WO2011114556A1 - 湿式ブラスト加工用研磨材及びその製造方法 - Google Patents

湿式ブラスト加工用研磨材及びその製造方法 Download PDF

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Publication number
WO2011114556A1
WO2011114556A1 PCT/JP2010/066726 JP2010066726W WO2011114556A1 WO 2011114556 A1 WO2011114556 A1 WO 2011114556A1 JP 2010066726 W JP2010066726 W JP 2010066726W WO 2011114556 A1 WO2011114556 A1 WO 2011114556A1
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Prior art keywords
polymer particles
abrasive
meth
weight
monomer
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PCT/JP2010/066726
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English (en)
French (fr)
Japanese (ja)
Inventor
史高 石森
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積水化成品工業株式会社
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Application filed by 積水化成品工業株式会社 filed Critical 積水化成品工業株式会社
Priority to CN201080065600.6A priority Critical patent/CN102802874B/zh
Publication of WO2011114556A1 publication Critical patent/WO2011114556A1/ja

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C11/00—Selection of abrasive materials or additives for abrasive blasts
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04—Homopolymers or copolymers of esters
    • C09J133/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen

Definitions

  • the present invention relates to an abrasive for wet blasting and a method for producing the same. More specifically, the present invention relates to an abrasive for wet blasting with less particles (abrasive) floating during wet blasting and a method for producing the same.
  • the inventor of the present invention has found that emulsions and / or microparticles that are generated as a secondary component during the process of polymerization for producing a wet blasting abrasive (spherical polymer particles).
  • spherical polymer particles By preventing the particles from sticking firmly to the particle surface, the spherical polymer particle surface can be smoothed. By smoothing the particle surface, bubbles are attached to the particles, and the particles are attached by the bubbles.
  • the present invention was found.
  • a (meth) acrylate monomer containing an ether group and a hydroxyl group or an ester group and a hydroxyl group, and a vinyl compound other than the (meth) acrylate monomer.
  • It consists of spherical polymer particles derived from a monomer mixture containing 100 parts by weight of the monomer, and the number of emulsions and / or fine particles adhering to the surface of the spherical polymer particles that are secondary generated during polymerization.
  • Is an abrasive for wet blasting in which the number of deposits is 9 or less (where the number of deposits is an average value of five fields of view for an arbitrary region of 6 ⁇ m ⁇ 5 ⁇ m of polymer particles).
  • FIG. 1 It is a SEM image of the abrasive
  • 2 is an enlarged image of the particle surface of FIG. 1 (showing the state of adhesion of emulsion and / or fine particles within a range of 6 ⁇ m wide ⁇ 5 ⁇ m long).
  • FIG. 4 is an enlarged image of the particle surface of FIG. 3 (showing the state of adhesion of emulsion and / or fine particles within a range of 6 ⁇ m wide ⁇ 5 ⁇ m long).
  • oil-soluble polymerization inhibitors examples include 2,6-di-t-butyl-p-cresol (BHT), 3-t-butyl-4-hydroxyanisole (3-BHA), 2-t-butyl-4-hydroxy Anisole (2-BHA), 2,2′-methylenebis (4-methyl-6-tert-butylphenol) (MBMBP), 2,2′-methylenebis (4-ethyl-6-tert-butylphenol) (MBEBP), 4 , 4′-Butylidenebis (3-methyl-6-tert-butylphenol) (BBMBP), 4,4′-thiobis (3-methyl-6-tert-butylphenol) (SBMBP), styrenated phenol, styrenated p-cresol 1,1,3-tris (2-methyl-4-hydroxy-5-t-butylphenyl) butane, tetrakis [methylene-3- (3 ′, 5 ′ Di-1-butyl-4′-hydroxyphenyl) propionate]
  • the number of stirrings is within 400 times per 1 kg of polymer particles until the weight loss on heating becomes 1%.
  • the number of stirring is more preferably 200 times or less, and particularly preferably 100 times or less. Agitation may be either continuous or intermittent. If the number of times of stirring per kg of polymer particles increases, the number of times of contact between the dryer and the resin particles increases, so that the time required for drying becomes shorter. On the other hand, the external force applied to the particles by stirring increases and the friction between the particles increases, so that an emulsion or the like adheres to the surface of the polymer particles, and it becomes easy to firmly fix the particles.
  • the ratio between the stirring time and the standing time is preferably in the range of 1: 9 to 59. Further, assuming that one stirring and one standing are one cycle, it is preferable to intermittently perform 10 to 60 cycles.
  • the polymerization stability when m is larger than 50, the polymerization stability may be lowered and coalescence particles may be generated. When n is larger than 50, the polymerization stability is also lowered and the coalescence particles are degraded. May occur.
  • a preferable range of m and n is a compound of 0 to 30 (except when m and n are 0 at the same time).
  • the polymerization stability when p is larger than 50, the polymerization stability may be lowered and coalescence particles may be generated.
  • a preferred range of p is 1-30.
