WO2011076499A1 - Procédé de revêtement électrochimique - Google Patents

Procédé de revêtement électrochimique Download PDF

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Publication number
WO2011076499A1
WO2011076499A1 PCT/EP2010/067830 EP2010067830W WO2011076499A1 WO 2011076499 A1 WO2011076499 A1 WO 2011076499A1 EP 2010067830 W EP2010067830 W EP 2010067830W WO 2011076499 A1 WO2011076499 A1 WO 2011076499A1
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WO
WIPO (PCT)
Prior art keywords
layer
workpiece
zones
coating
produced
Prior art date
Application number
PCT/EP2010/067830
Other languages
German (de)
English (en)
Inventor
Jens Dahl Jensen
Oliver Stier
Gabriele Winkler
Original Assignee
Siemens Aktiengesellschaft
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Aktiengesellschaft filed Critical Siemens Aktiengesellschaft
Priority to US13/518,627 priority Critical patent/US20120269982A1/en
Priority to EP10784289.0A priority patent/EP2516698B1/fr
Publication of WO2011076499A1 publication Critical patent/WO2011076499A1/fr

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/34—Pretreatment of metallic surfaces to be electroplated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00—Coating starting from inorganic powder
    • C23C24/02—Coating starting from inorganic powder by application of pressure only
    • C23C24/04—Impact or kinetic deposition of particles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/02—Pretreatment of the material to be coated, e.g. for coating on selected surface areas
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/18—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/615—Microstructure of the layers, e.g. mixed structure
    • C25D5/617—Crystalline layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/67—Electroplating to repair workpiece
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/66—Electroplating: Baths therefor from melts
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/04—Electroplating with moving electrodes
    • C25D5/06—Brush or pad plating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/04—Tubes; Rings; Hollow bodies

