TWI599624B - A method for producing a finely-coated inorganic oxide film-forming coating solution and a fine inorganic oxide film - Google Patents

A method for producing a finely-coated inorganic oxide film-forming coating solution and a fine inorganic oxide film Download PDF

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TWI599624B
TWI599624B TW102135841A TW102135841A TWI599624B TW I599624 B TWI599624 B TW I599624B TW 102135841 A TW102135841 A TW 102135841A TW 102135841 A TW102135841 A TW 102135841A TW I599624 B TWI599624 B TW I599624B
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oxide film
metal
metal oxide
forming
coating liquid
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TW201439234A (en
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Kazuki Eguchi
Kenichi Motoyama
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Nissan Chemical Ind Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/02Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances
    • H01B3/10Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances metallic oxides
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
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    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208Oxides, e.g. ceramics
    • C23C18/1216Metal oxides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1229Composition of the substrate
    • C23C18/1245Inorganic substrates other than metallic
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125Process of deposition of the inorganic material
    • C23C18/1283Control of temperature, e.g. gradual temperature increase, modulation of temperature
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/14Decomposition by irradiation, e.g. photolysis, particle radiation or by mixed irradiation sources

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Description

可微細塗佈的無機氧化物被膜形成用塗佈液及微細無機氧化物被膜之製造方法 Coating liquid for forming inorganic oxide film which can be finely applied, and method for producing fine inorganic oxide film

本發明係關於一種用於以微細液滴吐出裝置所進行的塗佈之金屬氧化物被膜形成用塗佈液,使用此塗佈液所得之金屬氧化物被膜、及該金屬氧化物被膜之製造方法。 The present invention relates to a coating liquid for forming a metal oxide film to be applied by a fine droplet discharge device, a metal oxide film obtained by using the coating liquid, and a method for producing the metal oxide film .

近年來,智慧型手機的普及,並且行動電話的顯示畫面趨大型化。因此,能夠利用顯示器之顯示的輸入操作之觸控面板的開發逐漸盛行。若依據觸控面板,則不需按壓式的開關等之輸入手段,因此,謀求顯示畫面之大型化。 In recent years, the popularity of smart phones has increased, and the display screen of mobile phones has become larger. Therefore, the development of a touch panel capable of utilizing the input operation of the display of the display has become popular. According to the touch panel, an input means such as a push switch is not required, and therefore, the display screen is enlarged.

觸控面板,係將手指或觸控筆等所接觸的操作區域之接觸位置進行檢測。利用此功能,觸控面板係作為輸入裝置使用。關於接觸位置的檢測方式,係有電阻膜方式或靜電容量方式等。電阻膜方式係使用相對向的2片基板,相對於此,靜電容量方式係可將所使用的基板設為1片。因而,若依據靜電容量方式,則可構成薄型之觸控面板,而 適於攜帶機器等,因此,近年來熱烈開發推展。 The touch panel detects a contact position of an operation area that is touched by a finger or a stylus pen. With this function, the touch panel is used as an input device. The detection method of the contact position is a resistive film method or a capacitance method. In the resistive film method, two substrates facing each other are used. On the other hand, in the capacitance mode, one substrate can be used. Therefore, according to the electrostatic capacitance method, a thin touch panel can be constructed, and It is suitable for carrying machines, etc., so it has been enthusiastically developed in recent years.

觸控面板,係內建於液晶顯示裝置等之顯示 裝置中,作為能夠檢測觸控位置之附觸控面板功能的顯示裝置使用。操作顯示面板者,由於透過觸控面板來視認顯示裝置,因此於透明電極係使用光之穿透特性優異的構件。例如,使用ITO(Indium Tin Oxide)等之無機材料。此外,層間絕緣膜方面,係使用能夠圖型化,且絕緣性之丙烯酸材料等。 Touch panel, built in display of liquid crystal display device, etc. The device is used as a display device with a touch panel function capable of detecting a touch position. When the display panel is operated, since the display device is viewed through the touch panel, a member having excellent light transmission characteristics is used for the transparent electrode. For example, an inorganic material such as ITO (Indium Tin Oxide) is used. Further, in the case of the interlayer insulating film, an acrylic material which can be patterned and insulative is used.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利第2881847號公報 [Patent Document 1] Japanese Patent No. 2881847

於靜電容量方式之觸控面板的情況中,係需要X軸方向和與X軸方向垂直的Y軸方向之2方向的電極,檢測手指接觸時之靜電容量的變化,藉此而檢測其座標,以辨識觸控位置或觸控動作。此時,在X軸方向的電極、與Y軸方向的電極重疊之部位,為了防止位置檢測錯誤動作,藉由採用將X軸方向的電極與Y軸方向的電極間絕緣之橋接結構(bridge structure)而使其交叉。 In the case of a capacitive touch panel, an electrode in two directions of the X-axis direction and the Y-axis direction perpendicular to the X-axis direction is required, and the change in electrostatic capacitance at the time of finger contact is detected, thereby detecting the coordinates. To identify the touch position or touch action. In this case, a bridge structure in which the electrode in the X-axis direction and the electrode in the Y-axis direction overlap each other to prevent the position detection from being erroneously operated by insulating the electrode in the X-axis direction from the electrode in the Y-axis direction (bridge structure) ) and make it cross.

於此橋接結構的部分所使用之絕緣膜(以下,亦將在此所使用的絕緣膜稱為電極交叉部微細絕緣層 (0C1)),一般使用有機之丙烯酸樹脂。但,將有機樹脂使用於橋接結構的部分之絕緣膜,且將無機材料之層間絕緣膜使用於上層時,藉由有機樹脂之熱伸縮性,會導致無機之層間絕緣膜產生龜裂。此外,由有機樹脂製成橋接結構時,由於具有一度在基板全面製膜之後,將該被膜的大部分去除之步驟,因此就製造效率的觀點而言會有問題。 An insulating film used in a portion of the bridge structure (hereinafter, the insulating film used herein is also referred to as an electrode insulating portion fine insulating layer) (0C1)), an organic acrylic resin is generally used. However, when an organic resin is used for the insulating film of a portion of the bridge structure and an interlayer insulating film of an inorganic material is used for the upper layer, the inorganic interlayer insulating film is cracked by the thermal stretchability of the organic resin. Further, when the bridging structure is made of an organic resin, there is a problem that the majority of the film is removed after the entire film is formed on the substrate, and thus there is a problem in terms of manufacturing efficiency.

如此之狀況中,針對將無機材料作為成分之金屬氧化物被膜進行探討。將無機材料作為成分之膜的情況中,一般係硬度為高,作為觸控面板的電極保護膜可期待高信賴性。此外,藉由使橋接部分之絕緣膜為無機材料,即使將無機材料適用於上層時,亦可防止龜裂產生。但,於將無機材料作為成分之金屬氧化物被膜中,以上述之圖型化所進行之製膜係有困難。 In such a case, a metal oxide film containing an inorganic material as a component is discussed. In the case of a film having an inorganic material as a component, the hardness is generally high, and high reliability can be expected as an electrode protective film for a touch panel. Further, by making the insulating film of the bridge portion an inorganic material, cracking can be prevented even when an inorganic material is applied to the upper layer. However, in the metal oxide film containing an inorganic material as a component, it is difficult to form a film by the above-described patterning.

因此,雖提案、探討有為了僅於透明電極間之橋接的部分形成金屬氧化物被膜,而使用有噴墨塗佈裝置、噴嘴分配塗佈裝置等之微細液滴吐出裝置的Dot塗佈,但於現行之金屬氧化物被膜形成用塗佈液中,由於在基板著液之後的液滴大小、浸潤性之控制困難,故難以形成微細的圖型。 Therefore, it is proposed to use a Dot coating of a fine droplet discharge device such as an inkjet coating device or a nozzle dispensing device, in order to form a metal oxide film only in a portion where the bridge between the transparent electrodes is formed. In the coating liquid for forming a metal oxide film, the control of the droplet size and the wettability after the substrate is immersed is difficult, so that it is difficult to form a fine pattern.

本發明係鑑於如此之觀點而完成者。亦即,本發明之目的,係提供一種適於形成使用微細液滴吐出裝置之微細的金屬氧化物被膜之金屬氧化物被膜形成用塗佈液。此外,提供一種以如此之方法所形成,且信賴性優異 之金屬氧化物被膜、及使用有噴嘴分配器的金屬氧化物被膜之形成方法。 The present invention has been completed in view of such a viewpoint. In other words, it is an object of the present invention to provide a coating liquid for forming a metal oxide film which is suitable for forming a fine metal oxide film using a fine droplet discharge device. In addition, it provides a method that is formed in such a way and has excellent reliability. A method of forming a metal oxide film and a metal oxide film using a nozzle dispenser.

本發明係為了達成上述之目的者,且以下述內容為要旨。 The present invention has been made in order to achieve the above objects, and the following matters are intended.

(1)一種金屬氧化物被膜形成用塗佈液,其係使用於以微細液滴吐出裝置所進行的塗佈,其特徵為含有以下述一般式(I)所表示之金屬烷氧化物、以下一般式(II)所表示之金屬鹽、有機溶劑、水、以及析出抑制劑,於全部有機溶劑中含有30質量%以上由乙二醇、丙二醇、1,2-丁二醇、1,3-丁二醇、1,4-丁二醇、1,2-戊二醇、1,3-戊二醇、1,4-戊二醇、1,5-戊二醇、2,4-戊二醇、2,5-己二醇、二乙二醇、二丙二醇、三乙二醇、及N-甲基吡咯啶酮所成之群中選出的至少1種,且表面張力為28mN/m以上。 (1) A coating liquid for forming a metal oxide film, which is used for coating by a fine droplet discharge device, and is characterized by containing a metal alkoxide represented by the following general formula (I), and the following The metal salt, the organic solvent, the water, and the precipitation inhibitor represented by the general formula (II) contain 30% by mass or more of ethylene glycol, propylene glycol, 1,2-butanediol, and 1,3- in all organic solvents. Butylene glycol, 1,4-butanediol, 1,2-pentanediol, 1,3-pentanediol, 1,4-pentanediol, 1,5-pentanediol, 2,4-pentane At least one selected from the group consisting of alcohol, 2,5-hexanediol, diethylene glycol, dipropylene glycol, triethylene glycol, and N-methylpyrrolidone, and having a surface tension of 28 mN/m or more .

M1(OR1)n (I)(M1係表示由矽、鈦、鉭、鋯、硼、鋁、鎂及鋅所成之群中選出的至少1種之金屬;R1係表示碳數1~5之烷基或乙醯氧基;n係表示2~5之整數)。 M 1 (OR 1 ) n (I) (M 1 represents at least one metal selected from the group consisting of ruthenium, titanium, osmium, zirconium, boron, aluminum, magnesium, and zinc; and R 1 represents a carbon number 1 to 5 alkyl or ethoxylated; n is an integer from 2 to 5.)

M2(X)k (II)(M2係表示由鋁、銦、鋅、鋯、鉍、鑭、鉭、釔及鈰所成之群中選出的至少1種之金屬;X係表示鹽酸、硝酸、硫酸、乙酸、草酸、胺磺酸、磺酸、乙醯乙酸或乙醯丙酮 酸之殘基、或者此等之鹼性鹽;k係表示M2之價數)。 M 2 (X) k (II) (M 2 represents at least one metal selected from the group consisting of aluminum, indium, zinc, zirconium, hafnium, tantalum, niobium, tantalum and niobium; X system represents hydrochloric acid, A residue of nitric acid, sulfuric acid, acetic acid, oxalic acid, aminesulfonic acid, sulfonic acid, acetoacetic acid or acetylpyruvate, or a basic salt thereof; k is a valence of M 2 ).

(2)如上述(1)所記載之金屬氧化物被膜形成用塗佈液,其係進一步含有以下述一般式(III)所表示之第2金屬烷氧化物,R2 1M3(OR3)m-1 (III)(M3係表示由矽、鈦、鉭、鋯、硼、鋁、鎂及鋅所成之群中選出的至少1種之金屬;R2係表示氫原子或氟原子,或者可以鹵原子、乙烯基、環氧丙氧基、巰基、甲基丙烯醯氧基、丙烯醯氧基、異氰酸酯基、胺基或脲基取代,且可具有雜原子的碳數1~20之烴基;R3係表示碳數1~5之烷基;m係表示2~5之整數;1係當m為3時為1或2,當m為4時為1~3之整數,當m為5時為1~4之整數)。 (2) The coating liquid for forming a metal oxide film according to the above (1), further comprising a second metal alkoxide represented by the following general formula (III), R 2 1 M 3 (OR 3 M-1 (III) (M 3 represents at least one metal selected from the group consisting of ruthenium, titanium, osmium, zirconium, boron, aluminum, magnesium, and zinc; and R 2 represents a hydrogen atom or a fluorine atom) Or may be substituted with a halogen atom, a vinyl group, a glycidoxy group, a decyl group, a methacryloxy group, an acryloxy group, an isocyanate group, an amine group or a urea group, and may have a carbon number of 1 to 20 of a hetero atom. a hydrocarbon group; R 3 represents an alkyl group having 1 to 5 carbon atoms; m represents an integer of 2 to 5; 1 is 1 or 2 when m is 3, and an integer of 1 to 3 when m is 4; When m is 5, it is an integer of 1 to 4).

