WO2012073754A1 - Procédé de fabrication de film à motifs, film à motifs, substrat de filtre coloré, dispositif d'affichage à cristaux liquide, et dispositif émetteur de lumière - Google Patents

Procédé de fabrication de film à motifs, film à motifs, substrat de filtre coloré, dispositif d'affichage à cristaux liquide, et dispositif émetteur de lumière Download PDF

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Publication number
WO2012073754A1
WO2012073754A1 PCT/JP2011/076867 JP2011076867W WO2012073754A1 WO 2012073754 A1 WO2012073754 A1 WO 2012073754A1 JP 2011076867 W JP2011076867 W JP 2011076867W WO 2012073754 A1 WO2012073754 A1 WO 2012073754A1
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Prior art keywords
ink
substrate
application
color filter
color
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PCT/JP2011/076867
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English (en)
Japanese (ja)
Inventor
敬太 片寄
中野　貴之
村上　泰敏
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シャープ株式会社
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Publication of WO2012073754A1 publication Critical patent/WO2012073754A1/fr

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • H10K71/135—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30—Devices specially adapted for multicolour light emission
    • H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels

Definitions

  • the present invention relates to a pattern film manufacturing method, a pattern film, a color filter substrate, a liquid crystal display device, and a light emitting device. More specifically, the present invention relates to a method for manufacturing a pattern film made of a color material from an ink containing the color material in a plurality of steps using an inkjet method, a pattern film, a color filter substrate, a liquid crystal display device, and a light emitting device.
  • the ink jet method is widely used in various applications as a method for efficiently producing a pattern film on a circuit board or the like. Among them, it is frequently used for the production of light emitters in self-luminous displays such as color filters, plasma panels and organic EL display devices in liquid crystal display panels and projection elements of projectors. Further, it may be widely applied to products in which a film can be formed by an inkjet device such as a thin film of an electronic component such as a solar cell, a printed matter such as a large poster or a large curtain, or a coating of a building material.
  • a pattern film is formed on an electronic device substrate by drawing a pattern by ejecting minute ink droplets from an ink jet apparatus and drying the pattern.
  • a pixel region of each color component is divided into a plurality of pixel regions partitioned by a plurality of partitions in an in-plane direction within a plane on the substrate.
  • a method of manufacturing a light emitting device including a method of forming a light emitting layer by sequentially applying each color component to a first coating solution in which a first color component is dissolved is applied to a pixel region of the first color component. And applying a second coating solution in which the second color component is dissolved to the pixel region of the second color component, wherein the first coating solution and the second coating solution contain at least one common solvent. And in the step of applying the coating liquid for each color component, the amount of the common solvent to be applied to the unit area from the coating liquid of the color component in which the amount of the common solvent to be applied to the unit area is relatively large. Relatively little color Performing the coating in the order of the coating liquid, a method of manufacturing a light emitting apparatus is disclosed (e.g., see Patent Document 1.).
  • Possible causes of this flicker are as follows. That is, (1) after forming the pattern film by drying the ink, the film thickness difference (liquid crystal) between RGB (between different color picture elements) and / or between the same color picture elements as shown in FIG. (Cell thickness difference in the display panel), and the alignment of the liquid crystal molecules is different between the picture elements due to the difference in film thickness, such as a portion in which the difference in film thickness is partially defective in alignment (2) In accordance with the above (1), the luminance changes between adjacent pixels and the screen flickers visually.
  • the film thickness difference liquid crystal
  • the obtained color filter substrate is between RGB and between pixels of the same color.
  • a film thickness difference of the color filter occurs.
  • the film thickness should be uniform when the light emitter is applied. Is required.
  • the method of manufacturing a pattern film using a color material from an ink containing the color material in a plurality of steps using the conventional inkjet method causes unevenness in the thickness of the pattern film, and this is caused by the unevenness. Since display quality deteriorates, there is room for improvement in terms of display quality.
  • the present invention has been made in view of the above situation, and provides a pattern film manufacturing method, a pattern film, a color filter substrate, a liquid crystal display device, and a light emitting device that can sufficiently improve display quality in a display device or a light emitting device. It is for the purpose.