Definitions

  • the invention relates to a method for coating a workpiece on which a layer is produced electrochemically.
  • a method of the type mentioned is described for example according to DE 602 25 352 T2. It is possible according to this method to coat the surface of a workpiece electro ⁇ chemically, for example by means of brush plating.
  • a flow, open-pore sponge or a brush is used as a carrier to transfer an electrolyte to the surface to be coated.
  • a metallic material is deposited on the surface by applying a voltage between the substrate and an electrode arranged in the region of the transmitter for the electrolyte from the electrolyte.
  • an electrochemical deposition of metal can also be carried out with ioni ⁇ rule liquids which replace a watery electrolyte.
  • ionic liquids that salt melts which are liquid in the range below 100 ° C, preferably even at room temperature, has the advantage that when they are used result in larger process ⁇ window for the deposition of metals, which by means of aqueous Due to their position in the voltage series of the metals, they are difficult or impossible to separate electrolytes.
  • An example of such a metal is Ta.
  • the object of the invention is to improve an electrochemical coating method in such a way that the electrochemically deposited layers exhibit an inhomogeneous expansion behavior.
  • zones of a second work ⁇ substance having a thermal expansion coefficient which differs from that of the first material can be applied using a thermal spray process on a work ⁇ piece and then through the electro ⁇ chemical coating embedded in the layer.
  • Zones in the sense of the invention are to be understood as meaning partial volumes of the layer whose lateral extent (ie extent seen in the direction parallel to the surface to be coated) is greater than its thickness extent (ie extent, measured perpendicular to the surface to be coated).
  • the thermal expansion behavior of the zones in the lateral direction of the layer is more noticeable than perpendicular to this direction.
  • the inhomogeneous expansion behavior of the layer produced is caused.
  • the second material has a greater coefficient of thermal expansion than the first material.
  • the expansion of the zones causes additional compressive stresses to form in the layer regions adjoining the zones. These can be used to stabilize the layer structure when this would ⁇ example, by formation of cracks react to tensile stresses.
  • Advantageously can be achieved by an appropriate combination of the first and second material, and by appropriate design of the geo ⁇ metric zones an inhomogeneous expansion ⁇ behave produce the layer, which can be adapted to different design requirements for the component to be coated.
  • the zones can also be made of a material which has a lower coefficient of thermal expansion than the first material. In this case, additional compressive stresses would be generated in the first material of the layer when the component is cooled with the layer. This could be advantageous in ⁇ example, if the first material of the layer tends to cold embrittlement and therefore must be protected at low temperatures before the occurrence of tensile stresses.
  • a cold gas spraying is applied as a thermal spraying method.
  • This is a method in which the coating particles primarily adhere to the surface due to their high kinetic energy. It is therefore also referred to as kinetic spraying.
  • the kinetic energy is generated by means of a cold gas spray nozzle, a convergent-divergent nozzle, in a gas jet, with heating of the particles not or only in small dimensions. In any case, heating is not enough to melt the particles, as with other thermal spraying methods.
  • the advantage of using cold gas spraying is therefore that the integrity of the structure of the particles used is not impaired by the cold gas spraying.
  • this method has the advantage that, in particular in the case of a soft, electrochemically produced layer matrix of the preceding layer, the particles penetrate into the layer, as a result of which a better distribution of the particles in the formed layer is achieved.
  • the layer is produced in several layers by performing the thermal spraying process and the electrochemical coating alternately several times.
  • a layer structure can, as already explained, are generated, in which the zones completely embedded in the layer ⁇ , that form the no part in the surface. This is particularly advantageous when the material of the zones has to be protected, for example, from corrosive attack.
  • the complete embedding of the Zo ⁇ nen allows a particularly effective introduction of tensile or compressive ⁇ stresses in the surrounding microstructure of the first material.
  • the thermal spraying and the coating mix electrochemical ⁇ in each case carried out simultaneously under different ⁇ union points of the workpiece.
  • a particularly high efficiency in the coating of the workpiece can advantageously be achieved.
  • the condition is that the workpiece with two coating process is coated only partially and for the same time (at differing ⁇ chen digits).
  • thermal spraying is this is required anyway, because always just the point of impact of the coating jet is coated.
  • electrochemical coating a coating processes must be selected drive, in which a partial coating of the component is possible, ie in which not all the construction ⁇ partially immersed in the electrolyte. This is preferred when applying the so-called Brush Platings possible, wherein only the portion of the workpiece is coated currently electrochemical ⁇ mixed here, which with the carrier of the
  • Electrolyte is in contact.