(3)如上述(2)所記載之金屬氧化物被膜形成用塗佈液,其中前述第2金屬烷氧化物的含量,相對於全部金屬烷氧化物為15莫耳%以上。 (3) The coating liquid for forming a metal oxide film according to the above (2), wherein the content of the second metal alkoxide is 15 mol% or more based on the total metal alkoxide.

(4)如上述(1)~(3)中任1項所記載之金屬氧化物被膜形成用塗佈液,其中前述析出抑制劑係由N-甲基-吡咯啶酮、乙二醇、二甲基甲醯胺、二甲基乙醯胺、二乙二醇、丙二醇、己二醇及此等之衍生物所成之群中選出的至少1種以上之物質。 (4) The coating liquid for forming a metal oxide film according to any one of the above aspects, wherein the precipitation inhibitor is N-methyl-pyrrolidone, ethylene glycol, or the like. At least one selected from the group consisting of methylformamide, dimethylacetamide, diethylene glycol, propylene glycol, hexanediol, and derivatives thereof.

(5)如上述(1)~(4)中任1項所記載之金屬氧化物被膜形成用塗佈液,其中金屬鹽之金屬原子(M2)、與金屬烷氧化物之金屬原子之合計(M)之莫耳比為0.01 ≦M2/M≦0.7。 (5) The coating liquid for forming a metal oxide film according to any one of the above (1), wherein the metal atom (M 2 ) of the metal salt and the metal atom of the metal alkoxide are combined. The molar ratio of (M) is 0.01 ≦M 2 /M≦0.7.

(6)如上述(1)~(5)中任1項所記載之金屬氧化物被膜形成用塗佈液,其中第1金屬烷氧化物係矽烷氧化物或其部分縮合物、與鈦烷氧化物之混合物。 (6) The coating liquid for forming a metal oxide film according to any one of the above-mentioned, wherein the first metal alkoxide-based decane oxide or a partial condensate thereof and the titanium alkoxide are oxidized. a mixture of things.

(7)如上述(1)~(6)中任1項所記載之金屬氧化物被膜形成用塗佈液,其中金屬鹽係金屬硝酸鹽、金屬硫酸鹽、金屬乙酸鹽、金屬氯化物、金屬草酸鹽、金屬胺磺酸鹽、金屬磺酸鹽、金屬乙醯乙酸鹽、金屬乙醯丙酮酸或此等之鹼性鹽。 (7) The coating liquid for forming a metal oxide film according to any one of the above-mentioned items, wherein the metal salt is a metal nitrate, a metal sulfate, a metal acetate, a metal chloride or a metal. An oxalate, a metal amine sulfonate, a metal sulfonate, a metal acetoacetate, a metal acetoacetate or an alkaline salt thereof.

(8)如上述(1)~(7)中任1項所記載之金屬氧化物被膜形成用塗佈液,其中第1金屬烷氧化物係矽烷氧化物或其部分縮合物、與鈦烷氧化物之混合物,有機溶劑係包含烷二醇類或其之單醚衍生物。 The coating liquid for forming a metal oxide film according to any one of the above-mentioned, wherein the first metal alkoxide-based decane oxide or a partial condensate thereof and the titanium alkane are oxidized. A mixture of substances, the organic solvent comprising an alkanediol or a monoether derivative thereof.

(9)一種金屬氧化物被膜,其係將如上述(1)~(8)中任1項所記載之金屬氧化物被膜形成用塗佈液,以微細液滴吐出裝置進行塗佈所得。 (9) A metal oxide film which is obtained by coating a coating liquid for forming a metal oxide film according to any one of the above (1) to (8) by a fine droplet discharge device.

(10)一種金屬氧化物被膜,其係將如上述(1)~(8)中任1項所記載之金屬氧化物被膜形成用塗佈液,藉由噴嘴分配器進行塗佈所得。 (10) A metal oxide film which is obtained by coating a coating liquid for forming a metal oxide film according to any one of the above (1) to (8) by a nozzle dispenser.

(11)一種金屬氧化物被膜,其係將如上述(1)~(8)中任1項所記載之金屬氧化物被膜形成用塗佈液,藉由壓電式噴嘴分配器進行塗佈所得。 (11) A metal oxide film which is obtained by coating a coating liquid for forming a metal oxide film according to any one of the above (1) to (8) by a piezoelectric nozzle dispenser. .

(12)一種金屬氧化物被膜之形成方法,其係將如上述(1)~(8)中任1項所記載之金屬氧化物被膜形成用 塗佈液,使用噴嘴分配器,來形成電極交叉部微細絕緣層。 (12) A method for forming a metal oxide film, which is used for forming a metal oxide film according to any one of the above (1) to (8) The coating liquid was formed using a nozzle dispenser to form a fine insulating layer at the electrode intersection.

(13)一種金屬氧化物被膜之形成方法,其係將如上述(1)~(8)中任1項所記載之金屬氧化物被膜形成用塗佈液,使用壓電式噴嘴分配器,來形成電極交叉部微細絕緣層。 (13) A method for forming a metal oxide film, which is a coating liquid for forming a metal oxide film according to any one of the above (1) to (8), using a piezoelectric nozzle dispenser. A fine insulating layer at the intersection of the electrodes is formed.

藉由使用本發明之金屬氧化物被膜形成用塗佈液,而可形成Dot徑小之微細的圖型之金屬氧化物被膜。此外,所得到的金屬氧化物被膜,係具有信賴性為高的特徵。 By using the coating liquid for forming a metal oxide film of the present invention, a metal oxide film having a fine pattern of a small Dot diameter can be formed. Further, the obtained metal oxide film has a feature of high reliability.

<金屬氧化物被膜形成用塗佈液> <Coating liquid for forming a metal oxide film>

本發明之金屬氧化物被膜形成用塗佈液,係含有以上述一般式(I)所表示之第1金屬烷氧化物、以上述一般式(II)所表示之金屬鹽、有機溶劑、水分、以及析出抑制劑。 The coating liquid for forming a metal oxide film of the present invention contains the first metal alkoxide represented by the above general formula (I), the metal salt represented by the above general formula (II), an organic solvent, water, and And a precipitation inhibitor.

<第1金屬烷氧化物> <First metal alkoxide>

本發明之金屬氧化物被膜形成用塗佈液,係含有以下述一般式(I)所表示的結構之第1金屬烷氧化物。 The coating liquid for forming a metal oxide film of the present invention contains a first metal alkoxide having a structure represented by the following general formula (I).

M1(OR1)n (I) M 1 (OR 1 ) n (I)

式(I)中,M1、R1、n係如上述所定義。其中,M1係以矽、鈦、鋯、或鋁為佳,特別是以矽、或鈦為佳。此外,n係以3或4為佳。 In the formula (I), M 1 , R 1 and n are as defined above. Among them, M 1 is preferably ruthenium, titanium, zirconium or aluminum, and particularly preferably ruthenium or titanium. Further, n is preferably 3 or 4.

使用矽烷氧化物或其之部分縮合物作為以式(I)所表示之金屬烷氧化物時,係使用以一般式(IV)所表示之化合物的1種或2種以上之混合物或部分縮合物(較佳為五聚物以下)。 When a decane oxide or a partial condensate thereof is used as the metal alkoxide represented by the formula (I), one or a mixture of two or more compounds or a partial condensate of the compound represented by the general formula (IV) is used. (preferably below the pentamer).

Si(OR’)4 (IV) Si(OR') 4 (IV)

式(IV)中,R’係表示碳數1~5,較佳為1~3之烷基或乙醯氧基。 In the formula (IV), R' represents an alkyl group having 1 to 5 carbon atoms, preferably 1 to 3 carbon atoms or an ethoxy group.

更具體而言,矽烷氧化物係使用例如:四甲氧基矽烷、四乙氧基矽烷、四丙氧基矽烷、四丁氧基矽烷、四乙醯氧基矽烷等之四烷氧基矽烷類等。 More specifically, as the decane oxide, a tetraalkoxy decane such as tetramethoxy decane, tetraethoxy decane, tetrapropoxy decane, tetrabutoxy decane or tetraethoxy decane is used. Wait.

此外,使用鈦烷氧化物或部分縮合物作為以式(I)所表示之金屬烷氧化物時,係使用以一般式(V)所表示之化合物的1種或2種以上之混合物或部分縮合物(較佳為五聚物以下)。 Further, when a titanium alkoxide or a partial condensate is used as the metal alkoxide represented by the formula (I), one or a mixture of two or more kinds of compounds represented by the general formula (V) or a partial condensation is used. (preferably below the pentamer).

Ti(OR”)4 (V) Ti(OR") 4 (V)

式(V)中,R”係表示碳數1~5之烷基。 In the formula (V), R" represents an alkyl group having 1 to 5 carbon atoms.

以式(I)所表示之金屬烷氧化物,具體而言,鈦烷氧化物係使用四乙氧化鈦、四丙氧化鈦、四丁氧化鈦等之四烷氧化鈦化合物或四-n-丁氧化鈦四聚物等之部分縮合物等。 The metal alkoxide represented by the formula (I), specifically, a tetraalkane oxide compound such as tetraethylene titania, tetrapropylene titania or tetrabutyltitanate or tetra-n-butyl is used as the titanium alkoxide. A partial condensate or the like of a titanium oxide tetramer or the like.

以式(I)所表示之金屬烷氧化物的其他例子 係可列舉:四乙氧化鋯、四丙氧化鋯、四丁氧化鋯等之四烷氧化鋯化合物;三丁氧化鋁、三異丙氧化鋁、三乙氧化鋁等之三烷氧化鋁化合物;五丙氧化鉭、五丁氧化鉭等之五烷氧化鉭化合物等。 Other examples of metal alkoxides represented by formula (I) Examples thereof include a tetraalkyl zirconia compound such as tetraethoxy zirconia, tetrapropoxide zirconia, and tetrabutyl zirconia; a trialkyl alumina compound such as tributyl aluminate, triisopropylaluminate or triethylaluminum oxide; A pentadecane ruthenium oxide compound such as arsenic trioxide or pentabutyl ruthenium oxide.

<第2金屬烷氧化物> <2nd metal alkoxide>

於本發明之金屬氧化物被膜形成用塗佈液中,係可進一步與上述第1金屬烷氧化物一起使用以下述式(III)所表示之第2金屬烷氧化物。 In the coating liquid for forming a metal oxide film of the present invention, a second metal alkoxide represented by the following formula (III) may be further used together with the first metal alkoxide.

R2 1M3(OR3)m-1 (III) R 2 1 M 3 (OR 3 ) m-1 (III)

式(III)中,M3、R2、R3、m係如上述所定義。其中,M3係以矽(Si)、鈦(Ti)、鋯(Zr)、或鋁(Al)為佳,特別是以矽(Si)、或鈦(Ti)為佳。 In the formula (III), M 3 , R 2 , R 3 and m are as defined above. Among them, M 3 is preferably bismuth (Si), titanium (Ti), zirconium (Zr), or aluminum (Al), and particularly preferably bismuth (Si) or titanium (Ti).

於本發明之金屬氧化物被膜形成用塗佈液中,係藉由含有第2金屬烷氧化物,於由丙烯酸材料等之有機材料所構成的膜上形成金屬氧化物被膜時,可緩和塗佈膜與有機膜之間的熱伸縮性之差異。其結果,即使於有機膜上形成金屬氧化物被膜,亦可防止金屬氧化物被膜產生龜裂。例如,於觸控面板中,即使於上述之層間絕緣膜等使用由丙烯酸材料所構成的有機膜,且於其上形成金屬氧化物被膜,也可防止層間絕緣膜上之金屬氧化物被膜產生龜裂。 In the coating liquid for forming a metal oxide film of the present invention, when a metal oxide film is formed on a film made of an organic material such as an acrylic material by containing a second metal alkoxide, the coating can be relaxed. The difference in thermal stretchability between the film and the organic film. As a result, even if a metal oxide film is formed on the organic film, cracking of the metal oxide film can be prevented. For example, in the touch panel, even if an organic film made of an acrylic material is used for the interlayer insulating film or the like, and a metal oxide film is formed thereon, the metal oxide film on the interlayer insulating film can be prevented from being turtle-produced. crack.

