WO2011098790A1 - Appareil et procédé de lithographie - Google Patents

Appareil et procédé de lithographie Download PDF

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Publication number
WO2011098790A1
WO2011098790A1 PCT/GB2011/050213 GB2011050213W WO2011098790A1 WO 2011098790 A1 WO2011098790 A1 WO 2011098790A1 GB 2011050213 W GB2011050213 W GB 2011050213W WO 2011098790 A1 WO2011098790 A1 WO 2011098790A1
Authority
WO
WIPO (PCT)
Prior art keywords
light
slm
apertures
light source
aperture
Prior art date
Application number
PCT/GB2011/050213
Other languages
English (en)
Inventor
John Weaver
Ehtsham Ul Haq
Clive Roberts
Graham Leggett
Jamie Hobbs
Original Assignee
The University Of Sheffield
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by The University Of Sheffield filed Critical The University Of Sheffield
Publication of WO2011098790A1 publication Critical patent/WO2011098790A1/fr

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70325—Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lenses or solid immersion lenses

Definitions

  • the present invention relates to apparatus and a method for performing lithographic patterning of a surface, more particularly photolithographic patterning of a surface.
  • SNOM scanning near-field optical microscope
  • NSOM near-field scanning optical microscope
  • WO2003/033127 discloses a method of patterning a monolayer comprising the steps of : providing a monolayer of a compound on a substrate; positioning a near field light source in relation to the monolayer so that light from the light source irradiates the monolayer in the near field regime, the wavelength of the light being suitable to interact with molecules in the monolayer and thereby initiate a photochemical reaction; and patterning the monolayer by causing relative movement of the monolayer and the near field light source, the relative movement corresponding to a desired pattern.
  • the method employs an optical fibre probe with a nanoscopic aperture as a light source as also described in S. Sun et al, J. Am. Chem. Soc. 124, 2414-2415 (2002).
  • Optical nanolithography with a cantilever probe in which a nanoscopic aperture is formed at the apex of a hollow pyramidal tip was disclosed by S. Alang-Ahmad et al, J. Am. Chem. Soc. 131 , 1513-1522 (2009).
  • the indentation can be 'read' from the surface by subsequently scanning a tip of the probe over the surface and detecting movement of the tip normal to the plane of the surface as the tip is scanned.
  • photolithography apparatus comprising: a plurality of probe members, each probe member comprising a tip portion having an aperture therethrough; a spatial light modulator, SLM; and a light source, wherein the SLM is arranged to selectively scatter a beam of light generated by the source thereby to selectively pass light through the aperture of each tip portion whereby the surface of the substrate is exposed to light from the light source.
  • Embodiments of the invention have the advantage that photolithography apparatus may be provided having high spatial resolution and a capability to perform rapid exposure of a surface of a substrate to a prescribed pattern of optical radiation.
  • Light from the light source may be arranged to illuminate a diffractive optical element, the optical element being arranged to provide a hologram of the apertures of the cantilevers thereby to scatter light along an optical path towards the apertures via the SLM.
  • the SLM may be arranged to provide a mask member between the diffractive optical element and the apertures of the cantilevers, the mask member being arranged to selectively block light scattered along an optical path towards a given aperture when it is not required to pass light through said aperture.
  • the SLM comprises one selected from amongst a digital mirror device (DMD) and a liquid crystal device (LCD).
  • a DMD has the advantage that a much higher switching speed may be obtained compared with an LCD.
  • Light from the light source may be arranged to illuminate the SLM, the SLM being operable to scatter light along an optical path through a selected one or more of the plurality of apertures.
  • a mask member is provided between the SLM and the cantilevers, the mask member being arranged to block light not following an optical path towards one of the plurality of apertures.
  • An optical telescope arrangement may be provided, the telescope arrangement being arranged to provide to an objective lens a de-magnified image of apertures it is required to pass light through (or 'illuminate'), the objective lens being arranged to project the image on to the cantilevers whereby light may be passed through the plurality of apertures.
  • the mask member may be provided between lenses of the telescope arrangement.
