WO2012071748A1 - 液晶面板的曝光工序及其掩膜 - Google Patents

液晶面板的曝光工序及其掩膜 Download PDF

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Publication number
WO2012071748A1
WO2012071748A1 PCT/CN2010/079685 CN2010079685W WO2012071748A1 WO 2012071748 A1 WO2012071748 A1 WO 2012071748A1 CN 2010079685 W CN2010079685 W CN 2010079685W WO 2012071748 A1 WO2012071748 A1 WO 2012071748A1
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WIPO (PCT)
Prior art keywords
liquid crystal
alignment marks
crystal panel
mask
glass substrate
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Ceased
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PCT/CN2010/079685
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English (en)
French (fr)
Inventor
张才力
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TCL China Star Optoelectronics Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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Publication of WO2012071748A1 publication Critical patent/WO2012071748A1/zh
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Ceased legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/42—Alignment or registration features, e.g. alignment marks on the mask substrates
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133351—Manufacturing of individual cells out of a plurality of cells, e.g. by dicing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7084—Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133354—Arrangements for aligning or assembling substrates

Definitions

  • the present invention relates to an exposure process for a glass substrate and a mask thereof when manufacturing a liquid crystal panel, and more particularly to a alignment mark for a misalignment mask in a aligning process of a preventable exposure machine.
  • an exposure machine for example, an exposure machine from Canon
  • the pattern is shifted to a certain extent. The investigation will find that it is due to progress.
  • the layer-to-error (right-to-error mask) of the mask at the time of alignment causes the occurrence of an abnormal pattern, and in-depth analysis finds that such an anomaly is inevitably caused by the structural design of the alignment mark.
  • the basic principle of the alignment system of the Canon exposure machine is as follows:
  • FIG. 2 Please refer to Figure 2 for a schematic diagram of the architecture of the alignment system.
  • Light from the source passes through the main optical system of the alignment system, reaching the mask and the glass substrate, respectively.
  • the image of the alignment marks A and C on the mask and the image of the alignment mark B on the glass substrate are reflected, captured by the image sensor through the objective lens and the alignment microscope, and then transmitted to the image processing system for display with the display.
  • the images of the alignment marks A, B, and C When the center of the alignment mark B of the glass substrate coincides with the center of the alignment marks A and C of the mask, the alignment is successful.
  • the carrier system of the carrier glass substrate can be actuated until the center and the mask of the alignment mark B of the glass substrate The centers of the alignment marks A and C coincide to complete the alignment procedure before exposure.
  • FIG. 3 is a schematic diagram of the alignment of the alignment marks of the masks of different layers (ie, masks of different tracks) in the prior art.
  • the original mask is linearly symmetrical even if the alignment marks of different layers are arranged, and the separation between the alignment marks of different masks is also equal.
  • the original design flaw is that when the masks of one layer are aligned, the positions of the alignment marks are linearly symmetrical because the alignment marks of the layers are exactly the same.
  • the exposure machine cannot judge the mask layer to which the registration mark belongs, and even if the mask layer is right or wrong, the alignment operation can be completed, and the mask layer is right or wrong, which leads to the foregoing figure.
  • the second mask is performed, because the alignment marks of the third, fourth, and fifth masks exist, if the second mask is aligned, the position of the glass is too offset, and the exposure machine is not aligned with the second.
  • the alignment mark of the track mask, and the alignment mark to the third mask. Since there is no difference between the alignment mask of the second mask and the third mask, the alignment process is completed and the exposure process is completed. That is, as shown in FIG. 1, there is a problem that the entire pattern is shifted due to the right or wrong of the mask layer. As a result, a large number of liquid crystal panel
  • the main object of the present invention is to provide a liquid crystal panel exposure process and a mask thereof, which can prevent the alignment mark of the dislocation mask in the alignment process of the exposure machine when the exposure process of the glass substrate is performed in the liquid crystal panel.
  • the present invention provides a liquid crystal panel exposure process and a mask thereof for manufacturing an exposure machine for a plurality of liquid crystal panels.
  • the liquid crystal panel exposure process of the present invention comprises the following steps: a plurality of sets of masks of the alignment mask are exposed, and the glass substrate for manufacturing the plurality of liquid crystal panels is exposed, and a plurality of sets of alignment marks corresponding to the subsequent masks are formed on the glass substrate; And performing, according to the sequence of the subsequent masks, the plurality of sets of alignment marks on the glass substrate, respectively, the subsequent masks and the glass substrate respectively corresponding to the subsequent masks
  • the plurality of sets of alignment marks of the alignment process and the exposure process to form a pattern; wherein the plurality of sets of alignment marks required for the subsequent masks are on the glass substrate corresponding to the same liquid crystal panel area There are different coordinate positions on the top.
  • the plurality of sets of alignment marks formed on the glass substrate are The two sides of the plurality of liquid crystal panel regions correspond to the same liquid crystal panel region, and the relative distance between the at least two alignment marks of the sets of alignment marks is different.
  • the relative distance between at least two alignment marks of the sets of alignment marks sequentially increases or decreases sequentially.
  • the relative distance between at least two alignment marks of each set of alignment marks is first increased and then decreased.
  • the plurality of sets of alignment marks formed on the glass substrate have different abscissa positions and different positions with respect to any side of the liquid crystal panel region.
