WO2012099253A1 - Coating composition for touch panels, coating film, and touch panel - Google Patents
Coating composition for touch panels, coating film, and touch panel Download PDFInfo
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- WO2012099253A1 WO2012099253A1 PCT/JP2012/051251 JP2012051251W WO2012099253A1 WO 2012099253 A1 WO2012099253 A1 WO 2012099253A1 JP 2012051251 W JP2012051251 W JP 2012051251W WO 2012099253 A1 WO2012099253 A1 WO 2012099253A1
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- transparent electrode
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- metal
- touch panel
- coating composition
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
- C08G77/58—Metal-containing linkages
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/14—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D185/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing atoms other than silicon, sulfur, nitrogen, oxygen, and carbon; Coating compositions based on derivatives of such polymers
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
- G06F3/0445—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
- G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04112—Electrode mesh in capacitive digitiser: electrode for touch sensing is formed of a mesh of very fine, normally metallic, interconnected lines that are almost invisible to see. This provides a quite large but transparent electrode surface, without need for ITO or similar transparent conductive material
Definitions
- the present invention relates to a coating composition for a touch panel, a coating film formed from the coating composition, and a touch panel having the coating film.
- inorganic coatings have been formed for various purposes on the surface of substrates such as glass, ceramics, metals, and plastics.
- substrates such as glass, ceramics, metals, and plastics.
- an inorganic coating By forming an inorganic coating on the surface of the substrate, it is possible to impart electrical properties, optical properties, chemical properties, mechanical properties, and the like to the substrate. Therefore, these inorganic coatings have been put into practical use as conductive films, insulating films, selective transmission or absorption films of light rays, alkali elution prevention films, chemical resistant films, hard coat films, and the like.
- Examples of the method for forming such an inorganic coating include a vapor phase method such as CVD (Chemical Vapor Deposition), PVD (Physical Vapor Deposition), sputtering, or a liquid phase method using an alkoxide compound.
- CVD Chemical Vapor Deposition
- PVD Physical Vapor Deposition
- sputtering or a liquid phase method using an alkoxide compound.
- the vapor phase method requires an expensive and large-scale apparatus such as a vacuum vapor deposition apparatus. There is also a problem that the size and shape of the base material on which the film can be formed are limited.
- a so-called sol-gel method is known as a liquid phase method using an alkoxide compound or the like. This method has advantages such as application to a large area and support for patterning. For this reason, the inorganic film by a liquid phase method is actively used as a coating film in an electronic device (for example, refer to Patent Document 1). In particular, recently, application to a touch panel has been studied.
- the touch panel detects the contact position of the operation area touched by a finger or pen. Using this function, the touch panel is used as an input device.
- the contact position detection method includes a resistance film method and a capacitance method.
- the resistive film method uses two opposing substrates, whereas the capacitive method allows a single substrate to be used. For this reason, according to the electrostatic capacity method, a thin touch panel can be configured and is suitable for a portable device or the like, so that development has been actively promoted in recent years.
- Patent Document 2 discloses a capacitive touch panel.
- a first transparent electrode for detecting coordinates in the X direction and a second transparent electrode for detecting coordinates in the Y direction are arranged on one surface of the transparent substrate, and intersect each other.
- An interlayer insulating film is interposed in the portion so as not to conduct.
- the touch panel is incorporated in a display device such as a liquid crystal display device and is used as a display device with a touch panel function capable of detecting a touch position. Since a person who operates the touch panel visually recognizes the display device through the touch panel, a member having excellent light transmission characteristics is used for the transparent electrode. For example, inorganic materials such as ITO (Indium Tin Oxide) are used. As the interlayer insulating film, patterning is possible, and an insulating acrylic material or the like is used.
- the touch panel as described above is required to have strength and high reliability because a finger or a pen tip may be actually touched and pressed in the operation area. Therefore, studies have been made to provide a protective film on the first and second electrodes that overlap with each other via an interlayer insulating film.
- the protective film an acrylic material that can be patterned is used.
- the acrylic material is an organic material, the hardness as a protective film is not sufficient.
- ITO etc. are used for a transparent electrode, the adhesiveness with respect to ITO is weak, and becomes a cause of reducing the reliability of a touch panel.
- a coating film containing an inorganic material as a component instead of an acrylic film has been studied as a protective film.
- the hardness is generally high, and high reliability can be expected as a coating film for a touch panel.
- it is required that a coating film using an inorganic material as a component can be formed using a printing technique and has high adhesion to an interlayer insulating film made of an organic material such as an acrylic material. ing.
- a difference in reflectance occurs between a region where a transparent electrode such as ITO is formed and a region where a transparent electrode is not formed. As a result, there is a problem that the pattern of the transparent electrode is visually recognized and display properties are lowered.
- an acrylic film has been used as a protective film material on the transparent electrode.
- the coat film preferably makes the transparent electrode pattern inconspicuous.
- an object of the present invention is to provide a coating film with a controlled refractive index that can be applied to a touch panel to achieve high reliability, and a coating composition that can form such a coating film.
- Another object of the present invention is to provide a touch panel having a coating film on an electrode, the refractive index of which is controlled and high reliability can be realized.
- a coating composition for a touch panel comprising: M 1 (OR 1 ) n (I) (Wherein M 1 is a group consisting of silicon (Si), titanium (Ti), tantalum (Ta), zirconium (Zr), boron (B), aluminum (Al), magnesium (Mg) and zinc (Zn).
- R 1 represents an alkyl group having 1 to 5 carbon atoms or an acetoxy group, and n represents a valence 2 to 5 of M 1 ).
- R 2 l M 2 (OR 3 ) ml (II) (Wherein M 1 is a group consisting of silicon (Si), titanium (Ti), tantalum (Ta), zirconium (Zr), boron (B), aluminum (Al), magnesium (Mg) and zinc (Zn).
- Represents at least one metal selected from R 2 may be substituted with a hydrogen atom or a fluorine atom, and may be a halogen atom, a vinyl group, a glycidoxy group, a mercapto group, a methacryloxy group, an acryloxy group, an isocyanate group; Represents a hydrocarbon group having 1 to 20 carbon atoms which may be substituted with an amino group or a ureido group and which may have a hetero atom, and R 3 represents an alkyl group having 1 to 5 carbon atoms.
- M represents the valence 2 to 5 of M 2
- l is 1 or 2 when the valence of m is 3, and 1 to 3 when the valence of m is 4, and the valence of m 1 to 4 if the number is 5 .
- M 3 (X) k (III) (Wherein M 3 represents aluminum (Al), indium (In), zinc (Zn), zirconium (Zr), bismuth (Bi), lanthanum (La), tantalum (Ta), yttrium (Y) and cerium ( Ce) represents at least one metal selected from the group consisting of: X is a residue of hydrochloric acid, nitric acid, sulfuric acid, acetic acid, succinic acid, sfamic acid, sulfonic acid, acetoacetic acid or acetylacetonate, or their basicity Represents a salt, and k represents the valence of M 3.
- 2nd metal alkoxide is a coating composition for touchscreen
- the anti-precipitation agent is at least one substance selected from the group consisting of N-methyl-pyrrolidone, ethylene glycol, dimethylformamide, dimethylacetamide, diethylene glycol, propylene glycol, hexylene glycol, and derivatives thereof. Or the coating composition for touchscreens of 2.
- the touch panel coating composition according to any one of 1 to 3 above, wherein + M 3 ) ⁇ 0.7. 5). 5. The touch panel coating composition as described in any one of 1 to 4 above, wherein the first metal alkoxide is a mixture of silicon alkoxide or a partial condensate thereof and titanium alkoxide. 6).
- the metal salt is a metal nitrate, metal sulfate, metal acetate, metal chloride, metal succinate, metal sphamate, metal sulfonate, metal acetoacetate, metal acetylacetonate or a basic salt thereof
- the coating composition for a touch panel as described in any one of 1 to 5 above. 7).
- the coating film as described in 8 above which has a refractive index of 1.52 to 1.70 and a film thickness of 40 nm to 170 nm.
- a touch panel in which a transparent electrode pattern is formed in the operation area of the substrate, 10.
- the transparent electrode pattern includes a first transparent electrode pattern for detecting positions in at least two different directions, and a second transparent electrode pattern, At least a part of the first transparent electrode pattern and the second transparent electrode pattern overlap in the operation region of the substrate, and the first transparent electrode pattern and the second transparent electrode in the overlapping part
- a film made of organic material is placed between the pattern and 10.
- the coating film according to 10 above wherein the coating film is configured to cover at least a part of the film made of the organic material together with at least a part of the first transparent electrode pattern or the second transparent electrode pattern.
- the touch panel described. 12 There are a plurality of overlapping portions of the first transparent electrode pattern and the second transparent electrode pattern in the operation region of the substrate, and each of the overlapping portions has an area larger than the area of the overlapping portion. 12.
- a coating composition for a touch panel that can be applied to a touch panel to form a coating film with a controlled refractive index that can realize high reliability.
- a coating film having a high refractive index and a high strength and suitable as a coating film for a touch panel is provided.
- a conspicuous electrode pattern is suppressed, and a highly reliable touch panel is provided.
- FIG. 2 is a cross-sectional view taken along the line A1-A1 'of FIG. (A)-(d) is process sectional drawing which shows the manufacturing method of the touchscreen of this invention. It is sectional drawing which shows schematic structure of another example of the touchscreen of this invention. It is a top view which shows typically the structure of another example of the touchscreen of this invention.
- FIG. 6 is a cross-sectional view taken along line B1-B1 ′ of FIG.
- the coating composition of the present invention includes a first metal alkoxide represented by the above general formula (I), a second metal alkoxide represented by the above general formula (II), and a metal represented by the above general formula (III). Contains a salt, an organic solvent, moisture, and a precipitation inhibitor. A coating suitable for a touch panel can be obtained by depositing this coating composition.
- the coating film obtained from the coating composition of the present invention is mainly composed of an inorganic metal oxide, and has a higher hardness and higher strength than a coating film made of an organic material such as an acrylic material. Have. Therefore, it is suitable as a protective film for an electrode of a touch panel. Further, the refractive index is controlled within the optimum range so as to reduce the so-called “electrode pattern appearance” phenomenon in which the transparent electrode pattern is visually recognized on the touch panel. As a result, it is possible to prevent deterioration in display properties of a display device to which a touch panel using this coat film is applied.
- the coating film obtained by the present invention is configured, for example, by including two types of transparent electrode patterns for detecting the positions in two different directions in the transparent electrode pattern arranged in the operation region of the touch panel substrate.
- an interlayer insulating film made of an organic material such as acrylic is disposed between the two transparent electrode patterns so as not to be electrically connected.
- the coat film is also formed on the interlayer insulating film.
- due to the difference in thermal stretchability between the coat film and the interlayer insulating film there is a problem that the coat film cracks and the reliability of the touch panel is lowered.
- the structure and composition of the components contained are preferably selected so that cracks do not occur in the coating film of the touch panel. More specifically, in the coating composition of the present invention, the metal alkoxide that is the main component can be selected in a structure and composition that are suitable for forming a coating film.
- the coating composition of the present invention contains a first metal alkoxide having a structure represented by the following general formula (I) and a second metal alkoxide having a structure represented by the following general formula (II).
- M 1 , R 1 and n are as defined above.
- M 1 is preferably silicon (Si), titanium (Ti), zirconium (Zr), or aluminum (Al), and particularly preferably silicon (Si) or titanium (Ti).
- N is preferably 3 or 4.
- M 2 , R 2 , R 3 and m are as defined above.
- M 2 is preferably silicon (Si), titanium (Ti), zirconium (Zr), or aluminum (Al), and particularly preferably silicon (Si) or titanium (Ti).
- R ′ represents an alkyl group having 1 to 5 carbon atoms, preferably 1 to 3 carbon atoms, or an acetoxy group.
- examples of the silicon alkoxide include tetraalkoxysilanes such as tetramethoxysilane, tetraethoxysilane, tetrapropoxysilane, tetrabutoxysilane, and tetraacetoxysilane.
- R ′′ represents an alkyl group having 1 to 5 carbon atoms.
- titanium alkoxide As the metal alkoxide represented by the formula (I), specifically, as titanium alkoxide, a titanium tetraalkoxide compound such as titanium tetraethoxide, titanium tetrapropoxide, titanium tetrabutoxide, or a moiety such as titanium tetra-n-butoxide tetramer A condensate or the like is used.
- a titanium tetraalkoxide compound such as titanium tetraethoxide, titanium tetrapropoxide, titanium tetrabutoxide, or a moiety such as titanium tetra-n-butoxide tetramer A condensate or the like is used.
- metal alkoxide represented by the formula (I) include zirconium tetraalkoxide compounds such as zirconium tetraethoxide, zirconium tetrapropoxide, zirconium tetrabutoxide; aluminum tributoxide, aluminum triisopropoxide, aluminum triethoxide And aluminum trialkoxide compounds such as tantalum pentapropoxide and tantalum pentaalkoxide compounds such as tantalum pentataboxide.
- zirconium tetraalkoxide compounds such as zirconium tetraethoxide, zirconium tetrapropoxide, zirconium tetrabutoxide
- aluminum tributoxide aluminum triisopropoxide
- aluminum trialkoxide compounds such as tantalum pentapropoxide and tantalum pentaalkoxide compounds such as tantalum pentataboxide.
- the content of the first metal alkoxide is preferably 20 mol% to 85 mol%, preferably 30 mol% to 70 mol%, based on the total amount of one metal alkoxide and second metal alkoxide contained in the coating composition. Mole% is more preferable.
- the second metal alkoxide represented by the above formula (II) is used in the coating composition of the present invention together with the first metal alkoxide.
- the coating composition when the coating film is formed on a film made of an organic material such as an acrylic material by including the second metal alkoxide, there is a difference in thermal stretchability between the coating film and the organic film. Alleviated.
- a coat film may be formed on the organic film, it is possible to prevent cracks from occurring in the coat film.
- a crack occurs in the coat film on the interlayer insulating film. Can be prevented.
- the content of the second metal alkoxide is preferably 80 to 15 mol%, preferably 70 to 30 mol, based on the total amount of one metal alkoxide and the second metal alkoxide contained in the coating composition. % Is more preferable.
- the carbon number of R 2 is 3 or less
- the content of the metal alkoxide represented by the formula (II) is 30% or more
- the carbon number of R 2 is 4 or more, or a mercapto group is contained in R 2
- the content of the second metal alkoxide is more preferably 15% or more, and more preferably 75 mol% or less.
- the total content of the first metal alkoxide and the second metal alkoxide contained in the coating composition is preferably 0.5% by weight to 20% by weight, more preferably 1% by weight to 15% by weight.
- this ratio is large, the storage stability of the coating composition is deteriorated and it is difficult to control the film thickness of the coating film.
- the thickness is small, the thickness of the resulting coating film becomes thin, and many coatings are required to obtain a predetermined film thickness.
- the metal salt contained in the coating composition of the present invention is represented by the following general formula (III).
- M 3 , X and k are as defined above.
- M 3 is preferably aluminum (Al), indium (In), cerium (Ce), or zirconium (Zr).
- X is preferably a residue of hydrochloric acid, nitric acid, acetic acid, succinic acid, sulfonic acid, acetoacetic acid or acetylacetonate, or a basic salt thereof.
- each acid in X is, for example, nitric acid is also called a nitrate radical and sulfuric acid is also called a sulfate radical, and the amount thereof is included so as to be equivalent to the valence of M 3 .
- a basic salt means the case where OH group is contained in the residue of said each acid.
- metal salts represented by the formula (III) nitrates, chloride salts, oxalates or basic salts thereof are particularly preferable. Of these, aluminum, indium, or cerium nitrate is more preferred from the viewpoint of availability and storage stability of the coating composition.
- the coating composition of the present invention contains an organic solvent.
- the organic solvent is for adjusting the viscosity of the coating composition and improving the coating property when forming a coating film from the coating composition to obtain a coating film.
- Content of the organic solvent in the coating composition Is preferably 80% by weight to 99.5% by weight and more preferably 85% by weight to 99% by weight with respect to the total metal alkoxide contained in the coating composition.
- the content of the organic solvent is small, the thickness of the resulting coating film is reduced, and many coatings are required to obtain a predetermined film thickness.
- the amount is large, the storage stability of the coating composition is deteriorated and it is difficult to control the thickness of the coating film.
- organic solvent used in the coating composition examples include alcohols such as methanol, ethanol, 1-propanol, 2-propanol, 1-butanol, 2-butanol, 2-methyl-1-propanol, and 2-methyl-2-propanol.
- Esters such as ethyl acetate; glycols such as ethylene glycol; or ester derivatives thereof; ethers such as diethyl ether; ketones such as acetone, methyl ethyl ketone, and cyclohexanone; aromatic hydrocarbons such as benzene and toluene; Is mentioned. These are used alone or in combination.
- the alkylene glycol or monoether thereof contained in the organic solvent is, for example, ethylene glycol, diethylene glycol, propylene glycol, hexylene glycol, or their monomethyl, monoethyl , Monopropyl, monobutyl or monophenyl ether.
- the molar ratio of the glycols or monoethers contained in the organic solvent used in the coating composition is less than 1 with respect to the titanium alkoxide, the stability of the titanium alkoxide is less effective, and the storage stability of the coating composition is reduced. Sexuality gets worse. on the other hand. It is not a problem to use a large amount of glycols or monoethers thereof.