  • the simultaneous coating of the workpiece with both coating methods can be used when the workpiece is a cylindrical body, in particular a work roll for rolling mills, coated, the ⁇ ser is set in rotation about its central axis and at one point of its circumference, the electrochemical coating and at another location of its circumference the thermal spraying is performed.
  • This can be done, for example, by immersing the cylindrical workpiece in the electrolyte with only part of its peripheral surface.
  • For a uniform coating then ensures the uniform rotation of the cylindrical workpiece through which gradually the entire surface can be coated.
  • the thermal coating can be performed. Even when using the Brush Platings, the rotation of the roller is very advantageous.
  • an ionic liquid is used as the electrolyte for the electrochemical Beschich ⁇ th. This has the advantage that even less noble metals can be deposited from a non-aqueous medium, namely the molten salt of the ionic coating.
  • Ionic liquids are organic liquids consisting of a
  • Cation such as an alkylated imidazolium, pyridinium, ammonium or phosphonium ion and an anion such.
  • Cation such as an alkylated imidazolium, pyridinium, ammonium or phosphonium ion and an anion such.
  • Tri (pentafluoroethyl) -Trifluorophospaten exist.
  • ionic liquids also have a high electrochemical stability, among other things Ti, Ta, Al and Si can be deposited, which consist of aqueous
  • Electrolytes can not be separated due to the strong evolution of hydrogen.
  • Suitable metal salts which are also mentioned in the aforementioned WO 2006/061081 A2, are, for example, halides, imides, amides, alcoholates and salts of mono-, di- or polyvalent organic acids, such as acetates, oxalates or tartrates.
  • the metals to be deposited electrochemically ⁇ mixed are brought by anodic dissolution in the appropriate ionic liquid.
  • a counter electrode to be coated component a lösli ⁇ che electrode is used. This consists of the metal that is to be coated.
  • the metal to be deposited can be added as a salt of the ionic liquid ⁇ the.
  • a platinum electrode can be used as a counterelectrode to the substrate.
  • the concentration of the metal ions to be deposited is maintained in the ionic liquid, which AI is described in detail, for example, in the above-mentioned already it ⁇ DE 43 44 387th
  • the metals are also deposited as nanocrystalline layers.
  • the ionic liquid suitable cations such as.
  • pyrrolinium ions which are surface active and therefore act as a grain refiner during electrochemical deposition. It, that can often be dispensed with under these conditions, the addition of wetting agents or Glanzmit ⁇ stuffs is advantageous. Below is carried out in more detail how the zones may be geometrically configured in single ⁇ nen.
  • the zones can be distributed as island-like depots in a regular pattern on the workpiece.
  • These island-like depots are limited in their size down only in that the gas jet of the applied cold gas spraying method creates a meeting place ⁇ on the component to be coated, which has certain dimensions. This results in the smallest possible extent of the depot. If the depot to be larger, the cold gas jet in the production of the same must be performed in a suitable manner. It is advantageous to produce depots with a round base, but other geometries can be realized. By producing comparatively small depots, it is advantageously achieved that a tight exchange between the first material and the second material in the layer can be realized. As a result, stress peaks in the structures of the first material and the second material can be kept low as soon as they arise due to the inhomogeneous Aus ⁇ strain behavior of the layer.
  • Another possibility is to arrange the zones as strips on the workpiece. This allows an inho- produce seamless front expansion behavior which is different turns in different directions of the layer not only in the expansion behavior of the layer perpendicular to the surface of the workpiece, but also with respect to the late ⁇ eral expansion behavior.
  • the zones are arranged as rectangles in a two-dimensional array on the workpiece.
  • the layer in the region to ⁇ at least one zone on a sacrificial material, for. B. wax, her ⁇ which is removed after the completion of the layer to form a cavity, for example, by melting on ⁇ .
  • a sacrificial material for. B. wax, her ⁇ which is removed after the completion of the layer to form a cavity, for example, by melting on ⁇ .
  • Layer is formed into a multilayer, cantilever bending beam. At one end of the bending beam is then connected to the rest of the composite layer. Below the bending beam, the already mentioned cavity is formed, wherein the other end of the bending beam is freely movable. Due to the different expansion behavior of the two materials, which are preferably arranged in two adjoining layers, the beam bends according to the mechanism mus, which is known for example from bimetallic strip. In this way, the actuator is realized.
  • a bending beam formed in this way can be produced with its free-carrying end, for example, above an opening in the surface of the workpiece.
  • This opening can serve in ⁇ example, the supply of a cooling medium.
  • the Bie ⁇ gebalken may be formed so that the opening is released only when a certain temperature is exceeded is ten, so that the coolant is imminent only when
  • the zone is produced as a cantilever beam of the second material. This has a greater thermal expansion coefficient ⁇ than the first material.
  • the bending beam is connected at one end to the rest of the layer composite and at the other
  • the beam thus formed on no component of the first material.
