KR101829495B1 - Coating composition for touch panels, coating film, and touch panel - Google Patents

Abstract

A coating composition capable of forming a coat film with high reliability and controlled in refractive index, a coat film formed from the composition, and a touch panel having the coat film on the electrode.
A metal alkoxide represented by the following general formula (I), a second metal alkoxide represented by the following general formula (II), a metal salt represented by the following general formula (III), an organic solvent, water and a precipitation inhibitor Wherein the coating composition is a coating composition for a touch panel.
M ¹ (OR ¹ ) _n (I)
R ² _l M ² (OR ³ ) _ml (II)
M ³ (X) _k (III)

Description

TECHNICAL FIELD [0001] The present invention relates to a coating composition for a touch panel, a coating film for a touch panel,

The present invention relates to a coating composition for a touch panel, a coat film formed from the coating composition, and a touch panel having the coat film.

2. Description of the Related Art Conventionally, inorganic coatings have been formed on various surfaces of substrates such as glass, ceramics, metals, and plastics. By forming the inorganic coating on the substrate surface, it becomes possible to impart electrical properties, optical properties, chemical properties, mechanical properties, and the like to the substrate. Therefore, these inorganic coatings have been put to practical use as conductive films, insulating films, selective transmission or absorption films of light rays, alkali release preventing films, chemical resistance films, hard coat films and the like.

Examples of the method for forming such an inorganic coating film include a vapor phase method such as CVD (Chemical Vapor Deposition), PVD (Physical Vapor Deposition), and sputtering, or a liquid phase method using an alkoxide compound or the like.

In general, the vaporization method requires an expensive and large-scale apparatus such as a vacuum deposition apparatus. There is also a problem that the size and shape of the film-forming base material are limited. On the other hand, as a liquid phase method using an alkoxide compound or the like, a so-called sol-gel method is known. This method has advantages such as application to a large area and coping with patterning. Therefore, the inorganic film formed by the liquid phase method is actively used as a coat film in an electronic device (see, for example, Patent Document 1). Particularly, application to a touch panel is being studied in recent years.

Recently, with the spread of smart phones, the display screen of cellular phones has become larger. Therefore, development of a touch panel capable of an input operation using a display on a display has been actively conducted. According to the touch panel, since input means such as a push-down switch is not required, the display screen can be enlarged.

The touch panel detects a contact position of an operation area in which a finger, a pen, or the like is in contact. Using this function, the touch panel is used as an input device. The contact position detection method includes a resistance film method and a capacitance method. In the resistive film type, two opposing substrates are used, while in the electrostatic capacity type, one substrate can be used. For this reason, according to the electrostatic capacity method, a thin touch panel can be configured, and it is preferable for a portable device and the like, and therefore, development is progressing actively.

Patent Document 2 discloses a capacitive touch panel. In this touch panel, a first transparent electrode for detecting the coordinate in the X direction and a second transparent electrode for detecting the coordinate in the Y direction are arranged on one surface of the transparent substrate, and an interlayer insulating film So as not to conduct.

The touch panel is mounted on a display device such as a liquid crystal display device and is used as a display device having a touch panel function capable of detecting a touch position. A person who operates the touch panel visually observes the display device through the touch panel. Therefore, a member having excellent light transmission characteristics is used for the transparent electrode. For example, inorganic materials such as indium tin oxide (ITO) have been used. As the interlayer insulating film, an acrylic material which can be patterned and is insulating is used.

Japanese Patent Publication No. 2881847 Japanese Laid-Open Patent Publication No. 2010-28115

In the touch panel as described above, strength and high reliability are required because the touch panel may be pressed or touched by a finger or a pen tip in the operation area. Therefore, studies have been made to form a protective film on the first and second electrodes overlapping each other through the interlayer insulating film.

As the protective film, a patternable acrylic material is used. However, since the acrylic material is an organic material, the hardness as a protective film is not sufficient. In addition, when ITO or the like is used for the transparent electrode, the adhesion to ITO is weak, which is one factor for lowering the reliability of the touch panel. Further, it is difficult to form a film using a printing technique such as flexographic printing for an acrylic material. Therefore, it is necessary to use a photolithography technique which is complicated in the process at the time of film formation.

In view of this, a coat film made of an inorganic material instead of an acrylic film has been studied as a protective film. In the case of a film made of an inorganic material as a component, since the hardness is generally high, high reliability can be expected as a coat film of the touch panel. For this reason, it is demanded that a film can be formed using a printing technique for a coat film containing an inorganic material as a component and that the film has high adhesion with an interlayer insulating film of an organic material such as an acrylic material.

Further, in a capacitive touch panel, there is a difference in reflectance between a region where a transparent electrode such as ITO is formed and a region where a transparent electrode is not formed. As a result, there is a problem that the pattern of the transparent electrode is visually observed and the display property is lowered.

As described above, in the conventional touch panel, an acrylic film has been used as a protective film material on a transparent electrode. However, in this case, the refractive index characteristics of the acrylic film are not considered at all. Therefore, the effect of making the transparent electrode pattern invisible to the acrylic film can not be expected. Therefore, in the case of using a coat film composed of an inorganic material as a component instead of an acrylic film, it is preferable that the coat film makes the transparent electrode pattern inconspicuous. Specifically, it is preferable to use a coat film in consideration of the refractive index.

The present invention has been made in view of this point. That is, an object of the present invention is to provide a coated film having a controlled refractive index, which can be applied to a touch panel to realize high reliability, and a coating composition capable of forming such a coated film.

Another object of the present invention is to provide a touch panel having a coat film on an electrode capable of realizing high reliability by controlling the refractive index.

In order to achieve the above object, the present invention provides the following.

What is claimed is: 1. A process for producing a metal-containing compound, comprising the steps of: 1. preparing a first metal alkoxide represented by the following general formula (I), a second metal alkoxide represented by the following general formula (II), a metal salt represented by the following general formula (III) The coating composition for a touch panel.

M ¹ (OR ¹ ) _n (I)

Wherein M ¹ is at least ^one element selected from the group consisting of silicon (Si), titanium (Ti), tantalum (Ta), zirconium (Zr), boron (B), aluminum (Al), magnesium (Mg) R ¹ represents an alkyl group having 1 to 5 carbon atoms, and n represents an integer of 2 to 5 in M ¹ )

R ² _l M ² (OR ³ ) _ml (II)

Wherein M ² is at least one selected from the group consisting of silicon (Si), titanium (Ti), tantalum (Ta), zirconium (Zr), boron (B), aluminum (Al), magnesium (Mg) R ² may be substituted with a hydrogen atom or a fluorine atom and may be a halogen atom, a vinyl group, a glycidoxy group, a mercapto group, a methacryloxy group, an acryloxy group, an iocyanate group R ³ represents an alkyl group having 1 to 5 carbon atoms, m represents an integer of 2 to 5, and M ² represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, 1 is 1 or 2 when the valence of m is 3 or 1 to 3 when the valence of m is 4 and 1 to 4 when the valence of m is 5)

M ³ (X) _k (III)

Wherein M ³ is at least one element selected from the group consisting of aluminum (Al), indium (In), zinc (Zn), zirconium (Zr), bismuth (Bi), lanthanum (La), tantalum (Ta), yttrium X represents at least one metal selected from the group consisting of hydrochloric acid, nitric acid, sulfuric acid, acetic acid, oxalic acid, sulfamic acid, sulfonic acid, acetoacetic acid or acetylacetonate or a basic salt thereof; ³ < / RTI >

2. The coating composition for a touch panel according to 1 above, wherein the content of the second metal alkoxide is at least 15 mol% based on the total metal alkoxide including the first metal alkoxide and the second metal alkoxide.

3. The precipitation inhibitor is at least one substance selected from the group consisting of N-methyl-pyrrolidone, ethylene glycol, dimethylformamide, dimethylacetamide, diethylene glycol, propylene glycol, hexylene glycol, The coating composition for a touch panel according to 1 or 2,

4. The metal atoms of the metal (M ³⁾ and, the molar ratio of first metal alkoxide and second metal alkoxide, the metal atom (M ¹ and M ²⁾ of 0.01 ≤ M ³ / (M ¹ + M ² + M ³⁾ ≤ 0.7 wherein 1 to 3 of the touch panel, the coating composition according to any one.

5. The coating composition for a touch panel according to any one of 1 to 4 above, wherein the first metal alkoxide is a mixture of a silicon alkoxide or a partial condensate thereof and a titanium alkoxide.

6. The metal salt as described in any of 1 to 5 above, which is a metal nitrate, a metal sulfate, a metal acetate, a metal chloride, a metal oxalate, a metal sulfamate, a metal sulfonate, a metal acetoacetate, a metal acetylacetonate or a basic salt thereof 1 < / RTI >

7. The coating for a touch panel according to any one of 1 to 6 above, wherein the first metal alkoxide is a mixture of a silicon alkoxide or a partial condensate thereof and a titanium alkoxide and the organic solvent comprises an alkylene glycol or a monoether derivative thereof Composition.

8. A coat film formed by using the coating composition for a touch panel according to any one of 1 to 7 above.

9. The coat film as described in 8 above, wherein the refractive index is 1.52 to 1.70 and the film thickness is 40 nm to 170 nm.

10. A touch panel in which a transparent electrode pattern is formed in an operation region of a substrate,

Wherein the coat film described in 8 or 9 above is disposed on at least a part of the transparent electrode pattern.

11. The transparent electrode pattern according to claim 1, wherein the transparent electrode pattern comprises a first transparent electrode pattern for detecting a position in at least two different directions and a second transparent electrode pattern,

At least a part of the first transparent electrode pattern and the second transparent electrode pattern are overlapped in the operation region of the substrate and the first transparent electrode pattern and the second transparent electrode pattern of the overlapping portion overlap each other with an organic material Is disposed,

The touch panel according to claim 10, wherein the coating film is configured to cover at least a part of the film made of the organic material together with at least a part of the first transparent electrode pattern or the second transparent electrode pattern.

12. The liquid crystal display device according to any one of the preceding claims, wherein a portion where the first transparent electrode pattern overlaps with the second transparent electrode pattern has a plurality of portions in the operation region of the substrate, and in each of the plurality of overlapping portions, Wherein a film made of the above organic material is arranged on the surface of the touch panel.

According to the present invention, there is provided a coating composition for a touch panel, which can be applied to a touch panel to realize high reliability and can form a coated film having a controlled refractive index.

Further, according to the present invention, a coating film having a high refractive index and a high strength, which is preferable as a coat film of a touch panel, is provided.

According to the present invention, the pattern of the electrode is suppressed from being conspicuous, and a touch panel having high reliability is provided.

1 is a plan view schematically showing the structure of a touch panel of the present invention.
2 is a sectional view taken along the line A1-A1 'in FIG.
3 (a) to 3 (d) are process sectional views showing a method of manufacturing the touch panel of the present invention.
4 is a cross-sectional view showing a schematic structure of another example of the touch panel of the present invention.
5 is a plan view schematically showing a structure of another example of the touch panel of the present invention.
6 is a cross-sectional view taken along the line B1-B1 'in FIG.

<Coating composition>

The coating composition of the present invention comprises a first metal alkoxide represented by the general formula (I), a second metal alkoxide represented by the general formula (II), a metal salt represented by the general formula (III), an organic solvent, Contains a precipitation inhibitor. By coating this coating composition, a desirable coat is obtained on the touch panel.