- all of the organic solvents used in the coating composition can be the above-described glycols or monoethers thereof.
- the coating composition does not contain a titanium alkoxide, it is not necessary to specifically contain the above-mentioned glycol and / or its monoether.
- the coating composition preferably contains a precipitation inhibitor.
- the anti-deposition agent prevents the metal salt from precipitating in the coating film when a coating film is formed from the coating composition.
- the precipitation inhibitor include N-methyl-pyrrolidone, dimethylformamide, dimethylacetamide, ethylene glycol, diethylene glycol, propylene glycol, hexylene glycol, and derivatives thereof. Of these, N-methyl-pyrrolidone, ethylene glycol, diethylene glycol, propylene glycol, hexylene glycol or derivatives thereof are more preferable. At least one kind of precipitation inhibitor can be used.
- the content of the precipitation inhibitor in the coating composition is preferably used at a ratio (weight ratio) satisfying the following, when the metal of the metal salt is converted into a metal oxide. (Precipitation inhibitor / metal oxide) ⁇ 1 When the ratio is less than 1, the effect of preventing precipitation of the metal salt at the time of forming the coating film is reduced. On the other hand, the use of a large amount of precipitation inhibitor does not affect the coating composition at all, but is preferably 200 or less.
- metal alkoxide particularly silicon alkoxide, titanium alkoxide, or silicon alkoxide and titanium alkoxide may be added during hydrolysis / condensation reaction in the presence of a metal salt. It may be added after completion of the condensation reaction.
- the content of the metal salt contained in the coating composition is the sum of the metal atoms (M 1 and M 2 ) constituting the first and second metal alkoxides and the metal atom (M 3 ) of the metal salt.
- the content ratio is preferably a ratio (molar ratio) that satisfies the following. 0.01 ⁇ M 3 / (M 1 + M 2 + M 3 ) ⁇ 0.7 If this ratio is less than 0.01, the mechanical strength of the resulting coating is not sufficient, which is not preferable. On the other hand, when it exceeds 0.7, the adhesion of the coating film to a substrate such as a glass substrate or a transparent electrode is lowered. Furthermore, when baked at a low temperature of 450 ° C. or lower, the chemical resistance of the resulting coating film tends to be lowered. In particular, this ratio is more preferably 0.01 to 0.6.
- inorganic fine particles fine particles such as silica fine particles, alumina fine particles, titania fine particles, and magnesium fluoride fine particles are preferable, and a colloid solution of these inorganic fine particles is particularly preferable.
- This colloidal solution may be a dispersion of inorganic fine particle powder in a dispersion medium or a commercially available colloidal solution.
- the inclusion of inorganic fine particles makes it possible to impart the surface shape of the formed cured film and other functions.
- the inorganic fine particles preferably have an average particle size of 0.001 to 0.2 ⁇ m, more preferably 0.001 to 0.1 ⁇ m. When the average particle diameter of the inorganic fine particles exceeds 0.2 ⁇ m, the transparency of the cured film formed using the prepared coating liquid may be lowered.
- the dispersion medium for the inorganic fine particles include water and organic solvents.
- the pH or pKa is preferably adjusted to 1 to 10, more preferably 2 to 7, from the viewpoint of the stability of the coating solution for film formation.
- Organic solvents used for the dispersion medium of the colloidal solution include methanol, ethanol, propanol, butanol, ethylene glycol, propylene glycol, butanediol, pentanediol, 2-methyl-2,4-pentanediol, diethylene glycol, dipropylene glycol, ethylene Alcohols such as glycol monopropyl ether; ketones such as methyl ethyl ketone and methyl isobutyl ketone; aromatic hydrocarbons such as toluene and xylene; amides such as dimethylformamide, dimethylacetamide and N-methylpyrrolidone; ethyl acetate and butyl acetate And esters such as ⁇ -butyrolactone; ethers such as tetrahydrofuran and 1,4-dioxane. Of these, alcohols and ketones are preferred. These organic solvents can be used alone or in admixture of two or more as
- the solid content concentration in the coating composition of the present invention is preferably in the range of 0.5 wt% to 20 wt% when the above metal alkoxide and metal salt are converted as metal oxides.
- the solid content exceeds 20% by weight, the storage stability of the coating composition is deteriorated and it is difficult to control the thickness of the coating film.
- the solid content is less than 0.5% by weight, the resulting coating film is thin, and many coatings are required to obtain a predetermined film thickness.
- the solid content concentration is more preferably 1% by weight to 15% by weight.
- the coating composition of the present invention contains water in order to obtain a condensate by hydrolyzing the first and second metal alkoxides in the presence of the metal salt.
- the amount of water is preferably 2 to 24 moles relative to the total moles of the first and second metal alkoxides.
- the ratio of (amount of water (mole) / (total number of moles of metal alkoxide) is 2 or less, hydrolysis of the metal alkoxide becomes insufficient, resulting in a decrease in film formability or a coat obtained. It is not preferable because the strength of the film is decreased, and when the ratio is more than 24, polycondensation continues to proceed, so that storage stability is decreased. More preferably, it is ⁇ 20.
- the metal salt contained in the coating composition is a hydrate salt
- the moisture content is involved in the hydrolysis reaction, so the amount of water contained in the coating composition includes the moisture content of the metal salt. It is necessary to consider.
- the coexisting metal salt is a hydrated salt of an aluminum salt
- the coating composition of the present invention can form a coating film suitable for a touch panel.
- This coat film is a coat film containing an inorganic metal oxide as a main component, and has higher strength than a film made of an organic material such as an acrylic material. And in the touch panel mentioned later, it applies as a protective film of an electrode. Since the coat film has an appropriate thermal expansion / contraction characteristic, even if it is formed on the organic film constituting the touch panel, generation of cracks is suppressed to a minimum.
- the refractive index is controlled in an optimal range so that a decrease in display performance of the display device due to the visual recognition of the transparent electrode pattern is reduced.
- the control of the refractive index of the coating film can be realized by controlling the composition of the coating composition. That is, the coating film in the present invention is produced by hydrolyzing and condensing the metal alkoxide contained in the coating composition described above. By selecting the composition of the metal alkoxide, the coating film to be formed is refracted. It is possible to adjust the rate within a predetermined range. For example, when silicon alkoxide and titanium alkoxide are selected as the metal alkoxide, by adjusting the mixing ratio thereof, within a predetermined range described below, specifically within a range of about 1.45 to 2.1, It is possible to adjust the refractive index of the resulting coating film.
- a metal is formed so as to realize the refractive index.
- the composition molar ratio of alkoxide for example, silicon alkoxide and titanium alkoxide.
- the refractive index of a coating film from a coating composition obtained by hydrolyzing only silicon alkoxide is a value of about 1.45.
- the refractive index of the coating film from the coating composition obtained by hydrolyzing only a titanium alkoxide is a value of about 2.1.
- the refractive index of the coating film when it is desired to set the refractive index of the coating film to a specific value between about 1.45 and 2.1, coating is performed using silicon alkoxide and titanium alkoxide at a predetermined ratio so as to realize the refractive index value. It is possible to produce a composition.
- the refractive index of the resulting coating film can be adjusted by using other metal alkoxides.
- the refractive index of the coating film in the present invention can be adjusted by selecting film forming conditions in addition to the composition conditions. In this way, it is possible to realize a high hardness of the coating film and a desired refractive index value.
- the coating film of the coating composition is preferably dried and then baked as described above. Drying is preferably performed at room temperature to 150 ° C, more preferably at 40 to 120 ° C.
- the drying time is preferably about 30 seconds to 10 minutes, more preferably about 1 to 8 minutes.
- a drying method it is preferable to use a hot plate, a hot air circulating oven, or the like.
- the firing is preferably performed at 100 ° C. to 300 ° C., more preferably 150 ° C. to 250 ° C. in consideration of the heat resistance of the other components of the touch panel.
- the firing time is preferably 5 minutes or more, and more preferably 15 minutes or more.
- a baking method it is preferable to use a hot plate, a thermal circulation oven, an infrared oven, or the like.
- the refractive index of the coating film obtained varies depending on the baking temperature. In this case, the higher the baking temperature, the higher the refractive index of the coating film. Therefore, the refractive index of the resulting coating film can be adjusted by selecting an appropriate baking temperature.
- the refractive index of the resulting coating film varies when the coating film is irradiated with ultraviolet rays (UV) before firing.
- UV ultraviolet rays
- the refractive index of the coat film can be increased as the amount of ultraviolet irradiation is increased. Therefore, it is possible to select the presence or absence of ultraviolet irradiation in order to achieve a desired refractive index.
- the refractive index of the resulting coating film fluctuates due to ultraviolet (UV) irradiation to the coating before firing, and ultraviolet rays
- UV ultraviolet
- the higher the irradiation amount the higher the refractive index of the coat film.
- a desired refractive index can be realized by selecting conditions such as composition, ultraviolet irradiation is not necessary.
- the refractive index of the coating film can be adjusted by selecting the irradiation amount.
- a high-pressure mercury lamp can be used. In 365nm terms when using a high-pressure mercury lamp, total light irradiation 1000 mJ / cm 2 or more dose are preferred and the dose of 3000mJ / cm 2 ⁇ 10000mJ / cm 2 is more preferable.
- an ultraviolet light source in addition to a high-pressure mercury lamp, a low-pressure mercury lamp, a metal halide lamp, a xenon lamp, an excimer lamp, or the like can be used.
- an ultraviolet irradiation process can also be performed between a drying process and a baking process.
- the coating composition contains a titanium alkoxide component in particular, the coating composition has the property of gradually increasing the viscosity under storage at room temperature. Although there is no concern that this will cause a serious problem in practice, careful control over temperature and the like is preferable when the thickness of the coating film is precisely controlled. Such an increase in viscosity becomes more significant as the composition ratio of titanium alkoxide in the coating composition increases. This is presumably because titanium alkoxide has a higher hydrolysis rate than silicon alkoxide and the like, and the condensation reaction is fast.
- the coating composition contains a titanium alkoxide component
- the following two production methods (1) and (2) are preferable in order to reduce the viscosity change.
- (1) When hydrolyzing titanium alkoxide in the presence of a metal salt, after sufficiently mixing glycols and titanium alkoxide in advance, if necessary, it is mixed with silicon alkoxide and hydrolyzed in the presence of an organic solvent. . By doing so, a coating composition having a small viscosity change can be obtained.
- the production method of (1) is effective because when titanium alkoxide is mixed with glycols, heat is generated, so transesterification occurs between the alkoxy group of titanium alkoxide and glycols, resulting in hydrolysis / condensation reaction. This is thought to be because of stabilization.
- a silicon alkoxide is preliminarily hydrolyzed in the presence of a metal salt and then mixed with a titanium alkoxide solution mixed with glycols to perform a condensation reaction to obtain a coating composition.
- a coating composition having a small viscosity change can be obtained.
- the reason why the production method (2) is effective is considered to be as follows. That is, the hydrolysis reaction of silicon alkoxide is performed at a high rate, but the subsequent condensation reaction is slower than titanium alkoxide. Therefore, when titanium alkoxide is added quickly after finishing the hydrolysis reaction, the silanol group of the hydrolyzed silicon alkoxide and the titanium alkoxide react uniformly. Thereby, it is thought that the hydrolyzed silicon alkoxide stabilizes the condensation reactivity of titanium alkoxide.
- a method for mixing silicon alkoxide hydrolyzed in advance and titanium alkoxide has already been attempted.
- the organic solvent used for the reaction does not contain glycols, a coating composition having excellent storage stability cannot be obtained.
- the method shown in 2) is also useful when a coating composition is obtained from another metal alkoxide having a high hydrolysis rate and silicon alkoxide.
- the coating composition of the present invention is formed by applying a commonly applied coating method to form a coating film, and then a coating film.
- a coating method for example, a dip coating method, a spin coating method, a spray coating method, a brush coating method, a roll transfer method, a screen printing method, an ink jet method, or a flexographic printing method is used.
- the inkjet method and flexographic printing method suitable for pattern printing are particularly preferred.
- the coating film of the present invention is formed using the above-described coating composition of the present invention. And it applies to the touch panel of this invention mentioned later as an electrode protective film of a touch panel.
- the coat film of the present invention is a coat film containing a metal oxide that is an inorganic substance as a component, and has higher hardness and higher strength than a coat film made of an organic material such as an acrylic material. That is, it excels in mechanical strength and protects the transparent electrode from multiple pressings with a finger or the like.
- the coating film of the present invention is particularly effective. It is. That is, even if the coating film of the present invention is formed on a film made of an organic material, the component composition is selected so that cracks do not occur due to the difference in thermal stretchability with the organic film.
- the coating film of the present invention is also suitable as a protective film for a touch panel electrode to be described later. That is, according to this coat film, it is possible to suppress a phenomenon in which the transparent electrode pattern is visually recognized (electrode pattern appearance phenomenon). Therefore, according to the touch panel formed using this coat film, it is possible to reduce the deterioration in display properties of the display device.
- the reason why the transparent electrode pattern is visually recognized on the touch panel is that the refractive index of the transparent electrode pattern in the operation region of the substrate is different from the refractive index of the substrate.
- the transparent electrode pattern of the touch panel is usually made of ITO (Indium Tin Oxide) which is an inorganic metal oxide.
- the refractive index of ITO is about 1.8 to 2.1. Since the refractive index of this is about 1.4 to 1.5, it is greatly different from the refractive index of ITO, which is different between the region where the transparent electrode pattern is formed and the region where it is not formed. In other words, the difference in the light reflection characteristic is caused between the area where the transparent electrode pattern is formed and the area where the transparent electrode pattern is not formed, thereby making the electrode pattern stand out in the screen display. .
- the inventor has such that the refractive index and the film thickness are within a desired range on the transparent electrode pattern arranged on the substrate. It has been found that providing a controlled layer is effective. Specifically, it was found that by controlling the refractive index and the film thickness of the protective layer of the transparent electrode pattern within the optimum range, it is possible to suppress the unintended viewing of the transparent electrode pattern on the touch panel.
- the coating film of the present invention has a refractive index in the range of 1.50 to 1.70, preferably in the range of 1.52 to 1.70, particularly when the phenomenon of the transparent electrode pattern being visually recognized is to be suppressed. It is controlled to become.
- the refractive index control method can be realized by controlling the component composition of the coating composition and also by controlling the film forming method.
- a coating method is applied to the coating composition of the present invention by applying a commonly applied coating method such as flexographic printing to form a coating film on the electrode of the touch panel, and then forming the coating film. Is mentioned.
- FIG. 1 is a plan view schematically showing the structure of the touch panel.
- FIG. 2 is a sectional view taken along line A1-A1 ′ of FIG.
- the touch panel 1 is configured using a transparent substrate 2, and a transparent electrode pattern is formed in the operation area of the substrate 2. Specifically, in the operation region of the substrate 2, the first transparent electrode 3 extending in the Y direction and the second transparent electrode 4 extending in the X direction are included. The first transparent electrode 3 and the second transparent electrode 4 are formed from the same layer provided on the same surface of the substrate 2.
- the substrate 2 is made of a transparent material such as glass, acrylic resin, polyester resin, polyethylene terephthalate resin, polycarbonate resin, polyvinylidene chloride resin, polymethyl methacrylate resin, polyethylene naphthalate resin, or triacetyl cellulose resin. In particular, it is preferable to select a material having heat resistance and chemical resistance suitable for forming the coat film 5.
- the thickness of the substrate 2 is, for example, about 0.1 mm to 2 mm when glass is used, and is about 10 ⁇ m to 2000 ⁇ m, for example, when a resin film is used.
- each of the first transparent electrode 3 and the second transparent electrode 4 includes a plurality of pad portions 21 as components.
- the pad portions 21 are arranged so as to be separated from each other in a planar manner, and the gap between the pad portions 21 is reduced. That is, the pad portions 21 forming a row in the X-axis direction and the pad portions 21 forming a row in the Y-axis direction are arranged in the entire operation region so that the region where they intersect each other is as small as possible.
- the pad part 21 can be made into polygonal shapes, such as a rhombus, a rectangle, and a hexagon, for example, These are arrange
- the first transparent electrode 3 and the second transparent electrode 4 configured by connecting a plurality of pad portions 21 are formed at positions corresponding to the operation area of the touch panel 1.
- the first transparent electrode 3 is provided separately in a plurality of regions along the X direction, and detects coordinates in the X direction.
- the second transparent electrode 4 is provided separately in a plurality of regions along the Y direction, and detects coordinates in the Y direction. With such a structure, the accuracy of touch position detection can be increased.
- the first transparent electrode 3 and the second transparent electrode 4 are formed using a transparent electrode material having at least a high transmittance for visible light and having conductivity.
- a transparent electrode material having conductivity include ITO (Indium Tin Oxide), IZO (Indium Zinc Oxide), and ZnO (zinc oxide).
- ITO Indium Tin Oxide
- IZO Indium Zinc Oxide
- ZnO zinc oxide
- the thickness is preferably 10 nm to 200 nm so as to ensure sufficient conductivity.
