WO2011080980A1 - Vacuum exhaust device and vacuum exhaust method, and substrate treatment device - Google Patents
Vacuum exhaust device and vacuum exhaust method, and substrate treatment device Download PDFInfo
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- WO2011080980A1 WO2011080980A1 PCT/JP2010/071234 JP2010071234W WO2011080980A1 WO 2011080980 A1 WO2011080980 A1 WO 2011080980A1 JP 2010071234 W JP2010071234 W JP 2010071234W WO 2011080980 A1 WO2011080980 A1 WO 2011080980A1
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
- F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
- F04B37/14—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use to obtain high vacuum
- F04B37/16—Means for nullifying unswept space
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
- F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
- F04B37/14—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use to obtain high vacuum
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
- F04C23/001—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of similar working principle
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C25/00—Adaptations of pumps for special use of pumps for elastic fluids
- F04C25/02—Adaptations of pumps for special use of pumps for elastic fluids for producing high vacuum
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C28/00—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids
- F04C28/02—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids specially adapted for several pumps connected in series or in parallel
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C28/00—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids
- F04C28/06—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids specially adapted for stopping, starting, idling or no-load operation
- F04C28/065—Capacity control using a multiplicity of units or pumping capacities, e.g. multiple chambers, individually switchable or controllable
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C28/00—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids
- F04C28/08—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids characterised by varying the rotational speed
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C28/00—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids
- F04C28/24—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids characterised by using valves controlling pressure or flow rate, e.g. discharge valves or unloading valves
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C28/00—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids
- F04C28/28—Safety arrangements; Monitoring
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C2220/00—Application
- F04C2220/10—Vacuum
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C2220/00—Application
- F04C2220/30—Use in a chemical vapor deposition [CVD] process or in a similar process
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C2240/00—Components
- F04C2240/70—Use of multiplicity of similar components; Modular construction
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C2270/00—Control; Monitoring or safety arrangements
- F04C2270/56—Number of pump/machine units in operation
Definitions
- the present invention relates to a vacuum exhaust apparatus and a vacuum exhaust method for exhausting a processing chamber to a vacuum state.
- the present invention also relates to a substrate processing apparatus to which an evacuation apparatus is connected.
- a processing apparatus for forming a metal film for wiring includes a substrate processing chamber (processing chamber) for performing a predetermined process.
- the substrate processing chamber is evacuated by a vacuum pump to create a vacuum environment corresponding to the processing. Since a highly reactive gas is often used in the film forming process or the like, a dry vacuum pump that obtains a vacuum from atmospheric pressure without oil in the suction chamber is used as the vacuum pump.
- the vacuum pump used in the vacuum evacuation apparatus is generally a volume transfer type, and during operation, the volume part of the final stage is repeatedly exposed to the atmosphere during evacuation. Since no gas is transferred during the standby operation, the work of the vacuum pump is theoretically zero, but power is required to make the volume part of the final stage vacuum (depressurize). For this reason, an auxiliary pump for exhausting the volume part of the final stage is provided, and the vacuum state of the volume part of the final stage is maintained by the auxiliary pump, thereby reducing the work amount of the vacuum pump during standby operation and suppressing power consumption. Is conventionally performed (see, for example, Patent Document 1 and Patent Document 2).
- the present invention has been made in view of the above situation, and an object thereof is to provide a vacuum exhaust apparatus and a vacuum exhaust method capable of suppressing power consumption of a plurality of vacuum pumps without using an auxiliary pump.
- Another object of the present invention is to provide a substrate processing apparatus provided with a vacuum exhaust device that can suppress power consumption of a plurality of vacuum pumps without using an auxiliary pump.
- the switching means when an operation for maintaining an existing vacuum pressure state is performed, communicates at least one vacuum pump intake-side flow path to the exhaust collecting pipe side so that at least one vacuum is provided.
