WO2011152235A1 - レーザ露光方法及び製品 - Google Patents
レーザ露光方法及び製品 Download PDFInfo
- Publication number
- WO2011152235A1 WO2011152235A1 PCT/JP2011/061719 JP2011061719W WO2011152235A1 WO 2011152235 A1 WO2011152235 A1 WO 2011152235A1 JP 2011061719 W JP2011061719 W JP 2011061719W WO 2011152235 A1 WO2011152235 A1 WO 2011152235A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- laser
- exposure method
- photosensitive film
- scanning
- plate
- Prior art date
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
- G03F7/2055—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0071—Beam steering, e.g. whereby a mirror outside the cavity is present to change the beam direction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0092—Nonlinear frequency conversion, e.g. second harmonic generation [SHG] or sum- or difference-frequency generation outside the laser cavity
Definitions
- the present invention can be used for laser plate making in gravure plate making, offset plate making, flexo plate making, etc., and further for laser exposure of circuit patterns in electronic parts such as printed boards, liquid crystal displays, plasma displays, and forgery prevention in banknotes, etc.
- the present invention relates to a high-resolution laser exposure method that can also be used for special printing and the like, and a product manufactured using the same.
- ink is filled into fine recesses (cells) formed on the surface of a cylindrical plate cylinder (gravure cylinder), and excess ink is scraped off by a doctor while the plate cylinder is printed on a substrate (paper Etc.) and the ink in the cell is transferred to the printing medium, and the gradation and shade of the ink are expressed depending on the depth of the cell.
- Plate making in gravure printing is performed by forming cells on the surface of the gravure cylinder, and there are also conventional mechanical engravings, but in recent years semiconductor lasers have been used from the viewpoint of high-definition printing and productivity improvement. Laser plate making that directly exposes plate making information (digital data such as characters and images) by the XY scanning type laser exposure apparatus used has become the mainstream.
- Laser engraving is a surface-curing coating such as chrome plating for a photosensitive material coating applied to the surface of a gravure cylinder that rotates at high speed. Is formed.
- Laser plate making is particularly suitably used in so-called CTP (computer plate to plate) which directly outputs digital data of plate making information such as characters and images to a plate without going through a film.
- CTP computer plate to plate
- Laser plate making is used not only for gravure plate making but also for various plate making such as offset plate making and flexo plate making.
- the present applicants have already developed a laser plate-making system that fully automates the entire process of laser plate-making and has been very well received (for example, Patent Document 1).
- a conventional laser exposure method having a resolution of 3200 dpi in the sub-scanning direction and 3200 dpi in the main scanning direction will be described with reference to FIG.
- a laser light source that oscillates laser light, a light modulator that spatially divides the laser light with a plurality of control signals to form a plurality of laser beams, and an array of laser beams from the light modulator
- a method for exposure will be described.
- 208 laser beams are used, and the size of the laser spot is a square having a height of about 7.9 ⁇ m and a width of about 7.9 ⁇ m.
- Exposure is performed by scanning the laser head spirally while rotating the cylinder coated with the photosensitive film.
- a laser spot array having a predetermined length is formed on the photosensitive film with 208 laser beams and exposed.
- the second rotation of the cylinder is sub-scanned based on the following formula (1) so as to overlap only the 208th beam irradiated in the first round, and the beam is irradiated. In this case, only the 208th line in the first round is overexposed.
- Pitch 25.4 / 3200 ⁇ 207 1.443 mm (1)
- the third rotation of the cylinder is irradiated with the beam overlapped with the 208th beam irradiated on the second rotation. In this case, only the 208th line in the first round is overexposed.
- a laser exposure apparatus that has a rectangular laser spot in which the height of the laser spot is half of the conventional laser spot size of about 7.9 ⁇ m has been developed. With such a laser exposure apparatus, laser exposure having a resolution of 3200 dpi ⁇ 6400 dpi is possible.
- a laser exposure method having a resolution of 3200 dpi in the sub-scanning direction and 6400 dpi in the main scanning direction will be described with reference to FIG.
- a laser light source that oscillates laser light, a light modulator that spatially divides the laser light with a plurality of control signals to form a plurality of laser beams, and an array of laser beams from the light modulator
- a method for exposure will be described.
- 208 laser beams are used, and the size of the laser spot is about 7.9 ⁇ m in width and is a rectangle whose height is half of that.
- Exposure is performed by scanning the laser head spirally while rotating the cylinder coated with the photosensitive film.
- a laser spot array having a predetermined length is formed on the photosensitive film with 208 laser beams and exposed.
