WO2009128138A1 - Appareil d'analyse de gaz avec pile à gaz d'étalonnage incorporée - Google Patents

Appareil d'analyse de gaz avec pile à gaz d'étalonnage incorporée Download PDF

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Publication number
WO2009128138A1
WO2009128138A1 PCT/JP2008/057320 JP2008057320W WO2009128138A1 WO 2009128138 A1 WO2009128138 A1 WO 2009128138A1 JP 2008057320 W JP2008057320 W JP 2008057320W WO 2009128138 A1 WO2009128138 A1 WO 2009128138A1
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WIPO (PCT)
Prior art keywords
wavelength
calibration
laser light
gas cell
light source
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Application number
PCT/JP2008/057320
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English (en)
Japanese (ja)
Inventor
直樹 松田
直司 森谷
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株式会社島津製作所
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Application filed by 株式会社島津製作所 filed Critical 株式会社島津製作所
Priority to PCT/JP2008/057320 priority Critical patent/WO2009128138A1/fr
Priority to JP2010508053A priority patent/JP5360053B2/ja
Priority to CN200880128659.8A priority patent/CN102007397B/zh
Publication of WO2009128138A1 publication Critical patent/WO2009128138A1/fr

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/39—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using tunable lasers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/27—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands using photo-electric detection ; circuits for computing concentration
    • G01N21/274—Calibration, base line adjustment, drift correction
    • G01N21/276—Calibration, base line adjustment, drift correction with alternation of sample and standard in optical path
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/39—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using tunable lasers
    • G01N2021/396—Type of laser source
    • G01N2021/399—Diode laser
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/12—Circuits of general importance; Signal processing
    • G01N2201/128—Alternating sample and standard or reference part in one path
    • G01N2201/1285—Standard cuvette

Definitions

  • the present invention relates to a gas analyzer using laser absorption spectroscopy.
  • a calibration gas is introduced into the measurement gas cell, and sensitivity calibration is performed from the output.
  • another optical system, a calibration gas cell, and a photodetector are always provided, and a calibration value is obtained by separating a part of the laser beam as measurement light by a half mirror and guiding it to the calibration gas cell.
  • An analyzer that always has a calibration gas cell has the advantage that the calibration value can always be monitored.
  • the S / N (signal-to-noise) ratio in the measurement photodetector decreases.
  • the measurement photodetector that detects the light that has passed through the measurement gas cell it has a monitor photodetector, which increases the need to adjust characteristics such as sensitivity and linearity between the two photodetectors. Also, the apparatus becomes complicated.
  • An object of the present invention is to eliminate the need to introduce a calibration gas into a measurement gas cell and eliminate the need to provide an extra photodetector in an analyzer for laser absorption spectroscopy measurement.
  • the calibration gas cell in order to solve these problems, can be inserted into the optical path only when necessary.
  • the analyzer of the present invention includes a laser light source that generates laser light as measurement light having a specific wavelength absorbed by a measurement target component in a sample gas, a laser light source drive control device that controls driving of the laser light source, A photodetector arranged at a position for receiving the laser beam; a gas cell for measuring a sample gas arranged on the optical path of the laser beam from the laser light source to the photodetector; and at least one in which a calibration gas is enclosed Calibration gas cell, calibration gas cell mounting mechanism capable of detachably placing one of the calibration gas cells on the optical path of the laser beam, and a measurement target in the sample gas based on the detection signal of the photodetector And an arithmetic unit for calculating the component concentration.
  • the wave number is used instead of the wavelength when specifically indicating the wavelength. Since the wave number corresponds to the wavelength, “wavelength” is used as a concept including “wave number” in the present invention.
  • the calibration gas cell is detachably inserted into the optical path used for gas measurement, it is not necessary to add new parts to the optical system. Further, since the laser beam for measurement is not separated by the half mirror, the light amount of the laser beam can be maintained. Furthermore, since calibration is performed using a photo detector for measurement, highly accurate calibration can be realized.
  • the gas cell for calibration can be manufactured with various specifications by changing parameters such as gas type, concentration, pressure, etc., and it is a means to realize more advanced calibration.
