WO2009078154A1 - 移動体システム、パターン形成装置、露光装置、及び計測装置、並びにデバイス製造方法 - Google Patents

移動体システム、パターン形成装置、露光装置、及び計測装置、並びにデバイス製造方法 Download PDF

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Publication number
WO2009078154A1
WO2009078154A1 PCT/JP2008/003735 JP2008003735W WO2009078154A1 WO 2009078154 A1 WO2009078154 A1 WO 2009078154A1 JP 2008003735 W JP2008003735 W JP 2008003735W WO 2009078154 A1 WO2009078154 A1 WO 2009078154A1
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WO
WIPO (PCT)
Prior art keywords
plane
stage
measuring instrument
moving body
body system
Prior art date
Application number
PCT/JP2008/003735
Other languages
English (en)
French (fr)
Inventor
Yuichi Shibazaki
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Priority to CN2008800187260A priority Critical patent/CN101680783B/zh
Priority to JP2009546138A priority patent/JP5224071B2/ja
Priority to KR1020097025693A priority patent/KR101489527B1/ko
Publication of WO2009078154A1 publication Critical patent/WO2009078154A1/ja
Priority to HK10104395.1A priority patent/HK1136622A1/xx

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
    • G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
    • G01D5/32—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light
    • G01D5/34—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells
    • G01D5/347—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells using displacement encoding scales
    • G01D5/34746—Linear encoders
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
    • G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
    • G01D5/32—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light
    • G01D5/34—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells
    • G01D5/347—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells using displacement encoding scales
    • G01D5/34707—Scales; Discs, e.g. fixation, fabrication, compensation
    • G01D5/34715—Scale reading or illumination devices
    • G01D5/34723—Scale reading or illumination devices involving light-guides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D2205/00—Indexing scheme relating to details of means for transferring or converting the output of a sensing member
    • G01D2205/90—Two-dimensional encoders, i.e. having one or two codes extending in two directions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Optical Transform (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

　移動体システムは、ＸＹ平面に沿って移動するステージ本体(９１)と、該ステージ本体上で、ＸＹ平面に直交する方向(Ｚ軸方向)及びＸＹ平面に対する傾斜方向に微動可能なテーブル(ＷＴＢ)とを有するステージ(ＷＳＴ)と、ＸＹ平面内におけるステージ(ＷＳＴ)の位置情報を計測する計測装置と、を備えている。計測装置は、テーブル(ＷＴＢ)に設けられた複数のエンコーダヘッド(６０Ｃ等)と、各ヘッドと対向してステージ本体(９１)に端部が設けられかつ端部で光軸がＺ軸方向と実質的に平行になる光ファイバ(２４,２６)と、を有し、ＸＹ平面と実質的に平行に配置されたグレーティング部(ＲＧ)に対向するヘッドの出力に基づいて、ステージ(ＷＳＴ)の位置情報を計測する。そして、各ヘッドと光ファイバの端部との間で信号の空中伝送が行われる。
PCT/JP2008/003735 2007-12-14 2008-12-12 移動体システム、パターン形成装置、露光装置、及び計測装置、並びにデバイス製造方法 WO2009078154A1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
CN2008800187260A CN101680783B (zh) 2007-12-14 2008-12-12 移动体系统、图案形成装置、曝光装置及测量装置、以及器件制造方法
JP2009546138A JP5224071B2 (ja) 2007-12-14 2008-12-12 移動体システム、パターン形成装置、露光装置、及び計測装置、並びにデバイス製造方法
KR1020097025693A KR101489527B1 (ko) 2007-12-14 2008-12-12 이동체 시스템, 패턴 형성 장치, 노광 장치, 및 계측 장치, 그리고 디바이스 제조 방법
HK10104395.1A HK1136622A1 (en) 2007-12-14 2010-05-04 Moving body system, pattern forming device, exposure apparatus, measuring instrument, and device manufacturing method

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007-324004 2007-12-14
JP2007324004 2007-12-14
JP2008-119266 2008-04-30
JP2008119266 2008-04-30

Publications (1)