- the first transparent electrode 3 and the second transparent electrode 4 are formed as follows. First, a transparent conductive film is formed by a method selected from sputtering, vacuum deposition, ion plating, spraying, dipping, CVD, or the like in consideration of the material of the substrate 2 as a base. Next, the transparent conductive film is patterned using a photolithography technique. Alternatively, a desired pattern may be formed by a printing method using a paint in which a conductive filler made of the above material is dispersed in an organic solvent.
- the film thickness can be accurately controlled. Therefore, it is preferable to select a method capable of forming a desired film thickness and forming a low-resistance film excellent in transparency.
- the first transparent electrode 3 and the second transparent electrode 4 are formed on the same surface of the substrate 2 and form the same layer. For this reason, the 1st transparent electrode 3 and the 2nd transparent electrode 4 cross
- FIG. 1 and FIG. 2 are formed on the same surface of the substrate 2 and form the same layer.
- one of the first transparent electrode 3 and the second transparent electrode 4 is divided so as not to contact the other. That is, as shown in FIG. 2, the second transparent electrode 4 is connected at any of the plurality of intersecting portions 18, but the first transparent electrode 3 is divided. And in order to connect the parting part of the 1st transparent electrode 3, the bridge
- a light transmissive interlayer insulating film 19 is formed on the second transparent electrode 4 at the intersection 18.
- An organic material such as a photosensitive acrylic resin is used to form the interlayer insulating film 19.
- a photosensitive acrylic resin it is set as the structure where the acrylic film was formed only on the 2nd transparent electrode 4 in the cross
- An inorganic material such as SiO 2 can also be used.
- SiO 2 a similar structure can be formed by, for example, a sputtering method using a mask. In consideration of patterning properties, it is preferable to use an acrylic film for the interlayer insulating film 19.
- a bridging electrode 20 is provided in the upper layer of the interlayer insulating film 19, a bridging electrode 20 is provided.
- the bridging electrode 20 is for electrically connecting the first transparent electrodes 3 separated by the intersecting portion 18, and is preferably formed of a light transmissive material. By providing the bridging electrode 20, the first transparent electrode 3 can be electrically connected in the Y direction.
- the first transparent electrode 3 and the second transparent electrode 4 have a shape in which a plurality of rhombus pad portions 21 are arranged vertically or horizontally.
- the connection portion located at the intersecting portion 18 has a shape narrower than the rhomboid pad portion 21 of the second transparent electrode 4.
- the bridging electrode 20 is also formed in a strip shape having a narrower width than the diamond-shaped pad portion 21.
- the above-described coat film 5 of the present invention is formed as a protective film on the first transparent electrode 3 and the second transparent electrode 4. ing. And the formation area and non-formation area
- the coat film 5 has high hardness and excellent adhesion to the first transparent electrode 3 and the second transparent electrode 4 made of an inorganic material.
- the above-described coating composition of the present invention is used. Specifically, the coating composition obtained by hydrolyzing and condensing the metal alkoxides represented by the above formulas (I) and (II) in an organic solvent in the presence of an aluminum salt, and further adding a precipitation inhibitor. Things are used.
- the refractive index and the film thickness of the coating film 5 can be selected so that the transparent electrode patterns of the first transparent electrode 3 and the second transparent electrode 4 are not visible.
- the refractive index of the coat film 5 is preferably in the range of 1.50 or more and 1.70 or less, and the film thickness is preferably in the range of 40 nm to 170 nm.
- the film thickness is more preferably in the range of 60 nm to 150 nm.
- the film thickness is more preferably in the range of 40 nm to 170 nm.
- the coat film 5 is formed from a coating composition containing silicon alkoxide and titanium alkoxide, and has a refractive index of 1.52 and a film thickness of 100 nm.
- the touch panel 1 has an adhesive layer using an acrylic photocurable resin or the like on the surface on which the first transparent electrode 3 and the like are formed and the uppermost layer on the viewing side of the display panel 10.
- the adhesive layer 9 is provided on the coat film 5.
- the display device described above includes the touch panel 1 and the display panel 10, and can include a backlight as necessary. Although details are omitted in FIG. 2, the display panel 10 can have the same configuration as a known display device.
- the display panel 10 can have a structure in which a liquid crystal layer is sandwiched between two transparent substrates.
- a polarizing plate can be provided on the side of each transparent substrate opposite to the side in contact with the liquid crystal layer.
- a segment electrode or a common electrode can be formed on each transparent substrate in order to control the state of the liquid crystal.
- the liquid crystal layer is sealed with each transparent substrate and a sealing material.
- terminals are provided at end portions of the first transparent electrode 3 and the second transparent electrode 4, and a plurality of lead wires 11 are provided from the terminals. Is pulled out.
- the lead wiring 11 can be an opaque metal wiring using an alloy containing these metals such as Mo—Nb (molybdenum-niobium) alloy in addition to silver, aluminum, chromium, copper, or molybdenum.
- the lead-out wiring 11 is connected to a control circuit (not shown) that detects voltage application and a touch position to the first transparent electrode 3 and the second transparent electrode 4.
- a voltage is sequentially applied to the plurality of first transparent electrodes 3 and the second transparent electrodes 4 to give an electric charge.
- a capacitor is formed by capacitive coupling between the fingertip and the first transparent electrode 3 and the second transparent electrode 4. Therefore, it is possible to detect which part of the finger touched by capturing the change in the charge at the contact position of the fingertip.
- the touch panel 1 can also selectively apply a voltage to either the first transparent electrode 3 or the second transparent electrode 4 under the control of a control circuit (not shown).
- a control circuit not shown
- an electric field is formed on the transparent electrode to which a voltage is applied, and when a finger or the like touches in this state, the contact position is grounded via the capacitance of the human body.
- a change in resistance value occurs between the terminal (not shown) of the first transparent electrode 3 or the second transparent electrode 4 as a target and the contact position. Since this resistance value is proportional to the distance between the contact position and the terminal of the first transparent electrode 3 or the second transparent electrode 4 as a target, the contact position and the first transparent electrode 3 or the first transparent electrode 3 as a target.
- the coordinates of the contact position can be obtained by the control circuit detecting the current value flowing between the two transparent electrodes 4.
- the conspicuous transparent electrode pattern is suppressed in the operation region due to the effect of the coating film 5 provided on the first and second transparent electrodes 3 and 4.
- 3A to 3D are process cross-sectional views illustrating a method for manufacturing a touch panel according to a first example of the present invention.
- a transparent substrate 2 such as a glass substrate is prepared.
- the substrate 2 is cut into a desired shape and washed as necessary.
- a transparent conductive film is formed on one surface of the substrate 2.
- An intermediate layer such as SiOx, SiNx, or SiON may be formed between the substrate 2 and the transparent conductive film.
- the transparent conductive film is, for example, ITO, and is formed to a thickness of 10 to 200 nm using a sputtering method, a vacuum deposition method, or the like.
- the transparent conductive film is etched in a state where an etching mask made of a photosensitive resin or the like is formed on the upper layer side of the transparent conductive film, and the first transparent electrode 3 and the second transparent electrode 4 are formed by patterning. By removing the etching mask, a transparent conductive film substrate 14 having a transparent electrode pattern as shown in FIG. 3A is obtained.
- the second transparent electrode 4 is connected through the connection portion, but the first transparent electrode 3 is divided.
- a photosensitive resin is applied to the side on which the first transparent electrode 3 and the second transparent electrode 4 are provided, and then exposed and developed, whereby an interlayer insulation is formed at the connection portion of the second transparent electrode 4.
- a film 19 is formed (FIG. 3B).
- a transparent resin is used.
- an acrylic resin can be used.
- the interlayer insulating film 19 is formed using SiO 2 , the same structure can be obtained by sputtering using a mask. However, when patterning property is taken into consideration, it is preferable to use an acrylic resin.
- the transparent conductive film is etched with an etching mask made of a photosensitive resin formed on the surface of the transparent conductive film. Thereafter, the etching mask is removed, and a bridging electrode 20 is formed on the interlayer insulating film 19 so as to connect the divided portions of the first transparent electrode 3. Thereby, the structure shown in FIG. 3C is obtained.
- An example of the transparent conductive film formed on the interlayer insulating film 19 is an ITO film. In that case, the bridging electrode 20 is formed of ITO.
- the above-described lead-out wiring 11 is formed using silver ink or the like in a later process. However, when the transparent conductive film is etched in the above step, the transparent conductive film is left along the outer peripheral edges of the first transparent electrode 3 and the second transparent electrode 4 to form the lead-out wiring 11. Is possible.
- a coating composition for forming a metal oxide layer is applied on the first transparent electrode 3, the second transparent electrode 4, and the bridging electrode 20 by flexographic printing.
- the coating composition is obtained by hydrolyzing and condensing a metal alkoxide in an organic solvent in the presence of a metal salt (for example, an aluminum salt) and further adding a precipitation inhibitor.
- the substrate 2 on which the coating film of the coating composition has been formed is dried on, for example, a hot plate at 40 to 150 ° C. (eg, 60 ° C.).
- the metal oxide layer 5 is formed on the first transparent electrode 3, the second transparent electrode 4, and the bridging electrode 20 by heating in, for example, an oven at 100 to 300 ° C.
- the coating film 5 of the present invention thus obtained has high hardness and high strength with inorganic metal oxide as the main component. In addition, no cracks are generated even on the interlayer insulating film 19 which is an organic film.
- a lead-out wiring 11 is formed with silver ink or the like from terminals (not shown) at the ends of the first transparent electrode 3 and the second transparent electrode 4 to form the touch panel 1.
- the touch panel 1 is connected to a control circuit (not shown) of the touch panel via the lead wiring 11.
- the completed touch panel 1 is attached to the front surface of the display panel 10 through an adhesive layer 9 such as an acrylic transparent adhesive.
- an adhesive layer 9 such as an acrylic transparent adhesive.
- alignment is performed by providing alignment marks at the corners of the substrate 2 and the display panel 10 as necessary.
- the coating film 5 is provided, so that high reliability is realized. And it can suppress that the transparent electrode pattern of the 1st transparent electrode 3 and the 2nd transparent electrode 4 is conspicuous in the operation area
- FIG. 4 is a cross-sectional view showing a schematic configuration of another example of the touch panel of the present invention.
- the touch panel 101 includes a transparent substrate 102.
- a transparent electrode pattern is formed in the operation region of the substrate 102. That is, the first transparent electrode 103 and the second transparent electrode 104 for detecting positions in two different directions are provided on the upper layer of the substrate 102.
- the first transparent electrode 103 and the second transparent electrode 104 are formed using a transparent electrode material that has high transmittance for at least visible light and has conductivity.
- a transparent electrode material having conductivity for example, ITO or ZnO can be used.
- the thickness is preferably 10 to 200 nm so as to ensure sufficient conductivity.
- the first transparent electrode 103 and the second transparent electrode 104 are formed by a transparent substrate 102 as an underlayer or an overcoat to be described later by sputtering, vacuum deposition, ion plating, spraying, dipping or CVD. An optimum method is selected in consideration of the layer 107.
- a transparent electrode formed in a planar shape is patterned by an etching method using photolithography technology, or a coating material in which a conductive filler made of the above material is dispersed in an organic solvent, and directly by a printing method.
- a method of forming a desired pattern In the transparent electrode forming step, it is preferable that the film thickness can be accurately controlled. Therefore, it is preferable to select a method capable of forming a desired film thickness and forming a low-resistance film excellent in transparency.
- the first transparent electrode 103 is disposed on the substrate 102.
- a coating film 105 of the present invention is formed on the first transparent electrode 103.
- the above-described coating composition of the present invention is used for the formation of the coating film 105.
- the coat film 105 covers the formation region and the non-formation region of the first transparent electrode 103 corresponding to the operation region of the touch panel 101.
- the overcoat layer 107 is provided on the coat film 105.
- the overcoat layer 107 is a film made of an organic material formed from a highly transparent acrylic resin.
- the second transparent electrode 104 is disposed on the overcoat layer 107.
- the coating film 106 of the present invention is formed.
- the above-described coating composition of the present invention is used.
- the coat film 106 covers the transparent electrode forming region and the non-forming region corresponding to the operation region of the touch panel 101.
- the coat films 105 and 106 have high hardness and excellent adhesion to the first transparent electrode 103 and the second transparent electrode 104.
- the coat film 106 of the present invention contains an inorganic metal oxide as a main component, but does not cause cracks on the overcoat layer 107. That is, even if the coat film 106 is formed so as to cover the overcoat layer 107 which is a film made of an organic material together with the second transparent electrode 104, no crack is generated inside.
- the refractive index and film thickness of the coating films 105 and 106 can be selected so that the transparent electrode patterns of the first transparent electrode 103 and the second transparent electrode 104 are not visible.
- the refractive indexes of the coat films 105 and 106 are preferably in the range of 1.50 to 1.70 and the film thickness is preferably in the range of 40 nm to 170 nm.
- the film thickness is more preferably in the range of 60 nm to 150 nm.
- the refractive indexes of the coating films 105 and 106 are in the range of 1.60 or more and 1.70 or less, the film thickness is more preferably in the range of 40 nm to 170 nm.
- the first transparent electrode 103 and the second transparent electrode 104 are each made of ITO having a film thickness of 28 nm.
- the coating films 105 and 106 are each formed from the coating composition of the present invention containing silicon alkoxide and titanium alkoxide, and have a refractive index of 1.52 and a film thickness of 100 nm.
- an adhesive layer 108 made of an acrylic transparent adhesive is provided on the coat film 106.
- the display panel 110 is attached to the touch panel 101 via the adhesive layer 108.
- the touch panel 101 having the above configuration, when a finger that is a conductor touches any part of the operation region, capacitive coupling between the fingertip and the first transparent electrode 103 and the second transparent electrode 104 is performed. To form a capacitor. Therefore, it is possible to detect which part of the finger touched by capturing the change in charge at the contact position of the fingertip.
- the touch panel 101 high reliability is realized by the effect of the coating films 105 and 106 provided on the first transparent electrode 103 and the second transparent electrode 104. It is also possible to suppress the conspicuous transparent electrode pattern in the operation area.
- FIG. 5 and 6 are diagrams showing the structure of still another example of the touch panel of the present invention.
- FIG. 5 is a plan view schematically showing the structure of still another example of the touch panel of the present invention.
- FIG. 6 is a sectional view taken along line B1-B1 'of FIG.
- the touch panel 201 is configured using a transparent substrate 202, and a transparent electrode pattern is formed in the operation area of the substrate 202. That is, the first transparent electrode 203 for detecting the coordinate in the X direction formed on one surface of the substrate 202 and the second transparent electrode for detecting the coordinate in the Y direction formed on the other surface of the substrate 202. 204.
- one surface of the substrate 202 is upward and the other surface of the substrate 202 is downward. In this case, the other surface of the substrate 202 is a surface to be attached to the display panel 210.
- the substrate 202 is a dielectric substrate.
- a transparent material such as glass, acrylic resin, polyester resin, polyethylene terephthalate resin, polycarbonate resin, polyvinylidene chloride resin, polymethyl methacrylate resin, polyethylene naphthalate resin, or triacetyl cellulose resin is used.
- the thickness of the substrate 202 can be about 0.1 mm to 2 mm for glass, and 10 ⁇ m to 2000 ⁇ m for a resin film.
- the first transparent electrode 203 and the second transparent electrode 204 are each formed of an elongated rectangular electrode.
- the first transparent electrode 203 extends in the Y direction, and the second transparent electrode 204 extends in the X direction.
- the first transparent electrode 203 is arranged in a stripe shape at regular intervals.
- the first transparent electrode 203 and the second transparent electrode 204 are disposed so as to be orthogonal to each other, and have a lattice shape as a whole.
- the first transparent electrode 203 and the second transparent electrode 204 are formed using a transparent electrode material that has high transmittance for at least visible light and has conductivity.
- a transparent electrode material having conductivity for example, ITO or ZnO can be used.
- the thickness is preferably 10 to 200 nm so as to ensure sufficient conductivity.
- the first transparent electrode 203 and the second transparent electrode 204 are optimal in consideration of the transparent substrate 202 as a base from sputtering, vacuum deposition, ion plating, spraying, dipping or CVD. It is formed by selecting a proper method.
- a transparent electrode formed in a planar shape is patterned by an etching method using photolithography, or directly by a printing method using a paint in which a conductive filler made of the above material is dispersed in an organic solvent.
- a method of forming the pattern In the transparent electrode forming step, it is important to be able to control the film thickness with high accuracy. Therefore, it is preferable to select a method capable of forming a desired film thickness and forming a low-resistance film excellent in transparency.
- a coat film 205 is formed on the first transparent electrode 203.
- the coat film 205 covers the transparent electrode forming region and the non-forming region corresponding to the operation region of the touch panel 201.
- a coat film 206 is also formed on the second transparent electrode 204 (below in the drawing).
- the coat film 206 covers the transparent electrode forming region and the non-forming region corresponding to the operation region of the touch panel 201.
- the coating films 205 and 206 are high in hardness and excellent in adhesion with the first transparent electrode 203 and the second transparent electrode 204.
- the above-described coating composition of the present invention obtained by hydrolyzing and condensing metal alkoxide in an organic solvent in the presence of an aluminum salt and further adding a precipitation inhibitor is used. It is done.