- the volume of the final stage of the other vacuum pump is evacuated by the pump, and the load due to the gas transfer in the other vacuum pump is approximated to zero.
- the power consumption of a plurality of vacuum pumps can be suppressed by using the switching means without using an auxiliary pump.
- auxiliary pumps costing hundreds of thousands of yen are omitted, that is, equipment costs of several million yen.
- the power consumption can be suppressed to the same extent as when the auxiliary pump is used. That is, in the case of a vacuum pump with an operation for reducing the volume of the final stage when maintaining the existing vacuum pressure state, for example, power consumption of 7.5 Kw was required.
- the power consumption is, for example, 2.5 Kw. Accordingly, it is possible to reduce the equipment cost of several million yen and suppress, for example, 5 Kw of electric power for one vacuum pump when performing an operation for maintaining the existing vacuum pressure state. .
- the vacuum exhaust apparatus of the present invention according to claim 2 is the vacuum exhaust apparatus according to claim 1, wherein the at least one vacuum pump is connected to the processing chamber by an intake pipe, and the switching means includes An exhaust adjustment valve for opening and closing the flow path of the intake pipe is provided in the intake pipe, the auxiliary pipe is connected to the intake pipe on the downstream side of the exhaust adjustment valve, and the flow path of the auxiliary pipe is connected to the exhaust adjustment valve.
- the auxiliary pipe is provided with an auxiliary exhaust valve that opens and closes in response to opening and closing.
- the present invention by controlling the opening and closing of the exhaust adjustment valve and the auxiliary exhaust valve, the final volume of the other vacuum pump can be exhausted by at least one vacuum pump. For this reason, the power consumption of a plurality of vacuum pumps can be suppressed with a simple operation.
- a vacuum exhaust apparatus according to the first or second aspect, wherein the exhaust side of the vacuum pump other than the at least one vacuum pump is an exhaust pipe. It is connected to the exhaust collecting pipe, and the exhaust pipe is provided with a vacuum maintaining valve that opens and closes in conjunction with opening and closing of the auxiliary exhaust valve.
- the exhaust pipe after exhausting the volume part of the final stage of the other vacuum pump by at least one vacuum pump, the exhaust pipe is closed by the vacuum maintenance valve, so that the final stage of the other vacuum pump is closed.
- the flow path on the exhaust side of the volume part is maintained in a vacuum state, and the load when the final volume part is exhausted next can be minimized.
- a vacuum evacuation device according to any one of the first to third aspects, wherein the evacuation device for reducing the pressure on the exhaust side of the at least one vacuum pump is provided. It is characterized by having.
- the volume of the final stage of at least one vacuum pump can be exhausted by the decompression means, and the power consumption of at least one vacuum pump can be suppressed.
- a vacuum exhaust apparatus is the vacuum exhaust apparatus according to any one of the first to fourth aspects, further comprising pressure detection means for detecting a pressure state on the processing chamber side.
- the switching means is operated based on detection information of the pressure detection means.
- the switching means can be operated according to the pressure state on the processing chamber side, and the operation of the vacuum pump can be controlled according to the actual pressure state.
- the pressure state on the processing chamber side the pressure in the processing chamber can be detected, and the pressure in the collecting pipe on the intake side of the plurality of vacuum pumps can be detected.
- the vacuum evacuation method of the present invention for achieving the above object maintains the vacuum pressure of the processing chamber when the processing chamber is brought into a predetermined vacuum state by a plurality of vacuum pumps arranged in parallel.
- at least one of the vacuum pumps is used to evacuate the atmosphere open volume on the exhaust side of the other vacuum pump.
- the auxiliary pump when the operation for maintaining the vacuum pressure state is performed, the auxiliary pump is provided by exhausting the open air volume portion on the exhaust side of the other vacuum pump by at least one vacuum pump.
- the power consumption of a plurality of vacuum pumps can be suppressed without using the.
