WO2009148878A2 - Method of forming functionalized silanes - Google Patents
Method of forming functionalized silanes Download PDFInfo
- Publication number
- WO2009148878A2 WO2009148878A2 PCT/US2009/045132 US2009045132W WO2009148878A2 WO 2009148878 A2 WO2009148878 A2 WO 2009148878A2 US 2009045132 W US2009045132 W US 2009045132W WO 2009148878 A2 WO2009148878 A2 WO 2009148878A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- silane
- integer
- doped
- formula
- doped silane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/50—Organo-phosphines
- C07F9/5004—Acyclic saturated phosphines
- C07F9/5009—Acyclic saturated phosphines substituted by B, Si, P or a metal
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/04—Hydrides of silicon
Definitions
- the present application is directed to heteroatom doped silane compounds and methods of producing such compounds.
- the methods commonly includes reacting a halogen substituted silane with a nucleophilic reagent to form a doped silane with a Si-E bond, where "E” may be selected from Group 13, Group 14, Group 15 and/or Group 16 elements.
- the doped silane is desirably a liquid under ambient temperature and pressure conditions (e.g., under 1 atmosphere pressure at 298 0 C).
- the halogen substituted silane may be formed by reacting a cyclic or acyclic silane with a halogenating reagent.
- the halogen substituted silane may be formed by reacting an aryl substituted (e.g., phenyl substituted) cyclic or acyclic silane with a hydrogen halide in the presence of a Lewis acid catalyst, such as AICI 3 .
- a Lewis acid catalyst such as AICI 3
- Monohalogen substituted cyclic silanes such as monochlorocyclopentasilane, monochlorocyclohexasilane, monobromocyclopentasilane and monobromocyclohexasilane, may be particularly desirable as intermediates for use in producing the present doped silane compounds.
- the present heteroatom doped silane compounds may have the formula:
- Examples of the present heteroatom doped silane compounds include cyclic silane compounds having the formula:
- n is an integer greater than 2 (commonly 3 to 10); m is 2n - 2 or 2n; and y is an integer from 1 to n.
- heteroatom doped silane compounds include acyclic silane compounds (e.g., branched and/or linear silanes), which are desirably a liquid under ambient temperature and pressure, having the formula:
- n H m -y(PH2)y wherein n is an integer greater than 2; m is 2n + 2; and y is an integer from 1 to n.
- Suitable synthetic intermediates which may be used to produce such heteroatom doped silane compounds include halogen substituted cyclic silane compounds having the formula: wherein n is an integer greater than 2 (commonly about 3 to 10); m is an integer from 2n - 2 to 2n; y is 1 or 2; and each X independently represents a halogen atom.
- the present heteroatom doped silane compounds may be prepared by reacting a mixture comprising:
- a solvent e.g., an ether solvent such as glyme, diglyme or the like.
- the halogenated silane may be reacted with a nucleophile of the formula:
- Suitable examples of such nucleophiles include NaPH 2 , LiPH 2 , NaAl(PH 2 ) 4 and LiAl(PH 2 ) 4 .
- the present application provides a method of producing a halogenated cyclic silane of the formula: wherein n is an integer greater than 2 (commonly about 3 to 10); m is 2n - 2 or 2n; y is 1 or 2; and each X independently represents a halogen atom.
- the method includes reacting a cyclic silane (e.g., either a monocyclic or bicyclic) with a halogenating agent to provide a halo-silane having a formula: Slnrim-y ⁇ X-y wherein n is an integer greater than 2 (commonly about 3 to 10; m is an integer from 2n - 2 to 2n; y is 1 or 2; and each X independently represents a halogen atom.
- suitable halogenating agents include AgCl, HgCl 2 , HgBr 2 , N-chlorosuccinimide (“NCS"), N-bromosuccinimide (“NBS”), SnCl 4 and iodine (I 2 ).
- heteroatom doped silane compounds may be prepared by reacting a mixture comprising: with other phosphorus-containing nucleophiles.
- halogenated silanes may be reacted with phosphorus-containing nucleophiles of the formula:
- M*PHSiH 3 where M* is an alkali metal (e.g., Li) to provide a heteroatom doped silane having a formula:
- heteroatom doped silane compounds may be prepared by reacting a mixture comprising: with phosphorus-containing nucleophiles of the formula:
- M*P(SiH 3 ) 2 where M* is an alkali metal (e.g., Li) to provide a heteroatom doped silane having a formula:
- Figure 1 depicts a GC-MS of the product solution produced according to the procedure described in Example 1.
