WO2011115457A2 - Led 모듈 및 그 제조 방법 - Google Patents
Led 모듈 및 그 제조 방법 Download PDFInfo
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- WO2011115457A2 WO2011115457A2 PCT/KR2011/001901 KR2011001901W WO2011115457A2 WO 2011115457 A2 WO2011115457 A2 WO 2011115457A2 KR 2011001901 W KR2011001901 W KR 2011001901W WO 2011115457 A2 WO2011115457 A2 WO 2011115457A2
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- Prior art keywords
- ground pad
- layer
- mirror
- forming
- partition wall
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- 238000004519 manufacturing process Methods 0.000 title claims description 52
- 238000005192 partition Methods 0.000 claims abstract description 62
- 239000000758 substrate Substances 0.000 claims abstract description 47
- 238000000034 method Methods 0.000 claims abstract description 44
- 229910052751 metal Inorganic materials 0.000 claims abstract description 33
- 239000002184 metal Substances 0.000 claims abstract description 33
- 238000007747 plating Methods 0.000 claims abstract description 15
- 230000004888 barrier function Effects 0.000 claims description 21
- 229920002120 photoresistant polymer Polymers 0.000 claims description 18
- 229910052737 gold Inorganic materials 0.000 claims description 12
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 9
- 238000004544 sputter deposition Methods 0.000 claims description 9
- 229910052802 copper Inorganic materials 0.000 claims description 8
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 7
- 238000009713 electroplating Methods 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 6
- 238000005530 etching Methods 0.000 claims description 5
- 238000000926 separation method Methods 0.000 claims description 5
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- 229920000642 polymer Polymers 0.000 claims description 4
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 4
- 238000000151 deposition Methods 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000012528 membrane Substances 0.000 claims description 2
- 239000000126 substance Substances 0.000 abstract description 2
- 238000002955 isolation Methods 0.000 abstract 4
- 238000009413 insulation Methods 0.000 abstract 2
- 239000004065 semiconductor Substances 0.000 description 3
- 230000002950 deficient Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 238000007743 anodising Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000009429 electrical wiring Methods 0.000 description 1
- 230000002996 emotional effect Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/58—Optical field-shaping elements
- H01L33/60—Reflective elements
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/16—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different main groups of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. forming hybrid circuits
- H01L25/167—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different main groups of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. forming hybrid circuits comprising optoelectronic devices, e.g. LED, photodiodes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/62—Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
- H01L2224/45001—Core members of the connector
- H01L2224/45099—Material
- H01L2224/451—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
- H01L2224/45138—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/45144—Gold (Au) as principal constituent
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2933/00—Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
- H01L2933/0008—Processes
- H01L2933/0033—Processes relating to semiconductor body packages
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/50—Wavelength conversion elements
Definitions
- the present invention relates to an LED module and a method of manufacturing the same, and more particularly, to an LED module and a method of manufacturing the LED module.
- an LED device is assembled in a lead-frame type package and a phosphor is coated to manufacture individual LED devices, and the assembled device is surface-mounted on a PCB substrate to manufacture a lighting module.
- this method has a disadvantage in that the heat generation characteristics of the LED device is lowered, the luminous efficiency is low, and the limitation of the size makes it difficult to make the brightness of the existing lighting bulb and the price cannot be lowered.
- COB chip on board
- the MCPCB has excellent thermal conductivity, but the price of the material itself is high, and facility investment, such as installing a mass production facility specially designed for mass production, must be followed. . Therefore, there is an evaluation that such a technology is inefficient in manufacturing a lighting LED module, and it is pointed out that it is not suitable as a lighting module due to its high price.
- Some embodiments of the present invention can improve the light emitting efficiency of the device by improving the heat emission characteristics of the LED device in the manufacture of high-brightness LED module, high-brightness LED module at a low price and small size by manufacturing a low-brightness LED in the form of a module
- An object of the present invention is to provide an LED module and a method of manufacturing the same.
- some embodiments of the present invention can improve the light emission characteristics by manufacturing the reflecting plate on the individual LED device, and can be produced in a variety of forms of module LED module that enables the production of high-brightness LED for lighting having various functions And the purpose is to provide a method for producing the same.
