WO2009107616A1 - 透明薄膜電極 - Google Patents
透明薄膜電極 Download PDFInfo
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- WO2009107616A1 WO2009107616A1 PCT/JP2009/053317 JP2009053317W WO2009107616A1 WO 2009107616 A1 WO2009107616 A1 WO 2009107616A1 JP 2009053317 W JP2009053317 W JP 2009053317W WO 2009107616 A1 WO2009107616 A1 WO 2009107616A1
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- transparent thin
- film electrode
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- electrode
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/13439—Electrodes characterised by their electrical, optical, physical properties; materials therefor; method of making
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133528—Polarisers
- G02F1/133548—Wire-grid polarisers
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
- H05B33/26—Light sources with substantially two-dimensional radiating surfaces characterised by the composition or arrangement of the conductive material used as an electrode
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/80—Constructional details
- H10K30/81—Electrodes
- H10K30/82—Transparent electrodes, e.g. indium tin oxide [ITO] electrodes
- H10K30/821—Transparent electrodes, e.g. indium tin oxide [ITO] electrodes comprising carbon nanotubes
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
- H10K50/81—Anodes
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
- H10K50/81—Anodes
- H10K50/814—Anodes combined with auxiliary electrodes, e.g. ITO layer combined with metal lines
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/868—Arrangements for polarized light emission
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2102/00—Constructional details relating to the organic devices covered by this subclass
- H10K2102/10—Transparent electrodes, e.g. using graphene
- H10K2102/101—Transparent electrodes, e.g. using graphene comprising transparent conductive oxides [TCO]
- H10K2102/103—Transparent electrodes, e.g. using graphene comprising transparent conductive oxides [TCO] comprising indium oxides, e.g. ITO
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Definitions
- the present invention relates to a transparent thin film electrode used for a liquid crystal display device, a light emitting element, and the like.
- transparent thin-film electrodes made of indium tin oxide are used.
- Transparent thin film electrodes made of ITO have both high conductivity and high transparency, and are indispensable for the spread of liquid crystal display devices.
- various types of light-emitting diodes that have been actively studied in recent years particularly organic light-emitting diodes using organic molecules as light-emitting materials (commonly referred to as OLEDs or organic EL), are electrodes that inject charges into the light-emitting materials and light from the light-emitting materials.
- a transparent thin film electrode that can transmit light is indispensable for the spread, and a transparent thin film electrode made of ITO and having no polarizing property is widely used like a liquid crystal display device.
- indium has a problem in terms of stable supply and cost because it has a small amount of resources and soars due to tight supply and demand.
- many alternative materials have been studied centering on inorganic oxides.
- conductive polymers for example, see Patent Document 1
- carbon nanotubes are ideal materials in the sense that they do not substantially contain rare metals and have no problem of resource supply or cost.
- the conductivity was lower than that of ITO.
- the thin film electrode is made thick to compensate for this, the transparency is lowered and there is a problem that it is not suitable for use.
- An object of the present invention is to provide a transparent thin film electrode that does not use indium as a material, and to provide a liquid crystal display device or a light emitting element having industrially sufficient performance using the transparent thin film electrode.
- the present inventor surprisingly orients the conductive polymer, carbon nanotube, anisotropic metal fine particle, or metal fine wire used for the transparent thin film electrode and manifests it there.
- the liquid crystal display device and the light emitting element are configured to find that a thin film that polarizes transmitted light can be used as the transparent thin film electrode, and the present invention has been completed. .
- the present invention provides the following [1] to [25].
- [1] A transparent thin film electrode, wherein light transmitted through the transparent thin film electrode is polarized.
- the transparent thin-film electrode according to the above [1], comprising a conductive polymer.
- the transparent thin-film electrode according to the above [1], comprising carbon nanotubes.
- the transparent thin-film electrode according to the above [1], comprising anisotropic metal fine particles.
- the transparent thin-film electrode according to the above [1] comprising a metal wire grid structure.
- a transparent thin film electrode according to the above [5] comprising a film comprising a conductive polymer or carbon nanotube.
- the polarization direction of the metal wire grid structure substantially matches the polarization direction of the transparent thin film electrode according to any one of [2] to [4].
- the transparent thin-film electrode in any one.
- the maximum value A1 of the absorbance with respect to polarized light in all directions within the film surface of the thin film is 0.1 or more. 13].
- An electrode composite comprising the transparent thin-film electrode according to any one of the above [1] to [14] and at least one auxiliary electrode in contact therewith.
- [17] A path from an arbitrary point X on the surface of the transparent thin film electrode not in contact with the auxiliary electrode to the auxiliary electrode, the length of the shortest path being perpendicular to the polarization direction of the transmitted light of the transparent thin film electrode
- a liquid crystal display device comprising the transparent thin film electrode according to any one of [1] to [14] or the electrode composite according to any one of [15] to [17] .
- the liquid crystal display device according to the above [18], further comprising at least one polarizing element, wherein the polarizing direction of the at least one polarizing element and the polarizing direction of the transparent thin film electrode substantially coincide.
- the light emitting device is characterized in that the light emission in the light emitting layer is polarized, and the polarization direction of the transparent thin film electrode substantially coincides with the polarization direction.
- the light emitting device according to the above [20], wherein the light emitting device is a light emitting diode.