The coat film obtained from the coating composition of the present invention contains a metal oxide as an inorganic component as a main component and has a higher hardness and higher strength than a coat film made of an organic material such as an acrylic material. Therefore, it is preferable as a protective film for an electrode of a touch panel. In addition, the refractive index is controlled in the optimum range so as to reduce the phenomenon of so-called &quot; electrode pattern exposure &quot; in which the transparent electrode pattern is visible in the touch panel. As a result, it is possible to prevent deterioration of the display quality of the display device to which the touch panel using the coat film is applied.

The coat film obtained in the present invention may be constituted by, for example, two kinds of transparent electrode patterns for detecting positions in two different directions, for example, a transparent electrode pattern disposed in an operation region of a substrate of a touch panel. At this time, an interlayer insulating film made of an organic material such as acryl is disposed between the two types of transparent electrode patterns so that they are not electrically connected. In the case of the touch panel having such a structure, a coat film is also formed on the interlayer insulating film. Here, cracks are generated in the coat film due to the difference in thermal stretchability between the coat film and the interlayer insulating film, and the reliability of the touch panel is deteriorated.

In the coating composition of the present invention, the structure and composition of components contained are preferably selected so that cracks do not occur in the coating film of the touch panel. More specifically, in the coating composition of the present invention, it is possible to select a structure and a composition suitable for formation of a coat film with respect to a metal alkoxide as a main component.

The coating composition of the present invention contains a first metal alkoxide having a structure represented by the following formula (I) and a second metal alkoxide having a structure represented by the following formula (II).

[Chemical Formula 1]

M ¹ (OR ¹ ) _n (I)

In the formula (I), M ¹ , R ¹ , n are as defined above. Among them, M ¹ is preferably silicon (Si), titanium (Ti), zirconium (Zr), or aluminum (Al), and particularly preferably silicon (Si) or titanium (Ti). Also, n is preferably 3 or 4.

(2)

R ² _l M ² (OR ³ ) _ml (II)

In the formula (II), M ² , R ² , R ³ , m are as defined above. Among them, M ² is preferably silicon (Si), titanium (Ti), zirconium (Zr), or aluminum (Al), and more preferably silicon (Si) or titanium (Ti).

When a silicon alkoxide or a partial condensate thereof is used as the metal alkoxide represented by the formula (I), one or a mixture of two or more compounds represented by the general formula (IV) or a partial condensate (preferably a pentamer or less) Is used.

(3)

Si (OR ') ₄ (IV)

In the formula (IV), R 'represents an alkyl group having 1 to 5 carbon atoms, preferably 1 to 3 carbon atoms, or an acetoxy group.

More specifically, as the silicon alkoxide, for example, tetraalkoxysilanes such as tetramethoxysilane, tetraethoxysilane, tetrapropoxysilane, tetrabutoxysilane and tetraacetoxysilane are used.

When a titanium alkoxide or a partial condensate is used as the metal alkoxide represented by the formula (I), one or a mixture of two or more compounds represented by the general formula (V) or a partial condensate (preferably, ) Is used.

[Chemical Formula 4]

Ti (OR &quot;) ₄ (V)

In the formula (V), R &quot; represents an alkyl group having 1 to 5 carbon atoms.

Specific examples of the metal alkoxide represented by the formula (I) include titanium alkoxide such as titanium tetraethoxide, titanium tetra propoxide, titanium tetraalkoxide compound such as titanium tetrabutoxide, or titanium tetra-n-butoxide tetramer And the like are used.

Other examples of the metal alkoxide represented by the formula (I) include zirconium tetraalkoxide compounds such as zirconium tetraethoxide, zirconium tetrapropoxide and zirconium tetrabutoxide; Aluminum trialkoxide compounds such as aluminum tributoxide, aluminum triisopropoxide and aluminum triethoxide; And tantalum pentaalkoxide compounds such as tantalum pentapropoxide and tantalum pentabutoxide.

The content of the first metal alkoxide is preferably from 20 mol% to 85 mol%, more preferably from 30 mol% to 70 mol%, based on the total amount of the first metal alkoxide and the second metal alkoxide contained in the coating composition .

The second metal alkoxide represented by the above formula (II) is used together with the first metal alkoxide in the coating composition of the present invention. In the coating composition, by containing the second metal alkoxide, the difference in thermal stretchability between the coat film and the organic film is alleviated when the coat film is formed on a film made of an organic material such as an acrylic material. As a result, even if a coat film is formed on the organic film, the coat film is prevented from cracking. For example, in the touch panel, cracks can be prevented from occurring in the coat film on the interlayer insulating film even if an organic film made of an acrylic material is used for the above-described interlayer insulating film and a coat film is formed thereon.

The content of the second metal alkoxide is preferably from 80 mol% to 15 mol%, more preferably from 70 mol% to 30 mol%, based on the total amount of the first metal alkoxide and the second metal alkoxide contained in the coating composition. When the carbon number of R ² is 3 or less, the content of the metal alkoxide represented by the formula (II) is 30 mol% or more, the carbon number of R ² is 4 or more, or when the mercapto group is contained in R ² , The content of the metal alkoxide is more preferably 15 mol% or more, and still more preferably 75 mol% or less.

When the content of the second metal alkoxide is less than 15 mol%, a crack may be generated in the coat film obtained on the organic film. On the other hand, if it is 80 mol% or more, there is a case where a crack is not generated but a uniform coating film can not be obtained. With such a content, cracking in the above-mentioned coat film can be suppressed.

The total content of the first metal alkoxide and the second metal alkoxide contained in the coating composition is preferably 0.5% by weight to 20% by weight, and more preferably 1% by weight to 15% by weight. When the ratio is large, the storage stability of the coating composition deteriorates, and it becomes difficult to control the thickness of the coat film. On the other hand, when the thickness is small, the thickness of the obtained coat film becomes thin, and a plurality of coatings are required to obtain a predetermined film thickness.

As the preferable metal alkoxide represented by the formula (II), for example, when M ² is silicon, the following compounds can be mentioned.

For example, there can be mentioned methyltrimethoxysilane, methyltripropoxysilane, methyltriacetoxysilane, methyltributoxysilane, methyltripentoxysilane, methyltriamyloxysilane, methyltriphenoxysilane, methyltribenzyloxy Silane, methyltriphenetyloxysilane, glycidoxymethyltrimethoxysilane, glycidoxymethyltriethoxysilane,? -Glycidoxyethyltrimethoxysilane,? -Glycidoxyethyltriethoxysilane,? -Glycidoxyethyltrimethoxysilane,? -Glycidoxyethyltriethoxysilane,? -Glycidoxypropyltrimethoxysilane,? -Glycidoxypropyltriethoxysilane,? -Glycidoxypropyl tri Glycidoxypropyltrimethoxysilane, gamma -glycidoxypropyltriethoxysilane, gamma -glycidoxypropyltripropoxysilane, gamma -glycidoxypropyltrimethoxysilane, gamma -glycidoxypropyltrimethoxysilane, gamma -glycidoxypropyltrimethoxysilane, gamma- Glycidoxypropyltributoxysilane,? -Glycidoxypropyl Glycidoxybutyltrimethoxysilane,? -Glycidoxybutyltrimethoxysilane,? -Glycidoxybutyltrimethoxysilane,? -Glycidoxybutyltrimethoxysilane,? -Glycidoxybutyltrimethoxysilane,? -Glycidoxybutyltrimethoxysilane, -Glycidoxybutyltriethoxysilane,? -Glycidoxybutyltrimethoxysilane,? -Glycidoxybutyltriethoxysilane, (3,4-epoxycyclohexyl) methyltrimethoxysilane, (3, ? - (3,4-epoxycyclohexyl) ethyltriethoxysilane,? - (3,4-epoxycyclohexyl) ethyltrimethoxysilane, (3,4-epoxycyclohexyl) ethyltripropoxysilane,? - (3,4-epoxycyclohexyl) ethyltripropoxysilane, (3,4-epoxycyclohexyl) propyltrimethoxysilane,? - (3,4-epoxycyclohexyl) propyltriethoxysilane,? - (3,4-epoxycycles Hexyl) butyltriethoxysilane, glycidoxymethylmethyldimethoxysilane, glycidoxymethylmethyldiethoxysilane,? -Glycidoxyethylmethyldimethoxysilane,? -Glycidoxyethylmethyldiethoxysilane,? - Glycidoxyethylmethyldimethoxysilane,? -Glycidoxyethylethyldimethoxysilane,? -Glycidoxypropylmethyldimethoxysilane,? -Glycidoxypropylmethyldiethoxysilane,? -Glycidoxypropylmethyldimethacrylate, Glycidoxypropylethyldimethoxysilane, gamma -glycidoxypropylmethyldimethoxysilane, gamma -glycidoxypropylmethyldiethoxysilane, gamma -glycidoxypropylmethyldipropoxysilane, gamma -glycidoxypropylmethyldimethoxysilane, gamma -glycidoxypropylethyldimethoxysilane, gamma- Glycidoxypropylmethyldibutoxysilane,? -Glycidoxypropylmethyldiphenoxysilane,? -Glycidoxypropylethyldimethoxysilane,? -Glycidoxypropylethyldiethoxysilane,? -Glycidoxypropylvinyl Dimethoxysilane, gamma -glycidoxypropylbis Vinyltriethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, phenyltriethoxysilane, phenyltriethoxysilane, vinyltriethoxysilane, vinyltriethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, phenyltriethoxysilane, 2-hydroxypropyltrimethoxysilane, gamma -chloropropyltrimethoxysilane, gamma -chloropropyltriethoxysilane, gamma -chloropropyltriacetoxysilane, 3,3,3-trifluoropropyltrimethoxysilane, gamma-methacryloxy Propyltrimethoxysilane,? -Mercaptopropyltrimethoxysilane,? -Mercaptopropyltriethoxysilane,? -Cyanoethyltriethoxysilane, chloromethyltrimethoxysilane, chloromethyltriethoxysilane, Aminopropyltrimethoxysilane, N- (? -Aminoethyl)? -Aminopropyltrimethoxysilane, N- (? -Aminoethyl)? -Aminopropylmethyldimethoxysilane,? -Aminopropylmethyldimethoxysilane, N- )? -aminopropyltriethoxysilane, N- (? -aminoethyl)? - amino Dimethyldimethoxysilane, dimethyldiethoxysilane, dimethyldiethoxysilane, phenylmethyldiethoxysilane,? -Chloropropylmethyldimethoxysilane,? -Chloropropylmethyldiethoxysilane, dimethyldiacetoxysilane, dimethyldiethoxysilane, Silane,? -Methacryloxypropylmethyldimethoxysilane,? -Methacryloxypropylmethyldiethoxysilane,? -Mercaptopropylmethyldimethoxysilane,? -Mercaptomethyldiethoxysilane, methylvinyldimethoxysilane, methyl (R) -N-1-phenylethyl-N'-tri (meth) acrylate, vinyltriethoxysilane, vinyltriethoxysilane, vinyltriethoxysilane, vinyldiethoxysilane, (R) -N-1-phenylethyl-N'-trimethoxysilylpropylurea, allyltriethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-methacryloxypropyl Triethoxysilane, 3-acryloxypropyltrimethoxysilane, 3-acryloxypropyltriethoxysilane, 3-isocyanatopropyltriethoxysilane, trifluoropropyltrimethoxysilane, bromopropyltriethoxysilane, diethyldiethoxysilane, diethyldimethoxysilane, diphenyl Trimethyl methoxysilane, p-styryltrimethoxysilane, p-styryltriethoxysilane, p-styryltripropoxysilane, and the like. have. These may be used alone or in combination of two or more.

The metal salt contained in the coating composition of the present invention is represented by the following general formula (III).