  • the ordinate position In an embodiment of the exposure process of the liquid crystal panel of the present invention, the plurality of sets of alignment marks formed on the glass substrate have different abscissa positions and different positions with respect to any side of the liquid crystal panel region. The ordinate position.
  • the present invention provides an exposure process for another liquid crystal panel for exposing a glass substrate for manufacturing the plurality of liquid crystal panels when an exposure machine for manufacturing a plurality of liquid crystal panels is used.
  • a plurality of sets of alignment marks corresponding to the subsequent masks are formed on the glass substrate;
  • the second mask has a mask corresponding to each mask after the second mask for exposure
  • Each set of alignment marks forms respective sets of alignment marks corresponding to the subsequent masks on the glass substrate; wherein after the first mask is exposed, corresponding to the same liquid crystal panel area, the subsequent plurality of masks are masked
  • the plurality of sets of alignment marks of the film respectively have different coordinate positions on the glass substrate; and, after the second mask is exposed, corresponding to the same liquid crystal panel area, after the second mask
  • Each set of alignment marks required for each mask has different coordinate positions on the glass substrate.
  • the plurality of sets of alignment marks formed on the glass substrate are in the The two sides of the plurality of liquid crystal panel regions correspond to the same liquid crystal panel region, and the relative distance between the at least two alignment marks of the plurality of sets of alignment marks is different.
  • each track after the second mask formed on the glass substrate are on both sides of the plurality of liquid crystal panel regions.
  • the present invention provides a mask for exposing a glass substrate for manufacturing the plurality of liquid crystal panels in an exposure process of an exposure machine for manufacturing a plurality of liquid crystal panels
  • the mask comprises: a plurality of liquid crystal panel regions for forming a pattern on the glass substrate; and a plurality of sets of alignment marks for forming a plurality of sets of alignment marks on the glass substrate corresponding to the subsequent plurality of masks respectively Corresponding to the same liquid crystal panel area, the plurality of sets of alignment marks of the subsequent plurality of masks have different relative distances on the mask.
  • each set of alignment marks corresponding to the respective masks respectively has at least two alignment marks, and the sets are respectively The relative distance between the at least two alignment marks possessed by the alignment mark is sequentially increased or decreased sequentially.
  • the exposure process of the liquid crystal panel and the mask thereof of the present invention it is possible to prevent the rework and scrapping phenomenon caused by the alignment mark of the error mask layer in the alignment process of the exposure machine, thereby improving the manufacturing yield of the liquid crystal panel. .
  • the exposure process of the liquid crystal panel of the present invention and the mask thereof can prevent the rework and the scrapping phenomenon which occur due to the alignment mark of the error mask layer in the alignment process of the exposure machine, thereby improving the manufacturing yield of the liquid crystal panel.
  • FIG. 1 is a schematic view showing a problem in which the overall pattern of the prior art is shifted to some extent.
  • FIG. 2 is a schematic diagram showing the architecture of a registration system of a prior art exposure machine.
  • 3 is a schematic view showing the arrangement of alignment marks of different masks in the prior art.
  • Fig. 4 is a view showing the arrangement of alignment marks of different masks in the present invention.
  • Fig. 5 is a schematic view showing the arrangement of alignment marks of different masks of the present invention on the glass substrate to form alignment marks.
  • Figure 6 is a schematic diagram showing the alignment marks of the different masks of the present invention.
  • Fig. 7 is a schematic view showing the alignment procedure of the alignment system of the exposure machine of the present invention when the alignment mark of the mask of the different layers is correct.
  • FIG. 5 and FIG. Fig. 4 is a view showing the arrangement of alignment marks of different masks in the present invention.
  • FIG. 5 is a schematic view showing the arrangement of the alignment marks of the different masks of the present invention on the glass substrate 20 to form alignment marks.
  • Figure 6 is a schematic diagram showing the alignment marks of the different masks of the present invention.
  • a mask of the present invention is shown in Figs. 4, 5 and 6, for use in an exposure process of an exposure machine for manufacturing a liquid crystal panel as shown in Fig. 2.
  • the mask of the present invention comprises a plurality of liquid crystal panel regions 10-1 and a plurality of sets of alignment marks, as shown in Fig. 4, only one liquid crystal panel region 10-1 is shown to further illustrate the present invention.
  • four liquid crystal panel regions 10-1 are shown in FIGS. 5 and 6.
  • a process of five masks is taken as an example, but there are more mask processes for the process requirements of the liquid crystal panel, and if a process of manufacturing a liquid crystal panel requires six or seven masks,
  • the sixth set of alignment marks and the seventh set of alignment marks can be further added to the present invention.
  • the first mask 10 of the present invention Shown in Figure 4 is the first mask 10 of the present invention.
  • the liquid crystal panel region 10-1 provided on the first mask 10 is used to form a pattern on the glass substrate 20 on which the liquid crystal panel is manufactured.
  • the first mask 10 has a second set of alignment marks 12 corresponding to the second mask, the third mask, the fourth mask, and the fifth mask, and a third set of alignment marks 14, Four sets of alignment marks 16, and a fifth set of alignment marks 18.
  • the present invention can also add a sixth set of alignment marks and a seventh set of alignment marks.
  • each of the upper and lower groups may further add a sixth set of alignment marks and a seventh set of alignment marks, and have five or six on the upper side or the lower side of each liquid crystal panel area 10-1 of the glass substrate 20, respectively.