- a vacuum exhaust method of the present invention according to claim 7 is the vacuum exhaust method according to claim 6, wherein the processing chamber is set to a predetermined state during operation of the vacuum pump for maintaining the vacuum pressure of the processing chamber.
- the other vacuum pump is operated at a rotational speed lower than the rotational speed at the time of operation for making the vacuum state.
- An evacuation method is the evacuation method according to the seventh aspect of the present invention, wherein the other vacuum pump is operated during operation of the vacuum pump for maintaining the vacuum pressure in the processing chamber.
- the number of rotations is a number of rotations capable of bringing the processing chamber into a predetermined vacuum state within a predetermined return time.
- the other vacuum pump in the standby state is controlled to the rotation speed of the standby operation capable of bringing the processing chamber into a vacuum state within a predetermined return time, so that the minimum rotation speed is achieved.
- a vacuum pump can be rotated and power consumption can be suppressed.
- a substrate processing apparatus includes a substrate processing chamber in which a substrate is carried and a predetermined processing is performed, and the substrate processing apparatus according to any one of the first to fifth aspects.
- the plurality of vacuum pumps of an evacuation apparatus are connected in parallel to the substrate processing chamber.
- the present invention according to claim 9 is a substrate processing apparatus including a vacuum exhaust apparatus capable of suppressing power consumption of a plurality of vacuum pumps without using an auxiliary pump by the operation of the switching means.
- a substrate processing apparatus is the substrate processing apparatus according to the ninth aspect, further comprising a second substrate processing chamber in which a substrate is loaded from the substrate processing apparatus and a predetermined process is performed.
- a second vacuum pump is connected to the second substrate processing chamber, one of the vacuum pumps and an intake side of the second vacuum pump are connected in parallel, and one of the vacuum pumps is connected to the second vacuum pump Is provided with a flow path selecting means.
- one of the vacuum pumps is connected to the second substrate processing chamber by the flow path selecting means. By connecting to, one of the vacuum pumps can be applied to maintain the vacuum in the second substrate processing chamber.
- the substrate processing apparatus of the present invention according to claim 11 is the substrate processing apparatus according to claim 10, wherein an exhaust side of the second vacuum pump is communicated with the exhaust collecting pipe, and the exhaust pump is connected with the exhaust pump by at least one vacuum pump.
- the exhaust-side fluid of the second vacuum pump is discharged through an exhaust collecting pipe.
- the vacuum exhaust apparatus and the vacuum exhaust method of the present invention can suppress power consumption of a plurality of vacuum pumps without using an auxiliary pump.
- the substrate processing apparatus of the present invention is a substrate processing apparatus provided with a vacuum exhaust device that can suppress power consumption of a plurality of vacuum pumps without using an auxiliary pump.
- FIG. 10 is a schematic system diagram of a substrate processing apparatus according to an eighth embodiment of the present invention. It is a schematic system diagram of a substrate processing apparatus according to a ninth embodiment of the present invention. It is a graph of the condition of pump rotation speed. It is a graph of power consumption.
- processing chambers such as a heating apparatus, a plasma CVD apparatus, a sputtering apparatus, and a dry etching apparatus that perform processing on a large glass substrate are arranged in series.
- An in-line type vertical processing apparatus that loads and unloads substrates from a processing chamber (load lock chamber: substrate processing chamber) is described as an example.
- a plurality of vacuum pumps are connected in parallel to the load lock chamber, and the interior of the plurality of processing chambers including the load lock chamber is brought into a predetermined vacuum state by driving the vacuum pump.
- the intake manifold 14 is provided with pressure detection means (pressure sensor) 24, based on the detection information of the pressure detection means 24, the opening / closing operation of the exhaust adjustment valve 21 a (open / close valve 21) and the opening / closing of the auxiliary exhaust valve 23. Operation is controlled. That is, the decompression operation is controlled based on the actual pressure of the intake manifold 14 (degree of vacuum: degree of vacuum of the substrate processing apparatus 1).
