOR
    • B23D65/00—Making tools for sawing machines or sawing devices for use in cutting any kind of material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B27/00—Other grinding machines or devices
    • B24B27/06—Grinders for cutting-off
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
    • B24D3/04—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic
    • B24D3/14—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic ceramic, i.e. vitrified bondings
    • B24D3/18—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic ceramic, i.e. vitrified bondings for porous or cellular structure
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/34—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor characterised by the shape of the material to be treated
    • C23C2/36—Elongated material
    • C23C2/38—Wires; Tubes

Definitions

  • the present invention relates to an abrasive fixed metal wire to which abrasive grains such as a saw wire are fixed and a method for manufacturing the same.
  • a resin bond saw is a kind of abrasive-fixed metal wire in which abrasive grains made of diamond or CBN (Cubic Boron Nitride) are fixed to a metal core wire Wires and electrodeposited saw wires are known.
  • Resin bond saw wire is a saw wire in which abrasive grains are fixed to a metal core with resin.
  • Resin bond saw wires can be made by applying a liquid hard resin mixed with abrasive grains to a metal core wire and curing it, making it easier to manufacture than electrodeposited saw wires. There is a problem that the abrasive grains easily peel off.
  • the electrodeposition saw wire can suppress wear during use because the abrasive grains are fixed by the metal plating layer, but there is a problem that it takes time for the plating process to electrodeposit the abrasive grains. . Therefore, in Patent Document 1, in order to improve the abrasive electrodeposition speed of the electrodeposited saw wire, the abrasive grains were covered with a conductive coating layer such as TiC or SiC, and the abrasive grains covered with this coating layer were mixed. It has been proposed to convey a metal core wire while immersing it in a plating bath, and apply a voltage to the metal core wire and a plating solution to electrodeposit abrasive grains onto the metal core wire.
  • a conductive coating layer such as TiC or SiC
  • the present inventors cannot increase the electrodeposition rate of abrasive grains in a plating bath with high electrical conductivity because the speed at which the abrasive grains migrate to the surface of the metal core wire is proportional to the electric field strength (V / cm). I found. Specifically, if the plating voltage is forcibly increased, the supply of plating metal ions to the surface of the metal core wire will not be in time, causing generation of hydrogen gas on the surface of the metal core wire and poor adhesion of abrasive grains due to plating burn. For this reason, there is a limit to the plating voltage that can be applied, and there is also a limit to the electrodeposition speed of the abrasive grains. Therefore, for example, the conventional dispersion plating method as in Patent Document 1 has found that the electrodeposition speed of the abrasive grains on the saw wire has an essential limit.
  • an object of the present invention is to provide a method for producing an abrasive-fixed metal wire having a high production rate and an abrasive-fixed metal wire.
  • a metal core wire is immersed in an abrasive electrodeposition solution containing colloidal particles of metal oxide and abrasive grains
  • a method for producing an abrasive-fixed metal wire wherein a voltage having a polarity different from that of the colloidal particles is applied to the metal core wire, and the abrasive particles are adhered to the metal core wire together with the colloid particles.
  • the metal oxide contains at least one metal selected from Ti, Zr, Al, Zn, Ni, Fe, Co, Cu, Cr, Sn, and Si (1) Or the manufacturing method of the abrasive grain fixed metal wire as described in (2).
  • a protective layer covering at least a part of the abrasive grains is formed.
  • a manufacturing method of an abrasive fixed metal wire is produced.
  • a metal core wire A metal wire comprising abrasive grains fixed on the metal core wire, The abrasive grain fixed metal wire, wherein the abrasive grain is fixed to the metal core wire through a metal oxide.
  • the metal oxide is an oxide of at least one metal selected from Ti, Zr, Al, Zn, Ni, Fe, Co, Cu, Cr, Sn, and Si.
  • the abrasive grain fixed metal wire according to any one of (6) to (8).
  • (11) The abrasive fixed metal wire according to any one of (6) to (10), wherein an average film thickness of the protective layer is 0.2 ⁇ m or more and 20 ⁇ m or less.
  • (12) In any one of (6) to (11), the metal core wire is covered with an underlayer made of at least one metal selected from Cu, Zn, and Ni.
  • attached amount of the metal oxide is one wherein the relative surface area 1 m 2 of the metal core is in terms of metal 5 mg / m 2 or more 500 mg / m 2 or more (6)
  • the charged metal oxide colloidal particles are applied to the surface of the metal core wire. Precipitate at high speed.
