WO2011108419A1 - 液体のろ過方法 - Google Patents
液体のろ過方法 Download PDFInfo
- Publication number
- WO2011108419A1 WO2011108419A1 PCT/JP2011/053993 JP2011053993W WO2011108419A1 WO 2011108419 A1 WO2011108419 A1 WO 2011108419A1 JP 2011053993 W JP2011053993 W JP 2011053993W WO 2011108419 A1 WO2011108419 A1 WO 2011108419A1
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- WO
- WIPO (PCT)
- Prior art keywords
- filter
- liquid
- filtration
- solvent
- present
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D37/00—Processes of filtration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D37/00—Processes of filtration
- B01D37/04—Controlling the filtration
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
- B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
Definitions
- the present invention relates to a method for filtering polishing slurry containing various liquids, particularly fine particles such as abrasives, as a dispersoid.
- the required level of surface smoothness and defect-freeness of the processed surface is increasing year by year.
- particles having a smaller particle diameter such as abrasives contained in the polishing slurry have been selected.
- the particle size of fine particles such as an abrasive generally has a distribution, and contains extremely large coarse particles with respect to the intended particle size.
- the coarse particles may cause surface defects such as scratches, it is preferable to remove them.
- the coarse particles contained in the polishing slurry in which fine particles are dispersed in such a liquid medium are usually removed by a filter.
- Filters used industrially are generally those in which resin fibers are wound around a core and molded, or those in which minute pores are formed in a resin film.
- a liquid can be passed through gaps formed between fibers or pores formed in a film, and coarse particles that cannot pass through can be removed.
- the filtration efficiency is not high immediately after the start of use. This is presumably because commercially available filters are generally dry, and the liquid hardly penetrates into the pores of the filter immediately after the start, and air tends to remain in the pores.
- the filtration efficiency immediately after the start of filtration tends to be very poor compared to non-viscous liquids. For this reason, it may be possible to press-fit water into the filter as a pretreatment.
- a large pressure is required. In some cases, a pressure higher than the breaking pressure of the filter may be required. Furthermore, a powerful pump is required to obtain such a high pressure.
- the pore size of the filter is distributed and there are very small pores, but even if pressure is applied, such small pores still do not easily penetrate water.
- IPA isopropyl alcohol
- Patent Document 1 a method of filtering water after wetting the filter with an organic solvent such as isopropyl alcohol (hereinafter sometimes referred to as IPA) having affinity for both the filter and water is known.
- Patent Document 1 a method of filtering water after wetting the filter with an organic solvent such as isopropyl alcohol (hereinafter sometimes referred to as IPA) having affinity for both the filter and water is known.
- Patent Document 1 a method in which an aqueous surfactant solution or the like is introduced under pressure into a hydrophobic porous hollow fiber membrane.
- Patent Document 2 a method of immersing the hydrophobic porous membrane in deaerated water (Patent Document 2) has been disclosed, but according to the study by the present inventors, it is sufficient to immerse the filter in deaerated water. It was found that there was room for improvement as a pretreatment.
- an object of the present invention is to provide a filtration method for various dispersions that can satisfy an improvement in filtration efficiency and a longer filter life.
- the method for filtering a liquid according to the present invention is a method of filtering a liquid with a filter, and prior to filtering the liquid with the filter, the filter is sealed with a solvent that is a main component of the liquid. It is characterized by carrying out decompression treatment in the inside.
- the filtration efficiency immediately after the start of filter use or immediately after filter replacement is improved, and further, by reducing the portion that does not contribute to the filtration of the filter, the long-term filtration efficiency is also improved, and clogging is further reduced.
- the efficiency of the filtration process and cost reduction can be achieved. Thereby, for example, it is possible to produce a polishing slurry containing abrasive grains as a dispersoid with high efficiency and low cost.
- the liquid to be filtered is not particularly limited. That is, the filtration method according to the present invention can be applied to an arbitrary liquid by selecting a filter to be described later according to the component contained in the liquid and the component to be removed from the liquid.
- the filtration method according to the present invention is particularly effective for removing the fine particle component or a part thereof, particularly coarse particles, from the dispersion or dispersion in which the insoluble fine particle component is dispersed in the solvent. It is also effective for removing the impure component from a solution in which impurities are suspended as an insoluble component in the solution.