[Chemical Formula 5]

M ³ (X) _k (III)

In the formula (III), M ³ , X and k are as defined above. Among them, M ³ is preferably Al, In, C or Zr. X is preferably a residue of hydrochloric acid, nitric acid, acetic acid, oxalic acid, sulfonic acid, acetoacetic acid or acetylacetonate, or a basic salt thereof. The residue of each acid in X is also called nitric acid and nitric acid, for example, and sulfuric acid is also called sulfuric acid, and the amount thereof is contained so as to be equivalent to the valence of M ³ . Further, the basic salt means a case in which OH groups are contained in the residues of the respective acids.

Of the metal salts represented by the formula (III), nitrates, chloride salts, oxalates or basic salts thereof are particularly preferable. Of these, aluminum nitrate, indium nitrate, or cerium nitrate is more preferable from the viewpoints of availability and storage stability of the coating composition.

The coating composition of the present invention contains an organic solvent. The organic solvent is used for improving the coatability of the coating composition by adjusting the viscosity of the coating composition when the coating film is formed by forming the coating film with the coating composition. The content of the organic solvent in the coating composition is preferably, By weight, more preferably from 85% by weight to 99% by weight, based on the total weight of the composition. When the content of the organic solvent is small, the thickness of the obtained coating film becomes thin, and a plurality of coatings are required to obtain a predetermined film thickness. On the other hand, in many cases, the storage stability of the coating composition deteriorates and it becomes difficult to control the thickness of the coat film.

Examples of the organic solvent used in the coating composition include alcohols such as methanol, ethanol, 1-propanol, 2-propanol, 1-butanol, 2-butanol, 2-methyl-1-propanol and 2-methyl- Esters such as acetic acid ethyl ester; Glycols such as ethylene glycol, and ester derivatives thereof; Ethers such as diethyl ether; Ketones such as acetone, methyl ethyl ketone, and cyclohexanone; And aromatic hydrocarbons such as benzene and toluene. These are used alone or in combination.

When the coating composition contains a titanium alkoxide component, the alkylene glycols or monoethers thereof contained in the organic solvent include, for example, ethylene glycol, diethylene glycol, propylene glycol, hexylene glycol, Ethyl, monopropyl, monobutyl or monophenyl ether.

When the molar ratio of the glycols or monoethers contained in the organic solvent used in the coating composition to the titanium alkoxide is less than 1, the stability of the titanium alkoxide is less effective and the storage stability of the coating composition deteriorates. On the other hand, the use of a large amount of glycols or monoethers thereof is not a problem at all. For example, all of the organic solvents used in the coating composition may be the above-mentioned glycols or monoethers thereof. However, when the coating composition contains no titanium alkoxide, it is not necessary to specifically contain the above-mentioned glycol and / or mono ether thereof.

The coating composition preferably contains a precipitation inhibitor. The precipitation inhibitor prevents the metal salt from precipitating in the coating film when the coating film is formed with the coating composition. Examples of the precipitation inhibitor include N-methyl-pyrrolidone, dimethylformamide, dimethylacetamide, ethylene glycol, diethylene glycol, propylene glycol or hexylene glycol, and derivatives thereof. Among them, N-methyl-pyrrolidone, ethylene glycol, diethylene glycol, propylene glycol, hexylene glycol or derivatives thereof are more preferable. At least one kind of precipitation inhibitor may be used.

The content of the precipitation inhibitor in the coating composition is preferably such that the metal of the metal salt is converted into a metal oxide and the following ratio (weight ratio) is satisfied.

(Precipitation inhibitor / metal oxide) ≥ 1

When the ratio is less than 1, the effect of preventing the precipitation of the metal salt at the time of forming the coating film becomes small. On the other hand, the use of a large amount of the precipitation inhibitor has no influence on the coating composition, but is preferably 200 or less.

The precipitation inhibitor may be added to the metal alkoxide, particularly, the silicon alkoxide, the titanium alkoxide, or the silicon alkoxide and the titanium alkoxide when the hydrolysis / condensation reaction is carried out in the presence of the metal salt, or may be added after the completion of the hydrolysis / condensation reaction.

On the other hand, the content of the metal salt contained in the coating composition is preferably such that the total content of the metal atoms (M ¹ and M ² ) constituting the first and second metal alkoxides and the metal atom (M ³ ) (Molar ratio).

0.01? M ³ / (M ¹ + M ² + M ³ )? 0.7

If this ratio is less than 0.01, the mechanical strength of the obtained coating film is not sufficient, which is not preferable. On the other hand, if it exceeds 0.7, adhesion of the coat film to a substrate such as a glass substrate or a transparent electrode is deteriorated. In addition, when baking is performed at a low temperature of 450 캜 or less, the chemical resistance of the obtained coat film tends to be lowered. Among them, the ratio is more preferably 0.01 to 0.6.

In the coating composition of the present invention, as long as the effect of the present invention is not impaired, other components other than the above-mentioned components such as inorganic fine particles, metal oxo oligomer, metal oxal polymer, leveling agent, surfactant May be contained.

As the inorganic fine particles, fine particles such as silica fine particles, alumina fine particles, titania fine particles, and magnesium fluoride fine particles are preferable, and a colloid solution of these inorganic fine particles is particularly preferable. The colloidal solution may be obtained by dispersing the inorganic fine particle powder in a dispersion medium, or may be a commercially available colloid solution.

In the present invention, by containing the inorganic fine particles, the surface shape and other functions of the formed cured coating can be imparted. The inorganic fine particles preferably have an average particle diameter of 0.001 to 0.2 탆, more preferably 0.001 to 0.1 탆. When the average particle diameter of the inorganic fine particles exceeds 0.2 탆, the transparency of the cured coating formed using the coating liquid to be prepared may be lowered.

Examples of the dispersion medium of the inorganic fine particles include water and an organic solvent. As the colloid solution, it is preferable that the pH or pKa is adjusted to 1 to 10, more preferably 2 to 7, from the viewpoint of the stability of the coating liquid for forming a film.

Examples of the organic solvent used in the dispersion medium of the colloid solution include organic solvents such as methanol, ethanol, propanol, butanol, ethylene glycol, propylene glycol, butanediol, pentanediol, 2- Alcohols such as ethylene glycol monopropyl ether; Ketones such as methyl ethyl ketone and methyl isobutyl ketone; Aromatic hydrocarbons such as toluene and xylene; Amides such as dimethylformamide, dimethylacetamide and N-methylpyrrolidone; Esters such as ethyl acetate, butyl acetate and? -Butyrolactone; And ethers such as tetrahydrofuran and 1,4-dioxane. Of these, alcohols and ketones are preferred. These organic solvents may be used alone or as a dispersion medium by mixing two or more kinds thereof.

When the metal alkoxide and the metal salt are converted into the metal oxide, the solid content concentration in the coating composition of the present invention is preferably in the range of 0.5 wt% to 20 wt%. When the solid content exceeds 20% by weight, the storage stability of the coating composition deteriorates, and it becomes difficult to control the thickness of the coat film. On the other hand, when the solid content is less than 0.5% by weight, the thickness of the obtained coat film becomes thin, and a plurality of coatings are required to obtain a predetermined film thickness. Among them, the solid concentration is more preferably 1 wt% to 15 wt%.

The coating composition of the present invention contains water to obtain a condensate by hydrolyzing the first and second metal alkoxides in the presence of the metal salt. The amount of such water is preferably 2 to 24 moles relative to the total moles of the first and second metal alkoxides. When the ratio of the amount of water (mol) / (total number of moles of metal alkoxide) is 2 or less, the hydrolysis of the metal alkoxide becomes insufficient and the film formability is lowered or the strength of the obtained coat film is lowered When the above ratio is more than 24, the polycondensation proceeds continuously, and thus the storage stability is lowered, which is not preferable. The molar ratio is more preferably 2 to 20.

In addition, when the metal salt contained in the coating composition is a hydrated salt, since the aqueous solution is involved in the hydrolysis reaction, it is necessary to take into account the water content of the metal salt as the amount of water to be contained in the coating composition. For example, when the coexisting metal salt is a hydrated salt of an aluminum salt, since the water content of the hydrated salt participates in the reaction, it is necessary to consider the water content of the aluminum salt with respect to the amount of water used for the hydrolysis.

The coating composition of the present invention can form a desired coat film on a touch panel. This coat film is a coat film mainly composed of a metal oxide, which is an inorganic substance, and has a higher strength than a film of an organic material such as an acrylic material. In addition, it is applied as a protective film for an electrode in a touch panel to be described later. Since the coat film has appropriate heat expansion and contraction properties, the occurrence of cracks is minimized even when the coating film is formed on the organic film constituting the touch panel. In addition, the refractive index is controlled to be within the optimum range so as to reduce the deterioration of the display performance of the display device due to visibility of the transparent electrode pattern.

The control of the refractive index of the coating film can be realized by controlling the composition of the coating composition. That is, the coat film in the present invention is prepared by hydrolysis / condensation of the metal alkoxide contained in the coating composition. By selecting the composition of the metal alkoxide, the refractive index of the coat film to be formed can be adjusted within a predetermined range Do. For example, when the silicon alkoxide and the titanium alkoxide are selected as the metal alkoxide, the refractive index of the obtained coat film is adjusted within a predetermined range to be described later, specifically within the range of about 1.45 to 2.1, It is possible to do.

That is, in order to realize the refractive index when the required refractive index is determined in the coat film formed after the coating composition is applied and film-formed, preferably after drying and then firing, the metal alkoxide, for example, The composition molar ratio of the silicon alkoxide and the titanium alkoxide can be determined. For example, the refractive index of the coating film from the coating composition obtained by hydrolyzing only the silicon alkoxide is a value of about 1.45. The refractive index of the coating film from the coating composition obtained by hydrolyzing only titanium alkoxide is a value of about 2.1. Therefore, when it is desired to set the refractive index of the coated film to a specific value between about 1.45 and 2.1, it is possible to prepare the coating composition using silicon alkoxide and titanium alkoxide at a predetermined ratio so as to realize the refractive index value.

Also, by using another metal alkoxide, it is possible to adjust the refractive index of the obtained coat film. The refractive index of the coated film in the present invention can be adjusted by selecting film forming conditions in addition to the composition conditions. By doing so, a high hardness of the coated film can be realized and a desired refractive index value can be realized.

When a coat film is obtained from the coating composition of the present invention, as described above, the coat film of the coating composition is preferably dried and then fired. The drying is preferably carried out at room temperature to 150 ° C, more preferably at 40 to 120 ° C. The drying time is preferably about 30 seconds to 10 minutes, more preferably about 1 to 8 minutes. As the drying method, it is preferable to use a hot plate, a hot air circulating oven, or the like.

The firing is preferably carried out at 100 캜 to 300 캜, and more preferably at 150 캜 to 250 캜, in consideration of the heat resistance of the other constituent members of the touch panel. The baking time is preferably 5 minutes or more, more preferably 15 minutes or more. As a firing method, it is preferable to use a hot plate, a thermocycling oven, an infrared oven, or the like.

In the case of producing a coated film by firing a coating film of the coating composition, the refractive index of the coated film obtained according to the firing temperature varies. In this case, the higher the firing temperature, the higher the refractive index of the coated film. Therefore, by selecting the firing temperature to an appropriate value, it is possible to adjust the refractive index of the obtained coat film.