Publication Number Publication Date
WO2009078154A1 true WO2009078154A1 (ja) 2009-06-25

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PCT/JP2008/003735 WO2009078154A1 (ja) 2007-12-14 2008-12-12 移動体システム、パターン形成装置、露光装置、及び計測装置、並びにデバイス製造方法

Country Status (7)

Country Link
US (1) US8115906B2 (ja)
JP (1) JP5224071B2 (ja)
KR (1) KR101489527B1 (ja)
CN (1) CN101680783B (ja)
HK (1) HK1136622A1 (ja)
TW (1) TWI436167B (ja)
WO (1) WO2009078154A1 (ja)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012009853A (ja) * 2010-06-03 2012-01-12 Asml Netherlands Bv ステージ装置およびそのようなステージ装置を備えるリソグラフィ装置
JP2012127946A (ja) * 2010-12-16 2012-07-05 Dr Johannes Heidenhain Gmbh 光学式位置測定装置
WO2013141112A1 (ja) * 2012-03-23 2013-09-26 住友電気工業株式会社 干渉測定装置
JP2015502032A (ja) * 2011-11-09 2015-01-19 ザイゴ コーポレーションＺｙｇｏ Ｃｏｒｐｏｒａｔｉｏｎ リソグラフィツールにおいて使用される計測システムのためのファイバ伝送
JP2017045063A (ja) * 2009-08-25 2017-03-02 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法
JP2017142523A (ja) * 2009-08-20 2017-08-17 株式会社ニコン 移動体装置、物体処理装置、フラットパネルディスプレイの製造方法、デバイス製造方法、及び搬送方法

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8421994B2 (en) * 2007-09-27 2013-04-16 Nikon Corporation Exposure apparatus
US8599359B2 (en) 2008-12-19 2013-12-03 Nikon Corporation Exposure apparatus, exposure method, device manufacturing method, and carrier method
US8902402B2 (en) 2008-12-19 2014-12-02 Nikon Corporation Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
US8773635B2 (en) * 2008-12-19 2014-07-08 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8760629B2 (en) * 2008-12-19 2014-06-24 Nikon Corporation Exposure apparatus including positional measurement system of movable body, exposure method of exposing object including measuring positional information of movable body, and device manufacturing method that includes exposure method of exposing object, including measuring positional information of movable body
US8488109B2 (en) 2009-08-25 2013-07-16 Nikon Corporation Exposure method, exposure apparatus, and device manufacturing method
US20110096318A1 (en) * 2009-09-28 2011-04-28 Nikon Corporation Exposure apparatus and device fabricating method
US20110096312A1 (en) * 2009-09-28 2011-04-28 Nikon Corporation Exposure apparatus and device fabricating method
US20110102761A1 (en) * 2009-09-28 2011-05-05 Nikon Corporation Stage apparatus, exposure apparatus, and device fabricating method
US20110096306A1 (en) * 2009-09-28 2011-04-28 Nikon Corporation Stage apparatus, exposure apparatus, driving method, exposing method, and device fabricating method
US20110128523A1 (en) * 2009-11-19 2011-06-02 Nikon Corporation Stage apparatus, exposure apparatus, driving method, exposing method, and device fabricating method
US20110123913A1 (en) * 2009-11-19 2011-05-26 Nikon Corporation Exposure apparatus, exposing method, and device fabricating method
US8488106B2 (en) * 2009-12-28 2013-07-16 Nikon Corporation Movable body drive method, movable body apparatus, exposure method, exposure apparatus, and device manufacturing method
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US9207549B2 (en) 2011-12-29 2015-12-08 Nikon Corporation Exposure apparatus and exposure method, and device manufacturing method with encoder of higher reliability for position measurement
CN103576463B (zh) * 2012-07-20 2015-09-30 上海微电子装备有限公司 光刻机工作台及其工作方法
US9772564B2 (en) * 2012-11-12 2017-09-26 Nikon Corporation Exposure apparatus and exposure method, and device manufacturing method
NL2015826A (en) * 2014-12-19 2016-09-20 Asml Netherlands Bv Optical encoder system, encoder head and lithographic apparatus.
TWI625557B (zh) * 2017-07-11 2018-06-01 大立光電股份有限公司 環形光學元件、成像鏡頭模組與電子裝置
DE102018103869B3 (de) * 2018-02-21 2019-05-09 Physik Instrumente (Pi) Gmbh & Co. Kg Maßelement für eine optische Messvorrichtung
EP3992575A4 (en) * 2019-06-28 2022-08-31 Koh Young Technology Inc. APPARATUS AND METHOD FOR DETERMINING THE THREE-DIMENSIONAL SHAPE OF AN OBJECT
US11226194B1 (en) 2020-06-25 2022-01-18 International Business Machines Corporation Apparatus and method for measuring distance between fiducial features, such as magnetic transducers, to an accuracy of within one nanometer