- a substrate such as a flat panel display carried into the load lock chamber 2 is held in a vacuum state in the load lock chamber 2, heated in the heating chamber 3, and sequentially transferred from the first processing chamber 4 to the fourth processing chamber 7. Then, the path is reversed, passes through the first processing chamber 4 and the heating chamber 3 from the fourth processing chamber 7, is returned to the load lock chamber 2, and is carried out. During this time, necessary processing is performed in a vacuum processing chamber.
- the substrate processing apparatus 1 is evacuated to a predetermined vacuum by a vacuum exhaust device 11.
- the exhaust adjustment valve 21a open / close valve 21
- the auxiliary exhaust valve 23 is closed, and the substrate processing apparatus 1 is driven into a predetermined state by driving the ten vacuum pumps 12.
- a vacuum state (vacuum state corresponding to processing) is set.
- the exhaust adjustment valve 21a (open / close valve 21) is closed and the auxiliary exhaust valve 23 is opened, and other than one vacuum pump 12a.
- the fluid in the final volume chamber of the other vacuum pump 12 is exhausted by the vacuum pump 12a through the exhaust pipe 18, the exhaust collecting pipe 19 and the auxiliary pipe 22, and the vacuum state is maintained.
- the process chamber of the final stage of the other vacuum pump 12 during the standby operation is not opened to the atmosphere, and the other vacuum pump 12 does not need power to depressurize the process chamber of the final stage from the atmosphere to the vacuum.
- the power of the vacuum pump 12 is theoretically only a mechanical loss without fluid transfer, and the power consumption of the vacuum pump 12 can be greatly suppressed without providing an auxiliary pump or the like.
- the substrate processing apparatus 1 that processes a large glass substrate such as a flat panel display, for example, ten vacuum pumps 12 are provided in parallel. By evacuating the final volume chamber of the other vacuum pump 12 by one vacuum pump 12a, the power consumption of the other vacuum pump 12 can be significantly suppressed.
- the vacuum exhaust device 31 of the second embodiment has a configuration in which a vacuum maintaining valve 27 is provided in the exhaust pipe 18 of the vacuum exhaust device 11 shown in FIG.
- the vacuum maintenance valve 27 is opened and closed in conjunction with the auxiliary exhaust valve 23.
- the vacuum maintaining valve 27 is opened, and the final volume chamber of the other vacuum pump 12 is exhausted by one vacuum pump 12a, and the auxiliary exhaust valve 23 is closed. At this time, the vacuum maintaining valve 27 is closed, and the vacuum state of the final volume chamber is maintained during operation by all the vacuum pumps 12.
- the exhaust pipe 18 is closed by the vacuum maintaining valve 27, so that the auxiliary exhaust valve 23 to the vacuum maintaining valve 27 are closed.
- the flow path including the auxiliary pipe 22 is maintained in a vacuum state, and the exhaust operation of the volume chamber can be performed with high responsiveness while minimizing the load when the final volume chamber is exhausted next time. .
- the auxiliary exhaust valve 23 When a problem occurs in the vacuum pump 12a, the auxiliary exhaust valve 23 is closed, the auxiliary exhaust valve 23b of the branch pipe 22b is opened, and the open / close valve 28 is closed, so that the adjacent vacuum pump 12b closes the final stage of the other vacuum pump 12. Exhaust the volume chamber. For this reason, even if a malfunction occurs in the vacuum pump 12a, the power consumption of the vacuum pump 12 can be reliably suppressed.
- a seventh embodiment will be described with reference to FIG.
- the power consumption of the vacuum pump 12 can be reliably suppressed, and the power consumption of all the vacuum pumps 12 including the vacuum pump 12a and the vacuum pump 12b is suppressed. Can do.
- the vacuum evacuation device 37 of the eighth embodiment is configured by combining the vacuum maintaining valve 27 shown in FIG. 2, the decompression means 29 shown in FIG. 7, the adjacent vacuum pump 12b as a backup, and the auxiliary decompression means 30. ing.