  • the SLM may be arranged to selectively illuminate portions of a diffractive optical element provided between the SLM and the cantilever, respective portions of the element being arranged to project light from the SLM through a corresponding aperture of a cantilever.
  • the diffractive optical element may comprise an array of focussing elements.
  • the array of focussing elements may comprise one selected from amongst an array of zone plates, an array of concave mirrors and an array of conventional lenses.
  • the diffractive optical element may comprise a substantially continuous element.
  • the substantially continuous element may comprise one selected from amongst a substantially continuous grating, a holographic element, a kinoform and a spatially modulated amplitude structure, being either a grayscale or binary amplitude structure.
  • the holographic element may be a volume hologram or a rainbow hologra
  • a substantially cylindrical lens may be provided between the diffractive optical element and the SLM, the cylindrical lens being arranged to illuminate the diffractive optical element with light from the light source.
  • the apparatus may be arranged to move the substrate with respect to the plurality of probe members thereby to selectively irradiate an area of the surface of the substrate.
  • the apparatus may be arranged to move the plurality of probe members with respect to the substrate thereby to selectively irradiate an area of the surface of the substrate.
  • the light source may be operable to emit light having a selected one of a plurality of different prescribed spectral frequency (or wavelength) distributions.
  • the apparatus may comprise a plurality of light sources, each light source being arranged to emit light having a respective different prescribed spectral frequency distribution.
  • the apparatus may be operable to project light of one of a plurality of different prescribed spectral frequency distributions through the aperture of a selected tip member.
  • the apparatus may be operable to project light of a first prescribed spectral frequency distribution through the aperture of at least a first selected tip member and light of a second prescribed spectral frequency distribution through the aperture of at least a second selected tip member.
  • the apparatus may be operable to project light of the respective different spectral frequency distributions through the respective apertures substantially simultaneously. Alternatively or in addition the apparatus may be operable to project light of the respective different spectral frequency distributions through the respective apertures substantially sequentially.
  • the light source may comprise a polychromatic light source such as a white light source.
  • the apparatus may be arranged to project light from the polychromatic light source onto the SLM.
  • a method of selectively exposing a surface of a substrate to light from a light source comprising: providing a plurality of probe members, each probe member comprising a tip portion having an aperture therethrough; and a spatial light modulator, SLM, the method comprising illuminating the SLM with a beam of light from the source and controlling the SLM selectively to scatter the beam thereby to selectively pass light through the aperture of each tip portion whereby the surface of the substrate is exposed to light from the light source.
  • FIGURE 1 shows apparatus according to an embodiment of the invention
  • FIGURE 2 shows apparatus according to a further embodiment of the invention.
  • FIGURE 3 shows apparatus according to a still further embodiment of the invention in which a diffractive optical element is arranged to direct light through an aperture of each of a plurality of a cantilevers, the optical element being in the form of (a) an array of focussing zone plates and (b) a single zone plate.
  • FIG. 1 shows photolithography apparatus 100 according to an embodiment of the invention in which an array of probe members 181 are provided, the probe members 181 being supported by a probe support member 180.
  • Each probe member 181 has an aperture 182 formed therethrough, the aperture 182 being located close to a free end of each respective probe member 181.
  • the aperture has a diameter in the range from around 50nm to around 250nm, optionally around 100nm.
  • the apparatus is arranged to allow a substrate 171 to be mounted on a substrate support 170 below the probe support member 180 and to be moved with respect to the probe members 181 .
  • the apparatus has a light source 105 arranged to generate a beam of light 107 that is projected onto a surface of a liquid crystal spatial light modulator (LCSLM) 1 10.
  • LCDSLM liquid crystal spatial light modulator
  • the LCSLM 1 10 is arranged to form a hologram of the apertures 182.
