WO2009008431A1 - 金属膜用研磨液及び研磨方法 - Google Patents
金属膜用研磨液及び研磨方法 Download PDFInfo
- Publication number
- WO2009008431A1 WO2009008431A1 PCT/JP2008/062352 JP2008062352W WO2009008431A1 WO 2009008431 A1 WO2009008431 A1 WO 2009008431A1 JP 2008062352 W JP2008062352 W JP 2008062352W WO 2009008431 A1 WO2009008431 A1 WO 2009008431A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- polishing
- metal film
- metal
- water
- polishing liquid
- Prior art date
Links
- 238000005498 polishing Methods 0.000 title abstract 11
- 239000002184 metal Substances 0.000 title abstract 7
- 239000007788 liquid Substances 0.000 title abstract 4
- 238000000034 method Methods 0.000 title abstract 2
- 239000002253 acid Substances 0.000 abstract 2
- 239000003795 chemical substances by application Substances 0.000 abstract 2
- 229920003169 water-soluble polymer Polymers 0.000 abstract 2
- 238000005260 corrosion Methods 0.000 abstract 1
- 230000007797 corrosion Effects 0.000 abstract 1
- 150000002148 esters Chemical class 0.000 abstract 1
- 239000007800 oxidant agent Substances 0.000 abstract 1
- 230000003449 preventive effect Effects 0.000 abstract 1
- 150000003839 salts Chemical class 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F3/00—Brightening metals by chemical means
- C23F3/04—Heavy metals
- C23F3/06—Heavy metals with acidic solutions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/30625—With simultaneous mechanical treatment, e.g. mechanico-chemical polishing
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
- H01L21/321—After treatment
- H01L21/32115—Planarisation
- H01L21/3212—Planarisation by chemical mechanical polishing [CMP]
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
Abstract
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/668,096 US8501625B2 (en) | 2007-07-10 | 2008-07-08 | Polishing liquid for metal film and polishing method |
EP08777961A EP2169710A4 (en) | 2007-07-10 | 2008-07-08 | METAL FILM LUBRICANT AND POLISHING METHOD |
JP2009522652A JP5392080B2 (ja) | 2007-07-10 | 2008-07-08 | 金属膜用研磨液及び研磨方法 |
KR1020107000298A KR101445429B1 (ko) | 2007-07-10 | 2008-07-08 | 금속용 연마액 및 연마 방법 |
US13/846,289 US20130217229A1 (en) | 2007-07-10 | 2013-03-18 | Polishing liquid for metal film and polishing method |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007180928 | 2007-07-10 | ||
JP2007-180928 | 2007-07-10 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US13/846,289 Division US20130217229A1 (en) | 2007-07-10 | 2013-03-18 | Polishing liquid for metal film and polishing method |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009008431A1 true WO2009008431A1 (ja) | 2009-01-15 |
Family
ID=40228602
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/062352 WO2009008431A1 (ja) | 2007-07-10 | 2008-07-08 | 金属膜用研磨液及び研磨方法 |
Country Status (6)
Country | Link |
---|---|
US (2) | US8501625B2 (ja) |
EP (1) | EP2169710A4 (ja) |
JP (1) | JP5392080B2 (ja) |
KR (1) | KR101445429B1 (ja) |
TW (2) | TWI471364B (ja) |
WO (1) | WO2009008431A1 (ja) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2273537A1 (en) * | 2008-04-15 | 2011-01-12 | Hitachi Chemical Company, Ltd. | Polishing solution for metal films and polishing method using the same |
