WO2012053368A1 - Grille pour imagerie par rayonnement, son procédé de fabrication, et système d'imagerie par rayonnement - Google Patents

Grille pour imagerie par rayonnement, son procédé de fabrication, et système d'imagerie par rayonnement Download PDF

Info

Publication number
WO2012053368A1
WO2012053368A1 PCT/JP2011/073066 JP2011073066W WO2012053368A1 WO 2012053368 A1 WO2012053368 A1 WO 2012053368A1 JP 2011073066 W JP2011073066 W JP 2011073066W WO 2012053368 A1 WO2012053368 A1 WO 2012053368A1
Authority
WO
WIPO (PCT)
Prior art keywords
grid
support
radiation
ray
substrate
Prior art date
Application number
PCT/JP2011/073066
Other languages
English (en)
Japanese (ja)
Inventor
金子　泰久
Original Assignee
富士フイルム株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 富士フイルム株式会社 filed Critical 富士フイルム株式会社
Publication of WO2012053368A1 publication Critical patent/WO2012053368A1/fr

Links

Images

Classifications

    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B6/00—Apparatus for radiation diagnosis, e.g. combined with radiation therapy equipment
    • A61B6/06—Diaphragms
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B6/00—Apparatus for radiation diagnosis, e.g. combined with radiation therapy equipment
    • A61B6/40—Apparatus for radiation diagnosis, e.g. combined with radiation therapy equipment with arrangements for generating radiation specially adapted for radiation diagnosis
    • A61B6/4035—Apparatus for radiation diagnosis, e.g. combined with radiation therapy equipment with arrangements for generating radiation specially adapted for radiation diagnosis the source being combined with a filter or grating
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B6/00—Apparatus for radiation diagnosis, e.g. combined with radiation therapy equipment
    • A61B6/42—Apparatus for radiation diagnosis, e.g. combined with radiation therapy equipment with arrangements for detecting radiation specially adapted for radiation diagnosis
    • A61B6/4291—Apparatus for radiation diagnosis, e.g. combined with radiation therapy equipment with arrangements for detecting radiation specially adapted for radiation diagnosis the detector being combined with a grid or grating
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B6/00—Apparatus for radiation diagnosis, e.g. combined with radiation therapy equipment
    • A61B6/48—Diagnostic techniques
    • A61B6/484—Diagnostic techniques involving phase contrast X-ray imaging