- the second rotation of the cylinder is irradiated with a beam based on the following formula (1) so as to overlap only the 208th beam irradiated in the first rotation. In this case, only the 208th line in the first round is overexposed.
- Pitch 25.4 / 3200 ⁇ 207 1.443 mm (1)
- the third rotation of the cylinder is irradiated with the beam overlapped with the 208th beam irradiated on the second rotation. In this case, only the 208th line in the first round is overexposed.
- Patent Document 2 a scanning line method using a single stripe laser diode that can be individually driven has been proposed.
- JP-A-10-193551 Japanese Patent Laid-Open No. 2002-113836 JP 2000-318195 A
- the present invention has been made in view of the above-mentioned problems of the prior art, and a gravure plate making using a laser exposure apparatus having a performance comparable to that of a relatively inexpensive conventional laser exposure apparatus having a resolution of about 3200 dpi.
- a laser exposure method of the present invention includes a laser light source that oscillates laser light, a light modulation unit that spatially divides the laser light into a plurality of laser beams by a plurality of control signals, and an arrangement from the light modulation unit
- Each of the plurality of laser spots arranged in the image forming unit of the projection optical unit has a width.
- An exposure method for forming a laser spot array having a predetermined length on a film and exposing a photosensitive film coated on a plate surface to form a part to be exposed and a part not to be exposed In, characterized in that the exposure by scanning a laser spot sequence after so that at least half the area of the width direction of the laser spot rows scanned above is overlapping exposure.
- the scanning means includes a main scanning direction for relative scanning in a direction intersecting the arrangement direction of the laser spot rows irradiated on the photosensitive film, and a sub-scanning direction for relative scanning in a direction orthogonal to the main scanning direction. Scanning means for scanning is preferable.
- the exposure area is increased by the amount obtained by subtracting the overlapped exposure portion with the laser spot row scanned earlier from the laser spot row scanned later.
- the exposure area becomes smaller, so that higher resolution can be realized.
- the plurality of laser beams is an odd number.
- the laser light source is preferably a semiconductor laser.
- the product of the present invention is manufactured using the laser exposure method of the present invention.
- high-resolution laser plate making in gravure plate making, offset plate making, flexo plate making, etc. is performed using a laser exposure device having the same performance as a relatively inexpensive conventional laser exposure device having a resolution of about 3200 dpi.
- a high-resolution laser exposure method that can be used for laser exposure of circuit patterns in electronic components such as printed boards, liquid crystal displays, and plasma displays, and special printing for preventing counterfeiting of banknotes, etc. It is possible to provide a product that is manufactured using the method.
- FIG. 2 is a schematic explanatory diagram for explaining in more detail the first and second rounds of cylinder rotation in FIG. 1.
- FIG. 5 is a schematic diagram showing FIG. 4 in more detail. It is an electron micrograph of a gravure cylinder that has been made, and (a) shows the result of Example 1, and (b) shows the result of Comparative Example 1. It is an enlarged photograph of the upper column of Fig.6 (a). It is an enlarged photograph of the upper column of FIG.6 (b). It is model explanatory drawing which shows the conventional laser exposure method. It is model explanatory drawing which shows the conventional laser exposure method.
- FIG. 3 is a block diagram showing the basic apparatus configuration of the laser exposure apparatus of the present invention.
- reference numeral 10 denotes a laser exposure apparatus, and the laser exposure apparatus 10 performs relative scanning in a direction crossing the array direction of the laser spot array irradiated to the photosensitive film and the main scanning direction.
- the laser head unit 11 includes a scanning mechanism 4 as a scanning unit that scans in the orthogonal sub-scanning direction.
- the laser head unit 11 includes the laser light source 1 and the size of the laser beam in the width direction.
- a plate cylinder 5 to be subjected to plate making is a plate surface 6 on which a photosensitive material is applied to form a photosensitive film.
- the laser light source 1 is a semiconductor laser having a plurality of laser oscillation portions of a semiconductor laser having a wavelength of 830 nm, for example, and continuously oscillates.
- the laser light emitted from the laser light source 1 enters the beam shaping irradiation unit 2.
- the beam shaping irradiation unit 2 includes an aperture shaping unit 7, a light modulation unit 8, and a projection optical unit 9.
- the aperture shaping unit 7 shapes the beam shape of the incident laser light so as to match the incident aperture of the light modulation unit 8 and makes it incident on the light modulation unit 8.
- the beam shape is also formed into a rectangle.