  • a laser light source it can be a laser diode that generates only light of a single wavelength, but as a means for expanding the measurement object, making the analysis object versatile, or improving the S / N ratio, A laser light source capable of changing the wavelength can be used.
  • a laser light source it is common to use a DFB laser (Distributed FeedBack ⁇ Laser) diode having a narrow oscillation spectrum line width, but any kind of laser light source can be used as long as it can achieve the same specifications. .
  • the laser light source drive control device controls the drive of the laser light source so as to generate laser light having a specific wavelength when measuring the measurement target component.
  • the wavelength of the laser beam generated can be adjusted by controlling parameters such as the drive current and the temperature of the laser body.
  • the laser light source drive control device preferably includes a wavelength variation data holding unit that holds wavelength variation data indicating the relationship between the wavelength of the generated laser light and the parameters. Controls the driving of the laser light source so that the laser light source generates laser light of a specific wavelength based on the held wavelength variation data.
  • the wavelength tunable laser light source it is possible to use a temperature adjusting mechanism that adjusts the temperature of the laser body and that can change the generated laser wavelength depending on the temperature of the laser body.
  • the laser light source drive control device supplies a constant reference current to the laser body for driving the laser light source and a temperature control current to the temperature adjustment mechanism for adjusting the temperature of the laser body. It is preferably controlled.
  • the current supply to the temperature adjustment mechanism is controlled so that the temperature of the laser main body becomes constant, and when the generated laser wavelength is changed, the temperature of the laser main body changes.
  • the current supply to the temperature adjustment mechanism is controlled.
  • the wavelength tunable laser light source When laser light having a specific wavelength is generated using a wavelength tunable laser light source, it is necessary to accurately set the driving condition of the laser light source. It is preferable that calibration can be performed at any time. If the spectroscope is used, the output wavelength can be adjusted accurately. However, in the present invention, the laser wavelength can be set accurately without using the spectroscope. For this purpose, the wavelength fluctuation data is calibrated from the relationship between the generated laser wavelength and parameters such as the laser body temperature using the reference peak wavelength.
  • a preferred embodiment of the present invention includes a wavelength calibration gas cell in which a gas having a known absorption peak wavelength is enclosed as a calibration gas cell.
  • the laser light source drive control device preferably includes a wavelength variation data calibration unit that calibrates wavelength variation data based on the wavelength of the absorption peak when the wavelength calibration gas cell is attached to the optical path.
  • Such a plurality of absorption peaks may be generated from one wavelength calibration gas cell.
  • the absorption peak used for wavelength calibration should have a large and sharp intensity compared to other absorption peaks. If a plurality of such appropriate peaks are included in the absorption peak generated from one wavelength calibration gas cell, they can be used.
  • wavelength calibration gas cell when there is one appropriate absorption peak generated from one wavelength calibration gas cell, it is preferable to use a plurality of wavelength calibration gas cells in which different gases are sealed.
  • a wavelength calibration gas cell a first wavelength calibration gas cell in which a gas having an absorption peak wavelength longer than a specific wavelength for measuring a measurement target component is enclosed, and a specific It is preferable to include a second wavelength calibration gas cell in which a gas having an absorption peak wavelength shorter than the wavelength is enclosed.
  • Another advantage of performing wavelength calibration is that the laser device can be driven so as to generate laser light with an optimum wavelength that minimizes the influence of interference.
  • the calibration gas cell includes at least two sensitivity calibration gas cells in which measurement target components having different known concentrations are sealed.
  • the computing device has a calibration curve data holding unit for holding calibration curve data for calculating the concentration of the measurement target component, and a calibration curve data holding unit based on the absorbance when the sensitivity calibration gas cell is mounted in the optical path of the laser beam.
  • a calibration curve data calibration unit for calibrating the calibration curve data.
  • the sensitivity calibration gas cell is arranged on the optical path of the laser beam even when measuring the sample gas.
  • the arithmetic unit includes an absorbance correction unit that subtracts the absorbance of the sensitivity calibration gas cell arranged on the optical path of the laser beam when measuring the sample gas from the absorbance obtained from the photodetector.