In the case of obtaining a coated film from a coating composition, when the coated film is irradiated with ultraviolet rays (UV) before firing, the refractive index of the obtained coated film fluctuates. Specifically, the higher the ultraviolet radiation dose, the higher the refractive index of the coated film. Therefore, in order to realize a desired refractive index, it is possible to select the presence or absence of ultraviolet irradiation. Particularly, when the metal alkoxide contained in the coating composition contains titanium alkoxide, zirconium alkoxide, or tantalum alkoxide, the refractive index of the obtained coat film is fluctuated by ultraviolet (UV) irradiation of the coat film before firing, The refractive index of the coated film can be increased. In the case where a desired refractive index can be realized by selecting conditions such as composition in the coat film, ultraviolet irradiation may not be performed.

In the case of ultraviolet irradiation, it is possible to adjust the refractive index of the coated film by selecting the irradiation amount. For example, a high-pressure mercury lamp may be used in the case where ultraviolet irradiation is required to obtain a desired refractive index in a coating film. In the case of using a high-pressure mercury lamp, the dose is preferably not less than 1000 mJ / cm 2 and not more than 3000 mJ / cm 2 to 10000 mJ / cm 2 in terms of 365 nm. As a light source of ultraviolet rays, in addition to a high-pressure mercury lamp, a low-pressure mercury lamp, a metal halide lamp, a xenon lamp, an excimer lamp, or the like can be used. When a light source other than the high pressure mercury lamp is used, the same amount of accumulated light quantity as that in the case of using the high pressure mercury lamp may be irradiated. When ultraviolet ray irradiation is performed, an ultraviolet ray irradiation step may be performed between the drying step and the baking step.

When the coating composition contains a titanium alkoxide component in particular, it has a property of gradually increasing its viscosity at room temperature. There is no fear that this will be a great problem in practical use. However, when the thickness of the coat film is precisely controlled, it is preferable to carefully manage the temperature and the like. Such an increase in viscosity becomes remarkable as the composition ratio of titanium alkoxide in the coating composition increases. This is thought to be due to the fact that the titanium alkoxide has a high hydrolysis rate with respect to the silicon alkoxide and the like and the condensation reaction is quick.

In the case where the coating composition contains a titanium alkoxide component, the following two methods (1) and (2) are preferred in order to reduce the viscosity change.

(1) When the titanium alkoxide is hydrolyzed in the presence of the metal salt, the glycols and the titanium alkoxide are thoroughly mixed in advance, and if necessary mixed with the silicon alkoxide and hydrolyzed in the presence of the organic solvent. By doing so, a coating composition having a small change in viscosity is obtained. The production method of (1) is effective because an ester exchange reaction occurs between an alkoxy group of a titanium alkoxide and a glycol, and is stabilized with respect to a hydrolysis / condensation reaction because there is heat when titanium alkoxide is mixed with a glycol I think.

(2) A silicon alkoxide is previously subjected to a hydrolysis reaction in the presence of a metal salt, and then mixed with a titanium alkoxide solution mixed with glycols to carry out a condensation reaction to obtain a coating composition. By doing so, a coating composition having a small change in viscosity is obtained.

It is considered that the manufacturing method of (2) is effective for the following reason. That is, the hydrolysis reaction of the silicon alkoxide occurs at a high rate, but the subsequent condensation reaction is slower than the titanium alkoxide. Therefore, when the titanium alkoxide is rapidly added after completing the hydrolysis reaction, the silanol group of the hydrolyzed silicon alkoxide reacts with the titanium alkoxide uniformly. Thus, it is considered that the hydrolyzed silicon alkoxide stabilizes the condensation reactivity of the titanium alkoxide.

A method of mixing titanium alkoxide with a previously hydrolyzed silicon alkoxide has already been attempted. However, when the organic solvent used in the reaction does not contain glycols, a coating composition having excellent storage stability can not be obtained. The method shown in 2) is also useful when a coating composition is obtained from other metal alkoxides and silicon alkoxides having a large hydrolysis rate.

In the coating composition of the present invention, a coating film is formed by applying a generally used coating method, and then a coating film is formed. As the coating method, for example, a dip coating method, a spin coating method, a spray coating method, a brush coating method, a roll transfer method, a screen printing method, an ink jet method or a flexo printing method is used. Of these, an inkjet method and a flexographic printing method which are preferable for pattern printing are particularly preferable.

<Coat membrane>

The coat film of the present invention is formed using the coating composition of the present invention described above. The present invention is applied to a touch panel of the present invention to be described later as an electrode protection film for a touch panel.

The coat film of the present invention is a coat film containing a metal oxide, which is an inorganic substance, as a component, and has a higher hardness and higher strength than a coat film made of an organic material such as an acrylic material. That is, it has excellent mechanical strength and protects the transparent electrode from a plurality of pressures by a finger or the like.

The coating film of the present invention is particularly effective when the touch panel is formed using a film made of an organic material, for example, when the interlayer insulating film disposed between the electrodes of the touch panel is made of an organic material such as acrylic. That is, even if the coat film of the present invention is formed on a film made of an organic material, the composition of the components is selected so that cracks do not occur due to the difference in thermal stretchability with the organic film.

The coat film of the present invention is also preferable as a protective film for an electrode of a touch panel to be described later. That is, according to this coat film, it is possible to suppress the phenomenon that the transparent electrode pattern is visible (electrode pattern exposure phenomenon). Therefore, with the touch panel formed using this coat film, it is possible to reduce deterioration of the display quality of the display device.

The reason why the transparent electrode pattern is visible with the touch panel is that the refractive index of the transparent electrode pattern in the operating region of the substrate is different from the refractive index of the substrate. The refractive index of the ITO is about 1.8 to 2.1. On the other hand, the refractive index of the glass substrate is about 1.4 to 1.5 The refractive index difference between the region where the transparent electrode pattern is formed and the region where the transparent electrode pattern is not formed causes a difference in the light reflection characteristic, that is, the interface reflection characteristic Is different between the region in which the transparent electrode pattern is formed and the region in which the transparent electrode pattern is not formed, thereby making the electrode pattern visible in the screen display.

The present inventors have conducted intensive investigations to obscure the transparent electrode pattern. As a result, the present inventors have found that forming a controlled layer on the transparent electrode pattern disposed on the substrate such that the refractive index and the film thickness are within a desired range I found out that it is valid. Specifically, by controlling the refractive index and the film thickness of the protective layer of the transparent electrode pattern in the optimum range, it was found that the visibility of the transparent electrode pattern unintentionally in the touch panel is suppressed.

In the coating film of the present invention, in particular, when suppressing the phenomenon that the transparent electrode pattern is visible, the refractive index is controlled to fall within the range of 1.50 to 1.70, preferably 1.52 to 1.70. The refractive index control method can be realized by controlling the film forming method in addition to controlling the composition of the coating composition as described above.

As a method for forming a coat film, there is a method in which a coating film is formed on an electrode of a touch panel by applying a coating method generally used in flexographic printing or the like to the coating composition of the present invention, .

<Touch panel>

Next, a touch panel having a coat film of the present invention will be described.

1 and 2 are views for explaining the configuration of a touch panel of the present invention. 1 is a plan view schematically showing a structure of a touch panel. 2 is a sectional view taken along line A1-A1 'in Fig.

As shown in Fig. 1, the touch panel 1 is formed using a transparent substrate 2, and a pattern of transparent electrodes is formed in the operation region of the substrate 2. Specifically, in the operation region of the substrate 2, a first transparent electrode 3 extending in the Y direction and a second transparent electrode 4 extending in the X direction are provided. The first transparent electrode 3 and the second transparent electrode 4 are formed of the same layer formed on the same surface of the substrate 2. [

The substrate 2 is formed of a transparent material such as glass, an acrylic resin, a polyester resin, a polyethylene terephthalate resin, a polycarbonate resin, a polyvinylidene chloride resin, a polymethyl methacrylate resin, a polyethylene naphthalate resin or a triacetylcellulose resin . Particularly, it is preferable to select a material having heat resistance and chemical resistance performance preferable for forming the coat film 5. The thickness of the substrate 2 is, for example, about 0.1 mm to 2 mm when glass is used, and about 10 m to 2,000 m, for example, when a resin film is used.

1, each of the first transparent electrode 3 and the second transparent electrode 4 has a plurality of pad portions 21 as constituent elements. Each of the pad portions 21 is arranged so as to be isolated from each other in plan view and to have a smaller gap between the pad portions 21. [ That is, the pad portion 21 forming the row in the X-axis direction and the pad portion 21 forming the row in the Y-axis direction are arranged in the entire operation region so that the region where they cross each other becomes as small as possible. The pad portion 21 may be formed in a polygonal shape such as a diamond shape, a rectangular shape, or a hexagonal shape, for example, arranged in a shifted or series fashion. Also, the number of separated (spaced) electrodes is not limited to the example shown in Fig. 1, but is determined according to the size of the operating region and the required accuracy of the detection position.

The first transparent electrode 3 and the second transparent electrode 4 which are formed by arranging the plurality of pad portions 21 are formed at positions corresponding to the operation region of the touch panel 1. The first transparent electrode 3 is formed separately in a plurality of regions along the X direction, and detects coordinates in the X direction. The second transparent electrode 4 is formed separately in a plurality of regions along the Y direction to detect coordinates in the Y direction. By adopting such a structure, the accuracy of touch position detection can be enhanced.

The first transparent electrode 3 and the second transparent electrode 4 are formed using a transparent electrode material having a high transmittance to visible light and conductivity. Examples of the transparent electrode material having such conductivity include ITO (Indium Tin Oxide), IZO (Indium Zinc Oxide), ZnO (zinc oxide), and the like. In the case of using ITO, it is preferable to set the thickness to 10 nm to 200 nm so as to secure sufficient conductivity.

The first transparent electrode 3 and the second transparent electrode 4 are formed, for example, as follows.

First, a transparent conductive film is formed by a method selected in consideration of the material of the substrate 2 as a base among the sputtering method, vacuum deposition method, ion plating method, spray method, dipping method, or CVD method. Next, the transparent conductive film is patterned using a photolithography technique. Alternatively, a desired pattern may be formed by a printing method using a paint in which an electrically conductive filler or the like made of the above material is dispersed in an organic solvent.

In the process of forming the transparent electrode, it is preferable that the film thickness can be controlled with good precision. Therefore, it is preferable to select a method capable of realizing a desired film thickness and forming a low-resistance film excellent in transparency at the time of formation.

As shown in Figs. 1 and 2, the first transparent electrode 3 and the second transparent electrode 4 are formed on the same surface of the substrate 2 to form the same layer. Therefore, the first transparent electrode 3 and the second transparent electrode 4 intersect at a plurality of points to form the intersection 18.

In the present invention, one of the first transparent electrode 3 and the second transparent electrode 4 is divided at the intersection portion 18 so as not to come in contact with the other. That is, as shown in Fig. 2, the second transparent electrodes 4 are connected at all of the plurality of intersections 18, but the first transparent electrodes 3 are divided. A crosslinking electrode 20 is formed to connect the division points of the first transparent electrode 3. An interlayer insulating film 19 made of an insulating material is formed between the crosslinking electrode 20 and the second transparent electrode 4. Hereinafter, a more detailed description will be given with reference to Figs. 1 and 2. Fig.

As shown in Fig. 2, a light-transmissive interlayer insulating film 19 is formed on the second transparent electrode 4 in the intersection portion 18. As shown in Fig. For forming the interlayer insulating film 19, an organic material such as a photosensitive acrylic resin is used. In the case of using a photosensitive acrylic resin, the acrylic film is formed only on the second transparent electrode 4 at the intersection portion 18 by using the photolithography method. An inorganic material such as SiO ₂ may also be used. When SiO ₂ is used, for example, the same structure can be formed by a sputtering method using a mask. In consideration of the patterning property, it is preferable to use an acrylic film for the interlayer insulating film 19.