  • colloidal particles adhering to the abrasive grains are pulled to the metal core wire, and colloidal particles heading toward the metal core wire press the abrasive grains, so that the abrasive grains adhere to the surface of the metal core wire, and colloidal particles that are simultaneously precipitated A metal oxide layer is formed and the abrasive grains are fixed to the surface of the metal core wire.
  • FIG. 1 It is a perspective view which shows a part of saw wire which concerns on embodiment of this invention. It is a fragmentary sectional view of the saw wire of FIG. It is a schematic diagram which shows the manufacturing process of the saw wire which concerns on embodiment of this invention. It is the schematic diagram which showed a mode that an abrasive grain adhered to a metal core wire.
  • FIG. 1 is a perspective view showing a part of a saw wire 1 according to this embodiment.
  • the saw wire 1 according to the present embodiment is configured such that abrasive grains 20 are fixed on an outer peripheral surface 11 of a metal core wire 10 such as a piano wire or a steel wire. Further, the outer peripheral surface 11 of the metal core wire 10 is protected by a protective layer 40.
  • FIG. 2 is a sectional view of the saw wire 1.
  • the abrasive grains 20 are formed on the metal core wire 10 through a metal oxide layer 30 such as zirconium oxide, titanium oxide, aluminum oxide, chromium oxide, silicon oxide, tin oxide, nickel oxide, iron oxide, cobalt oxide, copper oxide, or zinc oxide.
  • the metal oxide layer 30 is covered with a protective layer 40 and is fixed to the outer peripheral surface 11.
  • the abrasive 20 has an example in which the metal oxide layer 30 is interposed between the abrasive core 20 and the metal core wire 10.
  • the abrasive grains 20 may be fixed to the metal core wire 10 by being covered with the oxide layer 30.
  • the metal core wire 10 a steel wire or piano wire having a wire diameter of about 0.01 to 0.3 mm is suitable as a saw wire. Moreover, when the base layer 12 containing at least one kind of Cu, Zn, Ni or the like is provided on the surface of the steel wire, the metal core wire 10 can be protected from rust and the metal core wire 10 can be easily drawn. it can.
  • diamond or CBN (Cubic Boron Nitride) abrasive having an average particle diameter of 1 to 60 ⁇ m can be used.
  • a saw wire having an average particle diameter of 5 to 40 ⁇ m can be more preferably used.
  • the metal oxide layer 30 is an oxide containing at least one metal selected from Ti, Zr, Al, Zn, Ni, Fe, Co, Cu, Cr, Sn, and Si.
  • the metal oxide layer 30 may be in the form of a porous xerogel.
  • the metal oxide layer 30 may contain a silane derivative.
  • the protective layer 40 is a protective film that enhances the adhesion of the abrasive grains 20 to the metal core wire 10 and protects the outer peripheral surface 11 of the metal core wire 10 from rust and scratches. It can be formed from a ceramic coating such as Si having excellent wear resistance, a metal protective film that can be easily formed by plating, a hard resin that can be easily formed by coating, or the like.
  • the metal core wire 10 is pretreated to clean the surface of the metal core wire 10.
  • the pretreatment include alkali degreasing, water washing, and pickling in this order.
  • the metal core wire 10 is immersed in the abrasive electrodeposition liquid 60 in the abrasive electrodeposition tank 51 while being fed by the electrode roller 52 and the in-liquid roller 53.
  • the electrode roller 52 is provided above the surface of the abrasive electrodeposition liquid 60, and an electrode is formed on the contact surface with the metal core wire 10 so that a voltage can be applied to the metal core wire 10.
  • the submerged roller 53 is provided in the abrasive electrodeposition tank 51 so that the metal core wire 10 to be conveyed can be immersed in the abrasive electrodeposition liquid 60.
  • An electrode is formed inside the bathtub of the abrasive electrodeposition tank 51.
  • the abrasive electrodeposition liquid 60 includes a colloid dispersion liquid containing colloidal particles 61 made of a metal oxide dispersed in water as a medium, and the abrasive grains 20.
  • the colloidal particles 61 are made of at least one metal oxide selected from Ti and Zr that form a metal oxide colloid in water.