  • the present inventors have made various studies on a liquid crystal display device and a light emitting device that can sufficiently improve the display quality of the display device or the light emitting device. Attention was paid to the fact that various problems occurred when applied to liquid crystal display devices and light-emitting devices due to the difference in thickness.
  • a difference in film thickness between RGB (between different picture elements) or between adjacent color pixels such as red and blue adjacent to each other gives rise to a cell thickness difference in the liquid crystal display panel. Since the difference also changes, a difference in response speed occurs, and as a result, a flicker is seen on the display image.
  • the display quality deteriorates due to a difference in film thickness in the light emitter itself.
  • the cause of the difference in film thickness is the difference in the drying history of each picture element in multiple drawing, that is, in the process of performing the first application, drying, second application, and drying in this order.
  • a pattern film for example, a color filter or a light emitter
  • the first coating part is dried twice
  • the second coating part is dried once, and in other words, the difference in drying time.
  • Different volumetric variation of wood contraction difference between the final thickness was found that had occurred.
  • the second coating amount is changed as compared with the first coating amount in accordance with the volume change such as the shrinkage of the coloring material due to drying, and the final film thickness of RGB is made uniform so that the display on the display device or the light emitting device It has been found that the display quality can be improved by suppressing the flicker, and the present invention has been achieved by conceiving that the above problems can be solved brilliantly.
  • the present invention is a method for producing a pattern film made of a color material from an ink containing the color material in a plurality of steps using an ink jet method, wherein the production method applies the ink using the ink jet method.
  • the ink applied by the second application step is a pattern film manufacturing method in which the mass of the color material is smaller than that of the ink applied by the first application step. is there.
  • the pattern film obtained by the manufacturing method of the present invention is applied to a display device of three primary colors (when used as a color filter of a liquid crystal display device, a light emitting layer of a light emitting device, etc.), three colors are applied by an ink jet device.
  • a uniform pattern film at the time when the three-color coating is completed by giving a liquid amount difference between the first coating amount and the second coating amount according to the volume change such as the shrinkage of the coloring material by the drying step. It can be made thick (color film thickness).
  • the amount of decrease in film thickness after the drying step for example, a heating step such as baking [baking]
  • the set film thickness can be changed according to each ink type.
  • the coating process may be performed before the first coating process, or the coating process may be performed before the first drying process.
  • the color material usually shrinks and the film thickness is reduced accordingly (for example, it is reduced by 5 to 7% by baking at 240 ° C. for 40 minutes depending on the type of color material) Will be).
  • the final film thickness after the completion of the drying step can be made uniform according to the above form.
  • the mass of the color material contained in the ink applied by the second application step is one drying step (first drying) with respect to the mass of the color material contained in the ink applied by the first application step. It is particularly preferable that the film thickness is reduced by the rate at which the film thickness decreases due to the shrinkage of the color material in the step).
  • the mass of the color material contained in the ink applied by the second application step Is reduced by 5 to 7% by mass with respect to 100% by mass of the color material contained in the ink in the first application step from the amount of the color material contained in the ink in the first application step.
  • a film thickness can be made more uniform.
  • the form with less mass of the color material in the present invention is usually a form with less ink application amount.
  • the effect of the present invention can also be exerted when the ink applied in the second application step has a smaller color material volume than the ink applied in the first application step.
  • the ink applied by the second application step forms the same color film, it is possible to simplify the present invention by using the same color material as the ink applied by the first application step. It is suitable at the point which can be applied to.
  • the change of the color film thickness in the panel is simpler than the photolithography method. Therefore, by changing the film thickness for each pixel, it is possible to increase the swing width for display control for each pixel. Therefore, it is possible to make a stereoscopic image stand out by the panel drive and the panel structure.
  • the pattern film and color filter substrate of the present invention can exhibit the above-described effects of the present invention in a liquid crystal display device including the same.
  • the present invention is also a light emitting device in which the pattern film of the present invention is provided as a light emitting element.
  • the present invention can be applied not only to liquid crystal panels but also to products for which films are formed by other display processes and ink jet devices such as organic EL display panels. That is, the pattern film of the present invention is a pattern for improving the display quality of a color filter of a liquid crystal display device, a light emitting body in a self-luminous display such as a plasma panel or an organic EL display device, or a projection element of a projector.