On the upper layer of the interlayer insulating film 19, a crosslinking electrode 20 is formed. The cross-linking electrode 20 electrically connects the first transparent electrodes 3, which are separated from each other at the intersection portion 18, and is preferably formed of a light-transmitting material. By forming the crosslinking electrode 20, the first transparent electrode 3 can be electrically connected in the Y direction.

As shown in Fig. 1, the first transparent electrode 3 and the second transparent electrode 4 have a shape in which a plurality of rhombic pad portions 21 are arranged vertically or horizontally. In the second transparent electrode 4, the connection portion located at the intersection 18 is formed to have a narrower width than the diamond-shaped pad portion 21 of the second transparent electrode 4. In addition, the cross-linking electrode 20 is formed in a short shape in a shape narrower than the rhombic pad portion 21.

As shown in Figs. 1 and 2, in the touch panel 1 of the present invention, on the first transparent electrode 3 and the second transparent electrode 4, as the protective film, (5) is formed. In addition, the transparent electrode forming region and the non-forming region in the portion corresponding to the operation region of the touch panel 1 are covered. The coat film 5 has a high hardness and is excellent in adhesion between the first transparent electrode 3 and the second transparent electrode 4 made of an inorganic material.

For forming the coat film 5 of the present invention, the above-mentioned coating composition of the present invention is used. Specifically, a coating composition obtained by hydrolysis / condensation of the metal alkoxide represented by the above-mentioned formula (I) and the formula (II) in an organic solvent in the presence of an aluminum salt and adding an anti-precipitation agent is used.

In the touch panel 1, the refractive index and the film thickness of the coat film 5 can be selected so that the respective transparent electrode patterns of the first transparent electrode 3 and the second transparent electrode 4 are not seen. Specifically, the refractive index of the coat film 5 is preferably in the range of more than 1.50 and not more than 1.70, and the film thickness is preferably in the range of 40 nm to 170 nm. When the refractive index of the coat film 5 is larger than 1.50 and smaller than 1.60, the film thickness is more preferably in the range of 60 nm to 150 nm. When the refractive index of the coat film 5 is 1.60 or more and 1.70 or less, the film thickness is more preferably in the range of 40 nm to 170 nm.

In the touch panel 1, for example, the coat film 5 is formed of a coating composition containing silicon alkoxide and titanium alkoxide, and has a refractive index of 1.52 and a film thickness of 100 nm.

2, the touch panel 1 includes a surface on which the first transparent electrodes 3 and the like are formed and the uppermost layer on the viewer side of the display panel 10 are bonded to the adhesive layer 9 using an acrylic photocurable resin or the like, So that a single display device can be obtained. Here, the adhesive layer 9 is formed on the coat film 5.

The display device has a touch panel 1 and a display panel 10, and may have a backlight if necessary. 2, details thereof are omitted, but the display panel 10 can have the same configuration as that of a known display device. For example, in the case of a liquid crystal display device, the display panel 10 may have a structure in which a liquid crystal layer is sandwiched between two transparent substrates. On the opposite side of the transparent substrate to the side in contact with the liquid crystal layer, polarizers can be respectively formed. In each of the transparent substrates, a segment electrode or a common electrode can be formed to control the liquid crystal state. Then, the liquid crystal layer is sealed by the respective transparent substrates and the sealing material.

As shown in Fig. 1, terminals (not shown) are formed at the ends of the first transparent electrode 3 and the second transparent electrode 4 in the touch panel 1, The lead wiring 11 is drawn out. The lead wiring 11 may be an opaque metal wiring using an alloy containing these metals such as Mo-Nb (molybdenum-niobium) alloy in addition to silver, aluminum, chromium, copper or molybdenum. The lead wiring 11 is connected to a control circuit (not shown) for detecting the touch position and the application of a voltage to the first transparent electrode 3 and the second transparent electrode 4.

In the touch panel 1 having the above configuration, a voltage is sequentially applied to a plurality of the first transparent electrodes 3 and the second transparent electrodes 4 to apply a charge. A capacitor is formed by capacitive coupling between the fingertip and the first transparent electrode (3) and the second transparent electrode (4) when a finger as a conductive finger touches a certain point in the operation region. Therefore, by detecting the change of the charge at the contact position of the fingertip, it is possible to detect at which point the finger is touched.

The touch panel 1 may selectively apply a voltage to either the first transparent electrode 3 or the second transparent electrode 4 under the control of a control circuit (not shown). In this case, an electric field is formed on the transparent electrode to which the voltage is applied. When the finger or the like touches this state, the contact position is grounded through the capacitance of the human body. As a result, a change in the resistance value occurs between the contact position of the first transparent electrode 3 or second transparent electrode 4 to be a target and a contact position. Since this resistance value is proportional to the distance between the contact position and the terminal of the first transparent electrode 3 or the second transparent electrode 4 as an object, The control circuit detects the current value flowing between the terminals of the first transparent electrode 3 or the second transparent electrode 4 to be a target, thereby obtaining the coordinates of the contact position.

In the touch panel 1 of the present invention, the effect of the coat film 5 formed on the first and second transparent electrodes 3 and 4 prevents the transparent electrode pattern from being conspicuous in the operation region.

Next, a manufacturing method of the touch panel 1 of the present invention will be described.

3 (a) to 3 (d) are process sectional views showing a method of manufacturing a touch panel as a first example of the present invention.

First, a substrate 2 transparent to a glass substrate or the like is prepared. The substrate 2 is cut into a desired shape as required and cleaned. Subsequently, a transparent conductive film is formed on one surface of the substrate 2. Further, an intermediate layer of SiOx, SiNx, SiON or the like may be formed between the substrate 2 and the transparent conductive film. The transparent conductive film is, for example, ITO, and is formed into a film having a thickness of 10 to 200 nm by a sputtering method, a vacuum deposition method, or the like. Subsequently, the transparent conductive film is etched in a state where an etching mask made of a photosensitive resin or the like is formed on the upper layer side of the transparent conductive film, and the first transparent electrode 3 and the second transparent electrode 4 are patterned. By removing the etching mask, the transparent conductive film substrate 14 having the transparent electrode pattern shown in Fig. 3 (a) is obtained.

Here, at the intersection 18 of the transparent conductive film substrate 14, the second transparent electrode 4 is connected via the connection portion, but the first transparent electrode 3 is divided.

Next, a photosensitive resin is coated on the side where the first transparent electrode 3 and the second transparent electrode 4 are formed and then exposed to light to develop the interlayer insulating film 19 (Fig. 3 (b)). As the photosensitive resin for forming the interlayer insulating film 19, one having transparency is used. For example, an acrylic resin or the like can be used. In the case of forming the interlayer insulating film 19 using SiO ₂ , the same structure can be formed by a sputtering method using a mask. However, in consideration of the patterning property, use of an acrylic resin is preferable.

Next, after a transparent conductive film is formed on the interlayer insulating film 19, the transparent conductive film is etched in a state where an etching mask made of a photosensitive resin is formed on the surface of the transparent conductive film. Thereafter, the etching mask is removed, and the crosslinking electrode 20 is formed on the interlayer insulating film 19 so as to connect the divided portions of the first transparent electrode 3. Thus, the structure shown in Fig. 3 (c) is obtained. As the transparent conductive film to be formed on the interlayer insulating film 19, for example, an ITO film can be given. In that case, the crosslinking electrode 20 is formed by ITO.

In addition, the above-described lead wirings 11 are formed by using silver ink or the like in the following steps. However, when the transparent conductive film is etched in the above process, the outgoing wiring 11 may be formed while leaving the transparent conductive film along the outer peripheral edges of the first transparent electrode 3 and the second transparent electrode 4 .

Next, a coating composition for forming a metal oxide layer is applied on the first transparent electrode 3, the second transparent electrode 4, and the crosslinked electrode 20 by flexographic printing. Here, the coating composition is obtained by hydrolysis / condensation of a metal alkoxide in an organic solvent in the presence of a metal salt (for example, an aluminum salt) and addition of an anti-precipitation agent. Subsequently, the substrate 2 on which the coating film of the coating composition is formed is dried on a hot plate, for example, at 40 to 150 DEG C (for example, 60 DEG C). Thereafter, heating is performed in an oven at 100 to 300 캜 (for example, 250 캜), for example, to form a metal oxide (or a metal oxide) on the first transparent electrode 3, the second transparent electrode 4, Layer 5 is formed. Thus, the touch panel substrate 30 shown in Fig. 3 (d) is obtained. Further, the coated film on the substrate 2 may be dried, for example, on a hot plate, and then irradiated with ultraviolet rays, followed by heating in an oven.

The coat film (5) of the present invention thus obtained has a high hardness and a high strength using an inorganic metal oxide as a main component. In addition, even on the interlayer insulating film 19, which is an organic film, there is no case where a crack is generated inside.

Subsequently, the wiring 11 is drawn out from the terminals (not shown) of the ends of the first transparent electrode 3 and the second transparent electrode 4 with ink or the like to form the touch panel 1. [ The touch panel 1 is connected to a control circuit (not shown) of the touch panel via the lead wirings 11.

The completed touch panel 1 is attached to the front surface of the display panel 10 via an adhesive layer 9 such as an acrylic transparent adhesive. At this time, alignment marks are formed at the corners of the substrate 2 and the display panel 10 as necessary to perform alignment.

In the touch panel 1 attached to the display panel 10, since the coat film 5 is formed, high reliability is realized. It is possible to suppress the transparent electrode patterns of the first transparent electrode 3 and the second transparent electrode 4 from being conspicuous in the operation region of the touch panel 1. [

4 is a cross-sectional view showing a schematic structure of another example of the touch panel of the present invention. As shown in Fig. 4, the touch panel 101 has a transparent substrate 102. Fig. A transparent electrode pattern is formed in the operation region of the substrate 102. [ That is, a first transparent electrode 103 and a second transparent electrode 104 for detecting positions in two different directions are formed on the upper layer of the substrate 102, respectively.

The first transparent electrode 103 and the second transparent electrode 104 are formed using a transparent electrode material having a high transmittance to visible light and conductivity. As such a transparent electrode material having conductivity, for example, ITO or ZnO can be used. In the case of using ITO, it is preferable to set the thickness to 10 to 200 nm so as to secure sufficient conductivity.

The first transparent electrode 103 and the second transparent electrode 104 are formed on the transparent substrate 102 as a base or the overcoat layer (described later), which will be described later, by sputtering, vacuum evaporation, ion plating, spraying, 107) in consideration of an optimal method.

For example, a method of patterning a transparent electrode formed in a plane by an etching method using a photolithography technique, or a method in which a conductive filler or the like made of the above material is dispersed in an organic solvent, And the like. In the process of forming the transparent electrode, it is preferable that the film thickness can be controlled with good precision. Therefore, it is preferable to select a method capable of realizing a desired film thickness at the time of formation and capable of forming a low-resistance film excellent in transparency.

As shown in Fig. 4, the first transparent electrode 103 is disposed on the substrate 102. Fig. On the first transparent electrode 103, the coat film 105 of the present invention is formed. For the formation of the coat film 105, the above-mentioned coating composition of the present invention is used. The coat film 105 covers a region where the first transparent electrode 103 is formed and a region where the first transparent electrode 103 corresponds to the operation region of the touch panel 101 and the non-formation region.

An overcoat layer 107 is formed on the coat film 105. The overcoat layer 107 is a film made of an organic material and formed of an acrylic resin having high transparency.