- the vacuum evacuation device 38 of the ninth embodiment has a configuration in which the auxiliary decompression means 30 is omitted from the vacuum evacuation device 37 shown in FIG.
- the heating chamber 3 as the second substrate processing chamber, the first processing chamber 4, the second processing chamber 5, the third processing chamber 6 and the fourth processing chamber 7 are provided with one second vacuum via a vacuum pipe 40.
- a pump 41 is connected.
- the flow path selection means 43 switches the flow path to the vacuum pump 12s side, and the vacuum pump 12s causes the heating chamber 3, the first processing chamber 4, and the second processing chamber 5 to be switched.
- the insides of the third processing chamber 6 and the fourth processing chamber 7 can be evacuated. Therefore, even in the unlikely event, the vacuum atmosphere necessary for the process can be maintained, and the heating chamber 3, the first processing chamber 4, the second processing chamber 5, the third processing chamber 6, and the fourth processing chamber 7 can be maintained. Can be continued.
- the final vacuum pump 12a uses the final vacuum pump 12a.
- the stage volume chamber can be evacuated.
- the vacuum chamber of the final stage of another vacuum pump 12 is evacuated by one vacuum pump 12 a to maintain the final vacuum of the other vacuum pump 12. is doing.
- the rotation of the other vacuum pumps 12 is controlled at a rotational speed lower than the rotational speed at the time of operation for bringing the load lock chamber 2 into a predetermined vacuum state. That is, the rotation speed of the vacuum pump 12 for maintaining the vacuum pressure of the load lock chamber 2 is set to the minimum rotation speed at which the load lock chamber 2 can be brought into a predetermined vacuum state within a predetermined return time. Yes.
- the return time for maintaining the vacuum pressure in the load lock chamber 2 is 0 second. Further, when the number of rotations of the vacuum pump 12 is within a predetermined range (between T1 rpm and T3 rpm in the figure), there is no significant change in the return time for returning to the state in which the load lock chamber 2 maintains the vacuum pressure. And when the rotation speed of the vacuum pump 12 is low, the return time for returning to the state in which the vacuum pressure of the load lock chamber 2 is maintained becomes longer (exceeds the dotted line in the figure).
- the substrate processing apparatus 1 does not need to be set to 0 seconds because many devices are operating. If it is within a predetermined return time, the substrate processing is not affected. For this reason, the rotation speed of the vacuum pump 12 (in the vicinity of T2 rpm in the figure) at the shortest return time is set as the rotation speed of the vacuum pump 12 within the rotation speed in the range where the return time does not substantially change (between T1 rpm and T3 rpm in the figure). I'm driving.
- the rotation speed is returned from the low rotation speed, so that the rotation speed does not become excessively high, and the time t2 in the figure. As indicated by the dotted line, it is possible to suppress the temporary increase in power consumption.
- the above-described vacuum exhaust device can suppress power consumption of a plurality of vacuum pumps 12 without using an auxiliary pump.
- the above-described substrate processing apparatus is a substrate processing apparatus including a vacuum exhaust device that can suppress power consumption of a plurality of vacuum pumps 12 without using an auxiliary pump.
- the present invention can be used in the industrial field of a vacuum exhaust apparatus and a vacuum exhaust method for exhausting a processing chamber to a vacuum state.
- the present invention can be used in the industrial field of substrate processing apparatuses to which an evacuation apparatus is connected.
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
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Abstract
Description
また、本発明は、真空排気装置が接続された基板処理装置に関する。 The present invention relates to a vacuum exhaust apparatus and a vacuum exhaust method for exhausting a processing chamber to a vacuum state.
The present invention also relates to a substrate processing apparatus to which an evacuation apparatus is connected.