Definitions

  • the present invention relates to a grid used for radiographic imaging, a method for manufacturing the grid, and a radiographic imaging system using the grid.
  • phase imaging is used to obtain a high-contrast image (hereinafter referred to as a phase contrast image) from a subject having a low X-ray absorption capacity based on the phase change of the X-ray by the subject.
  • An X-ray imaging system using the Talbot interference effect is known as a kind of X-ray phase imaging (see, for example, Patent Document 1 and Non-Patent Document 1).
  • the first grid is disposed behind the subject as viewed from the X-ray source, and the second grid is disposed downstream from the first grid by the Talbot distance.
  • An X-ray image detector that detects an X-ray and generates an image is disposed behind the second grid.
  • the first grid and the second grid are striped grids in which X-ray absorbing portions and X-ray transmitting portions extended in one direction are alternately arranged along an arrangement direction orthogonal to the extension direction.
  • the Talbot distance is the distance at which X-rays that have passed through the first grid form a self-image (stripe image) due to the Talbot interference effect.
  • a phase contrast image is acquired based on a change in a striped image intensity-modulated by superimposing the self-image of the first grid and the second grid depending on the subject.
  • This is called a fringe scanning method.
  • the second grid is intermittently moved with respect to the first grid, and photographing is performed while the second grid is stopped. This intermittent movement is performed at a constant scanning pitch obtained by equally dividing the grid pitch in a direction substantially parallel to the plane of the first grid and substantially perpendicular to the grid direction of the first grid.
  • a phase differential image representing the distribution of the X-ray refraction angle in the subject is obtained.
  • a phase contrast image is obtained from this phase differential image.
  • This fringe scanning method is also used in an imaging apparatus using laser light (see, for example, Non-Patent Document 2).
  • the first and second grids have a fine structure in which X-ray absorbers are arranged at a pitch of several ⁇ m.
  • This X-ray absorption part is required to have high X-ray absorption.
  • the X-ray absorption part of the second grid needs higher X-ray absorption than the X-ray absorption part of the first grid in order to surely modulate the intensity of the fringe image.
  • the X-ray absorption parts of the first and second grids are made of heavy atomic weight gold (Au).
  • the X-ray absorption part of the second grid needs to have a relatively large thickness with respect to the X-ray traveling direction and have a high aspect ratio (a value obtained by dividing the thickness of the part that absorbs X-rays by the width). It is.
  • a silicon semiconductor process cannot manufacture a grid having a large area larger than the size of the wafer because the area of the grid to be manufactured is limited to the size of the wafer.
  • phase imaging since the imaging range is limited to the size of the first and second grids, it is desired to increase the area of the grid.
  • small grids is formed by arranging a plurality of small-area grids (hereinafter referred to as small grids) (see, for example, Patent Documents 1 and 2).
  • Patent Document 1 discloses that vignetting is reduced by arranging a plurality of small grids on a concave surface to form a large-area grid.
  • Patent Document 2 discloses that a plurality of small grids are arranged on a concave surface to form a large-area grid having a converging structure, and further the small grids are curved.
  • An object of the present invention is to obtain a large-area grid having a converging structure without bending the grid portion.
  • the grid for radiographic imaging of the present invention includes a plurality of plate-like grid portions in which radiation absorbing portions and radiation transmitting portions are alternately arranged, and each of the above-mentioned respective so as to face the focal point of the radiation source. And a support portion that supports the grid portion in a state where the grid portion is inclined at a predetermined angle.
  • the support part has a plurality of support tables individually provided for each grid part. Moreover, it is preferable that each said support stand inclines the said grid part at an angle according to the position on the said support substrate.
  • each of the support bases is a base substrate at the time of manufacturing the grid portion, and preferably has radiation transparency.
  • each said support stand is joined to the surface on the opposite side to the radiation-incidence side of the said grid part, and has a radiation transmittance.
  • the support portion has a plurality of inclined surfaces having different inclination angles, and the grid portions are respectively joined to the inclined surfaces.
  • the method for manufacturing a radiographic imaging grid includes a grid portion forming step of forming a flat grid portion in which radiation absorbing portions and radiation transmitting portions are alternately arranged, and the grid portion is inclined at a predetermined angle.
  • the support table forming step includes a base material holding step for holding the grid portion and the base substrate as the support table in a state inclined at a predetermined angle, and a polishing surface parallel to the surface of the support substrate. It is preferable to include a polishing step of forming a bonding surface with the support substrate by polishing the base substrate with a polishing apparatus.
  • the support table forming step includes a base material holding step for holding a base material having radiation transparency in a state inclined at a predetermined angle, and a polishing apparatus having a polishing surface parallel to the surface of the support substrate.
  • the radiographic imaging system of the present invention includes a first grid that generates a fringe image by passing radiation emitted from a radiation source, a second grid that applies intensity modulation to the fringe image, and the second grid.
  • a radiographic image detector for detecting a fringe image intensity-modulated by the radiographic image detector, and generating a phase contrast image from the fringe image detected by the radiographic image detector.