  • This structure can be used, for example, as a thermal switch. Upon heating of the component, the beam expands due to the larger coefficient of thermal expansion of the beam and bridged at a certain tempera ture the defined distance to the rest of the composite layer. This results in a contact that assumes an electrical conductivity at least of the second material and leads to a change in the electrical behavior of the layer. This can be measured and used as a switching signal. If the first material is an electrical insulator, this can be achieved by a suitable design of supply lines for example, realize an electrical switch with the beam from the first material.
  • the method can be used particularly advantageously for work rolls of a rolling mill. These serve, inter alia, the transport of goods to be rolled, z. As a sheet, which is reduced by the leadership between the work rolls, for example, in its wall thickness. Therefore, the work rolls of a rolling mill are subject to enormous wear.
  • the water can be reduced by the coatings applied according to the invention if particles of a hard material are preferably embedded in the zones. These may be, for example, oxides of Al, Co, Mg, Ti, Si or Zr, nitrides of Al, B or Si or carbides of B, Cr, Ti, Si or W or carbonitrides.
  • carbon can be used as graphite, diamond, DLC (diamond like carbon) or glassy carbon or mixtures of all these substances.
  • Particularly preferred hard materials are the following: Tic, B 4 C, Cr 3 C 2, SiC, WC, TiN, MoB, TiB 2, A1 2 0 3, Cr 2 0 3, Ti0. 2 Also Parti ⁇ angle of cemented carbides (WC, TiC or TiN with a content of> 80 wt .-% in a matrix of Co, Ni, Cr, Fe) may be used.
  • the hard materials may be mentioned as the second material in the zones bring ⁇ eliminated together with particles of a matrix material.
  • the first material can be selected with a smaller coefficient of thermal expansion than the second material in order to generate compressive stresses in the zones when the surface of the roll heats up , which must be preserved in the microstructure due to the proportion of hard materials before the occurrence of tensile stresses. In the zones then comparatively high concentrations of hard material particles can be realized.
  • the hard materials used in the zones of the layer produced on the one hand advantageously reduce their abrasion, so that their wear resistance increases. Furthermore, however, the hard materials also comply with the purpose to increase the surface roughness of the layer which is required because ⁇ can be transferred to the sheet to be rolled with the torque of the work rolls. If the hard materials are provided by the multi-layer structure of the roller over the entire layer thickness, it is furthermore advantageously ensured that the surface roughness of the roller is maintained even if the layer undergoes continuous wear by exposing ever new hard material particles. This signified tet ⁇ that advantageously, a component is created which is provided over its lifetime the requirements for the surface roughness met in full measure.
  • Brush Plating is transportable and therefore also z. B. can be used at the site of the workpiece to be repaired.
  • a surface cleaning and activation is performed on the workpiece to be coated. This can be done for example by a so-called brush cleaning by means of an alkaline and / or cyanide electrolyte and
  • Brush etching by means of an acidic electrolyte, such. For example, hydrochloric or sulfuric acid, take place.
  • an acidic electrolyte such as hydrochloric or sulfuric acid
  • the first coating step in which a ductile base material, such as. As nickel or nickel-cobalt, as the first material is deposited. This process is done by means of brush plating.
  • a ductile base material such as. As nickel or nickel-cobalt, as the first material is deposited.
  • the electrolyte for example, a Watts electrolyte can be used.
  • Sponge can be moved over the area to be coated.
  • an anode in the form of a rod, wire mesh or balls may be included.
  • the material of the anode is either the base material of the ERS ⁇ outgoing layer, this then dissolves and regular has to be replaced moderately, or an inert anode, example ⁇ of platinum.
  • the further coating step may take place subsequent to the electrochemical coating or simultaneously at another point.
  • zones of a second material with a different coefficient of thermal expansion are applied by means of thermal spraying, preferably cold gas spraying, wherein the particles mechanically cling to the surface and thus adhere.
  • thermal spraying preferably cold gas spraying
  • the particles mechanically cling to the surface and thus adhere.
  • ⁇ hardly thermally stressed. Therefore, it can instantly ⁇ of the electrochemical coating step applied ⁇ to. It can be realized a dense sequence of electrochemical and thermal coating steps. This provides a faster layer structure is possible, beneficial ⁇ way benefits of higher efficiency of the parts produced.
  • the coating is carried out in a non-aqueous electrolyte.
  • the surface cleaning and activation of the workpiece to be coated is carried out in the manner already described by brush cleaning and brush etching.
  • the first coating step ⁇ wherein a metal layer is deposited, for example, of titanium is carried out. This process is done by means of brush plating.
  • the electrolyte used to deposit titanium as the first material is 1-butyl-3-methylimidazolium tetrafluoroborate, in which titanium tetrafluoroborate is dissolved as ion carrier. A felt or sponge will come with this
  • Electrolyte impregnated and moved over the surface to be coated of the component The felt or sponge formed by the felt or sponge