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04198714A (ja) * 1990-11-28 1992-07-20 Canon Inc エンコーダ
JPH09269249A (ja) * 1996-03-29 1997-10-14 Omron Corp センサ装置
JP2002048601A (ja) * 2000-08-07 2002-02-15 Mitsutoyo Corp 光学式変位測定装置
JP2006332656A (ja) * 2005-05-24 2006-12-07 Asml Netherlands Bv ２ステージ・リソグラフィ装置及びデバイス製造方法
JP2007129194A (ja) * 2005-09-13 2007-05-24 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4780617A (en) * 1984-08-09 1988-10-25 Nippon Kogaku K.K. Method for successive alignment of chip patterns on a substrate
US5196745A (en) * 1991-08-16 1993-03-23 Massachusetts Institute Of Technology Magnetic positioning device
KR100300618B1 (ko) * 1992-12-25 2001-11-22 오노 시게오 노광방법,노광장치,및그장치를사용하는디바이스제조방법
JP3412704B2 (ja) * 1993-02-26 2003-06-03 株式会社ニコン 投影露光方法及び装置、並びに露光装置
JPH07270122A (ja) * 1994-03-30 1995-10-20 Canon Inc 変位検出装置、該変位検出装置を備えた露光装置およびデバイスの製造方法
CN100578876C (zh) * 1998-03-11 2010-01-06 株式会社尼康 紫外激光装置以及使用该紫外激光装置的曝光装置和曝光方法
WO2001035168A1 (en) 1999-11-10 2001-05-17 Massachusetts Institute Of Technology Interference lithography utilizing phase-locked scanning beams
SG107560A1 (en) * 2000-02-25 2004-12-29 Nikon Corp Exposure apparatus and exposure method capable of controlling illumination distribution
US20020041377A1 (en) * 2000-04-25 2002-04-11 Nikon Corporation Aerial image measurement method and unit, optical properties measurement method and unit, adjustment method of projection optical system, exposure method and apparatus, making method of exposure apparatus, and device manufacturing method
TW527526B (en) * 2000-08-24 2003-04-11 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
WO2002063664A1 (fr) * 2001-02-06 2002-08-15 Nikon Corporation Systeme et procede d'exposition et procede de production de dispositif
JP4714403B2 (ja) * 2001-02-27 2011-06-29 エーエスエムエル ユーエス，インコーポレイテッド デュアルレチクルイメージを露光する方法および装置
TW529172B (en) * 2001-07-24 2003-04-21 Asml Netherlands Bv Imaging apparatus
CN101424883B (zh) 2002-12-10 2013-05-15 株式会社尼康 曝光设备和器件制造法
US7025498B2 (en) * 2003-05-30 2006-04-11 Asml Holding N.V. System and method of measuring thermal expansion
KR101343720B1 (ko) * 2003-07-28 2013-12-20 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법, 그리고 노광 장치의제어 방법
TWI295408B (en) * 2003-10-22 2008-04-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method, and measurement system
US7190437B2 (en) * 2003-12-30 2007-03-13 Asml Netherlands B.V. Wireless signaling in a lithographic apparatus
US7102729B2 (en) * 2004-02-03 2006-09-05 Asml Netherlands B.V. Lithographic apparatus, measurement system, and device manufacturing method
JP4751032B2 (ja) * 2004-04-22 2011-08-17 株式会社森精機製作所 変位検出装置
JP4593971B2 (ja) * 2004-05-19 2010-12-08 キヤノン株式会社 ズームレンズ及びそれを有する撮像装置
US7256871B2 (en) * 2004-07-27 2007-08-14 Asml Netherlands B.V. Lithographic apparatus and method for calibrating the same