  • At least one of the grids is supported in a state where each of the grid portions is inclined at a predetermined angle so as to face the focal point of the radiation source and a plurality of flat grid portions in which radiation absorbing portions and radiation transmitting portions are alternately arranged. And a supporting part.
  • a third grid disposed between the radiation source and the first grid and configured to selectively shield the radiation emitted from the radiation source to form a plurality of line-shaped radiation;
  • the third grid supports the plurality of flat grid portions in which the radiation absorption portions and the radiation transmission portions are alternately arranged, and the respective grid portions inclined at a predetermined angle so as to face the focal point of the radiation source. And a support part.
  • each grid part is supported by the support part so that it may face a radiation focus, it can comprise the grid of a convergence structure, although it is flat form.
  • FIG. 1 is a perspective view showing a configuration of an X-ray image capturing system. It is a top view of the 2nd grid.
  • FIG. 2B is a cross-sectional view taken along the line IIB-IIB in FIG. 2A. It is sectional drawing which shows the Y direction cross section of a small grid. It is sectional drawing which shows the manufacture procedure 1 of a small grid. It is sectional drawing which shows the manufacturing procedure 2 of a small grid. It is sectional drawing which shows the manufacturing procedure 3 of a small grid. It is sectional drawing which shows the manufacture procedure 4 of a small grid. It is explanatory drawing explaining the grinding
  • an X-ray imaging system 10 includes an X-ray source 11, a source grid 12, a first grid 13, and a second grid arranged along the Z direction that is an X-ray irradiation direction. 14 and an X-ray image detector 15.
  • the X-ray source 11 has a rotary anode type X-ray tube (not shown) and a collimator (not shown) for limiting the X-ray irradiation field, and the subject H is irradiated with X-rays. Radiate.
  • the radiation source grid 12, the first grid 13, and the second grid 14 are absorption grids that absorb X-rays, and are disposed to face the X-ray source 11 in the Z direction. Between the radiation source grid 12 and the first grid 13, an interval at which the subject H can be arranged is provided. The distance between the first grid 13 and the second grid 14 is not more than the minimum Talbot distance.
  • the X-ray image detector 15 is a flat panel detector using a semiconductor circuit, and is disposed behind the second grid 14.
  • the second grid 14 is composed of five small grids 17 to 21 and a support substrate 23 to which the small grids 17 to 21 are bonded via an adhesive 22.
  • the support substrate 23 is made of a material having high X-ray transparency, such as glass, carbon, and acrylic.
  • the adhesive 22 is an organic adhesive having X-ray transparency.
  • a gap between adjacent small grids is filled with a material having X-ray absorption.
  • Each small grid 17 to 21 has an elongated rectangular shape extending in the X direction.
  • the small grids 17 to 21 are arranged in the Y direction on the support substrate 23.
  • the small grids 17 to 21 are inclined at different angles so as to face the X-ray focal point 11a of the X-ray source 11.
  • the second grid 14 has a converging structure corresponding to cone-beam X-rays, X-ray vignetting is small.
  • at least two small grids are required.
  • the number of small grids is preferably as large as possible.
  • the small grids 17 to 21 include grid portions 17a to 21a and base substrates 17b to 21b.
  • the base substrates 17b to 21b constitute a support portion that supports the grid portions 17a to 21a in an inclined state so as to face the X-ray focal point of the X-ray source 11.
  • the grid part 17 a includes an X-ray absorption part 25 and an X-ray transmission part 26.
  • the X-ray absorption part 25 and the X-ray transmission part 26 are extended substantially in the X direction and are alternately arranged along the Y direction substantially orthogonal to the X direction.
  • the X-ray absorption part 25 is formed of a material having X-ray absorption such as gold or platinum.
  • the X-ray transmission part 26 is made of a material having X-ray transmission properties such as silicon.
  • the width W2 and the pitch P2 of the X-ray absorber 25 are the distance between the source grid 12 and the first grid 13, the distance between the first grid 13 and the second grid 14, and the first It is determined by the pitch of the X-ray absorption part of the grid 13 or the like.
  • the width W2 is about 2 to 20 ⁇ m.
  • the pitch P2 is about 4 to 40 ⁇ m.
  • the thickness T2 in the Z direction of the X-ray absorber 25 is preferably as thick as possible in order to obtain high X-ray absorption, but considering the vignetting of cone-beam X-rays emitted from the X-ray source 11.
  • the thickness is preferably about 100 ⁇ m.
  • the width W2 is 2.5 ⁇ m
  • the pitch P2 is 5 ⁇ m
  • the thickness T2 is 100 ⁇ m.
  • the other grid parts 18a, 19a, 20a, and 21a are the structures similar to the grid part 17a, detailed description is abbreviate
  • the base substrates 17b to 21b are reinforcing substrates joined to the lower surfaces of the grid portions 17a to 21a, and are formed of a material having high X-ray transmissivity such as glass, carbon, and acrylic.
  • the base substrates 17 b to 21 b have bonding surfaces 17 c to 21 c that are bonded to the support substrate 23.
  • the joint surfaces 17c to 21c are inclined at a predetermined angle so that the grid portions 17a to 21a face the X-ray focal point 11a.
  • the base substrates 17 b and 21 b of the small grids 17 and 21 at the outer edge portion having the largest inclination angle are small in the height of the small grids 17 and 21. It is formed thin so as to be approximately the same as the height of ⁇ 20.
  • the source grid 12 and the first grid 13 are composed of a plurality of small grids and a support substrate in which the small grids are bonded together with an adhesive, like the second grid 14. Further, the small grids of the source grid 12 and the first grid 13 are provided with a grid portion and a base substrate as in the case of the second grid 14.