- the purpose is to allow particles having a desired particle diameter to permeate through a solvent or dispersion medium and particles dispersed in a liquid, while removing particles larger than a desired range and other relatively large impurity components. It is preferable to use the method of the present invention.
- the polishing slurry is for polishing a silicon substrate, a silicon carbide substrate, a metal oxide, a semiconductor device substrate, a hard disk substrate, glass, plastic, or the like.
- the polishing slurry contains oxide particles, nitrides, carbides, and more specifically, abrasive particles such as alumina, silica, ceria, titania, zirconia, diamond, silicon nitride, boron nitride in a dispersion medium.
- the filtration method according to the present invention is preferably used to remove not only impurities such as coarse particles contained in the raw material but also agglomerates and foreign substances to be purified during preparation from the polishing slurry.
- the average particle size of the fine particles contained in the dispersion is preferably 10 to 5000 nm, and preferably 20 to 300 nm. Is more preferable.
- the average particle diameter means that measured by the BET method unless otherwise specified. There are other methods for measuring the average particle size, such as light scattering method and laser diffraction method, but it is difficult to directly compare the average particle size measured by these methods with the particle size measured by the BET method. is there. In some cases, the average particle size measured by a method other than the BET method can be converted into the average particle size measured by the BET method, taking into account the principle of the measurement method, etc. It is preferable to do.
- the filtration method according to the present invention can be applied to the raw material instead of the polishing slurry itself. That is, the filtration method according to the present invention can be used for the purpose of removing coarse particles, gels, foreign matters, and the like from a dispersion containing abrasive particles that are raw materials for the polishing slurry. Alternatively, the filtration method according to the present invention can also be used to remove other undissolved substances, foreign matters and the like contained in various additive solutions.
- the time when the liquid is filtered by the filtration method according to the present invention is not particularly limited.
- the user removes the polishing slurry from the container and uses it for polishing, not only when the polishing slurry is filtered before filling the container as a product.
- the method of the present invention can be used before.
- the filtration method of the present invention can also be used when the polishing slurry once used is to be regenerated and reused.
- the filtration method according to the present invention comprises filtering the liquid using a filter.
- a media filter made of resin or glass fiber means a filter part through which a liquid passes is made of resin or glass fiber.
- the entire filter portion it is not necessary for the entire filter portion to be made of resin or glass fiber.
- fibers or metals may be included as a core material.
- the core material is preferably covered with a resin or glass fiber and is not in direct contact with the liquid to be filtered. This is because when the core material is a metal or the like, undesirable metal ions or the like may be eluted in the liquid.
- the resin or glass fiber media filter is preferably composed only of a filter portion made of resin or glass fiber.
- a filter consisting only of a filter portion is particularly preferable when it is incorporated in a pipe in a manufacturing process or the like.
- a cartridge-like one composed of a filter portion and a cartridge containing the filter portion is also used.
- the filter member is made of the resin or glass fiber described above, and the filter member is fixed inside the housing.
- the part that comes into contact with the liquid such as the packing provided on the inner surface of the housing or the contact with the pipe, is coated or formed with resin or rubber, and the part that comes into contact with the liquid It is preferable that no metal is used.
- resin or glass fiber media filters are commercially available in various types other than those having different structures as described above, such as those having different applications, for example, for separating fine particles and for separating microorganisms. Any one can be used depending on the case.
- the type of resin or glass fiber used for the filter member is not particularly limited, but is preferably inert to the liquid to be filtered.
- a common resin or glass fiber can be used.
- preferable materials used for the filter member include nylon, polycarbonate, polytetrafluoroethylene (hereinafter sometimes referred to as PTFE), polysulfone, polyethersulfone, cellulose and derivatives thereof, polypropylene, and glass fiber.
- nylon include nylon 6 and nylon 66.
- guide_body of a cellulose is included as a derivative
- filter members can be either hydrophilic or hydrophobic.
- the effect of improving the filtration efficiency at the start of use of the filter according to the present invention is preferable because the filter member is more hydrophobic.
- a filter including such a hydrophobic filter member is referred to as a hydrophobic filter.