  • the LCSLM 1 10 acts as a phase or diffractive optic, an amount of light from the light source 105 that is forward scattered along an optical path of the apparatus is greater than in the case of selective reflection of light along the optical path. This enhances an efficiency of operation of the apparatus. Efficiency is particularly critical since the substrate is illuminated using near-field illumination whereby an intensity of light incident on the substrate is reduced by a factor of approximately 10 "4 relative to a corresponding intensity in the case of far-field illumination.
  • the LCSLM 1 10 is arranged to scatter a portion of the light incident on the SLM through a filter arrangement 120. In some alternative embodiments the filter arrangement 120 is not provided.
  • the LCSLM 1 10 is arranged to modulate the phase of the light incident on the LCSLM 1 10. Alternatively or in addition the LCSLM 1 10 may be arranged to modulate the intensity of the beam directly. Modulation of the phase of the beam has the advantage that an increased intensity of light scattered by the SLM 1 10 may be achieved for a given photolithographic pattern to be projected.
  • the filter arrangement 120 has first and second lenses 121 , 127 respectively and a mask member 123 therebetween.
  • the mask member 123 is provided in a plane conjugate with that of the apertures 182 of the probes 181 and is arranged to block a direct component of the beam scattered by the spatial light modulator 1 10.
  • the mask member 123 may also be arranged to block light that has a path deviating from a path corresponding to a location of an aperture 181 such as stray background light due for example to optical aberrations etc.
  • the first and second lenses 121 , 127 are arranged in a telescope configuration in order to fill a back focal plane of an objective lens 140.
  • optical arrangement is similar in certain respects to that used in some optical tweezer apparatus.
  • optical tweezer apparatus is found to be considerably less sensitive to background illumination than photolithography apparatus in which background illumination can result in exposure of a layer of photoresist at undesirable locations.
  • the LCSLM 1 10 may be controlled by a suitably programmed controller in such a manner as to reduce an amount of the illumination scattered along a path not corresponding to a location of an aperture 181 .
  • a portion of the beam 107 that is passed by the filter arrangement 120 (labelled 108 in FIG. 1 ) is reflected by a mirror element 130 through a projector lens 140 whereupon respective apertures 182 of the probe members 181 are illuminated as required.
  • the spatial light modulator 1 10 is operable to control through which aperture 182 light is passed from the light source 105. In other words, which aperture is 'illuminated'. Thus, as a substrate is moved with respect to the probe members 181 light may be selectively projected through the apertures 182 as required thereby to selectively expose regions of the substrate to optical radiation.
  • the apparatus is coupled to a computing device arranged to provide a control signal to the LCSLM 1 10 and a corresponding control signal to the substrate support 170 thereby to control illumination of the apertures 182 as the substrate support 170 is moved with respect to the probe members 181 .
  • the LCSLM 1 10 is replaced by a fixed diffractive optic 210 being a hologram of the location of the apertures 182 of the cantilevers 181.
  • the mask member 123 is also replaced by an SLM 223 operable selectively to reflect or not reflect light incident on the SLM 223 at different respective positions thereof.
  • an LCSLM is employed.
  • a digital micro-mirror device may be employed.
  • a DMD has the advantage over an LCSLM that a switching speed of the DMD may be considerably higher than that of an LCSLM.
  • the use of a fixed diffractive optic in combination with a DMD device has the advantage of offering a higher rate of change of illumination levels at the apertures 182.
  • FIG. 3(a) shows apparatus 300 according to a further embodiment of the invention in which a spatial light modulator 310 in the form of a DMD is arranged to selectively illuminate focussing elements 341 of a focussing element array 340. It is to be understood that the DMD is arranged to selectively block or pass beams of scattered radiation following optical paths arranged to pass through respective apertures 382 of the probe members 381 .
  • Each focussing element 341 is arranged to illuminate an aperture 382 of a probe member 381 corresponding to that particular focussing element 341 .
  • the focussing element array 341 shown in FIG. 3(a) may be referred to as a zone plate array.
  • the apparatus 300 is arranged whereby a substrate to be illuminated may be moved with respect to the probe members 381 .
  • the spatial light modulator may be used to selectively illuminate the apertures 382 thereby to selectively expose regions of the substrate to optical radiation.
  • the focussing elements 341 are in the form of zone plates.