- some embodiments of the present invention provide a LED module and a method of manufacturing the same, which can significantly reduce the failure rate of the module due to the ease of mass production and significantly reduce the production cost due to the use of a semiconductor process. There is a purpose.
- the LED module manufacturing method comprises the steps of forming an insulating film on the substrate, the first ground pad and the second ground pad separated from each other on the insulating film Forming a first separator filling a gap between the ground pads, a second separator stacked on one surface of the first ground pad, and a third separator stacked on one surface of the second ground pad, the upper portion of each separator Forming a first barrier rib layer having a predetermined height on the substrate; sputtering seed metal on a substrate on which the first barrier rib layer is formed; forming a second barrier rib layer having a predetermined height on an upper portion of the first barrier rib layer; and a second barrier rib Performing a metal plating process on the layered substrate to form a first mirror connected with the first ground pad and a second mirror connected with the second ground pad, and removing the first and second partition layers. Step, the first connecting the Zener diode in the mirror,
- the LED module manufacturing method comprises the steps of inserting a zener diode in the substrate, forming an insulating film on the substrate, forming a first ground pad and a second ground pad separated from each other on the insulating film Forming a first separator filling a gap between the ground pads, a second separator stacked on one surface of the first ground pad, and a third separator stacked on one surface of the second ground pad, on top of each separator Forming a first partition wall layer having a predetermined height, sputtering seed metal on a substrate on which the first partition wall layer is formed, forming a second partition wall layer having a predetermined height on the first partition wall layer, and a second partition wall layer Performing a metal plating process on the formed substrate to form a first mirror connected to the first ground pad and a second mirror connected to the second ground pad, and removing the first and second partition layers. Connecting the LED on the second mirror and laminating the phosphor material to fill the
- the LED module according to the third aspect of the present invention is a first ground pad and a second ground pad formed on the substrate on which the insulating film is formed, the first mirror pad, the first mirror and one surface connected to the first ground pad, the second ground pad And a second mirror having one side connected to the first mirror, a zener diode connected to the first mirror, an LED disposed on a portion of the second mirror, and a zener diode and a phosphor formed on the LED, the other side of the first mirror and the second The other surfaces of the mirrors are formed to face each other.
- a high-brightness LED module in manufacturing a high-brightness LED module can improve the heat emission characteristics of the LED device to increase the luminous efficiency of the device, and to produce a low-brightness LED in the form of a module at a low price and small High brightness LED module can be manufactured.
- FIG. 1A to 1H illustrate a method of manufacturing an LED module according to an embodiment of the present invention.
- FIG. 2 shows a cross-sectional view of an LED module according to an embodiment of the invention.
- 3A to 3C illustrate a method of manufacturing an LED module according to another embodiment of the present invention.
- Figure 4 is a flow chart of the LED module manufacturing method according to an embodiment of the present invention.
- FIG. 1A to 1H illustrate a method of manufacturing an LED module according to an embodiment of the present invention.
- the LED module may include a first ground pad 142, a second ground pad 144, and a first ground pad 142 that are separated from each other on the substrate 110 on which the insulating film 120 is formed.
- the first mirror 182 connected to one surface, the second mirror 184 connected to the second ground pad 144, the zener diode 191 connected to the first mirror 182, and the second mirror 184 connected to the first mirror 182.
- LED 192 disposed on a portion of the surface, the zener diode 191 and the phosphor 194 formed on the LED 192, the other surface of the first mirror 182 and the second mirror 184 The other surface may be formed to face each other.
- the LED module manufacturing method will be described in more detail.
- an insulating film 120 is formed on the substrate 110.
- an Al metal is deposited on the Si substrate 110, and an aluminum oxide layer (AAO) formed with small nanopores of 5 nm or less is formed by anodizing, and silicon oxide (SiO 2) is formed.
- the layer may be deposited using a plasma chemical vapor deposition device to fabricate an insulating film 120 for the LED module.
- AAO aluminum oxide layer
- SiO 2 silicon oxide
- the ground pad 140 is formed on the insulating layer 120, but the first ground pad 142 and the second ground pad 144 are separated from each other.
- the first ground pad 142 and the second ground pad 144 may be formed through the process of.
