WO2009051036A1 - 薄膜形成方法及び有機エレクトロニクス素子 - Google Patents

薄膜形成方法及び有機エレクトロニクス素子 Download PDF

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Publication number
WO2009051036A1
WO2009051036A1 PCT/JP2008/068211 JP2008068211W WO2009051036A1 WO 2009051036 A1 WO2009051036 A1 WO 2009051036A1 JP 2008068211 W JP2008068211 W JP 2008068211W WO 2009051036 A1 WO2009051036 A1 WO 2009051036A1
Authority
WO
WIPO (PCT)
Prior art keywords
coating film
solvent
coating
thin film
film formation
Prior art date
Application number
PCT/JP2008/068211
Other languages
English (en)
French (fr)
Inventor
Kiyoshi Endo
Atsuo Nozaki
Original Assignee
Konica Minolta Holdings, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Holdings, Inc. filed Critical Konica Minolta Holdings, Inc.
Priority to JP2009538057A priority Critical patent/JP5316415B2/ja
Publication of WO2009051036A1 publication Critical patent/WO2009051036A1/ja

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
    • H10K71/441—Thermal treatment, e.g. annealing in the presence of a solvent vapour in the presence of solvent vapors, e.g. solvent vapour annealing

Abstract

　本発明は、装置の大型化、コストアップとなることなく、基板に均一な膜厚の有機エレクトロニクス素子の塗布膜を形成することのできる薄膜形成方法を提供する。この薄膜形成方法は、少なくとも１種類の溶媒と該溶媒中に分散または溶解した材料を含む液状組成物（塗布液）を基板に塗布し薄膜の塗布膜を形成する際に、前記塗布膜の膜厚を均一化する、溶媒蒸気供給手段を備えた溶媒蒸気供給工程を設け、塗布液に用いられる溶媒の溶媒蒸気を基板の塗布膜の近傍に供給し充満する。これにより、前記塗布膜の乾燥速度を抑制し、前記塗布膜の膜厚の均一化を促進する。
PCT/JP2008/068211 2007-10-17 2008-10-07 薄膜形成方法及び有機エレクトロニクス素子 WO2009051036A1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009538057A JP5316415B2 (ja) 2007-10-17 2008-10-07 薄膜形成方法及び有機エレクトロニクス素子

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007269871 2007-10-17
JP2007-269871 2007-10-17

Publications (1)

Publication Number Publication Date
WO2009051036A1 true WO2009051036A1 (ja) 2009-04-23

Family

ID=40567305

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/068211 WO2009051036A1 (ja) 2007-10-17 2008-10-07 薄膜形成方法及び有機エレクトロニクス素子

Country Status (2)

Country Link
JP (1) JP5316415B2 (ja)
WO (1) WO2009051036A1 (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015144051A (ja) * 2014-01-31 2015-08-06 住友化学株式会社 発光装置の製造方法
WO2019167741A1 (ja) * 2018-02-28 2019-09-06 キヤノン株式会社 インクジェット装置、およびそれを用いた機能素子の製造方法
JP2019150817A (ja) * 2018-02-28 2019-09-12 キヤノン株式会社 インクジェット装置、およびそれを用いた機能素子の製造方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02194873A (ja) * 1989-01-23 1990-08-01 Tokyo Electron Ltd 塗布装置及び塗布方法
JPH04337284A (ja) * 1991-05-14 1992-11-25 Asahi Chem Ind Co Ltd 有機電界発光素子
JP2004243164A (ja) * 2003-02-12 2004-09-02 Konica Minolta Holdings Inc 塗布装置および塗布方法
JP2005056614A (ja) * 2003-08-07 2005-03-03 Sharp Corp 有機エレクトロルミネッセンス素子の製造装置及びその製造方法
JP2007234390A (ja) * 2006-03-01 2007-09-13 Seiko Epson Corp 有機ｅｌパネルの製造方法及びその製造装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02194873A (ja) * 1989-01-23 1990-08-01 Tokyo Electron Ltd 塗布装置及び塗布方法
JPH04337284A (ja) * 1991-05-14 1992-11-25 Asahi Chem Ind Co Ltd 有機電界発光素子
JP2004243164A (ja) * 2003-02-12 2004-09-02 Konica Minolta Holdings Inc 塗布装置および塗布方法
JP2005056614A (ja) * 2003-08-07 2005-03-03 Sharp Corp 有機エレクトロルミネッセンス素子の製造装置及びその製造方法
JP2007234390A (ja) * 2006-03-01 2007-09-13 Seiko Epson Corp 有機ｅｌパネルの製造方法及びその製造装置

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015144051A (ja) * 2014-01-31 2015-08-06 住友化学株式会社 発光装置の製造方法
WO2019167741A1 (ja) * 2018-02-28 2019-09-06 キヤノン株式会社 インクジェット装置、およびそれを用いた機能素子の製造方法
JP2019150817A (ja) * 2018-02-28 2019-09-12 キヤノン株式会社 インクジェット装置、およびそれを用いた機能素子の製造方法
US11446941B2 (en) 2018-02-28 2022-09-20 Canon Kabushiki Kaisha Inkjet apparatus and method for manufacturing functional element using the same
JP7237616B2 (ja) 2018-02-28 2023-03-13 キヤノン株式会社 インクジェット装置、およびそれを用いた機能素子の製造方法

Also Published As

Publication number Publication date
JPWO2009051036A1 (ja) 2011-03-03
JP5316415B2 (ja) 2013-10-16

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