  • Alignment mark may also be arranged correspondingly on the upper and lower sides of each of the liquid crystal panel regions 10-1.
  • a plurality of sets of alignment marks corresponding to the subsequent masks are simultaneously formed on the glass substrate 20, that is, A second set of alignment marks 22, a third set of alignment marks 24, a fourth set of alignment marks 26, and a fifth set of alignment marks 28.
  • the second set of alignment mark 12, the third set of alignment mark 14, the fourth set of alignment mark 16 and the fifth set of alignment on the upper side of the liquid crystal panel area 10-1 has different coordinate positions on the first mask 10, that is, different abscissa positions and different ordinate positions (the sets of alignment marks on the lower side of the liquid crystal panel area 10-1 are also respectively the same Have different different abscissa positions and different ordinate positions).
  • the second set of alignment marks 12, the third set of alignment marks 14, and the fourth The respective horizontal coordinate values and vertical coordinate values of the center coordinate positions of the set of registration marks 16 and the fifth set of registration marks 18 are different from each other. That is, the second set of alignment mark 12, the third set of alignment mark 14, the fourth set of alignment mark 16, and the fifth set of alignment mark 18 on the first mask 10 are not designed to be linearly symmetrical. And will be arranged in a misplaced manner. For example, the relative distance between the second set of alignment mark 12, the third set of alignment mark 14, the fourth set of alignment mark 16 and the fifth set of alignment mark 18 increases or decreases sequentially. Alternatively, the relative distance between the second set of alignment marks 12, the third set of alignment marks 14, the fourth set of alignment marks 16, and the fifth set of alignment marks 18 is first increased and then decreased.
  • the plurality of sets of alignment marks can also be disposed on the liquid crystal.
  • the misalignment arrangement shown in FIG. 4 is illustrated by a stepped lifting arrangement, the present invention is not limited thereto, and the arrangement of the plurality of sets of alignment marks can also be in a wavy manner in a staggered manner.
  • the arrangement is arranged, and the arrangement of the plurality of sets of alignment marks may be arranged in a non-linear manner, so as to avoid serious errors in the prior art mask layer.
  • the second set of alignment coordinates corresponding to the second mask, the third mask, the fourth mask, and the fifth mask are designed.
  • the marker 22, the third set of alignment marker 24, the fourth set of alignment marker 26 and the fifth set of alignment marker 28 likewise have different coordinate positions, namely different abscissa positions and different ordinate positions.
  • the sets of alignment marks on the lower side of the liquid crystal panel region 10-1 also have different abscissa positions and different ordinate positions, respectively).
  • the second set of the alignment mark 22, the third set of the alignment mark 24, the fourth set of the alignment mark 26, and the fifth set of the alignment mark 28 are different.
  • the horizontal coordinate values and the vertical coordinate values are different from each other. That is, the second set of the alignment mark 22, the third set of the alignment mark 24, the fourth set of the alignment mark 26, and the fifth set of the alignment mark 28 on the glass substrate 20 are not linearly symmetric but will be misaligned. arrangement. For example, the relative distance between the second set of alignment mark 22, the third set of alignment mark 24, the fourth set of alignment mark 26, and the fifth set of alignment mark 28 increases sequentially or sequentially.
  • the relative distance between the second set of alignment marks 22, the third set of alignment marks 24, the fourth set of alignment marks 26, and the fifth set of alignment marks 28 is first increased and then decreased.
  • the subsequent masks, that is, the second mask, the third mask, the fourth mask, and the fifth mask are also sequentially used to expose the glass substrate 20 to form a pattern. Therefore, for example, when the exposure is performed with the third mask, the alignment masks of the other masks on the glass substrate 20, such as the second mask, the fourth mask, and the fifth mask, are not recorded. As shown in FIG.
  • each set of alignment marks corresponding to each mask has at least two upper and lower alignment marks. That is, as shown in FIG. 5 and FIG.
  • each set of alignment marks corresponding to the respective masks has three sets of six alignment marks on the upper and lower sides of the same liquid crystal panel region 10-1 on the glass substrate 20. .
  • this is not a limitation.
  • the distance between the two fourth sets of alignment marks 16 and the distance between the upper and lower two opposite pairs of the fifth set of the alignment marks 18 D5 is different from each other, D2 ⁇ D3 ⁇ D4 ⁇ D5.
  • the second set of alignment mark 22, the third set of alignment mark 24, the fourth set of alignment mark 26, and the fifth set of alignment mark 28 on the glass substrate 20 are in each liquid crystal panel area 10-1.
  • the upper and lower sides are arranged correspondingly. That is, corresponding to the second mask, the third mask, the fourth mask, and the fifth mask, the glass substrate 20 corresponds to each mask on the upper and lower sides of each of the liquid crystal panel regions 10-1.
  • Each set of alignment marks 22, 24, 26, 28 has three groups of upper and lower, six alignment marks.
  • the distance between the set of alignment marks 16 and the distance between the upper and lower fifth sets of the alignment marks 28 D5 is different from each other, D2 ⁇ D3 ⁇ D4 ⁇ D5. That is, as shown in FIG. 7, according to the present invention, if the alignment system of the exposure machine aligns the alignment marks of different masks, the alignment procedure cannot be completed. Not only can the alignment mark of the correct mask layer in the alignment process be avoided, but the rework or even the glass substrate must be scrapped, and the liquid crystal panel manufacturing yield can be improved.
