WO2010028884A3 - Verkapselung, mems sowie verfahren zum verkapseln - Google Patents

Verkapselung, mems sowie verfahren zum verkapseln Download PDF

Info

Publication number
WO2010028884A3
WO2010028884A3 PCT/EP2009/059009 EP2009059009W WO2010028884A3 WO 2010028884 A3 WO2010028884 A3 WO 2010028884A3 EP 2009059009 W EP2009059009 W EP 2009059009W WO 2010028884 A3 WO2010028884 A3 WO 2010028884A3
Authority
WO
WIPO (PCT)
Prior art keywords
encapsulation
mems
film
component structure
penetrated
Prior art date
Application number
PCT/EP2009/059009
Other languages
English (en)
French (fr)
Other versions
WO2010028884A2 (de
Inventor
Peter Rothacher
Original Assignee
Robert Bosch Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Robert Bosch Gmbh filed Critical Robert Bosch Gmbh
Priority to US13/063,722 priority Critical patent/US8680665B2/en
Priority to EP09780584A priority patent/EP2326592A2/de
Publication of WO2010028884A2 publication Critical patent/WO2010028884A2/de
Publication of WO2010028884A3 publication Critical patent/WO2010028884A3/de

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
    • B81B7/0032—Packages or encapsulation
    • B81B7/0035—Packages or encapsulation for maintaining a controlled atmosphere inside of the chamber containing the MEMS
    • B81B7/0041—Packages or encapsulation for maintaining a controlled atmosphere inside of the chamber containing the MEMS maintaining a controlled atmosphere with techniques not provided for in B81B7/0038
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/02—Bonding areas ; Manufacturing methods related thereto
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2207/00—Microstructural systems or auxiliary parts thereof
    • B81B2207/09—Packages
    • B81B2207/091—Arrangements for connecting external electrical signals to mechanical structures inside the package
    • B81B2207/094—Feed-through, via
    • B81B2207/095—Feed-through, via through the lid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2203/00—Forming microstructural systems
    • B81C2203/01—Packaging MEMS
    • B81C2203/0109—Bonding an individual cap on the substrate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2203/00—Forming microstructural systems
    • B81C2203/01—Packaging MEMS
    • B81C2203/0172—Seals
    • B81C2203/019—Seals characterised by the material or arrangement of seals between parts
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02—Bonding areas; Manufacturing methods related thereto
    • H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/0401—Bonding areas specifically adapted for bump connectors, e.g. under bump metallisation [UBM]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01—Chemical elements
    • H01L2924/01004—Beryllium [Be]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01—Chemical elements
    • H01L2924/01005—Boron [B]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01—Chemical elements
    • H01L2924/01006—Carbon [C]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01—Chemical elements
    • H01L2924/01013—Aluminum [Al]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01—Chemical elements
    • H01L2924/01014—Silicon [Si]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01—Chemical elements
    • H01L2924/01019—Potassium [K]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01—Chemical elements
    • H01L2924/01028—Nickel [Ni]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01—Chemical elements
    • H01L2924/01029—Copper [Cu]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01—Chemical elements
    • H01L2924/01033—Arsenic [As]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01—Chemical elements
    • H01L2924/0105—Tin [Sn]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01—Chemical elements
    • H01L2924/01079—Gold [Au]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/013—Alloys
    • H01L2924/014—Solder alloys
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10—Details of semiconductor or other solid state devices to be connected
    • H01L2924/146—Mixed devices
    • H01L2924/1461—MEMS

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Micromachines (AREA)
  • Pressure Sensors (AREA)
  • Measuring Fluid Pressure (AREA)

