WO2011002247A3 - 300nm 이하의 초단파장 노광기를 이용한 고체 촬상 소자의 컬러 필터 제조용 착색 감광성 수지 조성물, 이를 이용한 컬러 필터 및 이를 포함하는 고체 촬상 소자 - Google Patents

300nm 이하의 초단파장 노광기를 이용한 고체 촬상 소자의 컬러 필터 제조용 착색 감광성 수지 조성물, 이를 이용한 컬러 필터 및 이를 포함하는 고체 촬상 소자 Download PDF

Info

Publication number
WO2011002247A3
WO2011002247A3 PCT/KR2010/004288 KR2010004288W WO2011002247A3 WO 2011002247 A3 WO2011002247 A3 WO 2011002247A3 KR 2010004288 W KR2010004288 W KR 2010004288W WO 2011002247 A3 WO2011002247 A3 WO 2011002247A3
Authority
WO
WIPO (PCT)
Prior art keywords
color filter
solid
sensing device
state image
image sensing
Prior art date
Application number
PCT/KR2010/004288
Other languages
English (en)
French (fr)
Other versions
WO2011002247A2 (ko
Inventor
이상행
이승노
온정훈
전지민
Original Assignee
동우화인켐 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020090060149A external-priority patent/KR20110002608A/ko
Priority claimed from KR1020090060147A external-priority patent/KR20110002606A/ko
Priority claimed from KR1020090060148A external-priority patent/KR20110002607A/ko
Application filed by 동우화인켐 주식회사 filed Critical 동우화인켐 주식회사
Priority to JP2012517414A priority Critical patent/JP2012532334A/ja
Priority to CN2010800384478A priority patent/CN102770809A/zh
Priority to US13/381,289 priority patent/US8902522B2/en
Publication of WO2011002247A2 publication Critical patent/WO2011002247A2/ko
Publication of WO2011002247A3 publication Critical patent/WO2011002247A3/ko

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
  • Color Television Image Signal Generators (AREA)

Abstract

본 발명은 착색제, 바인더수지, 광중합성 화합물, 광중합개시제 및 용매를 포함하는 착색 감광성 수지 조성물에 있어서, 상기 광중합개시제가 300nm 이하에서 반응하는 화합물을 포함하는 것을 특징으로 하는 300nm 이하의 초단파장 노광기를 이용한 고체 촬상 소자의 컬러 필터 제조용 착색 감광성 수지 조성물을 제공한다. 상기 착색 감광성 수지 조성물은 초미세화된 착색 패턴이 구현된 컬러 필터를 제조할 수 있으며, 따라서 상기 컬러필터는 고체 촬상 소자에 유용하게 적용될 수 있다.
PCT/KR2010/004288 2009-07-02 2010-07-01 300nm 이하의 초단파장 노광기를 이용한 고체 촬상 소자의 컬러 필터 제조용 착색 감광성 수지 조성물, 이를 이용한 컬러 필터 및 이를 포함하는 고체 촬상 소자 WO2011002247A2 (ko)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2012517414A JP2012532334A (ja) 2009-07-02 2010-07-01 ３００ｎｍ以下の超短波長露光器を利用した固体撮像素子のカラーフィルター製造用着色感光性樹脂組成物、これを利用したカラーフィルターおよびこれを含む固体撮像素子
CN2010800384478A CN102770809A (zh) 2009-07-02 2010-07-01 用于制备利用300nm以下超短波长曝光器的固体摄像元件的彩色滤光片的着色感光性树脂组合物、利用其的彩色滤光片以及含有该彩色滤光片的固体摄像元件
US13/381,289 US8902522B2 (en) 2009-07-02 2010-07-01 Colored photosensitive resin composition for preparation of color filter of solid-state image sensing device using 300 nm or less ultrashort wave exposure equipment, color filter using same, and solid-state image sensing device containing same

