JPH07167053A - High vacuum exhaust device - Google Patents

High vacuum exhaust device

Info

Publication number
JPH07167053A
JPH07167053A JP31239993A JP31239993A JPH07167053A JP H07167053 A JPH07167053 A JP H07167053A JP 31239993 A JP31239993 A JP 31239993A JP 31239993 A JP31239993 A JP 31239993A JP H07167053 A JPH07167053 A JP H07167053A
Authority
JP
Japan
Prior art keywords
vacuum
pump
vacuum exhaust
roughing
exhaust
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP31239993A
Other languages
Japanese (ja)
Other versions
JP2990003B2 (en
Inventor
Katsuaki Sato
勝明 佐藤
Terukazu Motosawa
輝一 本沢
Hiroshi Ito
広志 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Yamagata Ltd
Original Assignee
NEC Yamagata Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Yamagata Ltd filed Critical NEC Yamagata Ltd
Priority to JP5312399A priority Critical patent/JP2990003B2/en
Publication of JPH07167053A publication Critical patent/JPH07167053A/en
Application granted granted Critical
Publication of JP2990003B2 publication Critical patent/JP2990003B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To shorten a starting time by a method wherein when high vacuum exhaust pumps are respectively disposed to a plurality of vacuum treating chambers, a vacuum piping for interconnecting the exhaust pumps is provided, and the exhaust pump designed to start by utilizing exhaust operation of the exhaust pump under a starting is roughed. CONSTITUTION:When a vacuum treating chamber 1 and a high vacuum exhaust pump 9 are already started and a vacuum treating chamber 2 and a high vacuum exhaust pump 10 are started, a roughing pump 18 is started, a roughing valve 14 is opened, and the roughing valve 14 is closed when the pressure of the exhaust pump 10 attains, for example, 50 mmTorr. Shield valves 20 and 21 are then opened and by utilizing exhaust gas of the exhaust pump 9, the exhaust pump 10 is caused to effect vacuum exhaust. When the pressure of the exhaust pump 10 is decreased to a value below, for example, 0.2 mmTorr, the exhaust pump 10 is started and the shield valves 20 and 21 are closed again. A roughing valve 15 is opened to effect roughing of the vacuum treating chamber 2. When the pressure of the vacuum treating chamber 2 attains 50 mmTorr, the roughing valve 15 is closed, a main valve 7 is opened, and the vacuum treating chamber 2 is brought into a high vacuum by the exhaust pump 10.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、アイソレーションバル
ブで仕切られる複数の真空処理室を真空排気する高真空
排気装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a high vacuum evacuation device for evacuating a plurality of vacuum processing chambers partitioned by isolation valves.

【0002】[0002]

【従来の技術】図3は従来の高真空排気装置の一例にお
ける構成を示す図である。従来、この種の高真空排気装
置は、図3に示すように、アイソレーションバルブ4,
5で仕切られる複数の真空処理室1,2,3のそれぞれ
にメインバルブ6,7,8を介して取付けられる複数の
高真空排気ポンプ9,10,11と、真空処理室1,
2,3の荒引きを行なうとともに高真空排気ポンプ9,
10,11の背圧を減ずる荒引きポンプ18と、真空処
理室1,2,3と荒引きポンプ18とを連結する第1の
配管の開閉を行なう荒引きバルブ13,15,17と、
高真空排気ポンプ9,10,11と荒引きポンプ18と
を連結する第2の配管の開閉を行なう荒引きバルブ1
2,14,16とを備えている。
2. Description of the Related Art FIG. 3 is a diagram showing a configuration of an example of a conventional high vacuum exhaust device. Conventionally, this type of high-vacuum exhaust device is provided with an isolation valve 4, as shown in FIG.
A plurality of high-vacuum exhaust pumps 9, 10, 11 which are attached via a main valve 6, 7, 8 to each of a plurality of vacuum processing chambers 1, 2, 3 partitioned by 5, and a vacuum processing chamber 1,
Rough evacuation of a few and high vacuum pump 9,
A roughing pump 18 for reducing the back pressure of 10, 11; and roughing valves 13, 15, 17 for opening and closing a first pipe connecting the vacuum processing chambers 1, 2, 3 and the roughing pump 18,
Roughing valve 1 for opening and closing a second pipe connecting the high vacuum exhaust pumps 9, 10, 11 and the roughing pump 18.
2, 14, 16 are provided.

