WO2011002247A3 - 300nm 이하의 초단파장 노광기를 이용한 고체 촬상 소자의 컬러 필터 제조용 착색 감광성 수지 조성물, 이를 이용한 컬러 필터 및 이를 포함하는 고체 촬상 소자 - Google Patents
300nm 이하의 초단파장 노광기를 이용한 고체 촬상 소자의 컬러 필터 제조용 착색 감광성 수지 조성물, 이를 이용한 컬러 필터 및 이를 포함하는 고체 촬상 소자 Download PDFInfo
- Publication number
- WO2011002247A3 WO2011002247A3 PCT/KR2010/004288 KR2010004288W WO2011002247A3 WO 2011002247 A3 WO2011002247 A3 WO 2011002247A3 KR 2010004288 W KR2010004288 W KR 2010004288W WO 2011002247 A3 WO2011002247 A3 WO 2011002247A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- color filter
- solid
- sensing device
- state image
- image sensing
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
- G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/201—Filters in the form of arrays
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
- Color Television Image Signal Generators (AREA)
Abstract
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2010800384478A CN102770809A (zh) | 2009-07-02 | 2010-07-01 | 用于制备利用300nm以下超短波长曝光器的固体摄像元件的彩色滤光片的着色感光性树脂组合物、利用其的彩色滤光片以及含有该彩色滤光片的固体摄像元件 |
US13/381,289 US8902522B2 (en) | 2009-07-02 | 2010-07-01 | Colored photosensitive resin composition for preparation of color filter of solid-state image sensing device using 300 nm or less ultrashort wave exposure equipment, color filter using same, and solid-state image sensing device containing same |
JP2012517414A JP2012532334A (ja) | 2009-07-02 | 2010-07-01 | 300nm以下の超短波長露光器を利用した固体撮像素子のカラーフィルター製造用着色感光性樹脂組成物、これを利用したカラーフィルターおよびこれを含む固体撮像素子 |
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2009-0060149 | 2009-07-02 | ||
KR1020090060149A KR20110002608A (ko) | 2009-07-02 | 2009-07-02 | 300nm 이하의 초단파장 노광기를 이용한 고체 촬상 소자의 컬러 필터 제조용 착색 감광성 수지 조성물, 이를 이용한 컬러 필터 및 이를 포함하는 고체 촬상 소자 |
KR10-2009-0060148 | 2009-07-02 | ||
KR1020090060148A KR20110002607A (ko) | 2009-07-02 | 2009-07-02 | 300nm 이하의 초단파장 노광기를 이용한 고체 촬상 소자의 컬러 필터 제조용 착색 감광성 수지 조성물, 이를 이용한 컬러 필터 및 이를 포함하는 고체 촬상 소자 |
KR1020090060147A KR20110002606A (ko) | 2009-07-02 | 2009-07-02 | 300nm 이하의 초단파장 노광기를 이용한 고체 촬상 소자의 컬러 필터 제조용 착색 감광성 수지 조성물, 이를 이용한 컬러 필터 및 이를 포함하는 고체 촬상 소자 |
KR10-2009-0060147 | 2009-07-02 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2011002247A2 WO2011002247A2 (ko) | 2011-01-06 |
WO2011002247A3 true WO2011002247A3 (ko) | 2011-04-14 |
Family
ID=43411620
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2010/004288 WO2011002247A2 (ko) | 2009-07-02 | 2010-07-01 | 300nm 이하의 초단파장 노광기를 이용한 고체 촬상 소자의 컬러 필터 제조용 착색 감광성 수지 조성물, 이를 이용한 컬러 필터 및 이를 포함하는 고체 촬상 소자 |
Country Status (4)
Country | Link |
---|---|
US (1) | US8902522B2 (ko) |
JP (1) | JP2012532334A (ko) |
CN (1) | CN102770809A (ko) |
WO (1) | WO2011002247A2 (ko) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5757925B2 (ja) * | 2011-08-31 | 2015-08-05 | 富士フイルム株式会社 | 着色組成物、並びに、これを用いたカラーフィルタの製造方法、カラーフィルタ、及び、固体撮像素子 |
JP2013117645A (ja) * | 2011-12-02 | 2013-06-13 | Toppan Printing Co Ltd | 固体撮像素子に用いられるカラーフィルタ用感光性着色組成物及びカラーフィルタ |
WO2014136667A1 (ja) * | 2013-03-06 | 2014-09-12 | 積水化学工業株式会社 | 液晶滴下工法用シール剤、上下導通材料、及び、液晶表示素子 |
JP6155772B2 (ja) * | 2013-04-02 | 2017-07-05 | 東洋インキScホールディングス株式会社 | 感光性着色組成物、着色膜及びカラーフィルタ |
KR20160075566A (ko) * | 2013-10-21 | 2016-06-29 | 닛산 가가쿠 고교 가부시키 가이샤 | 네가티브형 감광성 수지 조성물 |
JP6233271B2 (ja) * | 2013-12-27 | 2017-11-22 | Jsr株式会社 | 感光性樹脂組成物およびレジストパターンの製造方法 |
JP6392549B2 (ja) * | 2014-05-28 | 2018-09-19 | 株式会社タムラ製作所 | アルカリ可溶性樹脂組成物及びアルカリ可溶性樹脂組成物の硬化膜を有するプリント配線板 |