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
KR10-2009-0060148 2009-07-02
KR10-2009-0060149 2009-07-02
KR1020090060149A KR20110002608A (ko) 2009-07-02 2009-07-02 300ｎｍ 이하의 초단파장 노광기를 이용한 고체 촬상 소자의 컬러 필터 제조용 착색 감광성 수지 조성물, 이를 이용한 컬러 필터 및 이를 포함하는 고체 촬상 소자
KR1020090060147A KR20110002606A (ko) 2009-07-02 2009-07-02 300ｎｍ 이하의 초단파장 노광기를 이용한 고체 촬상 소자의 컬러 필터 제조용 착색 감광성 수지 조성물, 이를 이용한 컬러 필터 및 이를 포함하는 고체 촬상 소자
KR1020090060148A KR20110002607A (ko) 2009-07-02 2009-07-02 300ｎｍ 이하의 초단파장 노광기를 이용한 고체 촬상 소자의 컬러 필터 제조용 착색 감광성 수지 조성물, 이를 이용한 컬러 필터 및 이를 포함하는 고체 촬상 소자
KR10-2009-0060147 2009-07-02

Publications (2)

Publication Number Publication Date
WO2011002247A2 WO2011002247A2 (ko) 2011-01-06
WO2011002247A3 true WO2011002247A3 (ko) 2011-04-14

Family

ID=43411620

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2010/004288 WO2011002247A2 (ko) 2009-07-02 2010-07-01 300nm 이하의 초단파장 노광기를 이용한 고체 촬상 소자의 컬러 필터 제조용 착색 감광성 수지 조성물, 이를 이용한 컬러 필터 및 이를 포함하는 고체 촬상 소자

Country Status (4)

Country Link
US (1) US8902522B2 (ko)
JP (1) JP2012532334A (ko)
CN (1) CN102770809A (ko)
WO (1) WO2011002247A2 (ko)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5757925B2 (ja) * 2011-08-31 2015-08-05 富士フイルム株式会社 着色組成物、並びに、これを用いたカラーフィルタの製造方法、カラーフィルタ、及び、固体撮像素子
JP2013117645A (ja) * 2011-12-02 2013-06-13 Toppan Printing Co Ltd 固体撮像素子に用いられるカラーフィルタ用感光性着色組成物及びカラーフィルタ
WO2014136667A1 (ja) * 2013-03-06 2014-09-12 積水化学工業株式会社 液晶滴下工法用シール剤、上下導通材料、及び、液晶表示素子
JP6155772B2 (ja) * 2013-04-02 2017-07-05 東洋インキＳｃホールディングス株式会社 感光性着色組成物、着色膜及びカラーフィルタ
WO2015060240A1 (ja) * 2013-10-21 2015-04-30 日産化学工業株式会社 ネガ型感光性樹脂組成物
JP6233271B2 (ja) * 2013-12-27 2017-11-22 Jsr株式会社 感光性樹脂組成物およびレジストパターンの製造方法
JP6392549B2 (ja) * 2014-05-28 2018-09-19 株式会社タムラ製作所 アルカリ可溶性樹脂組成物及びアルカリ可溶性樹脂組成物の硬化膜を有するプリント配線板
US20170176856A1 (en) 2015-12-21 2017-06-22 Az Electronic Materials (Luxembourg) S.A.R.L. Negative-working photoresist compositions for laser ablation and use thereof
KR102143261B1 (ko) * 2016-04-01 2020-08-10 주식회사 엘지화학 잉크 조성물, 이로 제조된 경화 패턴, 이를 포함하는 발열체 및 이의 제조방법
JP6966546B2 (ja) 2017-07-04 2021-11-17 富士フイルム株式会社 デバイスの製造方法
CN115166888A (zh) * 2017-09-29 2022-10-11 富士胶片株式会社 滤光器的制造方法
KR102374880B1 (ko) 2017-09-29 2022-03-16 후지필름 가부시키가이샤 착색 감광성 조성물 및 광학 필터의 제조 방법
JPWO2019159950A1 (ja) * 2018-02-16 2021-02-04 富士フイルム株式会社 感光性組成物
TWI787455B (zh) 2018-02-16 2022-12-21 日商富士軟片股份有限公司 感光性組成物
TW201936648A (zh) * 2018-02-28 2019-09-16 日商富士軟片股份有限公司 感光性組成物
JP7075477B2 (ja) 2018-03-05 2022-05-25 富士フイルム株式会社 感光性組成物
JPWO2019188652A1 (ja) * 2018-03-26 2021-02-18 富士フイルム株式会社 感光性組成物
KR20200122349A (ko) 2018-03-26 2020-10-27 후지필름 가부시키가이샤 감광성 조성물
CN111902775B (zh) * 2018-04-19 2024-01-02 富士胶片株式会社 图案及光学滤波器及固体摄像元件以及图像显示装置的制造方法、光固化性组合物及膜