  • the present invention can be suitably applied to various uses that require uniformity of the film thickness.
  • the pattern film of the present invention is applied to the light-emitting body in the 3D light-emitting device.
  • the pattern film of the present invention can exhibit the above-described effects of the present invention in a light-emitting device including the pattern film.
  • the manufacturing process of the pattern film of the present invention can be used for thin film fixing of electronic parts such as solar cells, printed matter using an ink jet (large poster, large curtain, etc.), painting of building materials, and the like.
  • the structure of the pattern film manufacturing method, pattern film, color filter substrate, liquid crystal display device and light-emitting device of the present invention is particularly limited by other components as long as such components are formed as essential.
  • other methods ordinarily used in a pattern film manufacturing method, a pattern film, a color filter substrate, a liquid crystal display device, and a light-emitting device can be applied as appropriate.
  • the pattern film manufacturing method the pattern film, the color filter substrate, the liquid crystal display device and the light emitting device of the present invention, the display quality in the display device or the light emitting device can be sufficiently improved.
  • FIG. 3 is a schematic cross-sectional view of the substrate after each step of the method for manufacturing the color filter substrate of Embodiment 1.
  • FIG. 3 is a schematic plan view of a substrate showing ink applied in a staggered pattern during the first application in the first embodiment.
  • FIG. 3 is a schematic plan view of a substrate showing ink applied in a staggered pattern during the second application in the first embodiment.
  • 3 is a schematic plan view of a color filter substrate when ink application is completed in Embodiment 1.
  • FIG. 1 is a schematic cross-sectional view of a liquid crystal display device including a color filter substrate according to Embodiment 1.
  • FIG. 10 is a schematic cross-sectional view of a substrate after each step of a color filter substrate manufacturing method according to a modified example of Embodiment 1.
  • FIG. 6 is a schematic plan view of a substrate showing ink drawn in a stripe shape during the first application in a modification of the first embodiment.
  • FIG. 6 is a schematic plan view of a substrate showing ink drawn in a stripe shape at the time of second application in a modification of the first embodiment.
  • FIG. 6 is a schematic plan view of a substrate when ink application is completed in a modification of the first embodiment.
  • FIG. 6 is a schematic cross-sectional view of a substrate after each step of the method for manufacturing a color filter substrate of Embodiment 2.
  • FIG. 6 is a schematic plan view of a substrate showing ink drawn in a stripe shape during the first application in a modification of the first embodiment.
  • FIG. 6 is a schematic plan view of a substrate showing ink drawn in a stripe shape at the time of second application in
  • FIG. 6 is a schematic plan view of a substrate showing ink applied in a staggered pattern at the first application in Embodiment 2.
  • FIG. 6 is a schematic plan view of a substrate showing ink applied in a staggered pattern at the time of second application in Embodiment 2.
  • 6 is a schematic plan view of a color filter substrate when ink application is completed in Embodiment 2.
  • FIG. 10 is a schematic cross-sectional view of a substrate after each step of a method for manufacturing a color filter substrate according to a modified example of Embodiment 2.
  • FIG. 10 is a schematic plan view of a substrate showing ink drawn in a stripe shape during the first application in a modification of the second embodiment.
  • FIG. 10 is a schematic plan view of a substrate showing ink drawn in a stripe shape during the second application in a modification of the second embodiment.
  • FIG. 10 is a schematic plan view of a substrate when ink application is completed in a modification of the second embodiment. It is a cross-sectional schematic diagram of the substrate after each step of the manufacturing method of the color filter substrate of Embodiment 3.
  • FIG. 6 is a schematic plan view of a substrate showing ink drawn in a stripe shape at the time of first application in Embodiment 3.
  • FIG. 10 is a schematic plan view of a substrate showing ink drawn in a stripe shape at the time of second application in Embodiment 3. 6 is a schematic plan view of a substrate when ink application is completed in Embodiment 3.
  • FIG. 10 is a schematic plan view of a substrate showing ink drawn in a stripe shape during the second application in a modification of the second embodiment.
  • FIG. 10 is a schematic plan view of a substrate when ink application is completed in
  • the ink includes a color material, and may further include a solvent or the like for viscosity adjustment.