  • an absorbance correction unit that subtracts the absorbance of the sensitivity calibration gas cell arranged on the optical path of the laser beam when measuring the sample gas from the absorbance obtained from the photodetector.
  • wavelength calibration using a plurality of gas absorption lines as necessary accurate setting of measurement wavelength to reduce the influence of interference gas, or calibration of calibration curve data
  • gas measurement by laser absorption spectroscopy with higher accuracy becomes possible.
  • CH 4 is a graph showing the absorption spectra due to encapsulated wavelength calibration gas cell.
  • H 2 O is a graph showing the absorption spectra due to encapsulated wavelength calibration gas cell.
  • FIG. 1 schematically shows an analyzer according to one embodiment.
  • the laser light source 2 that generates laser light as measurement light having a specific wavelength that is absorbed by the measurement target component in the sample gas is a DFB laser diode that can change the wavelength.
  • the type of the laser light source that can change the wavelength is not particularly limited.
  • the laser light source 2 incorporates a temperature adjustment mechanism 3 composed of a Peltier element in order to adjust the temperature of the laser body.
  • a laser light source drive control device that controls the drive of the laser light source 2
  • a laser drive circuit 4 and a control unit 6 comprising an arithmetic processing circuit, a dedicated computer, or a general-purpose personal computer are provided.
  • the laser drive circuit 4 supplies a constant reference current Io as a drive current for driving the laser light source 2 by a control signal from the control unit 6.
  • the controller 6 further supplies a current It for temperature control to the Peltier element of the temperature adjusting mechanism 3 in order to adjust the wavelength of the laser light generated from the laser light source 2.
  • the wavelength of the laser light generated from the laser light source 2 is scanned so as to be a specific wavelength for measuring the absorbance when the concentration of the measurement target component in the sample gas is measured or sandwiching the specific wavelength.
  • the temperature control current It is controlled.
  • the temperature of the laser body is adjusted to a constant temperature corresponding to the specific wavelength.
  • the temperature control current It is controlled by the controller 6 so that the temperature of the laser body changes.
  • a photodetector 8 is disposed at a position where the measurement laser beam generated from the laser light source 2 is received.
  • the photodetector 8 is a photodiode or a photomultiplier tube.
  • a gas cell 12 for measuring a sample gas is disposed on the optical path 10 of the laser beam for measurement from the laser light source 2 to the photodetector 8.
  • the measurement gas cell 12 is a flow cell, and a sample gas is flowed through it.
  • This analyzer includes at least one calibration gas cell 14 in which a calibration gas is sealed.
  • the types of the calibration gas cell 14 include a wavelength calibration gas cell and a sensitivity calibration gas cell.
  • a calibration gas cell mounting mechanism (not shown in FIG. 1) is provided that can detachably place one of the calibration gas cells on the optical path 10.
  • the detection signal of the photodetector 8 is output to the arithmetic unit 16 which is an arithmetic processing circuit, a dedicated computer or a general-purpose personal computer.
  • the arithmetic device 16 includes a program for calculating the concentration of the measurement target component in the sample gas based on the detection signal of the photodetector 8.
  • control unit 6 and the arithmetic device 16 may be realized by one device or may be realized by another device.
  • the detection signal of the photodetector 8 is also output to the control unit 6.
  • FIG. 2A is a plan view showing in detail the vicinity of the calibration gas cell mounting mechanism.
  • the direction of the optical path 10 of the laser beam is changed by the folding mirror 18, condensed by the collector mirror 20, and guided to the photodetector 8.
  • the laser light is converted into parallel light by an optical system that exits the laser light source 2 and enters the measurement gas cell 12 and is introduced into the cell 12.
  • the laser light exiting the cell 12 is guided from the folding mirror 18 to the condensing mirror 20 while maintaining a parallel light state, and is condensed on the photodiode 8 which is a photodetector by the condensing mirror 20.
  • a calibration gas cell 14 is detachably mounted on the optical path 10 of the laser beam.