  • the colloidal particles 61 are prepared by dissolving an inorganic titanium compound such as titanium chloride, titanium oxychloride, titanium sulfate, and titanyl sulfate in water, and adding a catalyst such as hydrochloric acid or nitric acid as necessary.
  • titanium oxide colloidal particles can be obtained by hydrolysis by heating.
  • colloidal particles of titanium oxide can be obtained by hydrolysis of an organic titanium compound such as titanium alkoxide or titanium acetylacetonate.
  • zirconium oxide colloidal particles can be obtained from zirconium oxychloride, zirconyl sulfate, zirconium carbonate, zirconium alkoxide, or crystalline zirconium oxide sol.
  • the titanium oxide colloidal particles or zirconium oxide particles obtained in the acidic solution are positively charged.
  • the colloidal particles 61 in the abrasive electrodeposition liquid 60 are preferably negatively charged in the acidic to neutral colloidal dispersion. This is because when these colloidal particles 61 are positively charged in an acidic to neutral colloidal dispersion, the colloidal particles 61 aggregate and the dispersion becomes unstable.
  • an alkaline component is added to the above acidic colloidal dispersion to make the pH of the colloidal dispersion 5 or higher, and a water-soluble phosphorus compound is added to negatively charge titanium oxide particles or zirconium oxide particles. Is preferred.
  • the water-soluble phosphorus compound phosphoric acid, pyrophosphoric acid, tripolyphosphoric acid or an alkali salt thereof can be used, and a preferable concentration thereof is 1 part by mass or more and 20 parts by mass or less.
  • the water-soluble phosphorus compound dissolves in water to become negative phosphate ions (PO 4 3 ⁇ ), and the phosphate ions adhere to the colloidal particles 61 and increase the negative charge of the entire colloidal particles 61.
  • the repulsive force is increased, and the colloidal particles 61 can be stably dispersed in the colloidal dispersion.
  • the sign of the colloidal particles 61 can be easily measured with a zeta potential measuring device or the like.
  • the colloidal particles 61 are preferably charged with a negative potential of ⁇ 50 mV or less.
  • a negative potential In the case of aluminum oxide, cobalt oxide, nickel oxide, chromium oxide, copper oxide, zinc oxide, and iron oxide, it is preferable to be charged at a positive potential of +30 mV or higher.
  • silicon oxide it is preferably either ⁇ 50 mV or less or +30 mV or more.
  • the alkaline component added to make the colloid dispersion liquid have a pH of 5 or more preferably contains at least one alkaline component selected from ammonium compounds, alkali metal compounds and amines.
  • the ammonium compound is ammonium hydroxide (ammonia water)
  • the alkali metal compound is sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium silicate
  • the alkali component selected from amines is ethylenediamine, triethylenetetramine, etc. Examples of such polyamines can be given.
  • a water-soluble phosphorus compound and an alkaline component for example, a phosphorus compound that stably disperses the colloidal particles 61, such as ammonium pyrophosphate and ammonium lactate, and a compound that is also an alkaline component that makes the colloid dispersion liquid alkaline. It can also be used.
  • acidic ions such as hydrochloric acid ions and sulfate ions remaining in the colloidal dispersion can be neutralized to adjust the pH to 5 or more.
  • the pH of the colloidal dispersion varies depending on the type of the metal oxide, but in the case of titanium oxide or zirconium oxide, it is preferably adjusted to a range of 5 or more and 10 or less. If the pH is less than 5, the colloidal particles 61 cannot be uniformly dispersed in the colloidal dispersion. On the other hand, when the pH is higher than 10, the metal core wire 10 is dissolved in the step of attaching the abrasive grains 20 to the metal core wire 10, which is not preferable. In addition, it is preferable that 1 to 50 mass parts is added for the alkaline component to add.
  • the particle diameter of the colloidal particles 61 is preferably 1 nm or more and 500 nm or less, and more preferably 3 nm or more and 120 nm or less. This is because if the colloidal particles 61 are too small, the colloidal particles 61 tend to aggregate over time and the amount of precipitation is not stable, and if the colloidal particles 61 are too large, they are likely to precipitate.
  • colloidal particles having a desired particle size can be obtained by treating the colloidal dispersion with a stirrer such as a homomixer for a predetermined time.
  • the electric conductivity of the colloidal dispersion is preferably greater than 0 and less than 10 mS / cm, more preferably 0.05 mS / cm or more and 5 mS / cm or less.