- Whether or not the filter member is hydrophobic can be determined by whether or not water passes through the filter member. When the filter member is hydrophobic, water droplets are repelled on the surface of the filter member, or pressurization is required to allow water to pass through.
- Examples of such a hydrophobic filter include polypropylene and polytetrafluoroethylene (PTFE).
- the effect of the present invention is large with the hydrophobic filter member because the air in the filter pores is more likely to stay in the case of the hydrophobic material than the case where the material of the filter member is hydrophilic and is difficult to remove. it is conceivable that.
- CP filter (trade name) manufactured by Chisso Filter Co., Ltd.
- Polypro Clean (trade name) manufactured by Sumitomo 3M Co., Ltd.
- Profile II (trade name) manufactured by Nippon Pole Co., Ltd.
- ADVANTEC Toyo Co., Ltd. depth cartridge filter (brand name) etc. are mentioned. *
- the filter member is a non-woven fabric type depth filter formed by randomly and uniformly forming fibers made of resin such as polypropylene, and is formed by opening a hole of about 0.01 to several ⁇ m in the resin film.
- membrane type membrane filters Any type may be used in the present invention, but it is preferable to use a non-woven fabric type, particularly a non-woven fabric type depth filter, since the effects of the present invention are more easily manifested. The reason for this is considered to be that the retention of air in the pores greatly affects the filtration efficiency in the depth filtration. However, even in the case of sieve filtration or cake filtration, there is an effect of removing fine particles in the pores, so that the filtration efficiency can be improved by applying the filtration method of the present invention.
- depth filters can be broadly divided into the following two types.
- One is a planar filter having a planar filter paper shape.
- the other is a pipe-like filter in which a nonwoven fabric is wound around a cylindrical core or the like.
- such a pipe-shaped filter is often processed in such a manner that one end or both ends are processed so that the liquid does not leak and is housed in a cartridge.
- a cartridge-like three-dimensional or pipe-shaped filter housed in a cartridge is preferably used. This is because the filtration area is large and the handleability is excellent. Any of these shapes can be used for the filtration method according to the present invention.
- the filtration accuracy of the filter used in the present invention can be arbitrarily selected according to the type of liquid to be filtered, the components contained, the size of impurities to be removed, and the like.
- the filtration accuracy of the filter is preferably 5 ⁇ m or less, more preferably 1 ⁇ m or less, further preferably 0.5 ⁇ m or less, and 0.3 ⁇ m or less. Most preferred.
- the filtration accuracy of 0.3 ⁇ m at this time is defined as removing 99.9% or more of particles having an average particle size of 0.3 ⁇ m or more.
- this treatment is performed by subjecting the filter member to a reduced pressure treatment in a sealed container filled with a solvent.
- this processing may be referred to as “preprocessing”.
- preprocessing it is considered that the gas present in the pores in the filter member is removed and the pores are wetted, and as a result, high filtration efficiency can be obtained immediately after the start of filtration.
- the pretreatment according to the present invention is specifically performed by enclosing a filter member in a sealed container filled with a solvent and depressurizing the inside of the sealed container. At this time, the entire filter member is preferably in contact with the solvent.
- the entire filter member is not in contact with the solvent, the portion not in contact with the solvent is not substantially pretreated, and the filtration efficiency of the portion is not improved. The more portions that do not come into contact with such a solvent, the smaller the effect of improving the filtration efficiency. Therefore, the entire filter member is preferably in contact with the solvent.
- the decompression condition is preferably 10 kPa or less, more preferably 5 kPa or less. If the degree of vacuum is too low, the effect of the present invention is not sufficiently exhibited. On the other hand, the lower the pressure when performing the decompression treatment, the stronger the effect of the present invention tends to be. However, even if the pressure is excessively reduced, the effect may be saturated, and it is excessive for realizing a low pressure. Care must be taken because of the high cost.
- the time for the decompression treatment is not particularly limited, but if it is excessively short, the effect of the present invention is not sufficiently exerted, so 30 seconds or more is preferable, and 60 seconds or more is more preferable.
- the effect of the present invention tends to be more strongly expressed as the time of the decompression process is longer, the effect may be saturated even if the time of the decompression process is excessively long, and the production efficiency may be reduced. There is a need to be careful.