2 ロードロック室
3 加熱室
4 第1処理室
5 第2処理室
6 第3処理室
7 第4処理室
11、31、32、33、34、35、36、37、38 真空排気装置
12、12a、12b 真空ポンプ
13、40 真空配管
14 吸気集合管
15 吸気管
16 消音器
17 排気系
18、18b 排気管
19 排気集合管
21 開閉弁
21a 排気調整弁
22 補助配管
23 補助排気弁
24 圧力検出手段
27 真空維持弁
28、42 開閉弁
29 減圧手段
30 補助減圧手段
41 第2真空ポンプ DESCRIPTION OF
Claims (11)
- 処理室に対して並列に接続され前記処理室を所定の真空状態にする複数の真空ポンプと、
前記真空ポンプの排気側が連通される排気集合管と、
少なくとも一つの前記真空ポンプの吸気側と前記排気集合管を接続する補助配管と、
前記処理室側もしくは前記補助配管側に前記少なくとも一つの前記真空ポンプの吸気側の流路を切換える切換手段とを備えた
ことを特徴とする真空排気装置。 A plurality of vacuum pumps connected in parallel to the processing chamber to bring the processing chamber into a predetermined vacuum state;
An exhaust collecting pipe communicated with an exhaust side of the vacuum pump;
An auxiliary pipe connecting the suction side of at least one vacuum pump and the exhaust collecting pipe;
A vacuum evacuation apparatus comprising switching means for switching a flow path on the intake side of the at least one vacuum pump on the processing chamber side or the auxiliary piping side. - 請求項1に記載の真空排気装置において、
前記少なくとも一つの前記真空ポンプは吸気管により前記処理室に接続され、
前記切換手段は、
前記吸気管の流路を開閉する排気調整弁が前記吸気管に備えられ、
前記排気調整弁の下流側の前記吸気管に前記補助配管が接続され、
前記補助配管の流路を前記排気調整弁の開閉に応じて閉開する補助排気弁が前記補助配管に備えられている
ことを特徴とする真空排気装置。 The evacuation apparatus according to claim 1.
The at least one vacuum pump is connected to the processing chamber by an intake pipe;
The switching means is
An exhaust adjustment valve that opens and closes the flow path of the intake pipe is provided in the intake pipe,
The auxiliary pipe is connected to the intake pipe on the downstream side of the exhaust regulating valve;
The vacuum exhaust apparatus, wherein the auxiliary pipe is provided with an auxiliary exhaust valve that opens and closes the flow path of the auxiliary pipe in response to opening and closing of the exhaust adjustment valve. - 請求項1もしくは請求項2のいずれかに記載の真空排気装置において、
前記少なくとも一つの真空ポンプ以外の前記真空ポンプの排気側が排気管により前記排気集合管に接続され、
前記排気管には前記補助排気弁の開閉に連動して開閉する真空維持弁が備えられている
ことを特徴とする真空排気装置。 The evacuation apparatus according to claim 1 or 2,
The exhaust side of the vacuum pump other than the at least one vacuum pump is connected to the exhaust collecting pipe by an exhaust pipe,
The vacuum exhaust apparatus, wherein the exhaust pipe is provided with a vacuum maintaining valve that opens and closes in conjunction with opening and closing of the auxiliary exhaust valve. - 請求項1~請求項3のいずれか一項に記載の真空排気装置において、
前記少なくとも一つの真空ポンプの排気側を減圧する減圧手段を備えた
ことを特徴とする真空排気装置。 The vacuum exhaust apparatus according to any one of claims 1 to 3,
A vacuum evacuation apparatus comprising pressure reducing means for depressurizing an exhaust side of the at least one vacuum pump. - 請求項1~請求項4のいずれか一項に記載の真空排気装置において、
前記処理室側の圧力状態を検出する圧力検出手段を備え、
前記切換手段は前記圧力検出手段の検出情報に基づいて動作される
ことを特徴とする真空排気装置。 The vacuum exhaust apparatus according to any one of claims 1 to 4,
Pressure detecting means for detecting the pressure state on the processing chamber side,
The evacuation apparatus according to claim 1, wherein the switching means is operated based on detection information of the pressure detection means. - 並列に配置された複数の真空ポンプにより処理室を所定の真空状態にするに際し、前記処理室の真空圧を維持するための前記真空ポンプの運転時には、少なくとも一つの前記真空ポンプにより他の前記真空ポンプの排気側の大気開放容積部の排気を行なうことを特徴とする真空排気方法。 At the time of operating the vacuum pump for maintaining the vacuum pressure of the processing chamber when the processing chamber is brought into a predetermined vacuum state by a plurality of vacuum pumps arranged in parallel, at least one of the vacuum pumps performs the other vacuum. A vacuum evacuation method comprising evacuating an air release volume portion on an exhaust side of a pump.