  • the grid portion includes X-ray absorption portions and X-ray transmission portions that are extended in the X direction and alternately arranged along the Y direction orthogonal to the X direction. Since the X-ray absorption part and the X-ray transmission part have substantially the same configuration as the second grid 13 except that the width and pitch in the Y direction, the thickness in the Z direction, and the like are different, detailed description thereof is omitted.
  • the base substrate 17b is bonded to the lower surface of the X-ray transparent substrate 27 formed of silicon or the like.
  • a conductive seed layer 28 is provided on the surface of the base substrate 17b bonded to the X-ray transparent substrate 27.
  • a metal film such as Au or Ni, or a metal film such as Al, Ti, Cr, Cu, Ag, Ta, W, Pb, Pd, and Pt, or an alloy thereof is used.
  • the seed layer 28 is not limited to the base substrate 17b, but may be provided on the X-ray transparent substrate 27, or may be provided on both the X-ray transparent substrate 27 and the base substrate 17b.
  • an etching mask 30 is formed on the X-ray transmissive substrate 27 by using a general photolithography technique.
  • the etching mask 30 has a striped pattern that extends linearly in the X direction and is periodically arranged at a predetermined pitch in the Y direction.
  • a plurality of grooves 32 and a plurality of X-ray transmission portions 26 are formed in the X-ray transmission substrate 27.
  • the groove 32 requires a high aspect ratio with a width of several ⁇ m and a depth of about 100 ⁇ m. For this reason, for the dry etching for forming the grooves 32, deep etching such as a Bosch process or a cryo process is used.
  • the groove may be formed by forming the X-ray transparent substrate 27 using a photosensitive resist instead of silicon and exposing it with synchrotron radiation.
  • the groove 32 is filled with an X-ray absorbing material such as gold by electrolytic plating, and the X-ray absorbing portion 25 is formed.
  • the X-ray transparent substrate 27 is immersed in the plating solution with the current terminal connected to the sheath layer 28 while being held on the base substrate 17b.
  • the other electrode anode
  • the other electrode is prepared at a position facing the X-ray transparent substrate 27, and a current flows between the current terminal and the anode.
  • metal ions in the plating solution on the patterned X-ray transparent substrate 27 gold is embedded in the grooves 32. Thereafter, the etching mask 30 is removed using an ashing method or the like.
  • the filling method of the X-ray absorber in the groove 32 is not limited to the electrolytic plating method, and for example, the X-ray absorber may be filled as a paste or a colloid. In this case, the seeds layer 28 is unnecessary.
  • the lower portion of the base substrate 17b is cut obliquely to form an inclined bonding surface 17c.
  • the small grid 17 is held by a polishing holder 34 that sucks the grid portion 17a by air suction.
  • a suction surface 34a for suction is inclined at a predetermined angle.
  • the polishing holder 34 is moved above the polishing plate 35 of the polishing apparatus 36 by a moving mechanism (not shown).
  • the base substrate 17 b is pressed against the polishing plate 35 that is rotationally driven when the polishing holder 34 is lowered toward the polishing device 36.
  • the lower surface of the base substrate 17b is polished by the polishing plate 35, whereby the bonding surface 17c is formed.
  • alignment marks 38 are provided at two corners of the bonding surface 17c of the base substrate 17b.
  • the alignment mark 38 is provided at a predetermined position related to the grid pattern of the grid portion 17a. The recognition of the grid pattern is performed based on, for example, an image obtained by photographing with an imaging device (not shown).
  • the alignment mark 38 may be formed by cutting a groove in the base substrate 17b, or may be formed on the bonding surface 17c using a material having X-ray transparency.
  • the thickness of the alignment mark 38 is about 0.01 to 1 ⁇ m so as not to hinder the bonding to the support substrate 23. Is preferred.
  • the small grid 17 is bonded to the support substrate 23.
  • the small grid 17 is held by a bonding holder 40 that sucks the grid portion 17a by air suction.
  • the suction surface 40a that performs suction is inclined according to the angle of the joint surface 17c. Accordingly, the small grid 17 is held in a state where the joint surface 17c is horizontal.
  • the joining holder 40 is moved above the support substrate 23 coated with the adhesive 22 by a moving mechanism (not shown).
  • a pair of alignment marks 42 corresponding to the alignment marks 38 of the small grid 17 are provided on the upper surface of the support substrate 23.
  • Two position detection units 45 are inserted between the small grid 17 and the support substrate 23.
  • the position detection unit 45 is composed of a pair of alignment cameras 43 and 44 arranged back to back so that the upper and lower parts can be photographed simultaneously, and the alignment marks 38 and 42 are photographed by the respective cameras 43 and 44.
  • the Images taken by the alignment cameras 43 and 44 are processed by an image processing device (not shown), and the amount of positional deviation between the alignment mark 38 and the alignment mark 42 is detected.
  • the moving mechanism of the bonding holder 40 moves the small grid 17 based on the detected positional deviation amount, and performs position adjustment.
  • the adhesive 22 is preferably one that has X-ray transparency and does not undergo deformation such as shrinkage when solidified.
  • a thermosetting adhesive or an instantaneous adhesive is used.
  • the small grids 18 to 21 are manufactured in the same manner as the small grid 17 and are bonded to the support substrate 23 in the same manner, detailed description is omitted.
  • the small grid 19 attached to the center of the support substrate 23 does not need to incline the grid part 19a, the grinding
  • the source grid 12 and the first grid 13 are manufactured in the same manner as the second grid 14, a detailed description thereof is omitted.
  • X-rays radiated from the X-ray source 11 are partially shielded by the X-ray absorption part of the source grid 12, thereby reducing the effective focal size in the Y direction, and arranging many in the Y direction.
  • a line-shaped X-ray is formed.
  • the phase of each line-shaped X-ray changes when passing through the subject H.
  • a fringe image reflecting the transmission phase information of the subject H determined from the refractive index of the subject H and the transmitted optical path length is formed.