【0003】次に、真空処理室1と高真空排気ポンプ9
を起動する例により動作を説明する。今、全てにバルブ
は閉状態にある。まず、荒引きポンプ18を起動し、次
に荒引きバルブ12を開にし高真空排気ポンプ9を約5
0mmTorrまで荒引きしる。通常、高真空排気ポン
プにクライオポンプを用いた場合、起動には約1〜6時
間要し、ターボポンプの場合は30分程度を要する。
Next, the vacuum processing chamber 1 and the high vacuum exhaust pump 9
The operation will be described with an example of activating. All valves are closed now. First, the roughing vacuum pump 18 is started, then the roughing vacuum valve 12 is opened, and the high vacuum exhaust pump 9 is set to about 5%.
Roughly pull down to 0 mmTorr. Usually, when a cryopump is used as the high vacuum exhaust pump, it takes about 1 to 6 hours to start it, and in the case of a turbo pump, it takes about 30 minutes.

【0004】起動完了後、荒引きバルブ13を開け真空
処理室1の荒引きを約50mmTorrまで行い、荒引
きバルブ13を閉じ、メインバルブ6を開け、高真空排
気ポンプ9により真空処理室1を高真空に排気する。
After the start-up is completed, the roughing valve 13 is opened to roughen the vacuum processing chamber 1 to about 50 mmTorr, the roughing valve 13 is closed, the main valve 6 is opened, and the vacuum processing chamber 1 is opened by the high vacuum exhaust pump 9. Evacuate to high vacuum.

【0005】この場合、高真空排気ポンプが補助ポンプ
を必要とする(例えばターボポンプ等)場合には荒引き
ポンプ18を起動、荒引きバルブ12を開の状態で使用
し、補助必要としない高真空排気ポンプ(例えばクライ
オポンプ等)の場合は、荒引きポンプ18を停止し、荒
引きバルブ12を閉じた状態で使用する。
In this case, when the high-vacuum exhaust pump requires an auxiliary pump (for example, a turbo pump), the roughing pump 18 is started and the roughing valve 12 is used in an open state, so that the auxiliary pump is not required. In the case of a vacuum exhaust pump (for example, a cryopump), the roughing pump 18 is stopped and the roughing valve 12 is used in a closed state.

【0006】前述の例では順次真空排気を行う場合を上
げてあるが、真空処理室と高真空排を同時に荒引きする
場合もある。
In the above-mentioned example, the case where the vacuum evacuation is sequentially carried out is raised, but there are cases where the vacuum processing chamber and the high vacuum exhaust are simultaneously evacuated.

【0007】また、他の真空処理室及び高真空排気ポン
プの起動も同様に行うが、同時にあるいは順次行なう場
合がある。さらに、本動作例では全ての高真空排気ポン
プが停止している状態を上げているが場合、通常、本動
作例の状態はまれで、いずれかの高真空排気ポンプは起
動している場合がほとんどである。
Further, other vacuum processing chambers and high vacuum exhaust pumps are similarly started, but they may be started simultaneously or sequentially. Furthermore, in this operation example, when all the high vacuum exhaust pumps are in the stopped state, the state of this operation example is rare, and one of the high vacuum exhaust pumps may be activated. Mostly.

【0008】[0008]

【発明が解決しようとする課題】この従来の高真空排気
装置では、真空処理室及び高真空排気ポンプの荒引きを
荒引きポンプのみで行っているため、荒引き圧力が50
mmTorr程度と高く、真空処理室及び高真空排気ポ
ンプの起動に長時間を要していた。特に高真空排気ポン
プにクライオンポンプを用いた場合には真空断熱効果が
小さいので、起動に1〜6時間も要するという問題があ
った。
In this conventional high-vacuum exhaust device, since the roughing of the vacuum processing chamber and the high-vacuum pump is performed only by the roughing pump, the roughing pressure is 50.
It was as high as mmTorr, and it took a long time to start the vacuum processing chamber and the high vacuum exhaust pump. In particular, when a Claion pump is used as the high-vacuum exhaust pump, the vacuum adiabatic effect is small, so that there is a problem that it takes 1 to 6 hours to start.