  • the color material may contain components such as an additive for forming a pattern film in addition to pigment and resin as essential components.
  • drying means volatilizing a volatile component such as a solvent in the ink and / or curing the resin component in the ink to solidify the ink.
  • a drying process means a baking (baking) process in this embodiment, the process (heating process etc.) for drying can be used suitably in this invention.
  • the pattern film is formed in the order of first application, first drying, second application, and second drying.
  • a pixel refers to the smallest unit that can realize a function necessary for display.
  • one pixel is constituted by a total of three dots of consecutive RGB.
  • a picture element is an element constituting each pixel and refers to a minimum unit that is independently driven. In the three-primary-color display device, it refers to one dot for each RGB.
  • FIG. 1 is a schematic cross-sectional view of a substrate after each step of the color filter substrate manufacturing method of Embodiment 1.
  • a substrate hereinafter also referred to as substrate 1 ⁇ / b> A. The same applies to other symbols
  • substrate 1 ⁇ / b> A on which the reference numeral (1 ⁇ / b> A) is written on the right side is applied by the ink jet method for the first time (first application step).
  • substrate just after performing is shown typically.
  • the substrate 1B schematically shows a cross section of the substrate immediately after the first drying (first drying step).
  • Substrate 1C changed the mass of the color material contained in the ink at the time of the first application by the inkjet method (in other words, the amount of ink itself was changed at the same rate).
  • coating process is shown typically.
  • FIG. 1 shows a state in which the application amount is reduced from the first time and G (green), R (red), B (blue), and G (green) are newly applied every other picture element from the left side. Yes.
  • the ratio at which the coating amount is reduced can be appropriately set according to the ratio at which the color material undergoes volume change such as shrinkage by one drying (firing).
  • Substrate 1D schematically shows a cross section of the color filter substrate after the second drying (second drying step). The black-colored portion represents the bank material of the color filter substrate. The same applies to other drawings.
  • the mass of the color material contained in the green ink newly applied on the substrate 1C is less than the mass of the color material contained in the green ink applied on the substrate 1A.
  • the mass of the color material contained in the green ink applied on the substrate 1A is 100% by mass, it is reduced by 5 to 7% by mass.
  • the ink applied on the substrate 1A goes through two drying steps, but the ink newly applied on the substrate 1C only goes through one drying step and is applied on the substrate 1A.
  • the color material of the pattern film formed from the green ink changes in volume more than the pattern film formed from the green ink applied on the substrate 1C. For example, it shrinks by 5-7%.
  • the film thickness (final film thickness) of the color filter is sufficiently uniform. Thereby, the flicker in the liquid crystal display panel can be sufficiently suppressed, and the display quality can be improved.
  • FIG. 2 is a schematic plan view of a substrate showing ink applied (drawn) in a staggered pattern at the first application (first inkjet drawing) in the first embodiment.
  • FIG. 3 is a schematic plan view of the substrate showing the ink applied in a staggered pattern during the second application in the first embodiment. In FIG. 3, ink applied at the first application is not shown.
  • FIG. 4 is a schematic plan view of the color filter substrate when ink application is completed in the first embodiment.
  • the ink is drawn in a staggered pattern, dried, and then applied to the remaining portions where the ink is not applied. This is dried to form a pattern film.
  • Examples of the flow for applying in a staggered pattern include, for example, the first inkjet drawing, the first firing (240 ° C., 40 minutes), the second inkjet drawing, and the second firing (240 ° C., 40 minutes). Can be performed in this order.
  • the ink drawn in the first ink jet drawing passes through the main baking twice, and is drawn in the second ink jet drawing. The ink that has been subjected to the main baking only once.
  • the amount of film thickness reduction due to the shrinkage of the color material varies depending on the type of ink, and the coating amount (that is, the amount of color material in the ink) can be adjusted as appropriate according to the amount of film thickness decrease.
  • the film thickness is reduced by 5% to 7% by one main firing.
  • the application amount of the second ink jet drawing is reduced by 5 to 7% by mass with respect to 100% by mass of the first application, although it depends on the type of ink.
  • the volume may decrease due to volatilization of the volatile component during the first drying (baking) of the applied ink.