- the beam shape may be formed into a rectangular shape by a known method.
- the laser beam may be passed through a light valve having a rectangular hole (see Patent Document 3).
- the light modulator 8 is a light modulator composed of a liquid crystal spatial modulator having several tens to several hundreds of independent light modulation apertures, an electrically driven micromirror array, an acoustooptic spatial modulator, or the like. Based on the plate making information, the laser light is spatially divided and divided by a plurality of signals to control light modulation. For example, in the case of a diffraction grating type mirror array in which a large number of micro-mirrors that are electronically driven are arranged, the light intensity of the incident laser beam can be modulated at about 200 kHz by controlling the drive with several elements as one channel. It can be used as an optical modulator. Intensity modulation is independently performed by the modulation signal to which the plate making information from the control unit 3 is given, and is emitted as pulsed diffracted light arranged for several hundred channels.
- the laser beams emitted from the light modulation unit 8 and light-modulated respectively are arrayed laser beams corresponding to independent light modulation apertures, and enter the projection optical unit 9.
- the projection optical unit 9 is a reduction projection optical system composed of a plurality of lenses for reducing and projecting incident light at a predetermined magnification.
- the projection optical unit 9 has a lens system, an autofocus function, and the like, and uses the light modulation unit 8 as an incident light source surface.
- 6 is a reduction optical system having an image plane on 6.
- the laser light beam diameter and the laser light beam interval determined by the channel shape at the position of the light modulator 8 are reduced and projected so as to be a predetermined laser spot and laser spot interval on the plate surface. For example, if the reduction ratio of the projection optical unit is 10 to 1, the laser spot array arranged at 50 ⁇ m diameter and 50 ⁇ m interval by the light modulation unit 8 is reduced and projected at 5 ⁇ m interval. Is done.
- the laser head unit 11 on which the optical system from the laser light source 1 to the projection optical unit 9 is mounted sequentially passes through the shaft 12 along the plate cylinder 5 according to the plate making information.
- the scanning mechanism 4 scans the photosensitive film in the main scanning direction and the sub-scanning direction orthogonal to the main scanning direction.
- a photosensitive material is applied to the plate surface 6 to form a photosensitive film.
- the control unit 3 can control the rotation of the plate cylinder 5 and the main scanning direction and the sub-scanning direction of the laser scanning mechanism 4 based on the plate making information.
- the exposure method of the present invention uses such a laser exposure apparatus to scan a laser beam in the main scanning direction or the sub-scanning direction, thereby forming a laser spot array having a predetermined length on the photosensitive film, and applying it to the plate surface.
- the exposed photosensitive film is exposed to form a portion that is exposed and a portion that is not exposed.
- successive scanning at least a half region in the width direction of the previously scanned laser spot row is The subsequent laser spot row is scanned and exposed so as to be overexposed.
- the plurality of laser beams is preferably an odd number.
- the plate surface 6 Since the plate surface 6 is exposed to the laser-irradiated portion and the non-irradiated portion is not exposed, plate-making information is given to the entire surface of the plate cylinder 5. Thereafter, the plate cylinder 5 is provided as a gravure printing plate by development, metal surface etching, resist peeling, chrome plating, diamond-like carbon, and the like.
- the exposed portion When a positive photosensitive solution is used for the photosensitive material, the exposed portion is photodegraded, and when a negative photosensitive solution is used, the exposed area remains photocured and remains etched. In this case, the unexposed areas are removed.
- Example 1 The laser gravure plate making system was configured as follows.
- the plate cylinder gravure cylinder
- the photosensitive solution TSER-2104 [positive type photosensitive solution manufactured and sold by Sink Laboratories Co., Ltd.] was used, and the film thickness of the photosensitive film was 3.5 ⁇ m, followed by air drying (temperature 23 ° C.) for 45 minutes.
- Coating-FX-1300 manufactured and sold by Sink Laboratory Co., Ltd.] was used as the photosensitive solution coating apparatus.
- LaserStream-FX-1300 (manufactured and sold by Sink Laboratory Co., Ltd.) was used as the laser exposure apparatus, the exposure power was 230 mJ / cm 2, and the cylinder speed during exposure was 200 rpm.
- a TLD developer (manufactured and sold by Sink Laboratory Co., Ltd.) was used as the developer, and the developing method was 80 seconds (temperature 25 ° C.) by rotary immersion development.
- the laser spot 16 of the laser exposure apparatus in the system configuration is rectangular and can irradiate 208 laser beams.
- a laser exposure method using such a laser exposure apparatus will be described with reference to FIGS.