- the refractive indexes and film thicknesses of the coating films 205 and 206 can be selected so that the transparent electrode patterns of the first transparent electrode 203 and the second transparent electrode 204 are not visible.
- the refractive indexes of the coat films 205 and 206 are each preferably in the range of more than 1.50 and not more than 1.70, and the film thicknesses are preferably in the range of 40 nm to 170 nm, respectively.
- the film thickness is more preferably in the range of 60 nm to 150 nm.
- the refractive indexes of the coating films 205 and 206 are in the range of 1.60 or more and 1.70 or less, the film thickness is more preferably in the range of 40 nm to 170 nm.
- the first transparent electrode 203 and the second transparent electrode 204 are each made of ITO having a film thickness of 28 nm.
- the coat films 205 and 206 are each formed from a coating composition prepared using silicon alkoxide and titanium alkoxide, and have a refractive index of 1.52 and a film thickness of 100 nm.
- an adhesive layer 208 made of an acrylic transparent adhesive is provided on one surface of the substrate 202.
- a cover film 207 made of a transparent resin is bonded on the adhesive layer 208.
- the cover film 207 is omitted.
- the cover film 207 functions as a protective film for the first transparent electrode 203 and the coat film 205. Instead of the cover film 207, a transparent resin may be coated. In this case, the adhesive layer 208 can be omitted.
- the display panel 110 is attached to the other surface of the substrate 202 via an adhesive layer 209 made of an acrylic transparent adhesive.
- the display panel 210 can have the same configuration as a known display device.
- the display panel 210 can have a structure in which a liquid crystal layer is sandwiched between two transparent substrates.
- a polarizing plate can be provided on the side of each transparent substrate opposite to the side in contact with the liquid crystal layer.
- a segment electrode or a common electrode can be formed on each transparent substrate in order to control the state of the liquid crystal.
- the liquid crystal layer is sealed with each transparent substrate and a sealing material.
- terminals are provided at the ends of the first transparent electrode 3 and the second transparent electrode 4, and a plurality of lead wires (not shown) are drawn from the terminals.
- the lead-out wiring can be an opaque metal wiring using silver, aluminum, chromium, copper or an alloy containing these.
- the lead-out wiring is connected to a control circuit (not shown) that detects the touch position and voltage application to the first transparent electrode 203 and the second transparent electrode 204.
- the touch panel 201 having the above configuration, when a finger that is a conductor touches any part of the operation region, capacitive coupling between the fingertip and the first transparent electrode 203 and the second transparent electrode 204 is achieved. To form a capacitor. Therefore, it is possible to detect which part of the finger touched by capturing the change in charge at the contact position of the fingertip.
- the effect of the coating films 205 and 206 provided on the first transparent electrode 203 and the second transparent electrode 204 is suppressed from conspicuous in the operation region.
- the coating film of the present invention is provided on an organic film made of an acrylic resin, such as an interlayer insulating film or an overcoat layer. It is not.
- the coating film of the present invention effectively functions as a protective film for high-strength electrodes even for such touch panel examples. And it prevents that a transparent electrode pattern stands out.
- the touch panel of the present invention has been described above, but the present invention is not limited to the above embodiment.
- the coating film of the present invention can be applied as a protective film on the transparent electrodes. And high reliability is realized. In addition, the conspicuousness of the transparent electrode can be suppressed. At that time, even if the coating film of the present invention is formed on various organic films provided in the touch panel, cracks and the like are not generated inside.
- TEOS Tetraethoxysilane C18: Octadecyltriethoxysilane MPS: ⁇ -mercaptopropyltrimethoxysilane GPS: ⁇ -glycidoxypropyltrimethoxysilane UPS: ⁇ -ureidopropyltriethoxysilane APS: ⁇ -aminopropyltriethoxysilane ACPS : ⁇ -acryloxypropyltrimethoxysilane MPMS: ⁇ -methacryloxypropyltrimethoxysilane MTES: methyltriethoxysilane TIPT: tetraisopropoxytitanium AN: aluminum nitrate nonahydrate EG: ethylene glycol HG: 2-methyl-2 , 4-Pentanediol (also known as hexylene glycol) BCS: 2-butoxyethanol (also known as
- the coating composition K13 does not contain the metal alkoxide having the structure represented by the general formula (II).
- the coating composition K14 contains only a small amount of the metal alkoxide having the structure represented by the general formula (II). .
- the stability was evaluated using the coating compositions K1 to K12 and K15 as Examples 1 to 12 and Comparative Example 1, respectively.
- the stability is evaluated by using the synthesized coating compositions (K1 to K12, K15), pressure-filtering with a membrane filter having a pore size of 0.5 micrometers, and then allowing to stand at room temperature for 1 week. Subsequently, when a film was formed on the silicon substrate (100) by spin coating, the case where no foreign matter was observed on the coating film on the silicon substrate was evaluated as “Good”, and the case where foreign matter was observed was evaluated as “X”. The evaluation results are shown in Table 1.
- ⁇ Method I for Coating Film I> Using the coating composition according to the synthesis example described above, pressure filtration is performed with a membrane filter having a pore size of 0.5 ⁇ m, and a coating film is formed on the substrate by spin coating. The substrate is heated for 3 minutes on a hot plate set to 60 ° C. and dried. Next, UV irradiation is performed for 2 minutes at a light intensity of 50 mW / cm 2 (converted to a wavelength of 365 nm) using a high-pressure mercury lamp (input power supply 1000 W) using an ultraviolet irradiation device (UB011-3A type manufactured by Eye Graphics). . The amount of ultraviolet irradiation is 6000 mJ / cm 2 . After the ultraviolet irradiation, it is transferred into a hot air circulation oven set at 250 ° C. and baked for 30 minutes. Thus, a coat film is formed on the substrate.
- ⁇ Method II of Coating Film Formation> Using the coating composition according to the synthesis example described above, pressure filtration is performed with a membrane filter having a pore size of 0.5 ⁇ m, and a coating film is formed on the substrate by spin coating. The substrate is heated for 3 minutes on a hot plate set to 60 ° C. and dried. Next, it is transferred into a hot air circulation oven set at 250 ° C. and baked for 30 minutes. Thus, a coat film is formed on the substrate.
- Example 20 the coating films (KL9 to KL12) formed on the appropriate substrate by the above-described film forming method II were used as the coating films of Examples 21 to 10 of the present invention.
- Example 24 is taken.
- a coating film (KM2) formed by the above film forming method II on a suitable substrate using the coating composition K13 according to the synthesis example described above is referred to as a comparative example 2 of the coating film.
- a silicon substrate (100) was used as the substrate.
- the coating films of Examples 13 to 20 formed by the film forming method I on this silicon substrate, the coating films of Examples 21 to 24 formed by the film forming method II, The coating films of Comparative Example 2 and Comparative Example 3 formed by the film method II were formed, and the refractive index was evaluated.
- the evaluation method was performed by measuring the refractive index at a wavelength of 633 nm using an ellipsometer (DVA-FLVW, manufactured by Mizoji Optical Co., Ltd.).
- the evaluation results of each coat film are shown in Table 2 below together with the coating composition used for forming each coat film.
- ⁇ Crack evaluation> An acrylic film having a thickness of 2 ⁇ m was formed on the glass substrate.
- the acrylic film was formed as follows. First, the acrylic material composition was filtered under pressure with a membrane filter having a pore size of 0.5 ⁇ m, and a coating film was formed on the entire surface of the glass substrate by a spin coating method. Next, this substrate was heated and dried for 2 minutes on a hot plate, then transferred to a hot-air circulating oven and baked for 30 minutes. As a result, an acrylic film was formed on the glass substrate.
- a coat film having a thickness of 100 nm is formed on the acrylic film by the film formation method I or the film formation method II. Then, the coating films of Examples 13 to 20 formed by the film forming method I on the glass substrate on which the acrylic film was formed, and the coating films of Examples 21 to 24 formed by the film forming method II. Then, the coating film of Comparative Example 2 formed by the film forming method II was formed, and the coating film was evaluated for cracks.
- Transparent conductive film substrate A transparent conductive film substrate on which a patterned transparent conductive film is formed on a substrate is prepared. A glass substrate is used as the substrate, and ITO is used as the transparent conductive film. As this transparent conductive film substrate, the transparent conductive film substrate 14 used in the touch panel 1 of the present invention described above can be used. Here, the film thickness of ITO was 28 nm.
- a substrate in which the coating film KL8 of Example 20 was formed to a thickness of 100 nm on the transparent conductive film substrate having a thickness of ITO of 28 nm was produced.
- An optical adhesive was applied onto the substrate, and 0.7 mm of raw glass was bonded.
- ultraviolet irradiation device U011-3A type manufactured by Eye Graphics Co., Ltd.
- a high pressure mercury lamp input power supply 1000 W
- ultraviolet irradiation is performed for 80 seconds at a light intensity of 50 mW / cm 2 (wavelength 365 nm conversion). did.
- the optical adhesive was hardened and the touch panel of Example 25 was produced as a touch panel for characteristic evaluation.
- a touch panel of Example 26 was manufactured by the same manufacturing method as described above except that the coat film KL10 of Example 22 was used instead of KL8 of Example 20. Further, a touch panel of Example 27 was manufactured by the same manufacturing method as described above except that the coat film KL11 of Example 23 was used instead of KL8 of Example 20. Further, a touch panel of Example 28 was produced by the same production method as above except that the coat film KL12 of Example 24 was used instead of KL8 of Example 20.
- a coating film was formed by the film forming method I using the coating composition K12, and the rest was the same as in the case of Example 25, and the touch panel of Example 29 was used.
- the refractive index measured with the evaluation method similar to the above about the coating film formed into a film by the film-forming method I using the coating composition K12 was 1.70.
- the comparative evaluation it replaced with KL8 of Example 20 as a coating film, and produced the touchscreen of the comparative example 3 with the preparation method similar to the above except having used the coating film KM2 of the comparative example 2.
- FIG. Moreover, the touchscreen of the comparative example 4 was produced by the production method similar to the above except that the transparent conductive film substrate described above was used and no coating film was formed. Therefore, the evaluation touch panel of Comparative Example 4 has no coating film formed on the transparent electrode.
- each touch panel was placed on a black cloth and visually observed with the light illuminated from above. And in the touch panel of the comparative example 4, after confirming that a transparent electrode pattern is visible, another touch panel is observed. As a result of these observations, a transparent electrode pattern that could not be seen was evaluated as ⁇ . And although the transparent electrode pattern can be seen, the degree of improvement compared to the touch panel of Comparative Example 4 that does not have a coating film is evaluated as “Good”, and the one that is not improved compared to the touch panel of Comparative Example 4 is ⁇ It was evaluated. Table 3 summarizes the results of the electrode pattern appearance evaluation for the evaluation touch panels of Examples 25 to 29 and Comparative Examples 3 and 4.
- the stability of the coating composition was improved by including a metal nitrate and a precipitation inhibitor. From Table 2, by controlling the structure and composition of the metal alkoxide contained in the coating composition appropriately, the coating film formed therefrom is a stable film that does not crack even on an organic thin film made of an acrylic resin or the like. Was found to be formed.
- each of the coating films of the present example has a hardness of 5H or more, which is significantly higher than that of a general organic acrylic material less than 3H.
- the coating composition of the present invention can provide a high-strength coating film with a controlled refractive index, and the electrode pattern does not stand out on a touch panel using the coating film. Therefore, it is useful as a touch panel for a display device that requires excellent appearance and high reliability.
Abstract
Description
1.下記一般式(I)で示される第1の金属アルコキシドと、下記一般式(II)で示される第2の金属アルコキシドと、下記一般式(III)で示される金属塩と、有機溶媒と、水と、析出防止剤と、を含有することを特徴とするタッチパネル用コーティング組成物。
M1(OR1)n (I)
(式中、M1は、珪素(Si)、チタン(Ti)、タンタル(Ta)、ジルコニウム(Zr)、ホウ素(B)、アルミニウム(Al)、マグネシウム(Mg)および亜鉛(Zn)よりなる群から選択された少なくとも1の金属を表し、R1は、炭素数1~5のアルキル基またはアセトキシ基を表し、nは、M1の価数2~5を表す。)
R2 lM2(OR3)m-l (II)
(式中、M1は、珪素(Si)、チタン(Ti)、タンタル(Ta)、ジルコニウム(Zr)、ホウ素(B)、アルミニウム(Al)、マグネシウム(Mg)および亜鉛(Zn)よりなる群から選択された少なくとも1の金属を表す。R2は、水素原子またはフッ素原子で置換されてもよく、且つ、ハロゲン原子、ビニル基、グリシドキシ基、メルカプト基、メタクリロキシ基、アクリロキシ基、イオシアネート基、アミノ基またはウレイド基で置換されていてもよく、且つ、ヘテロ原子を有していてもよい炭素数1~20の炭化水素基を表す。R3は、炭素数1~5のアルキル基を表す。mは、M2の価数2~5を表し、lは、mの価数が3の場合1または2であり、mの価数が4の場合1~3であり、mの価数が5の場合1~4である。)
M3(X)k (III)
(式中、M3は、アルミニウム(Al)、インジウム(In)、亜鉛(Zn)、ジルコニウム(Zr)、ビスマス(Bi)、ランタン(La)、タンタル(Ta)、イットリウム(Y)およびセリウム(Ce)よりなる群から選択された少なくとも1の金属を表し、Xは、塩酸、硝酸、硫酸、酢酸、蓚酸、スファミン酸、スルホン酸、アセト酢酸若しくはアセチルアセトナートの残基、またはこれらの塩基性塩を表し、kは、M3の価数を表す。)
2.第2の金属アルコキシドの含有量は、第1の金属アルコキシドと第2の金属アルコキシドとを合わせた全金属アルコキシドに対して、15モル%以上である、上記1に記載のタッチパネル用コーティング組成物。 The present invention is for achieving the above-mentioned object, and the gist thereof is as follows.
1. A first metal alkoxide represented by the following general formula (I), a second metal alkoxide represented by the following general formula (II), a metal salt represented by the following general formula (III), an organic solvent, water And a deposition inhibitor. A coating composition for a touch panel, comprising:
M 1 (OR 1 ) n (I)
(Wherein M 1 is a group consisting of silicon (Si), titanium (Ti), tantalum (Ta), zirconium (Zr), boron (B), aluminum (Al), magnesium (Mg) and zinc (Zn). And R 1 represents an alkyl group having 1 to 5 carbon atoms or an acetoxy group, and n represents a
R 2 l M 2 (OR 3 ) ml (II)
(Wherein M 1 is a group consisting of silicon (Si), titanium (Ti), tantalum (Ta), zirconium (Zr), boron (B), aluminum (Al), magnesium (Mg) and zinc (Zn). Represents at least one metal selected from R 2 may be substituted with a hydrogen atom or a fluorine atom, and may be a halogen atom, a vinyl group, a glycidoxy group, a mercapto group, a methacryloxy group, an acryloxy group, an isocyanate group; Represents a hydrocarbon group having 1 to 20 carbon atoms which may be substituted with an amino group or a ureido group and which may have a hetero atom, and R 3 represents an alkyl group having 1 to 5 carbon atoms. M represents the
M 3 (X) k (III)
(Wherein M 3 represents aluminum (Al), indium (In), zinc (Zn), zirconium (Zr), bismuth (Bi), lanthanum (La), tantalum (Ta), yttrium (Y) and cerium ( Ce) represents at least one metal selected from the group consisting of: X is a residue of hydrochloric acid, nitric acid, sulfuric acid, acetic acid, succinic acid, sfamic acid, sulfonic acid, acetoacetic acid or acetylacetonate, or their basicity Represents a salt, and k represents the valence of M 3. )
2. Content of 2nd metal alkoxide is a coating composition for touchscreens of said 1 which is 15 mol% or more with respect to all the metal alkoxides which match | combined 1st metal alkoxide and 2nd metal alkoxide.
5.第1の金属アルコキシドは、シリコンアルコキシドまたはその部分縮合物と、チタンアルコキシドとの混合物である、上記1~4のいずれかに記載のタッチパネル用コーティング組成物。
6.金属塩は、金属硝酸塩、金属硫酸塩、金属酢酸塩、金属塩化物、金属蓚酸塩、金属スファミン酸塩、金属スルホン酸塩、金属アセト酢酸塩、金属アセチルアセトナートまたはこれらの塩基性塩である、上記1~5のいずれかに記載のタッチパネル用コーティング組成物。
7.第1の金属アルコキシドは、シリコンアルコキシドまたはその部分縮合物と、チタンアルコキシドとの混合物であり、有機溶媒は、アルキレングリコール類またはそのモノエーテル誘導体を含む、上記1~6のいずれかに記載のタッチパネル用コーティング組成物。
8.上記1~~7のいずれかに記載のタッチパネル用のコーティング組成物を用いて成膜されることを特徴とするコート膜。
9.屈折率が1.52~1.70であり、膜厚が40nm~170nmであることを特徴とする上記8に記載のコート膜。
10.基板の操作領域に透明電極のパターンが形成されたタッチパネルであって、
上記8または9に記載のコート膜を前記透明電極のパターンの少なくとも一部の上に配したことを特徴とするタッチパネル。
11.前記透明電極パターンは、少なくとも2つの異なる方向の位置を検出するための第1の透明電極パターンと、第2の透明電極パターンとを有して構成され、
前記第1の透明電極パターンと前記第2の透明電極パターンの少なくとも一部は、前記基板の操作領域で重畳するとともに、この重畳する部分の前記第1の透明電極パターンと前記第2の透明電極パターンとの間には有機材料からなる膜が配置されており、
前記コート膜は、前記第1の透明電極パターンまたは前記第2の透明電極パターンの少なくとも一部とともに前記有機材料からなる膜の少なくとも一部を被覆するよう構成されたことを特徴とする上記10に記載のタッチパネル。
12.前記第1の透明電極パターンと前記第2の透明電極パターンとが重畳する部分は、前記基板の操作領域に複数あり、これら複数の重畳する部分のそれぞれにおいて、前記重畳する部分の面積より大きい面積の前記有機材料からなる膜が配置されていることを特徴とする上記11に記載のタッチパネル。 4). The molar ratio of the metal atom (M 3 ) of the metal salt to the metal atoms (M 1 and M 2 ) of the first metal alkoxide and the second metal alkoxide is 0.01 ≦ M 3 / (M 1 + M 2 4. The touch panel coating composition according to any one of 1 to 3 above, wherein + M 3 ) ≦ 0.7.