【0009】従って、本発明の目的は、真空処理室の排
気および高真空排気ポンプの起動時間をより短くするこ
とのできる高真空排気装置を提供することである。
Therefore, an object of the present invention is to provide a high vacuum evacuation device which can shorten the evacuation time of the vacuum processing chamber and the activation time of the high vacuum evacuation pump.

【0010】[0010]

【課題を解決するための手段】本発明の特徴は、アイソ
レーションバルブで仕切られる複数の真空処理室のそれ
ぞれにメインバルブを介して取付けられる複数の高真空
排気ポンプと、前記真空処理室の荒引きを行なうととも
に前記高真空排気ポンプの背圧を減ずる荒引きポンプ
と、前記真空処理室と該荒引きポンプとを連結する第1
の配管の開閉を行なう第1の開閉バルブと、前記高真空
排気ポンプと前記荒引きポンプとを連結する第2の配管
の開閉を行なう第2の開閉バルブとを備える高真空排気
装置において、前記高真空排気ポンプを互いに連結する
第3の配管と、この第3の配管を独立に開閉する第3の
開閉バルブとを備える高真空排気装置置である。
A feature of the present invention is that a plurality of high vacuum exhaust pumps are attached to each of a plurality of vacuum processing chambers partitioned by an isolation valve via a main valve, and the vacuum processing chamber is roughened. A first roughing pump for pulling and reducing the back pressure of the high vacuum exhaust pump; and a first connecting the vacuum processing chamber and the roughing pump.
A high-vacuum exhaust device comprising: a first open-close valve for opening and closing the pipe; and a second open-close valve for opening and closing a second pipe connecting the high-vacuum exhaust pump and the roughing pump. A high vacuum exhaust device unit including a third pipe connecting the high vacuum exhaust pumps to each other and a third opening / closing valve that independently opens and closes the third pipe.

【0011】[0011]

【実施例】次に本発明について図面を参照して説明す
る。
The present invention will be described below with reference to the drawings.

【0012】図1は本発明の高真空排気装置の一実施例
における構成を示す図である。この高真空排気装置は、
図1に示すように、高真空排気ポンプ9,10,11を
互いに連結する第3の配管と、これらの第3の配管を独
立に開閉する遮断バルブ20,21,22を備えてい
る。それ以外は従来例と同じである。
FIG. 1 is a diagram showing the construction of an embodiment of a high vacuum exhaust device of the present invention. This high vacuum exhaust device
As shown in FIG. 1, a third pipe that connects the high vacuum exhaust pumps 9, 10, and 11 to each other and cutoff valves 20, 21, and 22 that independently open and close these third pipes are provided. Otherwise, it is the same as the conventional example.

【0013】図2は図1の高真空排気装置の動作を説明
するためのフローチャートである。次にこの高真空排気
装置の動作について、真空処理室1及び高真空排気ポン
プ9が起動済みで真空処理室2及び高真空排気ポンプ1
0を起動する例を挙げて説明する。
FIG. 2 is a flow chart for explaining the operation of the high vacuum exhaust device of FIG. Next, regarding the operation of this high-vacuum exhaust device, the vacuum processing chamber 1 and the high-vacuum exhaust pump 9 have already been started, and the vacuum processing chamber 2 and the high-vacuum exhaust pump 1
An example of activating 0 will be described.