- the transparent thin film electrode of the present invention can be suitably used for a liquid crystal display device, a light emitting element, etc. at low cost without using indium which is a rare metal resource. Further, the conductivity in a specific direction in the plane is high, and the transmittance of polarized light in the specific direction in the plane is high. Therefore, in the liquid crystal display device and light emitting element of the present invention, it can be used as a transparent thin film electrode without reducing the light utilization efficiency. Further, the effect of the electrode composite of the present invention obtained by appropriate combination with the auxiliary electrode can be remarkably enhanced.
- the transparent thin film electrode of the present invention is characterized in that light that is transmitted through the transparent thin film electrode (usually unpolarized light) is polarized.
- this polarized light means polarized light in the case where light enters and transmits perpendicularly to the film surface.
- the polarization direction of the transparent thin film electrode means the vibration direction of the electric field in the transmitted light under such incident conditions.
- the material of the transparent thin-film electrode that polarizes such transmitted light it can be used by appropriately selecting from materials having electrical conductivity and known properties of polarizing transmitted light.
- the transparent thin film electrode of the present invention contains other materials (subcomponents) as long as it does not impair its function, in addition to the above-mentioned materials having electrical conductivity and the property of polarizing transmitted light. Also good. Examples of such subcomponents include dopants, binders, plasticizers, stabilizers, liquid crystal alignment agents, and the like. Of these, the content of such subcomponents excluding the dopant is usually preferably small in order to reduce the resistance of the transparent thin film electrode.
- the optimum dopant content of the conductive polymer to be used can be appropriately selected and determined according to the combination of the conductive polymer to be used and the dopant. Specifically, it is determined in consideration of stability, light absorption, conductivity, mass of dopant, and the like, but usually it is preferably 1% to 98% by weight fraction, more preferably 3% to 90%. 5% to 85% is more preferable, 5% to 50% is even more preferable, and 5% to 30% is particularly preferable. In the case of a wire grid polarizer, these subcomponents can usually be formed on the surface of the fine metal wires or the gap between the fine metal wires constituting them.
- the conductive polymer used in the present invention will be described.
- the conductive polymer can be appropriately selected from polymers known as conductive polymers. Examples thereof include polyacetylene, polyparaphenylene vinylene, polypyrrole, polyaniline, polythiophene, and derivatives thereof. Among these, polypyrrole, polyaniline, polythiophene, and derivatives thereof are preferable in terms of stability in a doped state.
- a derivative soluble in the solution can be used when producing the transparent thin film electrode via a conductive polymer solution.
- Such derivatives include those in which various alkyl chains or alkoxy chains are introduced into the side chain of the conductive polymer, and organic acids such as benzene sulfonic acid, camphor sulfonic acid, polystyrene sulfonic acid, etc. as the conductive polymer dopant.
- organic acids such as benzene sulfonic acid, camphor sulfonic acid, polystyrene sulfonic acid, etc.
- Specific examples include poly (3,4-ethylenedioxythiophene) doped with polystyrene sulfonic acid.
- some solvents can be dissolved without using a derivative.
- dimethyl methacrylate or polyaniline dissolved in concentrated sulfuric acid can be used. If the intermediate of the conductive polymer is soluble, the intermediate is cast, coated, LB film accumulated, etc., converted into a conductive polymer by heat treatment, etc., and further doped. A method can also be used. Specific examples include polyparaphenylene vinylene obtained from a soluble polymer sulfonium salt and derivatives thereof.
- the conductive polymer can be used by appropriately selecting from known methods for preparing a thin film having an oriented conductive polymer.
- Specific examples of the method for forming a thin film include coating, printing, friction, transfer, vapor deposition, LB film accumulation, and the like.
- examples of the orientation treatment include a mechanical method (stretching, rolling, rubbing, etc.), a method of applying a magnetic field or an electric field, a method of utilizing the surface orientation action, and the like.
- an oriented thin film of polyparaphenylene vinylene can be prepared by heating and stretching a polymer film coated with a polymer sulfonium salt.
- a clean surface such as glass or silicon oxide, a surface modified with a surface treatment agent, a surface of a deformed material such as stretching or rolling, friction transfer, etc.
- an alignment action such as the surface of the polymer thin film obtained on the substrate and the surface of the rubbed material.
- the transparent thin film electrode is formed on some smooth substrate.
- the substrate is not particularly limited as long as it is stable as long as the purpose is not hindered. In many cases, it is required to use a transparent material for the purpose of the transparent thin film electrode. Examples of such a transparent base material include a base material made of quartz, glass, transparent resin, and the like. .
- a transparent thin film electrode can be further formed on the element already formed partway.
- One of the methods for producing the transparent thin film electrode of the present invention is a method in which a solution of a doped conductive polymer is applied and oriented.
- One of the methods for producing the transparent thin film electrode of the present invention is a method in which a solution of an undoped conductive polymer is applied, oriented, and further doped.
- One of the other preferable fabrication methods includes a method of accumulating an undoped or doped conductive polymer Langmuir Blodgett film.
- the orientation method of the present invention can also be used. That is, an orientation method in which a force is applied to a film containing a solvent and a conductive polymer can also be used. In this case, after applying a force in one direction to the film containing the solvent and the conductive polymer, A transparent thin film electrode can be produced by removing the solvent. Examples of the method for applying force include stretching, friction, and compression. In this case, it is preferable to use a doped conductive polymer. Specific examples include poly (3,4-ethylenedioxythiophene) doped with an organic acid such as polystyrene sulfonic acid.
- the conductive polymer constituting the transparent thin film electrode is preferably oxidized or reduced, that is, doped in terms of the conductivity of the transparent thin film electrode.