  • the electric conductivity is less than 0.05 mS / cm, it may be difficult to stably control the amount of metal oxide deposited due to impurities in the colloidal dispersion.
  • it is larger than 10 mS / cm, the amount of elution of the metal core wire 10 into the abrasive electrodeposition liquid is increased, which is not preferable.
  • the electrical conductivity can be lowered by performing a desalting treatment such as bringing the colloidal dispersion into contact with pure water through an ion exchange membrane. When the electrical conductivity is too high, the electrical conductivity can be lowered by dialysis or auto draining the supernatant of the colloidal dispersion.
  • the abrasive electrodeposition liquid 60 is obtained by mixing the colloidal dispersion prepared as described above with abrasive grains having an average particle diameter of 1 to 60 ⁇ m made of diamond, CBN (Cubic Boron Nitride) or the like.
  • the other components contained in the abrasive electrodeposition liquid 60 include chlorine ions, sulfate ions, alcohols, and the like depending on the titanium raw material used, but the remaining components are substantially composed of water.
  • colloidal particles 61 made of titanium dioxide a part of water may be replaced with a water-soluble solvent such as alcohol, glycol, glycol ether or ketone as an auxiliary solvent.
  • silane derivatives such as silica sol and alkyltrimethoxysilane are added as binders to improve the coating properties such as hardness and wear resistance of the metal oxide layer 30 formed on the outer peripheral surface 11 of the metal core wire 10. May be.
  • colloidal particles 61 in the abrasive electrodeposition liquid 60 have electric charges, they repel each other and are dispersed as shown in FIG. Some colloidal particles 61 are attached to the abrasive grains 20. Since the colloidal particles 61 adhering to the abrasive grains 20 are also charged, the respective abrasive grains 20 are repelled by the repulsive force of the colloidal particles 61 and are dispersed in the abrasive electrodeposition liquid 60. .
  • the electrode roller 52 is connected to a voltage source having a polarity opposite to that of the colloidal particles 61, a voltage is applied between the electrode roller 52 and the abrasive electrodeposition tank 51, and the abrasive electrodeposition liquid 60 prepared as described above is applied.
  • the metal core wire 10 is conveyed by the electrode roller 52 and the submerged roller 53 while immersing the metal core wire 10. Then, the colloidal particles 61 are attracted to the metal core wires 10 having different polarities and deposited on the outer peripheral surface 11 to form the metal oxide 30.
  • the abrasive grains 20 also adhere to the outer peripheral surface 11 of the metal core wire 10, and the attached abrasive grains 20 are fixed to the outer peripheral surface 11 by the metal oxide layer 30.
  • the abrasive grains 20 are pushed by the colloidal particles 61, or the colloidal particles 61 attached to the abrasive grains 20 are attracted to the metal core wire 10. It is thought that it adheres to the core wire 10.
  • the electrical conductivity of the abrasive electrodeposition liquid 60 is set to a low value of 10 mS / cm or less, and since the number of ions in the abrasive electrodeposition liquid 60 is small, a large number of colloidal particles 61 are not bonded to ions. It is stably dispersed in the abrasive electrodeposition liquid 60.
  • the colloidal particles start electrophoresis at high speed, and the abrasive grains are electrodeposited together with the colloidal particles in a short time by quickly carrying the mixed abrasive grains to the surface of the saw wire. Is done.
  • the electrical conductivity of the abrasive electrodeposition liquid 60 is low, a high voltage can be applied, and colloidal particles can be deposited on the surface of the metal core wire at high speed.
  • the abrasive grains 20 mixed in the abrasive electrodeposition liquid 60 preferably have an average particle diameter of 1 to 60 ⁇ m. This is because the abrasive grains 20 having an average particle diameter of less than 1 ⁇ m deteriorate the performance as the saw wire 1, and the abrasive grains 20 having a particle diameter of greater than 60 ⁇ m are difficult to adhere to the metal core wire 10 even with the colloidal particles 61.
  • the saw wire 1 obtained as described above may be heated and dried.
  • the obtained saw wire 1 is heated and dried, and the deposited colloidal particles 61 are dehydrated and condensed, whereby the formed metal oxide layer 30 can be strengthened.
  • the formed metal oxide layer 30 becomes a porous xerogel.
  • the protective layer 40 is formed on the saw wire 1 by plating, if the colloidal particles 61 are eluted in the plating solution, the plating solution is deteriorated. Therefore, the saw wire 1 is dried and cured before the plating step. It is preferable.