- a pattern for manufacturing a ground pad is formed through a photo process. Then, the ground pad is manufactured by using Cu or Au by electroplating.
- the separator 150 is formed, and the first separator 151 filling the gap between the ground pads 142 and 144 and the first stacked pads are stacked on one surface of the first ground pad 142.
- a second separator 152 and a third separator 153 stacked on one surface of the second ground pad 144 are formed.
- the first separator 151 to the third separator 153 may be formed by applying a polymer on the first ground pad 142 and the second ground pad 144.
- the first barrier layer 160 having a predetermined height is formed on the separator 150.
- the first barrier layer 160 is formed by stacking a first photoresist layer on the substrate 110 on which the separator 150 is formed, and exposing a portion of the first ground pad 142 and the second ground pad 144. It may be formed through a process of etching the first photoresist layer.
- the seed metal 162 is sputtered on the substrate 110 on which the first partition wall layer 160 is formed.
- a second partition wall 170 having a predetermined height is formed on the first partition wall layer 160.
- a second photoresist layer is stacked on the substrate 110 on which sputtering is performed, and a portion of the first ground pad 142 and the second ground pad 144 is exposed, and on the first separation layer 151.
- the second photoresist layer is etched such that the upper surface 164 of the formed first barrier layer 160 is covered by the second photoresist layer.
- the second partition wall layer 170 may be formed such that the upper surface 164 of the first partition wall layer 160 formed on the first separation layer 151 is covered by the second partition wall layer 170.
- the second barrier layer 170 is formed such that the top surfaces 166 and 168 of the first barrier layer 160 formed on the second and third separator 153 are partially exposed by the second barrier layer 170. can do. Through such a configuration, it is possible to prevent the mirror 180 from being formed around the first partition wall layer 160 formed on the first separator 151.
- a metal plating process is performed on the substrate 110 on which the second partition wall layer 170 is formed, and thus the first mirror 182 and the first contacting surface are connected to the first ground pad 142.
- the second mirror 184 is formed to be connected to the second ground pad 144.
- the first mirror 182 and the second mirror 184 may be formed by electroplating Ni, Su, Cu, Au, Ag on the substrate 110 on which the second partition wall layer 170 is formed.
- the mirror 180 as illustrated by the configuration of the first partition wall layer 160, the seed metal sputtered on the first partition wall layer 160, and the second partition wall layer 170 partially covering the sputtered seed metal. ) Structure can be formed.
- the first barrier layer 160 and the second barrier layer 170 are removed.
- the zener diode 191 is connected to the first mirror 182, and the LED 192 is connected to the second mirror 184. Then, Au wire bonding 193 is performed for the electrical wiring, and the phosphor 194 material is stacked to fill the space formed by the first mirror 182 and the second mirror 184.
- FIGS. 1A-1H illustrates a cross-sectional view of an LED module manufactured through the process of FIGS. 1A-1H described above in accordance with one embodiment of the present invention.
- LEDs having different color ranks can be combined in one module, so that an emotional lighting device using LEDs can be manufactured.
- 3A to 3C illustrate a method of manufacturing an LED module according to another embodiment of the present invention.
- a zener diode 191 may be inserted into the substrate 110 before the insulating layer 120 is formed on the substrate 110.
- the inserted zener diode 191 may be positioned in the lower direction of the first mirror 182.
- the process may be simplified, and a miniaturized LED module may be manufactured.
- a driver IC 200 may be attached onto the insulating layer 120 of the LED module. That is, by attaching the driver IC 200 of the LED in the form of a bare (bare) and the wire bonding (wire bonding) on the completed LED module can increase the integration of the module.
- the integrated passive device 210 may be integrated together on the insulating film 120.
- the high brightness LED module not only can improve the luminous efficiency of the device by improving the heat dissipation characteristics of the LED device, but also can manufacture the high brightness LED module at low price and small size by manufacturing the low brightness LED in the form of a module. Can be.
- Figure 4 is a flow chart of the LED module manufacturing method according to an embodiment of the present invention.
- an insulating film 120 is formed on the substrate 110 (S101).
- the insulating layer 120 may be formed by forming an aluminum oxide layer on the substrate 110 and depositing a silicon oxide (SiO 2) layer on the aluminum oxide layer.