- doping will be described.
- a doping method a known doping method can be used, and specific examples include electrochemical doping and chemical doping.
- Known dopants can be selected as appropriate. For example, iodine, bromine, chlorine, oxygen, arsenic pentafluoride, various anions (various sulfonic acids, chlorine ions, nitrate ions, etc.), sodium, potassium, various cations (Sodium ions, etc.).
- doping can be performed before the formation of the thin film, can be performed during the formation of the thin film, or can be performed after the formation of the thin film, depending on the method of forming the transparent thin film electrode.
- the carbon nanotube used in the present invention will be described.
- the carbon nanotube known ones can be used, but those having a high purity are usually preferred.
- Carbon nanotubes themselves are known to have semiconducting components and metallic components, but it is preferable that the ratio of metallic components is high in terms of electrical conductivity.
- an oriented thin film of carbon nanotubes is formed.
- an orientation method a mechanical method (stretching, rolling, rubbing, etc.), a method of applying a magnetic field or an electric field, and a surface orientation action are utilized. And the like. Specifically, for example, there is a method of forming a monomolecular film on the water surface and accumulating the LB film.
- the wire grid structure used in the present invention will be described.
- a known wire grid polarizer can be used.
- the type of metal is not particularly limited as long as it can be processed into a thin line on a stable and smooth substrate, and it can be used alone or as an alloy.
- gold, silver, aluminum, chromium, copper, etc., and alloys thereof can be mentioned.
- another metal can be thinly attached to the surface of the base material in advance, and then the metal can be appropriately attached.
- a method for producing a wire grid structure a known method for producing a wire grid polarizer for visible light can be used.
- a method of obtaining a fine line and space of a metal film using a submicron fine line and space resist pattern obtained by interference exposure and electron beam lithography is widely known.
- a method of forming a metal film on a transparent flexible substrate and stretching the substrate and the metal film is also known.
- the wire grid structure used in the present invention can be combined with a conductive polymer or carbon nanotube to form the transparent thin film electrode of the present invention.
- a film made of a conductive polymer or carbon nanotube is formed in the gap between the fine metal wires forming the wire grid structure or laminated with the entire wire grid structure.
- the wire grid structure used in the present invention can be combined with another type of second transparent thin film electrode of the present invention to form one composite transparent thin film electrode.
- other types of transparent thin-film electrodes of the present invention those comprising conductive polymers, carbon nanotubes, or anisotropic metal fine particles can be used.
- the polarization direction inherently possessed by the wire grid structure substantially coincides with the polarization direction inherently possessed by the second transparent thin film electrode.
- the unique polarization direction means a polarization direction of light vertically transmitted through each transparent thin film electrode in the state of the wire grid structure or each transparent thin film electrode of the film alone.
- the degree of orientation (order parameter of orientation) S of the transparent thin film electrode of the present invention is preferably higher.
- the degree of orientation substantially means an index obtained by evaluating the polarization of light transmitted through each transparent thin film electrode.
- the transparent thin film electrode is a conductive polymer, it is generally known as an index that correlates with the molecular orientation state.
- the index similarly correlates with some orientation state.
- S is preferably 0.1 or more, more preferably 0.2 or more, further preferably 0.5 or more, still more preferably 0.6 or more, and particularly preferably 0.7 or more.
- S can be measured by a known method such as polarization absorption spectrum, X-ray diffraction, etc., but usually a transmission polarization spectrum is measured, and the absorbance A1 with respect to incident light polarized in the direction in which the absorbance is maximized, is orthogonal to the direction.
- the incident light is incident perpendicularly to the surface of the flat transparent thin film electrode.
- the wavelength at which A1 is maximized is used as the measurement wavelength, but if the maximum is not clear, a wavelength having a relatively large A1 within the visible wavelength range can be appropriately selected and used.
- the polarization direction means a direction in which the projection of the electric field vector of the light is maximum in a plane perpendicular to the light traveling direction.
- S is preferably large. More specifically, S is preferably 0.1 or more, more preferably 0.3 or more, still more preferably 0.5 or more, even more preferably 0.7 or more, and 0 .8 or more is particularly preferable. Further, a smaller A2 can be used as a transparent thin film electrode with higher transparency. Specifically, A2 is preferably 0.5 or less, more preferably 0.3 or less, even more preferably 0.1 or less, and particularly preferably 0.05 or less. Moreover, the case where S is 0.5 or more and A2 is 0.3 or less is preferable, the case where S is 0.7 or more and A2 is 0.3 or less is more preferable, and S is 0.8 or more. And the case where A2 is 0.2 or less is particularly preferable.
- the electrode composite of the present invention includes the transparent thin film electrode and at least one auxiliary electrode in contact therewith.
- the transparent thin film electrode is formed on a smooth substrate, it is usually preferable to form an auxiliary electrode by laminating an auxiliary electrode on a part of the surface of the transparent thin film electrode or in contact with the transparent thin film electrode.
- auxiliary electrodes A path from an arbitrary point X on the surface of the transparent thin film electrode that is not in contact with the auxiliary electrode in terms of lowering electrical resistance, to the auxiliary electrode, perpendicular to the polarization direction of the transmitted light of the transparent thin film electrode and shortest
- the maximum value Lmax of the path length L is preferably smaller than half the square root of the area J of the surface of the transparent thin film electrode not in contact with the auxiliary electrode, more preferably 45% or less of the square root of J, It is more preferably 40% or less of the square root, and particularly preferably 30% or less of the square root of J.