As shown in FIG. 4, the second transparent electrode 104 is disposed on the overcoat layer 107. A coat film 106 of the present invention is formed on the second transparent electrode 104. For forming the coat film 106, the above-described coating composition of the present invention is used. The coat film 106 covers a region where the transparent electrode is formed and a region where the portion corresponding to the operation region of the touch panel 101 is not formed. The coat films 105 and 106 are high in hardness and excellent in the adhesion of the first transparent electrode 103 and the second transparent electrode 104. [ The coat film 106 of the present invention contains inorganic metal oxide as a main component, but does not cause cracking on the overcoat layer 107. [ That is, even if the coat film 106 is formed so as to cover the overcoat layer 107, which is a film made of an organic material together with the second transparent electrode 104, there is no case where cracks are generated inside.

The refractive index and film thickness of the coat films 105 and 106 can be selected so that the respective transparent electrode patterns of the first transparent electrode 103 and the second transparent electrode 104 are not seen in the touch panel 101. [ Specifically, the refractive index of the coat films 105 and 106 is preferably in the range of more than 1.50 and not more than 1.70, and the film thickness is preferably in the range of 40 nm to 170 nm. When the refractive index of the coat films 105 and 106 is larger than 1.50 and smaller than 1.60, the film thickness is more preferably in the range of 60 nm to 150 nm. When the refractive index of the coat films 105 and 106 is in the range of 1.60 or more and 1.70 or less, the film thickness is more preferably in the range of 40 nm to 170 nm.

In the touch panel 101, for example, the first transparent electrode 103 and the second transparent electrode 104 are each made of ITO having a thickness of 28 nm. In this case, the coat films 105 and 106 are formed of the coating composition of the present invention containing silicon alkoxide and titanium alkoxide, respectively, and have a refractive index of 1.52 and a film thickness of 100 nm.

As shown in Fig. 4, on the coat film 106, an adhesive layer 108 made of an acrylic transparent adhesive is formed. The display panel 110 is attached to the touch panel 101 with the adhesive layer 108 therebetween.

In the touch panel 101 having the above-described configuration, when a finger as a conductor touches a certain point in the operation area, the finger tip is electrically connected to the first transparent electrode 103 and the second transparent electrode 104 by electrostatic capacitive coupling A capacitor is formed. Therefore, by detecting the change of the charge at the contact position of the fingertip, it is possible to detect at which point the finger is touched.

In the touch panel 101, high reliability is realized by the effects of the coat films 105 and 106 formed on the first transparent electrode 103 and the second transparent electrode 104. [ It is also possible to prevent the transparent electrode pattern from being conspicuous in the operation region.

5 and 6 are views showing a structure of another example of the touch panel of the present invention. 5 is a plan view schematically showing a structure of another example of the touch panel of the present invention. 6 is a cross-sectional view taken along the line B1-B1 'in FIG.

As shown in Fig. 5, the touch panel 201 is formed using a transparent substrate 202, and a transparent electrode pattern is formed in an operation region of the substrate 202. Fig. A first transparent electrode 203 for detecting coordinates in the X direction formed on one surface of the substrate 202 and a second transparent electrode 204 for detecting coordinates in the Y direction formed on the other surface of the substrate 202, Respectively. In the following description, one surface of the substrate 202 is the upper side and the other side of the substrate 202 is the lower surface. In this case, the other surface of the substrate 202 becomes the surface on the side where the display panel 210 is mounted.

The substrate 202 is a dielectric substrate. Examples of the material of the substrate 202 include glass, acrylic resin, polyester resin, polyethylene terephthalate resin, polycarbonate resin, polyvinylidene chloride resin, polymethyl methacrylate resin, polyethylene naphthalate resin and triacetyl cellulose resin A transparent material is used. Particularly, it is preferable to select a material having heat resistance and chemical resistance suitable for forming the coat films 205 and 206 of the present invention. The thickness of the substrate 202 can be about 0.1 mm to 2 mm if it is made of glass, and 10 m to 2000 m if it is a resin film.

As shown in Fig. 5, the first transparent electrode 203 and the second transparent electrode 204 are each made of an elongated rectangular electrode. The first transparent electrode 203 is elongated in the Y direction and the second transparent electrode 204 is elongated in the X direction, and are arranged in stripes at regular intervals. In addition, the first transparent electrode 203 and the second transparent electrode 204 are arranged so as to be orthogonal to each other, and are generally lattice-shaped.

The first transparent electrode 203 and the second transparent electrode 204 are formed using a transparent electrode material having high transmittance at least for visible light and conductivity. As such a transparent electrode material having conductivity, for example, ITO or ZnO can be used. In the case of using ITO, it is preferable to set the thickness to 10 to 200 nm so as to secure sufficient conductivity.

The first transparent electrode 203 and the second transparent electrode 204 are formed by an optimum method in consideration of the transparent substrate 202 as a base in the sputtering method, vacuum deposition method, ion plating method, spray method, .

For example, a method of patterning a transparent electrode formed in a plane by an etching method using a photolithography technique, or a method in which a conductive filler or the like made of the above material is dispersed in an organic solvent, And the like. In the process of forming the transparent electrode, it is important that the film thickness can be controlled with good precision. Therefore, it is preferable to select a method capable of realizing a desired film thickness and forming a low-resistance film excellent in transparency at the time of formation.

As shown in Figs. 5 and 6, a coat film 205 is formed on the first transparent electrode 203. Fig. The coating film 205 covers a region where the transparent electrode is formed and a region where the portion corresponding to the operation region of the touch panel 201 is formed. 6, a coat film 206 is also formed on the second transparent electrode 204 (lower side in the drawing). The coating film 206 covers a region where a transparent electrode is formed and a region where the portion corresponding to the operation region of the touch panel 201 is formed. The coat films 205 and 206 are high in hardness and excellent in adhesion of the first transparent electrode 203 and the second transparent electrode 204.

For forming the coat films 205 and 206, the above-described coating composition of the present invention obtained by hydrolysis / condensation of a metal alkoxide in an organic solvent in the presence of an aluminum salt and further adding a precipitation inhibitor is used.

The refractive index and the film thickness of the coat films 205 and 206 can be selected so that the respective transparent electrode patterns of the first transparent electrode 203 and the second transparent electrode 204 are not seen in the touch panel 201. [ Specifically, the refractive indexes of the coat films 205 and 206 are preferably larger than 1.50 and not larger than 1.70, respectively, and the film thickness is preferably within a range of 40 nm to 170 nm. When the refractive index of the coat films 205 and 206 is larger than 1.50 and smaller than 1.60, the film thickness is more preferably in the range of 60 nm to 150 nm. When the refractive index of the coat films 205 and 206 is in the range of 1.60 or more and 1.70 or less, the film thickness is more preferably in the range of 40 nm to 170 nm.

In the touch panel 201, for example, the first transparent electrode 203 and the second transparent electrode 204 are each made of ITO having a thickness of 28 nm. In this case, the coat films 205 and 206 are formed of a coating composition prepared using silicon alkoxide and titanium alkoxide, respectively, and have a refractive index of 1.52 and a film thickness of 100 nm.

As shown in Fig. 6, an adhesive layer 208 made of an acrylic transparent adhesive is formed on one surface of the substrate 202. As shown in Fig. On the adhesive layer 208, a cover film 207 made of a transparent resin is adhered. In Fig. 5, the cover film 207 is omitted.

The cover film 207 functions as a protective film for the first transparent electrode 203 and the coat film 205. Instead of the cover film 207, a transparent resin may be coated. In this case, the adhesive layer 208 can be made unnecessary.

A display panel 110 is attached to the other surface of the substrate 202 via an adhesive layer 209 made of an acrylic transparent adhesive.

Although details are omitted in Fig. 6, the display panel 210 may have the same configuration as that of a known display device. For example, in the case of a liquid crystal display device, the display panel 210 may have a structure in which a liquid crystal layer is sandwiched between two transparent substrates. On the opposite side of the transparent substrate to the side in contact with the liquid crystal layer, polarizers can be respectively formed. In each of the transparent substrates, a segment electrode or a common electrode can be formed to control the liquid crystal state. Then, the liquid crystal layer is sealed by the respective transparent substrates and the sealing material.

In the touch panel 201, terminals (not shown) are formed at the ends of the first transparent electrode 3 and the second transparent electrode 4, respectively, and a plurality of lead wirings (not shown) . The lead wiring may be an opaque metal wiring using silver, aluminum, chromium, copper, or an alloy containing them. The lead wiring is connected to a control circuit (not shown) for detecting the touch position and the voltage application to the first transparent electrode 203 and the second transparent electrode 204.

In the touch panel 201 having the above-described configuration, when a finger as a conductor touches a certain point in the operation region, the finger tip is electrically connected to the first transparent electrode 203 and the second transparent electrode 204 by electrostatic capacitive coupling A capacitor is formed. Therefore, by detecting the change of the charge at the contact position of the fingertip, it is possible to detect at which point the finger is touched.

In the touch panel 201, the effect of the coat films 205 and 206 formed on the first transparent electrode 203 and the second transparent electrode 204 prevents the transparent electrode pattern from being conspicuous in the operation region have.

As described above, in another example of the touch panel of the present embodiment, unlike the above example, the touch panel of the present invention is not formed on an organic film made of acrylic resin or the like such as an interlayer insulating film or an overcoat layer not. The coat film of the present invention also effectively functions as a protective film for a high-strength electrode in the case of such an example of a touch panel. Then, the transparent electrode pattern is prevented from being conspicuous.

The touch panel of the present invention has been described above, but the present invention is not limited to the above embodiments. It is possible to apply the coat film of the present invention as a protective film on the transparent electrode of various types of touch panels using transparent electrodes such as ITO. And, high reliability is realized. It is also possible to prevent the transparent electrode from being conspicuous. At that time, even when the coat film of the present invention is formed on various organic films formed in the touch panel, cracks and the like are not generated inside.

Example

Hereinafter, the present invention will be described in more detail with reference to examples, but the present invention is not limited thereto.

[Abbreviations used in the examples]

The meanings of the weak symbols used in the following examples and the like are as follows.

TEOS: tetraethoxysilane

C18: octadecyltriethoxysilane

MPS:? -Mercaptopropyltrimethoxysilane

GPS:? -Glycidoxypropyltrimethoxysilane

UPS: γ-ureidopropyltriethoxysilane

APS:? -Aminopropyltriethoxysilane

ACPS:? -Acryloxypropyltrimethoxysilane

MPMS:? -Methacryloxypropyltrimethoxysilane

MTES: methyltriethoxysilane

TIPT: Tetraisopropoxytitanium

AN: aluminum nitrate 9 hydrate

EG: ethylene glycol

HG: 2-methyl-2,4-pentanediol (alias: hexylene glycol)

BCS: 2-butoxyethanol (alias: butyl cellosolve)

IPA: 2-propanol

&Lt; Synthesis Example 1 &gt; (Synthesis of Coating Composition K1)

In a 200 ml flask, 12.7 g of AN and 3.0 g of water were added and stirred to dissolve the AN. 13.6 g of EG, 38.8 g of HG, 36.8 g of BCS, 21.7 g of TEOS and 10.6 g of GPS were placed and stirred for 30 minutes at room temperature to obtain A1 solution.

4.7 g of TIPT as a titanium alkoxide was added to a flask having a capacity of 300 ml, to which 58.2 g of HG was added, followed by stirring at room temperature for 30 minutes to obtain an A2 solution.

Subsequently, the A1 solution and the A2 solution were mixed and stirred at room temperature for 30 minutes. Thus, a coating composition K1 was obtained.