於本發明之金屬氧化物被膜形成用塗佈液中使用有第2金屬烷氧化物時,第1金屬烷氧化物的含量, 相對於金屬氧化物被膜形成用塗佈液中所含有之金屬烷氧化物的合計量,較佳為20莫耳%~85莫耳%,更佳為30莫耳%~70莫耳%。 When the second metal alkoxide is used in the coating liquid for forming a metal oxide film of the present invention, the content of the first metal alkoxide is The total amount of the metal alkoxide contained in the coating liquid for forming a metal oxide film is preferably 20 mol% to 85 mol%, more preferably 30 mol% to 70 mol%.

於本發明之金屬氧化物被膜形成用塗佈液中使用有第2金屬烷氧化物時,第2金屬烷氧化物的含量,相對於金屬氧化物被膜形成用塗佈液中所含有之金屬烷氧化物的合計量,較佳為80莫耳%~15莫耳%,更佳為70莫耳%~30莫耳%。R2之碳數為3以下時,將以式(III)所表示之金屬烷氧化物的含量設為30%以上,R2之碳數為4以上時、或於R2中含有巰基時,第2金屬烷氧化物的含量係以15%以上為更佳,且以75莫耳%以下為更佳。 When the second metal alkoxide is used in the coating liquid for forming a metal oxide film of the present invention, the content of the second metal alkoxide is related to the metal alkane contained in the coating liquid for forming a metal oxide film. The total amount of oxides is preferably from 80 mol% to 15 mol%, more preferably from 70 mol% to 30 mol%. When the carbon number of R 2 is 3 or less, when the content of the metal alkoxide represented by the formula (III) is 30% or more, the carbon number of R 2 is 4 or more, or when the sulfhydryl group is contained in R 2 , The content of the second metal alkoxide is preferably 15% or more, more preferably 75 mol% or less.

第2金屬烷氧化物的含量未達15莫耳%時, 會有於在上述之有機膜上所得到的塗佈膜產生龜裂的情況。此外,為80莫耳%以上時,雖不會產生龜裂,但會有引起無法得到均勻的金屬氧化物被膜之現象的情況。藉由設為如此之含量,可抑制在上述之金屬氧化物被膜的龜裂產生。 When the content of the second metal alkoxide is less than 15 mol%, There is a case where the coating film obtained on the above organic film is cracked. In addition, when it is 80 mol% or more, cracks do not occur, but there is a case where a uniform metal oxide film cannot be obtained. By setting it as such content, it can suppress that the crack of the said metal oxide film generate|occur|produces.

於本發明之金屬氧化物被膜形成用塗佈液中使用有第2金屬烷氧化物時,本發明之金屬氧化物被膜形成用塗佈液中所含有之金屬烷氧化物的合計含量,較佳為0.5重量%~20重量%,更佳為1重量%~15重量%。於該比例為大的情況中,金屬氧化物被膜形成用塗佈液之儲藏安定性會變差,且塗佈膜之厚度會變得難以控制。另一方面,為小的情況中,所得到的塗佈膜之厚度會變薄,且為了得到 特定的膜厚而需要塗佈數次。 When the second metal alkoxide is used in the coating liquid for forming a metal oxide film of the present invention, the total content of the metal alkoxide contained in the coating liquid for forming a metal oxide film of the present invention is preferably It is 0.5% by weight to 20% by weight, more preferably 1% by weight to 15% by weight. In the case where the ratio is large, the storage stability of the coating liquid for forming a metal oxide film is deteriorated, and the thickness of the coating film becomes difficult to control. On the other hand, in the case of a small amount, the thickness of the obtained coating film becomes thin, and in order to obtain It needs to be coated several times for a specific film thickness.

以式(III)所表示之較佳的金屬烷氧化物,例如,M3為矽時,可列舉以下之化合物。 A preferred metal alkoxide represented by the formula (III), for example, when M 3 is hydrazine, the following compounds can be mentioned.

可列舉例如:甲基三甲氧基矽烷、甲基三丙氧基矽烷、甲基三乙醯氧基矽烷、甲基三丁氧基矽烷、甲基三戊氧基矽烷(methyl tripentoxysilane)、甲基三戊氧基矽烷(methyl triamyloxysilane)、甲基三苯氧基矽烷、甲基三苄氧基矽烷、甲基三苯乙氧基矽烷、環氧丙氧基甲基三甲氧基矽烷、環氧丙氧基甲基三乙氧基矽烷、α-環氧丙氧基乙基三甲氧基矽烷、α-環氧丙氧基乙基三乙氧基矽烷、β-環氧丙氧基乙基三甲氧基矽烷、β-環氧丙氧基乙基三乙氧基矽烷、α-環氧丙氧基丙基三甲氧基矽烷、α-環氧丙氧基丙基三乙氧基矽烷、β-環氧丙氧基丙基三甲氧基矽烷、β-環氧丙氧基丙基三乙氧基矽烷、γ-環氧丙氧基丙基三甲氧基矽烷、γ-環氧丙氧基丙基三乙氧基矽烷、γ-環氧丙氧基丙基三丙氧基矽烷、γ-環氧丙氧基丙基三丁氧基矽烷、γ-環氧丙氧基丙基三苯氧基矽烷、α-環氧丙氧基丁基三甲氧基矽烷、α-環氧丙氧基丁基三乙氧基矽烷、β-環氧丙氧基丁基三乙氧基矽烷、γ-環氧丙氧基丁基三甲氧基矽烷、γ-環氧丙氧基丁基三乙氧基矽烷、δ-環氧丙氧基丁基三甲氧基矽烷、δ-環氧丙氧基丁基三乙氧基矽烷、(3,4-環氧環己基)甲基三甲氧基矽烷、(3,4-環氧環己基)甲基三乙氧基矽烷、β-(3,4-環氧環己基)乙基三甲氧基矽烷、β-(3,4-環氧環己基)乙 基三乙氧基矽烷、β-(3,4-環氧環己基)乙基三丙氧基矽烷、β-(3,4-環氧環己基)乙基三丁氧基矽烷、β-(3,4-環氧環己基)乙基三苯氧基矽烷、γ-(3,4-環氧環己基)丙基三甲氧基矽烷、γ-(3,4-環氧環己基)丙基三乙氧基矽烷、δ-(3,4-環氧環己基)丁基三甲氧基矽烷、δ-(3,4-環氧環己基)丁基三乙氧基矽烷、環氧丙氧基甲基甲基二甲氧基矽烷、環氧丙氧基甲基甲基二乙氧基矽烷、α-環氧丙氧基乙基甲基二甲氧基矽烷、α-環氧丙氧基乙基甲基二乙氧基矽烷、β-環氧丙氧基乙基甲基二甲氧基矽烷、β-環氧丙氧基乙基乙基二甲氧基矽烷、α-環氧丙氧基丙基甲基二甲氧基矽烷、α-環氧丙氧基丙基甲基二乙氧基矽烷、β-環氧丙氧基丙基甲基二甲氧基矽烷、β-環氧丙氧基丙基乙基二甲氧基矽烷、γ-環氧丙氧基丙基甲基二甲氧基矽烷、γ-環氧丙氧基丙基甲基二乙氧基矽烷、γ-環氧丙氧基丙基甲基二丙氧基矽烷、γ-環氧丙氧基丙基甲基二丁氧基矽烷、γ-環氧丙氧基丙基甲基二苯氧基矽烷、γ-環氧丙氧基丙基乙基二甲氧基矽烷、γ-環氧丙氧基丙基乙基二乙氧基矽烷、γ-環氧丙氧基丙基乙烯基二甲氧基矽烷、γ-環氧丙氧基丙基乙烯基二乙氧基矽烷、乙基三甲氧基矽烷、乙基三乙氧基矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、乙烯基三乙醯氧基矽烷、苯基三甲氧基矽烷、苯基三乙氧基矽烷、苯基三乙醯氧基矽烷、γ-氯丙基三甲氧基矽烷、γ-氯丙基三乙氧基矽烷、γ-氯丙基三乙醯氧基矽烷、3,3,3-三氯丙基三甲氧 基矽烷、γ-甲基丙烯醯氧基丙基三甲氧基矽烷、γ-巰基丙基三甲氧基矽烷、γ-巰基丙基三乙氧基矽烷、β-氰基乙基三乙氧基矽烷、氯甲基三甲氧基矽烷、氯甲基三乙氧基矽烷、N-(β-胺基乙基)γ-胺基丙基三甲氧基矽烷、N-(β-胺基乙基)γ-胺基丙基甲基二甲氧基矽烷、γ-胺基丙基甲基二甲氧基矽烷、N-(β-胺基乙基)γ-胺基丙基三乙氧基矽烷、N-(β-胺基乙基)γ-胺基丙基甲基二乙氧基矽烷、二甲基二甲氧基矽烷、苯基甲基二甲氧基矽烷、二甲基二乙氧基矽烷、苯基甲基二乙氧基矽烷、γ-氯丙基甲基二甲氧基矽烷、γ-氯丙基甲基二乙氧基矽烷、二甲基二乙醯氧基矽烷、γ-甲基丙烯醯氧基丙基甲基二甲氧基矽烷、γ-甲基丙烯醯氧基丙基甲基二乙氧基矽烷、γ-巰基丙基甲基二甲氧基矽烷、γ-巰基甲基二乙氧基矽烷、甲基乙烯基二甲氧基矽烷、甲基乙烯基二乙氧基矽烷、γ-脲基丙基三乙氧基矽烷、γ-脲基丙基三甲氧基矽烷、γ-脲基丙基三丙氧基矽烷、(R)-N-1-苯基乙基-N’-三乙氧基矽烷基丙基脲、(R)-N-1-苯基乙基-N’-三甲氧基矽烷基丙基脲、烯丙基三乙氧基矽烷、3-甲基丙烯醯氧基丙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基三乙氧基矽烷、3-丙烯醯氧基丙基三甲氧基矽烷、3-丙烯醯氧基丙基三乙氧基矽烷、3-異氰酸酯丙基三乙氧基矽烷、三氟丙基三甲氧基矽烷、溴丙基三乙氧基矽烷、二乙基二乙氧基矽烷、二乙基二甲氧基矽烷、二苯基二甲氧基矽烷、二苯基二乙氧基矽烷、三甲基乙氧基矽烷、三甲基甲氧基 矽烷、p-苯乙烯基三甲氧基矽烷、p-苯乙烯基三乙氧基矽烷、p-苯乙烯基三丙氧基矽烷等。此等係可單獨,或將2種以上組合使用。 For example, methyl trimethoxy decane, methyl tripropoxy decane, methyl triethoxy decane, methyl tributoxy decane, methyl tripentoxysilane, methyl Methyl triamyloxysilane, methyltriphenyloxydecane, methyltribenzyloxydecane, methyltriphenylethoxydecane, glycidoxymethyltrimethoxydecane, propylene oxide Oxymethyltriethoxydecane, α-glycidoxyethyltrimethoxydecane, α-glycidoxyethyltriethoxydecane, β-glycidoxyethyltrimethoxy Baseline, β-glycidoxyethyltriethoxydecane, α-glycidoxypropyltrimethoxydecane, α-glycidoxypropyltriethoxydecane, β-ring Oxypropoxypropyltrimethoxydecane, β-glycidoxypropyltriethoxydecane, γ-glycidoxypropyltrimethoxydecane, γ-glycidoxypropyl III Ethoxy decane, γ-glycidoxypropyl tripropoxy decane, γ-glycidoxypropyl tributoxy decane, γ-glycidoxypropyl triphenoxy decane, --glycidyl Butyl trimethoxy decane, α-glycidoxybutyl triethoxy decane, β-glycidoxy butyl triethoxy decane, γ-glycidoxy butyl trimethoxy Decane, γ-glycidoxybutyltriethoxydecane, δ-glycidoxybutyltrimethoxydecane, δ-glycidoxybutyltriethoxydecane, (3,4 -Epoxycyclohexyl)methyltrimethoxydecane, (3,4-epoxycyclohexyl)methyltriethoxydecane, β-(3,4-epoxycyclohexyl)ethyltrimethoxydecane, --(3,4-epoxycyclohexyl)B Triethoxy decane, β-(3,4-epoxycyclohexyl)ethyltripropoxydecane, β-(3,4-epoxycyclohexyl)ethyl tributoxy decane, β-( 3,4-epoxycyclohexyl)ethyltriphenoxydecane, γ-(3,4-epoxycyclohexyl)propyltrimethoxydecane, γ-(3,4-epoxycyclohexyl)propyl Triethoxy decane, δ-(3,4-epoxycyclohexyl)butyltrimethoxydecane, δ-(3,4-epoxycyclohexyl)butyltriethoxydecane, glycidoxy Methyl methyl dimethoxy decane, glycidoxymethyl methyl diethoxy decane, α-glycidoxyethyl methyl dimethoxy decane, α-glycidoxy B Methyldiethoxydecane, β-glycidoxyethylmethyldimethoxydecane, β-glycidoxyethylethyldimethoxydecane, α-glycidoxy Propylmethyldimethoxydecane, α-glycidoxypropylmethyldiethoxydecane, β-glycidoxypropylmethyldimethoxydecane, β-glycidoxy Propyl propyl dimethoxy decane, γ-glycidoxypropyl methyl dimethoxy decane, γ-glycidoxypropyl methyl diethoxy decane, γ-glycidyl Propylmethyldipropoxydecane, γ-glycidoxypropylmethyldibutoxydecane, γ-glycidoxypropylmethyldiphenoxydecane, γ-glycidyl Oxypropylethyldimethoxydecane, γ-glycidoxypropylethyldiethoxydecane, γ-glycidoxypropylvinyldimethoxydecane, γ-epoxy Propoxypropyl vinyl diethoxy decane, ethyl trimethoxy decane, ethyl triethoxy decane, vinyl trimethoxy decane, vinyl triethoxy decane, vinyl triethoxy methoxy Decane, phenyltrimethoxydecane, phenyltriethoxydecane, phenyltriethoxydecane, γ-chloropropyltrimethoxydecane, γ-chloropropyltriethoxydecane, γ-chloride Propyltriethoxydecane, 3,3,3-trichloropropyltrimethoxy Baseline, γ-methacryloxypropyltrimethoxydecane, γ-mercaptopropyltrimethoxydecane, γ-mercaptopropyltriethoxydecane, β-cyanoethyltriethoxydecane , chloromethyltrimethoxydecane, chloromethyltriethoxydecane, N-(β-aminoethyl)γ-aminopropyltrimethoxydecane, N-(β-aminoethyl)γ -Aminopropylmethyldimethoxydecane, γ-aminopropylmethyldimethoxydecane, N-(β-aminoethyl)γ-aminopropyltriethoxydecane, N -(β-aminoethyl)γ-aminopropylmethyldiethoxydecane, dimethyldimethoxydecane, phenylmethyldimethoxydecane, dimethyldiethoxydecane , phenylmethyldiethoxydecane, γ-chloropropylmethyldimethoxydecane, γ-chloropropylmethyldiethoxydecane, dimethyldiethoxydecane, γ-甲Propylene methoxy propyl methyl dimethoxy decane, γ-methyl propylene methoxy propyl methyl diethoxy decane, γ-mercaptopropyl methyl dimethoxy decane, γ-fluorenyl Diethoxy decane, methyl vinyl dimethoxy decane, methyl vinyl diethoxy fluorene Alkane, γ-ureidopropyltriethoxydecane, γ-ureidopropyltrimethoxydecane, γ-ureidopropyltripropoxydecane, (R)-N-1-phenylethyl- N'-triethoxydecyl propyl urea, (R)-N-1-phenylethyl-N'-trimethoxydecyl propyl urea, allyl triethoxy decane, 3-methyl Acryloxypropyltrimethoxydecane, 3-methylpropenyloxypropyltriethoxydecane, 3-propenyloxypropyltrimethoxydecane, 3-propenyloxypropyltri Ethoxy decane, 3-isocyanate propyl triethoxy decane, trifluoropropyl trimethoxy decane, bromopropyl triethoxy decane, diethyl diethoxy decane, diethyl dimethoxy Decane, diphenyldimethoxydecane, diphenyldiethoxydecane, trimethylethoxydecane, trimethylmethoxy Decane, p-styryltrimethoxydecane, p-styryltriethoxydecane, p-styryltripropoxydecane, and the like. These may be used alone or in combination of two or more.