  • the fringe image generated by each line-shaped X-ray is projected onto the second grid 14 and overlaps at the position of the second grid 14.
  • the stripe image is intensity-modulated by being partially shielded by the second grid 14.
  • the second grid 14 is intermittently moved with respect to the first grid 13 using a fringe scanning method, and X-rays are irradiated from the X-ray source 11 to the subject H during the stop.
  • the X-ray image detector 15 takes an image. This intermittent movement is performed in the Y direction at a constant scanning pitch obtained by equally dividing the lattice pitch (for example, five divisions).
  • phase differentiation An image is obtained.
  • the phase differential image corresponds to the distribution of the X-ray refraction angle in the subject H.
  • the radiation source grid 12, the first grid 13, and the second grid 14 are each configured by a plurality of small grids to increase the area. For this reason, an imaging area expands rather than the case where each of the source grid 12, the first grid 13, and the second grid 14 is configured by one grid formed using a semiconductor process. Moreover, since the source grid 12, the first grid 13, and the second grid 14 are configured by a plurality of small grids that are inclined at different angles so as to face the X-ray focal point 11a, the thickness thereof as a whole is increased. A thin convergence structure is obtained. Thereby, the vignetting of the X-rays at the periphery of the grid is reduced, and a high-quality phase contrast image is obtained.
  • the small grids 17 to 21 are held by the polishing holder 34 and the bonding holder 40 for polishing and bonding. For this reason, it is necessary to prepare a plurality of types of polishing holders 34 and bonding holders 40 having suction surfaces inclined in accordance with the inclination angles of the bonding surfaces 17c to 21c of the base substrates 17b to 21b, which is inefficient. is there. Further, since the polishing holder 34 and the joining holder 40 must be exchanged in accordance with each of the small grids 17 to 21, the throughput during manufacturing is low.
  • the horizontal member 50 is attached as an adapter to the upper surface of the grid portion 17a of the small grid 17.
  • the horizontal member 50 has a lower surface inclined in accordance with the angle of the bonding surface formed on the base substrate 17b. According to the present embodiment, when the base substrate 17b is polished to form the bonding surface, the horizontal member 50 is sucked by the one type of polishing holder 51 having the horizontal suction surface 51a to hold the small grid 17. Therefore, it is not necessary to prepare a plurality of types of polishing holders.
  • the horizontal member 50 when joining the small grid 17 to the support substrate 23 after polishing the base substrate 17b, one kind of joining having a horizontal suction surface 53a. Since the horizontal member 50 can be adsorbed by the holder 53 and the small grid 17 can be held, it is not necessary to facilitate a plurality of types of joining holders.
  • the horizontal member 50 is preferably removed from the grid portion 17a after the small grid 17 is joined to the support substrate 23. However, when the horizontal member 50 is formed of an X-ray transmissive material, the grid member 17a is not changed as it is after the joining. It may be left.
  • the base substrate 17b which is the base at the time of manufacturing the grid portion 17a, is used as the support portion of the final small grid 17, but the base substrate 17b is removed and separated from the grid portion 17a. It is good also considering the formed support stand as a support part.
  • a method of manufacturing the grid according to the third embodiment will be described.
  • a base material 60 which is a material for the support base is held by a polishing holder 61 and polished by a polishing apparatus 36.
  • the polishing holder 61 has a suction surface 61a inclined at a predetermined angle, and holds and holds the substrate 60 by the suction surface 61a.
  • the base material 60 is made of a material having high X-ray permeability such as glass, carbon, and acrylic.
  • a support base 62 having a joint surface 62a is formed.
  • the support base 62 is sucked and held by a fixed stage 63 having a suction surface 63a inclined in accordance with the joining surface 62a. Thereby, the support surface 62b which supports the grid part 17a of the support stand 62 is kept horizontal.
  • An adhesive 64 is applied to the support surface 62b.
  • the adhesive 64 is an organic adhesive that has X-ray transparency and does not deform when solidified.
  • the grid portion 17a is formed by the same manufacturing method as in the first embodiment.
  • the grid portion 17 a is held by an assembly holder 65 having a horizontal suction surface 65 a and is joined to the support surface 62 b of the support base 62 via an adhesive 64.
  • the small grid 66 (refer FIG. 12) comprised by the grid part 17a and the support stand 62 is completed.
  • an alignment mark is formed on the joint surface 62a of the support base 62 as in the first embodiment.
  • the small grid 66 is held by a joining holder 67 having a suction surface 67a inclined in accordance with the joining surface 62a, as in the first embodiment.
  • the position of the bonding surface 62 a is adjusted using the alignment mark while being kept horizontal, and is bonded to the support substrate 23 via the adhesive 22.
  • the grid portions 18a to 21a are also bonded to the support substrate 23 using the support base in the same manner as the grid portion 17a.
  • the support base 62 when using resin materials, such as an acryl, as a base material of the support stand 62, you may shape
  • resin materials such as an acryl
  • polishing when the support base 62 is formed of a resin material, the alignment mark may be formed at the same time. According to this, since the polishing process of the support base 62 and the alignment mark forming process can be omitted, the throughput during manufacturing is improved.
  • the horizontal member 68 as an adapter is affixed to the grid part 17a of the small grid 66 of this 3rd Embodiment similarly to 2nd Embodiment, and this horizontal member 68 is made into horizontal It may be held by the bonding holder 69 having the suction surface 69 a and bonded to the support substrate 23.
  • the horizontal member 68 may be removed after the small grid 66 is bonded to the support substrate 23, or may be left as it is when formed of an X-ray transparent material.