  • the present invention provides another exposure process for a liquid crystal panel, and is similarly used for manufacturing an exposure machine for a plurality of liquid crystal panels to expose a glass substrate of the plurality of liquid crystal panels.
  • FIG. 4 FIG. 5, FIG. 6 and FIG. 7 of the present invention, the exposure process of another liquid crystal panel of the present invention will be described in detail below:
  • the first mask 10 When the glass substrate 20 is exposed with the first mask 10 to form the first metal layer, since the first mask 10 simultaneously has a set of alignment marks required to form, for example, a subsequent second mask 12, or two sets of alignment marks 12, 14 of the masks required for the subsequent second and third masks. Therefore, when the glass substrate 20 is exposed by the first mask 10, a set of alignment marks 22 corresponding to the subsequent second mask is formed, or the subsequent second and third masks are formed. Two sets of alignment marks 22, 24. When the subsequent second mask or the subsequent second and third masks are sequentially used to perform the alignment process and the exposure process on the glass substrate 20, the pattern is formed.
  • a set of alignment marks 14 forming, for example, a subsequent third mask, or two sets of alignment marks 16, 18 of the subsequent fourth and fifth masks. Therefore, when the glass substrate 20 is exposed with the last mask (the second mask or the third mask), a set of alignment marks 24 corresponding to the subsequent third mask is formed. Or two sets of alignment marks 26, 28 of the subsequent fourth and fifth masks. Moreover, the foregoing is a set of alignment marks required to simultaneously form a subsequent mask, or two sets of alignment marks required for forming the subsequent two masks at the same time, and the subsequent three masks may be simultaneously formed, or even five. Multiple sets of alignment marks required for the road and six masks. However, the present invention is not limited thereto.
  • the present invention can be applied to a manufacturing process of a liquid crystal panel which is more complicated and requires more masks, and further conforms to the currently developing liquid crystal panel process.

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  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Liquid Crystal (AREA)