  • Other focusing elements 341 such as lenses (e.g. microlenses), are also useful.
  • lens is meant a conventional lens such as a lens of the concave or convex type.
  • the focussing element array 340 is illuminated at an angle substantially equal to or less than the Brewster angle thereby to prevent reflection of illumination from the elements 341. This has the advantage of increasing an amount of light scattered by the elements 341 to the apertures 382.
  • FIG. 3(b) shows an embodiment in which the array of focussing elements is provided by a single diffractive optic 441 arranged to illuminate the apertures 482.
  • Use of a single diffractive optic 441 has the advantage that illumination that would otherwise fall between zone plates 341 of a zone plate array 340 may be focussed to pass through an aperture 482 of a cantilever 481.
  • a cylindrical lens 440 may be provided between the SLM 410 and focussing element 441 in order to facilitate illumination of the element 441 in a substantially uniform manner.
  • the apparatus may be arranged to expose a substrate to light of different respective spectral frequency (or wavelength) distributions.
  • the apparatus may be arranged to expose one portion of a substrate to light of one spectral frequency distribution and another portion of the substrate to light of a different spectral frequency distribution.
  • the apparatus may be arranged to expose the portions simultaneously or at different respective times.
  • the apparatus may be provided with a light source arranged to generate light of a selected one or more of a plurality of different respective spectral frequency distributions as required.
  • the apparatus may be provided with a plurality of light sources. In some embodiments each of the plurality of light sources may be arranged to generate light of a different respective spectral frequency distribution.
  • the apparatus may be arranged to change the spectral frequency distribution of light incident on the sample during a scan of the probe across the substrate, for example by controlling the light source (in the case that a single source is provided) or at least one of the plurality of light sources (in the case that more than one light source is provided).
  • the apparatus may be arranged to expose the substrate to light of different respective spectral frequency distributions during different respective scan operations.
  • simultaneous exposure of different respective regions of a substrate to light of different respective spectral frequency distributions may be performed.
  • a single light source may be employed to obtain beams of light of different respective spectral frequency distributions.
  • light from a single source may be divided to form separate beams that pass through different respective filters.
  • the filters may be arranged to pass light of different respective spectral frequency distributions. It is to be understood that embodiments of the invention are useful for high resolution patterning of layers of photoresist. Some embodiments are useful for patterning of layers of photoresist that are around one monolayer in thickness. Other thicknesses of resist are also useful.
  • Embodiments of the invention are suitable for use with polychromatic light, such 'broadband' illumination.
  • One or more white light sources may be used.
  • a layer of photoresist is applied to a surface, the layer having a thickness equal to or less than a diameter of the aperture of the probe member through which illumination will pass in order to expose the layer. This has the advantage that a size of an area of the layer exposed by the illumination is reduced. The use of thicker layers tends to result in exposure of a larger lateral area of the layer thereby reducing a resolution of the lithography tool. This is at least in part due to a divergence of near-field radiation emanating from the aperture.
  • photoresist' is understood to include any thin film of photosensitive material, including thin films and monolayers of organic molecules including, for example, self- assembled monolayers of alkanethiols, phosphonic acids, silanes, siloxanes and other adsorbates. Other materials are also useful.
  • the probe members are then moved over the surface of the substrate and the device operated so as to pass light through the aperture of each probe member as required in order to expose a prescribed one or more regions of the substrate.
  • the substrate may then be subject to further processing.
  • exposure of the substrate to light by the apparatus results in removal of exposed resist (for example by desorption or any other suitable mechanism) thereby to expose an underlying region of substrate.
  • exposure results in a change in a property of the resist layer.
  • exposure may result in photo-polymerisation of the layer or any other suitable physical, chemical or other change.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