- Figure 2 depicts GC-MS of the product solution produced according to the procedure described in Example 2.
- Figure 3 depicts GC-MS of the product solution produced according to the procedure described in Example 2 displaying Si-P bond formation.
- the present heteroatom doped silane compounds may be produced by reacting a halogen substituted silane with a nucleophilic reagent to form the doped silane.
- a halogenated silane may be reacted with a phosphorus-containing nucleophile to form a compound which includes a Si-P bond.
- the resulting product, a phosphorus doped silane is desirably a liquid under ambient temperature and pressure (e.g., under 1 atmosphere pressure at 298°C).
- the halogen substituted silane may be formed by reacting a cyclic or acyclic silane with a halogenating reagent.
- the starting materials, reaction conditions and/or stoichiometry may be controlled such that the reaction product is predominantly a silane substituted with only one or two halogen atoms.
- the halogenation reaction is typically carried out in the presence of a solvent, e.g., a chlorinated hydrocarbon solvent such as methylene chloride, chloroform, carbon tetrachloride and/or dichloroethane.
- the halogen substituted silane may be formed by dissolving a silane compound, e.g., a cyclic silane such as cyclotrisilane, cyclopentasilane or cyclohexasilane, in a chlorinated solvent (e.g., methylene chloride) and stirring the solution of silane with an inorganic halogenating reagent, such as AgCl, HgCl 2 , HgBr 2 , BCI 3 , or SnCl 4 . In such cases, an excess of the halogenating reagent may be used. After stirring the reaction mixture for a period of several hours, a mixture containing mono- and dihalogenated silane is typically obtained.
- a silane compound e.g., a cyclic silane such as cyclotrisilane, cyclopentasilane or cyclohexasilane
- a chlorinated solvent e.g., methylene chloride
- a silane compound e.g., a cyclic silane such as cyclotrisilane, cyclopentasilane or cyclohexasilane
- a chlorinated solvent e.g., methylene chloride or carbon tetrachloride
- NCS N- chlorosuccinimide
- NBS N-bromosuccinimide
- NBS or NCS are added to the solution for each mole of silane.
- dihalogenated silanes are the desired products
- two moles of NBS or NCS are added to the solution for each mole of silane.
- Suitable halogenated silane intermediates include: cyclotrisilane having 1 or 2 halogen atoms attached thereto; cyclopentasilane having 1 or 2 halogen atoms attached thereto; cyclohexasilane having 1 or 2 halogen atoms attached thereto; silylcyclopentasilane having 1 or 2 halogen atoms attached thereto; silylcyclohexasilane having 1 or 2 halogen atoms attached thereto; and spiro[4.4]nonasilane having 1 or 2 halogen atoms attached thereto.
- Halogenated silane compounds, which may be used to produce the present heteroatom doped silane compounds may be produced by reacting a halogenating reagent with a corresponding silane precursor.
- suitable halogenating reagents include:
- N-chlorosuccinimide N-chlorosuccinimide
- N-bromosuccinimide (“NBS").
- Suitable phosphorus-containing nucleophiles which may be used to produce the present heteroatom doped silane compounds include:
- LiHPSiH 3 LiP(SiH 3 ) 2 and LiAl(PHSiH 3 ) 4 .
- CH 2 Cl 2 methylene chloride
- NaAl(PH 2 ) 4 was synthesized by reacting 50.4 mg OfNaPH 2 (0.90 mmol, 1.00 eq) suspended in 2 mL of diethylene glycol dimethyl ether (diglyme) with 30.8 mg OfAlCl 3 (0.231 mmol, 3.90 eq) dissolved in 1 mL which resulted in the formation of a cloudy white slurry. This white precipitate is consistent with the formation of sodium chloride, NaCl.
- the AlCl 3 was quantitatively transferred by washing the vial with 3 x 1 mL of diglyme resulting in a 6 mL mixture that was allowed to stir overnight.