  • the calibration gas cell 14 can be disposed on the optical path between the folding mirror 18 and the condenser mirror 20. No vignetting occurs in the laser beam due to the insertion of the calibration gas cell 14, or there is no deviation of the condensing position on the photodetector 8, or the output of the photodetector 8 is constant or can be corrected even if there is a deviation. It is designed to be in good condition.
  • the window plate is provided with a wedge in order to avoid interference caused by the parallel window plates of the gas cells 12 and 14.
  • the support mechanism 22 as a calibration gas cell mounting mechanism has a portion opened at the top so that the calibration gas cell 14 can be fitted and mounted from above.
  • the optical path 10 is positioned so as to pass through the central portion of the gas cell 14.
  • FIG. 3 schematically shows a case where a plurality of calibration gas cells 14a to 14d are provided. Any one of the gas cells 14a to 14d is selected and attached to the support mechanism 22. When the calibration gas cell is not used, none of the gas cells 14 a to 14 d is attached to the support mechanism 22.
  • FIG. 4 shows another embodiment of the calibration gas cell mounting mechanism.
  • the cell holder 23 is rotatably supported by a rotating shaft 25 parallel to the optical axis 10 of the laser beam.
  • one through hole 15 and a plurality of calibration gas cells 14a to 14c are arranged on the circumference with the rotation shaft 25 as the center of the circle.
  • the through hole 15 or any of the gas cells 14a to 14c can be arranged on the optical axis 10.
  • the through hole 15 is positioned so as to be on the optical axis, and when performing wavelength calibration or sensitivity calibration, or when measuring a low concentration sample, any one of the predetermined gas cells 14a to 14c is set. It is arranged on the optical path 10.
  • the control unit 6 holds the wavelength variation data that holds the wavelength variation data indicating the relationship between the parameter that defines the driving condition of the laser light source 2 and the generated laser wavelength.
  • a holding unit 30 is provided.
  • the parameter that defines the driving condition is the temperature of the laser body, that is, the current value It flowing to the Peltier element of the temperature adjustment mechanism 3 built in the laser body.
  • the wavelength variation data indicates the relationship between the current value passed through the Peltier element and the generated laser wavelength.
  • the control unit 6 further includes a wavelength variation data calibration unit 32 that calibrates the wavelength variation data of the wavelength variation data holding unit 30 based on the wavelength of the absorption peak when the wavelength calibration gas cell is attached to the optical path 10 of the laser beam. I have.
  • the control unit 6 also includes an input unit 34 for setting a wavelength for measuring the measurement target component.
  • CO carbon monoxide
  • the control unit 6 sets the temperature of the laser body to a temperature that generates laser light of a specific wavelength suitable for measuring CO based on the wavelength variation data held in the wavelength variation data holding unit 30.
  • the current value It flowing to the Peltier element is controlled.
  • the drive current supplied from the laser drive circuit 4 to the laser light source 2 is always a constant reference current Io during measurement of the measurement target component and during calibration.
  • the measurement gas cell 12 When performing the wavelength calibration, the measurement gas cell 12 is not flowed into the measurement gas cell 12 and the measurement gas cell 12 is replaced with a gas that does not contain a measurement target component such as nitrogen gas.
  • a calibration gas cell As a calibration gas cell, a wavelength calibration gas cell in which CH 4 is enclosed is disposed on the optical path 10, and the temperature of the laser main body is changed by controlling the current value flowing from the control unit 6 to the Peltier element of the temperature adjustment mechanism 3. Go.
  • the wavelength of the laser beam generated from the laser light source 2 changes and wavelength scanning is performed.
  • the absorption spectrum shown in FIG. 6 is obtained.
  • CH 4 has a strong absorption line protruding in the vicinity of 4294 cm ⁇ 1 as indicated by an arrow in FIG.
  • the detailed peak wavelength (wave number) of the absorption line is well known.
  • the wavelength variation data calibrating unit 32 of the control unit 6 takes in the peak wavelength and the temperature of the laser body at that time, that is, the current value It 1 flowing to the Peltier element of the temperature adjusting mechanism 3 as the wavelength variation data.
