WO2011142233A1

WO2011142233A1 - Cleanroom

Info

Publication number: WO2011142233A1
Application number: PCT/JP2011/059922
Authority: WO
Inventors: 仁志遠藤
Original assignee: シャープ株式会社
Priority date: 2010-05-11
Filing date: 2011-04-22
Publication date: 2011-11-17
Also published as: JP2013148221A

Abstract

A wall unit (131) separates the outside and the inside of a cleanroom (101). An air conditioning unit (160) conditions the air to be cleaner inside than outside of the cleanroom (101), and to have an air pressure higher inside than outside thereof. An opening (141) is positioned in a portion of the wall unit (131). A conveyer (600) is positioned outside and inside of the cleanroom (101) on either side of the wall unit (131) so as to convey a substrate (400) through the opening (141). Inside of the cleanroom (101) on the wall unit (131), a rectifier (700, 710), which is disposed at the edge of the opening (141) facing at least one main surface of the substrate (400) conveyed by the conveyor (600), increases the velocity of the airflow (171, 172) generated by the air pressure difference between the inside and outside of the cleanroom (101) caused by the air conditioning unit (160).

Description

Clean room

The present invention relates to a clean room, and more particularly to a clean room in which the inside is kept at a positive pressure.

Japanese Patent Laid-Open No. 10-96333 (Patent Document 1) is a prior art document that discloses a clean room in which a positive pressure is maintained at a higher atmospheric pressure than the outside in order to suppress the entry of foreign matter from the outside. In the clean room described in Japanese Patent Laid-Open No. 10-96333 (Patent Document 1), the atmospheric pressure in the clean room is always detected, and the rotational speed of the blower fan of the external air conditioner is changed so that the atmospheric pressure is higher than the outside. The internal pressure is controlled so that the positive pressure state is higher by a certain value.

There are cases where multiple clean rooms with different internal air cleanliness are provided adjacent to each other. In this case, when the air pressure in the clean room with the higher air cleanliness is higher than the air pressure in the clean room with the lower air cleanliness, the air cleanliness in the clean room with the higher air cleanliness decreases. Is suppressed.

FIG. 6 is a partial cross-sectional view showing the configuration of a conventional clean room. As shown in FIG. 6, in the conventional clean room, the cleanliness 100 with a cleanliness of 10 and a relatively high cleanliness of the air, and a cleanroom with a cleanliness of 5000 and a cleanliness of the cleanliness of the interior. A relatively low clean room 500 is provided adjacent to the clean room 500.

In the clean room 100, a room space is formed by the ceiling portion 110, the floor portion 120, and the wall portion 130 that connects the ceiling portion 110 and the floor portion 120. In the clean room 500, a room space is formed by the ceiling portion 510, the floor portion 520, and the wall portion 130 that connects the ceiling portion 510 and the floor portion 520. The clean room 100 and the clean room 500 are separated by a wall 130.

One end of the pipe 150 is connected to the ceiling part 110 of the clean room 100, and the other end of the pipe 150 is connected to the air adjustment unit 160. The air adjuster 160 adjusts the cleanliness of the clean room 100 so that the cleanliness of the air is 10.

One end of the pipe 550 is connected to the ceiling 510 of the clean room 500, and the other end of the pipe 550 is connected to the air adjustment unit 560. The air adjuster 560 adjusts the cleanliness of the clean room 500 so that the cleanliness is 5000.

The air adjusting unit 160 and the air adjusting unit 560 are adjusted so that the pressure inside the clean room 100 is higher than the pressure inside the clean room 500. An opening 140 is provided in the wall 130. Due to the difference in atmospheric pressure between the inside of the clean room 100 and the inside of the clean room 500, an air flow 170 is generated near the opening 140 from the clean room 100 side to the clean room 500 side.

Inside the clean room 100, a cassette 300 that horizontally accommodates a plurality of substrates 400 is placed on the cassette base 200. The cassette stand 200 can move the cassette 300 up and down. Inside the clean room 500, the cassette 300 is placed on the cassette base 200.

A transfer conveyor 600 is arranged inside the clean room 500 and inside the clean room 100 with the wall portion 130 interposed therebetween so that the substrate 400 is transferred from the clean room 500 to the clean room 100 through the opening 140. The transport conveyor 600 transports the substrate 400 in the direction indicated by the white arrow in FIG. 6 while placing the substrate 400 on the roller.