  • Two Rs may be the same or different.
  • vinyl monomer examples include monomers that can be copolymerized with the (meth) acrylate monomer containing the ether group and the hydroxyl group or the ester group and the hydroxyl group. Specifically, it contains carboxyl groups such as methacrylic acid, acrylic acid, 2-methacryloyloxyethyl succinic acid, 2-methacryloyloxyethyl phthalic acid, 2-methacryloyloxyethyl hexahydrophthalic acid and 2-methacryloyloxyethyl maleic acid.
  • carboxyl groups such as methacrylic acid, acrylic acid, 2-methacryloyloxyethyl succinic acid, 2-methacryloyloxyethyl phthalic acid, 2-methacryloyloxyethyl hexahydrophthalic acid and 2-methacryloyloxyethyl maleic acid.
  • vinyl monomers monofunctional monomers such as styrene and methyl methacrylate, and crosslinkable monomers such as ethylene glycol dimethacrylate, which are inexpensive in terms of cost, are preferable.
  • the amount of the (meth) acrylate monomer containing an ether group and a hydroxyl group or an ester group and a hydroxyl group is 0.1 to 20 parts by weight with respect to 100 parts by weight of the vinyl monomer.
  • the amount is less than 0.1 part by weight, the hydrophilicity of the polymer particles is insufficient, and when dispersed in water and used as a slurry for wet blasting, the polymer particles may float in association with bubbles in the water. .
  • the concentration is not constant at the upper and lower portions of the slurry, and becomes non-uniform, resulting in variations in polishing power.
  • the slurry may foam significantly, and the particles may float together with the foam. Also in this case, the polishing force varies. The reason for foaming is presumed to be due to the presence of unreacted monomers.
  • a more preferable range of use amount is 1.0 to 15 parts by weight.
  • spherical polymer particles are used.
  • the spherical shape here does not have a strict meaning like a true sphere, but includes not only a circular true sphere but also an elliptical so-called substantially spherical shape.
  • a preferable spherical shape is a shape in which the ratio of the minor axis to the major axis (minor axis / major axis) is in the range of 1 to 0.9 in the projection diagram of the particles.
  • the minor axis / major axis 1 means a true sphere.
  • pellets, needles, and flakes with an indefinite shape outside the range of minor axis / major axis the polymer particles themselves have low impact resistance. Fine powder may be generated.
  • the method for producing polymer particles of the present invention is not particularly limited as long as spherical particles are obtained.
  • polymerization in an aqueous medium such as suspension polymerization, emulsion polymerization, or seed polymerization, or pelletizing the polymer mass by extrusion, and heating the pellet to a temperature at which the surface can be softened to obtain spherical particles Methods and the like.
  • the production method is preferably polymerization in an aqueous medium, and suspension polymerization is particularly suitable.
  • Suspension polymerization or emulsion polymerization is performed by polymerizing a polymer mixture containing a vinyl monomer, a (meth) acrylate monomer, and optionally a polymerization initiator in an aqueous medium.
  • hydrophilic sites are likely to appear on the surface of the resulting polymer particles due to the (meth) acrylate monomers, and highly hydrophilic particles can be obtained by adding a small amount of these monomers.
  • the oil droplets of the monomer mixture can be stably present in the aqueous medium, polymer particles having high monodispersity and small particle size variation can be obtained.
  • a component derived from the (meth) acrylate monomer is present on the particle surface, this causes steric repulsion, and the dispersibility of the polymer particles in water can be improved.
  • the surface of the polymer particles is photographed using a scanning electron microscope (SEM) at a photographing magnification of 2000 times for a total of five fields of view from different angles.
  • the photographed image is an image having a visual field of 6 ⁇ m wide ⁇ 5 ⁇ m long (3 ⁇ 10E-9 m 2 ).
  • the number of emulsions having a major axis of 1 ⁇ m or more is counted from each image, and an average value for five fields of view is obtained.
  • the calculated average value is evaluated based on the following four evaluation criteria.
  • ⁇ The number of emulsions is more than 5 and less than 10.
  • ⁇ The number of emulsions is 10 or more and less than 15.
  • X The number of emulsions is 15 or more.
  • honing was started with the particle concentration in the slurry being 30%, and the particle concentration was less than 20% from the start of honing while measuring the particle concentration every hour.
  • the time until the time is defined as “time required for adding particles”.
  • the evaluation is based on the following three evaluation criteria. ⁇ : 20 hours or more ⁇ : 10 hours or more but less than 20 hours ⁇ : less than 10 hours
  • the method for measuring the particle concentration in the slurry is that the slurry is taken from a measuring cylinder and the particles are allowed to settle out of the sedimentation height. Measured by determining the volume percent of