5). 5. The touch panel coating composition as described in any one of 1 to 4 above, wherein the first metal alkoxide is a mixture of silicon alkoxide or a partial condensate thereof and titanium alkoxide.
6). The metal salt is a metal nitrate, metal sulfate, metal acetate, metal chloride, metal succinate, metal sphamate, metal sulfonate, metal acetoacetate, metal acetylacetonate or a basic salt thereof The coating composition for a touch panel as described in any one of 1 to 5 above.
7). The touch panel according to any one of 1 to 6, wherein the first metal alkoxide is a mixture of silicon alkoxide or a partial condensate thereof and titanium alkoxide, and the organic solvent includes alkylene glycols or monoether derivatives thereof. Coating composition.
8). 8. A coating film formed by using the touch panel coating composition according to any one of 1 to 7 above.
9. 9. The coating film as described in 8 above, which has a refractive index of 1.52 to 1.70 and a film thickness of 40 nm to 170 nm.
10. A touch panel in which a transparent electrode pattern is formed in the operation area of the substrate,
10. A touch panel, wherein the coating film according to 8 or 9 is disposed on at least a part of the pattern of the transparent electrode.
11. The transparent electrode pattern includes a first transparent electrode pattern for detecting positions in at least two different directions, and a second transparent electrode pattern,
At least a part of the first transparent electrode pattern and the second transparent electrode pattern overlap in the operation region of the substrate, and the first transparent electrode pattern and the second transparent electrode in the overlapping part A film made of organic material is placed between the pattern and
10. The coating film according to 10 above, wherein the coating film is configured to cover at least a part of the film made of the organic material together with at least a part of the first transparent electrode pattern or the second transparent electrode pattern. The touch panel described.
12 There are a plurality of overlapping portions of the first transparent electrode pattern and the second transparent electrode pattern in the operation region of the substrate, and each of the overlapping portions has an area larger than the area of the overlapping portion. 12. The touch panel as described in 11 above, wherein a film made of the organic material is arranged.
本発明のコーティング組成物は、上記一般式(I)で示される第1の金属アルコキシドと、上記一般式(II)で示される第2の金属アルコキシドと、上記一般式(III)で示される金属塩と、有機溶媒と、水分と、析出防止剤と、を含有する。このコーティング組成物を成膜することによりタッチパネルに好適なコートが得られる。 <Coating composition>
The coating composition of the present invention includes a first metal alkoxide represented by the above general formula (I), a second metal alkoxide represented by the above general formula (II), and a metal represented by the above general formula (III). Contains a salt, an organic solvent, moisture, and a precipitation inhibitor. A coating suitable for a touch panel can be obtained by depositing this coating composition.
式(I)で示される金属アルコキシドとして、具体的には、チタンアルコキシドとして、チタニウムテトラエトキシド、チタニウムテトラプロポキシド、チタニウムテトラブトキシドなどのチタニウムテトラアルコキシド化合物またはチタニウムテトラ-n-ブトキシドテトラマーなどの部分縮合物などが用いられる。 When a titanium alkoxide or a partial condensate is used as the metal alkoxide represented by the formula (I), one or a mixture of two or more compounds or a partial condensate of the compound represented by the general formula (V) (preferably 5 amounts) Body or less) is used.
As the metal alkoxide represented by the formula (I), specifically, as titanium alkoxide, a titanium tetraalkoxide compound such as titanium tetraethoxide, titanium tetrapropoxide, titanium tetrabutoxide, or a moiety such as titanium tetra-n-butoxide tetramer A condensate or the like is used.
第2の金属アルコキシドの含有量が15モル%未満である場合、上記した有機膜上で得られるコート膜にクラックが生じる場合がある。また、80モル%以上である場合、クラックは生じないものの、均一な塗布膜が得られないといった現象が起こる場合がある。このような含有量とすることにより、上記したコート膜でのクラック発生を抑制することができる。 The content of the second metal alkoxide is preferably 80 to 15 mol%, preferably 70 to 30 mol, based on the total amount of one metal alkoxide and the second metal alkoxide contained in the coating composition. % Is more preferable. When the carbon number of R 2 is 3 or less, the content of the metal alkoxide represented by the formula (II) is 30% or more, and when the carbon number of R 2 is 4 or more, or a mercapto group is contained in R 2 In this case, the content of the second metal alkoxide is more preferably 15% or more, and more preferably 75 mol% or less.
When the content of the second metal alkoxide is less than 15 mol%, a crack may occur in the coating film obtained on the above-described organic film. On the other hand, if it is 80 mol% or more, cracks may not occur, but a phenomenon that a uniform coating film cannot be obtained may occur. By setting it as such content, crack generation | occurrence | production in an above-described coat film can be suppressed.
例えば、メチルトリメトキシシラン、メチルトリプロポキシシラン、メチルトリアセトキシシラン、メチルトリブトキシシラン、メチルトリペントキシシラン、メチルトリアミロキシシラン、メチルトリフェノキシシラン、メチルトリベンジルオキシシラン、メチルトリフェネチルオキシシラン、グリシドキシメチルトリメトキシシラン、グリシドキシメチルトリエトキシシラン、αーグリシドキシエチルトリメトキシシラン、α-グリシドキシエチルトリエトキシシラン、β-グリシドキシエチルトリメトキシシラン、β-グリシドキシエチルトリエトキシシラン、α-グリシドキシプロピルトリメトキシシラン、α-グリシドキシプロピルトリエトキシシラン、β-グリシドキシプロピルトリメトキシシラン、β-グリシドキシプロピルトリエトキシシラン、γ-グリシドキシプロピルトリメトキシシラン、γ-グリシドキシプロピルトリエトキシシラン、γ-グリシドキシプロピルトリプロポキシシラン、γ-グリシドキシプロピルトリブトキシシラン、γ-グリシドキシプロピルトリフェノキシシラン、α-グリシドキシブチルトリメトキシシラン、α-グリシドキシブチルトリエトキシシラン、β-グリシドキシブチルトリエトキシシラン、γ-グリシドキシブチルトリメトキシシラン、γ-グリシドキシブチルトリエトキシシラン、δ-グリシドキシブチルトリメトキシシラン、δ-グリシドキシブチルトリエトキシシラン、(3,4-エポキシシクロヘキシル)メチルトリメトキシシラン、(3,4-エポキシシクロヘキシル)メチルトリエトキシシラン、β-(3,4-エポキシシクロヘキシル)エチルトリメトキシシラン、β-(3,4-エポキシシクロヘキシル)エチルトリエトキシシラン、β-(3,4-エポキシシクロヘキシル)エチルトリプロポキシシラン、β-(3,4-エポキシシクロヘキシル)エチルトリブトキシシラン、β-(3,4-エポキシシクロヘキシル)エチルトリフェノキシシラン、γ-(3,4-エポキシシクロヘキシル)プロピルトリメトキシシラン、γ-(3,4-エポキシシクロヘキシル)プロピルトリエトキシシラン、δ-(3,4-エポキシシクロヘキシル)ブチルトリメトキシシラン、δ-(3,4-エポキシシクロヘキシル)ブチルトリエトキシシラン、グリシドキシメチルメチルジメトキシシラン、グリシドキシメチルメチルジエトキシシラン、α-グリシドキシエチルメチルジメトキシシラン、α-グリシドキシエチルメチルジエトキシシラン、β-グリシドキシエチルメチルジメトキシシラン、β-グリシドキシエチルエチルジメトキシシラン、α-グリシドキシプロピルメチルジメトキシシラン、α-グリシドキシプロピルメチルジエトキシシラン、β-グリシドキシプロピルメチルジメトキシシラン、β-グリシドキシプロピルエチルジメトキシシラン、γ-グリシドキシプロピルメチルジメトキシシラン、γ-グリシドキシプロピルメチルジエトキシシラン、γ-グリシドキシプロピルメチルジプロポキシシラン、γ-グリシドキシプロピルメチルジブトキシシラン、γ-グリシドキシプロピルメチルジフェノキシシラン、γ-グリシドキシプロピルエチルジメトキシシラン、γ-グリシドキシプロピルエチルジエトキシシラン、γ-グリシドキシプロピルビニルジメトキシシラン、γ-グリシドキシプロピルビニルジエトキシシラン、エチルトリメトキシシラン、エチルトリエトキシシラン、ビニルトリメトキシシラン、ビニルトリエトキシシラン、ビニルトリアセトキシシラン、フェニルトリメトキシシラン、フェニルトリエトキシシラン、フェニルトリアセトキシシラン、γ-クロロプロピルトリメトキシシラン、γ-クロロプロピルトリエトキシシラン、γ-クロロプロピルトリアセトキシシラン、3,3,3-トリフロロプロピルトリメトキシシラン、γ-メタクリルオキシプロピルトリメトキシシラン、γ-メルカプトプロピルトリメトキシシラン、γ-メルカプトプロピルトリエトキシシラン、β-シアノエチルトリエトキシシラン、クロロメチルトリメトキシシラン、クロロメチルトリエトキシシラン、N-(β-アミノエチル)γ-アミノプロピルトリメトキシシラン、N-(β-アミノエチル)γ-アミノプロピルメチルジメトキシシラン、γ-アミノプロピルメチルジメトキシシラン、N-(β-アミノエチル)γ-アミノプロピルトリエトキシシラン、N-(β-アミノエチル)γ-アミノプロピルメチルジエトキシシラン、ジメチルジメトキシシラン、フェニルメチルジメトキシシラン、ジメチルジエトキシシラン、フェニルメチルジエトキシシラン、γ-クロロプロピルメチルジメトキシシラン、γ-クロロプロピルメチルジエトキシシラン、ジメチルジアセトキシシラン、γ-メタクリルオキシプロピルメチルジメトキシシラン、γ-メタクリルオキシプロピルメチルジエトキシシラン、γ-メルカプトプロピルメチルジメトキシシラン、γ-メルカプトメチルジエトキシシラン、メチルビニルジメトキシシラン、メチルビニルジエトキシシラン、γ-ウレイドプロピルトリエトキシシラン、γ-ウレイドプロピルトリメトキシシラン、γ-ウレイドプロピルトリプロポキシシラン、(R)-N-1-フェニルエチル-N’-トリエトキシシリルプロピルウレア、(R)-N-1-フェニルエチル-N’-トリメトキシシリルプロピルウレア、アリルトリエトキシシラン、3-メタクリロキシプロピルトリメトキシシラン、3-メタクリロキシプロピルトリエトキシシラン、3-アクリロキシプロピルトリメトキシシラン、3-アクリロキシプロピルトリエトキシシラン、3-イソシアネートプロピルトリエトキシシラン、トリフルオロプロピルトリメトキシシラン、ブロモプロピルトリエトキシシラン、ジエチルジエトキシシラン、ジエチルジメトキシシラン、ジフェニルジメトキシシラン、ジフェニルジエトキシシラン、トリメチルエトキシシラン、トリメチルメトキシシラン、p-スチリルトリメトキシシラン、p-スチリルトリエトキシシラン、p-スチリルトリプロポキシシランなどを挙げることができる。これらは、単独で、または、2種以上組み合わせて使用することができる。 As a preferable metal alkoxide represented by the formula (II), for example, when M 2 is silicon, the following compounds may be mentioned.
For example, methyltrimethoxysilane, methyltripropoxysilane, methyltriacetoxysilane, methyltributoxysilane, methyltripentoxysilane, methyltriamyloxysilane, methyltriphenoxysilane, methyltribenzyloxysilane, methyltriphenethyloxysilane Glycidoxymethyltrimethoxysilane, glycidoxymethyltriethoxysilane, α-glycidoxyethyltrimethoxysilane, α-glycidoxyethyltriethoxysilane, β-glycidoxyethyltrimethoxysilane, β-glycidyl Sidoxyethyltriethoxysilane, α-glycidoxypropyltrimethoxysilane, α-glycidoxypropyltriethoxysilane, β-glycidoxypropyltrimethoxysilane, β-glycidoxypropyltrie Toxisilane, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropyltriethoxysilane, γ-glycidoxypropyltripropoxysilane, γ-glycidoxypropyltributoxysilane, γ-glycidoxypropyltriphenoxy Silane, α-glycidoxybutyltrimethoxysilane, α-glycidoxybutyltriethoxysilane, β-glycidoxybutyltriethoxysilane, γ-glycidoxybutyltrimethoxysilane, γ-glycidoxybutyltriethoxy Silane, δ-glycidoxybutyltrimethoxysilane, δ-glycidoxybutyltriethoxysilane, (3,4-epoxycyclohexyl) methyltrimethoxysilane, (3,4-epoxycyclohexyl) methyltriethoxysilane, β- (3,4-epoxy Cyclohexyl) ethyltrimethoxysilane, β- (3,4-epoxycyclohexyl) ethyltriethoxysilane, β- (3,4-epoxycyclohexyl) ethyltripropoxysilane, β- (3,4-epoxycyclohexyl) ethyltributoxy Silane, β- (3,4-epoxycyclohexyl) ethyltriphenoxysilane, γ- (3,4-epoxycyclohexyl) propyltrimethoxysilane, γ- (3,4-epoxycyclohexyl) propyltriethoxysilane, δ- ( 3,4-epoxycyclohexyl) butyltrimethoxysilane, δ- (3,4-epoxycyclohexyl) butyltriethoxysilane, glycidoxymethylmethyldimethoxysilane, glycidoxymethylmethyldiethoxysilane, α-glycidoxyethyl Methyl Dimethoxysilane, α-glycidoxyethylmethyldiethoxysilane, β-glycidoxyethylmethyldimethoxysilane, β-glycidoxyethylethyldimethoxysilane, α-glycidoxypropylmethyldimethoxysilane, α-glycidoxypropyl Methyldiethoxysilane, β-glycidoxypropylmethyldimethoxysilane, β-glycidoxypropylethyldimethoxysilane, γ-glycidoxypropylmethyldimethoxysilane, γ-glycidoxypropylmethyldiethoxysilane, γ-glycid Xylpropylmethyldipropoxysilane, γ-glycidoxypropylmethyldibutoxysilane, γ-glycidoxypropylmethyldiphenoxysilane, γ-glycidoxypropylethyldimethoxysilane, γ-glycidoxypropylethyldiet Xysilane, γ-glycidoxypropyl vinyldimethoxysilane, γ-glycidoxypropylvinyldiethoxysilane, ethyltrimethoxysilane, ethyltriethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltriacetoxysilane, phenyltri Methoxysilane, phenyltriethoxysilane, phenyltriacetoxysilane, γ-chloropropyltrimethoxysilane, γ-chloropropyltriethoxysilane, γ-chloropropyltriacetoxysilane, 3,3,3-trifluoropropyltrimethoxysilane, γ-methacryloxypropyltrimethoxysilane, γ-mercaptopropyltrimethoxysilane, γ-mercaptopropyltriethoxysilane, β-cyanoethyltriethoxysilane, chloromethyl Limethoxysilane, chloromethyltriethoxysilane, N- (β-aminoethyl) γ-aminopropyltrimethoxysilane, N- (β-aminoethyl) γ-aminopropylmethyldimethoxysilane, γ-aminopropylmethyldimethoxysilane, N- (β-aminoethyl) γ-aminopropyltriethoxysilane, N- (β-aminoethyl) γ-aminopropylmethyldiethoxysilane, dimethyldimethoxysilane, phenylmethyldimethoxysilane, dimethyldiethoxysilane, phenylmethyldi Ethoxysilane, γ-chloropropylmethyldimethoxysilane, γ-chloropropylmethyldiethoxysilane, dimethyldiacetoxysilane, γ-methacryloxypropylmethyldimethoxysilane, γ-methacryloxypropylmethyldiethoxysilane Run, γ-mercaptopropylmethyldimethoxysilane, γ-mercaptomethyldiethoxysilane, methylvinyldimethoxysilane, methylvinyldiethoxysilane, γ-ureidopropyltriethoxysilane, γ-ureidopropyltrimethoxysilane, γ-ureidopropyltri Propoxysilane, (R) -N-1-phenylethyl-N′-triethoxysilylpropylurea, (R) -N-1-phenylethyl-N′-trimethoxysilylpropylurea, allyltriethoxysilane, 3- Methacryloxypropyltrimethoxysilane, 3-methacryloxypropyltriethoxysilane, 3-acryloxypropyltrimethoxysilane, 3-acryloxypropyltriethoxysilane, 3-isocyanatopropyltriethoxysilane, tri Fluoropropyltrimethoxysilane, bromopropyltriethoxysilane, diethyldiethoxysilane, diethyldimethoxysilane, diphenyldimethoxysilane, diphenyldiethoxysilane, trimethylethoxysilane, trimethylmethoxysilane, p-styryltrimethoxysilane, p-styryltri Examples thereof include ethoxysilane and p-styryltripropoxysilane. These can be used alone or in combination of two or more.