- One embodiment provides a method of preparing a doped silane which includes reacting a mixture comprising:
- MPH2 include:
- the method may include reacting Si n H 2n-y X y with
- a heteroatom doped silane compound may be formed by reacting a mixture, which includes:
- a heteroatom doped silane compound may be formed by reacting a mixture, which includes:
- Suitable examples of the present heteroatom doped silane compounds include doped silanes having a formula:
- the present heteroatom doped silane compounds may desirably include compounds having one or more of the following formulas:
- heteroatom doped silane compounds include doped cyclic silanes having a formula:
- n H m -y(PH2)y wherein n is an integer from 3 to 10; m is 2n - 2 or 2n; and y is an integer from 1 to n.
- n is an integer from 3 to 10; m is 2n - 2 or 2n; and y is an integer from 1 to n.
- Other examples of the present heteroatom doped silane compounds include doped silanes having a formula:
- heteroatom doped silane compounds include doped silanes having a formula:
- n is an integer greater than 2 (typically 3 to 10); m is an integer from 2n - 2 to 2n +
- y is an integer from 1 to n (and often desirably 1 or 2).
- Certain embodiments provide halogen substituted cyclic silanes having the formula:
- n is an integer greater than 2 (commonly 3 to 10); m is 2n or 2n - 2; y is 1 or 2; and each X independently represents a halogen atom.
- Suitable examples include: such halogen substituted cyclic silanes wherein n is 3; m is 6; y is 1; and X is a chlorine atom; such halogen substituted cyclic silanes wherein n is 5; m is 10; y is 1; and X is a chlorine atom; such halogen substituted cyclic silanes wherein n is 6; m is 12; y is 1; and X is a chlorine atom; or such halogen substituted cyclic silanes wherein n is 7; m is 14; y is 1; and X is a chlorine atom.
- halogen substituted cyclic silanes include: such halogen substituted cyclic silanes wherein n is 3; m is 6; y is 1; and X is a bromine atom; such halogen substituted cyclic silanes wherein n is 5; m is 10; y is 1; and X is a bromine atom; such halogen substituted cyclic silanes wherein n is 6; m is 12; y is 1; and X is a bromine atom; or such halogen substituted cyclic silanes wherein n is 7; m is 14; y is 1; and X is a bromine atom.
- Suitable halogen substituted cyclic silanes include: chlorocyclopentasilane and/or dichlorocyclopentasilane; chlorocyclohexasilane and/or dichlorocyclohexasilane; monochloro- and/or dichloro- derivatives of silylcyclohexasilane; monochloro- and/or dichloro- derivatives of silylcyclopentasilane; monochloro- and/or dichloro- derivative of spiro[4.4]nonasilane; silylcyclopentasilane having 1 and/or 2 chlorine substituents; spiro[4.4]nonasilane having 1 and/or 2 chlorine substituents; silylcyclohexasilane having 1 and/or 2 chlorine substituents; cyclohexasilane having 1 and/or 2 chlorine substituents; cyclopentasilane having 1 and/or 2 chlorine substituents;
- Suitable halogen substituted cyclic silanes include: bromocyclopentasilane and/or dibromocyclopentasilane; bromocyclohexasilane and/or dibromocyclohexasilane; monobromo- and/or dibromo- derivatives of silylcyclohexasilane; monobromo- and/or dibromo- derivatives of silylcyclopentasilane; monobromo- and/or dibromo- derivative of spiro[4.4]nonasilane; silylcyclopentasilane having 1 and/or 2 bromine substituents; spiro[4.4]nonasilane having 1 and/or 2 bromine substituents; silylcyclohexasilane having 1 and/or 2 bromine substituents; cyclohexasilane having 1 and/or 2 bromine substituents; cyclopentasilane having 1 and/
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Silicon Compounds (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011511749A JP5519649B2 (ja) | 2008-05-29 | 2009-05-26 | 官能化されたシランの形成法 |
| US12/993,239 US8609799B2 (en) | 2008-05-29 | 2009-05-26 | Method of forming functionalized silanes |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13027108P | 2008-05-29 | 2008-05-29 | |
| US61/130,271 | 2008-05-29 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| WO2009148878A2 true WO2009148878A2 (en) | 2009-12-10 |