【0014】まず、ステップAで荒引きポンプ18を起
動し、ステップBで荒引きバルブ14を開く、ステップ
Cで高真空ポンプ10が50mmTorrに達したら、
ステップDで荒引きバルブ14を閉じる。次に、ステッ
プEとステップFにより遮断バルブ20および21を開
き、高真空排気ポンプ9の排気を利用し高真空排気ポン
プ10を真空排気する。ステップGで高真空排気ポンプ
10の圧力が0.2mmTorr以下になったら、ステ
ップHで高真空排気ポンプ10を起動する。そして、再
びステップIとJにより遮断バルブ20,21を閉じ、
ステップKで荒引きバルブ15を開き真空処理室2を荒
引きする。そしてステップLで真空処理室2が50mm
Torrに達したら、ステップMで荒引きバルブ15を
閉じ、ステップNでメインバルブ7を開き、高真空排気
ポンプ10で真空処理室2を高真空にする。
First, the roughing pump 18 is started in step A, the roughing valve 14 is opened in step B, and when the high vacuum pump 10 reaches 50 mmTorr in step C,
In step D, the roughing valve 14 is closed. Next, in steps E and F, the shutoff valves 20 and 21 are opened, and the high vacuum exhaust pump 9 is evacuated using the exhaust of the high vacuum exhaust pump 9. When the pressure of the high vacuum exhaust pump 10 becomes 0.2 mmTorr or less in step G, the high vacuum exhaust pump 10 is started in step H. Then, the shutoff valves 20 and 21 are closed again by steps I and J,
At step K, the roughing valve 15 is opened to roughly vacuum the vacuum processing chamber 2. Then, in step L, the vacuum processing chamber 2 is 50 mm
When the pressure reaches Torr, the roughing valve 15 is closed in step M, the main valve 7 is opened in step N, and the vacuum processing chamber 2 is set to a high vacuum by the high vacuum exhaust pump 10.

【0015】このように既に起動状態に達した高真空排
気ポンプを次段に立上げる高真空排気ポンプの真空排気
に利用することによって、高真空排気ポンプの軌道を早
めることができる。なお、ここで述べた実施例の構成で
は、圧力の測定系については省略してある。又、チャー
トに記載する判定圧力は高真空排気ポンプの種類、真空
処理室の容量等により変化する。
By using the high-vacuum exhaust pump that has already reached the start-up state for the vacuum exhaust of the high-vacuum exhaust pump that is started up to the next stage, the trajectory of the high-vacuum exhaust pump can be accelerated. In the configuration of the embodiment described here, the pressure measurement system is omitted. Also, the judgment pressure shown in the chart changes depending on the type of high vacuum exhaust pump, the capacity of the vacuum processing chamber, and the like.

【0016】[0016]

【発明の効果】以上説明したように本発明は、各高真空
排気ポンプを結なぐ真空配管とこの真空配管の連通ある
いは遮断を行なうバルブとを設け、既に起動している高
真空排気ポンプの排気作用を利用して起動しようとする
高真空排気ポンプを従来より低い圧力に荒引きすること
によって、真空処理室及び高真空排気ポンプの起動時間
を短くすることが出来という効果がある。例えば、高真
空排気ポンプにクライオンポンプを用いた場合、その起
動時間は従来技術に較べ50〜70パーセントまで短縮
できる。
As described above, according to the present invention, the vacuum pipes connecting the respective high vacuum exhaust pumps and the valves for connecting or disconnecting the vacuum pipes are provided, and the exhaust of the high vacuum exhaust pumps which have already been activated. By roughing the high-vacuum exhaust pump that is about to start using the action to a pressure lower than the conventional pressure, it is possible to shorten the start-up time of the vacuum processing chamber and the high-vacuum exhaust pump. For example, when a high-vacuum exhaust pump is a Claion pump, the start-up time can be shortened by 50 to 70% as compared with the prior art.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の高真空排気装置の一実施例における構
成を示す図である。
FIG. 1 is a diagram showing the configuration of an embodiment of a high vacuum exhaust device of the present invention.

【図2】図1の高真空排気装置の動作を説明するための
フローチャートである。
FIG. 2 is a flow chart for explaining the operation of the high vacuum exhaust device of FIG.

【図3】従来の高真空排気装置の一例における構成を示
す図である。
FIG. 3 is a diagram showing a configuration of an example of a conventional high vacuum exhaust device.