- the solvent used in the filtration method according to the present invention is the same solvent as the solvent that is the main component of the liquid to be filtered.
- the medium is generally referred to as a dispersion medium.
- such a dispersion medium is also referred to as a solvent.
- the solvent that is the main component of the liquid is water.
- the filter member is sealed in a sealed container filled with water, and pretreatment is performed by reducing the pressure inside the sealed container.
- the solvent is water
- An organic solvent may be sufficient.
- the solvent which is the main component of the liquid is a mixed solvent, the mixed solvent may be used.
- the solvent that is the main component of the target liquid is water, the effect of the present invention is strongly expressed.
- the solvent used for the pretreatment may contain an arbitrary additive as long as the effects of the present invention are not impaired.
- various reducing oxygen scavengers, preservatives, alcohols and the like may be added to the solvent.
- the solvent used for the pretreatment may contain a component contained in the liquid to be filtered. That is, when the liquid to be filtered is, for example, an aqueous polishing slurry, in addition to water as a main solvent, abrasive particles, water-soluble polymer compounds, acids or alkalis as pH adjusting agents, preservatives , Each main component such as a surfactant is included. At this time, the solvent used in the present invention may contain these components. Therefore, the polishing slurry itself to be filtered can be used as a solvent.
- the composition of the components is close to the liquid to be filtered and the solvent used for the pretreatment because it is easy or unnecessary to replace the solvent remaining in the filter after subjecting the filter to a reduced pressure treatment.
- the pretreatment is performed using the liquid to be filtered as a solvent, the pretreatment and the filtration of the liquid can be performed seamlessly.
- solvents having different components are mixed into the target liquid. Therefore, it is preferable that the loss at the start of filtration is reduced.
- the pretreatment can be carried out at an arbitrary method and time.
- a module that can be made independent as a sealed container is installed in the downstream piping of the liquid preparation process, and a filter is attached to that part, and the solvent is temporarily allowed to flow through the piping before filtering the prepared liquid.
- the sealed container is filled with a solvent and then sealed and subjected to reduced pressure treatment, it is preferable because a pretreatment facility different from the liquid filtration facility is not required and can be used continuously in the liquid filtration step after the pretreatment. .
- the filter once pretreated can exert the effects of the present invention even if it is brought into contact with air unless it is dried.
- the pretreatment can also be combined with a method of applying a physical impact such as ultrasonic waves or vibrations.
- a physical impact such as ultrasonic waves or vibrations.
- the filtration method according to the present invention can be used at any stage in the production of various liquid materials. Furthermore, since the non-degassed liquid used in the present invention is the same component except the liquid medium to be filtered and the dissolved gas, there is a low possibility that impurities will be mixed in, and this will affect the quality of the liquid produced. There is an advantage that there are few.
- Such a filtration method according to the present invention is preferably used for producing a liquid in which fine particles are dispersed as described above, but is particularly preferably used for producing a polishing slurry.
- Examples 1 to 7 As a filter member for filtering the liquid, prepare a depth filter (filter size total length about 50 cm; outer diameter about 7 cm; inner diameter about 2.8 cm) with a total length of about 50 cm, which is filled with a solvent according to the pretreatment conditions shown below. In a closed container. Pretreatment conditions Decompression treatment time: 0.25 minutes, 0.5 minutes, 1 minute, 2 minutes, 5 minutes, 30 minutes, or 60 minutes Decompression conditions: 1.2 kPa, or 10 kPa Pressure reducing device: VP-SD300V manufactured by Mitsubishi Electric FA Industrial Equipment Co., Ltd. Solvent: Ultrapure water
- Example 1 The same filter as in Example 1 was prepared, and the pretreatment was performed by changing the reduced pressure condition to 50 kPa among the pretreatment conditions. Next, evaluation was performed in the same manner as in Example 1.
- Example 2 The same filter as Example 1 was prepared, and the pretreatment which only immersed this in ultrapure water or IPA under atmospheric pressure (101.325 kPa) was implemented. Next, evaluation was performed in the same manner as in Example 1.
- the treatment by immersion in ultrapure water was performed by immersing the filter in ultrapure water and allowing to stand for 1 hour.