Abstract

Die Erfindung betrifft eine Verkapselung (4) einer empfindlichen mechanischen Bauelementstruktur (3) auf einem Halbleitersubstrat (2) mit einer die Bauelementstruktur (3) überdeckenden Folie (5), die mindestens eine Polymerschicht (8) aufweist, wobei zwischen der Bauelementstruktur (3) und der Folie (5) mindestens eine Kavität (7) ausgebildet ist. Erfindungsgemäß ist vorgesehen, dass die Folie (5) von mindestens einem Durchkontakt (15) durchsetzt ist.
PCT/EP2009/059009 2008-09-15 2009-07-15 Verkapselung, mems sowie verfahren zum verkapseln WO2010028884A2 (de)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US13/063,722 US8680665B2 (en) 2008-09-15 2009-07-15 Encapsulation, MEMS and encapsulation method
EP09780584A EP2326592A2 (de) 2008-09-15 2009-07-15 Verkapselung, mems sowie verfahren zum verkapseln

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102008042106.5 2008-09-15
DE102008042106A DE102008042106A1 (de) 2008-09-15 2008-09-15 Verkapselung, MEMS sowie Verfahren zum Verkapseln

Publications (2)

Publication Number Publication Date
WO2010028884A2 WO2010028884A2 (de) 2010-03-18
WO2010028884A3 true WO2010028884A3 (de) 2010-12-23

Family

ID=41667652

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2009/059009 WO2010028884A2 (de) 2008-09-15 2009-07-15 Verkapselung, mems sowie verfahren zum verkapseln

Country Status (5)

Country Link
US (1) US8680665B2 (de)
EP (1) EP2326592A2 (de)
DE (1) DE102008042106A1 (de)
TW (1) TW201018640A (de)
WO (1) WO2010028884A2 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008054415A1 (de) * 2008-12-09 2010-06-10 Robert Bosch Gmbh Anordnung zweier Substrate mit einer SLID-Bondverbindung und Verfahren zur Herstellung einer solchen Anordnung
DE102010040370B4 (de) * 2010-09-08 2016-10-06 Robert Bosch Gmbh MEMS-Mikrofon-Package
US9365416B2 (en) 2011-08-15 2016-06-14 Taiwan Semiconductor Manufacturing Company, Ltd. Structure and method for motion sensor
DE102011112476A1 (de) * 2011-09-05 2013-03-07 Epcos Ag Bauelement und Verfahren zum Herstellen eines Bauelements
DE102011119610A1 (de) * 2011-11-29 2013-05-29 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Herstellung strukturierter optischer Komponenten
US8853801B2 (en) 2012-04-19 2014-10-07 Taiwan Semiconductor Manufacturing Company, Ltd. MEMS devices and methods of forming the same
US8736045B1 (en) * 2012-11-02 2014-05-27 Raytheon Company Integrated bondline spacers for wafer level packaged circuit devices
DE102012111001A1 (de) * 2012-11-15 2014-05-15 Endress + Hauser Gmbh + Co. Kg Dichtring und Druckmessaufnehmer mit mindestens einem solchen Dichtring
DE102012224424A1 (de) * 2012-12-27 2014-07-17 Robert Bosch Gmbh Sensorsystem und Abdeckvorrichtung für ein Sensorsystem
DE102016112200A1 (de) * 2016-07-04 2018-01-04 Endress+Hauser Gmbh+Co. Kg Druckaufnehmer
DE102016112198A1 (de) * 2016-07-04 2018-01-04 Endress+Hauser Gmbh+Co. Kg Druckaufnehmer
CN113443602B (zh) * 2021-06-02 2023-12-08 中国科学院地质与地球物理研究所 微机电系统芯片晶圆级封装结构及其制造工艺

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1995030276A1 (de) * 1994-05-02 1995-11-09 Siemens Matsushita Components Gmbh & Co. Kg Verkapselung für elektronische bauelemente
WO2003085729A1 (en) * 2002-04-11 2003-10-16 Koninklijke Philips Electronics N.V. Method of manufacturing an electronic device
DE102006031047A1 (de) * 2005-07-06 2007-01-18 Denso Corp., Kariya Halbleitersensor und Herstellungsverfahren dafür