- the zener diode 191 may be inserted before the step S101.
- the first ground pad 142 and the second ground pad 144 separated from each other are formed on the insulating layer 120 (S111).
- the seed metal may be sputtered on the insulating layer 120, and a photo process and a metal plating process for fabricating the first ground pad 142 and the second ground pad 144 may be performed.
- Ti or Au can be used as a seed metal, and Cu or Au metal plating can be used for a metal plating process.
- the first separator 151 filling the gap between the ground pads, the second separator 152 stacked on one surface of the first ground pad 142, and the first stacked layer on one surface of the second ground pad 144. 3 to form a separator 153 (S121).
- the first separator 151 to the third separator 153 may be formed by applying a polymer on the first ground pad 142 and the second ground pad 144.
- the first partition layer 160 having a predetermined height is formed on each separation membrane (S131).
- the first barrier layer 160 is formed by stacking a first photoresist layer on a substrate 110 on which a separator is formed, and exposing a portion of the first ground pad 142 and the second ground pad 144. It may be formed through the process of etching the resist layer.
- the seed metal is sputtered on the substrate 110 on which the first partition wall layer 160 is formed (S141).
- a second partition wall 170 having a predetermined height is formed on the first partition wall layer 160 (S151).
- the second partition wall layer 170 may be formed such that the upper surface 164 of the first partition wall layer 160 formed on the first separation layer 151 is covered by the second partition wall layer 170.
- the second barrier layer 170 is formed such that the top surfaces 166 and 168 of the first barrier layer 160 formed on the second and third separator 153 are partially exposed by the second barrier layer 170. can do.
- a metal plating process is performed on the substrate 110 on which the second barrier layer 170 is formed, and the first mirror 182 and the second ground pad 144 connected to the first ground pad 142 are connected to each other.
- a second mirror 184 is formed (S161).
- the first mirror 182 and the second mirror 184 may be formed by electroplating Ni, Su, Cu, Au, or Ag on the substrate 110 on which the second partition wall layer 170 is formed.
- the zener diode 191 is connected to the first mirror 182, and the LED 192 is connected to the second mirror 184 (S181).
- the phosphor 194 material is stacked to fill the space formed by the first mirror 182 and the second mirror 184 (S191).
- the driver IC 200 and the integrated passive device 210 may be integrated together on the insulating film 120 of the LED module.
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- Computer Hardware Design (AREA)
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- Manufacturing & Machinery (AREA)
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- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
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- Electroluminescent Light Sources (AREA)
Abstract
Description
Claims (19)
- LED 모듈 제조 방법에 있어서,기판에 절연막을 형성하는 단계,상기 절연막 상에 서로 분리된 제 1 접지 패드 및 제 2 접지 패드를 형성하는 단계,상기 접지 패드 간의 간격을 메꾸는 제 1 분리막, 상기 제 1 접지 패드의 일면상에 적층되는 제 2 분리막, 상기 제 2 접지 패드의 일면상에 적층되는 제 3 분리막을 형성하는 단계,상기 각 분리막의 상부에 소정 높이의 제 1 격벽층을 형성하는 단계,상기 제 1 격벽층이 형성된 기판에 시드 금속을 스퍼터링하는 단계,상기 제 1 격벽층의 상부에 소정 높이의 제 2 격벽층을 형성하는 단계,상기 제 2 격벽층이 형성된 기판에 금속 도금 공정을 수행하여, 상기 제 1 접지 패드와 접속되는 제 1 미러 및 상기 제 2 접지 패드와 접속되는 제 2 미러를 형성하는 단계,상기 제 1 격벽층 및 제 2 격벽층을 제거하는 단계,상기 제 1 미러상에 제너 다이오드를 접속하고, 상기 제 2 미러상에 LED를 접속하는 단계 및상기 제 1 미러 및 제 2 미러에 의하여 형성된 공간이 채워지도록 형광체 물질을 적층하는 단계를 포함하는 LED 모듈 제조 방법.
- 제 1 항에 있어서,상기 제 1 격벽층을 형성하는 단계는상기 분리막이 형성된 기판에 제 1 포토레지스트 층을 적층하는 단계 및상기 제 1 접지 패드 및 제 2 접지 패드의 일부가 노출되도록 상기 제 1 포토레지스트 층을 식각하는 단계를 포함하는 LED 모듈 제조 방법.