  • the amount of metal oxide layer 30 formed by adhering colloidal particles 61 is preferably 5 mg / m 2 or more and 500 mg / m 2 or more in terms of metal with respect to the surface area of metal core wire 10.
  • the adhesion amount of the metal oxide is less than 5 mg / m 2 , the abrasive grains 20 are easy to peel off.
  • the adhesion amount is greater than 500 mg / m 2 , the colloidal particles 61 are adhered between the abrasive electrodeposition liquid 60 and the metal core wire 10. This is because the applied voltage becomes too large and is not efficient.
  • the protective layer 40 may be plated on the metal core wire 10 to which the abrasive grains 20 obtained as described above are fixed.
  • Examples of the protective layer 40 include Cu, Ni, and Zn. Since it is not necessary to perform the plating process of the protective layer 40 while attaching the abrasive grains 20, a high voltage can be applied to the plating bath to improve the plating process speed.
  • the average film thickness of the protective layer 40 is preferably 0.2 ⁇ m or more and 20 ⁇ m or less. This is because if the average film thickness of the protective layer 40 is less than 0.2 ⁇ m, the effect of protecting the metal core wire 10 cannot be expected, and if it is larger than 20 ⁇ m, the abrasive grains are buried in the protective layer 40 and do not function as the saw wire 1.
  • the plating speed can be increased at a high plating speed without limiting the speed at which the abrasive grains 20 are wound.
  • the abrasive electrodeposition liquid 60 in which the colloidal particles 61 are dispersed a large amount of the abrasive grains 20 can be attached to the metal core wire 10 at high speed. Therefore, the high performance saw wire 1 can be manufactured at high speed. Further, since the abrasive grains 20 are present in a dispersed manner in the abrasive electrodeposition liquid 60, the abrasive grains 20 can be dispersed and adhered to the saw wire 1.
  • the protective layer 40 is provided as a metal plating layer.
  • a resin is applied and cured, and the resin protective layer 40 or a ceramic coating is applied to make the ceramic layer.
  • the protective layer 40 may be provided.
  • Examples 1 to 9 were prepared by the manufacturing method of the above-described embodiment, and compared with Comparative Examples 1 to 3 in which abrasive grains were fixed in the plating process as in Patent Document 1.
  • the saw wire according to Example 1 was prepared as follows. First, a steel wire having a wire diameter of 0.12 mm subjected to brass plating is pretreated, and is alkali degreased at 60 ° C. for 60 seconds using an alkaline degreasing solution (FC-4360 manufactured by Nippon Parkerizing Co., Ltd.) and then washed with water. Further, it was pickled with a 0.1 mol / L sulfuric acid solution at room temperature for 10 seconds.
  • FC-4360 manufactured by Nippon Parkerizing Co., Ltd.
  • the abrasive prepared as follows The metal core wire 10 was conveyed so that it might be immersed in the particle electrodeposition liquid for 0.3 second.
  • the obtained saw wire was subjected to Ni plating to form a protective layer.
  • the abrasive electrodeposition solution was prepared as follows. First, as a metal oxide colloidal particle, a titanium oxide colloid was prepared by the following method. 154 g of titanium chloride aqueous solution (Ti: 15 to 16% by mass, manufactured by Sumitomo Sitix Co., Ltd.) was diluted with 500 mL of pure water, and contacted with pure water through an anion exchange membrane at room temperature for 7 hours to remove anion components (salt chloride). An acidic amorphous titanium oxide colloidal dispersion was prepared by deionization treatment to reduce product ions). In this state, the titanium oxide colloidal particles are positively charged.
  • Ti titanium chloride aqueous solution
  • An acidic amorphous titanium oxide colloidal dispersion was prepared by deionization treatment to reduce product ions). In this state, the titanium oxide colloidal particles are positively charged.
  • colloidal dispersion diluted with pure water, and immediately after that, morpholine was added to raise the pH to about 8. Further, the colloidal particles were dispersed for 15 minutes with a homomixer, transferred to an ultrafiltration membrane, and deionized water was fed while supplying deionized water until the electric conductivity of the colloidal dispersion became 10 mS / cm or less.
  • the dispersed particle diameter of the titanium oxide colloidal particles measured by the laser type particle size distribution measuring apparatus was 0.005 ⁇ m or more and 0.01 ⁇ m or less.
