WO2009078223A1 - 空間光変調ユニット、照明光学系、露光装置、およびデバイス製造方法 - Google Patents

空間光変調ユニット、照明光学系、露光装置、およびデバイス製造方法 Download PDF

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Publication number
WO2009078223A1
WO2009078223A1 PCT/JP2008/069997 JP2008069997W WO2009078223A1 WO 2009078223 A1 WO2009078223 A1 WO 2009078223A1 JP 2008069997 W JP2008069997 W JP 2008069997W WO 2009078223 A1 WO2009078223 A1 WO 2009078223A1
Authority
WO
WIPO (PCT)
Prior art keywords
light
optical system
spatial light
modulating unit
illumination optical
Prior art date
Application number
PCT/JP2008/069997
Other languages
English (en)
French (fr)
Inventor
Osamu Tanitsu
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Priority to EP08861234A priority Critical patent/EP2233960A4/en
Priority to JP2009546181A priority patent/JPWO2009078223A1/ja
Publication of WO2009078223A1 publication Critical patent/WO2009078223A1/ja
Priority to US12/817,299 priority patent/US20100253927A1/en

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0808—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more diffracting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0875—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements
    • G02B26/0883—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements the refracting element being a prism
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

Abstract

　例えば規則的に配置された多数の微小なミラー要素の周囲から発生する回折光の影響を抑えて、所望の瞳強度分布を実現することのできる照明光学系。光源（１）からの光に基づいて被照射面（Ｍ）を照明する照明光学系（ＩＬ）は、空間光変調ユニット（３）と、空間光変調器を介した光束に基づいて照明瞳に所定の光強度分布を形成する分布形成光学系（４，５）とを備えている。空間光変調ユニット（３）は、二次元的に配列されて個別に制御される複数の光学要素を有する空間光変調器（３ａ）と、複数の光学要素の各々の周囲において回折光を発生させる回折光発生領域と該回折光発生領域への入射光との相対的な角度を変化させる角度可変手段とを備えている。
PCT/JP2008/069997 2007-12-17 2008-11-04 空間光変調ユニット、照明光学系、露光装置、およびデバイス製造方法 WO2009078223A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP08861234A EP2233960A4 (en) 2007-12-17 2008-11-04 SPATIAL LIGHT MODULATION UNIT, OPTICAL LIGHTING SYSTEM, ALIGNMENT DEVICE AND COMPONENT MANUFACTURING METHOD
JP2009546181A JPWO2009078223A1 (ja) 2007-12-17 2008-11-04 空間光変調ユニット、照明光学系、露光装置、およびデバイス製造方法
US12/817,299 US20100253927A1 (en) 2007-12-17 2010-06-17 Spatial light modulating unit, illumination optical system, exposure apparatus, and device manufacturing method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007324115 2007-12-17
JP2007-324115 2007-12-17

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US12/817,299 Continuation US20100253927A1 (en) 2007-12-17 2010-06-17 Spatial light modulating unit, illumination optical system, exposure apparatus, and device manufacturing method

Publications (1)

Publication Number Publication Date
WO2009078223A1 true WO2009078223A1 (ja) 2009-06-25

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ID=40795342

Family Applications (1)

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PCT/JP2008/069997 WO2009078223A1 (ja) 2007-12-17 2008-11-04 空間光変調ユニット、照明光学系、露光装置、およびデバイス製造方法

Country Status (6)

Country Link
US (1) US20100253927A1 (ja)
EP (1) EP2233960A4 (ja)
JP (1) JPWO2009078223A1 (ja)
KR (1) KR20100105649A (ja)
TW (1) TW200933308A (ja)
WO (1) WO2009078223A1 (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011070853A1 (ja) * 2009-12-10 2011-06-16 株式会社ニコン 空間光変調器、照明光学系、露光装置、およびデバイス製造方法
WO2012060083A1 (ja) * 2010-11-05 2012-05-10 株式会社ニコン 照明装置、露光装置、プログラムおよび照明方法
WO2013094733A1 (ja) * 2011-12-22 2013-06-27 株式会社ニコン 計測方法、メンテナンス方法及びその装置

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JP5611016B2 (ja) * 2010-12-07 2014-10-22 株式会社日立ハイテクノロジーズ 露光装置、露光方法、及び表示用パネル基板の製造方法
US10120283B2 (en) * 2011-06-06 2018-11-06 Nikon Corporation Illumination method, illumination optical device, and exposure device
WO2013071940A1 (en) * 2011-11-15 2013-05-23 Carl Zeiss Smt Gmbh Light modulator and illumination system of a microlithographic projection exposure apparatus
CN107144948A (zh) * 2017-06-15 2017-09-08 中国科学院西安光学精密机械研究所 一种基于三角反射器的空间光调制器耦合装置

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011070853A1 (ja) * 2009-12-10 2011-06-16 株式会社ニコン 空間光変調器、照明光学系、露光装置、およびデバイス製造方法
WO2012060083A1 (ja) * 2010-11-05 2012-05-10 株式会社ニコン 照明装置、露光装置、プログラムおよび照明方法
WO2013094733A1 (ja) * 2011-12-22 2013-06-27 株式会社ニコン 計測方法、メンテナンス方法及びその装置

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US20100253927A1 (en) 2010-10-07
EP2233960A1 (en) 2010-09-29
KR20100105649A (ko) 2010-09-29
JPWO2009078223A1 (ja) 2011-04-28
EP2233960A4 (en) 2012-01-25
TW200933308A (en) 2009-08-01

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