式(III)で示される金属塩のうち、特に、硝酸塩、塩化物塩、蓚酸塩またはその塩基性塩が好ましい。この内、入手の容易性と、コーティング組成物の貯蔵安定性の点から、アルミニウム、インジウム、またはセリウムの硝酸塩がより好ましい。 The metal salt contained in the coating composition of the present invention is represented by the following general formula (III).
Of the metal salts represented by the formula (III), nitrates, chloride salts, oxalates or basic salts thereof are particularly preferable. Of these, aluminum, indium, or cerium nitrate is more preferred from the viewpoint of availability and storage stability of the coating composition.
(析出防止剤/金属酸化物)≧1
上記比率が1未満であると、塗布被膜を形成時における金属塩の析出防止効果が小さくなる。一方、析出防止剤を多量に用いることは、コーティング組成物に何ら影響を与えないが、200以下であるのが好ましい。 The content of the precipitation inhibitor in the coating composition is preferably used at a ratio (weight ratio) satisfying the following, when the metal of the metal salt is converted into a metal oxide.
(Precipitation inhibitor / metal oxide) ≧ 1
When the ratio is less than 1, the effect of preventing precipitation of the metal salt at the time of forming the coating film is reduced. On the other hand, the use of a large amount of precipitation inhibitor does not affect the coating composition at all, but is preferably 200 or less.
0.01≦M3/(M1+M2+M3)≦0.7
この比率が0.01より小さいと、得られる被膜の機械的強度が十分でないため好ましくない。一方、0.7を越えると、ガラス基板や透明電極などの基材に対するコート膜の密着性が低下する。さらに、450℃以下の低温で焼成した場合、得られるコート膜の耐薬品性が低下する傾向にもある。なかでも、この比率は、0.01~0.6であるのがより好ましい。 On the other hand, the content of the metal salt contained in the coating composition is the sum of the metal atoms (M 1 and M 2 ) constituting the first and second metal alkoxides and the metal atom (M 3 ) of the metal salt. The content ratio is preferably a ratio (molar ratio) that satisfies the following.
0.01 ≦ M 3 / (M 1 + M 2 + M 3 ) ≦ 0.7
If this ratio is less than 0.01, the mechanical strength of the resulting coating is not sufficient, which is not preferable. On the other hand, when it exceeds 0.7, the adhesion of the coating film to a substrate such as a glass substrate or a transparent electrode is lowered. Furthermore, when baked at a low temperature of 450 ° C. or lower, the chemical resistance of the resulting coating film tends to be lowered. In particular, this ratio is more preferably 0.01 to 0.6.
無機微粒子としては、シリカ微粒子、アルミナ微粒子、チタニア微粒子、フッ化マグネシウム微粒子等の微粒子が好ましく、これらの無機微粒子のコロイド溶液が特に好ましい。このコロイド溶液は、無機微粒子粉を分散媒に分散したものでもよいし、市販品のコロイド溶液であってもよい。 In the coating composition of the present invention, other components than the above-described components, for example, inorganic fine particles, metalloxane oligomers, metalloxane polymers, leveling agents, surfactants and the like, as long as the effects of the present invention are not impaired. May be included.
As the inorganic fine particles, fine particles such as silica fine particles, alumina fine particles, titania fine particles, and magnesium fluoride fine particles are preferable, and a colloid solution of these inorganic fine particles is particularly preferable. This colloidal solution may be a dispersion of inorganic fine particle powder in a dispersion medium or a commercially available colloidal solution.
無機微粒子の分散媒としては、水及び有機溶剤を挙げることができる。コロイド溶液としては、被膜形成用塗布液の安定性の観点から、pH又はpKaが1~10に調整されていることが好ましく、より好ましくは2~7である。 In the present invention, the inclusion of inorganic fine particles makes it possible to impart the surface shape of the formed cured film and other functions. The inorganic fine particles preferably have an average particle size of 0.001 to 0.2 μm, more preferably 0.001 to 0.1 μm. When the average particle diameter of the inorganic fine particles exceeds 0.2 μm, the transparency of the cured film formed using the prepared coating liquid may be lowered.
Examples of the dispersion medium for the inorganic fine particles include water and organic solvents. As the colloidal solution, the pH or pKa is preferably adjusted to 1 to 10, more preferably 2 to 7, from the viewpoint of the stability of the coating solution for film formation.
焼成は、タッチパネルの他の構成部材の耐熱性を考慮して、100℃~300℃ので行うのが好ましく、150℃~250℃で行うのがより好ましい。また、焼成時間は5分以上が好ましく、15分以上がより好ましい。焼成方法としては、ホットプレート、熱循環式オーブン、赤外線オーブンなどを用いるのが好ましい。
コーティング組成物の塗膜を焼成してコート膜を製造する場合、焼成温度により得られるコート膜の屈折率は変動する。この場合、焼成温度を高くするほど、コート膜の屈折率を高くできる。したがって、焼成温度を適度な値に選択することで、得られるコート膜の屈折率の調整が可能である。 When obtaining a coated film from the coating composition of the present invention, the coating film of the coating composition is preferably dried and then baked as described above. Drying is preferably performed at room temperature to 150 ° C, more preferably at 40 to 120 ° C. The drying time is preferably about 30 seconds to 10 minutes, more preferably about 1 to 8 minutes. As a drying method, it is preferable to use a hot plate, a hot air circulating oven, or the like.
The firing is preferably performed at 100 ° C. to 300 ° C., more preferably 150 ° C. to 250 ° C. in consideration of the heat resistance of the other components of the touch panel. The firing time is preferably 5 minutes or more, and more preferably 15 minutes or more. As a baking method, it is preferable to use a hot plate, a thermal circulation oven, an infrared oven, or the like.
When a coating film is produced by baking a coating film of the coating composition, the refractive index of the coating film obtained varies depending on the baking temperature. In this case, the higher the baking temperature, the higher the refractive index of the coating film. Therefore, the refractive index of the resulting coating film can be adjusted by selecting an appropriate baking temperature.
(1)チタンアルコキシドを金属塩の存在下、加水分解する際に、予めグリコール類とチタンアルコキシドを充分混合した後、必要に応じて、シリコンアルコキシドと混合し、有機溶媒の存在下で加水分解する。こうすることにより、粘度変化の小さいコーティング組成物が得られる。この(1)の製法が有効なのは、チタンアルコキシドをグリコール類と混合した際に発熱があることから、チタンアルコキシドのアルコキシ基と、グリコール類との間でエステル交換反応が起こり、加水分解・縮合反応に対して安定化されるためと考えられる。 In the case where the coating composition contains a titanium alkoxide component, the following two production methods (1) and (2) are preferable in order to reduce the viscosity change.
(1) When hydrolyzing titanium alkoxide in the presence of a metal salt, after sufficiently mixing glycols and titanium alkoxide in advance, if necessary, it is mixed with silicon alkoxide and hydrolyzed in the presence of an organic solvent. . By doing so, a coating composition having a small viscosity change can be obtained. The production method of (1) is effective because when titanium alkoxide is mixed with glycols, heat is generated, so transesterification occurs between the alkoxy group of titanium alkoxide and glycols, resulting in hydrolysis / condensation reaction. This is thought to be because of stabilization.
この(2)の製法が有効なのは、次の理由によると考えられる。すなわち、シリコンアルコキシドの加水分解反応は速い速度で行われるが、その後の縮合反応はチタンアルコキシドに比較して遅い。そのため、加水分解反応を終えた後、速やかにチタンアルコキシドを加えると、加水分解反応したシリコンアルコキシドのシラノール基と、チタンアルコキシドとが均一に反応する。これにより、チタンアルコキシドの縮合反応性を、加水分解されたシリコンアルコキシドが安定化させると考えられる。 (2) A silicon alkoxide is preliminarily hydrolyzed in the presence of a metal salt and then mixed with a titanium alkoxide solution mixed with glycols to perform a condensation reaction to obtain a coating composition. By doing so, a coating composition having a small viscosity change can be obtained.
The reason why the production method (2) is effective is considered to be as follows. That is, the hydrolysis reaction of silicon alkoxide is performed at a high rate, but the subsequent condensation reaction is slower than titanium alkoxide. Therefore, when titanium alkoxide is added quickly after finishing the hydrolysis reaction, the silanol group of the hydrolyzed silicon alkoxide and the titanium alkoxide react uniformly. Thereby, it is thought that the hydrolyzed silicon alkoxide stabilizes the condensation reactivity of titanium alkoxide.
本発明のコート膜は、上述した本発明のコーティング組成物を用いて形成される。そして、タッチパネルの電極保護膜として、後述する本発明のタッチパネルに適用される。
本発明のコート膜は、無機物である金属酸化物を成分として含むコート膜であり、アクリル材料などの有機材料からなるコート膜に比べて硬度が高く、高い強度を有する。すなわち、機械的強度に優れ、指などによる多数回の押圧から透明電極を保護する。 <Coating film>
The coating film of the present invention is formed using the above-described coating composition of the present invention. And it applies to the touch panel of this invention mentioned later as an electrode protective film of a touch panel.
The coat film of the present invention is a coat film containing a metal oxide that is an inorganic substance as a component, and has higher hardness and higher strength than a coat film made of an organic material such as an acrylic material. That is, it excels in mechanical strength and protects the transparent electrode from multiple pressings with a finger or the like.
コート膜の形成方法としては、本発明のコーティング組成物に、フレキソ印刷など一般に行われている塗布法を適用して、タッチパネルの電極上に塗膜を成膜し、その後、コート膜とする方法が挙げられる。 The coating film of the present invention has a refractive index in the range of 1.50 to 1.70, preferably in the range of 1.52 to 1.70, particularly when the phenomenon of the transparent electrode pattern being visually recognized is to be suppressed. It is controlled to become. As described above, the refractive index control method can be realized by controlling the component composition of the coating composition and also by controlling the film forming method.
As a method for forming the coating film, a coating method is applied to the coating composition of the present invention by applying a commonly applied coating method such as flexographic printing to form a coating film on the electrode of the touch panel, and then forming the coating film. Is mentioned.
次に、本発明のコート膜を有するタッチパネルについて説明する。
図1および図2は、本発明のタッチパネルの構成を説明する図である。図1は、タッチパネルの構造を模式的に示す平面図である。図2は、図1のA1-A1’線に沿う断面図である。 <Touch panel>
Next, a touch panel having the coating film of the present invention will be described.
1 and 2 are diagrams for explaining the configuration of the touch panel of the present invention. FIG. 1 is a plan view schematically showing the structure of the touch panel. FIG. 2 is a sectional view taken along line A1-A1 ′ of FIG.
まず、スパッタリング法、真空蒸着法、イオンプレーティング法、スプレー法、ディップ法またはCVD法などの中から、下地となる基板2の材質を考慮して選択した方法によって透明導電膜を成膜する。次に、上記透明導電膜を、フォトリソグラフィ技術を用いてパターニングする。または、有機溶剤に上記材料からなる導電性フィラーなどを分散させた塗料を用い、印刷法によって所望のパターンを形成してもよい。 For example, the first
First, a transparent conductive film is formed by a method selected from sputtering, vacuum deposition, ion plating, spraying, dipping, CVD, or the like in consideration of the material of the
図3(a)~(d)は、本発明の第1の例であるタッチパネルの製造方法を示す工程断面図である。 Next, the manufacturing method of the
3A to 3D are process cross-sectional views illustrating a method for manufacturing a touch panel according to a first example of the present invention.
基板202の他方の面には、アクリル系の透明接着剤からなる接着層209を介して、ディスプレイパネル110が取り付けられている。 The
The display panel 110 is attached to the other surface of the
以下の実施例などで用いる略記号の意味は、次の通りである。
TEOS:テトラエトキシシラン
C18:オクタデシルトリエトキシシラン
MPS:γ-メルカプトプロピルトリメトキシシラン
GPS:γ-グリシドキシプロピルトリメトキシシラン
UPS:γ-ウレイドプロピルトリエトキシシラン
APS:γ-アミノプロピルトリエトキシシラン
ACPS:γ-アクリロキシプロピルトリメトキシシラン
MPMS:γ-メタクリロキシプロピルトリメトキシシラン
MTES:メチルトリエトキシシラン
TIPT:テトライソプロポキシチタン
AN:硝酸アルミニウム九水和物
EG:エチレングリコール
HG:2-メチル-2,4-ペンタンジオール(別称:へキシレングリコール)
BCS:2-ブトキシエタノール(別称:ブチルセロソルブ)
IPA:2-プロパノール [Abbreviations used in Examples]
The meanings of the abbreviations used in the following examples are as follows.
TEOS: Tetraethoxysilane C18: Octadecyltriethoxysilane MPS: γ-mercaptopropyltrimethoxysilane GPS: γ-glycidoxypropyltrimethoxysilane UPS: γ-ureidopropyltriethoxysilane APS: γ-aminopropyltriethoxysilane ACPS : Γ-acryloxypropyltrimethoxysilane MPMS: γ-methacryloxypropyltrimethoxysilane MTES: methyltriethoxysilane TIPT: tetraisopropoxytitanium AN: aluminum nitrate nonahydrate EG: ethylene glycol HG: 2-methyl-2 , 4-Pentanediol (also known as hexylene glycol)
BCS: 2-butoxyethanol (also known as butyl cellosolve)
IPA: 2-propanol
200mLフラスコ中にAN 12.7g、水3.0gを加えて攪拌し、ANを溶解した。そこに、EG 13.6g、HG 38.8g、BCS 36.8g、TEOS 21.7g、GPS 10.6gを入れ、室温条件下で30分攪拌して、A1液を得た。 <Synthesis Example 1> (Synthesis of Coating Composition K1)
In a 200 mL flask, 12.7 g of AN and 3.0 g of water were added and stirred to dissolve AN. EG 13.6g, HG 38.8g, BCS 36.8g, TEOS 21.7g, GPS 10.6g was put there, and it stirred for 30 minutes under room temperature conditions, and obtained A1 liquid.
次いで、上述のA1液とA2液とを混合し、室温条件下で30分間撹拌した。これにより、コーティング組成物K1を得た。 In a 300 mL volumetric flask, 4.7 g of TIPT was put as titanium alkoxide, 58.2 g of HG was added thereto, and the mixture was stirred for 30 minutes at room temperature to obtain A2 liquid.
Subsequently, the above-mentioned A1 liquid and A2 liquid were mixed, and it stirred for 30 minutes under room temperature conditions. This obtained coating composition K1.
200mLフラスコ中にAN 12.7g、水3.0gを加えて攪拌し、ANを溶解した。そこに、EG 13.7g、HG 39.2g、BCS 37.3g、TEOS 21.7g、MPS 8.8gを入れ、室温条件下で30分攪拌して、B1液を得た。 <Synthesis Example 2> (Synthesis of Coating Composition K2)
In a 200 mL flask, 12.7 g of AN and 3.0 g of water were added and stirred to dissolve AN. EG 13.7g, HG 39.2g, BCS 37.3g, TEOS 21.7g, MPS 8.8g was put there, and it stirred for 30 minutes under room temperature conditions, and obtained B1 liquid.
次いで、上述のB1液とB2液とを混合し、室温条件下で30分間撹拌した。これにより、コーティング組成物K2を得た。 In a 300 mL volumetric flask, 4.7 g of TIPT was added as titanium alkoxide, 58.9 g of HG was added thereto, and the mixture was stirred for 30 minutes at room temperature to obtain B2 liquid.
Subsequently, the above-mentioned B1 liquid and B2 liquid were mixed, and it stirred for 30 minutes under room temperature conditions. This obtained coating composition K2.
200mLフラスコ中にAN 12.7g、水3.0gを加えて攪拌し、ANを溶解した。そこに、EG 13.6g、HG 38.8g、BCS 36.9g、TEOS 21.7g、ACPS 10.5gを入れ、室温条件下で30分攪拌して、C1液を得た。 <Synthesis Example 3> (Synthesis of Coating Composition K3)
In a 200 mL flask, 12.7 g of AN and 3.0 g of water were added and stirred to dissolve AN. EG 13.6g, HG 38.8g, BCS 36.9g, TEOS 21.7g, ACPS 10.5g was put there, and it stirred under room temperature conditions for 30 minutes, and obtained C1 liquid.
次いで、上述のC1液とC2液とを混合し、室温条件下で30分間撹拌した。これにより、コーティング組成物K3を得た。 In a 300 mL volumetric flask, 4.7 g of TIPT as titanium alkoxide was added, 58.2 g of HG was added thereto, and the mixture was stirred at room temperature for 30 minutes to obtain C2 solution.