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10006446A1 (de) 2000-02-14 2001-08-23 Epcos Ag Verkapselung für ein elektrisches Bauelement und Verfahren zur Herstellung
JP2002222811A (ja) 2001-01-24 2002-08-09 Seiko Epson Corp 半導体装置およびその製造方法
US20020121702A1 (en) * 2001-03-01 2002-09-05 Siemens Dematic Electronics Assembly Systems, Inc. Method and structure of in-situ wafer scale polymer stud grid array contact formation
DE102008040775A1 (de) * 2008-07-28 2010-02-04 Robert Bosch Gmbh Verkapselung, MEMS sowie Verfahren zum selektiven Verkapseln

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1995030276A1 (de) * 1994-05-02 1995-11-09 Siemens Matsushita Components Gmbh & Co. Kg Verkapselung für elektronische bauelemente
WO2003085729A1 (en) * 2002-04-11 2003-10-16 Koninklijke Philips Electronics N.V. Method of manufacturing an electronic device
DE102006031047A1 (de) * 2005-07-06 2007-01-18 Denso Corp., Kariya Halbleitersensor und Herstellungsverfahren dafür

Also Published As

Publication number Publication date
WO2010028884A2 (de) 2010-03-18
US20110180887A1 (en) 2011-07-28
TW201018640A (en) 2010-05-16
US8680665B2 (en) 2014-03-25
DE102008042106A1 (de) 2010-03-18
EP2326592A2 (de) 2011-06-01

Similar Documents

Publication Publication Date Title
WO2010028884A3 (de) Verkapselung, mems sowie verfahren zum verkapseln
WO2010012548A3 (de) Verkapselung, mems sowie verfahren zum selektiven verkapseln
WO2009092361A3 (de) Mems-bauelement, verfahren zur herstellung eines mems-bauelements und verfahren zur handhabung eines mems-bauelements
WO2009071595A3 (fr) Dispositif a circuit integre et n/mems encapsule et procede de realisation
WO2009042028A3 (en) Lanthanide dielectric with controlled interfaces
WO2009086289A3 (en) Solar cell package for solar concentrator
WO2010009716A3 (de) Strahlungsemittierende vorrichtung und verfahren zur herstellung einer strahlungsemittierenden vorrichtung
WO2009142391A3 (ko) 발광소자 패키지 및 그 제조방법
WO2007145778A3 (en) Mems device and method of fabricating the same
WO2011037938A3 (en) A method for encapsulation of organic electronic devices
WO2008087022A8 (de) Gehäuse für in mobilen anwendungen eingesetzte mikromechanische und mikrooptische bauelemente
WO2012057517A3 (ko) 화합물 반도체 장치 및 화합물 반도체 제조방법
WO2010016975A3 (en) Method of passivating and encapsulating cdte and czt segmented detectors
WO2011082241A3 (en) Microelectromechanical system having movable element integrated into leadframe-based package
WO2013003784A3 (en) Process for a sealed mems device with a portion exposed to the environment
TW201613820A (en) CMOS-MEMS integrated device including multiple cavities at different controlled pressures and methods of manufacture
WO2007011511A3 (en) Die package with asymmetric leadframe connection
WO2011004198A3 (en) Patterning
WO2009049958A3 (de) Verbund aus mindestens zwei halbleitersubstraten sowie herstellungsverfahren
WO2006128028A3 (en) Wafer-level, polymer-based encapsulation for microstructure devices
WO2009092794A3 (fr) Objet muni d'un element graphique reporte sur un support et procede de realisation d'un tel objet
TW200709360A (en) Semiconductor die package and method for making the same
WO2006115592A8 (en) Anti-stiction technique for electromechanical systems and electromechanical device employing same
WO2007055924A3 (en) Wafer level packaging process
TW200704582A (en) Semiconductor composite device and method of manufacturing the same

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 09780584

Country of ref document: EP

Kind code of ref document: A2

WWE Wipo information: entry into national phase

Ref document number: 2009780584

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 13063722

Country of ref document: US