- 제 1 항에 있어서,상기 제 2 격벽층을 형성하는 단계는상기 제 1 분리막 상에 형성된 제 1 격벽층의 상면이 상기 제 2 격벽층에 의해 모두 커버되도록 하는 LED 모듈 제조 방법.
- 제 1 항에 있어서,상기 제 2 격벽층을 형성하는 단계는상기 제 2 및 제 3 분리막 상에 형성된 제 1 격벽층의 상면이 상기 제 2 격벽층에 의해 일부 노출되도록 하는 LED 모듈 제조 방법.
- 제 1 항에 있어서,상기 제 2 격벽층을 형성하는 단계는상기 스퍼터링이 수행된 기판에 제 2 포토레지스트 층을 적층하는 단계 및상기 제 1 접지 패드 및 제 2 접지 패드의 일부가 노출되고, 상기 제 1 분리막 상에 형성된 제 1 격벽층의 상면이 상기 제 2 포토레지스트 층에 의해 모두 커버되도록 상기 제 2 포토레지스트 층을 식각하는 단계를 포함하는 LED 모듈 제조 방법.
- 제 1 항에 있어서,상기 절연막을 형성하는 단계는상기 기판 상에 산화알루미늄층(AAO, Anodic Aluminum Oxide)을 형성하고, 상기 산화알루미늄층 상단에 산화 실리콘(SiO2) 층을 증착하는 단계를 포함하는 LED 모듈 제조 방법.
- 제 1 항에 있어서,상기 제 1 접지 패드 및 제 2 접지 패드를 형성하는 단계는상기 절연막 상에 시드 금속을 스퍼터링하고, 상기 제 1 접지 패드 및 제 2 접지 패드의 제작을 위한 포토 공정 및 금속 도금 공정을 진행하는 단계를 포함하는 LED 모듈 제조 방법.
- 제 7 항에 있어서,상기 시드 금속으로 Ti 또는 Au를 사용하고, 상기 금속 도금 공정에 Cu 또는 Au 금속 도금를 이용하는 것인 LED 모듈 제조 방법.
- 제 1 항에 있어서,상기 제 1 분리막 내지 제 3 분리막은상기 제 1 접지 패드 및 제 2 접지 패드 상에 폴리머를 도포하여 형성되는 것인 LED 모듈 제조 방법.
- 제 1 항에 있어서,상기 제 1 미러 및 제 2 미러는상기 제 2 격벽층이 형성된 기판에 Ni, Su, Cu, Au 및 Ag 중 하나 이상을 전기 도금하여 형성되는 것인 LED 모듈 제조 방법.
- LED 모듈 제조 방법에 있어서,기판에 제너 다이오드를 삽입하는 단계,상기 기판에 절연막을 형성하는 단계,상기 절연막 상에 서로 분리된 제 1 접지 패드 및 제 2 접지 패드를 형성하는 단계,상기 접지 패드 간의 간격을 메꾸는 제 1 분리막, 상기 제 1 접지 패드의 일면상에 적층되는 제 2 분리막, 상기 제 2 접지 패드의 일면상에 적층되는 제 3 분리막을 형성하는 단계,상기 각 분리막의 상부에 소정 높이의 제 1 격벽층을 형성하는 단계,상기 제 1 격벽층이 형성된 기판에 시드 금속을 스퍼터링하는 단계,상기 제 1 격벽층의 상부에 소정 높이의 제 2 격벽층을 형성하는 단계,상기 제 2 격벽층이 형성된 기판에 금속 도금 공정을 수행하여, 상기 제 1 접지 패드와 접속되는 제 1 미러 및 상기 제 2 접지 패드와 접속되는 제 2 미러를 형성하는 단계,상기 제 1 격벽층 및 제 2 격벽층을 제거하는 단계,상기 제 2 미러상에 LED를 접속하는 단계 및상기 제 1 미러 및 제 2 미러에 의하여 형성된 공간이 채워지도록 형광체 물질을 적층하는 단계를 포함하는 LED 모듈 제조 방법.