  • a wavelength calibration gas cell in which H 2 O is sealed is disposed on the optical path 10, and the current value flowing from the control unit 6 to the Peltier element of the temperature control mechanism 3 is similarly controlled to control the laser body. Let's change the temperature. As a result, the wavelength of the laser beam generated from the laser light source 2 is changed and wavelength scanning is performed, and the absorption spectrum shown in FIG. 7 is obtained by this wavelength scanning.
  • H 2 O has a strong absorption line protruding in the vicinity of 4270 ⁇ 1 as indicated by an arrow in FIG. The detailed peak wavelength (wave number) of the absorption line is also well known.
  • the wavelength variation data calibrating unit 32 of the control unit 6 captures the peak wavelength and the temperature of the laser body at that time, that is, the current value It 2 flowing to the Peltier element of the temperature adjusting mechanism 3 as the wavelength variation data.
  • the wavelength variation data calibration unit 32 calibrates the wavelength variation data held in the wavelength variation data holding unit 30 by using the two parameters.
  • the corrected wavelength variation data is illustrated in FIG.
  • wavelength calibration may be performed using three or more peak wavelengths.
  • the control unit 6 When a wavelength (wave number) for measuring the measurement target component is input from the input unit 34 based on the calibrated wavelength variation data, the control unit 6 is set so that the laser body temperature for generating laser light of that wavelength is obtained. Thus, the current value It flowing to the Peltier element of the temperature adjustment mechanism 3 is controlled.
  • CO has nine characteristic absorption lines in the wave number 4270cm -1 as shown in FIG. 9 to 4300cm -1.
  • the CO gas concentration can be measured with any of the absorption lines, but since there are many absorption lines of CH 4 and H 2 O in the vicinity of this frequency, the noise due to the interference of the absorption lines cannot be ignored and the absorption is less affected by interference. It is necessary to select the line well.
  • the control unit 6 controls the wavelength of the laser light generated from the laser light source 2 based on the calibrated wavelength variation data. Is done.
  • Sensitivity calibration is calibration of calibration curve data for converting measured absorbance into a concentration value.
  • the arithmetic device 16 includes a calibration curve data holding unit 40 that holds calibration curve data for calculating a measurement target component concentration, and a sensitivity calibration gas cell mounted on the optical path 10 of the laser beam.
  • the calibration curve data calibration unit 42 calibrates the calibration curve data of the calibration curve data holding unit 40 according to the absorbance at that time.
  • the wavelength of the laser light generated from the laser light source 2 is fixed to a specific wavelength for measuring the measurement target component.
  • the measurement gas cell 12 is not flowed into the measurement gas cell 12, but the measurement gas cell 12 is replaced with a gas that does not contain a measurement target component such as nitrogen gas. It is assumed that the calibration curve data holding unit 40 holds calibration curve data indicated as Ao in FIG.
  • a sensitivity calibration gas cell in which CO as a measurement target component is sealed at a known concentration C 1 is arranged on the optical path 10 to measure the absorbance Ab 1 .
  • a sensitivity calibration gas cell in which CO is sealed at a known concentration C 2 is arranged on the optical path 10 as the sensitivity calibration gas cell 14 and the absorbance Ab 2 is measured.
  • the calibration curve data calibration unit 42 uses the obtained absorbances Ab 1 and Ab 2 at the two CO concentrations C 1 and C 2 as the calibration curve data held in the calibration curve data holding unit 40 in FIG. Calibrate as shown in 1 .
  • the sensitivity calibration may be performed using three or more gas cells for sensitivity calibration with different concentrations, or the sensitivity calibration may be performed with one gas cell for sensitivity calibration assuming that the calibration curve passes through the origin. .
  • the sensitivity calibration gas cell 14 When measuring the CO concentration of the sample gas, the sensitivity calibration gas cell 14 is removed from the optical path 10, the sample gas is flowed into the measurement gas cell 12, and the absorbance Ab is measured.
  • the computing device 16 calculates the concentration by applying the calibrated calibration curve data to the measured absorbance Ab.