- the treatment by immersion in IPA involves immersing the filter in IPA at a relatively slow rate of 2 cm / second, allowing it to stand for 60 minutes, and then washing the filter with pure water (5 L / min, 500 L or more of pure water). ).
- Example 9 and Comparative Examples 4 to 5 A filter having the same material and shape as that of Example 1 except for the filtration accuracy was prepared and subjected to a reduced pressure treatment at 1.2 kPa for 60 minutes in a sealed container filled with ultrapure water. Next, a polishing slurry containing 13% by weight of fumed silica having an average particle size of 30 nm as a liquid to be filtered was prepared, and filtered under the following filtration conditions using a pretreated filter. At that time, the filtration efficiency was measured immediately after the start of filtration, when 100 L was passed, when 200 L was passed, and when 300 L was passed. Further, the time required to pass a total of 360 L of the polishing slurry was measured. Filtration conditions ⁇ br/> Slurry slurry pressure for polishing: 0.16 MPa Pump: Diaphragm pump (manufactured by Wilden Pump & Engineering Company)
- Comparative Examples 4 and 5 the same slurry as in Example 7 was treated in the same manner as in Comparative Examples 2 and 3, and the polishing slurry was filtered.
- Comparative Examples 4 and 5 the same evaluation as in Example 7 was performed. The obtained results were as shown in Table 2.
- the method of the present invention in which the filter is subjected to reduced pressure treatment in a sealed container filled with a solvent as a pretreatment is a method using a filter simply immersed in a solvent. It was found that higher filtration efficiency can be obtained. In addition, according to the method of the present invention, it is possible to achieve a filtration efficiency equal to or higher than that obtained when the filter is immersed in IPA, and it becomes unnecessary or easy to perform the water washing after the IPA immersion. It was also found possible.
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- Mechanical Engineering (AREA)
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- Chemical Kinetics & Catalysis (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
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Abstract
Description
ろ過対象となる液体
本発明によるろ過方法において、ろ過をする対象となる液体は特に限定されない。すなわち、液体に含まれる成分とその液体から除去すべき成分とに応じて、後述するフィルターを選択することにより、任意の液体に対して本発明によるろ過方法を適用することができる。しかしながら、本発明によるろ過方法は、溶媒中に不溶な微粒子成分が分散されている分散液または分散物から、微粒子成分またはその一部分、特に粗大粒子等を除去するのに特に有効である。また、溶液中に不純物が不溶成分として浮遊している溶液から、その不純成分を除去するのにも有効である。すなわち、溶媒または分散媒と、液体中に分散された粒子の内、望ましい粒子径を有する粒子を透過させ、一方で望ましい範囲より大きい粒子やその他の相対的に大きな不純物成分を除去することを目的に本発明の方法を用いることが好ましい。
