WO2009025342A1 - Igbt用のシリコン単結晶ウェーハ及びigbt用のシリコン単結晶ウェーハの製造方法 - Google Patents
Igbt用のシリコン単結晶ウェーハ及びigbt用のシリコン単結晶ウェーハの製造方法 Download PDFInfo
- Publication number
- WO2009025342A1 WO2009025342A1 PCT/JP2008/064955 JP2008064955W WO2009025342A1 WO 2009025342 A1 WO2009025342 A1 WO 2009025342A1 JP 2008064955 W JP2008064955 W JP 2008064955W WO 2009025342 A1 WO2009025342 A1 WO 2009025342A1
- Authority
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- WIPO (PCT)
- Prior art keywords
- single crystal
- silicon single
- igbt
- wafer
- crystal wafer
- Prior art date
Links
- 239000013078 crystal Substances 0.000 title abstract 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title abstract 7
- 238000000034 method Methods 0.000 title abstract 7
- 229910052710 silicon Inorganic materials 0.000 title abstract 7
- 239000010703 silicon Substances 0.000 title abstract 7
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 4
- 229910052760 oxygen Inorganic materials 0.000 abstract 4
- 239000001301 oxygen Substances 0.000 abstract 4
- 238000001556 precipitation Methods 0.000 abstract 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract 2
- 230000007547 defect Effects 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 229910052757 nitrogen Inorganic materials 0.000 abstract 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/322—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to modify their internal properties, e.g. to produce internal imperfections
- H01L21/3221—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to modify their internal properties, e.g. to produce internal imperfections of silicon bodies, e.g. for gettering
- H01L21/3225—Thermally inducing defects using oxygen present in the silicon body for intrinsic gettering
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/20—Controlling or regulating
- C30B15/203—Controlling or regulating the relationship of pull rate (v) to axial thermal gradient (G)
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66234—Bipolar junction transistors [BJT]
- H01L29/66325—Bipolar junction transistors [BJT] controlled by field-effect, e.g. insulated gate bipolar transistors [IGBT]
- H01L29/66333—Vertical insulated gate bipolar transistors
- H01L29/66348—Vertical insulated gate bipolar transistors with a recessed gate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/739—Transistor-type devices, i.e. able to continuously respond to applied control signals controlled by field-effect, e.g. bipolar static induction transistors [BSIT]
- H01L29/7393—Insulated gate bipolar mode transistors, i.e. IGBT; IGT; COMFET
- H01L29/7395—Vertical transistors, e.g. vertical IGBT
- H01L29/7396—Vertical transistors, e.g. vertical IGBT with a non planar surface, e.g. with a non planar gate or with a trench or recess or pillar in the surface of the emitter, base or collector region for improving current density or short circuiting the emitter and base regions
- H01L29/7397—Vertical transistors, e.g. vertical IGBT with a non planar surface, e.g. with a non planar gate or with a trench or recess or pillar in the surface of the emitter, base or collector region for improving current density or short circuiting the emitter and base regions and a gate structure lying on a slanted or vertical surface or formed in a groove, e.g. trench gate IGBT
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Metallurgy (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
引き上げ速度マージンを拡大することが可能であるとともに、抵抗率のバラツキが小さく酸素析出を抑制可能なウェーハの製造が可能なチョクラルスキー法によってシリコン単結晶を育成することにより得られるIGBT用シリコン単結晶ウェーハの製造方法であって、シリコン単結晶の引き上げ速度をGrown-in欠陥フリーなシリコン単結晶が引き上げ可能な速度で、格子間酸素濃度が0.5×1017atoms/cm3以上8.5×1017atoms/cm3以下の単結晶を育成し、この単結晶からスライスしたシリコンウェーハに処理温度1000~1200°Cの範囲、窒素を含まない雰囲気で1分以上のRTA処理を施すことで酸素析出核やOSF核を消滅させ、IGBT用デバイスプロセス熱処理後にも酸素析出を抑制可能とする。
Priority Applications (1)
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JP2009529068A JP5387408B2 (ja) | 2007-08-21 | 2008-08-21 | Igbt用シリコン単結晶ウェーハの製造方法 |
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JP2007215336 | 2007-08-21 | ||
JP2007-215336 | 2007-08-21 |
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WO2009025342A1 true WO2009025342A1 (ja) | 2009-02-26 |