Description

液晶面板的曝光工序及其掩膜 技术领域
本发明是有关于一种制作液晶面板时，对玻璃基板的曝光工序及其掩膜，特别是有关于一种可预防曝光机的对位工序中因对错道掩膜的对位标记，而发生的重工及报废现象，进而提升液晶面板制造良率的液晶面板的曝光工序及其掩膜。
 背景技术
请参考图1，制作液晶面板时，会使用曝光机（例如：佳能（Canon）公司的曝光机），在实际生产时，图案整体发生一定程度的偏移的问题，调查会发现是由于在进行对位时掩膜的层别对错（对错道掩膜）而导致异常图案的发生，深入分析发现肇因于对位标记的结构设计而不可避免地导致此类异常。此就佳能曝光机的对位系统基本原理于此简单说明如下：
请参考图2，为对位系统的一个架构示意图。光源所发出的光线会经由对位系统的主光学系统，分别到达掩膜以及玻璃基板上。掩膜上的对位标记A、C的图像以及玻璃基板上的对位标记B的图像经过反射，透过物镜以及对准显微镜而被图像传感器抓取后，传送至图像处理系统而与显示器显示对位标记A、B、C的图像。当玻璃基板的对位标记B的中心与掩膜的对位标记A、C的中心重合时，即表示对位成功。若玻璃基板的对位标记B的中心与掩膜的对位标记A、C的中心没有重合，则载具玻璃基板的承载系统将可作动直至玻璃基板的对位标记B的中心与掩膜的对位标记A、C的中心重合，以完成曝光前的对位程序。
请参考图3，为已知技术中不同层别的掩膜（即不同道的掩膜）的对位标记的排列示意图。原有的掩膜即使是不同层别的对位标记的排列，是采取线性对称的设计，而且不同道掩膜的对位标记之间的间离亦相等。如图中所示，在液晶面板的上下均会有对位标记，且D2=D3=…=Dn (n为层别数)。图中是以五道掩膜为例，因此D2=D3=D4=D5。原有的设计缺陷在于当对一层别的掩膜进行对位时，由于各层别的对位标记形状完全一样，位置亦线性对称。是以，曝光机无法判断出对位标记的所属掩膜层别，即便掩膜层别对错时也能完成对位的动作，而导致掩膜层别对错的情况发生，也就导致前述图1，整体图案发生一定程度偏移的问题。以图中五道掩膜为例，D2=D3=D4=D5， 当进行第二道掩膜，由于第三、四、五道掩膜的对位标记存在，如果第二道掩膜在对准时，玻璃的位置过于偏移，而导致曝光机没对准第二道掩膜的对位标记，而对至第三道掩膜的对位标记。由于第二道掩膜与第三道掩膜的对位标记之间没有任何差异，因此以为对位程序完成，而进行且完成曝光工序。即会出现如图1所示，因掩膜层别对错，导致整体图案发生偏移的问题。而导致液晶面板产品大量重工或报废，造成巨大的损失。
因此，有必要提供一种液晶面板曝光工序及其掩膜，以解决前述现有技术中所存在的问题。
 技术问题
本发明的主要目的在于提供一种液晶面板曝光工序及其掩膜，于制作液晶面板中对玻璃基板的曝光工序时，能预防曝光机的对位工序中因对道错掩膜的对位标记，而发生的重工及报废现象，进而提升液晶面板制造良率的液晶面板的曝光工序及其掩膜。
 技术解决方案
为达成本发明的前述目的，本发明提供一种液晶面板曝光工序及其掩膜，用于制造若干个液晶面板的曝光机，本发明的液晶面板曝光工序包含下述步骤：以具有对应后续若干道掩膜的若干套对位标记的第一道掩膜，对制造所述若干个液晶面板的玻璃基板进行曝光，在所述玻璃基板上形成对应后续若干道掩膜的若干套对位标记；以及依据所述后续若干道掩膜的顺序，分别利用所述玻璃基板上的所述若干套对位标记，进行后续各道掩膜与所述玻璃基板上，分别对应所述后续各道掩膜的所述若干套对位标记的对位工序、曝光工序，以形成图案；其中对应同一个液晶面板区域，所述后续各道掩膜所需的所述若干套对位标记在所述玻璃基板上分别具有不同的坐标位置。
本发明的液晶面板的曝光工序的实施例中，在以所述第一道掩膜，对所述玻璃基板进行曝光的步骤后，所述玻璃基板上形成的所述若干套对位标记是在所述若干个液晶面板区域的两侧，对应同一个液晶面板区域，所述各套对位标记所具有的至少两个对位标记之间的相对距离不同。
本发明的液晶面板的曝光工序的实施例中，对应同一个液晶面板区域，所述各套对位标记所具有的至少两个对位标记之间的相对距离依次增大或依次减小。
本发明的液晶面板的曝光工序的实施例中，对应同一个液晶面板区域，所述各套对位标记所具有的至少两个对位标记之间的相对距离依次先增大后减小。
本发明的液晶面板的曝光工序的实施例中，所述玻璃基板上形成的所述若干套对位标记，相对于所述液晶面板区域的任意一侧，分别具有不同的横坐标位置及不同的纵坐标位置。
为达成本发明的前述目的，本发明提供另一种液晶面板的曝光工序，用于制造若干个液晶面板的一曝光机时，用以对制造所述若干个液晶面板的一玻璃基板进行曝光，包含：
以具有对应后续若干道掩膜的若干套对位标记的一第一掩膜，对所述玻璃基板进行曝光时，在所述玻璃基板上形成对应后续若干道掩膜的若干套对位标记；以后续若干道掩膜中最后一道的一第二掩膜，对所述玻璃基板进行曝光时，所述第二掩膜具有对应所述第二掩膜之后的各道掩膜进行曝光时所需的各套对位标记，在所述玻璃基板上形成对应后续各道掩膜的各套对位标记；其中所述第一掩膜曝光后，对应同一个液晶面板区域，所述后续若干道掩膜的所述若干套对位标记，在所述玻璃基板上分别具有不同的坐标位置；并且，所述第二掩膜曝光后，对应所述同一个液晶面板区域，所述第二掩膜之后的各道掩膜所需的各套对位标记，在所述玻璃基板上亦分别具有不同的坐标位置。