US20170176856A1 (en) | 2015-12-21 | 2017-06-22 | Az Electronic Materials (Luxembourg) S.A.R.L. | Negative-working photoresist compositions for laser ablation and use thereof |
KR102143261B1 (ko) * | 2016-04-01 | 2020-08-10 | 주식회사 엘지화학 | 잉크 조성물, 이로 제조된 경화 패턴, 이를 포함하는 발열체 및 이의 제조방법 |
JP6966546B2 (ja) | 2017-07-04 | 2021-11-17 | 富士フイルム株式会社 | デバイスの製造方法 |
WO2019065476A1 (ja) * | 2017-09-29 | 2019-04-04 | 富士フイルム株式会社 | 着色感光性組成物および光学フィルタの製造方法 |
CN115166888A (zh) * | 2017-09-29 | 2022-10-11 | 富士胶片株式会社 | 滤光器的制造方法 |
TWI787455B (zh) | 2018-02-16 | 2022-12-21 | 日商富士軟片股份有限公司 | 感光性組成物 |
WO2019159950A1 (ja) * | 2018-02-16 | 2019-08-22 | 富士フイルム株式会社 | 感光性組成物 |
TW201936648A (zh) * | 2018-02-28 | 2019-09-16 | 日商富士軟片股份有限公司 | 感光性組成物 |
WO2019172006A1 (ja) | 2018-03-05 | 2019-09-12 | 富士フイルム株式会社 | 感光性組成物 |
JPWO2019188653A1 (ja) | 2018-03-26 | 2021-02-18 | 富士フイルム株式会社 | 感光性組成物 |
JPWO2019188652A1 (ja) | 2018-03-26 | 2021-02-18 | 富士フイルム株式会社 | 感光性組成物 |
KR102612685B1 (ko) * | 2018-04-19 | 2023-12-12 | 후지필름 가부시키가이샤 | 패턴의 제조 방법, 광학 필터의 제조 방법, 고체 촬상 소자의 제조 방법, 화상 표시 장치의 제조 방법, 광경화성 조성물 및 막 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20070044062A (ko) * | 2004-08-18 | 2007-04-26 | 시바 스페셜티 케미칼스 홀딩 인크. | 옥심 에스테르 광개시제 |
KR20080088400A (ko) * | 2007-03-29 | 2008-10-02 | 도쿄 오카 고교 가부시키가이샤 | 착색 감광성 수지 조성물, 블랙 매트릭스, 컬러 필터, 및액정 표시 디스플레이 |
KR20090040232A (ko) * | 2007-10-19 | 2009-04-23 | 제이에스알 가부시끼가이샤 | 착색층 형성용 감방사선성 조성물, 컬러 필터 및 액정 표시소자 |
KR20090058458A (ko) * | 2007-12-04 | 2009-06-09 | 주식회사 엘지화학 | 알칼리 가용성 바인더 수지, 이의 제조방법 및 이를 포함하는 감광성 수지 조성물 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4238300B2 (ja) * | 2000-02-04 | 2009-03-18 | ペットリファインテクノロジー株式会社 | 高純度ビス−β−ヒドロキシエチルテレフタレートの製造方法 |
DE60141562D1 (de) * | 2000-11-08 | 2010-04-29 | Ricoh Kk | Elektrophotographischer Photorezeptor, Verfahren zur Herstellung des Photorezeptors, und bildformendes Verfahren sowie Apparat worin der Photorezeptor eingesetzt wird |
JP2007094310A (ja) * | 2005-09-30 | 2007-04-12 | Toppan Printing Co Ltd | プロキシミティー露光方法およびプロキシミティー露光装置 |
KR101116963B1 (ko) * | 2006-10-04 | 2012-03-14 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 고분자 화합물, 레지스트 재료, 및 패턴 형성 방법 |
JP5191241B2 (ja) * | 2007-01-12 | 2013-05-08 | 東洋インキScホールディングス株式会社 | 着色組成物およびカラーフィルタの製造方法 |
JP2010139692A (ja) | 2008-12-11 | 2010-06-24 | Toppan Printing Co Ltd | 感光性着色組成物、及びそれを用いるカラーフィルタ基板の製造方法 |
-
2010
- 2010-07-01 JP JP2012517414A patent/JP2012532334A/ja active Pending
- 2010-07-01 CN CN2010800384478A patent/CN102770809A/zh active Pending
- 2010-07-01 WO PCT/KR2010/004288 patent/WO2011002247A2/ko active Application Filing
- 2010-07-01 US US13/381,289 patent/US8902522B2/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20070044062A (ko) * | 2004-08-18 | 2007-04-26 | 시바 스페셜티 케미칼스 홀딩 인크. | 옥심 에스테르 광개시제 |
KR20080088400A (ko) * | 2007-03-29 | 2008-10-02 | 도쿄 오카 고교 가부시키가이샤 | 착색 감광성 수지 조성물, 블랙 매트릭스, 컬러 필터, 및액정 표시 디스플레이 |
KR20090040232A (ko) * | 2007-10-19 | 2009-04-23 | 제이에스알 가부시끼가이샤 | 착색층 형성용 감방사선성 조성물, 컬러 필터 및 액정 표시소자 |
KR20090058458A (ko) * | 2007-12-04 | 2009-06-09 | 주식회사 엘지화학 | 알칼리 가용성 바인더 수지, 이의 제조방법 및 이를 포함하는 감광성 수지 조성물 |
Also Published As
Publication number | Publication date |
---|---|
US8902522B2 (en) | 2014-12-02 |
CN102770809A (zh) | 2012-11-07 |
US20120099214A1 (en) | 2012-04-26 |
JP2012532334A (ja) | 2012-12-13 |
WO2011002247A2 (ko) | 2011-01-06 |
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