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20070044062A (ko) * 2004-08-18 2007-04-26 시바 스페셜티 케미칼스 홀딩 인크. 옥심 에스테르 광개시제
KR20080088400A (ko) * 2007-03-29 2008-10-02 도쿄 오카 고교 가부시키가이샤 착색 감광성 수지 조성물, 블랙 매트릭스, 컬러 필터, 및액정 표시 디스플레이
KR20090040232A (ko) * 2007-10-19 2009-04-23 제이에스알 가부시끼가이샤 착색층 형성용 감방사선성 조성물, 컬러 필터 및 액정 표시소자
KR20090058458A (ko) * 2007-12-04 2009-06-09 주식회사 엘지화학 알칼리 가용성 바인더 수지, 이의 제조방법 및 이를 포함하는 감광성 수지 조성물

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1210247C (zh) * 2000-02-04 2005-07-13 株式会社爱伊斯 高纯度双－β－羟乙基对苯二甲酸酯的制备方法
EP1205808B1 (en) * 2000-11-08 2010-03-17 Ricoh Company, Ltd. Electrophotographic photoreceptor and method of preparation thereof and image forming method and apparatus using the photoreceptor
JP2007094310A (ja) * 2005-09-30 2007-04-12 Toppan Printing Co Ltd プロキシミティー露光方法およびプロキシミティー露光装置
KR101116963B1 (ko) * 2006-10-04 2012-03-14 신에쓰 가가꾸 고교 가부시끼가이샤 고분자 화합물, 레지스트 재료, 및 패턴 형성 방법
JP5191241B2 (ja) 2007-01-12 2013-05-08 東洋インキＳｃホールディングス株式会社 着色組成物およびカラーフィルタの製造方法
JP2010139692A (ja) 2008-12-11 2010-06-24 Toppan Printing Co Ltd 感光性着色組成物、及びそれを用いるカラーフィルタ基板の製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20070044062A (ko) * 2004-08-18 2007-04-26 시바 스페셜티 케미칼스 홀딩 인크. 옥심 에스테르 광개시제
KR20080088400A (ko) * 2007-03-29 2008-10-02 도쿄 오카 고교 가부시키가이샤 착색 감광성 수지 조성물, 블랙 매트릭스, 컬러 필터, 및액정 표시 디스플레이
KR20090040232A (ko) * 2007-10-19 2009-04-23 제이에스알 가부시끼가이샤 착색층 형성용 감방사선성 조성물, 컬러 필터 및 액정 표시소자
KR20090058458A (ko) * 2007-12-04 2009-06-09 주식회사 엘지화학 알칼리 가용성 바인더 수지, 이의 제조방법 및 이를 포함하는 감광성 수지 조성물

Also Published As

Publication number Publication date
WO2011002247A2 (ko) 2011-01-06
US8902522B2 (en) 2014-12-02
JP2012532334A (ja) 2012-12-13
CN102770809A (zh) 2012-11-07
US20120099214A1 (en) 2012-04-26

