WO2009016887A1 - 流路中を流れるサンプルの光学的特性計測装置 - Google Patents

流路中を流れるサンプルの光学的特性計測装置 Download PDF

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Publication number
WO2009016887A1
WO2009016887A1 PCT/JP2008/060198 JP2008060198W WO2009016887A1 WO 2009016887 A1 WO2009016887 A1 WO 2009016887A1 JP 2008060198 W JP2008060198 W JP 2008060198W WO 2009016887 A1 WO2009016887 A1 WO 2009016887A1
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WO
WIPO (PCT)
Prior art keywords
section
signal
frequency
optical path
measurement instrument
Prior art date
Application number
PCT/JP2008/060198
Other languages
English (en)
French (fr)
Inventor
Hidenao Iwai
Toyohiko Yamauchi
Original Assignee
Hamamatsu Photonics K. K.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hamamatsu Photonics K. K. filed Critical Hamamatsu Photonics K. K.
Priority to EP16190479.2A priority Critical patent/EP3130913B1/en
Priority to EP08765011.5A priority patent/EP2175258B1/en
Priority to CN200880101132.6A priority patent/CN101765765B/zh
Priority to US12/671,051 priority patent/US8305584B2/en
Publication of WO2009016887A1 publication Critical patent/WO2009016887A1/ja

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02062—Active error reduction, i.e. varying with time
    • G01B9/02067—Active error reduction, i.e. varying with time by electronic control systems, i.e. using feedback acting on optics or light
    • G01B9/02069—Synchronization of light source or manipulator and detector
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/0201—Interferometers characterised by controlling or generating intrinsic radiation properties using temporal phase variation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
    • G01N21/45—Refractivity; Phase-affecting properties, e.g. optical path length using interferometric methods; using Schlieren methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/35—Mechanical variable delay line

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Optics & Photonics (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)

Abstract

光学的特性計測装置１は、光源部１０、第１光カプラ２１、第２光カプラ２２、レンズ３１、レンズ３２、位相変調部４０、駆動部４１、光路長差調整部５０、制御部５１、受光部６０、同期検出部７０および測定部８０を備える。位相変調部４０は、周波数ｆで光を位相変調する。同期検出部７０は、受光部６０から出力される電気信号に含まれる周波数ｆの成分の大きさに応じた値の第１信号を出力するとともに、該電気信号に含まれる周波数２ｆの成分の大きさに応じた値の第２信号を出力する。制御部５１は、同期検出部７０から出力される第１信号または第２信号に基づいて、光路長差調整部５０により調整される光路長差が所定値となるように制御をする。
PCT/JP2008/060198 2007-07-31 2008-06-03 流路中を流れるサンプルの光学的特性計測装置 WO2009016887A1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP16190479.2A EP3130913B1 (en) 2007-07-31 2008-06-03 Measurement instrument of optical characteristics for sample flowing in passage
EP08765011.5A EP2175258B1 (en) 2007-07-31 2008-06-03 Measurement instrument of optical characteristics for sample flowing in passage
CN200880101132.6A CN101765765B (zh) 2007-07-31 2008-06-03 流路中流动的样本的光学特性测量装置
US12/671,051 US8305584B2 (en) 2007-07-31 2008-06-03 Measurement instrument of optical characteristics for sample flowing in passage

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-199595 2007-07-31
JP2007199595A JP5156291B2 (ja) 2007-07-31 2007-07-31 フローセル中を流れるサンプルの光学的特性計測装置

Publications (1)

Publication Number Publication Date
WO2009016887A1 true WO2009016887A1 (ja) 2009-02-05

Family

ID=40304125

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/060198 WO2009016887A1 (ja) 2007-07-31 2008-06-03 流路中を流れるサンプルの光学的特性計測装置

Country Status (5)

Country Link
US (1) US8305584B2 (ja)
EP (2) EP3130913B1 (ja)
JP (1) JP5156291B2 (ja)
CN (1) CN101765765B (ja)
WO (1) WO2009016887A1 (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8537365B1 (en) * 2010-09-02 2013-09-17 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Mass gauging demonstrator for any gravitational conditions
JP5516525B2 (ja) 2011-07-20 2014-06-11 トヨタ自動車株式会社 運転支援装置
PL237446B1 (pl) * 2015-09-18 2021-04-19 Polskie Centrum Fotoniki I Swiatlowodow Urządzenie do pomiarów parametrów elementów fazowych i dyspersji światłowodów oraz sposób pomiaru parametrów elementu fazowego i dyspersji światłowodów
JP6762183B2 (ja) * 2016-09-25 2020-09-30 株式会社 エフケー光学研究所 位相計測装置
AT520258B1 (de) * 2017-07-26 2022-02-15 Univ Wien Tech Verfahren zur spektroskopischen bzw. spektrometrischen Untersuchung einer Probe