  • the produced titanium oxide colloidal particles were negatively charged and the zeta potential was ⁇ 70 mV.
  • the concentration of the titanium oxide colloidal particles was 4% by mass by dry weight.
  • abrasive electrodeposition liquid To the titanium oxide colloidal dispersion prepared as described above, 2500 parts by weight of diamond particles having an average particle size of 10 ⁇ m were added as abrasive grains to obtain an abrasive electrodeposition liquid.
  • Example 2 is the same as Example 1 described above, except that the time for immersing the metal core wire in the abrasive electrodeposition liquid is shortened to 0.03 seconds.
  • Example 3 is a saw wire formed using an abrasive electrodeposition liquid containing diamond abrasive grains provided with a Ni coating layer in Example 1 described above.
  • Example 4 as a metal oxide colloidal particle, a zirconium oxide colloidal sol having a negative charge (ZSL-10A manufactured by Daiichi Rare Element Chemical Co., Ltd.) was averaged as 150 parts by weight in terms of ZrO 2 and abrasive grains.
  • ZSL-10A manufactured by Daiichi Rare Element Chemical Co., Ltd.
  • an abrasive electrodeposition solution prepared by adding 2500 parts by weight of diamond particles having a particle size of 10 ⁇ m a steel wire is used as an anode (positive electrode), and a stainless counter electrode placed in parallel with this is used as a cathode (negative electrode). Then, the metal core wire 10 was conveyed at a speed at which immersion energization was performed for 0.3 second, and the formed electrodeposition film was dried by heating at 120 ° C. for 15 seconds. Furthermore, Ni plating was given to the obtained saw wire to form a protective layer.
  • Example 5 as the metal oxide colloidal particles, tin oxide sol having a negative charge (Ceramenu [pH 10] manufactured by Taki Chemical Co., Ltd.) was 250 parts by weight in terms of SnO 2 and the average particle diameter was 5 ⁇ m as abrasive grains.
  • an abrasive electrodeposition solution prepared by adding 2000 parts by weight of the above diamond particles a steel wire was used as an anode (positive electrode), and a stainless counter electrode placed in parallel therewith was used as a cathode (negative electrode).
  • the metal core wire 10 was transported at a speed at which immersion current was applied for 2 seconds, and the formed electrodeposition film was dried by heating at 120 ° C. for 10 seconds. Furthermore, Ni plating was given to the obtained saw wire to form a protective layer.
  • Example 6 as the metal oxide colloidal particles, a negatively charged silicon oxide sol (Snowtex N [pH 9.5] manufactured by Nissan Chemical Co., Ltd.) was 350 parts by weight in terms of SiO 2 and the average particle size as abrasive grains.
  • an abrasive electrodeposition liquid prepared by adding 2000 parts by weight of diamond particles having a diameter of 10 ⁇ m a steel wire is used as an anode (positive electrode), and a stainless counter electrode placed in parallel thereto is used as a cathode (negative electrode).
  • the metal core wire 10 was conveyed at a speed at which it was immersed for 3 seconds, and the produced electrodeposition film was dried by heating at 120 ° C. for 10 seconds. Furthermore, Ni plating was given to the obtained saw wire to form a protective layer.
  • Example 7 as the metal oxide colloid particles, positively charged alumina sol (Alumina Sol A-2 [pH 3.7] manufactured by Kawaken Fine Chemical Co., Ltd.) was averaged as 200 parts by weight in terms of Al 2 O 3 and abrasive grains.
  • abrasive electrodeposition solution prepared by adding 2500 parts by weight of diamond particles having a particle diameter of 10 ⁇ m, a steel wire is used as a cathode (negative electrode), and a platinum-plated titanium counter electrode placed in parallel with this is used as an anode (positive electrode).
  • the metal core wire 10 was transported at a speed of immersion energization for 0.2 seconds at 20 V, and the formed electrodeposition film was dried by heating at 120 ° C. for 10 seconds. Furthermore, Ni plating was given to the obtained saw wire to form a protective layer.
  • iron hydroxide sol having a positive charge (viral Fe-C10 [pH 7] manufactured by Taki Chemical Co., Ltd.) is 300 parts by weight in terms of FeOOH and the average particle size as abrasive grains.