- 제 11 항에 있어서,상기 삽입된 제너 다이오드는 상기 제 1 미러의 하단 방향에 위치되는 것인 LED 모듈 제조 방법.
- 제 11 항에 있어서,상기 제 1 격벽층을 형성하는 단계는상기 분리막이 형성된 기판에 제 1 포토레지스트 층을 적층하는 단계와, 상기 제 1 접지 패드 및 제 2 접지 패드의 일부가 노출되도록 상기 제 1 포토레지스트 층을 식각하는 단계를 포함하고,상기 제 2 격벽층을 형성하는 단계는상기 스퍼터링이 수행된 기판에 제 2 포토레지스트 층을 적층하는 단계와, 상기 제 1 접지 패드 및 제 2 접지 패드의 일부가 노출되고, 상기 제 1 분리막 상에 형성된 제 1 격벽층의 상면이 상기 제 2 포토레지스트 층에 의해 모두 커버되도록 하고, 상기 제 2 및 제 3 분리막 상에 형성된 제 1 격벽층의 상면이 상기 제 2 격벽층에 의해 일부 노출되도록 상기 제 2 포토레지스트 층을 식각하는 단계를 포함하는 LED 모듈 제조 방법.
- 제 11 항에 있어서,상기 절연막을 형성하는 단계는상기 기판 상에 산화알루미늄층(AAO, Anodic Aluminum Oxide)을 형성하고, 상기 산화알루미늄층 상단에 산화 실리콘(SiO2) 층을 증착하는 단계를 포함하고,상기 제 1 접지 패드 및 제 2 접지 패드를 형성하는 단계는상기 절연막 상에 Ti 또는 Au 시드 금속을 스퍼터링하고, 상기 제 1 접지 패드 및 제 2 접지 패드의 제작을 위한 포토 공정 및 Cu 또는 Au를 이용한 금속 도금 공정을 진행하는 단계를 포함하는 LED 모듈 제조 방법.
- 제 11 항에 있어서,상기 제 1 분리막 내지 제 3 분리막은상기 제 1 접지 패드 및 제 2 접지 패드 상에 폴리머를 도포하여 형성되고,상기 제 1 미러 및 제 2 미러는상기 제 2 격벽층이 형성된 기판에 Ni, Su, Cu, Au 및 Ag 중 하나 이상을 전기 도금하여 형성되는 것인 LED 모듈 제조 방법.
- 제 1 항 또는 제 11 항에 있어서,상기 절연막 상에 드라이버 IC(Integrated Circuit)를 접속시키는 단계를 더 포함하는 LED 모듈 제조 방법.
- 제 1 항, 제 11 항 및 제 16 항 중 어느 한 항에 있어서,상기 절연막 상에 집적 수동소자를 접속시키는 단계를 더 포함하는 LED 모듈 제조 방법.
- LED 모듈에 있어서,절연막이 형성된 기판 상에 서로 분리되어 형성된 제 1 접지 패드 및 제 2 접지 패드,상기 제 1 접지패드와 일면이 접속된 제 1 미러,상기 제 2 접지패드와 일면이 접속된 제 2 미러,상기 제 1 미러에 접속된 제너 다이오드,상기 제 2 미러의 일부면상에 배치된 LED와,상기 제너 다이오드 및 LED 상에 형성된 형광체를 포함하되,상기 제 1 미러의 타면 및 제 2 미러의 타면은 서로 마주 보도록 형성된 LED 모듈.
- 제 18 항에 있어서,상기 접속된 제너 다이오드는 상기 제 1 미러의 하단 방향에 위치되는 LED 모듈.
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RU2012144411/28A RU2510102C1 (ru) | 2010-03-19 | 2011-03-18 | Светодиодный модуль и способ его изготовления |
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DE102019112030B4 (de) | 2019-05-08 | 2023-11-02 | LSR Engineering & Consulting Limited | Verfahren zum Strukturieren eines Substrats |
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KR20110105624A (ko) | 2011-09-27 |
TWI473308B (zh) | 2015-02-11 |
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US20120326195A1 (en) | 2012-12-27 |
EP2549553A2 (en) | 2013-01-23 |
KR101121151B1 (ko) | 2012-03-20 |
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WO2011115457A3 (ko) | 2011-12-29 |
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