&Lt; Synthesis Example 2 &gt; (Synthesis of Coating Composition K2)

In a 200 ml flask, 12.7 g of AN and 3.0 g of water were added and stirred to dissolve the AN. 13.7 g of EG, 39.2 g of HG, 37.3 g of BCS, 21.7 g of TEOS and 8.8 g of MPS were added and stirred for 30 minutes at room temperature to obtain solution B1.

4.7 g of TIPT as a titanium alkoxide was placed in a flask having a capacity of 300 ml, 58.9 g of HG was added thereto, and the mixture was stirred for 30 minutes at room temperature to obtain a B2 solution.

Subsequently, the B1 solution and the B2 solution were mixed and stirred at room temperature for 30 minutes. Thus, a coating composition K2 was obtained.

&Lt; Synthesis Example 3 &gt; (Synthesis of Coating Composition K3)

In a 200 ml flask, 12.7 g of AN and 3.0 g of water were added and stirred to dissolve the AN. 13.6 g of EG, 38.8 g of HG, 36.9 g of BCS, 21.7 g of TEOS and 10.5 g of ACPS were added and stirred for 30 minutes at room temperature to obtain a C1 solution.

4.7 g of TIPT as a titanium alkoxide was added to a flask having a capacity of 300 ml, to which 58.2 g of HG was added, followed by stirring at room temperature for 30 minutes to obtain a C2 solution.

Subsequently, the C1 solution and the C2 solution described above were mixed and stirred for 30 minutes at room temperature. Thus, a coating composition K3 was obtained.

&Lt; Synthesis Example 4 &gt; (Synthesis of Coating Composition K4)

In a 200 ml flask, 12.7 g of AN and 3.0 g of water were added and stirred to dissolve the AN. 13.5 g of EG, 38.6 g of HG, 36.7 g of BCS, 21.7 g of TEOS and 11.1 g of MPMS were added and stirred for 30 minutes at room temperature to obtain a D1 solution.

4.7 g of TIPT and 57.9 g of HG were placed in a 300 ml flask, and stirred at room temperature for 30 minutes to obtain a D2 solution.

Subsequently, the above-mentioned D1 solution and D2 solution were mixed and stirred for 30 minutes at room temperature. Thus, a coating composition K4 was obtained.

&Lt; Synthesis Example 5 &gt; (Synthesis of Coating Composition K5)

In a 200 ml flask, 12.7 g of AN and 3.0 g of water were added and stirred to dissolve the AN. 13.9 g of EG, 39.7 g of HG, 37.7 g of BCS, 15.5 g of TEOS and 13.3 g of MTES were added and stirred for 30 minutes at room temperature to obtain an E1 solution.

4.7 g of TIPT and 59.5 g of HG were placed in a 300 ml flask and stirred at room temperature for 30 minutes to obtain an E2 solution.

Subsequently, the above-mentioned E1 solution and E2 solution were mixed and stirred at room temperature for 30 minutes. Thus, a coating composition K5 was obtained.

&Lt; Synthesis Example 6 &gt; (Synthesis of Coating Composition K6)

In a 200 ml flask, 12.7 g of AN and 3.0 g of water were added and stirred to dissolve the AN. 13.4 g of EG, 38.3 g of HG, 36.4 g of BCS, 21.7 g of TEOS, 9.3 g of MPMS and 3.1 g of C18 were added and stirred for 30 minutes at room temperature to obtain a F1 solution.

4.7 g of TIPT and 57.4 g of HG were placed in a 300 ml flask, and stirred at room temperature for 30 minutes to obtain an F2 solution.

Subsequently, the above-mentioned F1 solution and F2 solution were mixed and stirred at room temperature for 30 minutes. Thus, a coating composition K6 was obtained.

&Lt; Synthesis Example 7 &gt; (Synthesis of Coating Composition K7)

In a 200 ml flask, 12.7 g of AN and 3.0 g of water were added and stirred to dissolve the AN. 13.5 g of EG, 38.6 g of HG, 36.7 g of BCS, 15.5 g of TEOS, 1.7 g of APS, 6.7 g of ACPS and 8.8 g of GPS were added and stirred for 30 minutes at room temperature to obtain a G1 solution.

4.7 g of TIPT and 57.9 g of HG were placed in a 300 ml flask, and stirred at room temperature for 30 minutes to obtain a G2 solution.

Subsequently, the G1 liquid and the G2 liquid described above were mixed and stirred for 30 minutes at room temperature. Thus, a coating composition K7 was obtained.

Synthesis Example 8 (Synthesis of Coating Composition K8)

In a 200 ml flask, 12.7 g of AN and 3.0 g of water were added and stirred to dissolve the AN. 13.5 g of EG, 38.5 g of HG, 36.6 g of BCS, 15.5 g of TEOS, 1.5 g of MPS, 10.5 g of ACPS and 5.9 g of UPS were charged and stirred for 30 minutes at room temperature to obtain H1 solution.

4.7 g of TIPT and 57.7 g of HG were placed in a 300 ml flask, and stirred at room temperature for 30 minutes to obtain an H2 solution.

Subsequently, the H1 solution and the H2 solution were mixed and stirred at room temperature for 30 minutes. Thus, a coating composition K8 was obtained.

Synthesis Example 9 (Synthesis of Coating Composition K9)

In a 200 ml flask, 13.1 g of AN and 3.1 g of water were added and stirred to dissolve the AN. 13.3 g of EG, 95.2 g of HG, 36.2 g of BCS, 16.3 g of TEOS and 22.8 g of MPMS were added and stirred for 30 minutes at room temperature. Thus, a coating composition K9 was obtained.

&Lt; Synthesis Example 10 &gt; (Synthesis of Coating Composition K10)

In a 200 ml flask, 12.1 g of AN and 2.8 g of water were added and stirred to dissolve the AN. 13.5 g of EG, 56.7 g of HG, 36.8 g of BCS, 13.7 g of TEOS and 10.9 g of MPMS were added and stirred for 30 minutes at room temperature to obtain an I1 solution.

13.4 g of TIPT and 40.1 g of HG were placed in a 300 ml flask, and stirred at room temperature for 30 minutes to obtain an I2 solution.

Subsequently, the above-mentioned I1 solution and I2 solution were mixed and stirred at room temperature for 30 minutes. Thus, a coating composition K10 was obtained.

Synthesis Example 11 (Synthesis of Coating Composition K11)

11.8 g of AN and 2.8 g of water were added to a 200 ml flask and stirred to dissolve the AN. 13.6 g of EG, 44.8 g of HG, 36.8 g of BCS, 10.5 g of TEOS and 10.3 g of MPMS were added and stirred for 30 minutes at room temperature to obtain a J1 solution.

17.4 g of TIPT and 52.1 g of HG were added to a 300 ml flask and stirred at room temperature for 30 minutes to obtain a J2 solution.

Subsequently, the J1 solution and J2 solution described above were mixed and stirred for 30 minutes at room temperature. Thus, a coating composition K11 was obtained.

Synthesis Example 12 (Synthesis of Coating Composition K12)

In a 200 ml flask, 11.5 g of AN and 2.7 g of water were added and stirred to dissolve the AN. 13.6 g of EG, 33.5 g of HG, 36.9 g of BCS, 7.2 g of TEOS and 10.0 g of MPMS were added and stirred for 30 minutes at room temperature to obtain L1 solution.

21.2 g of TIPT and 63.6 g of HG were added to a 300 ml flask, and stirred at room temperature for 30 minutes to obtain an L2 solution.

Subsequently, the L1 solution and the L2 solution described above were mixed and stirred for 30 minutes at room temperature. Thus, a coating composition K12 was obtained.

&Lt; Synthesis Example 13 &gt; (Synthesis of Coating Composition K13)

In a 200 ml flask, 12.7 g of AN and 3.0 g of water were added and stirred to dissolve the AN. 13.7 g of EG, 39.1 g of HG, 37.1 g of BCS and 31.1 g of TEOS were added and stirred for 30 minutes at room temperature to obtain a M1 solution.

4.7 g of TIPT and 58.6 g of HG were placed in a 300 ml flask, and stirred at room temperature for 30 minutes to obtain an M2 solution.

Subsequently, the M1 solution and the M2 solution were mixed and stirred at room temperature for 30 minutes. Thus, a coating composition K13 was obtained. The coating composition K13 contains no metal alkoxide having the structure represented by the above-mentioned general formula (II).

&Lt; Synthesis Example 14 &gt; (Synthesis of Coating Composition K14)

In a 200 ml flask, 12.7 g of AN and 3.0 g of water were added and stirred to dissolve the AN. 13.7 g of EG, 39.2 g of HG, 37.3 g of BCS, 28.0 g of TEOS and 2.7 g of MTES were added and stirred for 30 minutes at room temperature to obtain N1 solution.

4.7 g of TIPT and 58.8 g of HG were placed in a 300 ml flask, and stirred at room temperature for 30 minutes to obtain a N2 solution.

Subsequently, the N1 solution and the N2 solution were mixed and stirred at room temperature for 30 minutes. Thus, a coating composition K14 was obtained.

The coating composition K13 contains only a small amount of the metal alkoxide having the structure represented by the general formula (II) described above in comparison with the coating compositions K1 to K12 of the above-mentioned Synthesis Examples 1 to 12. [

&Lt; Synthesis Example 15 &gt; (Synthesis of Coating Composition K15)

In a 200 ml flask, 12.7 g of AN and 3.0 g of water were added and stirred to dissolve the AN. 145.6 g of IPA, 15.5 g of TEOS, 18.5 g of MPMS and 4.7 g of TIPT were added thereto, followed by stirring at room temperature for 30 minutes. Thus, a coating composition K15 was obtained.

<Evaluation of stability>

The coating compositions K1 to K12 and K15 were evaluated for stability as Examples 1 to 12 and Comparative Example 1, respectively, on the coating composition according to the above-mentioned Synthesis Example.

In the evaluation of the stability, the coating compositions (K1 to K12 and K15) synthesized were pressure-filtered through a membrane filter having a pore diameter of 0.5 micrometer, and left at room temperature for one week. Subsequently, when the film was formed by spin coating on the silicon substrate 100, it was evaluated that the foreign substance was not observed on the coated film on the silicon substrate, and that the foreign substance was observed. Table 1 shows the above evaluation results.

<Film Formation Method of Coat Film I>

Using the coating composition according to the above-described synthesis example, the mixture was pressure-filtered through a membrane filter having a pore diameter of 0.5 mu m, and a coating film was formed on the substrate by spin coating. The substrate is heated on a hot plate set at 60 DEG C for 3 minutes to be dried. Subsequently, ultraviolet rays were irradiated for 2 minutes at a light intensity of 50 mW / cm 2 (converted to a wavelength of 365 nm) using a high pressure mercury lamp (input power: 1000 W) using an ultraviolet irradiation apparatus (UB011-3A type manufactured by Eye Graphics Co., . The ultraviolet irradiation dose is 6000 mJ / cm 2. After irradiating ultraviolet rays, they are transferred into a hot air circulating oven set at 250 캜 and baked for 30 minutes. Thus, a coat film is formed on the substrate.

<Film Formation Method of Coat Film II>

Using the coating composition according to the above-described synthesis example, the mixture was pressure-filtered through a membrane filter having a pore diameter of 0.5 mu m, and a coating film was formed on the substrate by spin coating. The substrate is heated on a hot plate set at 60 DEG C for 3 minutes to be dried. Then, it is transferred into a hot air circulating oven set at 250 캜 and baked for 30 minutes. Thus, a coat film is formed on the substrate.