- the auxiliary electrode satisfying such a condition is arranged in such a way that the shape of the transparent thin film electrode not in contact with the auxiliary electrode is short in the polarization direction of the transmitted light of the transparent thin film electrode as shown in FIG.
- Examples of such a shape include a rectangle, a parallelogram, and a rhombus.
- the value Lmax is preferably smaller than 5 cm, more preferably smaller than 1 cm, further preferably smaller than 1 mm, particularly preferably smaller than 0.5 mm in terms of lowering the electric resistance.
- the auxiliary electrode may or may not be transparent, but any material with high electrical conductivity can be used.
- various carbons carbon black, carbon nanotube, graphite, etc.
- metal copper, aluminum, chromium, gold, silver, platinum, iridium, osmium, tin, lead, titanium, molybdenum, tungsten, tantalum, niobium, vanadium Nickel, iron, manganese, cobalt, rhenium, etc.
- a method for producing the auxiliary electrode those known methods can be used according to the selected material. For example, methods such as vapor deposition, sputtering, plating, coating, printing, and the like can be given.
- the auxiliary electrode When an auxiliary electrode is laminated on a part of the transparent thin film electrode surface, the auxiliary electrode can be laminated by these methods.
- the auxiliary electrode may be formed on a substrate on which a transparent thin film electrode is formed in advance, or may be formed on a part of the auxiliary electrode after the transparent thin film electrode is formed.
- the liquid crystal display device of the present invention can be obtained by using the transparent thin film electrode of the present invention as at least a part of the transparent thin film electrode.
- the liquid crystal display mode to be used among the known liquid crystal display modes, a display mode using at least one polarizing element can be preferably used. Examples of such display modes include twisted nematic (TN), super twisted nematic (STN), optically compensated (OCB), surface-stabilized ferroelectric liquid crystal (FLC), and in-plane switching. (IPS) type.
- the transparent thin film electrode or electrode composite of the present invention is used as at least one of the electrodes for applying a voltage to the liquid crystal in these display mode devices.
- the polarized light transmitted through the transparent thin film electrode is partially absorbed by the transparent thin film electrode.
- substantially matching means minimizing the absorption, and the arrangement can be determined based on this. More specifically, a direction within 5 degrees from the direction in which absorption is minimized is preferable, and a direction within 3 degrees is more preferable.
- a liquid crystal alignment inducing layer usually used is omitted and a transparent thin film electrode is used as the alignment inducing layer. Sometimes you can.
- the light emitting device of the present invention is a light-emitting device having the transparent thin-film electrode of the present invention or the electrode composite of the present invention and a light-emitting layer, wherein light emitted from the light-emitting layer is polarized. It is a light emitting device in which the polarization directions of the electrodes substantially coincide.
- a method of the light emitting element a method in which some polarized light is radiated from a light emitting portion among known light emitting elements can be used.
- the light emitting diode in particular, the light emitting layer is an organic molecule and the polarized light is used.
- the organic molecules used in the light-emitting layer can be appropriately selected from those known to be able to form polarized OLEDs.
- conjugated polymers polyfluorene, polyphenylene, polyphenylene vinylene, polythiophene, etc.
- fluorescent dyes Etc.
- the transparent thin film electrode of the present invention is used as at least one of the electrodes. That is, a polarized OLED has at least a cathode, an anode, and a light emitting layer, and the transparent thin film electrode of the present invention is used as the cathode or anode or a part thereof. In terms of light emitting performance of the light emitting element, it is usually preferable to use it as an anode or a part thereof.
- the light emitting layer is composed of oriented organic molecules.
- Orientation can be performed by a known method, and specific examples include a dynamic method (stretching, rolling, rubbing, etc.), a method of applying a magnetic field or an electric field, a method of utilizing the surface orientation action, and the like. be able to.
- a polarized OLED made of oriented organic molecules by the methods described in JP-T-10-50314, JP-A-8-30654, JP-A-10-508979, and JP-A-11-503178 Can be produced.
- the degree of polarization of light emitted from the light emitting layer is preferably high.
- the degree of polarization is preferably 60% or more, more preferably 70% or more, still more preferably 80% or more, and particularly preferably 90% or more.
- Such a high degree of polarization can be realized by increasing the degree of orientation of the organic molecules.
- the polarized light emitted from the light emitting layer is partially absorbed by the transparent thin film electrode, and the polarization direction of the transmitted light in the transparent thin film electrode is substantially matched with the polarized light so that this absorption is minimized.
- substantially matching means that absorption is minimized, and the arrangement can be determined based on this. More specifically, a direction within 5 degrees from the direction in which absorption is minimized is preferable, and a direction within 3 degrees is more preferable. The details depend on the type of organic molecule, but in order to obtain such a match, the transparent thin film electrode and the light emitting layer should not be in direct contact so that the orientation of the transparent thin film electrode and the light emitting layer do not affect each other. Is usually preferred.
- One suitable alignment method for this purpose is to use an alignment inducing layer in contact with the light emitting layer.
- the surface in contact with the light emitting layer of the orientation inducing layer is aligned by a method such as friction, and the light emitting layer is aligned so as to have a desired polarization direction.
- Such an orientation inducing layer preferably has a hole transporting property.
- Example 1 (Creation of transparent thin film electrode 1)
- chromium and then gold are vapor-deposited in advance on a portion 2 on the glass substrate 8 using a mask to form the auxiliary electrode 7.