  • the film thickness reduction amount does not include the volume reduction amount from the ink liquid to the pattern film due to the volatilization of the solvent, but means only the film thickness reduction amount due to the contraction of the color material.
  • the coating amount of the second drawing from about 5% to 7%, the first and second film thicknesses are sufficiently uniformed.
  • the set film thickness may be changed according to each ink type.
  • FIG. 5 is a schematic cross-sectional view of a liquid crystal display device including the color filter substrate according to the first embodiment. Since the film thickness is sufficiently uniformed, the cell thickness for each picture element is sufficiently uniformed. As a result, luminance variation between pixels can be sufficiently suppressed, and a liquid crystal display device excellent in display quality can be obtained.
  • FIG. 6 is a schematic cross-sectional view of the substrate after each step of the color filter substrate manufacturing method according to the modification of the first embodiment.
  • ink is applied in a staggered pattern using an inkjet method for each pixel.
  • substrate 1A' the substrate on the right side
  • a cross section of the substrate is schematically shown.
  • Substrate 1B ′ schematically shows a cross section of the substrate immediately after the first drying.
  • Substrate 1C ′ has a second application (first ink volume is changed at the same rate) by changing the mass of the color material contained in the ink at the first application by the inkjet method (in other words, the ink liquid amount itself is also changed at the same rate).
  • 2 schematically shows a cross section of the substrate immediately after performing the (2 coating step).
  • FIG. 6 shows a state in which the application amount is reduced from the first time and R (red), G (green), and B (blue) are newly applied from the left side.
  • the ratio at which the coating amount is reduced can be appropriately set according to the ratio at which the color material undergoes volume change such as shrinkage by one firing.
  • Substrate 1D ′ schematically shows a cross-section of the color filter substrate after the second drying.
  • FIG. 7 is a schematic plan view of a substrate showing ink drawn in a stripe shape at the first application (first inkjet drawing) in the modification of the first embodiment.
  • FIG. 8 is a schematic plan view of a substrate showing ink drawn in a stripe shape during the second application in the modification of the first embodiment. In FIG. 8, ink applied at the first application is not shown.
  • FIG. 9 is a schematic plan view of the substrate when application of ink is completed in the modification of the first embodiment.
  • the ink is drawn in stripes, dried, and then applied to the remaining portions where the ink is not applied. This is dried to form a pattern film. Even in such a form, similarly to the first embodiment, the luminance variation can be sufficiently suppressed, and a liquid crystal display device excellent in display quality can be obtained.
  • FIG. 10 is a schematic cross-sectional view of a substrate after each step of the color filter substrate manufacturing method of Embodiment 2.
  • the substrate on which the symbol (2A) is written on the right side (hereinafter also referred to as substrate 2A. The same applies to other symbols) is the substrate immediately after the first application by the inkjet method.
  • the cross section of is schematically shown.
  • the substrate 2B schematically shows a cross section of the substrate immediately after the first drying.
  • the substrate 2C was subjected to the second application by changing the ink thickness (the amount of ink color material) compared to the ink thickness (the amount of ink color material) at the first application by the inkjet method.
  • substrate just after is shown typically.
  • FIG. 10 shows a state in which the application amount is reduced in the second time and G (green), Y (yellow), G (green), and Y (yellow) are newly applied every other picture element from the left side. .
  • the ratio at which the coating amount (the coating amount of the color material) is reduced can be appropriately set according to the ratio at which the color material undergoes volume change such as shrinkage by one firing.
  • the substrate 2D schematically shows a cross section of the color filter substrate after the second drying.
  • the amount of color material in the ink is decreasing.
  • the ink applied on the substrate 2A goes through two drying steps, but the ink newly applied on the substrate 2C only goes through one drying step and is applied on the substrate 2A.
  • the volume of the color material changes more in the ink than in the ink applied on the substrate 2C. For example, it shrinks by 5-7%.
  • the film thickness (final film thickness) of the color filter is sufficiently uniform. Thereby, the flicker in the liquid crystal display panel can be sufficiently suppressed, and the display quality can be improved.
  • FIG. 11 is a schematic plan view of a substrate showing ink applied (drawn) in a staggered pattern at the time of first application (inkjet drawing first time) in the second embodiment.