  • the support base 62 is formed by polishing the base material 60.
  • flat angle members 75a and 75b having different widths are connected to the grid portion 17a and the ends.
  • the support base 76 for inclining the grid portion 17a may be formed by aligning and laminating the portions.
  • the grid portion 17a is a phase-type grid, it is preferable to place an angle member 77 outside the grid portion 17a as shown in FIG. 14B in order to prevent X-ray diffraction by the angle member.
  • the small grids 17 to 21 are arranged in the Y direction to form a grid having a concave convergence structure.
  • the small grids are arranged in a matrix to form a grid having a spherical convergence structure. It is also possible to do.
  • the second grid 80 includes small grids 81a to 81y having a cross-shaped grid pattern arranged in a matrix on the XY plane of the support substrate 82, and each of the small grids 81a to 81y is X by a base substrate. It is inclined to face the line focal point 11a.
  • the support part is comprised by providing the support stand of the small grid 17 for every small grid 17, these support stands may be integrated and a support part may be comprised.
  • the second grid 90 includes a support base 91 formed integrally with a resin material such as acrylic.
  • the support base 91 has inclined surfaces 90 a to 90 e that are inclined so as to face the X-ray focal point 11 a of the X-ray source 11.
  • the grid portions 17a to 21a of the first embodiment are joined to the inclined surfaces 90a to 90e, respectively.
  • the integral support base 91 since the integral support base 91 is used, a joining step for joining a plurality of small grids to the support substrate is unnecessary, and the manufacturing is easy. Further, since the inclined surfaces 90a to 90e are flat, deformation and cracking due to stress do not occur when the grid portions 17a to 21a are joined.
  • the support base 91 since the inclined surfaces 90a to 90e are formed along a concave shape centered on the X-ray focal point 11a, the support base 91 has a thicker outer peripheral portion than the central portion. For this reason, a difference in thermal expansion occurs between the central portion and the outer peripheral portion of the support base 91, and it is expected that the inclination angles of the inclined surfaces 90a to 90e change due to the deformation of the support base 91.
  • the inclined surfaces 93a to 93e are formed on the support base 93 of the second grid 92 by shifting their positions in the Z direction. Thereby, the thickness to the Z direction of the support stand 93 is averaged.
  • the inclined surfaces 93a to 93e are inclined so as to face the X-ray focal point 11a of the X-ray source 11, and the grid portions 17a to 21a of the first embodiment are joined to each other. .
  • the thickness of the support base 93 is averaged in the Z direction, there is little difference in thermal expansion between the central portion and the outer peripheral portion, and it is difficult to deform. Thereby, the inclination angles of the inclined surfaces 93a to 93e can be kept substantially constant.
  • the overall thickness of the second grid 92 in the Z direction can be made thinner than that of the second grid 90 of the fifth embodiment.
  • the thickness of the support base 95 of the second grid 94 is substantially uniform.
  • the inclined surfaces 95a to 95e are inclined so as to face the X-ray focal point 11a of the X-ray source 11, and the grid portions 17a to 21a of the first embodiment are joined to each other. .
  • the amount of X-ray radiated from the X-ray focal point 11a through the support table 95 is substantially uniform.
  • the configuration of the support table 95 is suitable when the first grid is a phase-type grid as will be described later. Since it is difficult for a phase difference to occur on the support base of the first grid, a high-quality self-image can be obtained by the Talbot interference effect.
  • the first and second grids are configured so as to linearly (geometrically optically) project the X-rays that have passed through the X-ray transmission part, but International Publication No. WO 2004/058070.
  • the Talbot interference effect may be generated by diffracting X-rays at the X-ray transmission part.
  • the first grid can be a phase grid instead of the absorption grid.
  • the phase type grid forms a fringe image (self-image) generated by the Talbot interference effect at the position of the second grid.
  • the subject H is disposed between the X-ray source and the first grid.
  • the subject H may be disposed between the first grid and the second grid. Good.
  • a phase contrast image is similarly generated.
  • the radiation source grid is provided, but the radiation source grid may be omitted.
  • a striped one-dimensional grid having X-ray absorbing portions and X-ray transmitting portions that are extended in one direction and alternately arranged along the arrangement direction orthogonal to the extending direction will be described as an example.
  • the present invention can also be applied to a two-dimensional grid in which the X-ray absorption part and the X-ray transmission part are arranged in two orthogonal directions.
  • the phase contrast image may be generated by a fringe scanning method in which a plurality of shootings are performed, or the phase contrast image may be generated by a single shooting.
  • phase contrast image In order to generate a phase contrast image by one shooting, for example, a checkered phase type grid is used for the first grid and a net type amplitude type grid is used for the second grid. .
  • This single photographed image is subjected to Fourier transform, and the primary spectra in the vertical and horizontal directions are respectively extracted. By performing inverse Fourier transform on these primary spectra, a phase differential image in two directions is obtained.
  • the above embodiments may be combined with each other within a consistent range.
  • the present invention is applicable not only to a radiographic imaging system for medical diagnosis but also to other radiographic systems for industrial use and nondestructive inspection.
  • the grid of the present invention can also be applied to a scattered radiation removal grid that removes scattered radiation in X-ray imaging.
  • the present invention can also be applied to a radiographic imaging system that uses gamma rays or the like in addition to X-rays.