In the cassette 300 in the clean room 500, the substrate 400 is taken out in order from the lower side of the cassette 300. Therefore, the height of the cassette base 200 in the clean room 500 is adjusted so that the substrate 400 accommodated at the lowermost side in the cassette 300 is placed on the rollers of the transport conveyor 600.

The substrates 400 transferred into the clean room 100 by the transfer conveyor 600 are accommodated in order from the upper side of the cassette 300. Therefore, the height of the cassette table 200 in the clean room 100 is adjusted so that the substrate 400 being transferred is accommodated in the uppermost stage of the position where the substrate 400 is accommodated in the cassette 300.

In the cassette table 200 in the clean room 500, every time one substrate 400 is taken out from the cassette 300, the lowermost substrate 400 in the cassette 300 is placed on the rollers of the transfer conveyor 600. To descend.

On the other hand, every time a substrate is accommodated in the cassette 300, the cassette table 200 in the clean room 100 has a substrate accommodation position where the substrate 400 to be transported next does not yet accommodate the substrate 400 in the cassette 300. Ascend so that it is housed in the uppermost position.

As described above, the substrate 400 is transferred from the cassette 300 in the clean room 500 to the cassette 300 in the clean room 100. The substrate 400 transferred to the cassette 300 in the clean room 100 is processed in a substrate processing apparatus (not shown) in the clean room 100.

Japanese Patent Laid-Open No. 10-96333

In the conventional clean room as shown in FIG. 6, the air pressure in the clean room with the higher air cleanliness is made higher than the air pressure in the clean room with the lower air cleanliness, so that the clean room with the higher air cleanliness. The air flow toward the clean room with the lower air cleanliness is generated to suppress the decrease in the air cleanliness in the clean room with the higher air cleanliness.

However, when transporting a board from a clean room with a lower air cleanliness to a clean room with a higher air cleanliness, the air with low cleanliness and dust adhering to the board with high cleanliness. Flows into the clean room. As a result, there is a problem that the air cleanliness of the clean room having the higher air cleanliness is lowered.

The present invention has been made in view of the above-described problems, and an object of the present invention is to provide a clean room that can suppress a decrease in air cleanliness in a clean room when a substrate is received from the outside.

The clean room according to the present invention is a clean room in which a substrate is received from the outside and the substrate is processed inside. The clean room includes a wall portion, an air adjustment portion, an opening portion, a substrate transfer portion, and a rectifying portion. The wall section separates the outside and the inside of the clean room. The air adjusting unit makes the air cleanliness inside the clean room higher than the external air cleanliness, and makes the internal air pressure higher than the external air pressure. The opening is located at a part of the wall. The substrate transport unit is disposed outside and inside the clean room with the wall portion interposed therebetween so as to transport the substrate through the opening. The rectifying unit is arranged at the edge of the opening facing the main surface of at least one of the substrates conveyed by the substrate conveying unit on the inner side of the clean room in the wall, and the air pressure between the inside and the outside of the clean room by the air adjusting unit The flow velocity of the air flow generated by the difference is increased.

Preferably, the rectification unit has a rectification surface extending along the edge of the opening facing at least one main surface of the substrate conveyed by the substrate conveyance unit and facing the main surface.

In one embodiment of the present invention, the rectifying surface has an inclination angle of greater than 0 ° and 60 ° or less with respect to the main surface.

In one embodiment of the present invention, the rectifying surface is a curved surface in which the central portion of the rectifying surface in the substrate transport direction is curved convexly toward the substrate side from both ends.

Preferably, in the rectifying unit, the length of the substrate in the transport direction is twice or more the thickness of the wall.

Preferably, in the rectifying unit, the width in the direction orthogonal to the substrate transport direction is equal to or greater than the width of the substrate in this direction.

In one embodiment of the present invention, the rectifying unit is attached to the wall so that the inclination angle of the rectifying surface can be adjusted.

According to the present invention, it is possible to suppress a decrease in air cleanliness in a clean room when a substrate is received from the outside.