  • a sensitivity calibration gas cell 14 in which a measurement target component having an appropriate known concentration is sealed is arranged on the optical path 10 of the laser beam even when measuring the sample gas.
  • the component to be measured is CO
  • the CO concentration enclosed in the sensitivity calibration gas cell is, for example, 1 ppm. It is assumed that the absorbance measurement value by the sensitivity calibration gas cell 14 is Abo without flowing the sample gas into the measurement gas cell 12.
  • the absorbance measurement value with respect to the concentration of the measurement target component in the sample gas is indicated by Bo in FIG. To change.
  • the concentration of the measurement target component is a low concentration close to 0 with the absorbance Ab 1 , the absorption peak becomes small, the distinction from the background becomes unclear, and the wavelength drift causes Accurate concentration measurement cannot be performed.
  • the concentration of the measurement target component is as low as 0 having the absorbance Ab 1.
  • the absorbance Ab 1 ′ obtained by adding only Abo is detected as the absorbance measurement value, it is possible to perform measurement with a sufficient S / N ratio for correct concentration measurement without losing sight of the absorption peak. become able to.
  • the arithmetic unit 16 includes an absorbance correction unit 44 as shown in FIG.
  • the absorbance correction unit 44 calculates the concentration based on the calibration curve data after performing an operation of subtracting the absorbance Abo from the sensitivity calibration gas cell from the absorbance Ab 1 ′ obtained from the photodetector 8.
  • the component to be measured is CO, and CH 4 and H 2 O are taken up as gases sealed in the wavelength calibration gas cell.
  • this is an example, and the present invention can be applied to other gases. Needless to say.

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Abstract

L'invention porte sur un appareil d'analyse de gaz pour une mesure par spectroscopie d'absorption laser, qui comprend une source de lumière laser pour générer un faisceau laser avec une longueur d'onde spécifique absorbée par un composant mesuré dans un gaz échantillon, un contrôleur de pilotage de source de lumière laser pour commander le pilotage de la source de lumière laser, un détecteur optique agencé au niveau d'un emplacement dans lequel le faisceau laser est reçu, une pile à gaz pour la mesure du gaz échantillon qui est agencé sur un trajet optique du faisceau laser allant de la source de lumière laser au détecteur optique, et une unité de calcul pour calculer une concentration du composant mesuré dans le gaz échantillon, conformément à un signal de détection du détecteur optique. En outre, l'appareil d'analyse de gaz a au moins une pile à gaz d'étalonnage dans laquelle on remplit du gaz d'étalonnage, et un mécanisme de montage de pile à gaz d'étalonnage capable de positionner l'une des piles à gaz d'étalonnage de façon amovible sur le trajet optique du faisceau laser.
PCT/JP2008/057320 2008-04-15 2008-04-15 Appareil d'analyse de gaz avec pile à gaz d'étalonnage incorporée WO2009128138A1 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
PCT/JP2008/057320 WO2009128138A1 (fr) 2008-04-15 2008-04-15 Appareil d'analyse de gaz avec pile à gaz d'étalonnage incorporée
JP2010508053A JP5360053B2 (ja) 2008-04-15 2008-04-15 校正用ガスセルを搭載したガス分析装置
CN200880128659.8A CN102007397B (zh) 2008-04-15 2008-04-15 装载有校正用气室的气体分析装置

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JP2019191154A (ja) * 2018-04-25 2019-10-31 横河電機株式会社 ガス分析装置
CN112345528A (zh) * 2020-11-18 2021-02-09 北京凯尔科技发展有限公司 一种带自动校准功能的气体分析装置及校准方法
CN112697740A (zh) * 2020-12-10 2021-04-23 山东省科学院海洋仪器仪表研究所 一种表层海水中溶存甲烷检测系统及检测方法
WO2021118022A1 (fr) * 2019-03-27 2021-06-17 주식회사 이엘 Système de mesure et d'analyse automatique de rendement de réduction d'installations de réduction des gaz à effet de serre d'émission de processus de semi-conducteurs et d'afficheurs

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