- An ultrathin film oriented with polytetrafluoroethylene was formed on this substrate by the method described in Nature, Vol. 352, pages 414 to 417 (1991). At this time, polytetrafluoroethylene is not formed in the portion 2.
- Polyaniline is precipitated from concentrated sulfuric acid in which polyaniline is dissolved. Precipitation could be carried out by absorbing moisture from the atmosphere little by little.
- the deposited polyaniline film is oriented, and the concentrated sulfuric acid solution can be removed to form a transparent thin film electrode. Good electrical contact is obtained between the transparent thin film electrode and the auxiliary electrode.
- Example 2 (Creation of liquid crystal display elements)
- the transparent thin film electrode prepared in Example 1 can be used as a TN type liquid crystal electrode in the configuration of FIG.
- the polarization direction of the polarizing film 9 constituting the TN type liquid crystal is matched with the polarization direction of the transparent thin film electrode 6.
- the polarization direction of the polarizing film 9 and the polarization direction of the transparent thin film electrode 6 ′ are matched.
- the orientation of the director of the TN type liquid crystal can be controlled by applying polyimide as the liquid crystal orientation inducing layers 10 and 12 on the transparent thin film electrode and rubbing it.
- the polarization direction is rotated by 90 degrees in the TN-aligned liquid crystal 11, so that the polarized light incident from above and passed through 9 Is not significantly absorbed at 6 and not significantly absorbed at 6 'and 15.
- Example 3 (Creation of light emitting element)
- the oriented poly [3- (4-octylthiophene)] is transferred onto the transparent thin film electrode prepared in Example 1 by the method described in Example 1 of JP-A-8-30654, Then, calcium and then aluminum are vapor-deposited as a cathode to produce a polarized OLED element.
- the polarization direction of the light emitted from poly [3- (4-octylthiophene)] coincide with the polarization direction of the transmitted light of the transparent thin film electrode, brighter light emission can be obtained than in the case where they are not matched. .
- Example 4 (Creation of transparent thin film electrode 1)
- chromium and then gold are vapor-deposited in advance on a portion 2 on the glass substrate 8 using a mask to form the auxiliary electrode 7.
- 20 layers of LB films of carbon nanotubes are accumulated on this substrate by the vertical dipping method (vertical dipping) described in Technical Document 2.
- the resulting transparent thin film electrode has a D of about 1.8 near 750 nm and can be used as a transparent thin film electrode. (See Japanese Journal of Applied Physics, Vol. 42, pages 7629 to 7634 (2003).)
- Example 5 (Creation of transparent thin film electrode 2) An aqueous solution of poly (3,4-ethylenedioxythiophene) doped with polystyrene sulfonic acid (BaytronP® A14083) was applied on a glass substrate. The aqueous solution was immersed in a watercolor brush and applied while reciprocating in a certain direction. The brush was moved intermittently while drying, and when the viscosity increased, it was left to dry. It was confirmed that the light transmitted through the film was polarized.
- polystyrene sulfonic acid BaytronP® A14083
- Example 6 (Creation of transparent thin film electrode 3) A wire grid polarizer for visible light composed of fine metal wires of aluminum or silver (width 100 nm, pitch 200 nm, wire thickness 50-100 nm) was formed on a glass substrate. A polyamic acid solution for liquid crystal was applied on the wire grid polarizer and heated to form a polyimide film (film thickness: 0.1 ⁇ m). A transparent thin film electrode was produced by rubbing this polyimide film with a cloth in parallel with the fine metal wires of the wire grid polarizer.
- Example 7 (Production of TN liquid crystal display element) A liquid crystal cell was produced by bonding two transparent thin-film electrodes produced in Example 6 with the wire grid polarizer and the surface with polyimide facing each other. At this time, an epoxy resin mixed with 5 micron spacer beads was sandwiched around the periphery of the cell to obtain a liquid crystal cell having a cell gap of about 5 microns. At this time, the polarization direction of one transparent thin film electrode and the polarization direction of the other transparent thin film electrode were perpendicular. A TN liquid crystal composition was injected into the gap of the cell. When voltage was applied to the cell, changes in the light transmitted through the cell could be confirmed with the naked eye.
- Example 8 (Creation of transparent thin film electrode 4) An aqueous solution (BaytronP® A14083) of poly (3,4-ethylenedioxythiophene) doped with polystyrene sulfonic acid was applied on the wire grid polarizer prepared in Example 6 to a thickness of about 50 nm.