  • FIG. 12 is a schematic plan view of a substrate showing ink applied in a staggered pattern during the second application in the second embodiment. In FIG. 12, the ink applied at the first application is not shown.
  • FIG. 13 is a schematic plan view of the color filter substrate when ink application is completed in the second embodiment. As described above, in the second embodiment, in order to sufficiently prevent color mixture, the ink is drawn in a staggered pattern, dried, and then applied to the remaining portions where the ink is not applied. This is dried to form a pattern film.
  • the first inkjet drawing, the first firing (240 ° C., 40 minutes), the second inkjet drawing, the second firing, as in the first embodiment. (240 ° C., 40 minutes) can be performed in this order.
  • the ink drawn in the first ink jet drawing passes through the main baking twice, and is drawn in the second ink jet drawing. The ink that has been subjected to the main baking only once.
  • the amount of film thickness reduction due to color material shrinkage varies depending on the type of ink, and the amount of color material applied can be adjusted appropriately according to the amount of film thickness reduction.
  • the film thickness is reduced by 5% to 7% by one main firing.
  • the amount of the color material applied for the second ink jet drawing is 5% to 100% by mass of the first color material application amount, depending on the ink type. Reduce by 7%.
  • the coating amount of the second drawing by 5% to 7%, the first and second film thicknesses are sufficiently uniformed.
  • FIG. 14 is a schematic cross-sectional view of a substrate after each step of a color filter substrate manufacturing method according to a modification of the second embodiment.
  • ink is drawn in a stripe shape using an ink jet method.
  • a substrate (2A ′) written on the lower side thereof hereinafter also referred to as substrate 2A ′; the same applies to other symbols
  • substrate 2A ′ was applied for the first time by the ink jet method.
  • substrate just after is shown typically.
  • the substrate 2B ′ schematically shows a cross section of the substrate immediately after the first drying.
  • FIG. 15 is a schematic plan view of a substrate showing ink drawn in a stripe shape at the first application (inkjet drawing first time) in the modification of the second embodiment.
  • FIG. 16 is a schematic plan view of a substrate showing ink drawn in a stripe shape during the second application in a modification of the second embodiment. In FIG. 16, the ink applied at the first application is not shown.
  • FIG. 17 is a schematic plan view of the substrate when the application of ink is completed in the modification of the second embodiment.
  • the ink is drawn in stripes, dried, and then applied to the remaining portions where the ink is not applied. This is dried to form a pattern film. Even in such a form, similarly to the second embodiment, the luminance variation can be sufficiently suppressed, and a liquid crystal display device excellent in display quality can be obtained.
  • FIG. 18 is a schematic cross-sectional view of a substrate after each step of the color filter substrate manufacturing method of Embodiment 3.
  • the substrate (3A) indicated below (hereinafter also referred to as substrate 3A. The same applies to other symbols) is provided immediately after the first application by the ink jet method.
  • substrate is shown typically.
  • the substrate 3B schematically shows a cross section of the substrate immediately after the first drying.
  • the substrate 3C was immediately after the second application with the ink thickness (amount of ink color material) and the ink thickness (amount of ink color material) changed at the first application by the inkjet method.
  • substrate is shown typically.
  • the coating amount is reduced at the second time, and G (green), M (magenta), C (cyan), G (green), M (magenta), C (cyan) are newly added every other picture element from the left side. ) Is shown.
  • the ratio at which the coating amount (the coating amount of the color material) is reduced can be appropriately set according to the ratio at which the color material undergoes volume change such as shrinkage by one firing.
  • Substrate 3D schematically shows a cross section of the color filter substrate after the second drying.
  • the green color newly applied on the substrate 3 ⁇ / b> C is larger than the color material amount of the red ink applied on the substrate 3 ⁇ / b> A, the color material amount of the blue ink, or the color material amount of the yellow ink.
  • the amount of the ink color material, the color material amount of the magenta ink, or the color material amount of the cyan ink is reduced.
  • the ink applied on the substrate 3A undergoes two drying steps, but the ink newly applied on the substrate 3C only passes one drying step and is applied on the substrate 3A.
  • the color material changes in volume more than the ink applied on the substrate 3C. For example, it shrinks by 5-7%.