It is a partial cross section figure which shows the structure of the clean room which concerns on Embodiment 1 of this invention. It is the side view which looked at the opening part periphery of the clean room which concerns on the embodiment from the clean room 101 side. It is sectional drawing which shows the opening part periphery of the clean room which concerns on the same embodiment. It is sectional drawing which shows the opening part periphery of the clean room which concerns on Embodiment 2 of this invention. It is sectional drawing which shows the opening part periphery of the clean room which concerns on Embodiment 3 of this invention. It is a partial cross section figure which shows the structure of the conventional clean room.

Hereinafter, a clean room according to a first embodiment of the present invention will be described with reference to the drawings. In the following description of the embodiments, the same or corresponding parts in the drawings are denoted by the same reference numerals, and the description thereof will not be repeated.

(Embodiment 1)
FIG. 1 is a partial cross-sectional view showing a configuration of a clean room according to Embodiment 1 of the present invention. As shown in FIG. 1, in the clean room according to the first embodiment of the present invention, the clean room 101 having an internal air cleanliness level of 10 and a relatively high air cleanliness level, and the internal air cleanliness level of 5000 cleanliness. And a clean room 500 having a relatively low air cleanliness is provided adjacent to each other.

In the clean room 101, a room space is formed by the ceiling portion 110, the floor portion 120, and the wall portion 131 that connects the ceiling portion 110 and the floor portion 120. In the clean room 500, a room space is formed by the ceiling portion 510, the floor portion 520, and the wall portion 131 that connects the ceiling portion 510 and the floor portion 520. The clean room 101 and the clean room 500 are separated by a wall 131.

One end of the pipe 150 is connected to the ceiling part 110 of the clean room 101, and the other end of the pipe 150 is connected to the air adjustment unit 160. The air adjuster 160 adjusts the cleanliness of the clean room 101 so that the cleanliness is 10.

The air adjusting unit 160 and the air adjusting unit 560 are adjusted so that the air pressure inside the clean room 101 is higher than the air pressure inside the clean room 500. An opening 141 is provided in the wall 131. Due to the pressure difference between the inside of the clean room 101 and the inside of the clean room 500, an air flow 171 and an air flow 172 from the clean room 101 side toward the clean room 500 side are generated in the vicinity of the opening 141. The airflow 171 is an airflow generated on the upper surface side of the substrate 400, and the airflow 172 is an airflow generated on the lower surface side of the substrate 400.

Inside the clean room 101, a cassette 300 that horizontally accommodates a plurality of substrates 400 is placed on the cassette base 200. The cassette stand 200 can move the cassette 300 up and down. Inside the clean room 500, the cassette 300 is placed on the cassette base 200.

A transfer conveyer 600, which is a substrate transfer unit, is arranged inside the clean room 500 and inside the clean room 101 with the wall 131 interposed therebetween so that the substrate 400 is transferred from the clean room 500 to the clean room 101 through the opening 141. The transport conveyor 600 transports the substrate 400 in the direction indicated by the white arrow in FIG. 1 while placing the substrate 400 on the roller.

The substrates 400 transferred into the clean room 101 by the transfer conveyor 600 are accommodated in order from the upper side of the cassette 300. Therefore, the height of the cassette table 200 in the clean room 101 is adjusted so that the substrate 400 being transferred is accommodated in the uppermost stage of the position where the substrate 400 in the cassette 300 is accommodated.

As described above, the substrate 400 is transferred from the cassette 300 in the clean room 500 to the cassette 300 in the clean room 101. The substrate 400 transferred to the cassette 300 in the clean room 101 is processed in a substrate processing apparatus (not shown) in the clean room 101.

In the present embodiment, the opening 141 located at a part of the wall 131 is provided in a minimum size necessary for transporting the substrate 400 by the transport conveyor 600. Specifically, the vertical length of the opening 141 was about 50 mm. By reducing the size of the opening 141, the flow velocity of the airflow 171 when passing through the opening 141 can be increased. Further, the area of the opening 141 through which air with low air cleanliness and dust can flow into the clean room 101 can be reduced.

Further, on the inner side of the clean room 101 in the wall 131, a rectifying unit 700 is arranged at the edge of the opening 141 facing the main surface on the upper surface side of the substrate 400 conveyed by the conveyor 600. Further, a rectifying unit 710 is disposed on the edge of the opening 141 facing the main surface on the lower surface side of the substrate 400 conveyed by the conveyor 600.