本发明的液晶面板的曝光工序的实施例中，在以所述第一掩膜，对所述玻璃基板进行曝光的步骤后，所述玻璃基板上形成的所述若干套对位标记是在所述若干个液晶面板区域的两侧，对应同一个液晶面板区域，所述若干套对位标记所具有的至少两个对位标记之间的相对距离不同。
本发明的液晶面板的曝光工序的实施例中，在以所述第二掩膜，对所述玻璃基板进行曝光的步骤后，所述玻璃基板上形成的所述第二掩膜之后的各道掩膜进行曝光时所需的各套对位标记是在所述若干个液晶面板区域的两侧。
为达成本发明的前述目的，本发明提供一种掩膜，用于制造若干个液晶面板的一曝光机的曝光工序中，对制造所述若干个液晶面板的一玻璃基板进行曝光，本发明的掩膜包含：若干个液晶面板区域，用以在所述玻璃基板上形成图案；以及若干套对位标记，用以在所述玻璃基板上形成分别对应后续若干道掩膜的若干套对位标记，其中对应同一个液晶面板区域，所述后续若干道掩膜的所述若干套对位标记，在所述掩膜上分别具有不同的相对距离。
在本发明的掩膜的实施例中，在对应所述同一个液晶面板区域的两侧，分别对应各道掩膜的各套对位标记分别具有至少两个对位标记，且所述各套对位标记所具有的所述至少两个对位标记之间的相对距离依次增大或依次减小。
依据本发明的液晶面板的曝光工序及其掩膜，能预防曝光机的对位工序中因对错掩膜层别的对位标记，而发生的重工及报废现象，进而提升液晶面板制造良率。
 有益效果
本发明的液晶面板的曝光工序及其掩膜，能预防曝光机的对位工序中因对错掩膜层别的对位标记，而发生的重工及报废现象，进而提升液晶面板制造良率。
 附图说明
图1是显示现有技术发生整体图案发生一定程度偏移问题的示意图。
图2是显示在现有技术曝光机的对位系统的架构示意图。
图3是已知技术中不同道掩膜的对位标记的排列示意图。
图4是本发明中不同道掩膜的对位标记的排列示意图。
图5是本发明不同道掩膜的对位标记在玻璃基板上形成对位标记的排列示意图。
图6是说明本发明不同道掩膜的对位标记的示意图。
图7是说明本发明曝光机的对位系统，对错不同层别掩膜的对位标记时，无法完成对位程序的示意图。
 本发明的最佳实施方式
为让本发明上述目的、特征及优点更明显易懂，下文特举本发明较佳实施例，并配合附图，作详细说明如下：
请参考图4、图5与图6。图4是本发明中不同道掩膜的对位标记的排列示意图。图5是本发明不同道掩膜的对位标记在玻璃基板20上形成对位标记的排列示意图。图6是说明本发明不同道掩膜的对位标记的示意图。
图4、图5与图6中显示本发明之一掩膜，用于如图2中所显示制造一液晶面板的曝光机的曝光工序中。本发明之掩膜包含多个液晶面板区域10-1以及若干套对位标记，如图4中仅显示一个液晶面板区域10-1，以进一步详细说明本发明。但与图5与图6中显示四个液晶面板区域10-1。于本发明此实施例中，以五道掩膜的工序为例，但可视液晶面板的工艺需求，有更多道掩膜的工序，若制造液晶面板需六道或七道掩膜的工序，则本发明亦可再增加第六套对位标记及第七套对位标记。图4中显示的是为本发明的第一道掩膜10。第一道掩膜10上具有的液晶面板区域10-1是用以在制造液晶面板的玻璃基板20上形成图案。第一道掩膜10上具有对应第二道掩膜、第三道掩膜、第四道掩膜、第五道掩膜的第二套对位标记12、第三套对位标记14、第四套对位标记16、第五套对位标记18。第一道掩膜10上的第二套对位标记12、第三套对位标记14、第四套对位标记16及第五套对位标记18，在每一个液晶面板区域10-1的上下侧对应排列，亦即对应后续各道掩膜，第一道掩膜10分别具有上下三组，六个对位标记，但亦非以此为限定。同时，如前所述，若制造液晶面板需六道或七道掩膜的工序，则本发明亦可再增加第六套对位标记及第七套对位标记。则上下每一组则可再增加第六套对位标记及第七套对位标记，而在玻璃基板20的每一个液晶面板区域10-1的上侧或下侧分别具有五个或六个对位标记。各套对位标记亦可在每一个液晶面板区域10-1的上下侧对应排列。
当以此第一道掩膜10对液晶面板的玻璃基板20进行曝光工序时，如图5所示，会同时在玻璃基板20上形成对应后续各道掩膜的若干套对位标记，亦即第二套对位标记22、第三套对位标记24、第四套对位标记26及第五套对位标记28。对应同一个液晶面板区域10-1，例如在液晶面板区域10-1上侧的第二套对位标记12、第三套对位标记14、第四套对位标记16及第五套对位标记18，在第一道掩膜10上分别具有不同的坐标位置，即不同的横坐标位置及不同的纵坐标位置（在液晶面板区域10-1下侧的各套对位标记亦同样地分别具有不同的不同的横坐标位置及不同的纵坐标位置）。也就是说，若以第一道掩膜10上的任意一点或相对于液晶面板区域10-1的任意一侧为基准，第二套对位标记12、第三套对位标记14、第四套对位标记16及第五套对位标记18的中心坐标位置的各别的水平坐标值与垂直坐标值皆互不相同。亦即，第一道掩膜10上的第二套对位标记12、第三套对位标记14、第四套对位标记16及第五套对位标记18不会以采用线性对称的设计，而会以错位方式排列。例如：第二套对位标记12、第三套对位标记14、第四套对位标记16及第五套对位标记18之间的相对距离依次增大或依次减小。或者，第二套对位标记12、第三套对位标记14、第四套对位标记16及第五套对位标记18之间的相对距离依次先增大后减小。
再者，本发明的实施例中，虽以所述若干套对位标记设置于液晶面板区域10-1的上下侧的对应排列方式举例说明，然所述若干套对位标记亦能设置于液晶面板区域10-1的左右侧。并且，图4中所示的错位方式排列虽以阶梯式升降排列举例说明，但本发明亦非以此为限，所述若干套对位标记的排列方式亦能以交错高低相间的波浪状方式排列进行设置，所述若干套对位标记的排列方式只要是非线性方式排列，要能避免现有技术掩膜层别对错的严重错误即可。