  • the film thickness (final film thickness) of the color filter is sufficiently uniform. Thereby, the flicker in the liquid crystal display panel can be sufficiently suppressed, and the display quality can be improved.
  • FIG. 19 is a schematic plan view of a substrate showing ink drawn in a stripe shape during the first application (inkjet drawing first time) in the third embodiment.
  • FIG. 20 is a schematic plan view of a substrate showing ink drawn in a stripe shape during the second application in the third embodiment. In FIG. 20, ink applied at the first application is not shown.
  • FIG. 21 is a schematic plan view of a substrate when ink application is completed in the third embodiment.
  • the ink is drawn in stripes, dried, and then applied to the remaining portions where the ink is not applied.
  • the pattern film is formed by drying.
  • the flow of drawing in a stripe shape for example, the first ink jet drawing, the first firing (240 ° C., 40 minutes), the ink jet drawing, as in the flow of applying in a staggered pattern (staggered drawing) in the first embodiment.
  • the second and final firing (240 ° C., 40 minutes) can be performed in this order.
  • the ink drawn in the first ink jet drawing passes through the main baking twice and is drawn in the second ink jet drawing. The ink that has been subjected to the main baking only once.
  • the amount of film thickness reduction due to color material shrinkage varies depending on the type of ink, and the amount of color material applied can be adjusted appropriately according to the amount of film thickness reduction.
  • the film thickness is reduced by 5% to 7% by one main firing.
  • the amount of the color material applied for the second ink jet drawing is 5% with respect to 100% by mass of the color material applied for the first time, depending on the type of ink. Reduce by ⁇ 7%.
  • the first and second film thicknesses are sufficiently uniformed.
  • the cell thickness for each pixel is sufficiently uniformed as in the first embodiment.
  • luminance variation between pixels can be sufficiently suppressed, and a liquid crystal display device excellent in display quality can be obtained.
  • the ink applied in the second application process is different in mass of the color material from the ink applied in the first application process, but the non-volatile components in the ink are different. It can be said that the non-volatile component in the ink is different as described above.
  • the preferred forms such as the coating amount of the nonvolatile component in the present invention are the same as the preferred forms such as the coating amount of the coloring material in the present invention.
  • a flow for applying in a staggered pattern (drawing in a staggered pattern) and a flow for drawing in a stripe shape are preferable. These flows are suitable, but different colors of ink are vertically and horizontally adjacent to each application process. What is necessary is just to apply
  • the liquid crystal display device of the present embodiment includes a pair of substrates (circuit board and color filter substrate), a liquid crystal layer sandwiched between the pair of substrates, and polarized light disposed on the opposite side of the pair of substrates from the liquid crystal layer.
  • a normal liquid crystal display device such as a plate and a light source can be appropriately used.
  • the pattern film of the present invention is a projection of a self-luminous display such as a plasma panel or an organic EL or a projector. It can be applied to various uses using a film formed by an ink jet method, such as a light emitter in an element, and the display quality is sufficiently improved in display by a light emitting device by similarly suppressing luminance variation of the light emitter. Effect can be exerted.
  • the pattern film of the present embodiment can be appropriately applied to a liquid crystal display device or a light emitting device for 3D display.
  • Comparative Example 1 22 is a schematic cross-sectional view of the substrate after each step of the method for manufacturing the color filter substrate of Comparative Example 1.
  • FIG. 22 the substrate on which the symbol (a) is written on the right side (hereinafter also referred to as substrate a. The same applies to other symbols) is the substrate immediately after the first application by the inkjet method.
  • the cross section of is schematically shown.
  • substrate b shows typically the cross section of the board
  • substrate c shows typically the cross section of the board
  • Substrate 22 shows a state in which G (green), R (red), B (blue), and G (green) are newly applied every other picture element from the left side at the same application amount as the first time.
  • Substrate d schematically shows a cross section of the color filter substrate after the second drying.
  • the color material application amount of the green ink applied on the substrate a and the color material application amount of the green ink newly applied on the substrate c are the same amount.
  • the ink applied on the substrate a undergoes two drying steps, but the ink newly applied on the substrate c only passes one drying step, and is applied on the substrate a.
  • the color material contracts more in the ink than in the ink applied on the substrate c. For example, it shrinks by 5-7%.