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Abstract
Description
[1] 透明薄膜電極を透過する光が偏光することを特徴とする、透明薄膜電極。
[2] 導電性高分子を含んでなる、上記[1]記載の透明薄膜電極。
[3] カーボンナノチューブを含んでなる、上記[1]記載の透明薄膜電極。
[4] 異方性金属微粒子を含んでなる、上記[1]記載の透明薄膜電極。
[5] 金属のワイアグリッド構造を含んでなる、上記[1]記載の透明薄膜電極。
[6] 上記[5]記載の透明薄膜電極であって、かつ導電性高分子またはカーボンナノチューブを含んでなる膜を含む、透明薄膜電極。
[7] 上記[6]記載の透明薄膜電極であって、ワイアグリッド構造を形成する隣接する金属細線の間隙に、導電性高分子又はカーボンナノチューブを含んでなる膜が配置されている、透明薄膜電極。
[8][6]又は[7]に記載の透明薄膜電極であって、かつ導電性高分子又はカーボンナノチューブを含んでなる膜がワイアグリッド構造に積層されている、透明薄膜電極。
[9][5]記載の透明薄膜電極と、[2]~[4]のいずれか一項に記載の透明薄膜電極を含む複合した、透明薄膜電極。
[10][2]~[4]のいずれかに記載の透明薄膜電極が金属のワイアグリッド構造に積層されている、[9]記載の透明薄膜電極。
[11] 金属のワイアグリッド構造を形成する金属細線の間隙に、[2]~[4]のいずれかに記載の透明薄膜電極が配置されている、[9]記載の透明薄膜電極。
[12] 金属のワイアグリッド構造の偏光方向と、[2]~[4]のいずれかに記載の透明薄膜電極の偏光方向とが実質的に一致している、[9]~[11]のいずれかに記載の透明薄膜電極。
[13]透明薄膜電極における配向度Sが0.1以上である、上記[1]~[12]のいずれかに記載の透明薄膜電極。
[14] 透明薄膜電極の波長300~700nmの光の透過偏光吸収スペクトルにおいて、薄膜の膜面内のあらゆる方向の偏光に対する吸光度の最大値A1が0.1以上である、上記[1]~[13]のいずれかに記載の透明薄膜電極。
[15] 上記[1]~[14]のいずれかに記載の透明薄膜電極とこれに接する少なくとも1つ以上の補助電極を含むことを特徴とする、電極複合体。
[16] 補助電極と接していない透明薄膜電極の表面における任意の点Xから補助電極への経路であって、該透明薄膜電極の透過光の偏光方向に垂直であってかつ最短の経路の長さLの最大値Lmaxが補助電極と接していない該透明薄膜電極の表面の面積Jの平方根の半分よりも小さい、上記[15]記載の電極複合体。
[17] 補助電極と接していない透明薄膜電極の表面における任意の点Xから補助電極への経路であって、該透明薄膜電極の透過光の偏光方向に垂直であってかつ最短の経路の長さLの最大値Lmaxが5cmよりも小さい、上記[15]又は[16]記載の電極複合体。
[18] 上記[1]~[14]のいずれかに記載の透明薄膜電極、または上記[15]~[17]のいずれかに記載の電極複合体を有することを特徴とする、液晶表示装置。
[19] さらに少なくとも1つの偏光素子を有し、少なくとも1つの偏光素子の偏光方向と該透明薄膜電極の偏光方向が実質的に一致している、上記[18]記載の液晶表示装置。
[20] 上記[1]~[14]のいずれかに記載の透明薄膜電極、または上記[15]~[17]のいずれかに記載の電極複合体、さらに発光層を有する発光素子であって、該発光層における発光が偏光してなり、該偏光方向と該透明薄膜電極の前記偏光方向とが実質的に一致していることを特徴とする、発光素子。
[21] 発光素子が発光ダイオードである、上記[20]記載の発光素子。
[22] 発光ダイオードの発光層が配向した有機分子からなる、上記[21]記載の発光素子。
[23] 有機分子が高分子である、上記[22]記載の発光素子。
[24] 発光層といずれかの透明薄膜電極の間に少なくとも1層の配向誘起層を有する、上記[20]~[23]のいずれかに記載の発光素子。
[25] 溶媒と導電性高分子を含んでなる膜に力を加えることを特徴とする、上記[1]又は[2]記載の透明薄膜電極の製造方法。
2 透明薄膜電極が補助電極と接する部分
3 透明薄膜電極1の透過光の偏光方向
4 補助電極と接していない該透明薄膜電極表面における任意の点X
5 補助電極と接していない該透明薄膜電極表面における任意の点Xから補助電極への経路であって前記透明薄膜電極の透過光の偏光方向に垂直でかつ最短の経路の長さL
6 透明薄膜電極(断面)
6’ 透明薄膜電極(断面)
7 補助電極(断面)
8 基板(断面)
9 偏光フィルム(透過光が13の方向に偏光する)
10 液晶配向誘起層(表面の液晶のダイレクタは13の方向に配向する)
11 TN配向した液晶
12 液晶配向誘起層(表面の液晶のダイレクタは14の方向に配向する)
13 透明薄膜電極6の透過光の偏光方向
14 透明薄膜電極6‘の透過光の偏光方向
15 偏光フィルム(透過光が14の方向に偏光する)
16 基板
17 基板
18 正孔輸送層
19 発光層(発光は21の方向に偏光する)
20 陰極
21 透明薄膜電極1の透過光の偏光方向
22 透明薄膜電極
23 基板
24 導電性高分子の層
25 金属電極
本発明の透明薄膜電極は、透明薄膜電極を透過する光(通常は無偏光の光)が偏光することを特徴とする。ここでこの偏光とは光が膜面に対して垂直に入射し透過した場合の偏光を意味する。又、本発明において透明薄膜電極の偏光方向とはこのような入射条件の透過光における電場の振動方向を意味する。このような透過する光が偏光する透明薄膜電極の材料としては、電気伝導性があり透過する光が偏光する性質が知られている材料から適宜選択して使用することが出来、このような材料としては導電性高分子、カーボンナノチューブ、金属ナノロッド等の異方性金属微粒子、金属細線、等が知られているが、電気伝導性や偏光の点で導電性高分子、カーボンナノチューブ、金属細線が好ましい。金属細線としてはワイアグリッド偏光子と呼ばれる金属のワイアグリッド構造を用いる。