- the cylinder coated with the photosensitive film is rotated.
- the 208th of the 208 laser beams is turned OFF, and the laser spot array 14a having a predetermined length on the photosensitive film with 207 laser beams. Are formed, irradiated and exposed.
- the laser spot row is sub-scanned in the same manner so that the half area in the width direction of the 207 laser spot rows irradiated in the second turn is overlapped.
- FIG. 6A and 7 show the results of performing ordinary laser gravure plate making except for the laser exposure method described above. As shown in FIG. 6 (a) and FIG. 7, almost no steps or jagged edges appear in the shaded portion, and a substantially completely straight shaded line can be formed, so that fine exposure and plate making can be performed very accurately. .
- Example 1 A laser gravure plate making system similar to that in Example 1 was used, and the laser exposure apparatus in the system configuration was subjected to the same laser exposure method as that shown in FIG. Gravure plate making was performed. The results are shown in FIG. 6 (b) and FIG. As shown in FIG. 6B and FIG. 8, jagged edges due to steps appear in the hatched portion, and sufficiently fine exposure and plate making could not be performed.
- the laser exposure method of the present invention can be used not only for gravure plate making but also for various types of laser plate making such as offset plate making and flexo plate making.
- an XY scanning laser exposure apparatus is used in place of conventional mask film overlay and batch exposure or step exposure. It can also be used to expose various circuit patterns. Furthermore, it can be used for special printing for preventing counterfeiting on bills and the like.
- 1 laser light source
- 2 beam forming irradiation unit
- 3 control unit
- 4 laser scanning mechanism
- 5 plate cylinder (gravure cylinder)
- 6 plate surface (photosensitive film)
- 7 aperture forming unit
- 8 light modulation Part
- 9 projection optical part
- 10 laser exposure apparatus
- 11 laser head part
- 12 shaft
- 14a, 14b laser spot row
- 16 laser spot.
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Electromagnetism (AREA)
- Plasma & Fusion (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
Abstract
Description
ピッチ25.4/3200×207=1.643mm ・・・(1)
ピッチ25.4/3200×207=1.643mm ・・・(1)
レーザグラビア製版システムを次のように構成した。版胴(グラビアシリンダ)は円周600mmで幅1100mmのアルミニウム製グラビアシリンダに80μmの銅メッキを施し、表面を鏡面研磨(表面粗さRy=0.12μm)した。感光液としてはTSER-2104〔(株)シンク・ラボラトリー製造販売のポジ型感光液〕を用い、感光膜の膜厚3.5μm、塗布後45分間の風乾(温度23℃)を行った。感光液塗布装置としてはコーティング-FX-1300〔(株)シンク・ラボラトリー製造販売〕を用いた。レーザ露光装置として、LaserStream-FX-1300〔(株)シンク・ラボラトリー製造販売〕を用い、露光パワーを230mJ/cm2とし、露光時シリンダ回転数を200rpmとした。現像液にはTLD現像液〔(株)シンク・ラボラトリー製造販売〕を用い、現像方法は回転浸漬現像80秒(温度25℃)で行った。上記システム構成中のレーザ露光装置のレーザスポット16は矩形であり、208本のレーザビームを照射することができる。
ピッチ25.4/3200×103.5=0.8215mm ・・・(2)
実施例1と同様のレーザグラビア製版システムを用い、該システム構成中のレーザ露光装置において、図10に示したのと同様のレーザ露光方法を行った以外は、実施例1と同様にして、レーザグラビア製版を行った。その結果を図6(b)及び図8に示す。図6(b)及び図8に示される如く、斜線部分には段差によるギザギザが表れており、充分に微細な露光及び製版を行うことはできなかった。
Claims (3)
- レーザ光を発振するレーザ光源と、該レーザ光を複数の制御信号で空間的に配列分割して複数のレーザビームとする光変調部と、光変調部からの配列されたレーザビームを縮小投影する投影光学部と、該レーザビームを感光膜に対して走査させる走査手段とを有し、投影光学部の結像部に配列される複数のレーザスポットの夫々が幅方向のサイズが該幅方向と直交する高さ方向のサイズよりも大きい矩形形状を有する矩形レーザスポットとされてなるレーザヘッド部を含むレーザ露光装置を用い、レーザビームを走査させることで、該感光膜に所定長を有するレーザスポット列を形成し、版面に塗布された感光膜を露光して感光される部分と感光されない部分とを形成するための露光方法であり、相前後する走査において、先に走査されたレーザスポット列の幅方向の少なくとも半分の領域が重複露光されるように後のレーザスポット列を走査して露光することを特徴とするレーザ露光方法。