本発明によるろ過方法は、前記の液体をフィルターを用いてろ過することを含んでなる。ここで、本発明によるろ過方法では樹脂製又はグラスファイバー製メディアフィルターが用いられることが好ましい。樹脂製又はグラスファイバー製メディアフィルターとは、液体が通過するフィルター部分が樹脂又はグラスファイバーからなるものをいう。ここで、フィルター部分のすべてが樹脂又はグラスファイバーで構成される必要はなく、例えばフィルターの機械的強度を改良するために芯材として繊維や金属などを含んでいてもよい。ただし、この場合であっても、芯材は樹脂又はグラスファイバーにより被覆されて、ろ過する液体とは直接接触しないことが好ましい。これは、芯材が金属などであった場合には、液体中に好ましくない金属イオンなどが溶出する可能性があるからである。
液体をろ過するフィルター部材として、全長約50cmのデプスフィルター(フィルターサイズ全長約50cm;外径約7cm;内径約2.8cm)を準備し、これを下記に示す前処理条件に従い、溶媒が充填された密閉容器中で減圧処理した。
前処理条件
減圧処理時間: 0.25分、0.5分、1分、2分、5分、30分、または60分
減圧条件: 1.2kPa、または10kPa
減圧装置: 三菱電機FA産業機器株式会社製VP-SD300V
溶媒: 超純水
ろ過条件
ポンプ: レビトロポンプ LEV300(株式会社イワキ製)
通水条件: 回転数 2500rpm
実施例1と同じフィルターを準備し、前処理条件のうち減圧条件を50kPaに変更して前処理を実施した。次いで、実施例1と同様の方法で評価を実施した。
実施例1と同じフィルターを準備し、これをそれぞれ超純水、又はIPAに大気圧(101.325kPa)下で浸漬するだけの前処理を実施した。次いで、実施例1と同様の方法で評価を実施した。尚、超純水への浸漬による処理は、超純水の中にフィルターを浸して1時間静置することにより行った。また、IPAへの浸漬による処理は、フィルターを2cm/秒の比較的遅い速度でIPA中に没入させ、60分間静置した後、フィルターを純水にて洗浄(5L/分、純水500L以上)することにより行った。
実施例1とろ過精度が異なるだけで、材質および形状が同じフィルターを準備し、超純水が充填された密閉容器中で1.2kPaで60分間減圧処理した。次いで、ろ過する液体として平均粒子径が30nmのフュームドシリカを13重量%濃度で含む研磨用スラリーを準備し、前処理を施したフィルターを用いて下記に示すろ過条件でろ過した。その際、ろ過効率を、ろ過開始直後、100L通液時、200L通液時、300L通液時に測定した。また、合計360Lの研磨用スラリーを通液するのに要した時間を測定した。
ろ過条件
研磨用スラリー通液加圧: 0.16MPa
ポンプ: ダイヤフラムポンプ(ウィルデン・ポンプ・アンド・エンジニアリング・カンパニー製)
Claims (6)
- 液体をフィルターによりろ過するろ過方法であって、前記液体を前記フィルターでろ過するのに先立って、前記フィルターを前記液体の主成分である溶媒が充填された密閉容器中で減圧処理することを特徴とする、液体のろ過方法。
- 前記減圧処理条件が10kPa以下である、請求項1に記載のろ過方法。
- 前記液体が、研磨用スラリーである、請求項1または2に記載のろ過方法。
- 前記フィルターが疎水性フィルターである、請求項1~3のいずれか1項に記載のろ過方法。
- 前記フィルターが不織布タイプのデプスフィルターである、請求項1~4のいずれか1項に記載のろ過方法。
- 請求項1~5のいずれか1項に記載のろ過方法を用いる、研磨用スラリーの製造方法。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
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KR1020127022711A KR20130006606A (ko) | 2010-03-01 | 2011-02-23 | 액체의 여과 방법 |
US13/581,919 US20130139445A1 (en) | 2010-03-01 | 2011-02-23 | Liquid filtration method |
JP2012503082A JPWO2011108419A1 (ja) | 2010-03-01 | 2011-02-23 | 液体のろ過方法 |
CN2011800115175A CN102834157A (zh) | 2010-03-01 | 2011-02-23 | 液体的过滤方法 |
EP11750529A EP2543422A1 (en) | 2010-03-01 | 2011-02-23 | Liquid filtration method |
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JP2010044344 | 2010-03-01 | ||
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PCT/JP2011/053993 WO2011108419A1 (ja) | 2010-03-01 | 2011-02-23 | 液体のろ過方法 |
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US (1) | US20130139445A1 (ja) |
EP (1) | EP2543422A1 (ja) |
JP (1) | JPWO2011108419A1 (ja) |
KR (1) | KR20130006606A (ja) |
CN (1) | CN102834157A (ja) |
TW (1) | TW201206543A (ja) |
WO (1) | WO2011108419A1 (ja) |
Cited By (2)
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JP2018008262A (ja) * | 2016-07-05 | 2018-01-18 | 株式会社エフテック | 液体ろ過用減圧カプセルフィルタ |
JP2020197102A (ja) * | 2019-06-05 | 2020-12-10 | フジモリ産業株式会社 | トンネルの防水シート用空気抜き装置 |
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KR20190106679A (ko) * | 2018-03-07 | 2019-09-18 | 가부시키가이샤 후지미인코퍼레이티드 | 연마용 조성물 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01119310A (ja) | 1987-11-02 | 1989-05-11 | Mitsubishi Rayon Co Ltd | 疎水性多孔質中空糸膜の親水化法 |