本発明の透明薄膜電極は、前記の電気伝導性があり透過した光が偏光する性質が知られている材料以外に、その機能を損なわない範囲で、他の材料(副成分)を含んでいてもよい。このような副成分としてはたとえば、ドーパント、バインダー、可塑剤、安定材、液晶配向剤、等が挙げられる。このうちドーパントを除くこのような副成分の含有量は透明薄膜電極の抵抗を下げるためには、通常少ないことが好ましく、具体的には重量分率で50%以下が好ましく、30%以下がさらに好ましく、20%以下がさらにより好ましく、10%以下が特に好ましい。一方、ドーパントについては用いる導電性高分子の最適なドーパント含有量を、用いる導電性高分子とドーパントの組み合わせにしたがって、適宜選択して定めることが出来る。具体的には、安定性、光吸収、伝導度、ドーパントの質量、等を考慮して定めるが、通常は重量分率で1%以上98%以下が好ましく、3%以上90%以下がより好ましく、5%以上85%以下がさらに好ましく、5%以上50%以下がさらにより好ましく、5%以上30%以下が特に好ましい。ワイアグリッド偏光子の場合、これらの副成分は通常金属細線の表面またはこれらを構成する金属細線の間隙に形成できる。
(透明薄膜電極の作成1)
図1においてガラス基板8上の2の部分にあらかじめマスクを用いてクロム、次いで金を蒸着して補助電極7とする。この基板上にネイチャー、第352巻、第414~417頁(1991)記載の方法でポリテトラフルオロエチレンの配向した超薄膜を形成した。この時、ポリテトラフルオロエチレンを2の部分には形成しない。ポリアニリンを溶かした濃硫酸から、ポリアニリンを析出させる。析出は雰囲気から僅かずつ溶液に吸湿させることよって行うことが出来た。析出したポリアニリン膜は配向しており、濃硫酸溶液を除去して透明薄膜電極とすることができる。透明薄膜電極と補助電極の間には良好な電気的接触が得られる。
(液晶表示素子の作成)
前記実施例1で作成した透明薄膜電極をTN型液晶の電極として、図2の構成で使用することが出来る。この際TN型液晶を構成する偏光フィルム9の偏光方向と透明薄膜電極6の偏光方向を一致させる。また偏光フィルム9の偏光方向と透明薄膜電極6’の偏光方向を一致させる。この際TN型液晶のダイレクタの配向は、透明薄膜電極上に液晶配向誘起層10および12としてポリイミドを塗布して摩擦することで制御出来る。この時、透明薄膜電極6と透明薄膜電極6’の間に電圧を印加しない状態において、TN配向した液晶11内で、偏光方向が90度回転するため、上から入射して9を通過した偏光は、6で顕著に吸収されず、さらに6’および15においても顕著に吸収されない。
(発光素子の作成)
前記実施例1で作成した透明薄膜電極上に、特開平8-30654号公報の実施例1に記載の方法で、配向したポリ〔3-(4-オクチルチオフェン)〕を転写し、さらにその上に陰極としてカルシウム次いでアルミニウムを蒸着して、偏光OLED素子を作製する。この時、ポリ〔3-(4-オクチルチオフェン)〕からの発光の偏光方向と透明薄膜電極の透過光の偏光方向を一致させることによって、一致させなかった場合よりも明るい発光を得ることが出来る。
(透明薄膜電極の作成1)
図1においてガラス基板8上の2の部分にあらかじめマスクを用いてクロム、次いで金を蒸着して補助電極7とする。この基板上に技術文献2記載の垂直浸漬法(ヴァーティカル・ディッピング)で、カーボンナノチューブのLB膜を20層累積する。得られる透明薄膜電極は、750nm付近で約1.8のDを有し、透明薄膜電極として使用できる。(ジャパニーズ・ジャーナル・オブ・アプライド・フィジックス、第42巻、第7629頁~第7634頁(2003年)参照。)
(透明薄膜電極の作成2)
ガラス基板上にポリスチレンスルホン酸をドーピングしたポリ(3,4-エチレンジオキシチオフェン)の水溶液(BaytronP(登録商標)A14083)を塗布した。水溶液を水彩用筆に浸漬し、一定方向に往復させながら塗りつけた。乾燥させながら断続的に引きつづき筆を動かし、粘度が高くなったところ放置して乾燥した。膜を透過した光が偏光していることを確認できた。
(透明薄膜電極の作成3)
ガラス基板上にアルミニウム又は銀の金属細線(幅100nm、ピッチ200nm、細線厚み50~100nm)からなる可視光線用のワイアグリッド偏光子を形成した。このワイアグリッド偏光子上に液晶用のポリアミック酸溶液を塗布し加熱することによって、ポリイミド膜(膜厚0.1ミクロン)を形成した。このポリイミド膜をワイアグリッド偏光子の金属細線と平行に布でラビングすることによって透明薄膜電極を作製した。
(TN型液晶表示素子の作成)
実施例6で作製した透明薄膜電極2枚を、ワイアグリッド偏光子とポリイミドのついた面を向かい合わせにして貼り合わせ液晶セルを作製した。この際セルの周辺部に5ミクロンのスペーサ用ビーズを混入したエポキシ樹脂を挟むことによって、セルギャップ約5ミクロンの液晶セルとした。この時、一方の透明薄膜電極の偏光方向ともう一方の透明薄膜電極の偏光方向を垂直とした。セルの間隙にTN液晶組成物を注入した。このセルに電圧を印加したらところ、セルを透過する光の変化を肉眼で確認することが出来た。
(透明薄膜電極の作成4)
実施例6で作製したワイアグリッド偏光子上にポリスチレンスルホン酸をドーピングしたポリ(3,4-エチレンジオキシチオフェン)の水溶液(BaytronP(登録商標)A14083)を膜厚約50nm塗布した。
Claims (25)
- 透明薄膜電極を透過する光が偏光することを特徴とする、透明薄膜電極。
- 導電性高分子を含んでなる、請求項1記載の透明薄膜電極。
- カーボンナノチューブを含んでなる、請求項1記載の透明薄膜電極。
- 異方性金属微粒子を含んでなる、請求項1記載の透明薄膜電極。