Citations (12)

* Cited by examiner, † Cited by third party
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JPH02140639A (ja) * 1988-11-21 1990-05-30 Nippon Telegr & Teleph Corp <Ntt> 後方散乱光測定装置
JPH07119613A (ja) 1993-10-25 1995-05-09 Shin Yoneda 差動回流圧力機関
JPH10232204A (ja) * 1996-12-16 1998-09-02 Seitai Hikari Joho Kenkyusho:Kk 屈折率測定装置
JPH10267610A (ja) * 1997-03-26 1998-10-09 Kowa Co 光学測定装置
JPH11108763A (ja) * 1997-09-30 1999-04-23 Seitai Hikarijoho Kenkyusho:Kk 光計測装置
JP2001004538A (ja) * 1999-06-17 2001-01-12 Matsushita Electric Ind Co Ltd 媒質の測定装置および測定方法
JP2003307487A (ja) * 2002-04-12 2003-10-31 Olympus Optical Co Ltd 光走査プローブ
WO2005001445A2 (en) * 2001-12-18 2005-01-06 Massachusetts Institute Of Technology Systems and methods for phase measurements
WO2005015149A1 (ja) * 2003-08-12 2005-02-17 Bussan Nanotech Research Institute, Inc. 検出装置、光路長測定装置、測定用器具、光学部材評価方法、温度変化検出方法
JP2005121600A (ja) * 2003-10-20 2005-05-12 Otsuka Denshi Co Ltd 位相変調型干渉法を用いた動的光散乱測定装置
US20050105097A1 (en) 2001-12-18 2005-05-19 Massachusetts Institute Of Technology Systems and methods for phase measurements
JP2007155452A (ja) * 2005-12-02 2007-06-21 Nippon Telegr & Teleph Corp <Ntt> 光コヒーレンス断層画像測定方法および装置

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JPH02140639A (ja) * 1988-11-21 1990-05-30 Nippon Telegr & Teleph Corp <Ntt> 後方散乱光測定装置
JPH07119613A (ja) 1993-10-25 1995-05-09 Shin Yoneda 差動回流圧力機関
JPH10232204A (ja) * 1996-12-16 1998-09-02 Seitai Hikari Joho Kenkyusho:Kk 屈折率測定装置
JPH10267610A (ja) * 1997-03-26 1998-10-09 Kowa Co 光学測定装置
JPH11108763A (ja) * 1997-09-30 1999-04-23 Seitai Hikarijoho Kenkyusho:Kk 光計測装置
JP2001004538A (ja) * 1999-06-17 2001-01-12 Matsushita Electric Ind Co Ltd 媒質の測定装置および測定方法
WO2005001445A2 (en) * 2001-12-18 2005-01-06 Massachusetts Institute Of Technology Systems and methods for phase measurements
US20050105097A1 (en) 2001-12-18 2005-05-19 Massachusetts Institute Of Technology Systems and methods for phase measurements
JP2003307487A (ja) * 2002-04-12 2003-10-31 Olympus Optical Co Ltd 光走査プローブ
WO2005015149A1 (ja) * 2003-08-12 2005-02-17 Bussan Nanotech Research Institute, Inc. 検出装置、光路長測定装置、測定用器具、光学部材評価方法、温度変化検出方法
JP2005121600A (ja) * 2003-10-20 2005-05-12 Otsuka Denshi Co Ltd 位相変調型干渉法を用いた動的光散乱測定装置
JP2007155452A (ja) * 2005-12-02 2007-06-21 Nippon Telegr & Teleph Corp <Ntt> 光コヒーレンス断層画像測定方法および装置

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Title
E. B. VAN MUNSTER, CYTOMETRY, vol. 47, 2002, pages 192 - 199
See also references of EP2175258A4

Also Published As

Publication number Publication date
CN101765765A (zh) 2010-06-30
EP3130913B1 (en) 2019-02-27
US20100195110A1 (en) 2010-08-05
EP2175258B1 (en) 2017-04-12
JP2009036573A (ja) 2009-02-19
JP5156291B2 (ja) 2013-03-06
EP2175258A1 (en) 2010-04-14
EP3130913A1 (en) 2017-02-15
CN101765765B (zh) 2012-05-23
US8305584B2 (en) 2012-11-06
EP2175258A4 (en) 2015-06-24

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