Abstract

La présente invention porte sur une grille à surface large possédant une structure de convergence, et dans laquelle une partie de grille n'est pas courbée. Un système de radiographie réalise une imagerie de phase par rayons X. Le système de radiographie possède une première grille, une seconde grille et une grille de source à rayons X. Chacune des grilles est constituée d'un substrat de soutien et d'une pluralité de petites grilles (17-21) liées au substrat de soutien. Les petites grilles (17-21) sont respectivement pourvues des éléments suivants : une pluralité de sections de grille de type plaque (17a-21a), chacune d'entre elles possédant des parties d'absorption de rayons X et des parties de transmission de rayons X placées en alternance ; et des plaques de soutien (17b-21b) qui soutiennent les sections de grille (17a-21a) dans un état dans lequel les sections de grille sont inclinées selon un angle prédéfini, de sorte que les sections de grille fassent face au point focal de rayons X (11a) de la source de rayons X.
PCT/JP2011/073066 2010-10-19 2011-10-06 Grille pour imagerie par rayonnement, son procédé de fabrication, et système d'imagerie par rayonnement WO2012053368A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2010-234512 2010-10-19
JP2010234512A JP2014003988A (ja) 2010-10-19 2010-10-19 放射線画像撮影用グリッド及びその製造方法、並びに放射線画像撮影システム

Publications (1)

Publication Number Publication Date
WO2012053368A1 true WO2012053368A1 (fr) 2012-04-26

Family

ID=45975086

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2011/073066 WO2012053368A1 (fr) 2010-10-19 2011-10-06 Grille pour imagerie par rayonnement, son procédé de fabrication, et système d'imagerie par rayonnement

Country Status (2)

Country Link
JP (1) JP2014003988A (fr)
WO (1) WO2012053368A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103690185A (zh) * 2013-02-06 2014-04-02 苏州波影医疗技术有限公司 用于多层x射线计算机断层扫描系统的可调式光子探测系统
CN109893776A (zh) * 2017-12-07 2019-06-18 医科达有限公司 用于确定放射治疗束形状的方法和系统