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PCT/JP2008/064955 WO2009025342A1 (ja) | 2007-08-21 | 2008-08-21 | Igbt用のシリコン単結晶ウェーハ及びigbt用のシリコン単結晶ウェーハの製造方法 |
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WO (1) | WO2009025342A1 (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010263009A (ja) * | 2009-04-30 | 2010-11-18 | Sumco Corp | シリコンウェーハおよびその製造方法 |
CN102605433A (zh) * | 2012-01-09 | 2012-07-25 | 浙江大学 | 一种消除掺氮直拉单晶硅片中原生氧沉淀的方法 |
WO2012101957A1 (ja) * | 2011-01-24 | 2012-08-02 | 信越半導体株式会社 | シリコン単結晶ウェーハの製造方法及びアニールウェーハ |
JP2013048137A (ja) * | 2011-08-29 | 2013-03-07 | Covalent Silicon Co Ltd | シリコンウェーハの製造方法 |
WO2018116637A1 (ja) * | 2016-12-20 | 2018-06-28 | 株式会社Sumco | シリコン単結晶の製造方法 |
WO2019154729A1 (de) * | 2018-02-06 | 2019-08-15 | Siltronic Ag | Verfahren und vorrichtung zum ziehen eines einkristalls, einkristall und halbleiterscheibe |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7264100B2 (ja) * | 2020-04-02 | 2023-04-25 | 信越半導体株式会社 | シリコン単結晶基板中のドナー濃度の制御方法 |
Citations (4)
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JP2005154172A (ja) * | 2003-11-21 | 2005-06-16 | Shin Etsu Handotai Co Ltd | シリコン単結晶の製造方法及びシリコン単結晶製造装置の設計方法並びにシリコン単結晶製造装置 |
JP2006344823A (ja) * | 2005-06-09 | 2006-12-21 | Sumco Corp | Igbt用のシリコンウェーハ及びその製造方法 |
JP2007022863A (ja) * | 2005-07-19 | 2007-02-01 | Sumco Corp | シリコン単結晶の育成方法およびシリコンウェーハの製造方法 |
JP2007191350A (ja) * | 2006-01-19 | 2007-08-02 | Sumco Corp | Igbt用シリコン単結晶ウェーハ及びigbt用シリコン単結晶ウェーハの製造方法 |
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2008
- 2008-08-21 JP JP2009529068A patent/JP5387408B2/ja active Active
- 2008-08-21 WO PCT/JP2008/064955 patent/WO2009025342A1/ja active Application Filing
Patent Citations (4)
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JP2005154172A (ja) * | 2003-11-21 | 2005-06-16 | Shin Etsu Handotai Co Ltd | シリコン単結晶の製造方法及びシリコン単結晶製造装置の設計方法並びにシリコン単結晶製造装置 |
JP2006344823A (ja) * | 2005-06-09 | 2006-12-21 | Sumco Corp | Igbt用のシリコンウェーハ及びその製造方法 |
JP2007022863A (ja) * | 2005-07-19 | 2007-02-01 | Sumco Corp | シリコン単結晶の育成方法およびシリコンウェーハの製造方法 |
JP2007191350A (ja) * | 2006-01-19 | 2007-08-02 | Sumco Corp | Igbt用シリコン単結晶ウェーハ及びigbt用シリコン単結晶ウェーハの製造方法 |
Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010263009A (ja) * | 2009-04-30 | 2010-11-18 | Sumco Corp | シリコンウェーハおよびその製造方法 |
CN103328696B (zh) * | 2011-01-24 | 2016-05-11 | 信越半导体股份有限公司 | 单晶硅晶片的制造方法及退火晶片 |
KR101750688B1 (ko) * | 2011-01-24 | 2017-06-26 | 신에쯔 한도타이 가부시키가이샤 | 실리콘 단결정 웨이퍼의 제조방법 및 어닐링된 웨이퍼 |
WO2012101957A1 (ja) * | 2011-01-24 | 2012-08-02 | 信越半導体株式会社 | シリコン単結晶ウェーハの製造方法及びアニールウェーハ |
JP2012153548A (ja) * | 2011-01-24 | 2012-08-16 | Shin Etsu Handotai Co Ltd | シリコン単結晶ウェーハの製造方法及びアニールウェーハ |
CN103328696A (zh) * | 2011-01-24 | 2013-09-25 | 信越半导体股份有限公司 | 单晶硅晶片的制造方法及退火晶片 |
DE112012000306T5 (de) | 2011-01-24 | 2013-09-26 | Shin-Etsu Handotai Co., Ltd. | Verfahren zum Herstellen eines Silizium-Einkristallwafers und eines thermisch behandelten Wafers |
US8916953B2 (en) | 2011-01-24 | 2014-12-23 | Shin-Etsu Handotai Co., Ltd. | Method for manufacturing silicon single crystal wafer and annealed wafer |
JP2013048137A (ja) * | 2011-08-29 | 2013-03-07 | Covalent Silicon Co Ltd | シリコンウェーハの製造方法 |
CN102605433A (zh) * | 2012-01-09 | 2012-07-25 | 浙江大学 | 一种消除掺氮直拉单晶硅片中原生氧沉淀的方法 |
WO2018116637A1 (ja) * | 2016-12-20 | 2018-06-28 | 株式会社Sumco | シリコン単結晶の製造方法 |
JP2018100196A (ja) * | 2016-12-20 | 2018-06-28 | 株式会社Sumco | シリコン単結晶の製造方法 |
KR20190089978A (ko) * | 2016-12-20 | 2019-07-31 | 가부시키가이샤 사무코 | 실리콘 단결정 제조 방법 |
KR102265466B1 (ko) | 2016-12-20 | 2021-06-15 | 가부시키가이샤 사무코 | 실리콘 단결정 제조 방법 |
US11242617B2 (en) | 2016-12-20 | 2022-02-08 | Sumco Corporation | Method for producing silicon single crystal |
WO2019154729A1 (de) * | 2018-02-06 | 2019-08-15 | Siltronic Ag | Verfahren und vorrichtung zum ziehen eines einkristalls, einkristall und halbleiterscheibe |
Also Published As
Publication number | Publication date |
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JPWO2009025342A1 (ja) | 2010-11-25 |
JP5387408B2 (ja) | 2014-01-15 |
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