Subsequently, the above-mentioned C1 liquid and C2 liquid were mixed, and it stirred for 30 minutes under room temperature conditions. This obtained coating composition K3.
200mLフラスコ中にAN 12.7g、水3.0gを加えて攪拌し、ANを溶解した。そこに、EG 13.5g、HG 38.6g、BCS 36.7g、TEOS 21.7g、MPMS 11.1gを入れ、室温条件下で30分攪拌して、D1液を得た。 <Synthesis Example 4> (Synthesis of Coating Composition K4)
In a 200 mL flask, 12.7 g of AN and 3.0 g of water were added and stirred to dissolve AN. EG 13.5g, HG 38.6g, BCS 36.7g, TEOS 21.7g, MPMS 11.1g was put there, and it stirred under room temperature conditions for 30 minutes, and obtained D1 liquid.
次いで、上述のD1液とD2液とを混合し、室温条件下で30分間撹拌した。これにより、コーティング組成物K4を得た。 In a 300 mL flask, 4.7 g of TIPT and 57.9 g of HG were added and stirred for 30 minutes at room temperature to obtain a D2 solution.
Subsequently, the above-mentioned D1 liquid and D2 liquid were mixed, and it stirred for 30 minutes under room temperature conditions. This obtained coating composition K4.
200mLフラスコ中にAN 12.7g、水3.0gを加えて攪拌し、ANを溶解した。そこに、EG 13.9g、HG 39.7g、BCS 37.7g、TEOS 15.5g、MTES 13.3gを入れ、室温条件下で30分攪拌して、E1液を得た。 <Synthesis Example 5> (Synthesis of Coating Composition K5)
In a 200 mL flask, 12.7 g of AN and 3.0 g of water were added and stirred to dissolve AN. EG 13.9g, HG 39.7g, BCS 37.7g, TEOS 15.5g, MTES 13.3g was put there, and it stirred for 30 minutes under room temperature conditions, and obtained E1 liquid.
次いで、上述のE1液とE2液とを混合し、室温条件下で30分間撹拌した。これにより、コーティング組成物K5を得た。 In a 300 mL flask, 4.7 g of TIPT and 59.5 g of HG were added and stirred for 30 minutes at room temperature to obtain a liquid E2.
Subsequently, the above-mentioned E1 liquid and E2 liquid were mixed, and it stirred for 30 minutes under room temperature conditions. This obtained coating composition K5.
200mLフラスコ中にAN 12.7g、水3.0gを加えて攪拌し、ANを溶解した。そこに、EG 13.4g、HG 38.3g、BCS 36.4g、TEOS 21.7g、MPMS 9.3g、C18 3.1gを入れ、室温条件下で30分攪拌して、F1液を得た。 <Synthesis Example 6> (Synthesis of Coating Composition K6)
In a 200 mL flask, 12.7 g of AN and 3.0 g of water were added and stirred to dissolve AN. EG 13.4g, HG 38.3g, BCS 36.4g, TEOS 21.7g, MPMS 9.3g, C18 3.1g was put there, and it stirred for 30 minutes at room temperature conditions, and obtained F1 liquid .
次いで、上述のF1液とF2液とを混合し、室温条件下で30分間撹拌した。これにより、コーティング組成物K6を得た。 In a 300 mL flask, 4.7 g of TIPT and 57.4 g of HG were added and stirred for 30 minutes at room temperature to obtain an F2 solution.
Subsequently, the above-mentioned F1 liquid and F2 liquid were mixed, and it stirred for 30 minutes under room temperature conditions. This obtained coating composition K6.
200mLフラスコ中にAN 12.7g、水3.0gを加えて攪拌し、ANを溶解した。そこに、EG 13.5g、HG 38.6g、BCS 36.7g、TEOS 15.5g、APS 1.7g、ACPS 6.7g、GPS 8.8gを入れ、室温条件下で30分攪拌して、G1液を得た。 <Synthesis Example 7> (Synthesis of Coating Composition K7)
In a 200 mL flask, 12.7 g of AN and 3.0 g of water were added and stirred to dissolve AN. EG 13.5g, HG 38.6g, BCS 36.7g, TEOS 15.5g, APS 1.7g, ACPS 6.7g, GPS 8.8g was put there, and it stirred for 30 minutes under room temperature conditions. G1 liquid was obtained.
次いで、上述のG1液とG2液とを混合し、室温条件下で30分間撹拌した。これにより、コーティング組成物K7を得た。 In a 300 mL flask, 4.7 g of TIPT and 57.9 g of HG were added and stirred for 30 minutes at room temperature to obtain a G2 solution.
Subsequently, the above-mentioned G1 liquid and G2 liquid were mixed, and it stirred for 30 minutes under room temperature conditions. This obtained coating composition K7.
200mLフラスコ中にAN 12.7g、水3.0gを加えて攪拌し、ANを溶解した。そこに、EG 13.5g、HG 38.5g、BCS 36.6g、TEOS 15.5g、MPS 1.5g、ACPS 10.5g、UPS 5.9gを入れ、室温条件下で30分攪拌して、H1液を得た。 <Synthesis Example 8> (Synthesis of Coating Composition K8)
In a 200 mL flask, 12.7 g of AN and 3.0 g of water were added and stirred to dissolve AN. EG 13.5g, HG 38.5g, BCS 36.6g, TEOS 15.5g, MPS 1.5g, ACPS 10.5g, UPS 5.9g was put there, and it stirred for 30 minutes under room temperature conditions, An H1 solution was obtained.
次いで、上述のH1液とH2液とを混合し、室温条件下で30分間撹拌した。これにより、コーティング組成物K8を得た。 In a 300 mL flask, 4.7 g of TIPT and 57.7 g of HG were added and stirred for 30 minutes at room temperature to obtain an H2 solution.
Subsequently, the above-mentioned H1 liquid and H2 liquid were mixed, and it stirred for 30 minutes under room temperature conditions. This obtained coating composition K8.
200mLフラスコ中にAN 13.1g、水3.1gを加えて攪拌し、ANを溶解した。そこに、EG 13.3g、HG 95.2g、BCS 36.2g、TEOS 16.3g、MPMS 22.8gを入れ、室温条件下で30分攪拌した。これにより、コーティング組成物K9を得た。 <Synthesis Example 9> (Synthesis of Coating Composition K9)
In a 200 mL flask, 13.1 g of AN and 3.1 g of water were added and stirred to dissolve AN. EG 13.3g, HG 95.2g, BCS 36.2g, TEOS 16.3g, MPMS 22.8g was put there, and it stirred under room temperature conditions for 30 minutes. This obtained coating composition K9.
200mLフラスコ中にAN 12.1g、水2.8gを加えて攪拌し、ANを溶解した。そこに、EG 13.5g、HG 56.7g、BCS 36.8g、TEOS 13.7g、MPMS 10.9gを入れ、室温条件下で30分攪拌して、I1液を得た。 <Synthesis Example 10> (Synthesis of Coating Composition K10)
In a 200 mL flask, 12.1 g of AN and 2.8 g of water were added and stirred to dissolve AN. EG 13.5g, HG 56.7g, BCS 36.8g, TEOS 13.7g, MPMS 10.9g was put there, and it stirred for 30 minutes under room temperature conditions, and obtained I1 liquid.
次いで、上述のI1液とI2液とを混合し、室温条件下で30分間撹拌した。これにより、コーティング組成物K10を得た。 In a 300 mL flask, 13.4 g of TIPT and 40.1 g of HG were put, and stirred for 30 minutes at room temperature to obtain a liquid I2.
Subsequently, the above-mentioned I1 liquid and I2 liquid were mixed and stirred for 30 minutes at room temperature. This obtained coating composition K10.
200mLフラスコ中にAN 11.8g、水2.8gを加えて攪拌し、ANを溶解した。そこに、EG 13.6g、HG 44.8g、BCS 36.8g、TEOS 10.5g、MPMS 10.3gを入れ、室温条件下で30分攪拌して、J1液を得た。 <Synthesis Example 11> (Synthesis of Coating Composition K11)
In a 200 mL flask, 11.8 g of AN and 2.8 g of water were added and stirred to dissolve AN. EG 13.6g, HG 44.8g, BCS 36.8g, TEOS 10.5g, MPMS 10.3g was put there, and it stirred for 30 minutes under room temperature conditions, and obtained J1 liquid.
次いで、上述のJ1液とJ2液とを混合し、室温条件下で30分間撹拌した。これにより、コーティング組成物K11を得た。 In a 300 mL flask, 17.4 g of TIPT and 52.1 g of HG were put, and stirred for 30 minutes at room temperature to obtain a solution J2.
Subsequently, the above-mentioned J1 liquid and J2 liquid were mixed, and it stirred for 30 minutes under room temperature conditions. This obtained coating composition K11.
200mLフラスコ中にAN 11.5g、水2.7gを加えて攪拌し、ANを溶解した。そこに、EG 13.6g、HG 33.5g、BCS 36.9g、TEOS 7.2g、MPMS 10.0gを入れ、室温条件下で30分攪拌して、L1液を得た。 <Synthesis Example 12> (Synthesis of Coating Composition K12)
In a 200 mL flask, 11.5 g of AN and 2.7 g of water were added and stirred to dissolve AN. EG 13.6g, HG 33.5g, BCS 36.9g, TEOS 7.2g, and MPMS 10.0g were put there, and it stirred under room temperature conditions for 30 minutes, and obtained L1 liquid.
次いで、上述のL1液とL2液とを混合し、室温条件下で30分間撹拌した。これにより、コーティング組成物K12を得た。 In a 300 mL flask, 21.2 g of TIPT and 63.6 g of HG were put, and stirred at room temperature for 30 minutes to obtain a liquid L2.
Subsequently, the above-mentioned L1 liquid and L2 liquid were mixed, and it stirred for 30 minutes under room temperature conditions. This obtained coating composition K12.
200mLフラスコ中にAN 12.7g、水3.0gを加えて攪拌し、ANを溶解した。そこに、EG 13.7g、HG 39.1g、BCS 37.1g、TEOS 31.1gを入れ、室温条件下で30分攪拌して、M1液を得た。 <Synthesis Example 13> (Synthesis of Coating Composition K13)
In a 200 mL flask, 12.7 g of AN and 3.0 g of water were added and stirred to dissolve AN. EG 13.7g, HG 39.1g, BCS 37.1g, and TEOS 31.1g were put there, and it stirred under room temperature conditions for 30 minutes, and obtained M1 liquid.
次いで、上述のM1液とM2液とを混合し、室温条件下で30分間撹拌した。これにより、コーティング組成物K13を得た。コーティング組成物K13には、上述した一般式(II)で示される構造の金属アルコキシドは含有されていない。 In a 300 mL flask, 4.7 g of TIPT and 58.6 g of HG were placed, and stirred at room temperature for 30 minutes to obtain a liquid M2.
Subsequently, the above-mentioned M1 liquid and M2 liquid were mixed, and it stirred for 30 minutes under room temperature conditions. This obtained coating composition K13. The coating composition K13 does not contain the metal alkoxide having the structure represented by the general formula (II).
200mLフラスコ中にAN 12.7g、水3.0gを加えて攪拌し、ANを溶解した。そこに、EG 13.7g、HG 39.2g、BCS 37.3g、TEOS 28.0g、MTES 2.7gを入れ、室温条件下で30分攪拌して、N1液を得た。 <Synthesis Example 14> (Synthesis of Coating Composition K14)
In a 200 mL flask, 12.7 g of AN and 3.0 g of water were added and stirred to dissolve AN. EG 13.7g, HG 39.2g, BCS 37.3g, TEOS 28.0g, and MTES 2.7g were put there, and it stirred under room temperature conditions for 30 minutes, and obtained N1 liquid.
次いで、上述のN1液とN2液とを混合し、室温条件下で30分間撹拌した。これにより、コーティング組成物K14を得た。
コーティング組成物K13には、上記した合成例1~合成例12のコーティング組成物K1~K12に比べ、上述した一般式(II)で示される構造の金属アルコキシドが少量しか含有されていないことになる。 In a 300 mL flask, 4.7 g of TIPT and 58.8 g of HG were put, and stirred for 30 minutes at room temperature to obtain N2 liquid.
Subsequently, the above-mentioned N1 liquid and N2 liquid were mixed, and it stirred for 30 minutes under room temperature conditions. This obtained coating composition K14.
Compared to the coating compositions K1 to K12 of Synthesis Examples 1 to 12 described above, the coating composition K13 contains only a small amount of the metal alkoxide having the structure represented by the general formula (II). .
200mLフラスコ中にAN 12.7g、水3.0gを加えて攪拌し、ANを溶解した。そこに、IPA 145.6g、TEOS 15.5g、MPMS 18.5g、TIPT 4.7gを入れ、室温条件下で30分攪拌した。これにより、コーティング組成物K15を得た。 <Synthesis Example 15> (Synthesis of Coating Composition K15)
In a 200 mL flask, 12.7 g of AN and 3.0 g of water were added and stirred to dissolve AN. IPA 145.6g, TEOS 15.5g, MPMS 18.5g, and TIPT 4.7g were put there, and it stirred under room temperature conditions for 30 minutes. This obtained coating composition K15.
上述した合成例によるコーティング組成物について、コーティング組成物K1~K12及びK15を、それぞれ、実施例1~実施例12及び比較例1として、安定性の評価を行った。
安定性の評価方法は、合成したコーティング組成物(K1~K12、K15)を用い、孔径0.5マイクロメートルのメンブランフィルタで加圧濾過したのち、室温条件下にて1週間放置する。次いで、シリコン基板(100)にスピンコーティングにて成膜したとき、シリコン基板上の塗膜に異物が観察されないものを○評価とし、異物が観察されるものを×評価とした。上記の評価結果を表1に示す。 <Evaluation of stability>
With respect to the coating compositions according to the synthesis examples described above, the stability was evaluated using the coating compositions K1 to K12 and K15 as Examples 1 to 12 and Comparative Example 1, respectively.
The stability is evaluated by using the synthesized coating compositions (K1 to K12, K15), pressure-filtering with a membrane filter having a pore size of 0.5 micrometers, and then allowing to stand at room temperature for 1 week. Subsequently, when a film was formed on the silicon substrate (100) by spin coating, the case where no foreign matter was observed on the coating film on the silicon substrate was evaluated as “Good”, and the case where foreign matter was observed was evaluated as “X”. The evaluation results are shown in Table 1.
上述した合成例によるコーティング組成物を用いて、孔径0.5μmのメンブランフィルタで加圧濾過し、基板上にスピンコート法により塗膜を形成する。この基板を60℃に設定されたホットプレート上で3分間加熱し乾燥する。次いで、紫外線照射装置(アイグラフィックス社製 UB 011-3A型)を使用し、高圧水銀ランプ(入力電源1000W)を用いて50mW/cm2(波長365nm換算)の光強度で2分間紫外線照射する。紫外線照射量は6000mJ/cm2となる。紫外線照射の後、250℃に設定された熱風循環式オーブン内に移し、30分間焼成する。こうして、基板上にコート膜を成膜する。 <Method I for Coating Film I>
Using the coating composition according to the synthesis example described above, pressure filtration is performed with a membrane filter having a pore size of 0.5 μm, and a coating film is formed on the substrate by spin coating. The substrate is heated for 3 minutes on a hot plate set to 60 ° C. and dried. Next, UV irradiation is performed for 2 minutes at a light intensity of 50 mW / cm 2 (converted to a wavelength of 365 nm) using a high-pressure mercury lamp (input power supply 1000 W) using an ultraviolet irradiation device (UB011-3A type manufactured by Eye Graphics). . The amount of ultraviolet irradiation is 6000 mJ / cm 2 . After the ultraviolet irradiation, it is transferred into a hot air circulation oven set at 250 ° C. and baked for 30 minutes. Thus, a coat film is formed on the substrate.
上述した合成例によるコーティング組成物を用いて、孔径0.5μmのメンブランフィルタで加圧濾過し、基板上にスピンコート法により塗膜を形成する。この基板を60℃に設定されたホットプレート上で3分間加熱し乾燥する。次いで、250℃に設定された熱風循環式オーブン内に移し、30分間焼成する。こうして、基板上にコート膜を成膜する。 <Method II of Coating Film Formation>
Using the coating composition according to the synthesis example described above, pressure filtration is performed with a membrane filter having a pore size of 0.5 μm, and a coating film is formed on the substrate by spin coating. The substrate is heated for 3 minutes on a hot plate set to 60 ° C. and dried. Next, it is transferred into a hot air circulation oven set at 250 ° C. and baked for 30 minutes. Thus, a coat film is formed on the substrate.
基板には、シリコン基板(100)を用いた。上述したように、このシリコン基板上に、成膜方法Iにより成膜された実施例13~実施例20のコート膜、成膜方法IIにより成膜された実施例21~24のコート膜、成膜方法IIにより成膜された比較例2および比較例3のコート膜を形成し、屈折率の評価を行った。評価方法は、エリプソメータ(溝尻光学工業所社製、DVA-FLVW)を使用し、波長633nmにおける屈折率を測定することにより行った。
各コート膜の評価結果を、各コート膜形成に使用したコーティング組成物とともに、下記の表2に示す。 <Evaluation of refractive index>
A silicon substrate (100) was used as the substrate. As described above, the coating films of Examples 13 to 20 formed by the film forming method I on this silicon substrate, the coating films of Examples 21 to 24 formed by the film forming method II, The coating films of Comparative Example 2 and Comparative Example 3 formed by the film method II were formed, and the refractive index was evaluated. The evaluation method was performed by measuring the refractive index at a wavelength of 633 nm using an ellipsometer (DVA-FLVW, manufactured by Mizoji Optical Co., Ltd.).