  • an abrasive electrodeposition solution prepared by adding 2000 parts by weight of 5 ⁇ m diamond particles a steel wire is used as a cathode (negative electrode), and a platinum-plated titanium counter electrode placed in parallel thereto is used as an anode (positive electrode). Then, the metal core wire 10 was conveyed at a speed at which immersion energization was performed for 0.2 seconds, and the formed electrodeposition film was dried by heating at 120 ° C. for 10 seconds. Furthermore, Ni plating was given to the obtained saw wire to form a protective layer.
  • Example 9 as a metal oxide colloidal particle, a zinc hydroxide slurry produced by adding a sodium hydroxide solution to a zinc sulfate aqueous solution was subjected to dialysis to remove impurity salts, and a positively charged zinc hydroxide sol and did.
  • the abrasive electrodeposition liquid prepared by adding 150 parts by weight of the prepared sol in terms of ZnO and 2500 parts by weight of diamond particles having an average particle diameter of 10 ⁇ m as abrasive grains a steel wire is used as a cathode (negative electrode).
  • the metal core wire 10 was conveyed at a rate of immersion energization at 25 V for 0.5 seconds, and the formed electrodeposition film was dried by heating at 150 ° C. for 10 seconds. Furthermore, Ni plating was given to the obtained saw wire to form a protective layer.
  • Comparative Example 1 a steel wire having a wire diameter of 0.12 mm subjected to brass plating in the same manner as in Example 1 described above was immersed in a Ni plating solution mixed with diamond abrasive grains having an average particle diameter of 10 ⁇ m. A voltage is applied between the plating bath and the metal core wire, and the metal core wire is immersed in the plating bath for 0.3 seconds and dried.
  • the plating solution used was prepared by dissolving 4 kg of nickel sulfamate in 6 liters of warm water, adding 0.2 kg of nickel chloride and 0.3 kg of boric acid and dissolving them with stirring.
  • Comparative Example 2 is the same as Comparative Example 1 described above, except that the time for immersing the metal core wire in the plating bath is shortened to 0.03 seconds.
  • the comparative example 3 is a saw wire produced using the plating liquid containing the diamond abrasive grain in which the coating layer of Ni was provided in the above-mentioned comparative example 1.
  • adhesion density expands the surface of a saw wire with a scanning electron microscope (SEM), and confirms the number of the abrasive grains in a visual field visually.
  • SEM scanning electron microscope
  • the saw wire made under the above-mentioned conditions was subjected to a cold drawing process of about 15% using a drawing die, and the abrasive grains were driven into the plated layer of the saw wire. If no dropout was observed, it was evaluated as ⁇ , and if dropout was observed, it was evaluated as ⁇ .
  • Example 1 shows that the time required for the abrasive grain fixing process is the same, but the saw wire according to Example 1 has a larger abrasive adhesion density. Therefore, according to the saw wire manufacturing method according to the present embodiment, a saw wire having a high adhesion density can be obtained. In both Example 1 and Comparative Example 1, it was confirmed that the abrasive grains were fixed to the metal core wire with a sufficient fixing force.
  • Example 4 to Example 9 even when a material such as zirconium oxide, tin oxide, silicon oxide, alumina sol, iron hydroxide sol, or zinc hydroxide is used as the metal oxide forming the metal oxide colloidal particles. It was confirmed that a metal core wire having a high adhesion density of abrasive grains and a high adhesion strength of abrasive grains could be produced by a short grain fixing process.
  • a material such as zirconium oxide, tin oxide, silicon oxide, alumina sol, iron hydroxide sol, or zinc hydroxide
  • the plating solution since the abrasive grains are mixed in the plating solution, the plating solution may be deteriorated with time.
  • the manufacturing method according to the present embodiment since the abrasive is not mixed in the plating solution for forming the protective layer, the plating solution does not deteriorate even when the plating solution is used for a long period of time.
  • the charged metal oxide colloidal particles are applied to the surface of the metal core wire. Precipitate at high speed.
  • colloidal particles adhering to the abrasive grains are pulled to the metal core wire, and colloidal particles heading toward the metal core wire press the abrasive grains, so that the abrasive grains adhere to the surface of the metal core wire, and colloidal particles that are simultaneously precipitated A metal oxide layer is formed and the abrasive grains are fixed to the surface of the metal core wire.