- 前記複数のレーザビームが奇数本であることを特徴とする請求項1記載のレーザ露光方法。
- 請求項1又は2に記載のレーザ露光方法を用いて製造されたことを特徴とする製品。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012518342A JP5773539B2 (ja) | 2010-06-04 | 2011-05-23 | レーザ製版用レーザ露光方法 |
CN201180015378.3A CN102822748B (zh) | 2010-06-04 | 2011-05-23 | 激光曝光方法及制品 |
ES11789644T ES2763925T3 (es) | 2010-06-04 | 2011-05-23 | Método de exposición láser |
KR1020127023486A KR101648542B1 (ko) | 2010-06-04 | 2011-05-23 | 레이저 노광 방법 및 제품 |
US13/582,109 US8963971B2 (en) | 2010-06-04 | 2011-05-23 | Laser exposure method and product |
EP11789644.9A EP2579099B1 (en) | 2010-06-04 | 2011-05-23 | Laser exposure method |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010129076 | 2010-06-04 | ||
JP2010-129076 | 2010-06-04 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2011152235A1 true WO2011152235A1 (ja) | 2011-12-08 |
Family
ID=45066613
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2011/061719 WO2011152235A1 (ja) | 2010-06-04 | 2011-05-23 | レーザ露光方法及び製品 |
Country Status (7)
Country | Link |
---|---|
US (1) | US8963971B2 (ja) |
EP (1) | EP2579099B1 (ja) |
JP (1) | JP5773539B2 (ja) |
KR (1) | KR101648542B1 (ja) |
CN (1) | CN102822748B (ja) |
ES (1) | ES2763925T3 (ja) |
WO (1) | WO2011152235A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7356439B2 (ja) * | 2018-04-03 | 2023-10-04 | エーエスエムエル ネザーランズ ビー.ブイ. | 光ビームの空間変調 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10193551A (ja) | 1996-12-28 | 1998-07-28 | Think Lab Kk | グラビア製版工場 |
JP2000318195A (ja) | 1999-04-30 | 2000-11-21 | Creo Prod Inc | 可変性出力密度を用いる感熱記録方法 |
JP2002113836A (ja) | 2000-06-30 | 2002-04-16 | Heidelberger Druckmas Ag | 版に画像を形成する装置、およびインタリーブラスタ走査ライン方法 |
JP2004319581A (ja) * | 2003-04-11 | 2004-11-11 | Tadahiro Omi | パターン描画装置及びパターン描画方法 |
JP2006053499A (ja) * | 2004-07-16 | 2006-02-23 | Think Laboratory Co Ltd | レーザ露光装置 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5086325A (en) | 1990-11-21 | 1992-02-04 | Atmel Corporation | Narrow width EEPROM with single diffusion electrode formation |
CN1166984C (zh) * | 1997-01-29 | 2004-09-15 | 微激光系统公司 | 利用聚焦激光辐射在光敏涂敷衬底上制作结构的方法与装置 |
EP0956516B1 (en) * | 1997-01-29 | 2002-04-10 | Micronic Laser Systems Ab | Method and apparatus for the production of a structure by focused laser radiation on a photosensitively coated substrate |
DE19829986C1 (de) * | 1998-07-04 | 2000-03-30 | Lis Laser Imaging Systems Gmbh | Verfahren zur Direktbelichtung von Leiterplattensubstraten |
DE10108624A1 (de) * | 2001-02-22 | 2002-09-05 | Heidelberger Druckmasch Ag | Banding-reduzierende Bebilderung einer Druckform |
EP1662552A1 (en) * | 2003-04-11 | 2006-05-31 | Ball Semiconductor Inc. | Pattern plotting device and pattern plotting method |
US7868909B2 (en) * | 2004-09-17 | 2011-01-11 | Fujifilm Corporation | Method and apparatus for multi-beam exposure |
JP2008536331A (ja) * | 2005-04-15 | 2008-09-04 | マイクロニック レーザー システムズ アクチボラゲット | 複数の露光ビームによるリソグラフィ・ツールのための方法 |
US8432533B2 (en) * | 2009-01-05 | 2013-04-30 | Univ. of MD. at College Park | Method and system for photolithographic fabrication with resolution far below the diffraction limit |
-
2011
- 2011-05-23 JP JP2012518342A patent/JP5773539B2/ja active Active
- 2011-05-23 US US13/582,109 patent/US8963971B2/en active Active
- 2011-05-23 CN CN201180015378.3A patent/CN102822748B/zh active Active