此外,於本發明之金屬氧化物被膜形成用塗佈液中,除第1金屬烷氧化物、第2金屬烷氧化物以外,只要不損及本發明之效果,亦可含有其他的金屬烷氧化物。 Further, in the coating liquid for forming a metal oxide film of the present invention, in addition to the first metal alkoxide and the second metal alkoxide, other metal alkoxide may be contained as long as the effects of the present invention are not impaired. Things.

<金屬鹽> <metal salt>

本發明之金屬氧化物被膜形成用塗佈液中所含有的金屬鹽係以下述一般式(II)所表示。 The metal salt contained in the coating liquid for forming a metal oxide film of the present invention is represented by the following general formula (II).

M2(X)k (II) M 2 (X) k (II)

式(II)中,M2、X、k係如上述所定義。其中,M2係以鋁、銦、鈰、或鋯為佳。此外,X係以鹽酸、硝酸、乙酸、磺酸、乙醯乙酸或乙醯丙酮酸之殘基、或者此等之鹼性鹽為佳。於上述X中之各酸的殘基,例如,硝酸亦稱為硝酸根,硫酸亦稱為硫酸根,其量係以與M2之價數等價的方式含有。此外,鹼性鹽係意味著於上述各酸之殘基中含有OH基的情況。 In the formula (II), M 2 , X, and k are as defined above. Among them, M 2 is preferably aluminum, indium, antimony or zirconium. Further, X is preferably a residue of hydrochloric acid, nitric acid, acetic acid, sulfonic acid, acetoacetic acid or acetylpyruvate or an alkaline salt thereof. The residue of each acid in the above X, for example, nitric acid is also called nitrate, and sulfuric acid is also called sulfate, and the amount thereof is contained in an equivalent amount to the valence of M 2 . Further, the basic salt means a case where an OH group is contained in the residue of each of the above acids.

以式(II)所表示的金屬鹽當中,特別是以硝酸鹽、氯化物鹽、草酸鹽或其鹼性鹽為佳。其中,就取得之容易性、與金屬氧化物被膜形成用塗佈液之儲藏安定性的觀點而言,係以鋁、銦、或鈰之硝酸鹽為更佳。 Among the metal salts represented by the formula (II), a nitrate, a chloride salt, an oxalate or a basic salt thereof is particularly preferred. Among them, from the viewpoint of easiness of obtaining and storage stability of the coating liquid for forming a metal oxide film, it is more preferable to use a nitrate of aluminum, indium or bismuth.

<有機溶劑> <organic solvent>

於本發明之金屬氧化物被膜形成用塗佈液中係含有有機溶劑。該有機溶劑,係於由金屬氧化物被膜形成用塗佈液形成其之塗膜而得到金屬氧化物被膜時,用以調整金屬氧化物被膜形成用塗佈液之黏度,而改善塗佈性者,且金屬氧化物被膜形成用塗佈液中之有機溶劑的含量,相對於金屬氧化物被膜形成用塗佈液中所含有的全部金屬烷氧化物,較佳為80重量%~99.5重量%,更佳為85重量%~99重量%。於有機溶劑之含量少的情況中,所得到的金屬氧化物被膜之厚度會變薄,且為了得到特定的膜厚而需要塗佈數次。另一方面,於該含量多的情況中,金屬氧化物被膜形成用塗佈液之儲藏安定性會變差,且金屬氧化物被膜之膜厚會變得難以控制。 The coating liquid for forming a metal oxide film of the present invention contains an organic solvent. When the metal oxide film is formed by forming a coating film of the coating liquid for forming a metal oxide film, the organic solvent is used to adjust the viscosity of the coating liquid for forming a metal oxide film to improve the coating property. The content of the organic solvent in the coating liquid for forming a metal oxide film is preferably 80% by weight to 99.5% by weight based on the total amount of the metal alkoxide contained in the coating liquid for forming a metal oxide film. More preferably, it is 85% by weight to 99% by weight. When the content of the organic solvent is small, the thickness of the obtained metal oxide film is reduced, and coating is required several times in order to obtain a specific film thickness. On the other hand, in the case where the content is large, the storage stability of the coating liquid for forming a metal oxide film is deteriorated, and the film thickness of the metal oxide film is difficult to control.

本發明之金屬氧化物被膜形成用塗佈液中所 使用的有機溶劑係可列舉:甲醇、乙醇、1-丙醇、2-丙醇、1-丁醇、2-丁醇、2-甲基-1-丙醇、2-甲基-2-丙醇等之醇類;乙酸乙基酯等之酯類;乙二醇等之二醇類、或者此等之酯衍生物;二乙基醚等之醚類;丙酮、甲基乙基酮、環己酮等之酮類;苯、甲苯等之芳香族烴類等。此等係可單獨或組合使用。 In the coating liquid for forming a metal oxide film of the present invention The organic solvent to be used may, for example, be methanol, ethanol, 1-propanol, 2-propanol, 1-butanol, 2-butanol, 2-methyl-1-propanol or 2-methyl-2-propane. Alcohols such as alcohols; esters such as ethyl acetate; glycols such as ethylene glycol; or ester derivatives thereof; ethers such as diethyl ether; acetone, methyl ethyl ketone, ring A ketone such as ketone or the like; an aromatic hydrocarbon such as benzene or toluene. These systems can be used alone or in combination.

於本發明之金屬氧化物被膜形成用塗佈液中,於前述有機溶劑中含有30質量%以上由乙二醇、丙二醇、1,2-丁二醇、1,3-丁二醇、1,4-丁二醇、1,2-戊二醇、1,3-戊二醇、1,4-戊二醇、1,5-戊二醇、2,4-戊二醇、2,5-己二醇、二乙二醇、二丙二醇、三乙二醇、及N-甲基吡咯啶酮所 成之群中選出的至少1種(以下,亦稱為特定有機溶劑)。且,本發明之金屬氧化物被膜形成用塗佈液,係表面張力為28mN/m以上。藉此,能夠進行以噴嘴分配器所致之微細的圖型之塗佈。 In the coating liquid for forming a metal oxide film of the present invention, the organic solvent contains 30% by mass or more of ethylene glycol, propylene glycol, 1,2-butanediol, 1,3-butylene glycol, and 1, 4-butanediol, 1,2-pentanediol, 1,3-pentanediol, 1,4-pentanediol, 1,5-pentanediol, 2,4-pentanediol, 2,5- Hexanediol, diethylene glycol, dipropylene glycol, triethylene glycol, and N-methylpyrrolidone At least one selected from the group (hereinafter, also referred to as a specific organic solvent). Further, the coating liquid for forming a metal oxide film of the present invention has a surface tension of 28 mN/m or more. Thereby, the coating of the fine pattern by the nozzle dispenser can be performed.

於金屬氧化物被膜形成用塗佈液中,含有鈦烷氧化物成分時,有機溶劑中所含有的烷二醇類或者其之單醚係可列舉例如:乙二醇、二乙二醇、丙二醇、己二醇、或此等之單甲基、單乙基、單丙基、單丁基或單苯基醚等。 When the titanium alkoxide component is contained in the coating liquid for forming a metal oxide film, the alkanediol contained in the organic solvent or the monoether thereof may, for example, be ethylene glycol, diethylene glycol or propylene glycol. , hexanediol, or such monomethyl, monoethyl, monopropyl, monobutyl or monophenyl ether.

於本發明之金屬氧化物被膜形成用塗佈液使用的有機溶劑中所含有的二醇類或其之單醚,若相對於鈦烷氧化物,莫耳比未達1,則鈦烷氧化物之安定性效果會減少,而使金屬氧化物被膜形成用塗佈液之儲藏安定性變差。另一方面,多量使用二醇類或其之單醚,並無任何問題。例如,即使金屬氧化物被膜形成用塗佈液中所使用的所有有機溶劑,皆為上述之二醇類或其之單醚亦無妨。但,於金屬氧化物被膜形成用塗佈液不含有鈦烷氧化物的情況中,並不需要特別含有上述之二醇及/或其之單醚。 The diol or a monoether thereof contained in the organic solvent used for the coating liquid for forming a metal oxide film of the present invention, if the molar ratio is less than 1 with respect to the titanium alkoxide, the titanium alkoxide The stability effect is reduced, and the storage stability of the coating liquid for forming a metal oxide film is deteriorated. On the other hand, a large amount of a glycol or a monoether thereof is used without any problem. For example, all of the organic solvents used in the coating liquid for forming a metal oxide film may be the above-mentioned glycols or monoethers thereof. However, in the case where the coating liquid for forming a metal oxide film does not contain a titanium alkoxide, it is not necessary to particularly contain the above-mentioned diol and/or its monoether.

<析出抑制劑> <precipitation inhibitor>

本發明之金屬氧化物被膜形成用塗佈液係含有析出抑制劑。於本發明之析出抑制劑,意指具有在由金屬氧化物被膜形成用塗佈液形成塗佈被膜時,防止金屬鹽析出至塗膜中的功效之有機溶劑。析出抑制劑,較佳為由N-甲基- 吡咯啶酮、乙二醇、二甲基甲醯胺、二甲基乙醯胺、二乙二醇、丙二醇、己二醇及此等之衍生物所成之群中選出的至少1種。其中,更佳為N-甲基-吡咯啶酮、乙二醇、二乙二醇、丙二醇、己二醇或此等之衍生物。析出抑制劑係可使用至少1種以上。 The coating liquid for forming a metal oxide film of the present invention contains a precipitation inhibitor. The precipitation inhibitor of the present invention is an organic solvent which has an effect of preventing precipitation of a metal salt into a coating film when a coating film is formed from a coating liquid for forming a metal oxide film. a precipitation inhibitor, preferably N-methyl- At least one selected from the group consisting of pyrrolidone, ethylene glycol, dimethylformamide, dimethylacetamide, diethylene glycol, propylene glycol, hexanediol, and the like. Among them, N-methyl-pyrrolidone, ethylene glycol, diethylene glycol, propylene glycol, hexanediol or the like are more preferred. At least one type of the precipitation inhibitor may be used.