Similar Documents

Publication Publication Date Title
WO2011002247A3 (ko) 300nm 이하의 초단파장 노광기를 이용한 고체 촬상 소자의 컬러 필터 제조용 착색 감광성 수지 조성물, 이를 이용한 컬러 필터 및 이를 포함하는 고체 촬상 소자
EP2120094A3 (en) Black photosensitive resin composition, and color filter and method of producing the same
WO2018110864A8 (ko) 감광성 수지 조성물, 이를 이용한 감광성 수지막 및 컬러필터
EP1975702A3 (en) Colored photocurable composition for solid state image pick-up device, color filter and method for production thereof, and solid state image pick-up device
MY163409A (en) Photosensitive resin composition,laminate utilizing same and solid-state imaging device
TW200745752A (en) Photosensitive resist composition for color filters for use in electronic paper display devices
EP2385072A4 (en) NOVEL COMPOUND, POLYMERIZABLE COMPOSITION, COLOR FILTER AND METHOD FOR PRODUCING THE SAME, SOLID STATE IMAGING ELEMENT, AND ORIGINAL LITHOGRAPHIC PRINTING PLATE
TW200942970A (en) Photosensitive resin composition, light-shielding color filter, method of producing the same and solid-state image sensor
EP2270110A4 (en) PIGMENT DISPERSE COMPOSITION, COLORED PHOTOSENSIBLE COMPOSITION, PHOTOHARESCENT COMPOSITION, COLOR FILTER, LIQUID CRYSTALLINE DISPLAY ORGANIC, AND SOLID IMAGE RECORDING ORGAN
WO2009040661A3 (en) Thick film resists
EP2550554A4 (en) HARDENABLE BLACK COMPOSITION, LIGHT SCREENING COLOR FILTERS FOR A SOLID BODY IMAGING DEVICE AND METHOD FOR THE PRODUCTION THEREOF, SOLID BODY IMAGING DEVICE, WAF LEVEL LENS AND CAMERA MODULE
WO2008127036A3 (en) Photosensitive resin composition comprising a polymer prepared by using macromonomer as alkali soluble resin
EP2218756A4 (en) PIGMENT DISPERSION COMPOSITION, CURABLE COLOR COMPOSITION, COLOR FILTER AND METHOD OF MANUFACTURING THEREOF
EP2479613A4 (en) PHOTOPOLYMERIZABLE COMPOSITION, COLOR FILTER, MANUFACTURING METHOD THEREOF, TRANSISTORIZED IMAGE CAPTURE ELEMENT, LIQUID CRYSTAL DISPLAY DEVICE, ORIGINAL LITHOGRAPHIC PRINTING PLATE, AND NOVEL COMPOUND
TW200641523A (en) Photosensitive resin composition for use in forming light-blocking layer, light-blocking layer and color filter
SG128605A1 (en) Radiation sensitive composition for forming a colored layer and color filter
TW200731006A (en) Radiation-sensitive composition for forming colored layer, and color filter
EP2270593A4 (en) COLORED CURABLE COMPOSITION, COLOR FILTER, AND SEMICONDUCTOR IMAGING DEVICE
EP2348361A4 (en) CURABLE COMPOSITION CONTAINING NEGATIVE DYE, COLOR FILTER, AND METHOD OF MANUFACTURING THE SAME USING ALL THE COMPOSITION AND SOLID IMAGING ELEMENT
EP2362266A3 (en) Colored curable composition, color filter and method of producing color filter, solid-state image sensor and liquid crystal display device
TW200834231A (en) Black-colored photosensitive resin composition, method for formation of black matrix, method for production of color filter, and color filter
EP1777268A3 (de) Organische Pigmente für Farbfilter
EP2246739A4 (en) PHOTOSENSITIVE COLORED COMPOSITION, COLOR FILTER, AND PROCESS FOR PRODUCING THE SAME
TW201612630A (en) Photosensitive resin composition and color filter using the same
WO2013027936A3 (ko) 흑색 감광성 수지 조성물 및 이를 구비한 화상표시장치

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 201080038447.8

Country of ref document: CN

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 10794382

Country of ref document: EP

Kind code of ref document: A2

WWE Wipo information: entry into national phase

Ref document number: 2012517414

Country of ref document: JP

NENP Non-entry into the national phase

Ref country code: DE

WWE Wipo information: entry into national phase

Ref document number: 13381289

Country of ref document: US

122 Ep: pct application non-entry in european phase

Ref document number: 10794382

Country of ref document: EP

Kind code of ref document: A2