【符号の説明】[Explanation of symbols]

1,2,3 真空処理室 4,5 アイソレーションバルブ 6,7,8 メインバルブ 9,10,11 高真空排気ポンプ 12,13,14,15,16,17 荒引きバルブ 18 荒引きポンプ 20,21,22 遮断バルブ 1, 2, 3 Vacuum processing chamber 4, 5 Isolation valve 6, 7, 8 Main valve 9, 10, 11 High vacuum exhaust pump 12, 13, 14, 15, 16, 17 Roughing valve 18 Roughing pump 20, 21,22 Shut-off valve

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 アイソレーションバルブで仕切られる複
数の真空処理室のそれぞれにメインバルブを介して取付
けられる複数の高真空排気ポンプと、前記真空処理室の
荒引きを行なうとともに前記高真空排気ポンプの背圧を
減ずる荒引きポンプと、前記真空処理室と該荒引きポン
プとを連結する第1の配管の開閉を行なう第1の開閉バ
ルブと、前記高真空排気ポンプと前記荒引きポンプとを
連結する第2の配管の開閉を行なう第2の開閉バルブと
を備える高真空排気装置において、前記高真空排気ポン
プを互いに連結する第3の配管と、この第3の配管を独
立に開閉する第3の開閉バルブとを備えることを特徴と
する高真空排気装置。
1. A plurality of high-vacuum exhaust pumps mounted via a main valve to each of a plurality of vacuum processing chambers partitioned by isolation valves, and a plurality of high-vacuum exhaust pumps for roughing the vacuum processing chambers. A roughing pump that reduces back pressure, a first opening / closing valve that opens and closes a first pipe that connects the vacuum processing chamber and the roughing pump, the high vacuum exhaust pump, and the roughing pump are connected. A high vacuum exhaust device comprising a second opening / closing valve for opening / closing the second pipe, and a third pipe for connecting the high vacuum exhaust pumps to each other, and a third pipe for independently opening / closing the third pipe. A high-vacuum exhaust device, comprising:
JP5312399A 1993-12-14 1993-12-14 High vacuum exhaust system Expired - Fee Related JP2990003B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5312399A JP2990003B2 (en) 1993-12-14 1993-12-14 High vacuum exhaust system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5312399A JP2990003B2 (en) 1993-12-14 1993-12-14 High vacuum exhaust system

Publications (2)

Publication Number Publication Date
JPH07167053A true JPH07167053A (en) 1995-07-04
JP2990003B2 JP2990003B2 (en) 1999-12-13

Family

ID=18028781

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5312399A Expired - Fee Related JP2990003B2 (en) 1993-12-14 1993-12-14 High vacuum exhaust system

Country Status (1)

Country Link
JP (1) JP2990003B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6817377B1 (en) 1998-12-23 2004-11-16 Applied Materials, Inc. Processing apparatus having integrated pumping system
WO2011080980A1 (en) * 2009-12-28 2011-07-07 株式会社アルバック Vacuum exhaust device and vacuum exhaust method, and substrate treatment device
CN103228922A (en) * 2010-05-11 2013-07-31 爱德华兹有限公司 Vacuum pumping system

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6817377B1 (en) 1998-12-23 2004-11-16 Applied Materials, Inc. Processing apparatus having integrated pumping system
US7077159B1 (en) 1998-12-23 2006-07-18 Applied Materials, Inc. Processing apparatus having integrated pumping system
WO2011080980A1 (en) * 2009-12-28 2011-07-07 株式会社アルバック Vacuum exhaust device and vacuum exhaust method, and substrate treatment device
CN102713287A (en) * 2009-12-28 2012-10-03 株式会社爱发科 Vacuum exhaust device and vacuum exhaust method, and substrate treatment device
KR101327715B1 (en) * 2009-12-28 2013-11-11 가부시키가이샤 알박 Vacuum exhaust device and vacuum exhaust method, and substrate treatment device
JP5377666B2 (en) * 2009-12-28 2013-12-25 株式会社アルバック Vacuum exhaust apparatus, vacuum exhaust method and substrate processing apparatus
CN102713287B (en) * 2009-12-28 2015-04-15 株式会社爱发科 Vacuum exhaust device and vacuum exhaust method, and substrate treatment device
TWI503481B (en) * 2009-12-28 2015-10-11 Ulvac Inc A vacuum venting device and a vacuum venting method, and a substrate processing device
CN103228922A (en) * 2010-05-11 2013-07-31 爱德华兹有限公司 Vacuum pumping system
CN103228922B (en) * 2010-05-11 2016-10-26 爱德华兹有限公司 Vacuum pumping system

Also Published As

Publication number Publication date
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