於金屬氧化物被膜形成用塗佈液中之析出抑制劑的含量,係以將上述金屬鹽之金屬換算成金屬氧化物,並以滿足下述之比率(重量比)所使用者為佳。 The content of the precipitation inhibitor in the coating liquid for forming a metal oxide film is preferably such that the metal of the metal salt is converted into a metal oxide to satisfy the ratio (weight ratio) described below.

(析出抑制劑/金屬氧化物)≧1 (precipitation inhibitor / metal oxide) ≧ 1

若上述比率低於1,則於被膜形成時之金屬鹽的析出抑制效果會變小。另一方面,多量使用析出抑制劑時,雖不會對於金屬氧化物被膜形成用塗佈液造成任何影響,但以200以下為佳。 When the ratio is less than 1, the effect of suppressing precipitation of the metal salt at the time of film formation becomes small. On the other hand, when a precipitation inhibitor is used in a large amount, it does not have any influence on the coating liquid for forming a metal oxide film, but it is preferably 200 or less.

析出抑制劑,係可於金屬烷氧化物,尤其,矽烷氧化物、鈦烷氧化物、或矽烷氧化物與鈦烷氧化物,在金屬鹽之存在下進行水解、縮合反應時添加,亦可於水解、縮合反應結束之後添加。 The precipitation inhibitor may be added to the metal alkoxide, in particular, a decane oxide, a titanium alkoxide, or a decane oxide and a titanium alkoxide, in the presence of a metal salt for hydrolysis or condensation reaction, or After the hydrolysis and condensation reactions are completed, they are added.

另一方面,於金屬氧化物被膜形成用塗佈液中所含有之金屬鹽的含量,係以構成金屬烷氧化物之金屬原子的合計莫耳數(M)與上述金屬鹽之金屬原子的莫耳數(M2)之合計的含有比率滿足下述之比率(莫耳比)為佳。 On the other hand, the content of the metal salt contained in the coating liquid for forming a metal oxide film is the total number of moles (M) of the metal atoms constituting the metal alkoxide and the metal atom of the metal salt. The total content ratio of the number of ears (M 2 ) satisfies the ratio (mol ratio) described below.

0.01≦M2/M≦0.7 0.01≦M 2 /M≦0.7

若此比率低於0.01,則由於所得到的被膜之機械性強 度不足而不佳。另一方面,若超過0.7,則塗佈膜對於玻璃基板或透明電極等之基材的密著性會降低。進而,亦有經450℃以下之低溫燒成之後,所得到的金屬氧化物被膜之耐藥品性降低的傾向。其中,此比率係以0.01~0.6為更佳。 If the ratio is less than 0.01, the mechanical properties of the obtained film are strong. Not enough. On the other hand, when it exceeds 0.7, the adhesiveness of the coating film to the base material, such as a glass substrate and a transparent electrode, will fall. Further, after the low-temperature firing at 450 ° C or lower, the chemical resistance of the obtained metal oxide film tends to be lowered. Among them, the ratio is preferably 0.01 to 0.6.

於本發明之金屬氧化物被膜形成用塗佈液 中,只要不損及本發明之效果,亦可含有除上述之成分以外的其他成分,例如:無機微粒子、金屬氧烷(metalloxane)寡聚物、金屬氧烷聚合物、整平劑、界面活性劑等之成分。 Coating liquid for forming a metal oxide film of the present invention Other components other than the above components may be contained as long as the effects of the present invention are not impaired, for example, inorganic fine particles, metalloxane oligomers, metalloxane polymers, leveling agents, and interfacial activity. Ingredients such as agents.

無機微粒子係以二氧化矽微粒子、氧化鋁微粒子、氧化鈦微粒子、氟化鎂微粒子等之微粒子為佳,以此等之無機微粒子的膠體溶液特佳。此膠體溶液係可為將無機微粒子粉分散於分散介質者,亦可為市售品之膠體溶液。 The inorganic fine particles are preferably fine particles such as cerium oxide fine particles, alumina fine particles, titanium oxide fine particles, and magnesium fluoride fine particles, and the colloidal solution of the inorganic fine particles is particularly preferable. The colloidal solution may be one in which the inorganic fine particle powder is dispersed in a dispersion medium, or may be a colloidal solution of a commercially available product.

於本發明中,係藉由含有無機微粒子,而能夠賦予所形成之硬化被膜的表面形狀或其他功能。無機微粒子係以其平均粒徑為0.001~0.2μm為佳,更佳為0.001~0.1μm。無機微粒子之平均粒徑超過0.2μm時,會有使用所調製之塗佈液所形成的硬化被膜之透明性降低的情況。 In the present invention, the surface shape or other functions of the formed cured film can be imparted by containing inorganic fine particles. The inorganic fine particle system preferably has an average particle diameter of 0.001 to 0.2 μm, more preferably 0.001 to 0.1 μm. When the average particle diameter of the inorganic fine particles exceeds 0.2 μm, the transparency of the cured film formed using the prepared coating liquid may be lowered.

無機微粒子之分散介質係可列舉水及有機溶劑。就被膜形成用塗佈液之安定性的觀點而言,膠體溶液,係以將pH或pKa調整為1~10為佳,較佳為2~7。 Examples of the dispersion medium of the inorganic fine particles include water and an organic solvent. The colloidal solution is preferably adjusted to have a pH or pKa of from 1 to 10, preferably from 2 to 7, from the viewpoint of the stability of the coating liquid for film formation.

膠體溶液之分散介質所使用的有機溶劑係可列舉:甲醇、乙醇、丙醇、丁醇、乙二醇、丙二醇、丁二 醇、戊二醇、2-甲基-2,4-戊二醇、二乙二醇、二丙二醇、乙二醇單丙基醚等之醇類;甲基乙基酮、甲基異丁基酮等之酮類;甲苯、二甲苯等之芳香族烴類;二甲基甲醯胺、二甲基乙醯胺、N-甲基吡咯啶酮等之醯胺類;乙酸乙酯、乙酸丁酯、γ-丁內酯等之酯類;四氫呋喃、1,4-二噁烷等之醚類。此等當中,較佳為醇類或酮類。此等有機溶劑係可單獨或將2種以上混合而作為分散介質來使用。 Examples of the organic solvent used in the dispersion medium of the colloidal solution include methanol, ethanol, propanol, butanol, ethylene glycol, propylene glycol, and dibutyl. Alcohols, pentanediol, 2-methyl-2,4-pentanediol, diethylene glycol, dipropylene glycol, ethylene glycol monopropyl ether, etc.; methyl ethyl ketone, methyl isobutyl Ketones such as ketones; aromatic hydrocarbons such as toluene and xylene; decylamines such as dimethylformamide, dimethylacetamide, and N-methylpyrrolidone; ethyl acetate and butyl acetate An ester such as an ester or γ-butyrolactone; an ether such as tetrahydrofuran or 1,4-dioxane. Among these, alcohols or ketones are preferred. These organic solvents may be used singly or in combination of two or more kinds as a dispersion medium.

本發明之金屬氧化物被膜形成用塗佈液中之 固體成分濃度,係將上述金屬烷氧化物與金屬鹽換算成金屬氧化物時,較佳為0.5重量%~20重量%之範圍。若固體成分超過20重量%,則金屬氧化物被膜形成用塗佈液之儲藏安定性會變差,且金屬氧化物被膜之膜厚會變得難以控制。另一方面,於固體成分低於0.5重量%的情況中,所得到的金屬氧化物被膜之厚度會變薄,故為了得到特定的膜厚而需要進行多數次塗佈。其中,固體成分濃度係以1重量%~15重量%為更佳。 In the coating liquid for forming a metal oxide film of the present invention The solid content concentration is preferably in the range of 0.5% by weight to 20% by weight based on the metal alkoxide and the metal salt. When the solid content exceeds 20% by weight, the storage stability of the coating liquid for forming a metal oxide film is deteriorated, and the film thickness of the metal oxide film is difficult to control. On the other hand, when the solid content is less than 0.5% by weight, the thickness of the obtained metal oxide film is reduced, so that it is necessary to apply a plurality of times in order to obtain a specific film thickness. Among them, the solid content concentration is preferably from 1% by weight to 15% by weight.

於本發明之金屬氧化物被膜形成用塗佈液中,為了將含有上述第1及第2金屬烷氧化物之金屬烷氧化物,在上述金屬鹽之存在下進行水解,以得到縮合物,需含有水。 該水量,相對於上述第1及第2金屬烷氧化物的總莫耳,以設為2~24莫耳為佳。此(水量(莫耳))/(金屬烷氧化物的總莫耳數)之比率為2以下時,金屬烷氧化物之水解會不充分,而使成膜性降低,或使所得到的塗佈膜之強度降低,故不佳。此外,上述比率高於24時,由於聚 縮合會持續進行,而使儲藏安定性降低,故不佳。其中,此莫耳比係以2~20為更佳。 In the coating liquid for forming a metal oxide film of the present invention, in order to obtain a condensate, a metal alkoxide containing the first and second metal alkoxides is hydrolyzed in the presence of the metal salt. Contains water. The amount of water is preferably 2 to 24 moles based on the total moles of the first and second metal alkoxides. When the ratio of the amount of water (mole) / (the total number of moles of the metal alkoxide) is 2 or less, the hydrolysis of the metal alkoxide is insufficient, and the film formability is lowered, or the obtained coating is obtained. The strength of the film is lowered, so it is not good. In addition, when the above ratio is higher than 24, due to the aggregation Condensation continues, and storage stability is lowered, which is not preferable. Among them, the molar ratio is preferably 2 to 20.

另外,於金屬氧化物被膜形成用塗佈液中所 含有之金屬鹽為含水鹽時,由於其含水分會參與水解反應,因此關於金屬氧化物被膜形成用塗佈液中所含有之水量方面,需要考慮其金屬鹽之含水分。例如,所共存之金屬鹽為鋁鹽之含水鹽時,由於其含水分會參與反應,因此對於用於水解之水量方面,需要考慮其鋁鹽之含水分。 Further, in the coating liquid for forming a metal oxide film When the metal salt is a water-containing salt, since the water content thereof participates in the hydrolysis reaction, it is necessary to consider the water content of the metal salt in terms of the amount of water contained in the coating liquid for forming a metal oxide film. For example, when the coexisting metal salt is an aqueous salt of an aluminum salt, since the water content thereof participates in the reaction, the water content of the aluminum salt needs to be considered in terms of the amount of water used for the hydrolysis.

本發明之金屬氧化物被膜形成用塗佈液,係可形成適於觸控面板的金屬氧化物被膜。此金屬氧化物被膜,係將無機物之金屬氧化物作為主要成分的金屬氧化物被膜,且相較於丙烯酸材料等之有機材料的膜,具有較高的強度。 The coating liquid for forming a metal oxide film of the present invention can form a metal oxide film suitable for a touch panel. The metal oxide film is a metal oxide film containing a metal oxide of an inorganic material as a main component, and has a high strength compared to a film of an organic material such as an acrylic material.

此外,此金屬氧化物被膜幾乎不存在熱伸縮性,因此即使將無機材料適用於上層之電極保護層,亦不會發生龜裂。 Further, since the metal oxide film hardly has thermal stretchability, even if an inorganic material is applied to the electrode protective layer of the upper layer, cracking does not occur.

針對金屬氧化物被膜之折射率的控制,係可藉由控制金屬氧化物被膜形成用塗佈液之組成而實現。亦即,本發明之金屬氧化物被膜,係將於上述之金屬氧化物被膜形成用塗佈液中所含有的金屬烷氧化物進行水解、縮合而製造者,藉由選擇金屬烷氧化物之組成,而能夠在特定之範圍內調整所形成的金屬氧化物被膜之折射率。例如,選擇矽烷氧化物與鈦烷氧化物作為金屬烷氧化物時,藉由調整其之混合比,而能夠在後述之特定的範圍內,具體而言為1.45~2.1左右之範圍內,調整所得到的金屬氧 化物被膜之折射率。 The control of the refractive index of the metal oxide film can be achieved by controlling the composition of the coating liquid for forming a metal oxide film. In other words, the metal oxide film of the present invention is produced by hydrolyzing and condensing a metal alkoxide contained in the coating liquid for forming a metal oxide film, by selecting a composition of a metal alkoxide. The refractive index of the formed metal oxide film can be adjusted within a specific range. For example, when a decane oxide and a titanium alkoxide are selected as the metal alkoxide, by adjusting the mixing ratio thereof, it is possible to adjust the range within a specific range to be described later, specifically, in the range of about 1.45 to 2.1. Metal oxygen obtained The refractive index of the film.