EP1623821B1 (en) * 2004-08-03 2007-10-03 Sumitomo Rubber Industries, Ltd. Manufacturing method of a rubber member for tire
US7167233B2 (en) * 2004-09-20 2007-01-23 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and apparatus for processing an exchangeable object
US20060139595A1 (en) * 2004-12-27 2006-06-29 Asml Netherlands B.V. Lithographic apparatus and method for determining Z position errors/variations and substrate table flatness
US7161659B2 (en) * 2005-04-08 2007-01-09 Asml Netherlands B.V. Dual stage lithographic apparatus and device manufacturing method
US7924416B2 (en) * 2005-06-22 2011-04-12 Nikon Corporation Measurement apparatus, exposure apparatus, and device manufacturing method
EP2752714B8 (en) 2006-01-19 2015-10-28 Nikon Corporation Exposure apparatus and exposure method
TWI454859B (zh) * 2006-03-30 2014-10-01 尼康股份有限公司 移動體裝置、曝光裝置與曝光方法以及元件製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04198714A (ja) * 1990-11-28 1992-07-20 Canon Inc エンコーダ
JPH09269249A (ja) * 1996-03-29 1997-10-14 Omron Corp センサ装置
JP2002048601A (ja) * 2000-08-07 2002-02-15 Mitsutoyo Corp 光学式変位測定装置
JP2006332656A (ja) * 2005-05-24 2006-12-07 Asml Netherlands Bv ２ステージ・リソグラフィ装置及びデバイス製造方法
JP2007129194A (ja) * 2005-09-13 2007-05-24 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017142523A (ja) * 2009-08-20 2017-08-17 株式会社ニコン 移動体装置、物体処理装置、フラットパネルディスプレイの製造方法、デバイス製造方法、及び搬送方法
JP2017142522A (ja) * 2009-08-20 2017-08-17 株式会社ニコン 移動体装置、露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、及び露光方法
KR20190131146A (ko) * 2009-08-20 2019-11-25 가부시키가이샤 니콘 물체 처리 장치, 노광 장치 및 노광 방법, 및 디바이스 제조 방법
KR102184248B1 (ko) 2009-08-20 2020-11-30 가부시키가이샤 니콘 물체 처리 장치, 노광 장치 및 노광 방법, 및 디바이스 제조 방법
JP2017045063A (ja) * 2009-08-25 2017-03-02 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法
JP2012009853A (ja) * 2010-06-03 2012-01-12 Asml Netherlands Bv ステージ装置およびそのようなステージ装置を備えるリソグラフィ装置
US8587769B2 (en) 2010-06-03 2013-11-19 Asml Netherlands B.V. Stage apparatus and lithographic apparatus comprising such stage apparatus
JP2012127946A (ja) * 2010-12-16 2012-07-05 Dr Johannes Heidenhain Gmbh 光学式位置測定装置
JP2015502032A (ja) * 2011-11-09 2015-01-19 ザイゴ コーポレーションＺｙｇｏ Ｃｏｒｐｏｒａｔｉｏｎ リソグラフィツールにおいて使用される計測システムのためのファイバ伝送
WO2013141112A1 (ja) * 2012-03-23 2013-09-26 住友電気工業株式会社 干渉測定装置

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Publication number Publication date
CN101680783A (zh) 2010-03-24
US8115906B2 (en) 2012-02-14
JP5224071B2 (ja) 2013-07-03
HK1136622A1 (en) 2010-07-02
CN101680783B (zh) 2013-04-10
KR20100091886A (ko) 2010-08-19
KR101489527B1 (ko) 2015-02-03
TWI436167B (zh) 2014-05-01
JPWO2009078154A1 (ja) 2011-04-28
US20090161086A1 (en) 2009-06-25
TW200937136A (en) 2009-09-01

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