The rectifying unit 700 has a rectifying surface 701 facing the main surface on the upper surface side of the substrate 400. The rectifying surface 701 is formed so that the flow path of the airflow 171 becomes narrower in the flow direction of the airflow 171 in order to increase the flow velocity of the airflow 171 toward the opening 141. The rectifying unit 700 increases the flow velocity of the airflow 171 generated by the air pressure difference between the clean room 101 and the clean room 500 by the air adjusting unit 160 and the air adjusting unit 560.

The rectifying unit 710 has a rectifying surface 711 facing the main surface on the lower surface side of the substrate 400. The rectifying surface 711 is formed so that the flow path of the airflow 172 becomes narrower in the flow direction of the airflow 172 in order to increase the flow velocity of the airflow 172 toward the opening 141. The rectifying unit 710 increases the flow velocity of the airflow 172 generated by the pressure difference between the clean room 101 and the clean room 500 by the air adjusting unit 160 and the air adjusting unit 560.

Thus, by increasing the flow velocity of the

airflows

171 and 172 from the clean room 101 to the clean room 500, a so-called air curtain can be formed in the opening 141. As a result, air with low cleanliness and dust attached to the substrate together with the substrate 400 being conveyed can be prevented from flowing into the clean room 101.

In the present embodiment, the rectifying unit 700 and the rectifying unit 710 are arranged. However, if the rectifying unit is arranged on the edge of the opening facing at least one main surface of the substrate 400 conveyed by the conveying conveyor 600, the rectifying unit 700 and the rectifying unit 710 are arranged. Good. For this reason, only one of the rectifying unit 700 and the rectifying unit 710 may be arranged. Preferably, a rectifying unit is arranged at the edge of the opening facing the main surface on the side where the substrate processing is performed.

FIG. 2 is a side view of the vicinity of the opening of the clean room according to the present embodiment as viewed from the clean room 101 side. As shown in FIG. 2, the rectifying unit 700 of the present embodiment extends along the edge of the opening 141 that faces the main surface on the upper surface side of the substrate 400 that is transported by the transport conveyor 600. Further, the rectifying unit 700 is formed so that the width L ₀ in the direction orthogonal to the transport direction of the substrate 400 is equal to or larger than the width L _{S of the} substrate 400. With this configuration, it is possible to generate an airflow 171 having an increased flow velocity over the entire top surface of the substrate.

The rectifying unit 710 of the present embodiment extends along the edge of the opening 141 facing the main surface on the lower surface side of the substrate 400 conveyed by the conveyance conveyor 600. Further, the rectifying unit 710 is formed such that the width L ₀ in the direction orthogonal to the transport direction of the substrate 400 is equal to or greater than the width L _{S of the} substrate 400. With this configuration, an airflow 172 having an increased flow velocity can be generated on the entire lower surface of the substrate.

In the present embodiment, the width of the rectifying unit 700 and the width of the rectifying unit 710 are the same, but they are not necessarily the same.

FIG. 3 is a cross-sectional view showing the vicinity of the opening of the clean room according to the present embodiment. As shown in FIG. 3, in the clean room according to the present embodiment, the rectifying unit 700 is arranged at the edge of the opening 141 facing the main surface above the substrate 400 conveyed by the conveyance conveyor 600.

The rectifying surface 701 facing the main surface of the substrate 400 of the rectifying unit 700 has an inclination angle α with respect to the main surface of the substrate 400. The inclination angle α is preferably greater than 0 ° and 60 ° or less.

As the inclination angle α increases, the airflow component flowing in the direction perpendicular to the main surface of the substrate 400 increases, and the removal force of dust attached to the substrate 400 increases. However, as the inclination angle α increases, the airflow component flowing in the horizontal direction with respect to the main surface of the substrate 400 decreases, and the discharge force for removing dust removed from the main surface of the substrate 400 to the clean room 500 side decreases. Therefore, it is desirable that the inclination angle α is appropriately set within the range of 0 ° <α ≦ 60 ° depending on the substrate 400 to be processed.

