WO2011052987A3 - 식각액 조성물 - Google Patents

식각액 조성물 Download PDF

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Publication number
WO2011052987A3
WO2011052987A3 PCT/KR2010/007413 KR2010007413W WO2011052987A3 WO 2011052987 A3 WO2011052987 A3 WO 2011052987A3 KR 2010007413 W KR2010007413 W KR 2010007413W WO 2011052987 A3 WO2011052987 A3 WO 2011052987A3
Authority
WO
WIPO (PCT)
Prior art keywords
weight
etching solution
solution composition
composition
metal films
Prior art date
Application number
PCT/KR2010/007413
Other languages
English (en)
French (fr)
Other versions
WO2011052987A2 (ko
Inventor
이석준
양승재
권오병
이유진
Original Assignee
동우 화인켐 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 동우 화인켐 주식회사 filed Critical 동우 화인켐 주식회사
Priority to CN2010800429125A priority Critical patent/CN102648270A/zh
Publication of WO2011052987A2 publication Critical patent/WO2011052987A2/ko
Publication of WO2011052987A3 publication Critical patent/WO2011052987A3/ko

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
    • C09K13/06—Etching, surface-brightening or pickling compositions containing an inorganic acid with organic material

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  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Weting (AREA)
  • ing And Chemical Polishing (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Thin Film Transistor (AREA)

Abstract

본 발명은 조성물 총 중량에 대하여, H3PO4 25 내지 50 중량%; HNO3 0.1 내지 7 중량%; CH3COOH 10 내지 50 중량%; 고리형 아민 화합물 0.1 내지 5 중량%; 및 물 잔량을 포함하는 것을 특징으로 하는, 구리를 포함하는 금속막과 몰리브덴을 포함하는 금속막으로 이루어진 이중막 또는 다중막용 식각액 조성물에 관한 것이다.
PCT/KR2010/007413 2009-10-29 2010-10-27 식각액 조성물 WO2011052987A2 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2010800429125A CN102648270A (zh) 2009-10-29 2010-10-27 蚀刻液组合物

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2009-0103731 2009-10-29
KR1020090103731A KR20110046992A (ko) 2009-10-29 2009-10-29 식각액 조성물

Publications (2)

Publication Number Publication Date
WO2011052987A2 WO2011052987A2 (ko) 2011-05-05
WO2011052987A3 true WO2011052987A3 (ko) 2011-09-09

Family

ID=43922820

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2010/007413 WO2011052987A2 (ko) 2009-10-29 2010-10-27 식각액 조성물

Country Status (3)

Country Link
KR (1) KR20110046992A (ko)
CN (1) CN102648270A (ko)
WO (1) WO2011052987A2 (ko)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101256276B1 (ko) * 2010-08-25 2013-04-18 플란제 에스이 다중막의 식각액 조성물 및 그 식각방법
KR102293675B1 (ko) * 2015-03-24 2021-08-25 동우 화인켐 주식회사 구리계 금속막 식각액 조성물 및 이를 이용한 액정 표시 장치용 어레이 기판의 제조방법
TWI631205B (zh) * 2015-11-06 2018-08-01 東友精細化工有限公司 銀蝕刻液組合物和使用該組合物的顯示基板
KR102433385B1 (ko) * 2015-11-10 2022-08-17 동우 화인켐 주식회사 은 식각액 조성물 및 이를 이용한 표시 기판
CN116200749A (zh) * 2023-02-28 2023-06-02 深圳新宙邦科技股份有限公司 一种含氧化铟或其合金/银或其合金的多层薄膜用蚀刻液

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20060023917A (ko) * 2004-09-11 2006-03-15 테크노세미켐 주식회사 구리 연마용 조성물
KR20060134380A (ko) * 2005-06-22 2006-12-28 삼성전자주식회사 식각액, 이를 이용하는 배선 형성 방법 및 박막 트랜지스터기판의 제조 방법
KR20080024818A (ko) * 2006-09-15 2008-03-19 동우 화인켐 주식회사 구리와 몰리브덴으로 이루어진 다층막용 식각용액 조성물
KR20080045853A (ko) * 2006-11-21 2008-05-26 동우 화인켐 주식회사 액정표시장치용 ｔｆｔ 어레이 기판의 제조방법

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101171175B1 (ko) * 2004-11-03 2012-08-06 삼성전자주식회사 도전체용 식각액 및 이를 이용한 박막 트랜지스터표시판의 제조 방법
CN100510187C (zh) * 2005-11-17 2009-07-08 乐金显示有限公司 蚀刻金属层的组合物以及使用其形成金属图案的方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20060023917A (ko) * 2004-09-11 2006-03-15 테크노세미켐 주식회사 구리 연마용 조성물
KR20060134380A (ko) * 2005-06-22 2006-12-28 삼성전자주식회사 식각액, 이를 이용하는 배선 형성 방법 및 박막 트랜지스터기판의 제조 방법
KR20080024818A (ko) * 2006-09-15 2008-03-19 동우 화인켐 주식회사 구리와 몰리브덴으로 이루어진 다층막용 식각용액 조성물
KR20080045853A (ko) * 2006-11-21 2008-05-26 동우 화인켐 주식회사 액정표시장치용 ｔｆｔ 어레이 기판의 제조방법

Also Published As

Publication number Publication date
WO2011052987A2 (ko) 2011-05-05
CN102648270A (zh) 2012-08-22
KR20110046992A (ko) 2011-05-06

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