  • the transmitter is equipped with an electrode in the manner already described. This may consist of titanium or an inert material, such as platinum. Depending on the workpiece geometry can in alternation with the electro ⁇ chemical coating or simultaneously on a
  • the second coating step vorgenom ⁇ men are placed where the electrochemical coating is currently not performed.
  • zones are made of aluminum, for example, as the second material with said cold gas spraying.
  • the zones are then incorporated in the manner already described in the metal matrix by again titanium is deposited electrochemically.
  • FIG 1 shows an embodiment of the invention
  • FIGS. 4 to 11 layer structures that can be produced using exemplary embodiments of the method according to the invention.
  • a roller-shaped workpiece 11 with a Provided wear protection layer In the embodiment of the inventive method according to Figure 1, a roller-shaped workpiece 11 with a Provided wear protection layer.
  • the workpiece 11 is rotatably mounted with its central axis 12, wherein the axis of rotation 13 is identical to the central axis 12.
  • a bearing 14 is shown schematically, wherein during the coating, the workpiece 11 is rotated by means of a drive, not shown, at a constant speed.
  • FIG. 1 shows a plan view of the workpiece 11 from above to vertically below.
  • a transfer device 15 is brought from one side to the workpiece, which consists of a sponge 16 with open pores.
  • an electrolyte is applied to the surface 18 of the workpiece in a manner not shown via a feed system 17, which moves away under the transmitter.
  • an electrochemical coating takes place, for which purpose the workpiece 11 and the transmitter is connected to a voltage source 19.
  • a Kaltgasspritzdüse 20 is for this purpose guided to the surface 18 of the workpiece court ⁇ tet and gradually in the direction about the rotational axis 13 over the surface.
  • small deposits 27 shown in Figure 4
  • FIG. 3 shows the residence points 26 of the cold gas jet, which leads to a construction of depots 27 in the layer material 28 according to FIG. 4 with a checkerboard-like layer structure.
  • FIG. 4 shows a plan view of the layer surface is ⁇ provides. It can be seen that the depots 27 are embedded in the first material 28 of the layer so that they form part of the layer surface. In Figure 5, however, the deposits 27 are fully converted ⁇ ben on the material 28 of the layer. This can be achieved by carrying out an electrochemical coating step with the first material 28 of the layer after application of the depots 27, without once again applying the second material. A thus formed layer 29 thus has three layers 30, of which only the middle is equipped with the depots 27.
  • the layer surface with freely lie ⁇ constricting strips 31 of the second material, in turn, is shown, which are embedded to the side edges in the first material 28th
  • Another embodiment results if, instead of the strips 31, rectangles 32 are produced, as shown in FIG . These too are exposed at the top, so that they can be seen in the layer surface, while they are embedded with their sides by the first material.
  • FIG. 8 shows how a bending beam 33 can be integrated into the layer 29 on the component 11.
  • wax 34 is applied as a sacrificial material in a predetermined shape on the component 11, wherein the sacrificial material also closes an opening 35 in the component 11 and so verhin ⁇ changed that they are closed by the coating process becomes.
  • the first material 28 is deposited electrochemically, the sacrificial material being for this purpose electrically conductive
  • a zone 36 is produced by cold gas spraying onto the first material and then embedded in the first material 28 at its flanks 36a.
  • the zone 36 itself is not coated by the first material 28, it is electrically insulated (for example by means of a protective lacquer ⁇ ).
  • a two-layer composite the holding flexes with changes in temperature due to the inhomogeneous Ausdehnungsver- and the opening 35 can ver ⁇ close in this manner is formed at least in the central part of the bending beam 33rd
  • the sacrificial material 34 is removed, for example, by melting.
  • FIG. 9 shows a bar 37 which is integrated in the layer 29.
  • the beam 37 which consists entirely of the second material, is embedded in the first material 28 (cf., FIG. 10) and thus fixed in the region of the layer 29.
  • the sacrificial material 34 Through the sacrificial material 34, a cavity is defined, which leads to the fact that the beam 37 is arranged freely supported in the layer.
  • the beam 37 expands, with a sufficient length expansion, a distance a is bridged, so that the beam 34 abuts a transverse strut 38 formed from the first material 28. This also spans a compensating opening 39, so that the cross strut 38 can deform elastically upon further heating and expansion of the beam 37. It can be seen in FIG. 10 that the sacrificial material, even below the beam 37 and the transverse strut 38, ensures that there is no connection to the component 11. After the production of the layer 29, the sacrificial material must be removed. FIG. 9 also shows at which points 40
  • Electrodes could attack on the surface to detect a change in electrical resistance in the event of contact of the beam 37 with the crossbar 38. This can be measured, in particular, when the beam 37 has a lower electrical resistance than the first material 28.
  • FIG. 11 shows a component 11, which is designed as a shaft and is shown in cross-section.
  • the Layer consists of the first material 28, wherein axially ver ⁇ running strips 31 are provided in the layer. Viewed from the outside, the component 11 thus yields a tomogram, as shown in FIG.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Electrochemistry (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)