In the rectifying unit 700, the length L ₁ in the conveyance direction of the substrate 400 is preferably at least twice the thickness H of the wall 131. If the length L ₁ is less than twice the thickness H, it is impossible to secure a sufficient contact length between the regulating surfaces 701 and airflow 171, can not be obtained rectification effect of the air flow 171 by rectifier 700 . Here, the rectification effect refers to sufficiently suppressing the airflow from becoming turbulent.

By the length L ₁ of the rectifying unit 700 and more than twice the thickness H of the wall portion 131, it established a stream 171, such as stable and dust removed from the lower air and substrate 400 of cleanliness, clean room It can be discharged to the 500 side.

In the clean room according to the present embodiment, the rectifying unit 710 is disposed at the edge of the opening 141 facing the main surface below the substrate 400 conveyed by the conveyance conveyor 600.

The rectifying surface 711 facing the main surface of the substrate 400 of the rectifying unit 710 has an inclination angle β with respect to the main surface of the substrate 400. The inclination angle β is preferably greater than 0 ° and 60 ° or less.

As the inclination angle β increases, the airflow component flowing in the direction perpendicular to the main surface of the substrate 400 increases, and the removal force of dust attached to the substrate 400 increases. However, as the inclination angle β increases, the airflow component flowing in the horizontal direction with respect to the main surface of the substrate 400 decreases, and the discharge force for removing dust removed from the main surface of the substrate 400 to the clean room 500 side decreases.

On the lower surface side of the substrate 400 on which the rectifying unit 710 is disposed, a transport roller 610 included in the transport conveyor 600 and a shaft portion 620 that supports the transport roller 610 are disposed. When the inclination angle β is reduced, it is preferable to secure the contact length between the rectifying surface 711 and the airflow 172 by increasing the length L ₂ of the rectifying unit 710 in the transport direction of the substrate 400 as described later.

When the length L ₂ of the rectifying unit 710 is increased, the conveying roller 610 and the shaft portion 620 are provided so as not to interfere with the rectifying unit 710, so that the conveying roller 610 disposed closest to the wall 131 in the clean room 500. And the distance between the conveyance roller 610 disposed closest to the wall 131 in the clean room 101 is increased.

When the distance between the transport roller 610 in the clean room 500 and the transport roller 610 in the clean room 101 is increased as described above, the substrate 400 is transported from the clean room 500 into the clean room 101. The fluttering becomes large, which is not preferable.

Specifically, the top side in the transport direction of the substrate 400 that has passed over the transport roller 610 in the clean room 500 bends downward due to gravity. When the distance to the transport roller 610 in the clean room 100 is long, the amount of deflection becomes large, so that an impact when the top side in the transport direction of the substrate 400 rides on the transport roller 610 in the clean room 100 increases.

Therefore, it is desirable that the inclination angle β is appropriately set within the range of 0 ° <β ≦ 60 ° in consideration of the balance between the substrate 400 to be processed and the length L ₂ of the rectifying unit 710.

In the rectifying unit 710, the length L ₂ in the transport direction of the substrate 400 is preferably not less than twice the thickness H of the wall 131. If the length L ₂ is less than twice the thickness H, it is impossible to secure a sufficient contact length between the regulating surfaces 711 and airflow 172, can not be obtained rectification effect of the air flow 172 by rectifier 710 .

The length L ₂ of the rectifying section 710 be at least twice the thickness H of the wall portion 131, it established a stream 172, such as stable and dust removed from the lower air and substrate 400 of cleanliness, clean room It can be discharged to the 500 side.

By arranging the rectifying unit 700, the air flow 173 immediately after passing through the opening 141 has a flow velocity increased and rectified as compared with that before passing through the opening 141. As a result, a strong air curtain with high uniformity is formed on the substrate 400 in the opening 141. Therefore, it is possible to suppress the flow of air having low air cleanliness and dust adhering to the substrate 400 from the clean room 500 side into the clean room 101 as the substrate 400 is transported. Therefore, it can suppress that the air cleanliness in the clean room 101 falls.

Similarly, by arranging the rectifying unit 710, the air flow 174 immediately after passing through the opening 141 has a flow velocity increased compared to that before passing through the opening 141 and is rectified. As a result, a strong air curtain with high uniformity is formed below the substrate 400 in the opening 141. Therefore, it is possible to suppress the flow of air having low air cleanliness and dust adhering to the substrate 400 from the clean room 500 side into the clean room 101 as the substrate 400 is transported. Therefore, it can suppress that the air cleanliness in the clean room 101 falls.