| WO2009148878A3 WO2009148878A3 (en) | 2010-04-15 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/US2009/045132 Ceased WO2009148878A2 (en) | 2008-05-29 | 2009-05-26 | Method of forming functionalized silanes |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US8609799B2 (enExample) |
| JP (1) | JP5519649B2 (enExample) |
| WO (1) | WO2009148878A2 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102013021306A1 (de) | 2013-12-19 | 2015-06-25 | Johann Wolfgang Goethe-Universität | Verfahren zum Herstellen von linearen, cyclischen und/oder käfigartigen perhalogenierten Oligo- und Polysilyl-Anionen |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102010040231A1 (de) * | 2010-09-03 | 2012-03-08 | Evonik Degussa Gmbh | p-Dotierte Siliciumschichten |
| WO2012050869A1 (en) * | 2010-09-28 | 2012-04-19 | Ndsu Research Foundation | Atmospheric-pressure plasma-enhanced chemical vapor deposition |
| JP2016519640A (ja) * | 2013-03-15 | 2016-07-07 | エヌディーエスユー リサーチ ファウンデーション | 液体シランおよびヘテロ原子添加物を処理により形成されるシリコン材料 |
| JP7055674B2 (ja) * | 2018-03-15 | 2022-04-18 | 株式会社日本触媒 | ポリシラン組成物、及びヘテロ元素導入ポリシラン組成物の製造方法 |
| US11649560B2 (en) | 2019-06-20 | 2023-05-16 | Applied Materials, Inc. | Method for forming silicon-phosphorous materials |
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| US4447633A (en) * | 1983-06-14 | 1984-05-08 | North Dakota State University | Ultrasonically promoted hydrosilations |
| JPS6060915A (ja) * | 1983-09-12 | 1985-04-08 | Tokuyama Soda Co Ltd | 低ハロゲン化シランまたはモノシランの製造方法 |
| JPS6060916A (ja) * | 1983-09-14 | 1985-04-08 | Tokuyama Soda Co Ltd | 低ハロゲン化シランまたはモノシランの製造方法 |
| US4683147A (en) * | 1984-04-16 | 1987-07-28 | Canon Kabushiki Kaisha | Method of forming deposition film |
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| US4910153A (en) * | 1986-02-18 | 1990-03-20 | Solarex Corporation | Deposition feedstock and dopant materials useful in the fabrication of hydrogenated amorphous silicon alloys for photovoltaic devices and other semiconductor devices |
| JPS62232116A (ja) * | 1986-04-01 | 1987-10-12 | Hitachi Metals Ltd | 水素化アモルフアスシリコン及びその製造方法 |
| US4841083A (en) * | 1987-06-03 | 1989-06-20 | Mitsui Toatsu Chemicals, Incorporated | Ladder polysilanes |
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| US5942637A (en) * | 1998-03-30 | 1999-08-24 | North Dakota State University Research Foundation | Compounds containing tetradecachlorocyclohexasilane dianion |
| KR20010052441A (ko) * | 1999-03-30 | 2001-06-25 | 마쯔모또 에이찌 | 코팅 조성물 |
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| DE60041569D1 (de) * | 1999-03-30 | 2009-04-02 | Seiko Epson Corp | Herstellungsverfahren für eine solarzelle |
| TWI281921B (en) * | 2000-03-13 | 2007-06-01 | Jsr Corp | Novel cyclosilane compound, and solution composition and process for forming a silicon film |
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| US7674926B1 (en) | 2004-10-01 | 2010-03-09 | Kovio, Inc. | Dopant group-substituted semiconductor precursor compounds, compositions containing the same, and methods of making such compounds and compositions |
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2009
- 2009-05-26 WO PCT/US2009/045132 patent/WO2009148878A2/en not_active Ceased
- 2009-05-26 US US12/993,239 patent/US8609799B2/en active Active
- 2009-05-26 JP JP2011511749A patent/JP5519649B2/ja not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102013021306A1 (de) | 2013-12-19 | 2015-06-25 | Johann Wolfgang Goethe-Universität | Verfahren zum Herstellen von linearen, cyclischen und/oder käfigartigen perhalogenierten Oligo- und Polysilyl-Anionen |
| WO2015090277A1 (de) | 2013-12-19 | 2015-06-25 | Johann Wolfgang Goethe-Universität | Verfahren zum herstellen von linearen, cyclischen und/oder käfigartigen perhalogenierten oligo- und polysilyl-anionen |
Also Published As
| Publication number | Publication date |
|---|---|
| US20110108777A1 (en) | 2011-05-12 |
| JP5519649B2 (ja) | 2014-06-11 |
| JP2011521953A (ja) | 2011-07-28 |
| US8609799B2 (en) | 2013-12-17 |
| WO2009148878A3 (en) | 2010-04-15 |
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