因此，如图5所示，在玻璃基板20上，对应第二道掩膜、第三道掩膜、第四道掩膜及第五道掩膜设计好的对位坐标的第二套对位标记22、第三套对位标记24、第四套对位标记26及第五套对位标记28，同样地分别具有不同的坐标位置，即不同的横坐标位置及不同的纵坐标位置。（在液晶面板区域10-1下侧的各套对位标记亦同样地分别具有不同的横坐标位置及不同的纵坐标位置）也就是说，若以玻璃基板20上的任意一点或相对于液晶面板区域10-1的任意一侧为基准，第二套对位标记22、第三套对位标记24、第四套对位标记26及第五套对位标记28的中心坐标位置的各别的水平坐标值与垂直坐标值皆互不相同。亦即，玻璃基板20上的第二套对位标记22、第三套对位标记24、第四套对位标记26及第五套对位标记28，不是形成线性对称，而会以错位方式排列。例如：第二套对位标记22、第三套对位标记24、第四套对位标记26及第五套对位标记28之间的相对距离，依次增大或依次减小。或者，第二套对位标记22、第三套对位标记24、第四套对位标记26及第五套对位标记28之间的相对距离，依次先增大后减小。而后续各道掩膜，即第二道掩膜、第三道掩膜、第四道掩膜及第五道掩膜，亦依序用来对玻璃基板20进行曝光工序，以形成图案。因此，例如当以第三道掩膜进行曝光，不会对错玻璃基板20上其他道掩膜，如第二道掩膜、第四道掩膜及第五道掩膜的对位标记。如图7所示，若对错不同道掩膜的对位标记时，在曝光机对位系统的显示器上，从第三道掩膜上的对位标记A、C与玻璃基板20上的对位标记B（24）的相对位置关系，即能判别出此时已对错掩膜层别，无法完成对位程序。
请再参考本发明的图4、图5、图6与图7。在第一道掩膜10中，如前述，第二套对位标记12、第三套对位标记14、第四套对位标记16及第五套对位标记18，在其液晶面板区域10-1的上下侧对应排列，亦即对应第二道掩膜、第三道掩膜、第四道掩膜及第五道掩膜，第一道掩膜10在同一个液晶面板区域10-1的上下侧，对应各道掩膜的各套对位标记分别具有上下至少两个对位标记。亦即，如图5、图6所示，对应各道掩膜的各套对位标记，在玻璃基板20上同一个液晶面板区域10-1的上下侧，具有三组，六个对位标记。但并非以此为限定。并且，如图4、图6所示，上下两两相对的两个第二套对位标记12之间的距离D2、上下两两相对的两个第三套对位标记14之间的距离D3、上下两两相对的两个第四套对位标记16之间的距离D4及上下两两相对的两个第五套对位标记18之间的距离 D5彼此皆不相同，D2≠D3≠D4≠D5。同样地如前述，玻璃基板20上的第二套对位标记22、第三套对位标记24、第四套对位标记26及第五套对位标记28在每一个液晶面板区域10-1的上下侧对应排列。亦即，对应第二道掩膜、第三道掩膜、第四道掩膜及第五道掩膜，玻璃基板20在其每一个液晶面板区域10-1的上下侧，对应各道掩膜的各套对位标记22、24、26、28分别具有上下三组，六个对位标记。并且，每组对位标记中，上下两两相对的两个第二套对位标记22之间的距离D2、上下两个第三套对位标记24之间的距离D3、上下两个第四套对位标记16之间的距离D4及上下两个第五套对位标记28之间的距离 D5彼此皆不相同，D2≠D3≠D4≠D5。即如图7所示，依据本发明，曝光机的对位系统若对错不同道掩膜的对位标记时，即无法完成对位程序。不仅能避免对位工序中因对错掩膜层别的对位标记，而发生重工甚至导致玻璃基板必须报废的情形，更能藉此提升液晶面板制造良率。
并且，本发明再提供另一种液晶面板的曝光工序，同样地用于制造若干个液晶面板的曝光机，以对所述若干个液晶面板的玻璃基板进行曝光。请参考本发明的图4、图5、图6与图7，以下对本发明的另一种液晶面板的曝光工序进行详细说明：
在以第一道掩膜10，对玻璃基板20进行曝光，以形成第一金属层时，由于第一道掩膜10同时具有形成例如：后续第二道掩膜所需的一套对位标记12，或者是后续第二道、第三道掩膜所需的各道掩膜的两套对位标记12、14。因此，当以第一道掩膜10，对玻璃基板20进行曝光的同时，即会形成对应后续第二道掩膜的一套对位标记22，或者是后续第二道、第三道掩膜的两套对位标记22、24。当后续第二道掩膜，或者是后续第二道、第三道掩膜依序用来对玻璃基板20进行对位工序、曝光工序，形成图案后。由于最后一道掩膜同时具有形成例如：后续第三道掩膜的一套对位标记14，或者是后续第四道、第五道掩膜的两套对位标记16、18。因此，当以最后一道掩膜（第二道掩膜，或者是第三道掩膜）对玻璃基板20进行曝光的同时，即会形成对应后续第三道掩膜的一套对位标记24，或者是后续第四道、第五道掩膜的两套对位标记26、28。并且，前述以同时形成后续一道掩膜所需的一套对位标记，或者同时形成后续两道掩膜所需的两套对位标记为例，亦可同时形成后续三道掩膜，甚至五道、六道掩膜所需的多套对位标记。但本发明亦并未以此为限定，可视液晶面板的工艺需求，多道掩膜的工序如何规划为优选而定。藉此，本发明能应用于更为复杂，需要更为多道掩膜的液晶面板的制造工序，以更进一步符合现今发展迅速的液晶面板工艺。
本发明已由上述相关实施例加以描述，然而上述实施例仅为实施本发明的范例。必需指出的是，已公开的实施例并未限制本发明的范围。相反地，包含于权利要求书的精神及范围的修改及均等设置均包括于本发明的范围内。
 本发明的实施方式
工业实用性
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Claims (17)