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  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Polishing Bodies And Polishing Tools (AREA)

Abstract

La présente invention se rapporte à un procédé à vitesse élevée pour fabriquer un fil métallique auquel adhèrent des grains abrasifs. Un noyau métallique est plongé dans un liquide d'électrodéposition contenant des grains abrasifs et des particules colloïdes d'un oxyde métallique ; et une tension d'une polarité différente de celle des particules colloïdes est appliquée au noyau métallique, si bien que les grains abrasifs sont amenés à adhérer, avec les particules colloïdes, au noyau métallique.
PCT/JP2012/056495 2011-03-15 2012-03-14 Fil métallique auquel adhèrent des grains abrasifs et procédé de fabrication de fil métallique auquel adhèrent des grains abrasifs WO2012124717A1 (fr)

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KR1020137023337A KR20140061292A (ko) 2011-03-15 2012-03-14 지립 고착 금속선 및 그의 제조 방법
JP2013504749A JPWO2012124717A1 (ja) 2011-03-15 2012-03-14 砥粒固着金属線及びその製造方法
CN2012800121062A CN103429391A (zh) 2011-03-15 2012-03-14 粘着有磨粒的金属线及其制造方法

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CN104116312A (zh) * 2014-07-15 2014-10-29 宁波美神塑料科技有限公司 一种主体为磨料丝的包覆丝及其制造方法
CN105908244A (zh) * 2016-06-29 2016-08-31 刘伟 金刚线制备工艺
CN106782788A (zh) * 2017-01-10 2017-05-31 余钟泉 一种无机漆包线及其制备装置和制备方法
CN110561282B (zh) * 2018-06-06 2021-07-30 江苏华东砂轮有限公司 砂轮用补强剂、补强砂轮及制备方法
JP2022189632A (ja) * 2021-06-11 2022-12-22 パナソニックＩｐマネジメント株式会社 ソーワイヤ用電着線及び金属線、並びに、ソーワイヤ用電着線の製造方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000254866A (ja) * 1999-03-05 2000-09-19 Noritake Diamond Ind Co Ltd 超砥粒電着砥石の製造方法および超砥粒電着砥石
JP2003181765A (ja) * 2002-12-24 2003-07-02 Alps Electric Co Ltd 多孔質超砥粒砥石とその製造方法
JP2003525130A (ja) * 1998-03-11 2003-08-26 サンーゴバン アブレイシブズ，インコーポレイティド 超砥粒ワイヤソーおよびそのソーの製造方法
JP2010201542A (ja) * 2009-03-02 2010-09-16 Sumitomo Electric Ind Ltd ダイヤモンドワイヤーソー、ダイヤモンドワイヤーソーの製造方法
JP2011016208A (ja) * 2009-07-10 2011-01-27 Noritake Super Abrasive Co Ltd 固定砥粒ワイヤ及び固定砥粒ワイヤ製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3362854B2 (ja) * 1994-01-13 2003-01-07 ミネソタ マイニング アンド マニュファクチャリング カンパニー 研摩材、研摩材の製造方法、および研摩装置
CN1100671C (zh) * 1999-05-04 2003-02-05 李美琴 一种反光件的制造方法
KR101163539B1 (ko) * 2003-11-06 2012-07-06 니끼 쇼꾸바이 카세이 가부시키가이샤 체인 무기 산화물 미립자 그룹, 미립자 그룹 분산의제조방법 및 미립자 그룹의 이용
JP4139810B2 (ja) * 2004-12-28 2008-08-27 旭ダイヤモンド工業株式会社 電着ワイヤ工具
CN201283606Y (zh) * 2008-08-11 2009-08-05 魏莲君 超细金刚石切割线

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003525130A (ja) * 1998-03-11 2003-08-26 サンーゴバン アブレイシブズ，インコーポレイティド 超砥粒ワイヤソーおよびそのソーの製造方法
JP2000254866A (ja) * 1999-03-05 2000-09-19 Noritake Diamond Ind Co Ltd 超砥粒電着砥石の製造方法および超砥粒電着砥石
JP2003181765A (ja) * 2002-12-24 2003-07-02 Alps Electric Co Ltd 多孔質超砥粒砥石とその製造方法
JP2010201542A (ja) * 2009-03-02 2010-09-16 Sumitomo Electric Ind Ltd ダイヤモンドワイヤーソー、ダイヤモンドワイヤーソーの製造方法
JP2011016208A (ja) * 2009-07-10 2011-01-27 Noritake Super Abrasive Co Ltd 固定砥粒ワイヤ及び固定砥粒ワイヤ製造方法

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