亦即,於塗佈金屬氧化物被膜形成用塗佈液 來成膜,較佳為乾燥後,燒成之後所形成的金屬氧化物被膜中,決定所要求之折射率時,能夠為了實現此折射率,而決定金屬烷氧化物,例如,矽烷氧化物與鈦烷氧化物之組成莫耳比。例如,來自藉由僅將矽烷氧化物進行水解所得到的金屬氧化物被膜形成用塗佈液之金屬氧化物被膜之折射率為1.45左右之值。而,來自藉由僅將鈦烷氧化物進行水解所得到的金屬氧化物被膜形成用塗佈液之金屬氧化物被膜之折射率為2.1左右之值。因而,欲將金屬氧化物被膜之折射率設定為1.45~2.1左右之間的特定值時,能夠為了實現此折射率值,而以特定比例使用矽烷氧化物與鈦烷氧化物來製造金屬氧化物被膜形成用塗佈液。 That is, coating a coating liquid for forming a metal oxide film It is preferable to form a film, preferably after drying, and determine the desired refractive index in the metal oxide film formed after firing, in order to achieve the refractive index, a metal alkoxide, for example, a decane oxide and The composition of the titanium alkoxide is the molar ratio. For example, the refractive index of the metal oxide film derived from the coating liquid for forming a metal oxide film obtained by hydrolyzing only the decane oxide is about 1.45. In addition, the refractive index of the metal oxide film derived from the coating liquid for forming a metal oxide film obtained by hydrolyzing only the titanium alkoxide is about 2.1. Therefore, when the refractive index of the metal oxide film is to be set to a specific value of about 1.45 to 2.1, in order to realize the refractive index value, a metal oxide can be produced by using a decane oxide and a titanium alkoxide in a specific ratio. A coating liquid for forming a film.

此外,即使藉由使用其他之金屬烷氧化物, 亦能調整所得到的金屬氧化物被膜之折射率。進而,針對本發明之金屬氧化物被膜之折射率,除組成條件以外,亦能夠藉由選擇成膜條件而進行調整。如此一來,則能夠實現金屬氧化物被膜之高硬度,並且實現所期望之折射率值。 In addition, even by using other metal alkoxides, The refractive index of the obtained metal oxide film can also be adjusted. Further, the refractive index of the metal oxide film of the present invention can be adjusted by selecting film formation conditions in addition to the composition conditions. In this way, the high hardness of the metal oxide film can be achieved, and the desired refractive index value can be achieved.

由本發明之金屬氧化物被膜形成用塗佈液得到金屬氧化物被膜時,如上所述,較佳為將金屬氧化物被膜形成用塗佈液之塗膜進行乾燥,接著,加以燒成。乾燥,較佳為以室溫~150℃進行,更佳為40~120℃進行。此外,乾燥時間較佳為30秒鐘~10分鐘左右,更佳為1~8分鐘 左右。乾燥方法,較佳為使用加熱板或熱風循環式烘箱等。 When the metal oxide film is obtained from the coating liquid for forming a metal oxide film of the present invention, as described above, it is preferred to dry the coating film of the coating liquid for forming a metal oxide film, followed by baking. Drying is preferably carried out at room temperature to 150 ° C, more preferably 40 to 120 ° C. In addition, the drying time is preferably from about 30 seconds to about 10 minutes, more preferably from 1 to 8 minutes. about. The drying method is preferably a heating plate or a hot air circulating oven or the like.

燒成係考慮觸控面板以外之其他的構成構件之耐熱性,較佳為以100℃~300℃進行,更佳為以150℃~250℃進行。此外,燒成時間較佳為5分鐘以上,更佳為15分鐘以上。燒成方法,較佳為使用加熱板、熱循環式烘箱、紅外線烘箱等。 The firing is preferably carried out at 100 ° C to 300 ° C, more preferably at 150 ° C to 250 ° C, in consideration of heat resistance of the constituent members other than the touch panel. Further, the firing time is preferably 5 minutes or longer, more preferably 15 minutes or longer. The firing method is preferably a heating plate, a heat cycle oven, an infrared oven or the like.

將金屬氧化物被膜形成用塗佈液之塗膜進行 燒成來製造金屬氧化物被膜時,所得到的金屬氧化物被膜之折射率會隨著燒成溫度而變動。此時,燒成溫度越高,可使金屬氧化物被膜之折射率會越高。因而,藉由選擇燒成溫度為適當的值,而能調整所得到的金屬氧化物被膜之折射率。 The coating film of the coating liquid for forming a metal oxide film is used When the metal oxide film is produced by firing, the refractive index of the obtained metal oxide film varies depending on the firing temperature. At this time, the higher the firing temperature, the higher the refractive index of the metal oxide film. Therefore, the refractive index of the obtained metal oxide film can be adjusted by selecting the firing temperature to an appropriate value.

此外,由金屬氧化物被膜形成用塗佈液得到金屬氧化物被膜時,若在燒成前,對塗膜照射紫外線(UV),則會使所得到的金屬氧化物被膜之折射率變動。具體而言,紫外線照射量越多,可使金屬氧化物被膜之折射率會越高。因而,能夠為了實現所期望之折射率而選擇有無紫外線照射。尤其,於金屬氧化物被膜形成用塗佈液中所含有的金屬烷氧化物為含有鈦烷氧化物、鋯烷氧化物或鉭烷氧化物時,藉由對於燒成前之塗膜照射紫外線(UV),使所得到的金屬氧化物被膜之折射率變動,紫外線照射量越多,可使金屬氧化物被膜之折射率越高。另外,於金屬氧化物被膜中,可藉由組成等之選擇條件而實現所期望之折 射率時,亦可不進行紫外線照射。 When the metal oxide film is obtained from the coating liquid for forming a metal oxide film, if the coating film is irradiated with ultraviolet rays (UV) before firing, the refractive index of the obtained metal oxide film is changed. Specifically, the more the amount of ultraviolet irradiation, the higher the refractive index of the metal oxide film. Therefore, the presence or absence of ultraviolet irradiation can be selected in order to achieve a desired refractive index. In particular, when the metal alkoxide contained in the coating liquid for forming a metal oxide film contains a titanium alkoxide, a zirconium alkoxide or a decane oxide, the coating film before firing is irradiated with ultraviolet rays ( UV) changes the refractive index of the obtained metal oxide film, and the higher the amount of ultraviolet irradiation, the higher the refractive index of the metal oxide film. Further, in the metal oxide film, the desired folding can be achieved by the selection conditions of the composition and the like. At the rate of exposure, ultraviolet radiation may not be applied.

進行紫外線照射時,藉由選擇其照射量,而 能夠調整金屬氧化物被膜之折射率。於金屬氧化物被膜,為了得到所期望之折射率而需要紫外線照射時,可使用例如高壓水銀燈。使用高壓水銀燈時,以365nm換算,較佳為全光照射1000mJ/cm2以上之照射量,更佳為3000mJ/cm2~10000mJ/cm2之照射量。紫外線之光源,除高壓水銀燈以外,亦可使用低壓水銀燈、金屬鹵素燈、氙氣燈、準分子燈等。於使用除使用高壓水銀燈時以外之光源的情況中,係只要照射與使用上述高壓水銀燈的情況同量之累積光量即可。進行紫外線照射時,亦可於乾燥步驟與燒成步驟之間進行紫外線照射步驟。 When ultraviolet irradiation is performed, the refractive index of the metal oxide film can be adjusted by selecting the amount of irradiation. For the metal oxide film, in order to obtain a desired refractive index, when ultraviolet irradiation is required, for example, a high pressure mercury lamp can be used. When a high-pressure mercury lamp is used, it is preferable to irradiate an amount of irradiation of 1000 mJ/cm 2 or more with all-optical light, and more preferably an irradiation amount of 3,000 mJ/cm 2 to 10000 mJ/cm 2 in terms of 365 nm. In addition to high-pressure mercury lamps, low-pressure mercury lamps, metal halide lamps, xenon lamps, and excimer lamps can be used as the light source for ultraviolet rays. In the case of using a light source other than when a high-pressure mercury lamp is used, it is only necessary to irradiate the same amount of accumulated light as in the case of using the above-described high-pressure mercury lamp. When ultraviolet irradiation is performed, an ultraviolet irradiation step may be performed between the drying step and the baking step.

於金屬氧化物被膜形成用塗佈液中,特別是 含有鈦烷氧化物成分時,係具有在室溫保存下黏度會緩緩上昇的性質。藉此實用上雖無造成大問題的顧慮,但於精密控制金屬氧化物被膜之厚度的情況中,以對於溫度等進行慎重管理為佳。另外,如此之黏度的上昇,會隨著金屬氧化物被膜形成用塗佈液中之鈦烷氧化物的組成比率變多而變得顯著。一般認為此乃相較於矽烷氧化物,鈦烷氧化物之水解速度較快,而縮合反應快速之故。 In the coating liquid for forming a metal oxide film, in particular When the titanium alkoxide component is contained, it has a property that the viscosity gradually rises at room temperature. In view of the fact that there is no serious problem in practical use, in the case of precisely controlling the thickness of the metal oxide film, it is preferable to carefully manage the temperature or the like. In addition, the increase in the viscosity is remarkable as the composition ratio of the titanium alkoxide in the coating liquid for forming a metal oxide film becomes large. It is generally believed that this is a faster hydrolysis rate of titanium alkoxide than decane oxide, and the condensation reaction is fast.

於金屬氧化物被膜形成用塗佈液含有鈦烷氧化物的情況中,為了減少黏度變化,係以下述2個之製法(1)或製法(2)為佳。 In the case where the coating liquid for forming a metal oxide film contains a titanium alkoxide, in order to reduce the viscosity change, the following two methods (1) or (2) are preferred.

(1)於將鈦烷氧化物在金屬鹽之存在下進行 水解時,預先將二醇類與鈦烷氧化物充分混合之後,因應需要,與矽烷氧化物進行混合,在有機溶劑之存在下進行水解。藉由此,而得到黏度變化小的塗佈組成物。一般認為,此製法有效乃由於將鈦烷氧化物與二醇類混合後會發熱,因此在鈦烷氧化物之烷氧基、與二醇類之間會引起酯交換反應,對於水解、縮合反應得以安定化之故。 (1) in the presence of a titanium alkoxide in the presence of a metal salt In the case of hydrolysis, the glycol is sufficiently mixed with the titanium alkoxide in advance, and if necessary, it is mixed with the decane oxide and hydrolyzed in the presence of an organic solvent. Thereby, a coating composition having a small change in viscosity is obtained. It is generally believed that this method is effective because it will generate heat after mixing titanium alkoxide with glycol, so it will cause transesterification reaction between alkoxy group of titanium alkoxide and glycol, and hydrolysis and condensation reaction. It was stabilized.

(2)預先使矽烷氧化鈦在金屬鹽之存在下進行水解反應之後,與和二醇類進行了混合的鈦烷氧化物溶液混合而進行縮合反應,得到金屬氧化物被膜形成用塗佈液。藉由此,而得到黏度變化小的金屬氧化物被膜形成用塗佈液。 (2) After the hydrolysis reaction of the titanium hydride in the presence of a metal salt, the titanium alkoxide solution mixed with the diol is mixed and subjected to a condensation reaction to obtain a coating liquid for forming a metal oxide film. As a result, a coating liquid for forming a metal oxide film having a small change in viscosity is obtained.

一般認為此製法有效乃基於以下之理由。亦即,矽烷氧化物之水解反應雖以較快的速度進行,但其後之縮合反應係較鈦烷氧化物更慢。因此,若結束水解反應之後,迅速地添加鈦烷氧化物,則經水解反應的矽烷氧化物之矽醇基、與鈦烷氧化物會均勻地反應。藉此,認為經水解之矽烷氧化物會使鈦烷氧化物之縮合反應性安定化。 It is generally believed that this method of production is valid for the following reasons. That is, although the hydrolysis reaction of the decane oxide proceeds at a relatively fast rate, the subsequent condensation reaction is slower than the titanium alkoxide. Therefore, when the titanium alkoxide is rapidly added after the completion of the hydrolysis reaction, the sterol group of the hydrolyzed decane oxide and the titanium alkoxide are uniformly reacted. Thereby, it is considered that the hydrolyzed decane oxide stabilizes the condensation reactivity of the titanium alkoxide.

