WO2011031666A1 - Photovoltaic back contact - Google Patents

Photovoltaic back contact Download PDF

Info

Publication number
WO2011031666A1
WO2011031666A1 PCT/US2010/047971 US2010047971W WO2011031666A1 WO 2011031666 A1 WO2011031666 A1 WO 2011031666A1 US 2010047971 W US2010047971 W US 2010047971W WO 2011031666 A1 WO2011031666 A1 WO 2011031666A1
Authority
WO
WIPO (PCT)
Prior art keywords
acid
cleaning agent
carbon
surfactant
depositing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2010/047971
Other languages
English (en)
French (fr)
Inventor
Pratima V. Addepalli
John S. Deeken
Oleh P. Karpenko
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
First Solar Inc
Original Assignee
First Solar Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by First Solar Inc filed Critical First Solar Inc
Priority to IN2167DEN2012 priority Critical patent/IN2012DN02167A/en
Priority to DE112010003607T priority patent/DE112010003607T5/de
Priority to CN201080040452.2A priority patent/CN102498572B/zh
Publication of WO2011031666A1 publication Critical patent/WO2011031666A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/20—Electrodes
    • H10F77/206—Electrodes for devices having potential barriers
    • H10F77/211—Electrodes for devices having potential barriers for photovoltaic cells
    • H10F77/219—Arrangements for electrodes of back-contact photovoltaic cells
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/20—Organic compounds containing oxygen
    • C11D3/2075—Carboxylic acids-salts thereof
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/26—Organic compounds containing nitrogen
    • C11D3/30—Amines; Substituted amines ; Quaternized amines
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/265—Carboxylic acids or salts thereof
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3209—Amines or imines with one to four nitrogen atoms; Quaternized amines
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3218—Alkanolamines or alkanolimines
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00—Individual photovoltaic cells, e.g. solar cells
    • H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
    • H10F10/16—Photovoltaic cells having only PN heterojunction potential barriers
    • H10F10/162—Photovoltaic cells having only PN heterojunction potential barriers comprising only Group II-VI materials, e.g. CdS/CdTe photovoltaic cells
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H10F71/125—The active layers comprising only Group II-VI materials, e.g. CdS, ZnS or CdTe
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/543—Solar cells from Group II-VI materials
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Definitions

  • a photovoltaic device 300 can include a transparent conductive oxide layer 120 deposited adjacent to a substrate 110.
  • Transparent conductive oxide layer 120 can be deposited on substrate 110 by sputtering or evaporation or any other appropriate method.
  • Substrate 110 can include any suitable substrate material, including glass, such as soda-lime glass.
  • Transparent conductive oxide layer 120 can include any suitable transparent conductive oxide material, including a cadmium stannate, an indium-doped cadmium oxide, or a tin-doped indium oxide.
  • Semiconductor window layer 130 can be deposited adjacent to transparent conductive oxide layer 120.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Emergency Medicine (AREA)
  • Health & Medical Sciences (AREA)
  • Photovoltaic Devices (AREA)
  • Weting (AREA)
  • Sustainable Development (AREA)
  • Sustainable Energy (AREA)
  • Manufacturing & Machinery (AREA)
  • Secondary Cells (AREA)
  • Carbon And Carbon Compounds (AREA)
PCT/US2010/047971 2009-09-11 2010-09-07 Photovoltaic back contact Ceased WO2011031666A1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
IN2167DEN2012 IN2012DN02167A (en:Method) 2009-09-11 2010-09-07
DE112010003607T DE112010003607T5 (de) 2009-09-11 2010-09-07 Phovoltaik-rückkontakt
CN201080040452.2A CN102498572B (zh) 2009-09-11 2010-09-07 清洗碲化镉表面的方法和制造光伏器件的方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US24160609P 2009-09-11 2009-09-11
US61/241,606 2009-09-11

Publications (1)

Publication Number Publication Date
WO2011031666A1 true WO2011031666A1 (en) 2011-03-17

Family

ID=43729290

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2010/047971 Ceased WO2011031666A1 (en) 2009-09-11 2010-09-07 Photovoltaic back contact

Country Status (7)

