WO2010013921A3 - 중에너지 이온빔 산란을 이용한 분광분석기 - Google Patents

중에너지 이온빔 산란을 이용한 분광분석기 Download PDF

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Publication number
WO2010013921A3
WO2010013921A3 PCT/KR2009/004177 KR2009004177W WO2010013921A3 WO 2010013921 A3 WO2010013921 A3 WO 2010013921A3 KR 2009004177 W KR2009004177 W KR 2009004177W WO 2010013921 A3 WO2010013921 A3 WO 2010013921A3
Authority
WO
WIPO (PCT)
Prior art keywords
spectrophotometer
ion
ion beam
medium energy
energy ion
Prior art date
Application number
PCT/KR2009/004177
Other languages
English (en)
French (fr)
Other versions
WO2010013921A2 (ko
Inventor
문대원
김주황
이연진
유규상
김완섭
Original Assignee
케이맥(주)
한국표준과학연구원
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 케이맥(주), 한국표준과학연구원 filed Critical 케이맥(주)
Priority to JP2011521020A priority Critical patent/JP5713403B2/ja
Priority to US13/056,427 priority patent/US8395117B2/en
Publication of WO2010013921A2 publication Critical patent/WO2010013921A2/ko
Publication of WO2010013921A3 publication Critical patent/WO2010013921A3/ko

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/08—Deviation, concentration or focusing of the beam by electric or magnetic means
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • G21K5/04—Irradiation devices with beam-forming means
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • G21K5/10—Irradiation devices with provision for relative movement of beam source and object to be irradiated

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Electron Tubes For Measurement (AREA)

Abstract

본 발명은 중에너지 이온빔 산란을 이용한 분광분석기에 관한 것으로서, 본 발명은 이온을 발생시키는 이온원(10); 이온을 평행빔으로 발생시키는 콜리메이터(collimator)(20); 평행빔을 가속화시키는 가속기(30); 가속된 이온빔을 펄스화하는 이온빔 펄스발생기(40); 펄스된 이온빔을 시편(1)으로 집속시키는 집속대물렌즈(50); 집속된 이온빔이 시편(1)으로부터 산란된 이온빔 펄스의 분광신호를 검출하는 검출기(60); 상기 검출기(60)에 의해 검출된 분광신호를 분석 처리하는 데이터 분석기(70); 를 포함하여 이루어지는 것을 특징으로 한다.
PCT/KR2009/004177 2008-07-31 2009-07-28 중에너지 이온빔 산란을 이용한 분광분석기 WO2010013921A2 (ko)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2011521020A JP5713403B2 (ja) 2008-07-31 2009-07-28 中エネルギーイオンビーム散乱を用いた分光分析器
US13/056,427 US8395117B2 (en) 2008-07-31 2009-07-28 Spectrophotometer using medium energy ion

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2008-0075139 2008-07-31
KR1020080075139A KR101052361B1 (ko) 2008-07-31 2008-07-31 중에너지 이온빔 산란을 이용한 분광분석기

Publications (2)

Publication Number Publication Date
WO2010013921A2 WO2010013921A2 (ko) 2010-02-04
WO2010013921A3 true WO2010013921A3 (ko) 2010-05-06

Family

ID=41610831

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2009/004177 WO2010013921A2 (ko) 2008-07-31 2009-07-28 중에너지 이온빔 산란을 이용한 분광분석기

Country Status (4)

Country Link
US (1) US8395117B2 (ko)
JP (1) JP5713403B2 (ko)
KR (1) KR101052361B1 (ko)
WO (1) WO2010013921A2 (ko)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63102150A (ja) * 1986-10-17 1988-05-07 Rikagaku Kenkyusho イオン散乱分光顕微鏡
KR960000808B1 (ko) * 1992-06-22 1996-01-12 삼성전자주식회사 이차 이온 질량분석기
JPH10282024A (ja) * 1997-04-09 1998-10-23 Hitachi Ltd レーザイオン化中性粒子質量分析装置および分析方法
KR20000029046A (ko) * 1998-10-14 2000-05-25 가네꼬 히사시 시료전류 스펙트로스코피 표면측정을 위한 방법 및 장치
KR20080070619A (ko) * 2005-07-08 2008-07-30 넥스젠 세미 홀딩 인코포레이티드 제어 입자 빔 제조를 위한 장치 및 방법

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63102151A (ja) * 1986-10-17 1988-05-07 Rikagaku Kenkyusho 飛行時間測定型の同軸型材料表面解析装置
JPS63208049A (ja) * 1987-02-24 1988-08-29 Nec Corp 半導体製造用マスクの製造方法およびその装置
DE69026751T2 (de) * 1989-05-17 1996-11-14 Kobe Steel Ltd Ionenbündelfokussierungsvorrichtung
JPH05264485A (ja) * 1992-03-17 1993-10-12 Nippon Telegr & Teleph Corp <Ntt> 表面原子配列観察法
JPH08329883A (ja) * 1995-05-31 1996-12-13 Rikagaku Kenkyusho 飛行時間分析方法及び装置
JP2001141673A (ja) * 1999-11-16 2001-05-25 Canon Inc 時間分解型表面分析装置
US6699630B2 (en) * 2000-07-07 2004-03-02 Nikon Corporation Method and apparatus for exposure, and device manufacturing method
US6686595B2 (en) * 2002-06-26 2004-02-03 Semequip Inc. Electron impact ion source
JP2007178341A (ja) * 2005-12-28 2007-07-12 Institute Of Physical & Chemical Research イオン散乱分光分析装置
DE102006015714B4 (de) * 2006-04-04 2019-09-05 Applied Materials Gmbh Lichtunterstütztes Testen eines optoelektronischen Moduls
WO2008140585A1 (en) * 2006-11-22 2008-11-20 Nexgen Semi Holding, Inc. Apparatus and method for conformal mask manufacturing
US8143603B2 (en) * 2008-02-28 2012-03-27 Ricoh Company, Ltd. Electrostatic latent image measuring device
US8026492B2 (en) * 2008-11-04 2011-09-27 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Dual mode gas field ion source

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63102150A (ja) * 1986-10-17 1988-05-07 Rikagaku Kenkyusho イオン散乱分光顕微鏡
KR960000808B1 (ko) * 1992-06-22 1996-01-12 삼성전자주식회사 이차 이온 질량분석기
JPH10282024A (ja) * 1997-04-09 1998-10-23 Hitachi Ltd レーザイオン化中性粒子質量分析装置および分析方法
KR20000029046A (ko) * 1998-10-14 2000-05-25 가네꼬 히사시 시료전류 스펙트로스코피 표면측정을 위한 방법 및 장치
KR20080070619A (ko) * 2005-07-08 2008-07-30 넥스젠 세미 홀딩 인코포레이티드 제어 입자 빔 제조를 위한 장치 및 방법

Also Published As

Publication number Publication date
US8395117B2 (en) 2013-03-12
WO2010013921A2 (ko) 2010-02-04
KR101052361B1 (ko) 2011-07-27
US20110133081A1 (en) 2011-06-09
KR20100013562A (ko) 2010-02-10
JP5713403B2 (ja) 2015-05-07
JP2011529622A (ja) 2011-12-08

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