In this embodiment, the case where clean rooms with different air cleanliness are provided adjacent to each other has been described, but the outside of the clean room 101 may be a normal room or outdoors.

Hereinafter, a clean room according to a second embodiment of the present invention will be described with reference to the drawings.
(Embodiment 2)
FIG. 4 is a cross-sectional view showing the vicinity of the opening of a clean room according to Embodiment 2 of the present invention. As shown in FIG. 4, in the clean room according to the second embodiment of the present invention, the rectifying surface of the rectifying unit is curved so that the central portion of the rectifying surface in the substrate transport direction is convex toward the substrate side from both ends. It is a curved surface. Since other configurations are the same as those of the clean room of the first embodiment, description thereof will not be repeated.

In the clean room of the present embodiment, the rectifying unit 720 is disposed at the edge of the opening 141 facing the main surface above the substrate 400 conveyed by the conveyance conveyor 600. The rectifying unit 720 extends along the edge of the opening 141 facing the main surface on the upper surface side of the substrate 400 conveyed by the conveyor 600.

The rectifying unit 720 has a rectifying surface 721 that faces the main surface on the upper surface side of the substrate 400. The rectifying surface 721 is formed so that the flow path of the airflow 175 becomes narrow in the flow direction of the airflow 175 in order to increase the flow velocity of the airflow 175 toward the opening 141. The rectifying unit 720 increases the flow velocity of the airflow 175 generated by the pressure difference between the clean room 101 and the clean room 500.

Specifically, the rectifying surface 721 is curved so that the central portion 722 of the rectifying surface 721 in the conveyance direction of the substrate 400 is convex toward the substrate 400 from both ends.

In the clean room of the present embodiment, the rectifying unit 730 is disposed at the edge of the opening 141 facing the main surface below the substrate 400 conveyed by the conveyance conveyor 600. The rectifying unit 730 extends along the edge of the opening 141 facing the main surface on the lower surface side of the substrate 400 conveyed by the conveying conveyor 600.

The rectifying unit 730 has a rectifying surface 731 facing the main surface on the lower surface side of the substrate 400. The rectifying surface 731 is formed so that the flow path of the airflow 176 becomes narrower in the flow direction of the airflow 176 in order to increase the flow velocity of the airflow 176 toward the opening 141. The rectifying unit 730 increases the flow velocity of the airflow 176 generated by the pressure difference between the clean room 101 and the clean room 500.

Specifically, the rectifying surface 731 is curved so that the central portion 732 of the rectifying surface 731 in the conveyance direction of the substrate 400 is convex toward the substrate 400 side from both ends.

As described above, by arranging the rectifying unit 720 and the rectifying unit 730, the air existing in the range of the distance A between the end of the rectifying unit 720 and the end of the rectifying unit 730 in the vertical direction is rectified. It can be made to flow along the rectifying surface 721 of the part 720 or the rectifying surface 731 of the rectifying part 730. That is, air can be collected from a wide range and flow toward the opening 141.

In addition, by arranging the rectifying unit 720 and the rectifying unit 730, the length of the air flow path in the vertical direction is equal to the distance B between the central part 722 of the rectifying unit 720 and the central part 732 of the rectifying unit 730. Become. This distance B is preferably smaller than the length of the opening 141 in the vertical direction. In this case, since the flow path of the airflow passing between the rectifying unit 720 and the rectifying unit 730 can be further narrowed, the flow velocity of the airflow can be further increased.

By arranging the rectifying unit 720, the airflow 177 immediately after passing through the opening 141 has a flow velocity increased and rectified as compared with that before passing through the opening 141. As a result, a strong air curtain with high uniformity is formed on the substrate 400 in the opening 141. Therefore, it is possible to suppress the flow of air having low air cleanliness and dust adhering to the substrate 400 from the clean room 500 side into the clean room 101 as the substrate 400 is transported. Therefore, it can suppress that the air cleanliness in the clean room 101 falls.