La présente invention concerne un appareil de photolithographie qui comprend : une pluralité d'éléments sondes, chaque élément sonde comprenant une partie embout à travers laquelle est formée une ouverture; un modulateur de lumière spatial (« spatial light modulator » ou SLM); et une source lumineuse, le SLM étant agencé pour diffuser sélectivement un faisceau de lumière généré par la source, pour ainsi faire passer sélectivement de la lumière à travers l'ouverture de chaque partie embout, la surface du substrat étant exposée à la lumière de la source lumineuse.
PCT/GB2011/050213 2010-02-09 2011-02-08 Appareil et procédé de lithographie WO2011098790A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB1002099.8A GB201002099D0 (en) 2010-02-09 2010-02-09 Lithography apparatus and method
GB1002099.8 2010-02-09

Publications (1)

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WO2011098790A1 true WO2011098790A1 (fr) 2011-08-18

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015113408A1 (fr) * 2014-01-28 2015-08-06 上海普利生机电科技有限公司 Dispositif d'impression 3d du type à photo-durcissement et son système d'exposition d'images
CN106200276A (zh) * 2016-07-19 2016-12-07 西安电子科技大学 基于随机散射介质的可控亚波长无掩模光刻系统和方法
CN107831639A (zh) * 2017-11-20 2018-03-23 张家港奇点光电科技有限公司 一种新型的大台面led曝光机
CN111766414A (zh) * 2020-08-14 2020-10-13 强一半导体（苏州）有限公司 面向导引板mems探针结构模板烧刻的探针定位方法

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Publication number Priority date Publication date Assignee Title
WO2003033127A2 (fr) 2001-10-19 2003-04-24 University Of Manchester Institute Of Science And Technology Procedes de modelisation d'une monocouche
US20060014108A1 (en) * 2004-06-28 2006-01-19 Canon Kabushiki Kaisha Resist pattern forming method based on near-field exposure, and substrate processing method and device manufacturing method using the resist pattern forming method
US20070125969A1 (en) * 2005-09-15 2007-06-07 Schellenberg Franklin M Nanolithography system

Patent Citations (3)

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Publication number Priority date Publication date Assignee Title
WO2003033127A2 (fr) 2001-10-19 2003-04-24 University Of Manchester Institute Of Science And Technology Procedes de modelisation d'une monocouche
US20060014108A1 (en) * 2004-06-28 2006-01-19 Canon Kabushiki Kaisha Resist pattern forming method based on near-field exposure, and substrate processing method and device manufacturing method using the resist pattern forming method
US20070125969A1 (en) * 2005-09-15 2007-06-07 Schellenberg Franklin M Nanolithography system

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Title
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KINGSLEY JAMES ET AL: "Optical nanolithography using a scanning near-field probe with an integrated light source", APPLIED PHYSICS LETTERS, AIP, AMERICAN INSTITUTE OF PHYSICS, MELVILLE, NY, US, vol. 93, no. 21, 24 November 2008 (2008-11-24), pages 213103 - 213103, XP012112630, ISSN: 0003-6951, DOI: DOI:10.1063/1.3032912 *
S. ALANG-AHMAD ET AL., J. AM. CHEM. SOC., vol. 131, 2009, pages 1513 - 1522
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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015113408A1 (fr) * 2014-01-28 2015-08-06 上海普利生机电科技有限公司 Dispositif d'impression 3d du type à photo-durcissement et son système d'exposition d'images
US10156793B2 (en) 2014-01-28 2018-12-18 Prismlab China Ltd. Light-curing type 3D printing device and image exposure system thereof
CN106200276A (zh) * 2016-07-19 2016-12-07 西安电子科技大学 基于随机散射介质的可控亚波长无掩模光刻系统和方法
CN107831639A (zh) * 2017-11-20 2018-03-23 张家港奇点光电科技有限公司 一种新型的大台面led曝光机
CN111766414A (zh) * 2020-08-14 2020-10-13 强一半导体（苏州）有限公司 面向导引板mems探针结构模板烧刻的探针定位方法
CN111766414B (zh) * 2020-08-14 2020-12-25 强一半导体（苏州）有限公司 面向导引板mems探针结构模板烧刻的探针定位方法

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