- 請求項6に記載の真空排気方法において、
前記処理室の真空圧を維持するための前記真空ポンプの運転時には、前記処理室を所定の真空状態にする運転時の回転数よりも低い回転数で他の前記真空ポンプが運転される
ことを特徴とする真空排気方法。 The evacuation method according to claim 6,
When the vacuum pump for maintaining the vacuum pressure in the processing chamber is operated, the other vacuum pump is operated at a lower rotational speed than the rotational speed at the time of the operation for bringing the processing chamber into a predetermined vacuum state. The evacuation method characterized. - 請求項7に記載の真空排気方法において、
前記処理室の真空圧を維持するための前記真空ポンプの運転時における他の前記真空ポンプの回転数は、
所定の復帰時間内で前記処理室を所定の真空状態にできる回転数である
ことを特徴とする真空排気方法。 The evacuation method according to claim 7,
The number of rotations of the other vacuum pump during operation of the vacuum pump for maintaining the vacuum pressure in the processing chamber is
A vacuum evacuation method characterized in that the number of rotations is such that the processing chamber can be brought into a predetermined vacuum state within a predetermined return time. - 基板が搬入されて所定の処理が行われる基板処理室を備え、請求項1~請求項5のいずれかに記載の真空排気装置の前記複数の真空ポンプを前記基板処理室に並列に接続したことを特徴とする基板処理装置。 6. A substrate processing chamber in which a substrate is carried in and a predetermined processing is performed, and the plurality of vacuum pumps of the vacuum exhaust apparatus according to claim 1 are connected in parallel to the substrate processing chamber. A substrate processing apparatus.
- 請求項9に記載の基板処理装置において、
前記基板処理装置からの基板が搬入されて所定の処理が行われる第2基板処理室を備え、
前記第2基板処理室に第2真空ポンプを接続し、
前記真空ポンプの一つと前記第2真空ポンプの吸気側を並列に接続し、
前記真空ポンプの一つと前記第2真空ポンプの接続部に流路選択手段を備えた
ことを特徴とする基板処理装置。 The substrate processing apparatus according to claim 9,
A second substrate processing chamber in which a substrate from the substrate processing apparatus is carried and a predetermined processing is performed;
A second vacuum pump is connected to the second substrate processing chamber;
One of the vacuum pumps and the suction side of the second vacuum pump are connected in parallel;
A substrate processing apparatus comprising a flow path selecting means at a connection portion between one of the vacuum pumps and the second vacuum pump. - 請求項10に記載の基板処理装置において、
前記排気集合管に前記第2真空ポンプの排気側が連通され、
少なくとも一つの前記真空ポンプにより前記排気集合管を介して前記第2真空ポンプの排気側の流体が排出される
ことを特徴とする基板処理装置。 The substrate processing apparatus according to claim 10, wherein
An exhaust side of the second vacuum pump communicates with the exhaust collecting pipe;
The substrate processing apparatus, wherein the fluid on the exhaust side of the second vacuum pump is discharged by the at least one vacuum pump through the exhaust collecting pipe.
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JP2018503027A (en) * | 2015-01-06 | 2018-02-01 | エドワーズ リミテッド | Improvements in or related to vacuum pump equipment |
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