JP2011020208A (ja) * | 2009-07-15 | 2011-02-03 | Hitachi Chem Co Ltd | Cmp研磨液及びこのcmp研磨液を用いた研磨方法 |
WO2014013977A1 (ja) * | 2012-07-17 | 2014-01-23 | 株式会社 フジミインコーポレーテッド | 合金材料研磨用組成物及びそれを用いた合金材料の製造方法 |
JP2017057398A (ja) * | 2016-10-07 | 2017-03-23 | 株式会社フジミインコーポレーテッド | 研磨用組成物、それを用いた研磨方法、及びその製造方法 |
JP2017101248A (ja) * | 2017-01-13 | 2017-06-08 | 株式会社フジミインコーポレーテッド | 研磨用組成物、研磨用組成物製造方法および研磨物製造方法 |
US10508222B2 (en) | 2010-08-23 | 2019-12-17 | Fujimi Incorporated | Polishing composition and polishing method using same |
CN110904458A (zh) * | 2019-12-31 | 2020-03-24 | 苏州丰川电子科技有限公司 | 金属表面处理装置 |
CN110952097A (zh) * | 2019-12-31 | 2020-04-03 | 苏州丰川电子科技有限公司 | 电子产品金属外壳的表面处理装置 |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5392080B2 (ja) * | 2007-07-10 | 2014-01-22 | 日立化成株式会社 | 金属膜用研磨液及び研磨方法 |
CN103333661B (zh) | 2008-12-11 | 2015-08-19 | 日立化成株式会社 | Cmp用研磨液以及使用该研磨液的研磨方法 |
JP5648567B2 (ja) * | 2010-05-07 | 2015-01-07 | 日立化成株式会社 | Cmp用研磨液及びこれを用いた研磨方法 |
JP5979872B2 (ja) * | 2011-01-31 | 2016-08-31 | 花王株式会社 | 磁気ディスク基板の製造方法 |
JP5979871B2 (ja) * | 2011-03-09 | 2016-08-31 | 花王株式会社 | 磁気ディスク基板の製造方法 |
US20130017762A1 (en) * | 2011-07-15 | 2013-01-17 | Infineon Technologies Ag | Method and Apparatus for Determining a Measure of a Thickness of a Polishing Pad of a Polishing Machine |
TWI582184B (zh) * | 2012-01-16 | 2017-05-11 | 福吉米股份有限公司 | 研磨用組成物、其製造方法、稀釋用原液、矽基板之製造方法、及矽基板 |
WO2013137089A1 (en) * | 2012-03-14 | 2013-09-19 | Semiconductor Energy Laboratory Co., Ltd. | Light-emitting element, light-emitting device, display device, electronic device, and lighting device |
CN105378011B (zh) | 2013-07-11 | 2020-07-07 | 巴斯夫欧洲公司 | 包含苯并三唑衍生物作为缓蚀剂的化学机械抛光组合物 |
US10752807B2 (en) * | 2013-09-10 | 2020-08-25 | Hitachi Chemical Company, Ltd | Slurry, polishing-liquid set, polishing liquid, method for polishing substrate, and substrate |
KR20180132893A (ko) * | 2016-05-26 | 2018-12-12 | 후지필름 가부시키가이샤 | 연마액, 연마액의 제조 방법, 연마액 원액, 및 화학적 기계적 연마 방법 |
US11145544B2 (en) * | 2018-10-30 | 2021-10-12 | Taiwan Semiconductor Manufacturing Co., Ltd. | Contact etchback in room temperature ionic liquid |
US10964549B2 (en) * | 2018-11-30 | 2021-03-30 | Taiwan Semiconductor Manufacturing Company Limited | Wafer polishing with separated chemical reaction and mechanical polishing |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002050595A (ja) * | 2000-08-04 | 2002-02-15 | Hitachi Ltd | 研磨方法、配線形成方法及び半導体装置の製造方法 |
JP2004311565A (ja) * | 2003-04-03 | 2004-11-04 | Hitachi Chem Co Ltd | 金属用研磨液及び研磨方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4944836A (en) * | 1985-10-28 | 1990-07-31 | International Business Machines Corporation | Chem-mech polishing method for producing coplanar metal/insulator films on a substrate |
US4954142A (en) | 1989-03-07 | 1990-09-04 | International Business Machines Corporation | Method of chemical-mechanical polishing an electronic component substrate and polishing slurry therefor |
JP3111892B2 (ja) * | 1996-03-19 | 2000-11-27 | ヤマハ株式会社 | 研磨装置 |
CN101058713B (zh) | 2001-10-31 | 2011-02-09 | 日立化成工业株式会社 | 研磨液及研磨方法 |
TWI259201B (en) * | 2001-12-17 | 2006-08-01 | Hitachi Chemical Co Ltd | Slurry for metal polishing and method of polishing with the same |