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
PCT/JP2010/066726 2010-03-19 2010-09-27 湿式ブラスト加工用研磨材及びその製造方法 WO2011114556A1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201080065600.6A CN102802874B (zh) 2010-03-19 2010-09-27 用于湿式喷砂的磨料及其制造方法

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JP2010064891A JP5444066B2 (ja) 2010-03-19 2010-03-19 湿式ブラスト加工用研磨材及びその製造方法
JP2010-064891 2010-03-19

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WO2011114556A1 true WO2011114556A1 (ja) 2011-09-22

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Publication number Priority date Publication date Assignee Title
JP5905251B2 (ja) * 2011-12-26 2016-04-20 積水化成品工業株式会社 樹脂粒子、分散液およびその用途
JP6313974B2 (ja) * 2013-03-29 2018-04-18 積水化成品工業株式会社 架橋アクリル系樹脂粒子及びその製造方法、樹脂組成物並びに包装物品
JP6199222B2 (ja) * 2014-03-28 2017-09-20 積水化成品工業株式会社 複合粒子、複合粒子の製造方法、及び外用剤
FR3035607B1 (fr) * 2015-04-30 2017-04-28 Saint-Gobain Centre De Rech Et D'Etudes Europeen Procede de modification de l'aspect d'une surface
JP6901968B2 (ja) * 2015-06-04 2021-07-14 株式会社日本触媒 有機重合体微粒子

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63351A (ja) * 1986-06-19 1988-01-05 Mitsui Toatsu Chem Inc 合成樹脂製研磨材
JPH036285A (ja) * 1989-06-02 1991-01-11 Mitsui Toatsu Chem Inc 合成樹脂研磨材
JPH03251369A (ja) * 1990-02-27 1991-11-08 Kanebo Ltd 湿式ブラスト用投射材
DE29612046U1 (de) * 1996-07-11 1996-09-12 Christ Otto Gmbh & Co Vorrichtung zum Reinigen von verschmutzten Oberflächen

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH063351A (ja) * 1992-06-19 1994-01-11 Hitachi Zosen Corp 排プラスチック中の塩ビ検出装置
FR2766106B1 (fr) * 1997-07-18 2001-09-07 Coatex Sa Utilisation d'un copolymere a structure tensio-active comme agent dispersant et/ou d'aide au broyage
US7344574B2 (en) * 2005-06-27 2008-03-18 3M Innovative Properties Company Coated abrasive article, and method of making and using the same
CN101525401B (zh) * 2009-03-16 2010-12-01 南京工业大学 用于水射流的亲水性不饱和聚酯磨料及其制备方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63351A (ja) * 1986-06-19 1988-01-05 Mitsui Toatsu Chem Inc 合成樹脂製研磨材
JPH036285A (ja) * 1989-06-02 1991-01-11 Mitsui Toatsu Chem Inc 合成樹脂研磨材
JPH03251369A (ja) * 1990-02-27 1991-11-08 Kanebo Ltd 湿式ブラスト用投射材
DE29612046U1 (de) * 1996-07-11 1996-09-12 Christ Otto Gmbh & Co Vorrichtung zum Reinigen von verschmutzten Oberflächen

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JP5444066B2 (ja) 2014-03-19
JP2011194529A (ja) 2011-10-06
CN102802874A (zh) 2012-11-28

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