已嘗試有將預先經水解的矽烷氧化物、與鈦烷氧化物進行混合的方法。但,於反應所使用的有機溶劑中不含有二醇類時,並無法得到儲存安定性優異的金屬氧化物被膜形成用塗佈液。此外,(2)所示之方法,於由具有高的水解速度之其他金屬烷氧化物與矽烷氧化物得到金屬氧化物被膜形成用塗佈液的情況亦為有用。 Attempts have been made to mix pre-hydrolyzed decane oxides with titanium alkoxides. However, when the diol is not contained in the organic solvent used for the reaction, the coating liquid for forming a metal oxide film which is excellent in storage stability cannot be obtained. Further, the method shown in (2) is also useful in the case of obtaining a coating liquid for forming a metal oxide film from another metal alkoxide having a high hydrolysis rate and a decane oxide.

<金屬氧化物被膜> <Metal oxide film>

本發明之金屬氧化物被膜形成用塗佈液,係適用微細液滴塗佈裝置,進行塗佈、製膜,而成為金屬氧化物被膜。微細液滴塗佈裝置,雖有以噴墨塗佈方式、或分配器塗佈方式所進行者,但本發明之金屬氧化物被膜用塗佈液,係可較佳使用於以利用分配器塗佈方式所進行之微細液滴塗佈裝置所致的塗佈。 The coating liquid for forming a metal oxide film of the present invention is applied to a fine droplet coating apparatus, and is applied and formed into a film to form a metal oxide film. Although the fine droplet coating apparatus is carried out by an inkjet coating method or a dispenser coating method, the coating liquid for metal oxide coating of the present invention can be preferably used for coating with a dispenser. Coating by a fine droplet coating device by a cloth method.

於分配器塗佈方法中,雖有大氣方式(Air method)、閥方式(Valve method)、螺旋方式、容積方式、噴射方式之分配器,但就微細圖型塗佈之觀點而言,以噴嘴分配器為佳。 In the dispenser coating method, there are a dispenser of the air method, the valve method, the spiral method, the volume method, and the spray method, but in terms of the fine pattern coating, the nozzle is used. The dispenser is better.

進而,於噴嘴分配器中,係有氣閥方式、螺旋管方式(Solenoid method)、壓電方式,其中就更微細圖型塗佈之觀點而言,以壓電方式為佳。 Further, in the nozzle dispenser, there are a gas valve method, a spiral tube method, and a piezoelectric method, and in terms of finer pattern coating, piezoelectric means is preferable.

以微細液滴吐出裝置所吐出的金屬氧化物被膜形成用塗佈液之液滴的大小,係依據觸控面板之X軸方向的電極與Y軸方向的電極間之距離的關係,以250μm以下為佳。更佳為230μm以下。 The size of the droplet of the coating liquid for forming a metal oxide film to be discharged by the fine droplet discharge device is 250 μm or less depending on the relationship between the electrode in the X-axis direction of the touch panel and the distance between the electrodes in the Y-axis direction. It is better. More preferably, it is 230 μm or less.

[實施例] [Examples]

以下,雖藉由本發明之實施例進一步具體地說明,但並不限定與此等所解釋者。 Hereinafter, the present invention will be further specifically described, but it is not limited to those explained above.

本實施例所使用的化合物之略稱如下。 The compounds used in this example are abbreviated as follows.

TEOS:四乙氧基矽烷 TEOS: tetraethoxy decane

MPS:γ-巰基丙基三甲氧基矽烷 MPS: γ-mercaptopropyltrimethoxydecane

UPS:γ-脲基丙基三乙氧基矽烷 UPS: γ-ureidopropyl triethoxy decane

ACPS:丙烯醯氧基丙基三甲氧基矽烷 ACPS: propylene methoxy propyl trimethoxy decane

TIPT:四異丙氧基鈦 TIPT: titanium tetraisopropoxide

AN:硝酸鋁九水合物 AN: Aluminum nitrate hexahydrate

EG:乙二醇 EG: ethylene glycol

HG:2-甲基-2,4-戊二醇(別名:己二醇) HG: 2-methyl-2,4-pentanediol (alias: hexanediol)

NMP:N-甲基-2-吡咯啶酮 NMP: N-methyl-2-pyrrolidone

1,3BDO:1,3-丁二醇 1,3BDO: 1,3-butanediol

BCS:2-丁氧基乙醇(別名:丁基賽路蘇) BCS: 2-butoxyethanol (alias: butyl 赛路苏)

EtOH:乙醇 EtOH: ethanol

<合成例1> <Synthesis Example 1> <A1液> <A1 liquid>

於200mL燒瓶中添加AN 12.7g、及水3.0g進行攪拌,將AN溶解。於其中添加EG 73.1g、HG 14.6g、BCS 36.6g、TEOS 15.5g、ACPS 10.5g、MPS 1.5g、及UPS 5.9g,在室溫下攪拌30分鐘。 12.7 g of AN and 3.0 g of water were added to a 200 mL flask, and the mixture was stirred to dissolve AN. EG 73.1 g, HG 14.6 g, BCS 36.6 g, TEOS 15.5 g, ACPS 10.5 g, MPS 1.5 g, and UPS 5.9 g were added thereto, and stirred at room temperature for 30 minutes.

<A2液> <A2 liquid>

於300mL燒瓶中添加TIPT 4.7g、及HG 21.9g,在室溫下攪拌30分鐘。將<A1液>與<A2液>混合,在室溫下攪拌30分鐘而得到溶液(K1)。 TIPT 4.7 g and HG 21.9 g were added to a 300 mL flask, and the mixture was stirred at room temperature for 30 minutes. The <A1 liquid> was mixed with the <A2 liquid>, and stirred at room temperature for 30 minutes to obtain a solution (K1).

<合成例2> <Synthesis Example 2> <B1液> <B1 liquid>

於200mL燒瓶中添加AN 12.7g、及水3.0g進行攪拌,將AN溶解。於其中添加EG 73.1g、BCS 29.2g、1,3BDO 29.2g、TEOS 15.5g、ACPS 10.5g、MPS 1.5g、及UPS 5.9g,在室溫下攪拌30分鐘。 12.7 g of AN and 3.0 g of water were added to a 200 mL flask, and the mixture was stirred to dissolve AN. EG 73.1 g, BCS 29.2 g, 1,3 BDO 29.2 g, TEOS 15.5 g, ACPS 10.5 g, MPS 1.5 g, and UPS 5.9 g were added thereto, and stirred at room temperature for 30 minutes.

<B2液> <B2 liquid>

於300mL燒瓶中添加TIPT 4.7g、及HG 14.6g,在室溫下攪拌30分鐘。將<B1液>與<B2液>混合,在室溫下攪拌30分鐘而得到溶液(K2)。 TIPT 4.7g and HG 14.6g were added to a 300 mL flask, and it stirred at room temperature for 30 minutes. The <B1 liquid> was mixed with the <B2 liquid>, and stirred at room temperature for 30 minutes to obtain a solution (K2).

<合成例3> <Synthesis Example 3> <C1液> <C1 liquid>

於200mL燒瓶中添加AN 12.7g、及水3.0g進行攪拌,將AN溶解。於其中添加EG 7.3g、HG 32.2g、NMP 58.5g、TEOS 15.5g、ACPS 10.5g、MPS 1.5g、及UPS 5.9g,在室溫下攪拌30分鐘。 12.7 g of AN and 3.0 g of water were added to a 200 mL flask, and the mixture was stirred to dissolve AN. EG 7.3 g, HG 32.2 g, NMP 58.5 g, TEOS 15.5 g, ACPS 10.5 g, MPS 1.5 g, and UPS 5.9 g were added thereto, and stirred at room temperature for 30 minutes.

<C2液> <C2 liquid>

於300mL燒瓶中添加TIPT 4.7g、及HG 48.3g,在室溫下攪拌30分鐘。將<C1液>與<C2液>混合,在室溫下攪拌30分鐘而得到溶液(K3)。 TIPT 4.7 g and HG 48.3 g were added to a 300 mL flask, and the mixture was stirred at room temperature for 30 minutes. The <C1 liquid> was mixed with the <C2 liquid>, and stirred at room temperature for 30 minutes to obtain a solution (K3).

<合成例4> <Synthesis Example 4> <D1液> <D1 liquid>

於200mL燒瓶中添加AN 12.7g、及水3.0g進行攪拌,將AN溶解。於其中添加EG 73.1g、HG 17.6g、NMP 29.2g、TEOS 15.5g、ACPS 10.5g、MPS 1.5g、及UPS 5.9g,在室溫下攪拌30分鐘。 12.7 g of AN and 3.0 g of water were added to a 200 mL flask, and the mixture was stirred to dissolve AN. EG 73.1 g, HG 17.6 g, NMP 29.2 g, TEOS 15.5 g, ACPS 10.5 g, MPS 1.5 g, and UPS 5.9 g were added thereto, and stirred at room temperature for 30 minutes.

<D2液> <D2 liquid>

於300mL燒瓶中添加TIPT 4.7g、及HG 26.3g,在室溫下攪拌30分鐘。將<D1液>與<D2液>混合,在室溫下攪拌30分鐘而得到溶液(K4)。 TIPT 4.7 g and HG 26.3 g were added to a 300 mL flask, and the mixture was stirred at room temperature for 30 minutes. The <D1 liquid> was mixed with the <D2 liquid>, and stirred at room temperature for 30 minutes to obtain a solution (K4).

<合成例5> <Synthesis Example 5> <E1液> <E1 liquid>

於200mL燒瓶中添加AN 12.7g、及水3.0g進行攪拌,將AN溶解。於其中添加HG 29.2g、BCS 73.1g、TEOS 15.5g、ACPS 10.5g、MPS 1.5g、及UPS 5.9g,在室溫下攪拌30分鐘。 12.7 g of AN and 3.0 g of water were added to a 200 mL flask, and the mixture was stirred to dissolve AN. HG 29.2 g, BCS 73.1 g, TEOS 15.5 g, ACPS 10.5 g, MPS 1.5 g, and UPS 5.9 g were added thereto, and stirred at room temperature for 30 minutes.

<E2液> <E2 liquid>

於300mL燒瓶中添加TIPT 4.7g、及HG 43.9g,在室溫下攪拌30分鐘。將<E1液>與<E2液>混合,在室溫下攪拌30分鐘而得到溶液(K5)。 TIPT 4.7 g and HG 43.9 g were added to a 300 mL flask, and the mixture was stirred at room temperature for 30 minutes. The <E1 liquid> was mixed with the <E2 liquid>, and stirred at room temperature for 30 minutes to obtain a solution (K5).

<合成例6> <Synthesis Example 6> <F1液> <F1 liquid>

於200mL燒瓶中添加AN 12.7g、水3.0g進行攪拌,將AN溶解。於其中添加EG 29.2g、EtOH 73.1g、TEOS 15.5g、ACPS 10.5g、MPS 1.5g、UPS 5.9g,在室溫下攪拌30分鐘。 12.7 g of AN and 3.0 g of water were added to a 200 mL flask, and the mixture was stirred to dissolve AN. EG 29.2 g, EtOH 73.1 g, TEOS 15.5 g, ACPS 10.5 g, MPS 1.5 g, UPS 5.9 g were added thereto, and stirred at room temperature for 30 minutes.

<F2液> <F2 liquid>

於300mL燒瓶中添加TIPT 4.7g、及EG 43.9g,在室溫下攪拌30分鐘。將<F1液>與<F2液>混合,在室溫下攪拌30分鐘而得到溶液(K6)。 TIPT 4.7 g and EG 43.9 g were added to a 300 mL flask, and the mixture was stirred at room temperature for 30 minutes. The <F1 liquid> was mixed with the <F2 liquid>, and stirred at room temperature for 30 minutes to obtain a solution (K6).

<合成例7> <Synthesis Example 7> <G1液> <G1 liquid>

於200mL燒瓶中添加AN 12.7g、及水3.0g進行攪拌,將AN溶解。於其中添加EG 7.3g、HG 43.9g、NMP 29.2g、TEOS 15.5g、ACPS 10.5g、MPS 1.5g、及UPS 5.9g,在室溫下攪拌30分鐘。 12.7 g of AN and 3.0 g of water were added to a 200 mL flask, and the mixture was stirred to dissolve AN. EG 7.3 g, HG 43.9 g, NMP 29.2 g, TEOS 15.5 g, ACPS 10.5 g, MPS 1.5 g, and UPS 5.9 g were added thereto, and stirred at room temperature for 30 minutes.

<G2液> <G2 liquid>

於300mL燒瓶中添加TIPT 4.7g、及HG 65.8g,在室溫下攪拌30分鐘。將<G1液>與<G2液>混合,在室溫下攪拌30分鐘而得到溶液(K7)。 TIPT 4.7 g and HG 65.8 g were added to a 300 mL flask, and the mixture was stirred at room temperature for 30 minutes. The <G1 liquid> was mixed with the <G2 liquid>, and stirred at room temperature for 30 minutes to obtain a solution (K7).

[表面張力] [Surface Tension]

使用協和界面科學股份有限公司製之AUTO DISPENCER AD-3,以溶液溫度25℃測量。 The AUTO DISPENCER AD-3 manufactured by Kyowa Interface Science Co., Ltd. was used to measure at a solution temperature of 25 °C.