Similarly, by arranging the rectifying unit 730, the air flow 178 immediately after passing through the opening 141 has a flow velocity increased and rectified compared with that before passing through the opening 141. As a result, a strong air curtain with high uniformity is formed below the substrate 400 in the opening 141. Therefore, it is possible to suppress the flow of air having low air cleanliness and dust adhering to the substrate 400 from the clean room 500 side into the clean room 101 as the substrate 400 is transported. Therefore, it can suppress that the air cleanliness in the clean room 101 falls.

Hereinafter, a clean room according to a third embodiment of the present invention will be described with reference to the drawings.
(Embodiment 3)
FIG. 5 is a cross-sectional view showing the vicinity of an opening of a clean room according to Embodiment 3 of the present invention. As shown in FIG. 5, in the clean room according to Embodiment 3 of the present invention, the rectifying unit is attached to the wall so that the inclination angle of the rectifying surface can be adjusted. Since other configurations are the same as those of the clean room of the first embodiment, description thereof will not be repeated.

In the clean room of the present embodiment, the rectifying unit 740 is disposed at the edge of the opening 141 facing the main surface above the substrate 400 conveyed by the conveyance conveyor 600. The rectifying unit 740 extends along the edge of the opening 141 facing the main surface on the upper surface side of the substrate 400 conveyed by the conveying conveyor 600.

The rectifying unit 740 has a rectifying surface 741 that faces the main surface on the upper surface side of the substrate 400. The rectifying surface 741 is formed so that the flow path of the airflow 180 becomes narrower in the flow direction of the airflow 180 in order to increase the flow velocity of the airflow 180 toward the opening 141. The rectifying unit 740 increases the flow velocity of the airflow 180 generated by the pressure difference between the clean room 101 and the clean room 500.

The rectifying unit 740 is attached to the wall part 132 via the attaching part 133. The attachment portion 133 holds the rectifying unit 740 so that the inclination angle γ with respect to the rectifying surface 741 and the main surface of the substrate 400 can be adjusted. For example, the attachment portion 133 and the rectifying portion 740 are connected by a ball joint.

As the inclination angle γ is increased, the airflow component flowing in the direction perpendicular to the main surface of the substrate 400 increases, and the removal force of dust attached to the substrate 400 increases. However, as the inclination angle γ is increased, the airflow component flowing in the horizontal direction with respect to the main surface of the substrate 400 decreases, and the discharge force for removing dust removed from the main surface of the substrate 400 to the clean room 500 side decreases. Therefore, it is desirable that the inclination angle γ is appropriately adjusted within the range of 0 ° <γ ≦ 60 ° depending on the substrate 400 to be processed.

In the clean room of the present embodiment, the rectifying unit 750 is disposed at the edge of the opening 141 facing the main surface below the substrate 400 conveyed by the conveyance conveyor 600. The rectifying unit 750 extends along the edge of the opening 141 facing the main surface on the lower surface side of the substrate 400 conveyed by the conveying conveyor 600.

The rectifying unit 750 has a rectifying surface 751 facing the main surface on the lower surface side of the substrate 400. The rectifying surface 751 is formed so that the flow path of the airflow 181 becomes narrower in the flow direction of the airflow 181 in order to increase the flow velocity of the airflow 181 toward the opening 141. The rectifying unit 750 increases the flow velocity of the airflow 181 generated by the pressure difference between the clean room 101 and the clean room 500.

The rectifying unit 750 is attached to the wall part 132 via the attaching part 134. The attachment portion 134 holds the rectifying unit 750 so that the inclination angle ω with respect to the rectifying surface 751 and the main surface of the substrate 400 can be adjusted. For example, the attachment part 134 and the rectifying part 750 are connected by a ball joint.

As the inclination angle ω increases, the airflow component flowing in the direction perpendicular to the main surface of the substrate 400 increases, and the removal force of dust attached to the substrate 400 increases. However, as the inclination angle ω is increased, the airflow component flowing in the horizontal direction with respect to the main surface of the substrate 400 decreases, and the discharge force for removing dust removed from the main surface of the substrate 400 to the clean room 500 side decreases. Therefore, it is desirable that the tilt angle ω is appropriately adjusted within the range of 0 ° <ω ≦ 60 ° depending on the substrate 400 to be processed.