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001194462A (ja) * 1999-11-24 2001-07-19 Xerox Corp 微細加工されたｘ線画像コントラストグリッド
JP2001349952A (ja) * 2000-06-12 2001-12-21 Fuji Photo Film Co Ltd 散乱線除去グリッド
JP2002191596A (ja) * 2000-08-24 2002-07-09 General Electric Co <Ge> Ｘ線散乱防止グリッド
JP2007504881A (ja) * 2003-09-12 2007-03-08 コニンクリユケ フィリップス エレクトロニクス エヌ．ブイ． 電磁放射線照射のための配列
WO2010007544A1 (fr) * 2008-07-14 2010-01-21 Koninklijke Philips Electronics N.V. Grille d'anti-diffusion

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001194462A (ja) * 1999-11-24 2001-07-19 Xerox Corp 微細加工されたｘ線画像コントラストグリッド
JP2001349952A (ja) * 2000-06-12 2001-12-21 Fuji Photo Film Co Ltd 散乱線除去グリッド
JP2002191596A (ja) * 2000-08-24 2002-07-09 General Electric Co <Ge> Ｘ線散乱防止グリッド
JP2007504881A (ja) * 2003-09-12 2007-03-08 コニンクリユケ フィリップス エレクトロニクス エヌ．ブイ． 電磁放射線照射のための配列
WO2010007544A1 (fr) * 2008-07-14 2010-01-21 Koninklijke Philips Electronics N.V. Grille d'anti-diffusion

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103690185A (zh) * 2013-02-06 2014-04-02 苏州波影医疗技术有限公司 用于多层x射线计算机断层扫描系统的可调式光子探测系统
CN103690185B (zh) * 2013-02-06 2016-06-15 苏州波影医疗技术有限公司 用于多层x射线计算机断层扫描系统的可调式光子探测系统
CN109893776A (zh) * 2017-12-07 2019-06-18 医科达有限公司 用于确定放射治疗束形状的方法和系统

Also Published As

Publication number Publication date
JP2014003988A (ja) 2014-01-16

Similar Documents

Publication Publication Date Title
JP5451150B2 (ja) Ｘ線用線源格子、ｘ線位相コントラスト像の撮像装置
WO2012026223A1 (fr) Grille de capture d&#39;image de rayonnement, son procédé de fabrication, et système de capture d&#39;image de rayonnement
JP2012013530A (ja) 回折格子及びその製造方法、並びに放射線撮影装置
US7838856B2 (en) Collimator fabrication
CN102626320A (zh) 放射线成像中使用的栅格和栅格制备方法,以及放射线成像系统
CN103443652B (zh) 谱成像探测器
JP2006526761A (ja) Ｃｔスキャナ用の散乱防止ｘ線コリメータ
JP2006500097A (ja) コンピュータ断層撮影用検出器アレイの散乱ｘ線除去グリッドを位置合わせするための方法と装置
CN104244832A (zh) 医学射线照相成像用混合pci系统
JP7025352B2 (ja) コンパクトな（擬似）等方性多線源ｘ線撮像のためのｘ線撮像装置
WO2012053368A1 (fr) Grille pour imagerie par rayonnement, son procédé de fabrication, et système d&#39;imagerie par rayonnement
JP5204880B2 (ja) 放射線画像撮影用グリッド及びその製造方法、並びに、放射線画像撮影システム
JP2024026391A (ja) 均一なイメージングのための集束型シンチレータ構造のｘ線検出器
JP2012022239A (ja) 回折格子及びその製造方法、放射線撮影装置
US20120148029A1 (en) Grid for use in radiation imaging, method for producing the same, and radiation imaging system
WO2012053342A1 (fr) Grille pour imagerie radiologique, son procédé de fabrication et système d&#39;imagerie radiologique
JP2012149982A (ja) 放射線画像撮影用格子ユニット及び放射線画像撮影システム、並びに格子体の製造方法
WO2013099652A1 (fr) Grille pour radiographie, son procédé de fabrication et système de radiographie
WO2012081376A1 (fr) Grilles pour radiographie et système de radiographie
JP2007240510A (ja) Ｘ線トポグラフィー測定装置、および、ｘ線トポグラフィー測定方法
JP2012132793A (ja) 放射線画像撮影用グリッド及びその製造方法、並びに放射線画像撮影システム
JP2012249847A (ja) 放射線画像撮影用グリッド及びその製造方法、並びに放射線画像撮影システム
JP2012093117A (ja) 放射線画像撮影用グリッド及びその製造方法、並びに放射線画像撮影システム
WO2012026222A1 (fr) Grille pour capturer une image de rayonnement, son procédé de fabrication, et système de capture d&#39;image de rayonnement
JP2012130503A (ja) 放射線画像撮影用グリッド及びその製造方法、並びに放射線画像撮影システム

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 11834208

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 11834208

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: JP