  • the ink portion drawn at the first time undergoes the main baking twice, so that 2 Compared to the film thickness of the first drawing, for example, it is 5 to 7% thinner and non-uniform.
  • the film thickness (final film thickness) of the color filter is not sufficiently uniform and varies. As a result, flickering occurred in the liquid crystal display panel.
  • ink is drawn in a staggered pattern, dried, and then dried in the remaining portions where no ink is applied, as in the first embodiment. Ink is applied and dried to form a pattern film.
  • the flow of applying (staggered drawing) in a staggered pattern is the same as that described in Embodiment 1, for example.
  • FIG. 23 is a schematic cross-sectional view of a liquid crystal display device including a color filter substrate according to Comparative Example 1. Since the film thickness is not sufficiently uniformed, the cell thickness for each picture element is not sufficiently uniformed. As a result, luminance variation occurs between pixels, and the display quality of the liquid crystal display device is impaired.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)

Abstract

La présente invention porte sur un procédé de fabrication de film à motifs, sur un film à motifs, sur un substrat de filtre coloré, sur un dispositif d'affichage à cristaux liquide et sur un dispositif émetteur de lumière, la qualité d'affichage d'un dispositif d'affichage ou d'un dispositif émetteur de lumière étant améliorée de manière adéquate. Dans ce procédé de fabrication de film à motifs, un film à motifs réalisé en un matériau coloré est fabriqué à partir d'encre contenant le matériau coloré dans une pluralité d'étapes à l'aide d'un procédé à jet d'encre. Ce procédé de fabrication comprend, dans l'ordre successif, une première étape d'application dans laquelle de l'encre est appliquée à l'aide du procédé à jet d'encre, une première étape de séchage dans laquelle l'encre appliquée dans la première étape d'application est séchée, une seconde étape d'application dans laquelle l'encre est appliquée à l'aide du procédé à jet d'encre, et une seconde étape de séchage dans laquelle l'encre appliquée dans la seconde étape d'application est séchée. Dans ce procédé de fabrication de film à motifs, l'encre appliquée dans la seconde étape d'application contient moins de matière colorée en termes de masse que l'encre appliquée dans la première étape d'application.
PCT/JP2011/076867 2010-11-29 2011-11-22 Procédé de fabrication de film à motifs, film à motifs, substrat de filtre coloré, dispositif d'affichage à cristaux liquide, et dispositif émetteur de lumière WO2012073754A1 (fr)

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JP2010-265615 2010-11-29
JP2010265615 2010-11-29

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WO2012073754A1 true WO2012073754A1 (fr) 2012-06-07

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003107231A (ja) * 2001-09-27 2003-04-09 Seiko Epson Corp カラーフィルタの製造方法とカラーフィルタ及びそれを備えた液晶装置と電子機器
JP2004140004A (ja) * 2000-11-28 2004-05-13 Seiko Epson Corp 有機エレクトロルミネッセンス装置の製造方法および有機エレクトロルミネッセンス装置並びに電子機器
JP2004361428A (ja) * 2003-05-30 2004-12-24 Seiko Epson Corp カラーフィルタの製造方法、カラーフィルタ基板及びその製造方法、エレクトロルミネッセンス基板及びその製造方法、電気光学装置及びその製造方法、電子機器及びその製造方法、並びに成膜方法
JP2009277578A (ja) * 2008-05-16 2009-11-26 Panasonic Corp 発光装置の製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004140004A (ja) * 2000-11-28 2004-05-13 Seiko Epson Corp 有機エレクトロルミネッセンス装置の製造方法および有機エレクトロルミネッセンス装置並びに電子機器
JP2003107231A (ja) * 2001-09-27 2003-04-09 Seiko Epson Corp カラーフィルタの製造方法とカラーフィルタ及びそれを備えた液晶装置と電子機器
JP2004361428A (ja) * 2003-05-30 2004-12-24 Seiko Epson Corp カラーフィルタの製造方法、カラーフィルタ基板及びその製造方法、エレクトロルミネッセンス基板及びその製造方法、電気光学装置及びその製造方法、電子機器及びその製造方法、並びに成膜方法
JP2009277578A (ja) * 2008-05-16 2009-11-26 Panasonic Corp 発光装置の製造方法

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