Abstract

L'invention concerne un procédé pour le revêtement d'une pièce, dans lequel une couche à base d'un premier matériau (28) est fabriquée de façon électrochimique. Afin de générer un comportement de dilatation non homogène de la couche, on arrive selon l'invention par une pulvérisation thermique, en particulier une pulvérisation de gaz froid, à ce que des zones définies (27) dans la couche (29) à base d'un matériau avec un autre comportement de dilatation thermique sont générées. Ces zones ont latéralement une dilation plus grande que dans le sens de l'épaisseur de couche, de sorte que, lors d'un réchauffement ou d'un refroidissement de l'élément de construction (11), des tensions propres orientées se forment dans la couche (29), lesquelles peuvent être utilisées de façon ciblée en fonction des données de construction de l'élément de construction (11).
PCT/EP2010/067830 2009-12-22 2010-11-19 Procédé de revêtement électrochimique WO2011076499A1 (fr)

Priority Applications (2)

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US13/518,627 US20120269982A1 (en) 2009-12-22 2010-11-19 Method for electrochemical coating
EP10784289.0A EP2516698B1 (fr) 2009-12-22 2010-11-19 Procédé de revêtement par pulvérisation thermique et placage électrochimique

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DE102009060937.7 2009-12-22
DE102009060937A DE102009060937A1 (de) 2009-12-22 2009-12-22 Verfahren zum elektrochemischen Beschichten

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EP (1) EP2516698B1 (fr)
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WO (1) WO2011076499A1 (fr)

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CN114505210B (zh) * 2020-11-17 2023-06-23 武汉苏泊尔炊具有限公司 刀具加工方法与刀具

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EP1029951A2 (fr) * 1994-05-24 2000-08-23 TOYO KOHAN Co., Ltd Appareil pour le traitement d'une bande
WO2002012595A1 (fr) * 2000-07-24 2002-02-14 Pohang Iron & Steel Co., Ltd Procede destine a la reduction d'une marque de bande sur une feuille d'acier d'electrodeposition
US20050029109A1 (en) * 2002-05-07 2005-02-10 Gang Zhang Method of electrochemically fabricating multilayer structures having improved interlayer adhesion
WO2006061081A2 (fr) 2004-12-10 2006-06-15 Merck Patent Gmbh Depot electrochimique de tantale et/ou de cuivre dans des liquides ioniques
WO2006089519A1 (fr) * 2005-02-24 2006-08-31 Praxair S.T. Technology, Inc. Corps recouvert, en particulier un cylindre, en matiere plastique renforcee de fibres de carbone, utilise dans des machines a papier et des imprimantes et procede pour produire ledit corps
DE60225352T2 (de) 2002-06-25 2008-06-12 Integran Technologies Inc., Toronto Verfahren zum elektroplattieren von metallischen und metallmatrix-komposite folien, beschichtungen und mikrokomponenten
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DE4344387A1 (de) 1993-12-24 1995-06-29 Atotech Deutschland Gmbh Verfahren zur elektrolytischen Abscheidung von metallischen Schichten mit vorbestimmten physikalischen Eigenschaften und Anordnung zur Durchführung des Verfahrens
EP1029951A2 (fr) * 1994-05-24 2000-08-23 TOYO KOHAN Co., Ltd Appareil pour le traitement d'une bande
WO2002012595A1 (fr) * 2000-07-24 2002-02-14 Pohang Iron & Steel Co., Ltd Procede destine a la reduction d'une marque de bande sur une feuille d'acier d'electrodeposition
US20050029109A1 (en) * 2002-05-07 2005-02-10 Gang Zhang Method of electrochemically fabricating multilayer structures having improved interlayer adhesion
DE60225352T2 (de) 2002-06-25 2008-06-12 Integran Technologies Inc., Toronto Verfahren zum elektroplattieren von metallischen und metallmatrix-komposite folien, beschichtungen und mikrokomponenten
WO2006061081A2 (fr) 2004-12-10 2006-06-15 Merck Patent Gmbh Depot electrochimique de tantale et/ou de cuivre dans des liquides ioniques
WO2006089519A1 (fr) * 2005-02-24 2006-08-31 Praxair S.T. Technology, Inc. Corps recouvert, en particulier un cylindre, en matiere plastique renforcee de fibres de carbone, utilise dans des machines a papier et des imprimantes et procede pour produire ledit corps
US20080299247A1 (en) * 2007-05-31 2008-12-04 Masahiko Ogino Fine Pattern Mold and Method for Producing the Same

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US20120269982A1 (en) 2012-10-25
EP2516698B1 (fr) 2014-04-02
EP2516698A1 (fr) 2012-10-31

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