JPH0237228B2 (ja) * | 1982-08-06 | 1990-08-23 | Mitsubishi Electric Corp | Goseijushinoganshinhoho |
JPH05208121A (ja) | 1992-01-30 | 1993-08-20 | Dainippon Ink & Chem Inc | 多孔質膜の親水化方法 |
JPH10166269A (ja) * | 1996-12-06 | 1998-06-23 | Tokyo Seimitsu Co Ltd | 研削装置 |
JP2001260117A (ja) * | 2000-03-21 | 2001-09-25 | Ngk Insulators Ltd | ハニカムフィルタ用基材及びその製造方法 |
JP2002346312A (ja) * | 2001-05-23 | 2002-12-03 | Fuji Photo Film Co Ltd | 送液流路における濾材処理方法 |
JP2009269161A (ja) * | 2008-05-02 | 2009-11-19 | Emaus Kyoto:Kk | 三次元網目構造多孔体からなるスラリー分離材及びその製造方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5733441A (en) * | 1996-06-27 | 1998-03-31 | United Microelectronics Corporation | Pre-wet system for a filter |
US7410605B2 (en) * | 2002-07-19 | 2008-08-12 | Fujifilm Corporation | Solution film-forming method |
JP2008111084A (ja) * | 2006-10-31 | 2008-05-15 | Konica Minolta Opto Inc | セルロースエステルフィルム、及びその製造方法 |
JP5038378B2 (ja) * | 2009-11-11 | 2012-10-03 | 株式会社コガネイ | 薬液供給装置および薬液供給方法 |
-
2011
- 2011-02-18 TW TW100105411A patent/TW201206543A/zh unknown
- 2011-02-23 CN CN2011800115175A patent/CN102834157A/zh active Pending
- 2011-02-23 EP EP11750529A patent/EP2543422A1/en not_active Withdrawn
- 2011-02-23 JP JP2012503082A patent/JPWO2011108419A1/ja active Pending
- 2011-02-23 KR KR1020127022711A patent/KR20130006606A/ko not_active Application Discontinuation
- 2011-02-23 US US13/581,919 patent/US20130139445A1/en not_active Abandoned
- 2011-02-23 WO PCT/JP2011/053993 patent/WO2011108419A1/ja active Application Filing
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0237228B2 (ja) * | 1982-08-06 | 1990-08-23 | Mitsubishi Electric Corp | Goseijushinoganshinhoho |
JPH01119310A (ja) | 1987-11-02 | 1989-05-11 | Mitsubishi Rayon Co Ltd | 疎水性多孔質中空糸膜の親水化法 |
JPH05208121A (ja) | 1992-01-30 | 1993-08-20 | Dainippon Ink & Chem Inc | 多孔質膜の親水化方法 |
JPH10166269A (ja) * | 1996-12-06 | 1998-06-23 | Tokyo Seimitsu Co Ltd | 研削装置 |
JP2001260117A (ja) * | 2000-03-21 | 2001-09-25 | Ngk Insulators Ltd | ハニカムフィルタ用基材及びその製造方法 |
JP2002346312A (ja) * | 2001-05-23 | 2002-12-03 | Fuji Photo Film Co Ltd | 送液流路における濾材処理方法 |
JP2009269161A (ja) * | 2008-05-02 | 2009-11-19 | Emaus Kyoto:Kk | 三次元網目構造多孔体からなるスラリー分離材及びその製造方法 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018008262A (ja) * | 2016-07-05 | 2018-01-18 | 株式会社エフテック | 液体ろ過用減圧カプセルフィルタ |
JP2020197102A (ja) * | 2019-06-05 | 2020-12-10 | フジモリ産業株式会社 | トンネルの防水シート用空気抜き装置 |
JP7249886B2 (ja) | 2019-06-05 | 2023-03-31 | フジモリ産業株式会社 | トンネルの防水シート用空気抜き装置 |
Also Published As
Publication number | Publication date |
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KR20130006606A (ko) | 2013-01-17 |
TW201206543A (en) | 2012-02-16 |
CN102834157A (zh) | 2012-12-19 |
US20130139445A1 (en) | 2013-06-06 |
EP2543422A1 (en) | 2013-01-09 |
JPWO2011108419A1 (ja) | 2013-06-27 |
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