Country Link
US (2) US8603253B2 (en:Method)
CN (1) CN102498572B (en:Method)
DE (1) DE112010003607T5 (en:Method)
IN (1) IN2012DN02167A (en:Method)
MY (1) MY164919A (en:Method)
TW (1) TWI513814B (en:Method)
WO (1) WO2011031666A1 (en:Method)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102405276A (zh) * 2009-04-08 2012-04-04 太阳索尼克斯公司 从基板去除污染物质的方法和装置
US20110117696A1 (en) * 2009-11-19 2011-05-19 Air Liquide Electronics U.S. Lp CdTe SURFACE TREATMENT FOR STABLE BACK CONTACTS
CN103180962B (zh) 2010-08-13 2016-05-11 第一太阳能有限公司 具有氧化物层的光伏装置
US9412886B2 (en) 2010-08-20 2016-08-09 First Solar, Inc. Electrical contact
BR112015023736A2 (pt) * 2013-03-15 2017-07-18 First Solar Inc método para manufaturar dispositivo fotovoltaico
CN104518045B (zh) * 2013-09-26 2018-03-23 中国建材国际工程集团有限公司 用来调理CdTe薄层太阳能电池的CdTe层的方法
US10367110B2 (en) * 2015-12-09 2019-07-30 First Solar, Inc. Photovoltaic devices and method of manufacturing
MY191173A (en) 2016-04-07 2022-06-03 First Solar Inc Devices and methods for making polycrystalline alloys
CN117832333B (zh) * 2024-03-05 2024-05-31 龙焱能源科技（杭州）有限公司 一种碲化镉薄膜电池及其制备方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5837662A (en) * 1997-12-12 1998-11-17 Memc Electronic Materials, Inc. Post-lapping cleaning process for silicon wafers
US20040018664A1 (en) * 2002-07-23 2004-01-29 Subhendu Guha Lightweight semiconductor device and method for its manufacture
US20060175295A1 (en) * 2003-07-11 2006-08-10 Jia-Ni Chu Abrasive partilcle for chemical mechanical polishing
US20060183055A1 (en) * 2005-02-15 2006-08-17 O'neill Mark L Method for defining a feature on a substrate
US20070148336A1 (en) * 2005-11-07 2007-06-28 Robert Bachrach Photovoltaic contact and wiring formation

Family Cites Families (14)

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IL139546A (en) * 1998-05-18 2005-08-31 Mallinckrodt Inc Silicate-containing alkaline compositions for cleaning microelectronic substrates
CA2544198C (en) * 2003-10-29 2011-07-26 Mallinckrodt Baker, Inc. Alkaline, post plasma etch/ash residue removers and photoresist stripping compositions containing metal-halide corrosion inhibitors
JP2005181987A (ja) * 2003-11-27 2005-07-07 Konica Minolta Holdings Inc 光双方向モジュール
US20130000214A1 (en) * 2006-01-11 2013-01-03 Jia-Ni Chu Abrasive Particles for Chemical Mechanical Polishing
US8309387B2 (en) * 2007-04-13 2012-11-13 David Forehand Improving back-contact performance of group VI containing solar cells by utilizing a nanoscale interfacial layer
WO2009012345A2 (en) * 2007-07-16 2009-01-22 Ascent Solar Technologies, Inc. Hybrid multi-junction photovoltaic cells and associated methods
WO2009032460A1 (en) * 2007-08-02 2009-03-12 Advanced Technology Materials, Inc. Non-fluoride containing composition for the removal of residue from a microelectronic device
TW200936749A (en) * 2007-10-29 2009-09-01 Ekc Technology Inc Process of purification of amidoxime containing cleaning solutions and their use
CN100555679C (zh) * 2008-08-05 2009-10-28 四川大学 CdTe薄膜太阳电池的腐蚀方法
JP2010171362A (ja) * 2008-12-26 2010-08-05 Fujifilm Corp 半導体デバイス用洗浄剤及びそれを用いた半導体デバイスの製造方法
JP2011018636A (ja) * 2009-06-09 2011-01-27 Fujifilm Corp 導電性組成物、並びに透明導電膜、表示素子及び集積型太陽電池
JP5878465B2 (ja) * 2009-07-13 2016-03-08 ファースト ソーラー インコーポレイテッド 太陽電池フロントコンタクトのドーピング
IN2012DN01293A (en:Method) * 2009-08-10 2015-06-05 First Solar Inc
WO2012129235A1 (en) * 2011-03-21 2012-09-27 EncoreSolar, Inc. High efficiency cadmium telluride solar cell and method of fabrication

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5837662A (en) * 1997-12-12 1998-11-17 Memc Electronic Materials, Inc. Post-lapping cleaning process for silicon wafers
US20040018664A1 (en) * 2002-07-23 2004-01-29 Subhendu Guha Lightweight semiconductor device and method for its manufacture
US20060175295A1 (en) * 2003-07-11 2006-08-10 Jia-Ni Chu Abrasive partilcle for chemical mechanical polishing
US20060183055A1 (en) * 2005-02-15 2006-08-17 O'neill Mark L Method for defining a feature on a substrate
US20070148336A1 (en) * 2005-11-07 2007-06-28 Robert Bachrach Photovoltaic contact and wiring formation

Also Published As

Publication number Publication date
US20110061736A1 (en) 2011-03-17
CN102498572B (zh) 2016-03-02
US8603253B2 (en) 2013-12-10
MY164919A (en) 2018-02-15
TW201127949A (en) 2011-08-16
DE112010003607T5 (de) 2012-08-23
CN102498572A (zh) 2012-06-13
US9252302B2 (en) 2016-02-02
US20140057389A1 (en) 2014-02-27
IN2012DN02167A (en:Method) 2015-08-21
TWI513814B (zh) 2015-12-21

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