US20030219982A1 (en) * | 2002-05-23 | 2003-11-27 | Hitachi Chemical Co., Ltd | CMP (chemical mechanical polishing) polishing liquid for metal and polishing method |
US20050104048A1 (en) * | 2003-11-13 | 2005-05-19 | Thomas Terence M. | Compositions and methods for polishing copper |
US7303993B2 (en) * | 2004-07-01 | 2007-12-04 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Chemical mechanical polishing compositions and methods relating thereto |
JP5392080B2 (ja) * | 2007-07-10 | 2014-01-22 | 日立化成株式会社 | 金属膜用研磨液及び研磨方法 |
-
2008
- 2008-07-08 JP JP2009522652A patent/JP5392080B2/ja not_active Expired - Fee Related
- 2008-07-08 WO PCT/JP2008/062352 patent/WO2009008431A1/ja active Application Filing
- 2008-07-08 EP EP08777961A patent/EP2169710A4/en not_active Withdrawn
- 2008-07-08 US US12/668,096 patent/US8501625B2/en not_active Expired - Fee Related
- 2008-07-08 KR KR1020107000298A patent/KR101445429B1/ko not_active IP Right Cessation
- 2008-07-10 TW TW97126163A patent/TWI471364B/zh not_active IP Right Cessation
- 2008-07-10 TW TW102119634A patent/TWI471365B/zh not_active IP Right Cessation
-
2013
- 2013-03-18 US US13/846,289 patent/US20130217229A1/en not_active Abandoned
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002050595A (ja) * | 2000-08-04 | 2002-02-15 | Hitachi Ltd | 研磨方法、配線形成方法及び半導体装置の製造方法 |
JP2004311565A (ja) * | 2003-04-03 | 2004-11-04 | Hitachi Chem Co Ltd | 金属用研磨液及び研磨方法 |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2273537A1 (en) * | 2008-04-15 | 2011-01-12 | Hitachi Chemical Company, Ltd. | Polishing solution for metal films and polishing method using the same |
EP2273537A4 (en) * | 2008-04-15 | 2012-07-25 | Hitachi Chemical Co Ltd | POLISHING SOLUTION FOR METALLIC FILMS AND METHOD OF POLISHING USING THE SAME |
US8734204B2 (en) | 2008-04-15 | 2014-05-27 | Hitachi Chemical Company, Ltd. | Polishing solution for metal films and polishing method using the same |
JP2011020208A (ja) * | 2009-07-15 | 2011-02-03 | Hitachi Chem Co Ltd | Cmp研磨液及びこのcmp研磨液を用いた研磨方法 |
US10508222B2 (en) | 2010-08-23 | 2019-12-17 | Fujimi Incorporated | Polishing composition and polishing method using same |
WO2014013977A1 (ja) * | 2012-07-17 | 2014-01-23 | 株式会社 フジミインコーポレーテッド | 合金材料研磨用組成物及びそれを用いた合金材料の製造方法 |
CN104471016A (zh) * | 2012-07-17 | 2015-03-25 | 福吉米株式会社 | 合金材料研磨用组合物及使用其的合金材料的制造方法 |
JP2017057398A (ja) * | 2016-10-07 | 2017-03-23 | 株式会社フジミインコーポレーテッド | 研磨用組成物、それを用いた研磨方法、及びその製造方法 |
JP2017101248A (ja) * | 2017-01-13 | 2017-06-08 | 株式会社フジミインコーポレーテッド | 研磨用組成物、研磨用組成物製造方法および研磨物製造方法 |
CN110904458A (zh) * | 2019-12-31 | 2020-03-24 | 苏州丰川电子科技有限公司 | 金属表面处理装置 |
CN110952097A (zh) * | 2019-12-31 | 2020-04-03 | 苏州丰川电子科技有限公司 | 电子产品金属外壳的表面处理装置 |
CN110904458B (zh) * | 2019-12-31 | 2024-03-29 | 苏州丰川电子科技有限公司 | 金属表面处理装置 |
Also Published As
Publication number | Publication date |
---|---|
TW201345960A (zh) | 2013-11-16 |
US20130217229A1 (en) | 2013-08-22 |
JP5392080B2 (ja) | 2014-01-22 |
US8501625B2 (en) | 2013-08-06 |
TWI471364B (zh) | 2015-02-01 |
US20100323584A1 (en) | 2010-12-23 |
TW200911893A (en) | 2009-03-16 |
JPWO2009008431A1 (ja) | 2010-09-09 |
KR20100051610A (ko) | 2010-05-17 |
EP2169710A4 (en) | 2010-11-17 |
KR101445429B1 (ko) | 2014-09-26 |
TWI471365B (zh) | 2015-02-01 |
EP2169710A1 (en) | 2010-03-31 |
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