- 2011-05-23 ES ES11789644T patent/ES2763925T3/es active Active
- 2011-05-23 KR KR1020127023486A patent/KR101648542B1/ko active IP Right Grant
- 2011-05-23 EP EP11789644.9A patent/EP2579099B1/en active Active
- 2011-05-23 WO PCT/JP2011/061719 patent/WO2011152235A1/ja active Application Filing
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10193551A (ja) | 1996-12-28 | 1998-07-28 | Think Lab Kk | グラビア製版工場 |
JP2000318195A (ja) | 1999-04-30 | 2000-11-21 | Creo Prod Inc | 可変性出力密度を用いる感熱記録方法 |
JP2002113836A (ja) | 2000-06-30 | 2002-04-16 | Heidelberger Druckmas Ag | 版に画像を形成する装置、およびインタリーブラスタ走査ライン方法 |
JP2004319581A (ja) * | 2003-04-11 | 2004-11-11 | Tadahiro Omi | パターン描画装置及びパターン描画方法 |
JP2006053499A (ja) * | 2004-07-16 | 2006-02-23 | Think Laboratory Co Ltd | レーザ露光装置 |
Also Published As
Publication number | Publication date |
---|---|
JP5773539B2 (ja) | 2015-09-02 |
US20120327388A1 (en) | 2012-12-27 |
EP2579099B1 (en) | 2019-12-04 |
KR20130083823A (ko) | 2013-07-23 |
CN102822748B (zh) | 2015-09-16 |
US8963971B2 (en) | 2015-02-24 |
KR101648542B1 (ko) | 2016-08-16 |
EP2579099A1 (en) | 2013-04-10 |
JPWO2011152235A1 (ja) | 2013-07-25 |
ES2763925T3 (es) | 2020-06-01 |
CN102822748A (zh) | 2012-12-12 |
EP2579099A4 (en) | 2014-08-06 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US8335999B2 (en) | System and method for optical shearing | |
JP2011511951A (ja) | 特にフレキソ印刷分野において使用可能なレリーフ画像構造の作製方法、及び該方法によって作製された構造 | |
US6552779B2 (en) | Flying image of a maskless exposure system | |
US7589755B2 (en) | Apparatus and method for recording image on photosensitive material | |
JP2009537324A (ja) | 移動する基板上の薄膜をパターニングするための方法およびツール | |
JP2004200221A (ja) | レーザマーキング方法及び装置 | |
JP4396979B2 (ja) | レーザ露光装置 | |
JP5773539B2 (ja) | レーザ製版用レーザ露光方法 | |
CN110892334B (zh) | 用于光敏聚合物印刷版的直接固化的系统和过程 | |
US20080008970A1 (en) | Lithographic Process | |
JP2006126463A (ja) | 露光方法および装置 | |
US20090015809A1 (en) | Image Recording Method and Device | |
US20020135745A1 (en) | Multibeam scanning device for scanning a photosensitive material with a multi-spot array, and method of correcting the position of image points of the multi-spot array | |
JP2001347669A (ja) | ノズル穴の製造方法およびノズル穴 | |
JP2005333414A (ja) | レーザ露光装置 | |
JP4556143B2 (ja) | 位相格子マスクの製造方法及びフォトマスクの製造方法 | |
JP3273139B1 (ja) | 印刷用刷版の画素密度複数段順次露光方法及びその装置 | |
JP3302974B2 (ja) | 印刷用刷版の画素密度複数段同時露光方法及びその装置 | |
JP2003173016A (ja) | フォトマスクの製造方法 | |
JP4329417B2 (ja) | グラビア版の製造方法 | |
JP2004509456A (ja) | 画像品質を向上し、かつ感光性層の露光の際における描画速度を増加するための方法 | |
JP4632103B2 (ja) | フォトマスク | |
JP2014071350A (ja) | パターン形成方法及び装置、露光装置並びに表示用パネル製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WWE | Wipo information: entry into national phase |
Ref document number: 201180015378.3 Country of ref document: CN |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 11789644 Country of ref document: EP Kind code of ref document: A1 |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2255/KOLNP/2012 Country of ref document: IN |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2011789644 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 13582109 Country of ref document: US |
|
ENP | Entry into the national phase |
Ref document number: 20127023486 Country of ref document: KR Kind code of ref document: A |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2012518342 Country of ref document: JP |
|
NENP | Non-entry into the national phase |
Ref country code: DE |