WO2009013904A1 - 有機薄膜の基材への作製方法 - Google Patents

有機薄膜の基材への作製方法 Download PDF

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Publication number
WO2009013904A1
WO2009013904A1 PCT/JP2008/001975 JP2008001975W WO2009013904A1 WO 2009013904 A1 WO2009013904 A1 WO 2009013904A1 JP 2008001975 W JP2008001975 W JP 2008001975W WO 2009013904 A1 WO2009013904 A1 WO 2009013904A1
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
organic
thin
thin film
film formation
Prior art date
Application number
PCT/JP2008/001975
Other languages
English (en)
French (fr)
Inventor
Mikiya Shimada
Original Assignee
Nippon Soda Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Soda Co., Ltd. filed Critical Nippon Soda Co., Ltd.
Priority to JP2009524398A priority Critical patent/JP5286266B2/ja
Publication of WO2009013904A1 publication Critical patent/WO2009013904A1/ja

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/002—Processes for applying liquids or other fluent materials the substrate being rotated
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
    • B05D1/185—Processes for applying liquids or other fluent materials performed by dipping applying monomolecular layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/12—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by mechanical means

Abstract

基板表面に液ジミ、液流れ跡のないきれいな有機薄膜を作製するものである。 （ａ）表面が親水性である基材を水平な台又は回転可能な水平な台上に載置して固定した後、 （ｂ） 撥水性基を有する有機薄膜形成溶液を、基材表面を覆うことのできる量だけ基材上に滴下し、 （ｃ）基材上に有機薄膜を形成させるに足りる時間静置した後、台を傾けるか、又は台を回転させて余剰の有機薄膜形成溶液を取り除き、必要に応じて、 （ｄ）洗浄用溶剤を基材上に滴下して一定時間保持した後、台を傾けるか、又は台を回転させて洗浄用溶剤を取り除くことを特徴とする有機薄膜の作製方法である。
PCT/JP2008/001975 2007-07-24 2008-07-24 有機薄膜の基材への作製方法 WO2009013904A1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009524398A JP5286266B2 (ja) 2007-07-24 2008-07-24 有機薄膜の基材への作製方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-192089 2007-07-24
JP2007192089 2007-07-24

Publications (1)

Publication Number Publication Date
WO2009013904A1 true WO2009013904A1 (ja) 2009-01-29

Family

ID=40281164

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/001975 WO2009013904A1 (ja) 2007-07-24 2008-07-24 有機薄膜の基材への作製方法

Country Status (2)

Country Link
JP (2) JP5286266B2 (ja)
WO (1) WO2009013904A1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104834033A (zh) * 2015-04-10 2015-08-12 北京空间机电研究所 一种光学元件用透明衍射薄膜的旋涂制备方法
JPWO2015146127A1 (ja) * 2014-03-27 2017-04-13 日本曹達株式会社 疎水化表面基板の製造方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5944132B2 (ja) * 2011-10-05 2016-07-05 株式会社Ｓｃｒｅｅｎセミコンダクターソリューションズ 塗布方法および塗布装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08337654A (ja) * 1995-06-14 1996-12-24 Matsushita Electric Ind Co Ltd 化学吸着膜の製造方法及びこれに用いる化学吸着液
JPH11147074A (ja) * 1997-11-18 1999-06-02 Matsushita Electric Ind Co Ltd 化学吸着単分子膜の製造方法
JP2005177655A (ja) * 2003-12-22 2005-07-07 Kazufumi Ogawa 防汚性宝飾製品とその製造方法
JP2006122748A (ja) * 2004-10-26 2006-05-18 Nippon Soda Co Ltd 有機薄膜形成方法及び有機薄膜形成用溶液
WO2007119690A1 (ja) * 2006-04-12 2007-10-25 Panasonic Corporation 有機分子膜構造体の形成方法及び有機分子膜構造体

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03178371A (ja) * 1989-12-07 1991-08-02 Sony Corp 回転塗布方法
US6020026A (en) * 1997-01-17 2000-02-01 Corning Incorporated Process for the production of a coating of molecular thickness on a substrate
JP3656159B2 (ja) * 2002-02-22 2005-06-08 独立行政法人理化学研究所 リガンドとの分子間相互作用を有するタンパク質のスクリーニング方法
JP2004125882A (ja) * 2002-09-30 2004-04-22 Seiko Epson Corp 基板洗浄方法
JP4274924B2 (ja) * 2003-12-16 2009-06-10 日本曹達株式会社 有機薄膜製造方法
JP4757474B2 (ja) * 2004-10-15 2011-08-24 日本曹達株式会社 有機薄膜形成方法
JP2006231262A (ja) * 2005-02-28 2006-09-07 Fuji Photo Film Co Ltd スピンコート製膜法
JP5464784B2 (ja) * 2005-10-05 2014-04-09 日本曹達株式会社 基材をオゾン水又は過酸化水素水で洗浄する工程を含む、有機薄膜の製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08337654A (ja) * 1995-06-14 1996-12-24 Matsushita Electric Ind Co Ltd 化学吸着膜の製造方法及びこれに用いる化学吸着液
JPH11147074A (ja) * 1997-11-18 1999-06-02 Matsushita Electric Ind Co Ltd 化学吸着単分子膜の製造方法
JP2005177655A (ja) * 2003-12-22 2005-07-07 Kazufumi Ogawa 防汚性宝飾製品とその製造方法
JP2006122748A (ja) * 2004-10-26 2006-05-18 Nippon Soda Co Ltd 有機薄膜形成方法及び有機薄膜形成用溶液
WO2007119690A1 (ja) * 2006-04-12 2007-10-25 Panasonic Corporation 有機分子膜構造体の形成方法及び有機分子膜構造体

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2015146127A1 (ja) * 2014-03-27 2017-04-13 日本曹達株式会社 疎水化表面基板の製造方法
CN104834033A (zh) * 2015-04-10 2015-08-12 北京空间机电研究所 一种光学元件用透明衍射薄膜的旋涂制备方法
CN104834033B (zh) * 2015-04-10 2017-05-10 北京空间机电研究所 一种光学元件用透明衍射薄膜的旋涂制备方法

Also Published As

Publication number Publication date
JP2013144297A (ja) 2013-07-25
JP5286266B2 (ja) 2013-09-11
JP5571226B2 (ja) 2014-08-13
JPWO2009013904A1 (ja) 2010-09-30

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