[吐出試驗] [spit test]

使用噴嘴分配器塗佈裝置Quspa-JET(進和股份有限公司製)來進行吐出試驗。吐出條件係以下之表1所示。 The discharge test was performed using a nozzle dispenser coating apparatus Quspa-JET (manufactured by Jinhe Co., Ltd.). The discharge conditions are shown in Table 1 below.

[吐出性] [spit sex]

將所預料之液量安定地被吐出的情況視為○,將比所預料之液量更少,或完全不被不吐出的情況視為×。 The case where the expected amount of liquid is discharged stably is regarded as ○, and the case where the amount of liquid is expected to be less than the expected amount of liquid or not to be discharged at all is regarded as ×.

[Dot徑] [Dot Trail]

將上述液滴塗佈於無鹼玻璃上,其後,利用熱風循環式烘箱,以80℃、乾燥5分鐘之後,利用另一熱風循環式烘箱以230℃、燒成30分鐘。測量所完成之被膜的直徑。 The above droplets were applied to an alkali-free glass, and then dried at 80 ° C for 5 minutes in a hot air circulating oven, and then fired at 230 ° C for 30 minutes in another hot air circulating oven. The diameter of the film to be completed was measured.

分別將所得到的溶液K1~K4作為實施例1~4,溶液 K5~K7作為比較例1~3,評估上述項目。 The obtained solutions K1 to K4 were used as the solutions of Examples 1 to 4, respectively. K5~K7 were used as comparative examples 1 to 3 to evaluate the above items.

將所得到的結果示於表2。 The results obtained are shown in Table 2.

依據表2可知:實施例1~4係得到吐出性,且可將Dot徑控制得較小。 According to Table 2, in Examples 1 to 4, the discharge property was obtained, and the Dot diameter was controlled to be small.

於比較例1中,由於並未含有特定有機溶劑,因此無法得到吐出性,亦無法控制Dot徑。 In Comparative Example 1, since the specific organic solvent was not contained, the discharge property could not be obtained, and the Dot diameter could not be controlled.

於比較例2中,雖含有30質量%以上之特定有機溶劑,但由於表面張力低於28mN/m,因此無法得到吐出性,亦無法控制Dot徑。 In Comparative Example 2, although the specific organic solvent was contained in an amount of 30% by mass or more, the surface tension was less than 28 mN/m, so that the discharge property could not be obtained and the Dot diameter could not be controlled.

於比較例3中,雖表面張力為28mN/m以上,但由於未含有30質量%以上之特定有機溶劑,因此雖可得到吐出性,但無法控制Dot徑。 In Comparative Example 3, although the surface tension was 28 mN/m or more, since the specific organic solvent was not contained in an amount of 30% by mass or more, the discharge property was not obtained, but the Dot diameter could not be controlled.

由此可知:藉由金屬氧化物被膜用塗佈液之溶劑組成為含有30質量%以上之特定有機溶劑,且表面張力為28mN/m,而可得到吐出性,且可塗佈微細的圖型。 From this, it is understood that the solvent composition of the coating liquid for a metal oxide film is 30% by mass or more of a specific organic solvent, and the surface tension is 28 mN/m, whereby discharge property can be obtained, and a fine pattern can be applied. .

[產業上之可利用性] [Industrial availability]

本發明之金屬氧化物被膜形成用塗佈液,係可利用於Dot徑小的微細圖型之金屬氧化物被膜之形成。 The coating liquid for forming a metal oxide film of the present invention can be used for forming a fine metal oxide film having a small Dot diameter.

另外,在此引用2012年10月3日所申請之日本專利申請2012-221607號說明書、申請專利範圍、及摘要之全部內容,作為本發明之說明書的揭示,而採用者。 In addition, the entire contents of the specification, the patent application, and the abstract of Japanese Patent Application No. 2012-221607, filed on Jan.

Claims (11)

一種金屬氧化物被膜形成用塗佈液,其係使用於以微細液滴吐出裝置所進行的塗佈,其特徵為含有以下述一般式(I)所表示之第1金屬烷氧化物、以下述一般式(III)所表示之第2金屬烷氧化物、以下一般式(II)所表示之金屬鹽、有機溶劑、水、以及析出抑制劑,前述第2金屬烷氧化物的含量,相對於全部金屬烷氧化物為15莫耳%以上,於全部有機溶劑中含有45質量%以上由乙二醇、丙二醇、1,2-丁二醇、1,3-丁二醇、1,4-丁二醇、1,2-戊二醇、1,3-戊二醇、1,4-戊二醇、1,5-戊二醇、2,4-戊二醇、2,5-己二醇、二乙二醇、二丙二醇、三乙二醇、及N-甲基吡咯啶酮所成之群中選出的至少1種,且塗佈液表面張力為28mN/m以上;M1(OR1)n (I)(M1係表示由矽、鈦、鉭、鋯、硼、鋁、鎂及鋅所成之群中選出的至少1種之金屬;R1係表示碳數1~5之烷基或乙醯氧基;n係表示2~5之整數)M2(X)k (II)(M2係表示由鋁、銦、鋅、鋯、鉍、鑭、鉭、釔及鈰所成之群中選出的至少1種之金屬;X係表示鹽酸、硝酸、硫酸、乙酸、草酸、胺磺酸、磺酸、乙醯乙酸或乙醯丙酮酸之殘基、或者此等之鹼性鹽;k係表示M2之價數)R2 1M3(OR3)m-1 (III) (M3係表示由矽、鈦、鉭、鋯、硼、鋁、鎂及鋅所成之群中選出的至少1種之金屬;R2係表示氫原子或氟原子,或者可以鹵原子、乙烯基、環氧丙氧基、巰基、甲基丙烯醯氧基、丙烯醯氧基、異氰酸酯基、胺基或脲基取代,且可具有雜原子的碳數1~20之烴基;R3係表示碳數1~5之烷基;m係表示2~5之整數;l係當m為3時為1或2,當m為4時為1~3之整數,當m為5時為1~4之整數)。 A coating liquid for forming a metal oxide film, which is used for coating by a fine droplet discharge device, and is characterized by containing a first metal alkoxide represented by the following general formula (I), and the following a second metal alkoxide represented by the general formula (III), a metal salt represented by the following general formula (II), an organic solvent, water, and a precipitation inhibitor, and the content of the second metal alkoxide is relative to all The metal alkoxide is 15 mol% or more, and is contained in all organic solvents in an amount of 45 mass% or more from ethylene glycol, propylene glycol, 1,2-butanediol, 1,3-butanediol, and 1,4-butane. Alcohol, 1,2-pentanediol, 1,3-pentanediol, 1,4-pentanediol, 1,5-pentanediol, 2,4-pentanediol, 2,5-hexanediol, At least one selected from the group consisting of diethylene glycol, dipropylene glycol, triethylene glycol, and N-methylpyrrolidone, and the surface tension of the coating liquid is 28 mN/m or more; M 1 (OR 1 ) n (I) (M 1 represents at least one metal selected from the group consisting of ruthenium, titanium, iridium, zirconium, boron, aluminum, magnesium, and zinc; and R 1 represents an alkyl group having 1 to 5 carbon atoms; Or ethoxylated; n is an integer from 2 to 5) M 2 (X) k (II (M 2 represents at least one metal selected from the group consisting of aluminum, indium, zinc, zirconium, hafnium, tantalum, niobium, tantalum, and niobium; and X system represents hydrochloric acid, nitric acid, sulfuric acid, acetic acid, oxalic acid, a residue of an amine sulfonic acid, a sulfonic acid, an acetamidine acetic acid or an acetylpyruvate, or a basic salt thereof; k is a valence of M 2 ) R 2 1 M 3 (OR 3 ) m-1 (III (M 3 represents at least one metal selected from the group consisting of ruthenium, titanium, iridium, zirconium, boron, aluminum, magnesium, and zinc; R 2 represents a hydrogen atom or a fluorine atom, or may be a halogen atom, a vinyl group, a glycidoxy group, a decyl group, a methacryloxy group, an acryloxy group, an isocyanate group, an amine group or a ureido group, and may have a hydrocarbon atom having 1 to 20 carbon atoms; R 3 system An alkyl group having a carbon number of 1 to 5; m is an integer of 2 to 5; l is 1 or 2 when m is 3, an integer of 1 to 3 when m is 4, and 1 when m is 5. An integer of ~4). 如請求項1所記載之金屬氧化物被膜形成用塗佈液,其中前述析出抑制劑係由N-甲基-吡咯啶酮、乙二醇、二甲基甲醯胺、二甲基乙醯胺、二乙二醇、丙二醇、己二醇及此等之衍生物所成之群中選出的至少1種。 The coating liquid for forming a metal oxide film according to claim 1, wherein the precipitation inhibitor is N-methyl-pyrrolidone, ethylene glycol, dimethylformamide, dimethylacetamide. At least one selected from the group consisting of diethylene glycol, propylene glycol, hexanediol, and derivatives thereof. 如請求項1或2項所記載之金屬氧化物被膜形成用塗佈液,其中金屬鹽之金屬原子的莫耳數(M2)、與金屬烷氧化物之金屬原子之合計的莫耳數(M)之莫耳比為0.01≦M2/M≦0.7。 The coating liquid for forming a metal oxide film according to claim 1 or 2, wherein the molar number (M 2 ) of the metal atom of the metal salt and the molar number of the metal atom of the metal alkoxide ( The molar ratio of M) is 0.01 ≦ M 2 / M ≦ 0.7. 如請求項1或2所記載之金屬氧化物被膜形成用塗佈液,其中第1金屬烷氧化物係矽烷氧化物或其部分縮合物、與鈦烷氧化物之混合物。 The coating liquid for forming a metal oxide film according to claim 1 or 2, wherein the first metal alkoxide is a decane oxide or a partial condensate thereof and a mixture with a titanium alkoxide. 如請求項1或2所記載之金屬氧化物被膜形成用塗佈液,其中金屬鹽係金屬硝酸鹽、金屬硫酸鹽、金屬乙酸鹽、金屬氯化物、金屬草酸鹽、金屬胺磺酸鹽、金屬磺酸鹽、金屬乙醯乙酸鹽、金屬乙醯丙酮酸或此等之鹼性鹽。 The coating liquid for forming a metal oxide film according to claim 1 or 2, wherein the metal salt is a metal nitrate, a metal sulfate, a metal acetate, a metal chloride, a metal oxalate, a metal amine sulfonate, a metal sulfonate, a metal acetoacetate, a metal acetoacetate or an alkaline salt thereof. 如請求項1或2所記載之金屬氧化物被膜形成用塗 佈液,其中第1金屬烷氧化物係矽烷氧化物或其部分縮合物、與鈦烷氧化物之混合物,有機溶劑係包含烷二醇類或其之單醚衍生物。 The coating for forming a metal oxide film as described in claim 1 or 2 The cloth liquid, wherein the first metal alkoxide is a decane oxide or a partial condensate thereof, and a mixture with a titanium alkoxide, and the organic solvent contains an alkanediol or a monoether derivative thereof. 一種金屬氧化物被膜,其係將如請求項1~6中任1項所記載之金屬氧化物被膜形成用塗佈液,以微細液滴吐出裝置進行塗佈所得。 A metal oxide film obtained by coating a coating liquid for forming a metal oxide film according to any one of claims 1 to 6 by a fine droplet discharge device. 一種金屬氧化物被膜,其係將如請求項1~6中任1項所記載之金屬氧化物被膜形成用塗佈液,藉由噴嘴分配器進行塗佈所得。 A metal oxide film obtained by coating a coating liquid for forming a metal oxide film according to any one of claims 1 to 6 by a nozzle dispenser. 一種金屬氧化物被膜,其係將如請求項1~6中任1項所記載之金屬氧化物被膜形成用塗佈液,藉由壓電式噴嘴分配器進行塗佈所得。 A metal oxide film obtained by coating a coating liquid for forming a metal oxide film according to any one of claims 1 to 6 by a piezoelectric nozzle dispenser. 一種金屬氧化物被膜之形成方法,其係將如請求項1~6中任1項所記載之金屬氧化物被膜形成用塗佈液,使用噴嘴分配器,來形成電極交叉部微細絕緣層。 A method for forming a metal oxide film, which is a coating liquid for forming a metal oxide film according to any one of claims 1 to 6, which uses a nozzle dispenser to form a fine insulating layer at the electrode intersection portion. 一種金屬氧化物被膜之形成方法,其係將如請求項1~6中任1項所記載之金屬氧化物被膜形成用塗佈液,使用壓電式噴嘴分配器,來形成電極交叉部微細絕緣層。 A method for forming a metal oxide film, which is a coating liquid for forming a metal oxide film according to any one of claims 1 to 6, which uses a piezoelectric nozzle dispenser to form a fine insulation of an electrode intersection portion. 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