  1. 一种液晶面板的曝光工序，用于制造若干个液晶面板的一曝光机，其特征在于：包含：
    以具有对应后续若干道掩膜的若干套对位标记的一第一道掩膜，对制造所述若干个液晶面板的一玻璃基板进行曝光时，在所述玻璃基板上形成对应后续若干道掩膜的若干套对位标记；
    依据所述后续若干道掩膜的顺序，分别利用所述玻璃基板上的所述若干套对位标记，进行后续各道掩膜与所述玻璃基板上，分别对应所述后续各道掩膜的所述若干套对位标记的对位工序、曝光工序，以形成图案；
    其中对应同一个液晶面板区域，所述后续各道掩膜所需的所述若干套对位标记，在所述玻璃基板上分别具有不同的坐标位置。
  2. 如权利要求1所述的液晶面板的曝光工序，其特征在于：在以所述第一道掩膜，对所述玻璃基板进行曝光的步骤后，所述玻璃基板上形成的所述若干套对位标记是在所述若干个液晶面板区域的两侧，对应同一个液晶面板区域，所述各套对位标记所具有的至少两个对位标记之间的相对距离不同。
  3. 如权利要求2所述的液晶面板的曝光工序，其特征在于：对应同一个液晶面板区域，所述各套对位标记所具有的所述至少两个对位标记之间的相对距离，依次增大或依次减小。
  4. 如权利要求2所述的液晶面板的曝光工序，其特征在于：对应同一个液晶面板区域，所述各套对位标记所具有的所述至少两个对位标记之间的相对距离，依次先增大后减小。
  5. 如权利要求1所述的液晶面板的曝光工序，其特征在于：所述玻璃基板上形成的所述若干套对位标记，相对于所述液晶面板区域的任意一侧，分别具有不同的横坐标位置及不同的纵坐标位置。
  6. 一种液晶面板的曝光工序，用于制造若干个液晶面板的一曝光机时，用以对制造所述若干个液晶面板的一玻璃基板进行曝光，其特征在于：包含：
    以具有对应后续若干道掩膜的若干套对位标记的一第一掩膜，对所述玻璃基板进行曝光时，在所述玻璃基板上形成对应后续若干道掩膜的若干套对位标记；
    以后续若干道掩膜中最后一道的一第二掩膜，对所述玻璃基板进行曝光时，所述第二掩膜具有对应所述第二掩膜之后的各道掩膜进行曝光时所需的各套对位标记，在所述玻璃基板上形成对应后续各道掩膜的各套对位标记；
    其中所述第一掩膜曝光后，对应同一个液晶面板区域，所述后续若干道掩膜的所述若干套对位标记，在所述玻璃基板上分别具有不同的坐标位置；并且，所述第二掩膜曝光后，对应所述同一个液晶面板区域，所述第二掩膜之后的各道掩膜所需的各套对位标记，在所述玻璃基板上亦分别具有不同的坐标位置。
  7. 如权利要求6所述的液晶面板的曝光工序，其特征在于：在以所述第一掩膜，对所述玻璃基板进行曝光的步骤后，所述玻璃基板上形成的所述若干套对位标记是在所述若干个液晶面板区域的两侧，对应同一个液晶面板区域，所述若干套对位标记所具有的至少两个对位标记之间的相对距离不同。
  8. 如权利要求7所述的液晶面板的曝光工序，其特征在于：对应同一个液晶面板区域，所述若干套对位标记所具有的所述至少两个对位标记之间的相对距离，依次增大或依次减小。
  9. 如权利要求6所述的液晶面板的曝光工序，其特征在于：在以所述第一掩膜，对所述玻璃基板进行曝光的步骤后，所述玻璃基板上形成的所述若干套对位标记，相对于所述液晶面板区域的任意一侧，分别具有不同的横坐标位置及不同的纵坐标位置。
  10. 如权利要求6所述的液晶面板的曝光工序，其特征在于：在以所述第二掩膜，对所述玻璃基板进行曝光的步骤后，所述玻璃基板上形成的所述第二掩膜之后的各道掩膜进行曝光时，所需的各套对位标记是在所述若干个液晶面板区域的两侧，对应同一个液晶面板区域，所述各套对位标记所具有的所述至少两个对位标记之间的相对距离不同。
  11. 如权利要求10所述的液晶面板的曝光工序，其特征在于：对应同一个液晶面板区域，所述各套对位标记所具有的所述至少两个对位标记之间的相对距离，依次增大或依次减小。
  12. 如权利要求6所述的液晶面板的曝光工序，其特征在于：在以所述第二掩膜，对所述玻璃基板进行曝光的步骤后，所述玻璃基板上形成的所述各套对位标记，相对于所述液晶面板区域的任意一侧，分别具有不同的横坐标位置及不同的纵坐标位置。
  13. 一种掩膜，用于制造若干个液晶面板的一曝光机的曝光工序中，对制造所述若干个液晶面板的一玻璃基板进行曝光，其特征在于：包含：
    若干个液晶面板区域，用以在所述玻璃基板上形成图案；以及
    若干套对位标记，用以在所述玻璃基板上形成分别对应后续若干道掩膜的若干套对位标记，其中对应同一个液晶面板区域，所述后续若干道掩膜的所述若干套对位标记，在所述掩膜上分别具有不同的坐标位置。
  14. 如权利要求13所述的掩膜，其特征在于：在对应所述同一个液晶面板区域的两侧，分别对应各道掩膜的各套对位标记，分别具有至少两个对位标记，且所述各套对位标记所具有的所述至少两个对位标记之间的相对距离不同。
  15. 如权利要求14所述的掩膜，其特征在于：对应所述同一个液晶面板区域的两侧，所述至少两个对位标记之间的相对距离，依次增大或依次减小。
  16. 如权利要求14所述的掩膜，其特征在于：对应所述同一个液晶面板区域的两侧，所述至少两个对位标记之间的相对距离，依次先增大后减小。
  17. 如权利要求13所述的掩膜，其特征在于：对应所述同一个液晶面板区域的两侧，所述若干套对位标记，相对于所述液晶面板区域的任意一侧，分别具有不同的横坐标位置及不同的纵坐标位置。
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