- 金属のワイアグリッド構造を含んでなる、請求項1記載の透明薄膜電極。
- 請求項5記載の透明薄膜電極であって、かつ導電性高分子またはカーボンナノチューブを含んでなる膜を含む、透明薄膜電極。
- 請求項6記載の透明薄膜電極であって、金属のワイアグリッド構造を形成する隣接する金属細線の間隙に、導電性高分子又はカーボンナノチューブを含んでなる膜が配置されている、透明薄膜電極。
- 請求項6又は7に記載の透明薄膜電極であって、かつ導電性高分子又はカーボンナノチューブを含んでなる膜が金属のワイアグリッド構造に積層されている、透明薄膜電極。
- 請求項5記載の透明薄膜電極と、請求項2~4のいずれか一項に記載の透明薄膜電極を含む複合した、透明薄膜電極。
- 請求項2~4のいずれか一項に記載の透明薄膜電極が金属のワイアグリッド構造に積層されている、請求項9記載の透明薄膜電極。
- 金属のワイアグリッド構造を形成する金属細線の間隙に、請求項2~4のいずれか一項に記載の透明薄膜電極が配置されている、請求項9記載の透明薄膜電極。
- 金属のワイアグリッド構造の偏光方向と、請求項2~4のいずれか一項記載の透明薄膜電極の偏光方向とが実質的に一致している、請求項9~11のいずれか一項記載の透明薄膜電極。
- 透明薄膜電極における配向度Sが0.1以上である、請求項1~12のいずれか一項に記載の透明薄膜電極。
- 透明薄膜電極の波長300~700nmの光の透過偏光吸収スペクトルにおいて、薄膜の膜面内のあらゆる方向の偏光に対する吸光度の最大値A1が0.1以上である、請求項1~13のいずれか一項に記載の透明薄膜電極。
- 請求項1~14のいずれか一項に記載の透明薄膜電極とこれに接する少なくとも1つ以上の補助電極を含むことを特徴とする、電極複合体。
- 補助電極と接していない透明薄膜電極の表面における任意の点Xから補助電極への経路であって、該透明薄膜電極の透過光の偏光方向に垂直であってかつ最短の経路の長さLの最大値Lmaxが補助電極と接していない該透明薄膜電極の表面の面積Jの平方根の半分よりも小さい、請求項15記載の電極複合体。
- 補助電極と接していない透明薄膜電極の表面における任意の点Xから補助電極への経路であって、該透明薄膜電極の透過光の偏光方向に垂直であってかつ最短の経路の長さLの最大値Lmaxが5cmよりも小さい、請求項15又は16記載の電極複合体。
- 請求項1~14のいずれか一項に記載の透明薄膜電極、または請求項15~17のいずれか一項に記載の電極複合体を有することを特徴とする、液晶表示装置。
- さらに少なくとも1つの偏光素子を有し、少なくとも1つの偏光素子の偏光方向と該透明薄膜電極の偏光方向が実質的に一致している、請求項18記載の液晶表示装置。
- 請求項1~14のいずれか一項に記載の透明薄膜電極、または請求項15~17のいずれか一項に記載の電極複合体、さらに発光層を有する発光素子であって、該発光層における発光が偏光してなり、該偏光方向と該透明薄膜電極の前記偏光方向とが実質的に一致していることを特徴とする、発光素子。
- 発光素子が発光ダイオードである、請求項20記載の発光素子。
- 発光ダイオードの発光層が配向した有機分子からなる、請求項21記載の発光素子。
- 有機分子が高分子である、請求項22記載の発光素子。
- 発光層といずれかの透明薄膜電極の間に少なくとも1層の配向誘起層を有する、請求項20~23のいずれか一項に記載の発光素子。
- 溶媒と導電性高分子を含んでなる膜に力を加えることを特徴とする、請求項1又は2記載の透明薄膜電極の製造方法。
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DE112009000460T DE112009000460T5 (de) | 2008-02-28 | 2009-02-25 | Transparente Dünnschichtelektrode |
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GB201014288D0 (en) | 2010-10-13 |
CN101960535A (zh) | 2011-01-26 |
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DE112009000460T5 (de) | 2010-12-30 |
CN102929047A (zh) | 2013-02-13 |
CN101960535B (zh) | 2012-12-19 |
GB2470317A (en) | 2010-11-17 |
JP5453842B2 (ja) | 2014-03-26 |
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TW200951996A (en) | 2009-12-16 |
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US20110001905A1 (en) | 2011-01-06 |
GB201201625D0 (en) | 2012-03-14 |
GB2485307A (en) | 2012-05-09 |
GB2485305A (en) | 2012-05-09 |
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CN102929047B (zh) | 2015-05-20 |
GB2485305B (en) | 2012-09-19 |
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GB2470317B (en) | 2012-04-11 |
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