By arranging the rectifying unit 740, the airflow 182 immediately after passing through the opening 141 has a flow velocity increased compared to that before passing through the opening 141 and is rectified. As a result, a strong air curtain with high uniformity is formed on the substrate 400 in the opening 141. Therefore, it is possible to suppress the flow of air having low air cleanliness and dust adhering to the substrate 400 from the clean room 500 side into the clean room 101 as the substrate 400 is transported. Therefore, it can suppress that the air cleanliness in the clean room 101 falls.

Similarly, by arranging the rectifying unit 750, the airflow 183 immediately after passing through the opening 141 has a flow velocity increased and rectified as compared with that before passing through the opening 141. As a result, a strong air curtain with high uniformity is formed below the substrate 400 in the opening 141. Therefore, it is possible to suppress the flow of air having low air cleanliness and dust adhering to the substrate 400 from the clean room 500 side into the clean room 101 as the substrate 400 is transported. Therefore, it can suppress that the air cleanliness in the clean room 101 falls.

In this embodiment, since the inclination angles of the rectifying surface 741 and the rectifying surface 751 are adjustable, the inclination angle is changed depending on the type of the substrate 400 to be processed, and the air cleanliness in the clean room is maintained. The substrate can be transferred under optimum conditions.

In addition, the said embodiment disclosed this time is an illustration in all the points, Comprising: It does not become the basis of a limited interpretation. Therefore, the technical scope of the present invention is not interpreted only by the above-described embodiments, but is defined based on the description of the scope of claims. In addition, meanings equivalent to the claims and all modifications within the scope are included.

101,500 clean room, 110,510 ceiling, 120,520 floor, 131,132 wall, 133,134 mounting, 141 opening, 150,550 piping, 160,560 air conditioning, 171,172,173 , 174, 175, 176, 177, 178, 180, 181, 182, 183 Airflow, 200 cassette stand, 300 cassette, 400 substrate, 600 transport conveyor, 610 transport roller, 620 shaft, 700, 710, 720, 730, 740, 750, rectifying unit, 701, 711, 721, 731, 741, 751, rectifying surface, 722, 732, central part.

Claims

A clean room (101) in which a substrate (400) is received from outside and the substrate (400) is processed inside;
Walls (131, 132) separating the outside and the inside;
An air adjusting unit (160) for making the internal air cleanliness higher than the external air cleanliness and making the internal air pressure higher than the external air pressure;
An opening (141) located in a part of the wall (131, 132);
A substrate transfer unit (600) disposed outside and inside the wall (131, 132) so as to transfer the substrate (400) through the opening (141);
On the inner side of the walls (131, 132), disposed on the edge of the opening (141) facing at least one main surface of the substrate (400) conveyed by the substrate conveyance unit (600), A clean room (101) comprising a rectifying unit (700, 710, 720, 730, 740, 750) for increasing the flow velocity of the air flow generated by the air pressure difference between the inside and the outside by the air adjusting unit (160).
The rectifying unit (700, 710, 720, 730, 740, 750) is an edge of the opening (141) facing at least one main surface of the substrate (400) conveyed by the substrate conveying unit (600). The clean room according to claim 1, further comprising a rectifying surface (701, 711, 721, 731, 741, 751) extending along the main surface and facing the main surface.
The clean room according to claim 2, wherein the rectifying surface (701, 711, 741, 751) has an inclination angle greater than 0 ° and 60 ° or less with respect to the main surface.
The rectifying surfaces (721, 731) are curved surfaces in which the central portion of the rectifying surfaces (721, 731) in the conveyance direction of the substrate (400) is curved in a convex manner toward the substrate (400) side from both ends. The clean room according to claim 2.
In the rectifying section (700, 710, 720, 730, 740, 750), the length of the substrate (400) in the transport direction is twice or more the thickness of the wall section (131, 132). Clean room in any one of 1-4.
2. In the rectifying unit (700, 710, 720, 730, 740, 750), a width in a direction orthogonal to the transport direction of the substrate (400) is equal to or greater than the width of the substrate (400) in the direction. To 5. The clean room according to any one of 5.
The clean room according to claim 3, wherein the rectifying part (740, 750) is attached to the wall part (132) so that the inclination angle of the rectifying surface (741, 751) can be adjusted.