The evaluation results of each coat film are shown in Table 2 below together with the coating composition used for forming each coat film.
ガラス基板上に、膜厚2μmのアクリル膜を形成した。アクリル膜の形成は、次のようにして行った。まず、アクリル材料組成物を、孔径0.5μmのメンブランフィルタで加圧濾過し、ガラス基板全面にスピンコート法により塗膜を形成した。次いで、この基板をホットプレート上で2分間加熱乾燥した後、熱風循環式オーブン内に移し、30分間焼成した。これにより、ガラス基板上にアクリル膜が形成された。 <Crack evaluation>
An acrylic film having a thickness of 2 μm was formed on the glass substrate. The acrylic film was formed as follows. First, the acrylic material composition was filtered under pressure with a membrane filter having a pore size of 0.5 μm, and a coating film was formed on the entire surface of the glass substrate by a spin coating method. Next, this substrate was heated and dried for 2 minutes on a hot plate, then transferred to a hot-air circulating oven and baked for 30 minutes. As a result, an acrylic film was formed on the glass substrate.
そして、アクリル膜の形成されたガラス基板上に、成膜方法Iにより成膜された実施例13~実施例20のコート膜、成膜方法IIにより成膜された実施例21~24のコート膜、成膜方法IIにより成膜された比較例2のコート膜を形成し、コート膜のクラック評価を行った。 A coat film having a thickness of 100 nm is formed on the acrylic film by the film formation method I or the film formation method II.
Then, the coating films of Examples 13 to 20 formed by the film forming method I on the glass substrate on which the acrylic film was formed, and the coating films of Examples 21 to 24 formed by the film forming method II. Then, the coating film of Comparative Example 2 formed by the film forming method II was formed, and the coating film was evaluated for cracks.
評価の結果、比較例2のコート膜に比べ、実施例13~実施例24のコート膜は、クラックの発生において改善が見られることが分かった。 Regarding the evaluation criteria for crack evaluation, in the coating film on the substrate, those that do not cause cracks are evaluated as ◎, those that do not occur in the plane but cracks only at the edges are evaluated as ○, and those that cause cracks on the entire surface are × It was evaluated.
As a result of the evaluation, it was found that the coating films of Examples 13 to 24 showed improvement in the occurrence of cracks compared to the coating film of Comparative Example 2.
基板上にパターニングされた透明導電膜が成膜された透明導電膜基板を準備する。基板にはガラス基板を用い、透明導電膜にはITOを用いる。この透明導電膜基板としては、上述した本発明のタッチパネル1に使用した透明導電膜基板14の使用が可能である。ここでは、ITOの膜厚は28nmとした。 <Transparent conductive film substrate>
A transparent conductive film substrate on which a patterned transparent conductive film is formed on a substrate is prepared. A glass substrate is used as the substrate, and ITO is used as the transparent conductive film. As this transparent conductive film substrate, the transparent
ITOの膜厚が28nmである上記の透明導電膜基板上に、実施例20のコート膜KL8を100nmの膜厚で成膜した基板を作製した。この基板上に光学接着剤を塗布し、0.7mmの素ガラスを貼り合わせた。次いで、紫外線照射装置(アイグラフィックス社製 UB 011-3A型)を使用し、高圧水銀ランプ(入力電源1000W)を用いて、50mW/cm2(波長365nm換算)の光強度で80秒間紫外線照射した。これにより、光学接着剤を硬化させて、特性評価用のタッチパネルとして実施例25のタッチパネルを作製した。 <Production of touch panel>
A substrate in which the coating film KL8 of Example 20 was formed to a thickness of 100 nm on the transparent conductive film substrate having a thickness of ITO of 28 nm was produced. An optical adhesive was applied onto the substrate, and 0.7 mm of raw glass was bonded. Next, using an ultraviolet irradiation device (UB011-3A type manufactured by Eye Graphics Co., Ltd.) and using a high pressure mercury lamp (input power supply 1000 W), ultraviolet irradiation is performed for 80 seconds at a light intensity of 50 mW / cm 2 (wavelength 365 nm conversion). did. Thereby, the optical adhesive was hardened and the touch panel of Example 25 was produced as a touch panel for characteristic evaluation.
実施例25~実施例29および比較例3、4の評価用のタッチパネルを用い、ITOの電極パターンが目立つかどうかの評価をする、電極パターン見えの評価を行った。 <Evaluation of electrode pattern appearance>
Using the touch panels for evaluation in Examples 25 to 29 and Comparative Examples 3 and 4, the appearance of the electrode pattern was evaluated to evaluate whether or not the ITO electrode pattern was conspicuous.
実施例25~実施例29並びに比較例3、4の評価用のタッチパネルについて、電極パターン見え評価の結果をまとめ、表3に示す。 As an evaluation method, each touch panel was placed on a black cloth and visually observed with the light illuminated from above. And in the touch panel of the comparative example 4, after confirming that a transparent electrode pattern is visible, another touch panel is observed. As a result of these observations, a transparent electrode pattern that could not be seen was evaluated as ◎. And although the transparent electrode pattern can be seen, the degree of improvement compared to the touch panel of Comparative Example 4 that does not have a coating film is evaluated as “Good”, and the one that is not improved compared to the touch panel of Comparative Example 4 is × It was evaluated.
Table 3 summarizes the results of the electrode pattern appearance evaluation for the evaluation touch panels of Examples 25 to 29 and Comparative Examples 3 and 4.
表2より、コーティング組成物に含有される金属アルコキシドの構造と組成を適切に制御することにより、それから形成されるコート膜は、アクリル樹脂などからなる有機薄膜上でもクラックが生じない、安定な膜として形成されることが分かった。 As a result of the above evaluation, it was found from Table 1 that the stability of the coating composition was improved by including a metal nitrate and a precipitation inhibitor.
From Table 2, by controlling the structure and composition of the metal alkoxide contained in the coating composition appropriately, the coating film formed therefrom is a stable film that does not crack even on an organic thin film made of an acrylic resin or the like. Was found to be formed.
本実施例のコート膜は、いずれも5H以上の硬度を示し、これは、一般的な有機アクリル材料が3H未満に比べて顕著に高い硬度である。 From Table 3, it was found that the appearance of the electrode pattern can be suppressed on the touch panel by forming a coat film having an appropriately controlled refractive index on the electrode.
Each of the coating films of the present example has a hardness of 5H or more, which is significantly higher than that of a general organic acrylic material less than 3H.
2、102、202 基板
3、103、203 第1の透明電極
4、104、204 第2の透明電極
5、6、105、106、205、206 コート膜
9、108、208、209 接着層
10、110、210 ディスプレイパネル
11 引き出し配線
14 透明導電膜基板
18 交差部
19 層間絶縁膜
20 架橋電極
21 パッド部
30 タッチパネル基板
107 オーバーコート層
207 カバーフィルム 1, 101, 201
Claims (12)
- 下記一般式(I)で示される第1の金属アルコキシドと、下記一般式(II)で示される第2の金属アルコキシドと、下記一般式(III)で示される金属塩と、有機溶媒と、水と、析出防止剤と、を含有することを特徴とするタッチパネル用コーティング組成物。
M1(OR1)n (I)
(式中、M1は、珪素(Si)、チタン(Ti)、タンタル(Ta)、ジルコニウム(Zr)、ホウ素(B)、アルミニウム(Al)、マグネシウム(Mg)および亜鉛(Zn)よりなる群から選択された少なくとも1の金属を表し、R1は、炭素数1~5のアルキル基を表し、nは、M1の価数2~5を表す。)
R2 lM2(OR3)m-l (II)
(式中、M1は、珪素(Si)、チタン(Ti)、タンタル(Ta)、ジルコニウム(Zr)、ホウ素(B)、アルミニウム(Al)、マグネシウム(Mg)および亜鉛(Zn)よりなる群から選択された少なくとも1の金属を表す。R2は、水素原子またはフッ素原子で置換されてもよく、且つ、ハロゲン原子、ビニル基、グリシドキシ基、メルカプト基、メタクリロキシ基、アクリロキシ基、イオシアネート基、アミノ基またはウレイド基で置換されていてもよく、且つ、ヘテロ原子を有していてもよい炭素数1~20の炭化水素基を表す。R3は、炭素数1~5のアルキル基を表す。mは、M2の価数2~5を表し、lは、mの価数が3の場合1または2であり、mの価数が4の場合1~3であり、mの価数が5の場合1~4である。)
M3(X)k (III)
(式中、M3は、アルミニウム(Al)、インジウム(In)、亜鉛(Zn)、ジルコニウム(Zr)、ビスマス(Bi)、ランタン(La)、タンタル(Ta)、イットリウム(Y)およびセリウム(Ce)よりなる群から選択された少なくとも1の金属を表し、Xは、塩酸、硝酸、硫酸、酢酸、蓚酸、スファミン酸、スルホン酸、アセト酢酸若しくはアセチルアセトナートの残基、またはこれらの塩基性塩を表し、kは、M3の価数を表す。) A first metal alkoxide represented by the following general formula (I), a second metal alkoxide represented by the following general formula (II), a metal salt represented by the following general formula (III), an organic solvent, water And a deposition inhibitor. A coating composition for a touch panel, comprising:
M 1 (OR 1 ) n (I)
(Wherein M 1 is a group consisting of silicon (Si), titanium (Ti), tantalum (Ta), zirconium (Zr), boron (B), aluminum (Al), magnesium (Mg) and zinc (Zn). At least one metal selected from R 1 represents an alkyl group having 1 to 5 carbon atoms, and n represents a valence 2 to 5 of M 1. )
R 2 l M 2 (OR 3 ) ml (II)
(Wherein M 1 is a group consisting of silicon (Si), titanium (Ti), tantalum (Ta), zirconium (Zr), boron (B), aluminum (Al), magnesium (Mg) and zinc (Zn). Represents at least one metal selected from R 2 may be substituted with a hydrogen atom or a fluorine atom, and may be a halogen atom, a vinyl group, a glycidoxy group, a mercapto group, a methacryloxy group, an acryloxy group, an isocyanate group; Represents a hydrocarbon group having 1 to 20 carbon atoms which may be substituted with an amino group or a ureido group and which may have a hetero atom, and R 3 represents an alkyl group having 1 to 5 carbon atoms. M represents the valence 2 to 5 of M 2 , l is 1 or 2 when the valence of m is 3, and 1 to 3 when the valence of m is 4, and the valence of m 1 to 4 if the number is 5 .)
M 3 (X) k (III)
(Wherein M 3 represents aluminum (Al), indium (In), zinc (Zn), zirconium (Zr), bismuth (Bi), lanthanum (La), tantalum (Ta), yttrium (Y) and cerium ( Ce) represents at least one metal selected from the group consisting of: X is a residue of hydrochloric acid, nitric acid, sulfuric acid, acetic acid, succinic acid, sfamic acid, sulfonic acid, acetoacetic acid or acetylacetonate, or their basicity Represents a salt, and k represents the valence of M 3. ) - 第2の金属アルコキシドの含有量は、第1の金属アルコキシドと第2の金属アルコキシドとを合わせた全金属アルコキシドに対して、15モル%以上である請求項1に記載のタッチパネル用コーティング組成物。 The touch panel coating composition according to claim 1, wherein the content of the second metal alkoxide is 15 mol% or more based on the total metal alkoxide of the first metal alkoxide and the second metal alkoxide.
- 析出防止剤は、N-メチル-ピロリドン、エチレングリコール、ジメチルホルムアミド、ジメチルアセトアミド、ジエチレングリコール、プロピレングリコール、ヘキシレングリコールおよびこれらの誘導体よりなる群から選択された少なくとも1以上である請求項1または2に記載のタッチパネル用コーティング組成物。 The precipitation inhibitor is at least one or more selected from the group consisting of N-methyl-pyrrolidone, ethylene glycol, dimethylformamide, dimethylacetamide, diethylene glycol, propylene glycol, hexylene glycol and derivatives thereof. The coating composition for touchscreens as described.
- 金属塩の金属原子(M3)と、第1の金属アルコキシドおよび第2の金属アルコキシドの金属原子(M1およびM2)とのモル比は、
0.01≦M3/(M1+M2+M3)≦0.7
である請求項1~3のいずれかに記載のタッチパネル用コーティング組成物。 The molar ratio of the metal atom (M 3 ) of the metal salt to the metal atoms (M 1 and M 2 ) of the first metal alkoxide and the second metal alkoxide is:
0.01 ≦ M 3 / (M 1 + M 2 + M 3 ) ≦ 0.7
The touch panel coating composition according to any one of claims 1 to 3. - 第1の金属アルコキシドは、シリコンアルコキシドまたはその部分縮合物と、チタンアルコキシドとの混合物である請求項1~4のいずれかに記載のタッチパネル用コーティング組成物。 5. The touch panel coating composition according to claim 1, wherein the first metal alkoxide is a mixture of silicon alkoxide or a partial condensate thereof and titanium alkoxide.
- 前記金属塩は、金属硝酸塩、金属硫酸塩、金属酢酸塩、金属塩化物、金属蓚酸塩、金属スファミン酸塩、金属スルホン酸塩、金属アセト酢酸塩、金属アセチルアセトナートまたはこれらの塩基性塩である請求項1~5のいずれかに記載のタッチパネル用コーティング組成物。 The metal salt is a metal nitrate, metal sulfate, metal acetate, metal chloride, metal oxalate, metal sphamate, metal sulfonate, metal acetoacetate, metal acetylacetonate or a basic salt thereof. The touchscreen coating composition according to any one of claims 1 to 5.
- 前記有機溶媒は、アルキレングリコール類またはそのモノエーテル誘導体を含む請求項1~6のいずれかに記載のコーティング組成物。 The coating composition according to any one of claims 1 to 6, wherein the organic solvent contains an alkylene glycol or a monoether derivative thereof.
- 請求項1~7のいずれかに記載のタッチパネル用コーティング組成物を用いて成膜されたコート膜。 A coating film formed using the coating composition for a touch panel according to any one of claims 1 to 7.
- 屈折率が1.52~1.70であり、膜厚が40nm~170nmである請求項8に記載のコート膜。 The coating film according to claim 8, wherein the refractive index is 1.52 to 1.70 and the film thickness is 40 nm to 170 nm.
- 基板の操作領域に透明電極のパターンが形成されたタッチパネルであって、請求項8または9に記載のコート膜を前記透明電極のパターンの少なくとも一部の上に配したことを特徴とするタッチパネル。 A touch panel in which a transparent electrode pattern is formed in an operation region of a substrate, wherein the coating film according to claim 8 or 9 is disposed on at least a part of the transparent electrode pattern.
- 前記透明電極パターンは、少なくとも2つの異なる方向の位置を検出するための第1の透明電極パターンと、第2の透明電極パターンとを有して構成され、
前記第1の透明電極パターンと前記第2の透明電極パターンの少なくとも一部は、前記基板の操作領域で重畳するとともに、この重畳する部分の前記第1の透明電極パターンと前記第2の透明電極パターンとの間には有機材料からなる膜が配置されており、
前記コート膜は、前記第1の透明電極パターンまたは前記第2の透明電極パターンの少なくとも一部とともに前記有機材料からなる膜の少なくとも一部を被覆するよう構成された請求項10に記載のタッチパネル。 The transparent electrode pattern includes a first transparent electrode pattern for detecting positions in at least two different directions, and a second transparent electrode pattern,
At least a part of the first transparent electrode pattern and the second transparent electrode pattern overlap each other in the operation region of the substrate, and the first transparent electrode pattern and the second transparent electrode in the overlapping part A film made of organic material is placed between the pattern and
The touch panel according to claim 10, wherein the coating film is configured to cover at least a part of the film made of the organic material together with at least a part of the first transparent electrode pattern or the second transparent electrode pattern. - 前記第1の透明電極パターンと前記第2の透明電極パターンとが重畳する部分は、前記基板の操作領域に複数あり、これら複数の重畳する部分のそれぞれにおいて、前記重畳する部分の面積より大きい面積の前記有機材料からなる膜が配置されている請求項11に記載のタッチパネル。 There are a plurality of overlapping portions of the first transparent electrode pattern and the second transparent electrode pattern in the operation region of the substrate, and each of the overlapping portions has an area larger than the area of the overlapping portion. The touch panel according to claim 11, wherein a film made of the organic material is arranged.
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Also Published As
Publication number | Publication date |
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KR101829495B1 (en) | 2018-02-14 |
JP6048148B2 (en) | 2016-12-21 |
TW201245345A (en) | 2012-11-16 |
CN103443750B (en) | 2017-02-15 |
CN103443750A (en) | 2013-12-11 |
KR20140005250A (en) | 2014-01-14 |
TWI542648B (en) | 2016-07-21 |
JPWO2012099253A1 (en) | 2014-06-30 |
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