WO2009016870A1 - 加熱処理装置および加熱処理方法 - Google Patents
加熱処理装置および加熱処理方法 Download PDFInfo
- Publication number
- WO2009016870A1 WO2009016870A1 PCT/JP2008/058806 JP2008058806W WO2009016870A1 WO 2009016870 A1 WO2009016870 A1 WO 2009016870A1 JP 2008058806 W JP2008058806 W JP 2008058806W WO 2009016870 A1 WO2009016870 A1 WO 2009016870A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- heat treatment
- lower electrode
- treatment apparatus
- treatment method
- electrode
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B17/00—Furnaces of a kind not covered by any preceding group
- F27B17/0016—Chamber type furnaces
- F27B17/0025—Especially adapted for treating semiconductor wafers
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Engineering & Computer Science (AREA)
- Muffle Furnaces And Rotary Kilns (AREA)
- Furnace Details (AREA)
Abstract
下部電極を上部電極と平行に維持することができる加熱処理装置および加熱処理方法を提供すること。 真空チャンバと11、この真空チャンバ11の内部において上下動可能な下部電極13と、この下部電極13を支持するとともにこの下部電極13を上下動させる支持部材15と、下部電極13が上下動の略下端の位置において下部電極13の下面の所定の位置(たとえば下部電極13が下方に撓み変形が生じやすい位置)に当接して前記下部電極を支持する凸状の部材111とを備える。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007200576 | 2007-08-01 | ||
JP2007-200576 | 2007-08-01 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009016870A1 true WO2009016870A1 (ja) | 2009-02-05 |
Family
ID=40304110
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/058806 WO2009016870A1 (ja) | 2007-08-01 | 2008-05-14 | 加熱処理装置および加熱処理方法 |
Country Status (1)
Country | Link |
---|---|
WO (1) | WO2009016870A1 (ja) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11233291A (ja) * | 1998-02-17 | 1999-08-27 | Fron Tec:Kk | プラズマ処理装置 |
JP2007043170A (ja) * | 2005-08-02 | 2007-02-15 | Applied Materials Inc | 基板支持体の加熱及び冷却 |
-
2008
- 2008-05-14 WO PCT/JP2008/058806 patent/WO2009016870A1/ja active Application Filing
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11233291A (ja) * | 1998-02-17 | 1999-08-27 | Fron Tec:Kk | プラズマ処理装置 |
JP2007043170A (ja) * | 2005-08-02 | 2007-02-15 | Applied Materials Inc | 基板支持体の加熱及び冷却 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN103862281B (zh) | 一种微小型零件的装配方法 | |
TW200734076A (en) | Apparatus and method for cleaning a substrate terminal area | |
WO2009060890A1 (ja) | 貼合せ基板製造装置および貼合せ基板製造方法 | |
WO2009063906A1 (ja) | 貼合せ基板製造装置および貼合せ基板製造方法 | |
WO2011059750A3 (en) | Chamber for pecvd | |
IL207267A0 (en) | Portal re-positioning device for large-area glass plates | |
WO2007016413A3 (en) | Method for aligning and assembling two lens pieces, and a machine to accomplish this task | |
WO2009024972A3 (en) | A continuously height adjustable baby mattress support and apparatus therefor | |
WO2019004636A3 (ko) | 자동화된 핵산 분리 장치 | |
WO2008120294A1 (ja) | 搬送装置 | |
FR2874914B1 (fr) | Procede de fabrication continue de verre plat par laminage | |
WO2010088338A3 (en) | Rapid cooling of a substrate by motion | |
TW200741939A (en) | Substrate placing stand and substrate treatment apparatus | |
TW200731388A (en) | Stripping means and stripping apparatus | |
WO2007140173A3 (en) | Methods of maintaining and using a high concentration of dissolved copper on the surface of a useful article | |
WO2008024681A3 (en) | Apparatus and methods for handling workpieces in a processing system | |
WO2008057582A3 (en) | Rotary punch | |
GB201303765D0 (en) | Apparatus and methods for manoeuvring and support of panels | |
CN103552345A (zh) | 贴合装置及贴合方法 | |
MX2014010558A (es) | Montaje de flexion articulado. | |
WO2009060855A1 (ja) | 貼合せ基板製造装置および貼合せ基板製造方法 | |
CN104691077B (zh) | 贴合设备 | |
WO2009016870A1 (ja) | 加熱処理装置および加熱処理方法 | |
SG144816A1 (en) | Apparatus for eliminating wafer warpage | |
JP2015135903A5 (ja) |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 08752677 Country of ref document: EP Kind code of ref document: A1 |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
NENP | Non-entry into the national phase |
Ref country code: JP |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 08752677 Country of ref document: EP Kind code of ref document: A1 |