The method of forming the coat film of this embodiment using the coating composition of this embodiment has been described above. Next, the evaluation of the coat film of this embodiment will be described. At this time, coat films (KL1 to KL8) formed by the above-mentioned film forming method I were coated on the appropriate substrates using the coating compositions K1 to K8 according to the above-mentioned synthesis examples, Example 20. Coat films (KL9 to KL12) formed by the above-mentioned film forming method II on a suitable substrate using the coating compositions K9 to K12 according to the above-described synthesis examples were applied to Examples 21 to 24 . Using the coating composition K13 according to the above-described synthesis example, the coat film (KM2) formed by the above film forming method II is used as a coat film comparative example 2 on a suitable substrate.

<Evaluation of Refractive Index>

A silicon substrate 100 was used as a substrate. As described above, the coat films of Examples 13 to 20 formed by the film forming method I, the coat films of Examples 21 to 24 formed by the film forming method II, A coat film of Comparative Example 2 and Comparative Example 3 formed by the method II was formed, and the refractive index was evaluated. The evaluation was carried out by measuring the refractive index at a wavelength of 633 nm by using an ellipsometer (DVG-FLVW, manufactured by Mizogiri Optical Industries, Ltd.).

The evaluation results of the respective coat films are shown in the following Table 2 together with the coating composition used for forming each coat film.

<Crack evaluation>

On the glass substrate, an acrylic film having a thickness of 2 mu m was formed. The formation of the acrylic film was carried out as follows. First, the acrylic material composition was pressure filtered through a membrane filter having a pore diameter of 0.5 mu m, and a coating film was formed on the entire surface of the glass substrate by a spin coat method. Subsequently, the substrate was heated and dried on a hot plate for 2 minutes, transferred into a hot air circulating oven, and baked for 30 minutes. Thereby, an acrylic film was formed on the glass substrate.

A coat film having a thickness of 100 nm is formed on the acrylic film by Film Formation Method I or Film Formation Method II.

On the glass substrate on which the acrylic film was formed, the coat films of Examples 13 to 20 formed by Film Formation Method I, the coat films of Examples 21 to 24 formed by Film Formation Method II, the coat films of Examples 21 to 24 To form a coat film of Comparative Example 2, and the cracks of the coat film were evaluated.

As evaluation criteria for crack evaluation, evaluation was made as to whether the cracks did not occur in the coat film on the substrate, and that cracks were generated only in the edge but not in the surface, Was evaluated as x evaluation.

As a result of the evaluation, it was found that the coat films of Examples 13 to 24 showed improvement in occurrence of cracks as compared with the coat film of Comparative Example 2.

&Lt; Transparent conductive film substrate &

A transparent conductive film substrate on which a patterned transparent conductive film is formed on a substrate is prepared. A glass substrate is used for the substrate, and ITO is used for the transparent conductive film. As the transparent conductive film substrate, the transparent conductive film substrate 14 used for the touch panel 1 of the present invention described above can be used. Here, the film thickness of ITO was set to 28 nm.

&Lt; Fabrication of touch panel &

A substrate having a film thickness of 100 nm of the coat film KL8 of Example 20 was formed on the transparent conductive film substrate having the ITO film thickness of 28 nm. An ultraviolet ray irradiation apparatus (UB011-3A type manufactured by Eye Graphics Co., Ltd.) was used, and a high-pressure mercury lamp (input power: 1000 W) was irradiated with ultraviolet rays, Was irradiated with ultraviolet rays for 80 seconds at a light intensity of 50 mW / cm 2 (in terms of a wavelength of 365 nm). Thus, the optical adhesive was cured to produce the touch panel of Example 25 as a touch panel for property evaluation.

Next, a touch panel of Example 26 was manufactured by the same manufacturing method as above except that the coat film KL10 of Example 22 was used in place of KL8 of Example 20 as a coat film. A touch panel of Example 27 was produced by the same method as described above except that the coat film KL11 of Example 23 was used in place of KL8 of Example 20 as the coat film. Further, the touch panel of Example 28 was manufactured by the same manufacturing method as above except that the coat film KL12 of Example 24 was used in place of KL8 of Example 20 as the coat film.

Further, a coating film was formed on the above-mentioned transparent conductive film substrate by the above-mentioned film forming method I using the coating composition K12, and in the same manner as in the case of the above-mentioned Example 25, the touch panel of Example 29 was manufactured Respectively. The refractive index measured by the same evaluation method as above was 1.70 for the coat film formed by the film forming method I using the coating composition K12.

A touch panel of Comparative Example 3 was manufactured by the same method as described above, except that the coat film KM2 of Comparative Example 2 was used instead of KL8 of Example 20 as the coat film for comparison evaluation. Further, the above-mentioned transparent conductive film substrate was used to manufacture the touch panel of Comparative Example 4 except that no coat film was formed, and the same manufacturing method as that described above was performed. Therefore, in the touch panel for evaluation in Comparative Example 4, no coat film was formed on the transparent electrode.

&Lt; Evaluation of electrode pattern exposure &gt;

Exposure evaluation of the electrode patterns for evaluating whether or not the electrode patterns of ITO are conspicuous was carried out by using the evaluation touch panels of Examples 25 to 29 and Comparative Examples 3 and 4.

As an evaluation method, each touch panel was placed on a black cloth, and light was observed from the top, and observation was performed with the naked eye. Then, in the touch panel of Comparative Example 4, after confirming that the transparent electrode pattern is visible, another touch panel is observed. As a result of the observation, it was evaluated that the transparent electrode pattern was not observed. It was evaluated that the transparent electrode pattern was seen but the degree of improvement was improved compared with the touch panel of Comparative Example 4 having no coating film.

The electrode pattern exposure evaluation results of the touch panels for evaluation of Examples 25 to 29 and Comparative Examples 3 and 4 are summarized in Table 3.

As a result of the above evaluation, it was found from Table 1 that the stability of the coating composition is improved by containing the metal nitrate salt and the precipitation inhibitor.

It can be seen from Table 2 that the coat film formed with the metal alkoxide contained in the coating composition can be formed into a stable film that does not crack even on the organic thin film made of acrylic resin or the like by appropriately controlling the structure and composition of the metal alkoxide contained in the coating composition.

It can be seen from Table 3 that the exposure of the electrode pattern can be suppressed in the touch panel by forming a coat film having a refractive index appropriately controlled on the electrode.

The coat film of the present embodiment all exhibits a hardness of 5H or more, which is a remarkably high hardness as compared with that of a general organic acrylic material of less than 3H.

Industrial availability

The coating composition of the present invention can provide a high-strength coated film having a controlled refractive index, and in the touch panel using the coated film, the pattern of the electrode is not conspicuous. Therefore, the present invention is useful as a touch panel for a display device which requires excellent appearance and high reliability.

The entire contents of the specification, claims, drawings and summary of Japanese Patent Application No. 2011-010164 filed on January 20, 2011 are hereby incorporated herein by reference as the disclosure of the specification of the present invention.

1, 101, 201: Touch panel
2, 102, 202: substrate
3, 103 and 203: a first transparent electrode
4, 104 and 204: a second transparent electrode
5, 6, 105, 106, 205, 206: coat film
9, 108, 208, 209: adhesive layer
10, 110, 210: display panel
11: Extraction wiring
14: transparent conductive film substrate
18: intersection
19: Interlayer insulating film
20: Cross-linking electrode
21: pad portion
30: Touch panel substrate
107: Overcoat layer
207: Cover film

Claims (12)

A metal alkoxide represented by the following general formula (I), a second metal alkoxide represented by the following general formula (II), a metal salt represented by the following general formula (III), an organic solvent, water and a precipitation inhibitor Wherein the coating composition is a coating composition for a touch panel.
M ¹ (OR ¹ ) _n (I)
Wherein M ¹ is at least ^one element selected from the group consisting of silicon (Si), titanium (Ti), tantalum (Ta), zirconium (Zr), boron (B), aluminum (Al), magnesium (Mg) R ¹ represents an alkyl group having 1 to 5 carbon atoms, and n represents an integer of 2 to 5 in M ¹ )
R ² _l M ² (OR ³ ) _ml (II)
Wherein M ² is at least one selected from the group consisting of silicon (Si), titanium (Ti), tantalum (Ta), zirconium (Zr), boron (B), aluminum (Al), magnesium (Mg) R ² may be a hydrogen atom or a fluorine atom, and may be a halogen atom, a vinyl group, a glycidoxy group, a mercapto group, a methacryloxy group, an acryloxy group, an isocyanate group, R ³ represents an alkyl group having 1 to 5 carbon atoms, m represents a valence of 2 to 5 in M ² , and R ³ represents an alkyl group having 1 to 5 carbon atoms, which may have a heteroatom , 1 is 1 or 2 when the valence of m is 3, 1 to 3 when the valence of m is 4, and 1 to 4 when the valence of m is 5)
M ³ (X) _k (III)
Wherein M ³ is at least one element selected from the group consisting of aluminum (Al), indium (In), zinc (Zn), zirconium (Zr), bismuth (Bi), lanthanum (La), tantalum (Ta), yttrium X represents at least one metal selected from the group consisting of hydrochloric acid, nitric acid, sulfuric acid, acetic acid, oxalic acid, sulfamic acid, sulfonic acid, acetoacetic acid or acetylacetonate or a basic salt thereof; ³ &lt; / RTI &gt; The method according to claim 1,
The content of the second metal alkoxide is 15 mol% or more with respect to the total metal alkoxide including the first metal alkoxide and the second metal alkoxide. The method according to claim 1,
The precipitation inhibitor is at least one or more selected from the group consisting of N-methyl-pyrrolidone, ethylene glycol, dimethylformamide, dimethylacetamide, diethylene glycol, propylene glycol, hexylene glycol and derivatives thereof. The method according to claim 1,
The molar ratio of the metal atom (M ³ ) of the metal salt to the metal atom (M ¹ and M ² ) of the first metal alkoxide and the second metal alkoxide is,
0.01? M ³ / (M ¹ + M ² + M ³ )? 0.7
By weight based on the total weight of the coating composition. The method according to claim 1,
Wherein the first metal alkoxide is a mixture of a silicon alkoxide or a partial condensate thereof and a titanium alkoxide. The method according to claim 1,
Wherein the metal salt is a metal nitrate salt, a metal sulfate salt, a metal acetate salt, a metal chloride salt, a metal oxalate salt, a metal sulfamate salt, a metal sulfonate salt, a metal acetoacetate salt, a metal acetylacetonate or a basic salt thereof. The method according to claim 1,
Wherein the organic solvent comprises an alkylene glycol or a monoether derivative thereof. A coated film formed by using the coating composition for a touch panel according to any one of claims 1 to 7. 9. The method of claim 8,
A refractive index of 1.52 to 1.70, and a film thickness of 40 nm to 170 nm. A touch panel in which a transparent electrode pattern is formed in an operation region of a substrate, wherein a coat film according to claim 8 is disposed on at least a part of the transparent electrode pattern. 11. The method of claim 10,
Wherein the transparent electrode pattern comprises a first transparent electrode pattern for detecting positions in at least two different directions, and a second transparent electrode pattern,
At least a part of the first transparent electrode pattern and the second transparent electrode pattern are overlapped in the operation region of the substrate and the first transparent electrode pattern and the second transparent electrode pattern of the overlapping portion overlap each other with an organic material Is disposed,
And the coating film is configured to cover at least a part of the film made of the organic material together with at least a part of the first transparent electrode pattern or the second transparent electrode pattern. 12. The method of claim 11,
Wherein a portion where the first transparent electrode pattern overlaps with the second transparent electrode pattern has a plurality of portions in an operation region of the substrate and in each of the plurality of overlapping portions, Wherein a film made of the organic material is disposed.

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